(-COOH) Functionalized Industrial Multi Walled Carbon Nanotubes, Purity: > 90%, Outside Diameter: 50-80 n

Price range: $72.00 through $435.00
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Applications:

Multi Walled Carbon Nanotubes have a variety of potential applications in different fields. These applications include medicine, mechanics, electric-electronics, chemicals, energy and others. It can be applied in, 1-drug delivery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium batteries, 8-gas-discharge tubes, 9-flat panel displays, 10-supercapacitors, 11-transistors, 12-solar cells, 13-photoluminescence, 14-templates  

Nickel Chromium (Ni/Cr) Sputtering Target

Price range: $89.00 through $434.00
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Product 

Nickel Chromium (Ni/Cr) Sputtering Target

CAS No.

11114-46-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

58.0–59.0 g/mol

Melting Point

1390–1420 °C

Boiling Point

2730–2900 °C

Density

8.2 – 8.4 g/cm³

Product Codes

NCZ-1314K

Molybdenum Powder ( 500~800nm, 99.9%)

Price range: $190.00 through $434.00
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$190/100g
$305/500g
$434/1000g

Product 

Molybdenum Powder ( 500~800nm, 99.9%)

CAS No.

7439-98-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

500~800nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

95.95 g/mol

Melting Point

~2623°C

Boiling Point

4639 °C

Density

10.28 g/cm³

Product Codes

NCZ-1050K

Magnesium (Mg) Sputtering Targets, Purity: 99.95%, Size: 6”, Thickness: 0.250”

$434.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Graphene Water Dispersion, Purity: 99.5%, Black Liquid, Graphene: 0.5 wt%

Price range: $40.00 through $434.00
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30 ml/40 € 60 ml/59 €                          120 ml/93

Nickel-Coated Multi Walled Carbon Nanotubes, Purity: > 99%, Outside Diameter: 28-48 nm

Price range: $73.00 through $434.00
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Applications:

Nickel is coated on MWCNTs to have one dimentional magnetic material. Nickel is ferromagnetic material. MWCNTs are used as template for ferromagnetic nickel. Nickel-coated MWCNTs show good magnetic properties. Nickel-coated MWCNTs have a variety of potential applications in different fields. These applications include medicine, mechanics, electric-electronics, chemicals, energy and others. It can be applied in, 1-drug delivery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium batteries, 8-gas-discharge tubes, 9-flat panel displays, 10-supercapacitors, 11-transistors, 12-solar cells, 13-photoluminescence, 14-templates

Nickel-Coated Multi Walled Carbon Nanotubes, Purity: > 99%, Outside Diameter: 48-78 nm

Price range: $72.00 through $434.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Nickel is coated on MWCNTs to have one dimentional magnetic material. Nickel is ferromagnetic material. MWCNTs are used as template for ferromagnetic nickel. Nickel-coated MWCNTs show good magnetic properties. Nickel-coated MWCNTs have a variety of potential applications in different fields. These applications include medicine, mechanics, electric-electronics, chemicals, energy and others. It can be applied in, 1-drug delivery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium batteries, 8-gas-discharge tubes, 9-flat panel displays, 10-supercapacitors, 11-transistors, 12-solar cells, 13-photoluminescence, 14-templates

Indium (In) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.250”

$433.00

Product 

Indium (In) Sputtering Targets, Purity: 99.999%, Size: 2'', Thickness: 0.250''

CAS No.

 7440-74-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

114.82 g/mol

Melting Point

 156.6 °C

Boiling Point

 2,072 °C

Density

 7.31 g/cm³

Product Codes

NCZ-2228K

Copper Nanoparticles/ Nanopowder (Cu, ~1um, 99.8%)

Price range: $45.00 through $433.00
Select options This product has multiple variants. The options may be chosen on the product page
$45/25g $83/100g
$275/500g
$433/1kg

Product 

Copper Nanoparticles/ Nanopowder (Cu, ~1um, 99.8%)

CAS No.

7440-50-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

~1um (Size Can be customized), Ask for other available size ranges.

Ingredient

AlN

Molecular Weight

63.55 g/mol

Melting Point

1084.62 °C

Boiling Point

2562 °C

Density

8.96 g/cm³

Product Codes

NCZ-1037K

Copper Nanoparticles/Nanopowder in organic media (Cu, 5-7nm, oil-soluble, dispersible, lubricants additive)

Price range: $123.00 through $433.00
Select options This product has multiple variants. The options may be chosen on the product page
$123/100g
$315/500g
$433/1000g

Product 

Copper Nanoparticles/Nanopowder in organic media (Cu, 5-7nm, oil-soluble, dispersible, lubricants additive)

CAS No.

