Thin Graphene Nanoplatelets, 1g

$235.00
Product Thin Graphene Nanoplatelets, 1g
CAS No. 1034343-98-0
Appearance Black to dark gray
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 0.5–25µm  (Size Can be customized),  Ask for other available size range.
Ingredient C
Molecular Weight Black to dark gray
Melting Point N/A
Boiling Point N/A
Density 2.2 g/cm³
Product Codes NCZ-554I

Permalloy (Ni-Fe-Mo) Sputtering Targets, Size: 2”, Thickness: 0.125”

$235.00

Product 

Permalloy (Ni-Fe-Mo) Sputtering Targets, Size: 2'', Thickness: 0.125''

CAS No.

 Nickel: 7440-02-0 Iron: 7439-89-6 Molybdenum: 7439-98-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 Not defined (alloy), but elemental weights: Ni: 58.69 g/mol Fe: 55.85 g/mol Mo: 95.95 g/mol

Melting Point

 ~1450 °C

Boiling Point

 ~2730–3000 °C

Density

~8.7 g/cm³

Product Codes

NCZ-1801K

Silicon Dioxide (SiO2) Sputtering Targets, Fused Quartz, Purity: 99.995%, Size: 6”, Thickness: 0.125”

$235.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Silver (Ag) Nanopowder/Nanoparticles Dispersion, Purity: %99.99, Size: 20-30 nm, 167 ppm

Price range: $20.00 through $235.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

This research grade product brings special properties of silver (Ag) nanoparticles into a solution. This way silver nanoparticles find further applications in the research studies. It is an easy to use dispersion and can be diluted with water addition and simple mixing. This dispersion can be used in the applications where antibacterial protection is needed. It can be used in antibacterial finishing of textiles (such as leather), paper products, deodorants for personal belongings (such as toys, footwear), deodorizing agents in paints and skin related medical products (such as antibacterial gels and lotions). Note: Silver nanoparticle dispersion product should be kept away from sunlight. It is a research grade product, it should be handled by professional people. If nanoparticles begin to agglomerate after stored for a long time, the dispersion can be simply mixed before use.

High Temperature Teflon Tape for Lithium Battery, Width: 19 mm, Thickness: 0.13 mm, Length: 10 m

Price range: $75.00 through $235.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

High Temperature Teflon Tape for Lithium Battery is mainly used to prevent the battery from being high temperature scald.

Graphite Sheet Thermal Interface Material, EYG Series, 1350 W/m.K, Thickness: 40 µm, Lenght: 115 mm, Width: 90 mm

Price range: $57.00 through $235.00
Select options This product has multiple variants. The options may be chosen on the product page
1 piece / 57 € 5 pieces / 235 € Please contact us for quotes on larger quantities !   Graphite

Zirconium Oxide Nanopowder/ Nanoparticles(ZrO2- 8Y, 99.9%, 0.8um)

Price range: $69.00 through $234.00
Select options This product has multiple variants. The options may be chosen on the product page
$68/100g
$147/500g
$234/kg

Product 

Zirconium Oxide Nanopowder/ Nanoparticles(ZrO2- 8Y, 99.9%, 0.8um)

CAS No.

 1314-23-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

0.8um(Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

~130.9 g/mol

Melting Point

~2,700 °C

Boiling Point

~4,300 °C

Density

~5.9 – 6.1 g/cm³

Product Codes

NCZ-1227K

Magnesium Oxide Nanoparticles/ Nanopowder (MgO, 99+%, 10~30nm)

Price range: $84.00 through $234.00
Select options This product has multiple variants. The options may be chosen on the product page
$84/100g
$174/500g
$234/1kg

Product 

Magnesium Oxide Nanoparticles/ Nanopowder (MgO, 99+%, 10~30nm)

CAS No.

