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Indium Zinc Oxide/IZO (InZnO) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness: 0.125''
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Indium Zinc Oxide/IZO (InZnO) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.125”

$411.00
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Product 

 Indium Zinc Oxide/IZO (InZnO) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness: 0.125''

CAS No.
Indium oxide (In₂O₃): 1312-43-2
Zinc oxide (ZnO): 1314-13-2

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 Approx. 260–270 g/mol (depends on ratio)

Melting Point

 Indium oxide: ~1910 °C Zinc oxide: ~1975 °C

Boiling Point

N/A

Density

 ~7.1 g/cm³

Product Codes

NCZ-2199K
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Molybdenum Disilicide (MoSi2) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.125”

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$411.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Tungsten Titanium (TiW) Sputtering Targets, Purity: 99.99%, Size: 4'', Thickness: 0.250''
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Tungsten Titanium (TiW) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.250”

$410.00
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Product 

 Tungsten Titanium (TiW) Sputtering Targets, Purity: 99.99%, Size: 4'', Thickness: 0.250''

CAS No.

58397-70-9

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 ~231.71 g/mol

Melting Point

~2,700–3,200 °C

Boiling Point

~4,500–5,000 °C

Density

 ~14.5–17.0 g/cm³

Product Codes

NCZ-1555K
Aluminum Oxide (Al2O3) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness: 0.125''
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Aluminum Oxide (Al2O3) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.125”

$409.00
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 Aluminum Oxide (Al2O3) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness: 0.125''

CAS No.
 1344-28-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 101.96 g/mol

Melting Point

 ~2,072 °C

Boiling Point

~2,977 °C

Density

 ~3.97–3.98 g/cm³

Product Codes

NCZ-2545K
Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.125''
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Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”

$409.00
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Product 

 Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.125''

CAS No.

 ~68189‑52‑4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

<5 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 ~234–237 g/mol

Melting Point

Decomposes before melting or boiling (≈ >1300 °C)

Boiling Point

N/A

Density

 ~6.3–6.5 g/cm³

Product Codes

NCZ-2109K
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Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.125”

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$409.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

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Tantalum Oxide (Ta2O5) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.250”

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$409.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

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Molybdenum Oxide (MoO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”

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$409.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

Boron Nitride (BN) Sputtering Targets, Purity: 99.5%, Size: 1'', Thickness: 0.250''
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Boron Nitride (BN) Sputtering Targets, Purity: 99.5%, Size: 1”, Thickness: 0.250”

$408.00
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Product 

 Boron Nitride (BN) Sputtering Targets, Purity: 99.5%, Size: 1'', Thickness: 0.250''

CAS No.
 10043-11-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 24.82 g/mol

Melting Point

 ~2973 °C

Boiling Point

N/A

Density

 ~2.1 g/cm³

Product Codes

NCZ-2374K
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Indium Zinc Oxide/IZO (InZnO) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.250”

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$408.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

H-MCM-22(SiO2/Al2O3=26-34) (875940)
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H-MCM-22(SiO2/Al2O3=26-34) (875940)

$407.00
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H-MCM-22(SiO2/Al2O3=26-34) (875940)

SiO2/Al2O3 26-34 Surface area(m2/g) 440 Relative Crystallinity(%) 98 Pore volume(cm3/g) 0.5

Product Codes- NCZ-2719K
Carbon (C) Sputtering Targets, indium, Purity: 99.999%, Size: 2'', Thickness: 0.125''
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Carbon (C) Sputtering Targets, indium, Purity: 99.999%, Size: 2”, Thickness: 0.125”

$407.00
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Product 

 Carbon (C) Sputtering Targets, indium, Purity: 99.999%, Size: 2'', Thickness: 0.125''

CAS No.
 7782‑42‑5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 12.01 g/mol

Melting Point

 Sublimates at ~3,652 °C

Boiling Point

Sublimates at ~4,200 °C

Density

  ~2.25 g/cm³

Product Codes

NCZ-2347K
Multi-walled Carbon Nanotubes, High Purity >95 wt%, 100g
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Multi-walled Carbon Nanotubes, High Purity >95 wt%, 100g

