Silver (Ag) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”

$378.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Silver (Ag) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.250”

$378.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Silicon (Si) Sputtering Targets, N-type, Purity: 99.999%, Size: 3”, Thickness: 0.125”

$378.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Niobium Oxide (Nb2O5) Sputtering Targets, Purity: 99.5%, Size: 3”, Thickness: 0.250”

$378.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Nickel Vanadium (NiV) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.250”

$378.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Molybdenum Oxide (MoO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”

$378.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Vanadium Oxide (V2O5) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”

$377.00

Product 

Vanadium Oxide (V2O5) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''

CAS No.

1314‑62‑1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

V₂O₅ (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

181.88 g/mol

Melting Point

690 °C

Boiling Point

 ~1750 °C

Density

 ~3.35 g/cm³

Product Codes

NCZ-1395K

Silver Nanoparticles/Nanopowder Oleic Acid Coated (Ag, 30~50nm)

Price range: $75.00 through $377.00
Select options This product has multiple variants. The options may be chosen on the product page
$75/5g $170/25g
$380/100g
 

Product 

Silver Nanoparticles/Nanopowder Oleic Acid Coated (Ag, 30~50nm)

CAS No.

24304-00-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

30-50 nm (Size Can be customized), Ask for other available size ranges.

Ingredient

AlN

Molecular Weight

40.982 g/mol

Melting Point

2200 °C

Boiling Point

2517 °C

Density

3.3 g/cm³

Product Codes

NCZ-1005K

Manganese (Mn) Micron Powder, Purity: 99.95%, Size: 35 µm, Metal Basis

Price range: $12.00 through $377.00
Select options This product has multiple variants. The options may be chosen on the product page
1 gram/11 € 5 grams/31 € 25 grams/47 € 100 grams/85 € 500 grams/199 € 1000 grams/335 €    
Please contact us for quotes on larger quantities !!!

Manganese (Mn) Micron Powder

Purity: 99.95%, Size: 35 µm, Metal Basis

Technical Properties:

True Density (g/cm3) 7,2
Crystal Structure cubic
Tmelting (oC) 1246
Tboiling (oC) 2061
Average Particle Size (µm) 35

Applications:

Manganese is well known with the sulfur-fixing properties in steel production. It is mainly used in stainless steels and aluminum alloys for its corrosion resistance properties.  

(-OH) Functionalized Industrial Multi Walled Carbon Nanotubes, Purity: > 92%, Outside Diameter: 7-16 nm

Price range: $94.00 through $377.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Multi Walled Carbon Nanotubes have a variety of potential applications in different fields. These applications include medicine, mechanics, electric-electronics, chemicals, energy and others. It can be applied in, 1-drug delivery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium batteries, 8-gas-discharge tubes, 9-flat panel displays, 10-supercapacitors, 11-transistors, 12-solar cells, 13-photoluminescence, 14-templates

Industrial Grade Multi Walled Carbon Nanotubes, Purity: > 92%, Outside Diameter: 48-78 nm

Price range: $60.00 through $377.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Multi Walled Carbon Nanotubes have a variety of potential applications in different fields. These applications include medicine, mechanics, electric-electronics, chemicals, energy and others. It can be applied in, 1-drug delivery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium batteries, 8-gas-discharge tubes, 9-flat panel displays, 10-supercapacitors, 11-transistors, 12-solar cells, 13-photoluminescence, 14-templates

Zinc Oxide (ZnO) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”

$376.00

Product 

Zinc Oxide (ZnO) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.125''

CAS No.

1314‑13‑2

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

ZnO (black granules) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

81.38 g/mol

Melting Point

~1975 °C

Boiling Point

~2360 °C

Density

 ~5.61 g/cm³

Product Codes

NCZ-1457K

Industrial Grade Multi Walled Carbon Nanotubes, Purity: > 92%, Outside Diameter: 48-78 nm

Price range: $59.00 through $376.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Multi Walled Carbon Nanotubes have a variety of potential applications in different fields. These applications include medicine, mechanics, electric-electronics, chemicals, energy and others. It can be applied in, 1-drug delivery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium batteries, 8-gas-discharge tubes, 9-flat panel displays, 10-supercapacitors, 11-transistors, 12-solar cells, 13-photoluminescence, 14-templates

Molybdenum disulfide(MoS2, 98.00%) (223629)

$375.00
Molybdenum disulfide(MoS2, 98.00%) (223629)

Molybdenum disulfide(MoS2) is a black powder that may be used as a solid lubricant.