1309-48-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

10~30nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 40.30 g/mol

Melting Point

~2,852 °C

Boiling Point

~3,600 °C

Density

~3.58 g/cm³

Product Codes

NCZ-1149K

Magnesium (Mg) Sputtering Targets, Purity: 99.98%, Size: 2”, Thickness: 0.250”

$233.00

Product 

Magnesium (Mg) Sputtering Targets, Purity: 99.98%, Size: 2'', Thickness: 0.250''

CAS No.

7439-95-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 24.305 g/mol

Melting Point

 650 °C

Boiling Point

 1,090 °C

Density

1.738 g/cm³

Product Codes

NCZ-2000K

Tantalum (Ta) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.250”

$233.00

Product 

Tantalum (Ta) Sputtering Targets, Purity: 99.95%, Size: 1'', Thickness: 0.250''

CAS No.

 7440-25-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 180.95 g/mol

Melting Point

3017 °C

Boiling Point

 5458 °C

Density

16.65 g/cm³

Product Codes

NCZ-1666K

Carbonyl Iron Powder (Fe, 4-8um)

Price range: $157.00 through $233.00
Select options This product has multiple variants. The options may be chosen on the product page
$157/50g $233/100g

Product 

Carbonyl Iron Powder (Fe, 4-8um)

CAS No.

7439-89-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

4–8 µm (microns) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

55.845 g/mol

Melting Point

1538 °C

Boiling Point

2862 °C

Density

7.87 g/cm³

Product Codes

NCZ-1046K

Magnesium (Mg) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.250”

$232.00

Product 

Magnesium (Mg) Sputtering Targets, Purity: 99.95%, Size: 3'', Thickness: 0.250''

CAS No.

7439-95-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 24.305 g/mol

Melting Point

 650 °C

Boiling Point

 1,090 °C

Density

1.738 g/cm³

Product Codes

NCZ-1997K

Manganese (Mn) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.125”

$232.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

316SS Coin Cell Battery Spacer, Diameter: 15.8 mm, Thickness: 0.5 mm

Price range: $63.00 through $232.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

316 Stainless Steel Coin Cell Battery Spacer (15.8 mm Dia x 0.5 mm) for Battery Research

Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: 4-16 nm

Price range: $36.00 through $232.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Multi Walled Carbon Nanotubes have a wide range of possible uses in various industries. These applications cover a variety of fields, such as energy, chemistry, electronics, mechanics, and medicine. It has applications in the following areas: 1-drug delivery; 2-biosensors; 3-CNT composites; 4-catalysis; 5-nanoprobes; and 6-hydrogen storage. seven lithium batteries Eight gas discharge tubes ten flat panel displays, eleven transistors, twelve solar cells, and ten supercapacitors 14-templates and 13-photoluminescence

Nickel (Ni) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 90 nm, Metal Basis

Price range: $118.00 through $232.00
Select options This product has multiple variants. The options may be chosen on the product page

Nickel (Ni) Nanopowder/Nanoparticles

Purity: 99.95%, Size: 90 nm, Metal Basis

Technical Properties:

Bulk Density (g/cm3) 1,1
True Density (g/cm3) 8,9
Shape spherical
Color black
Average Particle Size (nm) 90
Specific Surface Area (m2/g) 28,1
Elemental Analysis Ni Co Mg Pb Others
99.95 0.002 0.001 0.001 0.001

Properties, Storage and Cautions:

Nickel nanoparticles are highly reactive and flammable, therefore it should be handled with care and rapid moves, vibrations should be avoided. Nanopowder should be kept away from sunlight, any kind of heating, moisture and impacts. Coagulation of the particles is a serious problem, so, nanopowder should be sealed under vacuum and should be kept in cool and dry conditions. Air contact should be avoided.

Antimony (Sb) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.125”

$231.00

Product 

Antimony (Sb) Sputtering Targets, Purity: 99.999%, Size: 1'', Thickness: 0.125''

CAS No.