7440-50-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

5-7nm (Size Can be customized), Ask for other available size ranges.

Ingredient

AlN

Molecular Weight

63.55 g/mol

Melting Point

1084.62 °C

Boiling Point

2562 °C

Density

8.96 g/cm³

Product Codes

NCZ-1031K

Permalloy (Ni-Fe-Mo) Sputtering Targets, Size: 4”, Thickness: 0.125”

$432.00

Product 

Permalloy (Ni-Fe-Mo) Sputtering Targets, Size: 4'', Thickness: 0.125''

CAS No.

 Nickel: 7440-02-0 Iron: 7439-89-6 Molybdenum: 7439-98-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 Not defined (alloy), but elemental weights: Ni: 58.69 g/mol Fe: 55.85 g/mol Mo: 95.95 g/mol

Melting Point

 ~1450 °C

Boiling Point

 ~2730–3000 °C

Density

~8.7 g/cm³

Product Codes

NCZ-1797K

Boron powder ( B, 99.99%, -325 mesh)

Price range: $104.00 through $432.00
Select options This product has multiple variants. The options may be chosen on the product page
$104/5g
$432/25g

Product 

Boron powder ( B, 99.99%, -325 mesh)

CAS No.

7440-42-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

-325 mesh (Size Can be customized), Ask for other available size ranges.

Ingredient

AlN

Molecular Weight

10.81 g/mol

Melting Point

2076°C

Boiling Point

2808 °C

Density

19.32 g/cm³

Product Codes

NCZ-1018K

Tungsten Titanium (TiW) Sputtering Targets, Purity: 99.99%, Size: 8”, Thickness: 0.250”

$432.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Lithium Nickel Manganese Cobalt Oxide (LiNiCoMnO2) Powder for High Power Li-ion Battery Cathode Application, (Ni:Mn:Co=5:3:2) NMC 532

Price range: $60.00 through $432.00
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100 grams/60 €                      500 grams/248 €             

Lithium Nickel Manganese Cobalt Oxide (LiNiCoMnO2) Powder for High Power Li-ion Battery Cathode Application, (Ni:Mn:Co=5:3:2) NMC 532

Price range: $60.00 through $432.00
Select options This product has multiple variants. The options may be chosen on the product page
100 grams/60 €                      500 grams/248 €             

Fullerene-C60, Purity: 99%

Price range: $95.00 through $432.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

1. Pharmaceutical: Diagnostic reagents, super drugs, cosmetics, nuclear magnetic resonance (NMR) with the developer. DNA affinity 2. Energy: Solar battery, fuel cell, secondary battery. 3. Industry: Wear resistant material, flame retardant materials, lubricants, polymer additives, high-performance membrane, catalyst, artificial diamond, hard alloy, electric viscous fluid, ink filters, high-performance coatings, fire retardant coatings, manufacturing bioactive materials , memory materials, embedded molecular and other characteristics, composite materials etc. 4. Information industry: Semiconductor record medium, magnetic materials, printing ink, toner, ink, paper special purposes. 5. Electronic parts: Superconducting semiconductor, diodes, transistors, inductor.  , 6. Optical materials, electronic camera, fluorescence display tube, nonlinear optical materials. 7. Environment: Gas adsorption, gas storage.

Carboxymethyl Cellulose (CMC) Micron Powder for Li-ion Battery Anode Materials

Price range: $62.00 through $432.00
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100 grams/49 € 500 grams/198 € 1000 grams/345 €
Please contact us for quotes on larger quantities !!!

Carboxymethyl Cellulose (CMC) Micron Powder for Li-ion Battery Anode Materials

Technical Properties:

 Appearance  White powder
 Viscosity (2% aqueous solution)  7000~10000 mpa.s
 Purity  ≧99.5%
 Water Content  ≦10%
 Substituting degree  0.6~0.9
 PH  6.0~8.5
 Heavy metal (pb)  ≦15 ppm
 Fe  ≦40 ppm
 As  ≦2 ppm
 CAS Number  9004-32-4

Graphite Sheet Thermal Interface Material, EYG Series, 1600 W/m.K, Thickness: 25 µm, Lenght: 230 mm, Width: 180 mm

Price range: $99.00 through $432.00
Select options This product has multiple variants. The options may be chosen on the product page
1 piece / 99 € 5 pieces / 432 € Please contact us for quotes on larger quantities !   Graphite

Silicon Dioxide (SiO2) Sputtering Targets, Fused Quartz, indium, Purity: 99.995%, Size: 2”, Thickness: 0.125”

$431.00

Product 

Silicon Dioxide (SiO2) Sputtering Targets, Fused Quartz, indium, Purity: 99.995%, Size: 2'', Thickness: 0.125''

CAS No.