Grades Large Particle Technical Grade Technical Fine Super Fine
MoS2 % (min) 98.00
Acid Insoluble% (max) 0.50 0.50 0.50 0.50
MoO3% (max) 0.05 0.05 0.10 0.15
SiO2 % (max) 0.10 0.10 0.10 0.10
Iron% (max) 0.25 0.25 0.25 0.25
Water% (max) 0.10 0.10 0.10 0.15
Oil% (max) 0.40 0.40 0.40 0.40
Carbon% (max) 0.50 0.50 0.50 0.50
Acid Number* mg KOH/g 0.5 0.50 0.50 2.0
D50 16-30 μm 12-16 μm 3-6 μm 1-1.5 μm
D99 190 μm 100 μm 36 μm 6 μm

.

* Acid number is determined at the end of production. Prolonged storage will result in an increase in

slight oxidation, which will result in an increase in acid number. The smaller particle size is more

susceptible to surface oxidation.

 
Product Codes- NCZ-2795K

Silicon Oxide Nanoparticles / Nanopowder modified with epoxy group

Price range: $70.00 through $375.00
Select options This product has multiple variants. The options may be chosen on the product page
$70/25g
$133/100g
$333/500g
$575/kg

Product 

Silicon Oxide Nanoparticles / Nanopowder modified with epoxy group

CAS No.

7631-86-9

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 10-20nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

60.08 g/mol

Melting Point

~1,710 °C (core SiO₂)

Boiling Point

~2,230 °C

Density

~2.1 – 2.2 g/cm³

Product Codes

NCZ-1168K

Iron Oxide Nanopowder / Nanoparticles (Fe2O3 gamma Fe2O3, 20~40nm)

Price range: $93.00 through $375.00
Select options This product has multiple variants. The options may be chosen on the product page
$93/100g
$257/500g
$375/Kg

Product 

Iron Oxide Nanopowder / Nanoparticles (Fe2O3 gamma Fe2O3, 20~40nm)

CAS No.

1309-37-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

20~40nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

159.69 g/mol

Melting Point

~1,565 °C

Boiling Point

Decomposes

Density

 ~5.24 g/cm³

Product Codes

NCZ-1135K

Yttrium Oxide (Y2O3) Nanopowder/Nanoparticles, Purity: 99.999%, Size: 25-50 nm

Price range: $29.00 through $375.00
Select options This product has multiple variants. The options may be chosen on the product page
5 grams/26 € 25 grams/54 € 100 grams/101 € 500 grams/175 € 1000 grams/331 €
Please contact us for quotes on larger quantities !!!

Yttrium Oxide (Y2O3) Nanopowder/Nanoparticles

Purity: 99.999%, Size: 25-50 nm

Technical Properties:

Purity (%) 99.999
Morphology spherical
Average Particle Size (nm) 25.0-50.0
Color white
Specific Surface Area (m2/g) 25.0-45.0
Bulk Density (g/cm3) 0,3
True Density (g/cm3) 5,1
Elemental Analysis (%) SiO2 Fe2O3 CaO
0.008 0.0032 0.006

Applications:

Yttrium oxide nanoparticles have applications in inorganic synthesis, material science, and in different electronic devices. In inorganic synthesis yttrium oxide is an important starting point for inorganic compound. It is used in making plasma and flat panel displays. It is also used in making fluorescent lamps, ultra-fast sensors, and photoelectric sensors. Yttrium oxide nanoparticle is used as additive in steel , iron, and non-ferrous alloys. It is also used as additive in coatings for high temperature applications.

Zinc Cobalt Iron Oxide (Zn0.5Co0.5Fe2O4) Nanopowder/Nanoparticles, Purity: 99.995%, Size: 38 nm

Price range: $49.00 through $375.00
Select options This product has multiple variants. The options may be chosen on the product page
1 gram/44 €
5 grams/94 € 25 grams/332 €                       
Please contact us for quotes on larger quantities !!!