 7440-36-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 121.76 g/mol

Melting Point

 630.6 °C

Boiling Point

 1587 °C

Density

 6.69 g/cm³

Product Codes

NCZ-2511K

Nickel (Ni) Sputtering Targets, Purity: 99.995%, Size: 3”, Thickness: 0.250”

$231.00

Product 

Nickel (Ni) Sputtering Targets, Purity: 99.995%, Size: 3'', Thickness: 0.250''

CAS No.

7440-02-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 58.69 g/mol

Melting Point

 1,455 °C

Boiling Point

 2,732 °C

Density

 8.90 g/cm³

Product Codes

NCZ-1881K

Praseodymium (Pr) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”

$231.00

Product 

Praseodymium (Pr) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.250''

CAS No.

7440-10-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 140.91 g/mol

Melting Point

931 °C

Boiling Point

 3520 °C

Density

 6.77 g/cm³

Product Codes

NCZ-1790K

Nitinol Shape Memory Alloy Sheet, Thickness: 0,5 mm, AF: 80-85°C

Price range: $6.80 through $230.75
Select options This product has multiple variants. The options may be chosen on the product page
1cm x 1cm/  6,80  €                     2 cm x 2cm/   16 €    

Nitinol Shape Memory Alloy Sheet, Thickness: 0,5 mm, AF: 35-40°C

Price range: $6.85 through $230.75
Select options This product has multiple variants. The options may be chosen on the product page
1cm x 1cm/  6,85  €                     2 cm x 2cm/   16 €    

Silicon (Si) Sputtering Targets, N-type, Purity: 99.999%, Size: 2”, Thickness: 0.125”

$230.00

Product 

Silicon (Si) Sputtering Targets, N-type, Purity: 99.999%, Size: 2'', Thickness: 0.125''

CAS No.

7440-21-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

28.0855 g/mol

Melting Point

 1,414 °C

Boiling Point

3,265 °C

Density

 2.33 g/cm³

Product Codes

NCZ-1765K

Silicon (Si) Sputtering Targets, P-type, Purity: 99.999%, Size: 2”, Thickness: 0.125”

$230.00

Product 

Silicon (Si) Sputtering Targets, P-type, Purity: 99.999%, Size: 2'', Thickness: 0.125''

CAS No.

7440-21-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

28.0855 g/mol

Melting Point

 1,414 °C

Boiling Point

3,265 °C

Density

 2.33 g/cm³

Product Codes

NCZ-1751K

3N (99.9%) Ytterbium Oxide (Yb2O3) Pieces (3-12mm) Evaporation Materials

Price range: $176.00 through $230.00
Select options This product has multiple variants. The options may be chosen on the product page
Product 3N (99.9%) Ytterbium Oxide (Yb2O3) Pieces (3-12mm) Evaporation Materials
CAS No. 1314-37-0
Appearance White, Crystalline Solid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 3-12mm (Size Can be customized),  Ask for other available size range.
Ingredient Yb2O3
Molecular Weight 394.08 g/mol
Melting Point N/A
Boiling Point N/A
Density 9.17 g/cm3
Product Codes NCZ-167E
 

Yttria Stabilized Zirconium Oxide Nanopowder / Nanoparticles ( ZrO2-3Y, D50 0.3~3um)

Price range: $67.00 through $230.00
Select options This product has multiple variants. The options may be chosen on the product page
$68/100g
$144/500g
$230/kg

Product 

Yttria Stabilized Zirconium Oxide Nanopowder / Nanoparticles ( ZrO2-3Y, D50 0.3~3um)

CAS No.

1314-23-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

D50 0.3~3um (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

~126.29 g/mol

Melting Point

~2,700 °C

Boiling Point

~4,300 °C

Density

~5.8–6.1 g/cm³

Product Codes

NCZ-1226K

Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.125”

$230.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Titanium Dioxide (TiO2) Nanopowder/Nanoparticles Dispersion in Water, Anatase, Size: 25-45 nm, 42 wt%

Price range: $68.00 through $230.00
Select options This product has multiple variants. The options may be chosen on the product page
Titanium Dioxide (TiO2) Nanopowder/Nanoparticles Dispersion in Water Anatase, Size: 25-45 nm, 42 wt%

Copper Oxide (CuO) Nanopowder/Nanoparticles, Purity: 99.5%, Size: < 77 nm

Price range: $27.00 through $230.00
Select options This product has multiple variants. The options may be chosen on the product page
25 grams/24 € 
100 grams/37 € 500 grams/128 €
1000 grams/203 € 
                      
Please contact us for quotes on larger quantities !!!