Price range: $374.00 through $407.00
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Product Multi-walled Carbon Nanotubes, High Purity >95 wt%, 100g
CAS No. 308068-56-6
Appearance Black, fluffy
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 10-50um ( (Size Can be customized),  Ask for other available size range.
Ingredient C
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 2.1 g/cm³
Product Codes NCZ-461I
 
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Silver (Ag) Doped Antibacterial Nanopowder/Nanoparticles, Size: 100 nm

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Price range: $26.11 through $406.34
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Silver (Ag) Doped Antibacterial Nanopowder/Nanoparticles Size: 100 nm Technical Properties: Bulk Density (g/cm3) 0,39 Color white pH 5,7 Loss on
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Silicon Carbide (SiC) Sputtering Targets, Purity: 99.5%, Size: 1”, Thickness: 0.125”

, , ,
$406.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Chromium (Cr) Sputtering Target
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Chromium (Cr) Sputtering Target

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Price range: $81.00 through $405.00
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Product 

 Chromium (Cr) Sputtering Target

CAS No.

7440-47-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 51.996 g/mol

Melting Point

1,907 °C

Boiling Point

2,671 °C

Density

 7.19 g/cm³

Product Codes

NCZ-1287K
3N (99.9%) Zinc Oxide (ZnO) Pieces (1-3mm) Evaporation Materials
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3N (99.9%) Zinc Oxide (ZnO) Pieces (1-3mm) Evaporation Materials

Price range: $99.00 through $405.00
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Product 3N (99.9%) Zinc Oxide (ZnO) Pieces (1-3mm) Evaporation Materials
CAS No. 1314-13-2
Appearance White, Crystalline Solid powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1-3mm (Size Can be customized),  Ask for other available size range.
Ingredient ZnO
Molecular Weight 81.38 g/mol
Melting Point 1,975°C
Boiling Point N/A
Density 5.61 g/cm³
Product Codes NCZ-117E
High Purity Zinc Oxide 99.999% 200-800 nm
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High Purity Zinc Oxide 99.999% 200-800 nm

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Price range: $103.00 through $405.00
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$103/25g
$231/100g
$405/500g

Product 

 High Purity Zinc Oxide 99.999% 200-800 nm

CAS No.

1314-13-2

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

200-800 nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 81.38 g/mol

Melting Point

~1,975 °C

Boiling Point

~2,360 °C

Density

 ~5.61 g/cm³

Product Codes

NCZ-1217K
Phosphorus Pentasulfide Powder( P2S5, 99.9%)
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Phosphorus Pentasulfide Powder( P2S5, 99.9%)

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Price range: $185.00 through $405.00
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$185/25g
$405/100g

Product 

 Phosphorus Pentasulfide Powder( P2S5, 99.9%)

CAS No.

1314-80-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

5 – 50 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 222.27 g/mol

Melting Point

 ~288 °C

Boiling Point

Decomposes before boiling (~514 °C in vacuum)

Density

 ~2.09 g/cm³

Product Codes

NCZ-1161K
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Carbon Nanotube (CNT) Nanoribbon Water Dispersion, 0.5 mg/mL

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Price range: $40.00 through $405.00
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Manufacturing Method: Strong oxidizing substances are used in chemical oxidation and longitudinal opening to make ribbon.
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Europium Oxide (Eu2O3) Micron Powder, Purity: 99.99%, Size: 325 mesh

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Price range: $94.00 through $405.00
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Applications:

Europium oxide shows high efficiency as a luminescent material. It is used in flat-panal displays, fluorescent lamps, red powder activation of color TV, and high pressure mercury lump. It is also used as an agent for manufacturing fluorescence glass.
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Potassium titanate whisker(K2Ti6O13, D=0.2~1.5µm, L=10~100µm) (222811)

$404.00
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Potassium titanate whisker(K2Ti6O13, D=0.2~1.5µm, L=10~100µm) (222811)