Zinc Cobalt Iron Oxide (Zn0.5Co0.5Fe2O4) Nanopowder/Nanoparticles

Purity: 99.995%, Size: 38 nm

Two-dimensional NiFe Layered Double Hydroxide (NiFe-LDH) Powder, 500 mg/bottle

$374.00
Product Two-dimensional NiFe Layered Double Hydroxide (NiFe-LDH) Powder, 500 mg/bottle
CAS No. N/A
Appearance Pale green, layered platele
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 15–20nm (Size Can be customized),  Ask for other available size range.
Ingredient Ni₆Al₂(OH)₁₆CO₃·4H₂O
Molecular Weight 603–610 g/mol
Melting Point N/A
Boiling Point N/A
Density 2.3 – 2.4 g/cm³
Product Codes NCZ-586I
 

Silicon Carbide (SiC) Fibers Powder, 10g/bottle

$374.00
Product Silicon Carbide (SiC) Fibers Powder, 10g/bottle
CAS No. 60853-76-1
Appearance Gray to black fibrous
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 100µm (Size Can be customized),  Ask for other available size range.
Ingredient SiC
Molecular Weight 40.10 g/mol
Melting Point N/A
Boiling Point N/A
Density 3.21 g/cm³
Product Codes NCZ-514I
 

Graphene Quantum Dots Solution (Green Fluorescence), 1mg/mL

Price range: $209.00 through $374.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Graphene Quantum Dots Solution (Green Fluorescence), 1mg/mL
CAS No. 1034343-98-0
Appearance Pale yellow or light green
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 5nm  (Size Can be customized),  Ask for other available size range.
Ingredient CₓOᵧH_z
Molecular Weight 2000 g/mol
Melting Point N/A
Boiling Point N/A
Density 2.0–2.3 g/cm³
Product Codes NCZ-367I

Graphene Oxide Sheet with Large Diameter

Price range: $209.00 through $374.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Graphene Oxide Sheet with Large Diameter
CAS No. 7782-42-5
Appearance Brownish to yellowish
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 5–50µm (Size Can be customized),  Ask for other available size range.
Ingredient CₓOᵧH_z
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 1.8–2.2 g/cm³
Product Codes NCZ-364I
 

Zinc (Zn) Sputtering Targets, indium, Purity: 99.95%, Size: 1”, Thickness: 0.125”

$374.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Nickel Oxide (NiO) Nanopowder/Nanoparticles, Purity: 99.5%, Size: 8-18 nm

Price range: $29.00 through $374.00
Select options This product has multiple variants. The options may be chosen on the product page
5 grams/26 € 25 grams/42 € 100 grams/73 € 500 grams/170 € 1000 grams/332 €
Please contact us for quotes on larger quantities !!!

Nickel Oxide (NiO) Nanopowder/Nanoparticles

Purity: 99.5%, Size: 8-18 nm

Technical Properties:

Purity (%) 99.5
Color gray-black
Morphology nearly spherical
Average Particle Size (nm) 8.0-18.0
Specific Surface Area (m2/g)    >95
Bulk Density (g/cm3) 0,8
True Density (g/cm3) 6,8
Elemental Analysis (%) Al Ba Ca Mg Fe Zn
0.002 0.0025 0.0092 0.01 0.002 0.006

Applications:

Nickel oxide nanoparticle is widely used in different materials. It is used in preparation of nickel cermet for the anode layer of solid oxide fuel cells. It is used in nanowires, nanofibers, and specific alloys. It is used in ceramic structures, electrochromic coatings, plastics, and textiles. Nickel oxide nanoparticle is used in active optical filters, and automotive rear view mirrors with adjustable reflectance. It is also used to make energy efficient smart windows with adjustable absorption and reflectance.

Praseodymium (Pr) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”

$373.00

Product 

Praseodymium (Pr) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.250''

CAS No.