Copper Oxide (CuO) Nanopowder/Nanoparticles

Purity: 99.5%, Size: < 77 nm

Applications:

Copper Oxide nanoparticles have wide applications in different materials. It is applied to thermoelectric materials, superconducting materials, sensing materials, catalysts, ceramics, and glass. For example it is applied in the followings: near infrared tilters, magnetic storage devices, semiconductors, gas sensors, photoconductors and photothermal applications, and solar energy transformation. In catalysis, it is used as rocket propellant combustion catalyst. It significantly can improve the homogeneous propellant burning rate and lower pressure index.

Nickel Iron (Ni-Fe) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.125”

$229.00

Product 

Nickel Iron (Ni-Fe) Sputtering Targets, Purity: 99.95%, Size: 2'', Thickness: 0.125''

CAS No.

N/A

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 57.5 g/mol

Melting Point

 ~1,400 – 1,450 °C

Boiling Point

 ~2,730 – 2,750 °C

Density

 ~8.7 g/cm³

Product Codes

NCZ-1846K

Gadolinium Oxide (Gd2O3) Nanopowder/Nanoparticles, Purity: 99.99%, Size: 13-95 nm

Price range: $27.00 through $229.00
Select options This product has multiple variants. The options may be chosen on the product page
1 gram/24 € 
5 grams/44 € 25 grams/110 €
100 grams/202 € 
Please contact us for quotes on larger quantities !!! 

Gadolinium Oxide (Gd2O3) Nanopowder/Nanoparticles

Purity: 99.99%, Size: 13-95 nm

Applications:

Gadolinium oxide nanoparticles are used in different fluorescent, luminescence and electric devices. It is used in electroluminescent devices, cathode-ray tube, field emission displays, ferroelectric memory, plasma display panels, ultraviolet detectors, and high resolution x-ray medical imaging.  

Activated carbon fiber Felt(Rayon based, for solvent recovery) (263584)

$228.00
Select options This product has multiple variants. The options may be chosen on the product page
Activated carbon fiber Felt(Rayon based, for solvent recovery) (263584)
CAS 7440-44-0
Product Codes- NCZ-2691K

Activated carbon fiber Powder(Rayon based, 100-120 mesh) (070584)

$228.00
Select options This product has multiple variants. The options may be chosen on the product page
Activated carbon fiber Powder(Rayon based, 100-120 mesh) (070584)

Test Items Specifications
Ignition temperature(°C) » 500
BET(m2/g) 1200
Pore volume(cm3/g) 0.67
pH 5.6-7.0
Ash(%) ≤ 3
Iodine uptake (liquid phase) (mg/g) 1050-1100
Benzene uptake(%) 35-38
Mesh number(mesh) 100-120
Product Codes- NCZ-2687K

Activated carbon fiber Yarn(Rayon based) (120584)

$228.00
Select options This product has multiple variants. The options may be chosen on the product page
Activated carbon fiber Yarn(Rayon based) (120584)

Test Items

Units

Specifications

Filament diameter

um

10-20

Bulk density

g/m3

0.04-0.10

Ignition point

°C

»500

BET

m2/g

1200

Pore volume

cm3/g

0.67

pH

5.6-7.0

Ash

%

≤1.5

Iodine adsorption (liquid phase)

mg/g

1100-1150

Benzene adsorption

%

35-38

Filament length

mm

≤8mm

≤3mm

Product Codes- NCZ-2686K

Silver (Ag) Nanopowder, 30-50nm, >99.99% Purity, 5g

$228.00
Product Silver (Ag) Nanopowder, 30-50nm, >99.99% Purity, 5g
CAS No. 7440-22-4
Appearance Gray to dark gray fine
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 30-50nm (Size Can be customized),  Ask for other available size range.
Ingredient Ag
Molecular Weight N/A
Melting Point 961.8°C
Boiling Point N/A
Density 10.49 g/cm³
Product Codes NCZ-522I
 