Chemical formula: K2Ti6O13 Appearance: white powder Particle shape:  needle crystal Whisker diameter: 0.2-1.5µm Whisker length: 10-100µm Mohs hardness: 4 Bulk density: about 0.3g/cm3 Moisture content: <0.5% pH: 7-9 Heat-resistance: 1200°C(in air) Tensile strength: 7000MPa Elastic modulus: 280GPa

Excellent reflection capacity in infrared region Excellent friction properties: 1. Stable Friction coefficient from room to high temperatures to assure smooth braking. 2. Low Wear at high temperatures, no damage to brake disk 3. Almost no friction noise during braking Applications Reinforcing agent for plastic composites Friction control agent As heat-resistant and insulation paint when mixed with silicon resin
Product Codes- NCZ-2749K
Bismuth (Bi) Sputtering Targets, Purity: 99.999%, Size: 4'', Thickness: 0.250''
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Bismuth (Bi) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.250”

$404.00
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Product 

 Bismuth (Bi) Sputtering Targets, Purity: 99.999%, Size: 4'', Thickness: 0.250''

CAS No.
7440‑69‑9

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

1 – 5 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 ~208.98 g/mol

Melting Point

  271.4 °C

Boiling Point

~1560 °C

Density

  ~9.78–9.80 g/cm³

Product Codes

NCZ-2433K
Iron Oxide (Fe3O4) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''
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Iron Oxide (Fe3O4) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”

$404.00
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Product 

 Iron Oxide (Fe3O4) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''

CAS No.

1317‑61‑9

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  231.6 g/mol

Melting Point

~1,597 °C

Boiling Point

 ~2,623 °C (material may decompose before boiling)

Density

  ~5.17 g/cm³ (sintered target)

Product Codes

NCZ-2175K
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Zinc Oxide (ZnO) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.250”

, , ,
$404.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Carbon (C) (Pyrolytic Graphite) Sputtering Targets, Purity: 99.999%, Size: 3'', Thickness: 0.125''
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Carbon (C) (Pyrolytic Graphite) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.125”

$403.00
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Product 

 Carbon (C) (Pyrolytic Graphite) Sputtering Targets, Purity: 99.999%, Size: 3'', Thickness: 0.125''

CAS No.
 7782-42-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  12.01 g/mol

Melting Point

 Sublimes ~3652 °C (no true melting)

Boiling Point

Sublimes directly ~4,200°C

Density

  ~2.2–2.25 g/cm³

Product Codes

NCZ-2340K
High Purity Cerium Oxide (CeO2) Powder 99.999% 5N Trace Metal Basis
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High Purity Cerium Oxide (CeO2) Powder 99.999% 5N Trace Metal Basis

Price range: $143.00 through $403.00
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Product High Purity Cerium Oxide (CeO2) Powder 99.999% 5N Trace Metal Basis
CAS No. 12061-16-4
Appearance Pale pink to lavender
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 40–50nm (Size Can be customized),  Ask for other available size range.
Ingredient CeO2
Molecular Weight 382.52 g/mol
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-409I
Aqueous Dispersion of PEDOT:PSS Conductive Polymer (Clevios P VP AI 4083) for Solar Cell and Electronics, OLED Grade
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Aqueous Dispersion of PEDOT:PSS Conductive Polymer (Clevios P VP AI 4083) for Solar Cell and Electronics, OLED Grade

Price range: $150.00 through $403.00
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Product Aqueous Dispersion of PEDOT:PSS Conductive Polymer (Clevios P VP AI 4083) for Solar Cell and Electronics, OLED Grade
CAS No. 155090-83-8
Appearance Dark blue aqueous liquid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 4–6µm (Size Can be customized),  Ask for other available size range.
Ingredient C₆H₄O₂S
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 1.0–1.1 g/cm³
Product Codes NCZ-290I
3N (99.9%) 300nm Silicon (Si) Nanoparticle Water Dispersion, 5%
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3N (99.9%) 300nm Silicon (Si) Nanoparticle Water Dispersion, 5%