7440-10-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 140.91 g/mol

Melting Point

931 °C

Boiling Point

 3520 °C

Density

 6.77 g/cm³

Product Codes

NCZ-1788K

Vanadium (V) Sputtering Targets, Purity: 99.5%, Size: 3”, Thickness: 0.250”

$373.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Silicon Dioxide (SiO2) Sputtering Targets, Fused Quartz, indium, Purity: 99.995%, Size: 2”, Thickness: 0.125”

$373.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Platinum (Pt) Nanopowder, 20-30nm, ≥99.99% (4N) Purity, 1g

$372.00
Product Platinum (Pt) Nanopowder, 20-30nm, ≥99.99% (4N) Purity, 1g
CAS No. 7440-06-4
Appearance Dark gray to black fine
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 20-30nm (Size Can be customized),  Ask for other available size range.
Ingredient Pt
Molecular Weight 195.08 g/mol
Melting Point N/A
Boiling Point N/A
Density 21.45 g/cm³
Product Codes NCZ-493I

Permalloy (Ni-Fe-Mo) Sputtering Targets, Size: 4”, Thickness: 0.125”

$372.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Nickel (Ni) Sputtering Targets, Purity: 99.95%, Size: 6”, Thickness: 0.250”

$372.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Aluminum Nitride (AlN) Sputtering Targets, Purity: 99.8%, Size: 1”, Thickness: 0.125”

$372.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered. With the sputtering target's assistance, the

Using mass spectrometry, the identification and concentration of spewed atoms are determined. The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

The chemical compound aluminum nitride has the formula AlN.The exceptional combination of mechanical, chemical, and physical properties of aluminum nitride

Aluminum Nitride (AlN) Sputtering Targets, Purity: 99.8%, Size: 1”, Thickness: 0.125”

$372.00

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Aluminum nitride is a chemical compound with the formula of AlN.Aluminum nitride has excellent combination of physical, chemical, and mechanical properties. High-quality films of aluminum nitride have been used in various devices and sensors including the optical and optoelectronic devices. As far as the optical and optoelectronic applications are concerned, wide band gap (~6.2 eV) along with high-refractive index (~2.0) and low-absorption coefficient (<10−3) makes AlN a very attractive material for these applications. In addition to this, thermal and chemical stability of AlN films make it suitable for applications in difficult environment. Today, AlN films/coatings have been grown by several methods which include pulsed laser deposition, reactive molecular beam epitaxy, vacuum arc/cathodic arc deposition, DC/RF reactive sputtering, ion beam sputtering, metal-organic chemical vapor deposition (MOCVD), and miscellaneous other techniques. Due to simplicity, reproducibility, ease of scaling up, and lower cost, magnetron sputtering is one of the common methods for growing AlN films for various applications. Properties of AlN films depend upon the crystal structure, crystal orientation, microstructure, and chemical composition, which in turn depend upon the deposition conditions such as sputtering power, pulse frequency, duty cycle, growth temperature, nitrogen/argon flow ratio, and sputtering gas pressure. AlN sputtering targets give good result with the method of reactive DC magnetron sputtering system.

Molybdenum (Mo) Micron Powder, Purity: 99.95 %, Size: 20 µm

Price range: $31.00 through $372.00
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Please contact us for quotes on larger quantities !!! 

Molybdenum (Mo) Micron Powder

Purity: 99.95 %, Size: 20 µm

Technical Properties:

PURITY

99.95 %

PARTICLE SIZE

20 µm

CAS

7439-98-7

MELTING POINT

2610 °C

BOILING POINT

5560 °C

CRYSTAL STRUCTURE

Cubic, Body Centered

DENSITY 8.2 g/cm³
COEFF. OF EXPANSION @ 20ºC

    5.1 x 10⁻⁶

ELECTRIC RESISTIVITY

5.17 microhm-cm

FORM  

Powder

APPLICATIONS

Aerospace Alloys Electronics Metal Injection Molding

                                                             

Titanium Boride (TiB2) Sputtering Targets, Purity: 99.5%, Size: 1”, Thickness: 0.250”

$371.00

Product 

Titanium Boride (TiB2) Sputtering Targets, Purity: 99.5%, Size: 1'', Thickness: 0.250''

CAS No.