60676-86-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

60.08 g/mol

Melting Point

~1715 °C

Boiling Point

~2230 °C

Density

~2.20 g/cm³

Product Codes

NCZ-1708K

Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”

$431.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Copper (Cu) Micron Powder, Purity: 99.9 %, Size: 325 mesh, Spherical

Price range: $9.00 through $431.00
Select options This product has multiple variants. The options may be chosen on the product page
5 grams/9 €  25 grams/35 €  100 grams/117 €  500 grams/218 €  1000 grams/431 €  Please contact us for quotes on larger quantities !!! Copper (Cu)

Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”

$431.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Copper (Cu) Nanopowder/Nanoparticles, Purity: 99.85%, Size: 22 nm, Carbon Coated

Price range: $83.00 through $431.00
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Copper (Cu) Nanopowder/Nanoparticles

Purity: 99.85%, Size: 22 nm, Carbon Coated

Technical Properties:

Cu Purity (%) 99,85 (partially passivated by coating nanoparticles     with 4,0 wt% Carbon for only safe shipping)
Bulk Density (g/cm3) 0,2-0,4
True Density (g/cm3) 8,9
Color black
Shape spherical
Crystal Structure cubic
Average Particle Size (nm) 22
Specific Surface Area (m2/g) 35,0-55,0
Elemental Analysis Cu Si Others
99.8 0.1 0.01

Properties, Storage and Cautions:

Copper nanoparticles are highly reactive and flammable, therefore it should be handled with care and rapid moves, vibrations should be avoided. Nanopowder should be kept away from sunlight, any kind of heating, moisture and impacts. Coagulation of the particles is a serious problem, so, nanopowder should be sealed under vacuum and should be kept in cool and dry conditions. Air contact should be avoided.

Antimony (Sb) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.125”

$430.00

Product 

Antimony (Sb) Sputtering Targets, Purity: 99.999%, Size: 3'', Thickness: 0.125''

CAS No.

 7440-36-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 121.76 g/mol

Melting Point

 630.6 °C

Boiling Point

 1587 °C

Density

 6.69 g/cm³

Product Codes

NCZ-2506K

Tin Oxide Nanoparticles/ Nanopowder ( SnO2, 99.9%, 50-70 nm)

Price range: $105.00 through $430.00
Select options This product has multiple variants. The options may be chosen on the product page
$105/100g
$240/500g
$430/1kg

Product 

Tin Oxide Nanoparticles/ Nanopowder ( SnO2, 99.9%, 50-70 nm)

CAS No.

 18282-10-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

50-70 nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

150.71 g/mol

Melting Point

~1,630 °C

Boiling Point

~1,800 °C

Density

 6.95 g/cm³

Product Codes

NCZ-1179K

Palladium Nanopowder/Nanoparticles (Pd, 99.9%, ~20nm)

Price range: $245.00 through $430.00
Select options This product has multiple variants. The options may be chosen on the product page
$245/0.5g
$430/1g

Product 

Palladium Nanopowder/Nanoparticles (Pd, 99.9%, ~20nm)

CAS No.

7440-05-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 ~20nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

106.42 g/mol

Melting Point

1,554.9 °C

Boiling Point

2,963 °C°C

Density

 12.02 g/cm³

Product Codes

NCZ-1063K

Platinum Nanopowder/Nanoparticles (Pt, 99.9%, ~20nm)

Price range: $245.00 through $430.00
Select options This product has multiple variants. The options may be chosen on the product page
$245/0.5g
$430/1g

Product 

Platinum Nanopowder/Nanoparticles (Pt, 99.9%, ~20nm)

CAS No.