Price range: $216.00 through $403.00
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Product 3N (99.9%) 300nm Silicon (Si) Nanoparticle Water Dispersion, 5%
CAS No. 7440-21-3
Appearance Grayish-white to light brown
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 300nm (Size Can be customized), Ask for other available size range.
Ingredient Si
Molecular Weight 28.0855 g/mol
Melting Point N/A
Boiling Point N/A
Density 2.33 g/cm³
Product Codes NCZ-158I
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Zinc (Zn) Sputtering Targets, indium, Purity: 99.95%, Size: 2”, Thickness: 0.125”

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$403.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

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Fullerene-C60, Purity: 99.5%

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Price range: $88.00 through $403.00
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1 gram/79 € 5 grams/360 €                          
Please contact us for quotes on larger quantities !!!

Fullerene-C60

Purity: 99.5% 

Technical Properties:

Fullerene Compound Formula C60
Fullerene  Molecular Weight 720.64 g/mol
Fullerene  Size Diameter: 0.8 nm, Length: 1.2 nm
Fullerene  Purity 99.5%
Fullerene  Melting Point >280 °C
Fullerene  True Density 1.71 g/cm3
Fullerene  Electrical Resistivity 1034 ohms m-1
Fullerene  Appearance Shinning Black
Fullerene  CAS 99685-96-8 

Applications:

1. Pharmaceutical: Diagnostic reagents, super drugs, cosmetics, nuclear magnetic resonance (NMR) with the developer. DNA affinity 2. Energy: Solar battery, fuel cell, secondary battery. 3. Industry: Wear resistant material, flame retardant materials, lubricants, polymer additives, high-performance membrane, catalyst, artificial diamond, hard alloy, electric viscous fluid, ink filters, high-performance coatings, fire retardant coatings, manufacturing bioactive materials , memory materials, embedded molecular and other characteristics, composite materials etc. 4. Information industry: Semiconductor record medium, magnetic materials, printing ink, toner, ink, paper special purposes. 5. Electronic parts: Superconducting semiconductor, diodes, transistors, inductor.  , 6. Optical materials, electronic camera, fluorescence display tube, nonlinear optical materials. 7. Environment: Gas adsorption, gas storage.
Piroctone olamine(octopirox) (677617)
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Piroctone olamine(octopirox) (677617)

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Piroctone olamine(octopirox) (677617)

CAS No:68890-66-4

Specifications: Appearance                    White or slightly yellow crystalline powder Odor                                Almost odorless Content                           Not less than 98% Melting point                   130-135℃ Loss on drying                 Not more than 0.3% Ash (SO4)                      Not more than 0.2% pH value (1% aq. solu. 20℃)      8.5-10.0 Heavy metals                   Not more than 20ppm Amino Ethanol                 20.1 to 20.9% dried base
Product Codes- NCZ-2711K
Copper (Cu) Sputtering Targets, Purity: 99.99%, Size: 5'', Thickness: 0.250''
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Copper (Cu) Sputtering Targets, Purity: 99.99%, Size: 5”, Thickness: 0.250”

$402.00
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Product 

 Copper (Cu) Sputtering Targets, Purity: 99.99%, Size: 5'', Thickness: 0.250''

CAS No.
7440-50-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 63.55 g/mol

Melting Point

 1,084 °C

Boiling Point

 2,562 °C

Density

 8.96 g/cm³

Product Codes

NCZ-2258K
Titanium Dioxide (TiO2) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125'', Grey to Black
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Titanium Dioxide (TiO2) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”, Grey to Black

$402.00
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Product 

 Titanium Dioxide (TiO2) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125'', Grey to Black

CAS No.

13463‑67‑7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

TiO₂ (black granules) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 79.94 g/mol

Melting Point

~1,843 °C

Boiling Point

~2,972 °C

Density

 ~4.23 g/cm³

Product Codes

NCZ-1441K
Silicon (Si) Sputtering Targets, undoped, Purity: 99.999%, Size: 3'', Thickness: 0.125''
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Silicon (Si) Sputtering Targets, undoped, Purity: 99.999%, Size: 3”, Thickness: 0.125”

$401.00
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Product 

 Silicon (Si) Sputtering Targets, undoped, Purity: 99.999%, Size: 3'', Thickness: 0.125''

CAS No.