 12045-63-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

69.49 g/mol

Melting Point

 ~3225 °C

Boiling Point

N/A

Density

 4.52 g/cm³

Product Codes

NCZ-1621K

Titanium Aluminum Nitride (Ti2AlN) MAX Phase Micron-Powder, 10g

$370.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Titanium Aluminum Nitride (Ti2AlN) MAX Phase Micron-Powder, 10g
CAS No. 12537-79-2
Appearance Gray to dark gray
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1-40µm (Size Can be customized),  Ask for other available size range.
Ingredient Ti2AlN
Molecular Weight 160.69 g/mol
Melting Point N/A
Boiling Point N/A
Density 4.28 g/cm³
Product Codes NCZ-573I

Piezoelectric PMN-PT (65:35), 325 Mesh Ceramic Powder, 100g

$370.00
Product Piezoelectric PMN-PT (65:35), 325 Mesh Ceramic Powder, 100g
CAS No. 12060-00-3
Appearance Fine white to off-white
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 44µm (Size Can be customized),  Ask for other available size range.
Ingredient PbTiO₃
Molecular Weight 460 g/mol
Melting Point N/A
Boiling Point N/A
Density 8.0 g/cm³
Product Codes NCZ-491I
 

Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”

$370.00

Product 

Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.250''

CAS No.

7783-40-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 62.30 g/mol

Melting Point

~1263 °C

Boiling Point

~2260 °C

Density

 3.18 g/cm³

Product Codes

NCZ-1981K

Lithium Nickel Manganese Oxide (LMNO) for Li-Ion Cathode Material, LiNi0.5Mn1.5O4

Price range: $73.00 through $370.00
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Lithium Nickel Manganese Oxide (LMNO) for Li-Ion Cathode Material, LiNi0.5Mn1.5O4 25 grams/73 € 100 grams/120 € 500 grams/230 € 1000

Lithium Nickel Manganese Oxide (LMNO) for Li-Ion Cathode Material, LiNi0.5Mn1.5O4

Price range: $73.00 through $370.00
Select options This product has multiple variants. The options may be chosen on the product page
Lithium Nickel Manganese Oxide (LMNO) for Li-Ion Cathode Material, LiNi0.5Mn1.5O4 25 grams/73 € 100 grams/120 € 500 grams/230 € 1000

Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles, Gamma, Purity: 99.995%, Size: 4 nm, Hydrophilic

Price range: $29.00 through $370.00
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5 grams/26 € 25 grams/47 € 100 grams/101 € 500 grams/190 € 1000 grams/326 € Please contact us for quotes on larger quantities !!!

Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles

Gamma, Purity: 99.995%, Size: 4 nm, Hydrophilic

Applications:

Aluminum oxide nanoparticles show high hardness and high dimensional stability. It is used to improve toughness, wear resistance, thermal fatigue resistance, and ceramic density for rubber, plastics, and ceramics. It is used in high strength aluminum oxide ceramic, high purity crucibles, furnace tubes, and cutting tools. It is added to metal products, semiconductors, tapes, polishing materials, and glass products. Aluminum oxide nanoparticles have excellent properties for far infrared emission. It is used in fiber fabric products and high pressure sodium lamp as far-infrared emission and thermal insulation materials. In addition it is used in the field of catalysis as catalyst or catalyst carrier.

Iron (Fe) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”

$369.00

Product 

 Iron (Fe) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”

CAS No.

 7439-89-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 55.85 g/mol

Melting Point

 1538 °C

Boiling Point

 2862 °C

Density

 7.87 g/cm³

Product Codes

NCZ-2192K

Zinc Nanoparticles/ Nanopowder ( Zn, 99.9% 80-100nm)

Price range: $119.00 through $369.00
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$119/25g
$369/100g

Product 

Zinc Nanoparticles/ Nanopowder ( Zn, 99.9% 80-100nm)

CAS No.