7440-06-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

20nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

195.08 g/mol

Melting Point

1,768 °C

Boiling Point

 3,825 °C

Density

~21.45 g/cm³

Product Codes

NCZ-1062K

Gold Au Nanoparticles/ Nanopowder AuNPs 99.9%, 20nm

Price range: $245.00 through $430.00
Select options This product has multiple variants. The options may be chosen on the product page
$245/0.5g $430/1g

Product 

Gold Au Nanoparticles/ Nanopowder AuNPs 99.9%, 20nm

CAS No.

7440-57-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

20nm (Size Can be customized), Ask for other available size ranges.

Ingredient

AlN

Molecular Weight

196.966 g/mol

Melting Point

1063-1064°C

Boiling Point

2808 °C

Density

19.32 g/cm³

Product Codes

NCZ-1017K

Aluminum Nitride (AlN) Sputtering Targets, Purity: 99.8%, Size: 1”, Thickness: 0.125”

$429.00

Product 

Aluminum Nitride (AlN) Sputtering Targets, Purity: 99.8%, Size: 1'', Thickness: 0.125''

CAS No.

 24304-00-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

40.99 g/mol

Melting Point

 ~2200 °C

Boiling Point

 N/A

Density

 ~3.26 g/cm³

Product Codes

NCZ-2561K

Indium (In) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”

$429.00

Product 

Indium (In) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.125''

CAS No.

 7440-74-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

114.82 g/mol

Melting Point

 156.6 °C

Boiling Point

 2,072 °C

Density

 7.31 g/cm³

Product Codes

NCZ-2227K

Premium Grade Synthetic Diamond Superabrasive Micropowder

Price range: $209.00 through $429.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Premium Grade Synthetic Diamond Superabrasive Micropowder
CAS No. 7782-40-3
Appearance Fine crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 0.1–20µm (Size Can be customized),  Ask for other available size range.
Ingredient C
Molecular Weight 438.92 g/mol
Melting Point N/A
Boiling Point N/A
Density 3.52 g/cm³
Product Codes NCZ-504I

Polyaniline Rod Powder, 5g/bottle

$429.00
Product Polyaniline Rod Powder, 5g/bottle
CAS No. 25233-30-1
Appearance Dark green to black
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 50–200nm (Size Can be customized),  Ask for other available size range.
Ingredient (C6H4NH)n​
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 1.3–1.4 g/cm³
Product Codes NCZ-495I

Oleic Acid Coated Magnetic Fe3O4 Nanoparticle Dispersion, 1mg/mL

Price range: $176.00 through $429.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Oleic Acid Coated Magnetic Fe3O4 Nanoparticle Dispersion, 1mg/mL
CAS No. N/A
Appearance Black or dark brown
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 5–20nm (Size Can be customized),  Ask for other available size range.
Ingredient Fe3O4
Molecular Weight 231.55g/mol
Melting Point N/A
Boiling Point N/A
Density 5.17 g/cm³
Product Codes NCZ-486I

Nitrogen-Doped Carbon-Iridium Single-Atom Catalyst, Ir-N-C SAC, 1g

$429.00
Product Nitrogen-Doped Carbon-Iridium Single-Atom Catalyst, Ir-N-C SAC, 1g
CAS No. N/A
Appearance Dark gray
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 0.5–5µm (Size Can be customized),  Ask for other available size range.
Ingredient Ir–Nₓ–C
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 0.3–0.6 g/cm³
Product Codes NCZ-483I
 

Graphite Oxide Powder

Price range: $231.00 through $429.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Graphite Oxide Powder
CAS No. 7782-42-5
Appearance Brownish-yellow
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 10µm (Size Can be customized),  Ask for other available size range.
Ingredient CₓOᵧH_z
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 1.8–2.2 g/cm³
Product Codes NCZ-369I

Graphene Quantum Dots Powder (White Fluorescence), 50mg

$429.00
Product Graphene Quantum Dots Powder (White Fluorescence), 50mg
CAS No. 7440-44-0
Appearance Light brown to grayish
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 10nm (Size Can be customized),  Ask for other available size range.
Ingredient CₓOᵧH_z
Molecular Weight 300 g/mol
Melting Point N/A
Boiling Point N/A
Density 2.0–2.3 g/cm³
Product Codes NCZ-366I
 

Graphene Quantum Dots Powder (Red Fluorescence), 50mg

$429.00
Product Graphene Quantum Dots Powder (Red Fluorescence), 50mg
CAS No. 7440-44-0
Appearance Brownish-black
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 10nm (Size Can be customized),  Ask for other available size range.
Ingredient CₓOᵧH_z
Molecular Weight 1000 g/mol
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-365I

