Cerium Oxide (CeO2) Micron Powder, Purity: 99.99%, Size: 325 mesh, White

Price range: $36.00 through $305.00
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5 grams/24 € 25 grams/37 € 100 grams/65 € 500 grams/135 € 1000 grams/195 €
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Cerium Oxide (CeO2) Micron Powder

Purity: 99.99%, Size: 325 mesh, White

Technical Properties:

PURITY

Min. 99.99 %

COMPOSITION

Ce- 81.4, O- 18.6

PARTICLE SIZE

325 mesh

CAS

1306-38-3

DENSITY

686 g/cm³

BOILING POINT

3468 °C

MELTING POINT

2600 °C

MOHS HARDNESS @ 20ºC

6

COEFF. OF EXPANSION @ 20ºC

8 x 10 ⁸

ELECTRIC RESISTIVITY

0.218 microhm-1

CRYSTAL STRUCTURE

Cubic, Face Centered

FORM  

Powder

APPLICATIONS

Lapping, Polishing

                                   

Cerium Oxide (CeO2) Nanopowder/Nanoparticles, Purity: 99.975%, Size: 8-28 nm

Price range: $59.00 through $384.00
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Applications:

Cerium Oxide nanoparticles are excellent oxidation resistant materials. It is used in oxidation resistant coatings, oxygen sensors, and oxygen pumps. It is good Infrared absorbent. It is used in heat resistant alloy coatings and coatings for infrared filters. Cerium Oxide nanoparticle is used in electronics as buffer layer for superconductors and polishing media for electronic devices. It is also used as electrolytes and electrode materials for solid oxide fuel cells. Cerium Oxide nanoparticles have also applications in the field of catalysis as a catalyst or catalyst support.

Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”

$156.00
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Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Erbium oxide with a chemical formula of Er2Ois an oxide of erbium metal. The applications of erbium oxide are varied due to their electrical, optical and photoluminescence properties. Nanoscale materials doped with Er+3 are of much interest because they have special particle-size-dependent optical and electrical properties. Erbium oxide doped nanoparticle materials can be dispersed in glass or plastic for display purposes, such as display monitors. The spectroscopy of Er+3 electronic transitions in host crystals lattices of nanoparticles combined with ultrasonically formed geometries in aqueous solution of carbon nanotubes is of great interest for synthesis of photoluminescence nanoparticles in ‘green’ chemistry. Erbium oxide is among the most important rare earth metals used in biomedicine. Erbium oxides are also used as gate dielectrics in semiconductor devices since it has a high dielectric constant (10-14) and a large band gap. Erbium is sometimes used as a coloring for glasses and erbium oxide can also be used as a burnable neutron poison for nuclear fuel. Erbium oxide films obtained by sputtering can be used for their photoluminescence effect.