7440-66-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

80-100nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

65.38 g/mol

Melting Point

419.5 °C

Boiling Point

907 °C

Density

7.14 g/cm³

Product Codes

NCZ-1084K

Zinc (Zn) Sputtering Targets, indium, Purity: 99.99%, Size: 2”, Thickness: 0.125”

$369.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered. The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target. There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Copper Foam for Battery and Supercapacitor Research, Purity: 99.9+%, Size : 100 mm x100 mm x 1mm

Price range: $93.00 through $369.00
Select options This product has multiple variants. The options may be chosen on the product page
1 piece: 93€ 5 pieces: 369€ Product Information Product Name Copper Foam for Battery and Supercapacitor Research Product No NG10BEW0949

Polymer Dispersant for Dispersion of Carbon Nanotubes (CNTs) in Ester Solvents

Price range: $42.00 through $369.00
Select options This product has multiple variants. The options may be chosen on the product page
Polymer Dispersant for Dispersion of Carbon Nanotubes (CNTs) in Ester Solvents Technical Properties: The dispersant material is a polymer in

Polymer Dispersant for Dispersion of Carbon Nanotubes (CNTs) in Ester Solvents

Price range: $42.00 through $369.00
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Technical Properties: The dispersant material is a polymer in a solvent mixture. It is suitable for the dispersion of carbon

(-OH) Functionalized Industrial Multi Walled Carbon Nanotubes, Purity: > 92%, Outside Diameter: 18-38 nm

Price range: $60.00 through $369.00
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Applications:

Multi Walled Carbon Nanotubes have a wide range of possible uses in several industries. These applications span a variety of fields, including energy, chemistry, mechanics, and electric-electronics. Drug delivery, biosensors, CNT composites, catalysis, nanoprobes, and hydrogen storage are just a few applications for it. 7, lithium-ion batteries, eight gas discharge tubes nine flat-panel screens, ten supercapacitors, and eleven transistors a dozen solar cells, 14 templates, 13 photoluminescence

Mesocarbon Microbeads (MCMB) Graphite Micron Powder for Lithium Ion Battery

Price range: $210.00 through $369.00
Select options This product has multiple variants. The options may be chosen on the product page
500 grams/210 € 1000 grams/369 € Please contact us for quotes on larger quantities !!! Mesocarbon Microbeads (MCMB) Graphite Micron Powder for Lithium

Mesocarbon Microbeads (MCMB) Graphite Micron Powder for Lithium Ion Battery

Price range: $210.00 through $369.00
Select options This product has multiple variants. The options may be chosen on the product page
500 grams/210 € 1000 grams/369 € Please contact us for quotes on larger quantities !!! Mesocarbon Microbeads (MCMB) Graphite Micron Powder for Lithium

Polymer Dispersant for Dispersion of Carbon Nanotubes (CNTs) in Ester Solvents

Price range: $41.00 through $369.00
Select options This product has multiple variants. The options may be chosen on the product page
5 grams/38 € 25 grams/89 € 100 grams/335 €                     
Please contact us for quotes on larger quantities !!!

Polymer Dispersant for Dispersion of Carbon Nanotubes (CNTs) in Ester Solvents

Technical Properties:

The dispersant material is a polymer in a solvent mixture. It is suitable for the dispersion of carbon nanotubes in solvents such as ethhyl acetate, butyl acetate, epoxy resin (in liquid form) etc. Dispersion volume and concentration should be considered for an ideal dispersion and amount of dispersant that will be used.
 

Fullerene-C60, Purity: 98%

Price range: $81.00 through $369.00
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1 gram/73 € 5 grams/330 €                          
Please contact us for quotes on larger quantities !!!

Fullerene-C60

Purity: 98% 

Technical Properties:

Fullerene Compound Formula C60
Fullerene  Molecular Weight 720.64
Fullerene  Size Diameter: 0.8 nm, Length: 1.2 nm
Fullerene  Purity 98%
Fullerene  Melting Point >280 °C
Fullerene  True Density 1.71 g/cm3
Fullerene  Electrical Resistivity 1034 ohms m-1
Fullerene  Appearance Shinning Black
Fullerene  CAS 99685-96-8 

Applications:

1. Pharmaceutical: Diagnostic reagents, super drugs, cosmetics, nuclear magnetic resonance (NMR) with the developer. DNA affinity 2. Energy: Solar battery, fuel cell, secondary battery. 3. Industry: Wear resistant material, flame retardant materials, lubricants, polymer additives, high-performance membrane, catalyst, artificial diamond, hard alloy, electric viscous fluid, ink filters, high-performance coatings, fire retardant coatings, manufacturing bioactive materials , memory materials, embedded molecular and other characteristics, composite materials etc. 4. Information industry: Semiconductor record medium, magnetic materials, printing ink, toner, ink, paper special purposes. 5. Electronic parts: Superconducting semiconductor, diodes, transistors, inductor.  , 6. Optical materials, electronic camera, fluorescence display tube, nonlinear optical materials. 7. Environment: Gas adsorption, gas storage.