Magnesium (Mg) Sputtering Targets, Purity: 99.98%, Size: 4”, Thickness: 0.125”

$228.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Nickel Titanium (Ni-Ti) Alloy Nanopowder/Nanoparticles, Size: 55 nm, Ni:Ti/50:50

$228.00
Select options This product has multiple variants. The options may be chosen on the product page
Nickel Titanium (Ni-Ti) Alloy Nanopowder/Nanoparticles Size: 55 nm, Ni:Ti/50:50 Technical Properties: Alloy Ratio (Ni-Ti) 50-50 Average Particle Size (nm) 55

Nickel Titanium (Ni-Ti) Alloy Nanopowder/Nanoparticles, Size: 55 nm, Ni:Ti/50:50

$228.00
Select options This product has multiple variants. The options may be chosen on the product page

Nickel Titanium (Ni-Ti) Alloy Nanopowder/Nanoparticles

Size: 55 nm, Ni:Ti/50:50

Technical Properties:

Alloy Ratio (Ni-Ti) 50-50
Average Particle Size (nm) 55
Elemental Analysis Ni-Ti Fe Cu Cr Others
≥99.9 0.025 0.02 0.018 0.01

Properties, Storage and Cautions:

Ni-Ti alloy nanoparticles are highly reactive, therefore it should be handled with care and rapid moves, vibrations should be avoided. The powder should be kept away from sunlight, any kind of heating, moisture and impacts. Coagulation of the particles is a serious problem, so, the powder should be sealed under vacuum and should be kept in cool and dry conditions. Air contact should be avoided.

Applications:

Ni-Ti alloy materials show high elasticity and shape memory property. They can be used in heat engines, sensors, biomedical applications, actuators etc.

Nickel Titanium (Ni-Ti) Alloy Nanopowder/Nanoparticles, Size: 55 nm, Ni:Ti/50:50

$228.00
Select options This product has multiple variants. The options may be chosen on the product page

Nickel Titanium (Ni-Ti) Alloy Nanopowder/Nanoparticles

Size: 55 nm, Ni:Ti/50:50

Technical Properties:

Alloy Ratio (Ni-Ti) 50-50
Average Particle Size (nm) 55
Elemental Analysis Ni-Ti Fe Cu Cr Others
≥99.9 0.025 0.02 0.018 0.01

Properties, Storage and Cautions:

Ni-Ti alloy nanoparticles are highly reactive, therefore it should be handled with care and rapid moves, vibrations should be avoided. The powder should be kept away from sunlight, any kind of heating, moisture and impacts. Coagulation of the particles is a serious problem, so, the powder should be sealed under vacuum and should be kept in cool and dry conditions. Air contact should be avoided.

Silver (Ag) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”

$227.00

Product 

Silver (Ag) Sputtering Targets, Purity: 99.99%, Size: 1'', Thickness: 0.125''

CAS No.

 7440-22-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

107.87 g/mol

Melting Point

 961.78 °C

Boiling Point

 2162 °C

Density

 10.49 g/cm³

Product Codes

NCZ-1694K

Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.125”

$227.00

Product 

Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 2'', Thickness: 0.125''

CAS No.

7440-33-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 183.84 g/mol

Melting Point

3422 °C

Boiling Point

 5555 °C

Density

19.25 g/cm³

Product Codes

NCZ-1593K

Zinc Oxide (ZnO) with Alumina Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”

$227.00

Product 

Zinc Oxide (ZnO) with Alumina Sputtering Targets, Purity: 99.99%, Size: 1'', Thickness: 0.250''

CAS No.