7440-21-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 28.0855 g/mol

Melting Point

1,414 °C

Boiling Point

 3,265 °C

Density

  2.33 g/cm³

Product Codes

NCZ-1733K
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Zinc (Zn) Sputtering Targets, indium, Purity: 99.99%, Size: 1'', Thickness: 0.125''
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Zinc (Zn) Sputtering Targets, indium, Purity: 99.99%, Size: 1”, Thickness: 0.125”

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Product 

 Zinc (Zn) Sputtering Targets, indium, Purity: 99.99%, Size: 1'', Thickness: 0.125''

CAS No.

7440‑66‑6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

Zn (black granules) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 65.38 g/mol

Melting Point

419.5 °C

Boiling Point

 907 °C

Density

 7.14 g/cm³

Product Codes

NCZ-1462K
MWNTs -COOH Functionalized 95% 10-20 nm
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MWNTs -COOH Functionalized 95% 10-20 nm

Price range: $94.00 through $401.00
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$94/5g
$268/25g
$401/100g

Product 

 MWNTs -COOH Functionalized 95% 10-20 nm

CAS No.

 7727-54-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

10-20 nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 228.20 g/mol

Melting Point

~120 °C

Boiling Point

NA

Density

  1.98 g/cm³

Product Codes

NCZ-1271K
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Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”

, , ,
$401.00
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Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.
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Chromium Carbide (Cr3C2) Nanopowder/Nanoparticles, Purity: 99.75+%, Size: 25-125 nm

Price range: $49.00 through $401.00
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5 grams/44 € 25 grams/156 € 100 grams/354 €
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Chromium Carbide (Cr3C2) Nanopowder/Nanoparticles

Purity: 99.75+%, Size: 25-125 nm

Applications:

Chromium carbide nanoparticles is used as a thermal spray material for protection of the metal surface beneath and as a coating for seals, bearings, and valve seals. It also used as additive to corrosion resistant and wear resistant materials. It is also used as fine crystal phase in sintered carbides.  
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(-OH) Functionalized Industrial Multi Walled Carbon Nanotubes, Purity: > 92%, Outside Diameter: 18-38 nm

Price range: $66.00 through $401.00
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Applications:

Multi Walled Carbon Nanotubes have a variety of potential applications in different fields. These applications include medicine, mechanics, electric-electronics, chemicals, energy and others. It can be applied in, 1-drug delivery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium batteries, 8-gas-discharge tubes, 9-flat panel displays, 10-supercapacitors, 11-transistors, 12-solar cells, 13-photoluminescence, 14-templates  
Niobium Oxide (Nb2O5) Sputtering Targets, Purity: 99.5%, Size: 3'', Thickness: 0.125''
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Niobium Oxide (Nb2O5) Sputtering Targets, Purity: 99.5%, Size: 3”, Thickness: 0.125”

$400.00
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Product 

 Niobium Oxide (Nb2O5) Sputtering Targets, Purity: 99.5%, Size: 3'', Thickness: 0.125''

CAS No.

1313-96-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  265.81 g/mol

Melting Point

~1512 °C

Boiling Point

N/A

Density

  4.6 – 4.9 g/cm³

Product Codes

NCZ-1808K
4N (99.99%) Strontium Fluoride (SrF2) Pieces (1-10mm) Evaporation Materials, 100g
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4N (99.99%) Strontium Fluoride (SrF2) Pieces (1-10mm) Evaporation Materials, 100g

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Product 4N (99.99%) Strontium Fluoride (SrF2) Pieces (1-10mm) Evaporation Materials, 100g
CAS No. 7783-48-4
Appearance Light Yellow Crystal Granule
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1-10mm (Size Can be customized),  Ask for other available size range.
Ingredient SrF2
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 4.269 g/cm³
Product Codes NCZ-173I
4N (99.99%) Strontium Fluoride (SrF2) Pieces
4N (99.99%) Strontium Fluoride (SrF2) Pieces
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4N (99.99%) Strontium Fluoride (SrF2) Pieces (1-10mm) Evaporation Materials, 100g