L-Ascorbic acid 2-glucoside (439641)

$368.00
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L-Ascorbic acid 2-glucoside (439641)

Molecular formula   C12H18O11 Purity   > 98% CAS#   129499-78-1 Appearance   White crystalline powder, odourless
Product Codes- NCZ-2709K

Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”

$368.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.125”

$368.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. W

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Silvery, shiny, hard, and brittle, chromium is a metal that resists corrosion and has a high mirror polish. The automotive industry finds extensive use for chromium sputtering targets. Chromium sputtering targets work well as a shiny coating for bumpers and wheels. Chromium sputtering targets can be employed in a variety of vacuum applications, such as automotive glass coatings.

hen selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

Vulcan XC72 Conductive Carbon Black

Price range: $28.00 through $368.00
Select options This product has multiple variants. The options may be chosen on the product page
APPLICATION AREAs
• Energy Storage, including Batteries and Fuel Cells • Conductive Paper • Conductive Liquid Dispersion • As a Catalyst Support • Antistatic and conductive applications

Iron Chromium Cobalt (Fe-Cr-Co) Alloy Nanopowder/Nanoparticles, Size: 35-95 nm, Fe:Cr:Co/64:25:11

$368.00
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5 grams/325 €                       
Please contact us for quotes on larger quantities !!! 

Iron Chromium Cobalt (Fe-Cr-Co) Alloy Nanopowder/Nanoparticles

Size: 35-95 nm, Fe:Cr:Co/64:25:11

Technical Properties:

Alloy Ratio (Fe-Cr-Co) 64-25-11
Average Particle Size (nm) 35-95

Properties, Storage and Cautions:

Fe-Cr-Co alloy nanoparticles are highly reactive, therefore it should be handled with care and rapid moves, vibrations should be avoided. The powder should be kept away from sunlight, any kind of heating, moisture and impacts. Coagulation of the particles is a serious problem, so, the powder should be sealed under vacuum and should be kept in cool and dry conditions. Air contact should be avoided.

Applications:

Fe-Cr-Co alloys are permanent magnetic alloys and they are easy to shape materials. They can be magnetized in a desired direction by a heat treatment. They can be used in compasses, rotary magnetic designs, displays etc…

Boron Nitride (BN) Sputtering Targets, Purity: 99.5%, Size: 1”, Thickness: 0.125”

$367.00

Product 

Boron Nitride (BN) Sputtering Targets, Purity: 99.5%, Size: 1'', Thickness: 0.125''

CAS No.

 10043-11-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

24.82 g/mol

Melting Point

~2973 °C

Boiling Point

N/A

Density

~2.1 g/cm³

Product Codes

NCZ-2375K

Tungsten Titanium (TiW) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.250”

$367.00

Product 

Tungsten Titanium (TiW) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness: 0.250''

CAS No.

58397-70-9

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

~231.71 g/mol

Melting Point

~2,700–3,200 °C

Boiling Point

~4,500–5,000 °C

Density

~14.5–17.0 g/cm³

Product Codes

NCZ-1559K

Lithium Cobalt Oxide (LiCoO2) Powder for Li-ion Battery Cathode Application

Price range: $68.00 through $367.00
Select options This product has multiple variants. The options may be chosen on the product page
100 grams/68 €                     500 grams/245 €               

Lithium Cobalt Oxide (LiCoO2) Powder for Li-ion Battery Cathode Application

Price range: $68.00 through $367.00
Select options This product has multiple variants. The options may be chosen on the product page
100 grams/68 €                     500 grams/245 €