ZnO: 1314-13-2 Al₂O₃: 1344-28-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

ZnO + Al₂O₃ (AZO)(black granules) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

ZnO: 81.38 g/mol Al₂O₃: 101.96 g/mol

Melting Point

~1975 °C

Boiling Point

N/A

Density

~5.6 g/cm³

Product Codes

NCZ-1492K

5N (99.999%) Perovskite Grade Cesium Bromide (CsBr), 10g

$227.00
Product 5N (99.999%) Perovskite Grade Cesium Bromide (CsBr), 10g
CAS No. 7787-69-1
Appearance White 
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS <50µm (Size Can be customized), Ask for other available size range.
Ingredient CsBr
Molecular Weight 212.81 g/mol
Melting Point 636 °C
Boiling Point N/A
Density 4.44 g/cm³
Product Codes NCZ-100I

Barium Iron Oxide (BaFe12O19) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 55 nm

Price range: $73.00 through $227.00
Select options This product has multiple variants. The options may be chosen on the product page
1 gram/65 € 5 grams/201 €  
 
Please contact us for quotes on larger quantities !!!

Barium Iron Oxide (BaFe12O19) Nanopowder/Nanoparticles

Purity: 99.95%, Size: 55 nm

Technical Properties:

Purity (%) 99.95
True Density (g/cm3) 5.5
Average Particle Size (nm) 55
Morphology polyhedral
Elemental Analysis Al Ca Cd Co Cr Cu Mg Mn Ni Zn
290 ppm 158 ppm 35 ppm 22 ppm 35 ppm 8 ppm 150 ppm 650 ppm 65 ppm 4 ppm

Applications:

Barium Iron oxide nanoparticle is used as flame retardant in different materials. It can be used in textiles, fibers, plastics,and coatings. It has also applications in the field of catalysis.

Aluminum (Al) Nanopowder/Nanoparticles, Purity: 99.995%, Size: 110 nm, Metal Basis

Price range: $67.00 through $227.00
Select options This product has multiple variants. The options may be chosen on the product page

Aluminum (Al) Nanopowder/Nanoparticles

Purity: 99.995%, Size: 110 nm, Metal Basis

Technical Properties:

Bulk Density (g/cm3) 0,22
True Density (g/cm3) 2,7
Color black
Shape spherical
Crystal Structure cubic
Average Particle Size (nm) 110
Specific Surface Area (m2/g) 15-20
Elemental Analysis Al Si Fe Cu Mg, Mn, Pb, Ni, Zn
99.995 0.01 0.01 0.03 ≤0.01

Applications:

Aluminum nanoparticles are highly reactive and flammable, therefore it should be handled with care and rapid moves, vibrations should be avoided. Nanopowder should be kept away from sunlight, any kind of heating, moisture and impacts. Coagulation of the particles is a serious problem, so, nanopowder should be sealed under vacuum and should be kept in cool and dry conditions. Air contact should be avoided. Aluminum nanopowder can be used in catalysis applications as well as biomedical research. It can be added to heat transfer fluids, composite materials, package materials, transparent conductive fluids and wear resistant parts in order to strengthen their properties.  

Carbon (C) (Pyrolytic Graphite) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.250”

$226.00

Product 

Carbon (C) (Pyrolytic Graphite) Sputtering Targets, Purity: 99.999%, Size: 1'', Thickness: 0.250''

CAS No.

 7782-42-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 12.01 g/mol

Melting Point

Sublimes ~3652 °C (no true melting)

Boiling Point

Sublimes directly ~4,200°C

Density

 ~2.2–2.25 g/cm³

Product Codes

NCZ-2343K

Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.125”

$226.00

Product 

Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 3'', Thickness: 0.125''

CAS No.

7440‑47‑3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 51.9961 g/mol

Melting Point

 1,857 °C

Boiling Point

 2,672 °C

Density

 7.14 g/cm³

Product Codes

NCZ-2314K

Magnesium (Mg) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.250”

$226.00

Product 

Magnesium (Mg) Sputtering Targets, Purity: 99.95%, Size: 2'', Thickness: 0.250''

CAS No.