$400.00
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Product 4N (99.99%) Strontium Fluoride (SrF2) Pieces (1-10mm) Evaporation Materials, 100g
CAS No. 7783-48-4
Appearance Light Yellow Crystal Granule 
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1-10mm (Size Can be customized),  Ask for other available size range.
Ingredient SrF2
Molecular Weight 125.62 g/mol
Melting Point 1,450°C
Boiling Point 2,460°C
Density 4.26 g/cm³
Product Codes NCZ-116E
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(-COOH) Functionalized Industrial Multi Walled Carbon Nanotubes, Purity: > 90%, Outside Diameter: 50-80 nm

, ,
Price range: $65.00 through $400.00
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Applications:

Multi Walled Carbon Nanotubes have a wide range of possible uses in several industries. These applications span a variety of fields, including energy, chemistry, mechanics, and electric-electronics. It can be used for a number of things, including medication administration, biosensors, CNT composites, catalysis, nanoprobes, and hydrogen storage. 7, lithium-ion batteries, eight gas discharge tubes nine flat-panel screens, ten supercapacitors, and eleven transistors a dozen solar cells, 14 templates, 13 photoluminescence
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Industrial Grade Multi Walled Carbon Nanotubes, Purity: > 92%, Outside Diameter: 8-28 nm

, ,
Price range: $40.00 through $400.00
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Applications:

Several Walled Carbon There are numerous possible uses for nanotubes in various industries. Medicine, mechanics, electric-electronics, chemistry, energy, and other fields are among these uses. It can be used in a variety of applications, including medication delivery, biosensors, CNT composites, catalysis, nanoprobes, and hydrogen storage. seven lithium batteries, tubes for 8 gas discharges, 11 transistors, 10 supercapacitors, and 9 flat-panel screens twelve solar cells templates, 13-photoluminescence, and 14
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(-COOH) Functionalized Industrial Multi Walled Carbon Nanotubes, Purity: > 92%, Outside Diameter: 10-30 nm

Price range: $66.00 through $400.00
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Applications:

Multi Walled Carbon Nanotubes have a variety of potential applications in different fields. These applications include medicine, mechanics, electric-electronics, chemicals, energy and others. It can be applied in, 1-drug delivery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium batteries, 8-gas-discharge tubes, 9-flat panel displays, 10-supercapacitors, 11-transistors, 12-solar cells, 13-photoluminescence, 14-templates  
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(-OH) Functionalized Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: 48-78 nm

Price range: $66.00 through $399.00
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Applications:

Multi Walled Carbon Nanotubes have a variety of potential applications in different fields. These applications include medicine, mechanics, electric-electronics, chemicals, energy and others. It can be applied in, 1-drug delivery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium batteries, 8-gas-discharge tubes, 9-flat panel displays, 10-supercapacitors, 11-transistors, 12-solar cells, 13-photoluminescence, 14-templates
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(-OH) Functionalized Industrial Multi Walled Carbon Nanotubes, Purity: > 92%, Outside Diameter: 18-38 nm

Price range: $65.00 through $398.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Multi Walled Carbon Nanotubes have a variety of potential applications in different fields. These applications include medicine, mechanics, electric-electronics, chemicals, energy and others. It can be applied in, 1-drug delivery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium batteries, 8-gas-discharge tubes, 9-flat panel displays, 10-supercapacitors, 11-transistors, 12-solar cells, 13-photoluminescence, 14-templates  
Permalloy (Ni-Fe-Mo) Sputtering Targets, Size: 3'', Thickness: 0.125''
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Permalloy (Ni-Fe-Mo) Sputtering Targets, Size: 3”, Thickness: 0.125”

$397.00
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 Permalloy (Ni-Fe-Mo) Sputtering Targets, Size: 3'', Thickness: 0.125''

CAS No.

 Nickel: 7440-02-0 Iron: 7439-89-6 Molybdenum: 7439-98-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  Not defined (alloy), but elemental weights: Ni: 58.69 g/mol Fe: 55.85 g/mol Mo: 95.95 g/mol

Melting Point

 ~1450 °C

Boiling Point

 ~2730–3000 °C

Density

 ~8.7 g/cm³

Product Codes

NCZ-1799K
Aluminum Silicon (Al/Si) Sputtering Target
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Aluminum Silicon (Al/Si) Sputtering Target

,
Price range: $92.00 through $397.00
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Product 

 Aluminum Silicon (Al/Si) Sputtering Target

CAS No.

12004-15-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 ~65–70 g/mol

Melting Point

~548 °C

Boiling Point

~2,400–2,550 °C

Density

 ~2.78 g/cm³

Product Codes

NCZ-1313K
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Zinc Oxide (ZnO) with Alumina Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”

, , ,
$397.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

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Zinc Oxide (ZnO) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”

, , ,
$397.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

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Silicon Nitride (Si3N4) Sputtering Targets, Purity: 99.5%, Size: 2”, Thickness: 0.125”, Dark Gray to Black

, , ,
$397.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

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Silicon Nitride (Si3N4) Sputtering Targets, Purity: 99.5%, Size: 2”, Thickness: 0.125”, Dark Gray to Black

, , ,
$397.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

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Molybdenum Oxide (MoO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”

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$397.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

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Zirconium Carbide (ZrC) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 400-1100 nm, Cubic

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Price range: $41.00 through $397.00
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25 grams/37 € 100 grams/107 € 500 grams/271 € 1000 grams/350 €
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Zirconium Carbide (ZrC) Nanopowder/Nanoparticles

Purity: 99.95%, Size: 400-1100 nm, Cubic

Applications:

Zirconium carbide powder has high hardness, high thermal conductivity, good oxidation resistance, and toughness. It is used in textile industry in making thermostat textiles in nylon, fiber and hard alloy. It is also used in composite materials such as polymer nanocomposites, ceramic and metal matrix. Zirconium carbide powder is also used in nano-structured parts in metallurgical, chemical and aviation industry. It has application in drills and other tools that need to be abrasion resistant.
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Silver (Ag) Nanopowder/Nanoparticles, Purity: > 99.995%, Size: 28-n48 m, w/~0.25% PVP

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Price range: $22.70 through $396.13
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Silver (Ag) Nanopowder/Nanoparticles Purity: > 99.995%, Size: 28-48 nm, w/~0.25% PVP Technical Properties: Bulk Density (g/cm3) 1,24 True Density (g/cm3)
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Silver (Ag) Nanopowder/Nanoparticles, Purity: > 99.995%, Size: 28-48 nm, Metal Basis

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Price range: $22.70 through $396.13
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Silver (Ag) Nanopowder/Nanoparticles Purity: > 99.995%, Size: 28-48 nm, Metal Basis Technical Properties: True Density (g/cm3) 10,6 Color black Shape
Single Layer Graphene Powder (Chemical Method)
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Single Layer Graphene Powder (Chemical Method)

Price range: $198.00 through $396.00
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Product Single Layer Graphene Powder (Chemical Method)
CAS No. 7440-44-0
Appearance Black, fine to flaky
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 0.5–10µm (Size Can be customized),  Ask for other available size range.
Ingredient C
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 2.2 g/cm³
Product Codes NCZ-524I
 
99.9wt% Aminated Hollow Mesoporous Silica Powder (Spherical)
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99.9wt% Aminated Hollow Mesoporous Silica Powder (Spherical)

Price range: $209.00 through $396.00
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Product 99.9wt% Aminated Hollow Mesoporous Silica Powder (Spherical)
CAS No. 7631-86-9
Appearance White to off-white fine
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 100–500nm (Size Can be customized),  Ask for other available size range.
Ingredient SiO₂
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 2.0–2.2 g/cm³
Product Codes NCZ-267I