7439-95-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 24.305 g/mol

Melting Point

 650 °C

Boiling Point

 1,090 °C

Density

1.738 g/cm³

Product Codes

NCZ-2001K

Nickel Chromium (Ni-Cr) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”

$226.00

Product 

Nickel Chromium (Ni-Cr) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.125''

CAS No.

 11106-97-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 ~110.69 g/mol

Melting Point

 ~1,400 °C

Boiling Point

 ~2,730–2,750 °C

Density

 ~8.4 – 8.5 g/cm³

Product Codes

NCZ-1857K

Silver (Ag) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”

$226.00

Product 

Silver (Ag) Sputtering Targets, Purity: 99.99%, Size: 1'', Thickness: 0.250''

CAS No.

 7440-22-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

107.87 g/mol

Melting Point

 961.78 °C

Boiling Point

 2162 °C

Density

 10.49 g/cm³

Product Codes

NCZ-1693K

Tin (Sn) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”

$226.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Silicon (Si) Sputtering Targets, P-type, indium, Purity: 99.999%, Size: 1”, Thickness: 0.250”

$226.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Indium (In) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.125”

$225.00

Product 

Indium (In) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness: 0.125''

CAS No.

 7440-74-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

114.82 g/mol

Melting Point

 156.6 °C

Boiling Point

 2,072 °C

Density

 7.31 g/cm³

Product Codes

NCZ-2231K

Yttrium Oxide Nanoparticles / Nanopowder (Y2O3, 99.995%, 0.5~1um)

Price range: $105.00 through $225.00
Select options This product has multiple variants. The options may be chosen on the product page
$105/100g $225/500g $325/kg
Product Yttrium Oxide Nanoparticles / Nanopowder (Y2O3, 99.995%, 0.5~1um)
CAS No. 1314-36-9
Appearance White powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 0.5-1nm (Size Can be customized),  Ask for other available size range.
Ingredient Y2O3
Molecular Weight 225.81 g/mol
Melting Point 2425°C
Boiling Point 4300°C
Density 5.01 g/cm³
Product Codes NCZ-122R
 

Zinc Sulfide (ZnS) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”

$225.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Silicon Nitride (Si3N4) Sputtering Targets, Purity: 99.5%, Size: 1”, Thickness: 0.125”, Dark Gray to Black

$225.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Nickel Vanadium (NiV) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.125”

$225.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Bismuth (Bi) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.125”

$225.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered. With the sputtering target's assistance, the

Even incredibly low amounts of contaminants are recognized, and the target material can be identified.

Applications for sputtering targets are also found in space. One type of space weathering is sputtering, which modifies the chemical and physical characteristics of airless worlds like the Moon and asteroids.

The silvery metal bismuth has a hint of pink and is fragile. It is stable in both water and air. Even though bismuth has bad thermal and electrical properties, it is used to make fusible alloys, a class of materials with low melting points that are useful for a variety of products, such as thermal fuses and solders. Because pure bismuth absorbs gamma rays highly, it can be used as a window or filter for these at the same time allowing neutrons to flow through.

Europium (Eu) Micron Powder, Purity: 99.5 %, Size: 325 mesh

Price range: $36.00 through $225.00
Select options This product has multiple variants. The options may be chosen on the product page
1 gram/32 € 5 grams/53 € 25 grams/109 € 100 grams/200 € 

Carbon (C) (Graphite) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.250”

$224.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Activated Carbon Micron Powder, Size: 200 Mesh

Price range: $21.00 through $224.00
Select options This product has multiple variants. The options may be chosen on the product page
25 grams/19 € 100 grams/34 € 500 grams/74 € 1000 grams/99 € 5 kg/198 € Please contact us for quotes on larger quantities !!!

Activated Carbon Micron Powder

Size: 200 Mesh