Copper (Cu) Nanowire Dispersion, 1g/bottle

$429.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Copper (Cu) Nanowire Dispersion, 1g/bottle
CAS No. 7440-50-8
Appearance Reddish-brown to red suspension
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 100–200nm (Size Can be customized),  Ask for other available size range.
Ingredient Cu
Molecular Weight 63.55 g/mol
Melting Point N/A
Boiling Point N/A
Density 8.96 g/cm³
Product Codes NCZ-330I

Alkylated Carbon Quantum Dot Powder (Blue Fluorescence), 100mg

$429.00
Product Alkylated Carbon Quantum Dot Powder (Blue Fluorescence), 100mg
CAS No. 7723-14-0
Appearance Brownish yellow
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 2-6nm (Size Can be customized),  Ask for other available size range.
Ingredient CxHyOzRn​
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 0.4–0.7 g/cm³
Product Codes NCZ-276I
 

99.999% 5N 10-20 nm Gamma Aluminum Oxide (Alumina) Al2O3 Powder, 500 g

$429.00
Product 99.999% 5N 10-20 nm Gamma Aluminum Oxide (Alumina) Al2O3 Powder, 500 g
CAS No. 1344-28-1
Appearance White to off-white
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 10-20nm (Size Can be customized),  Ask for other available size range.
Ingredient Al2O3
Molecular Weight 101.96 g/mol
Melting Point N/A
Boiling Point N/A
Density 3.65 g/cm³
Product Codes NCZ-257I

Vanadium (V) Sputtering Targets, Purity: 99.5%, Size: 3”, Thickness: 0.250”

$429.00

Product 

Vanadium (V) Sputtering Targets, Purity: 99.5%, Size: 3'', Thickness: 0.250''

CAS No.

7440-62-2

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

50.9415 g/mol

Melting Point

1910 °C

Boiling Point

3407 °C

Density

6.11 g/cm³

Product Codes

NCZ-1547K

2.5 mL Palladium (Pd) Nanoparticles (15-25 nm) Water Dispersion, 1 mg/mL

$429.00
Product 2.5 mL Palladium (Pd) Nanoparticles (15-25 nm) Water Dispersion, 1 mg/mL
CAS No. 7440-05-3
Appearance Brown-black liquid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 15-25 nm (Size Can be customized),  Ask for other available size range.
Ingredient Pd
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-143I
 

Vanadium (V) Sputtering Targets, Purity: 99.5%, Size: 4”, Thickness: 0.125”

$429.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Iron Oxide (Fe3O4) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”

$429.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Multi Walled Carbon Nanotubes N-Methyl-2-Pyrrolidinone Dispersion, 4 wt%, Purity: > 96 %, OD: 18-28 nm, Length 8-18 µm

Price range: $89.00 through $429.00
Select options This product has multiple variants. The options may be chosen on the product page
Multi Walled Carbon Nanotubes N-Methyl-2-Pyrrolidinone Dispersion 4 wt%, Purity: > 96+ %, OD: 18-28 nm, Length 8-18 µm Technical Properties: Purity

Multi Walled Carbon Nanotubes N-Methyl-2-Pyrrolidinone Dispersion, 4 wt%, Purity: > 96 %, OD: 18-28 nm, Length 8-18 µm

Price range: $89.00 through $429.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

MWCNTs have a variety of potential applications in different fields. These applications include midicine, mechanical, electric, chemical, energy and others. It can be applied in, 1-drug dilevery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium battaries, 8-gas-discharge tubes, 9-flat panel display, 10-supercapacitor, 11-transistors, 12-solar cells, 13-photoluminescence, 14-tamplate

Molybdenum Disulfide (MoS2) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”

$428.00

Product 

Molybdenum Disulfide (MoS2) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.250''

CAS No.

 1317-33-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 160.07 g/mol

Melting Point

 ~1185 °C

Boiling Point

 ~4500 °C

Density

 ~5.06 g/cm³

Product Codes

NCZ-1918K

Nickel Chromium (Ni-Cr) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.250”

$428.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Molybdenum (Mo) Micron Powder, Purity: 99.95 %, Size: 3 µm

Price range: $51.00 through $428.00
Select options This product has multiple variants. The options may be chosen on the product page
25 grams/46 € 100 grams/94 € 500 grams/265 € 1000 grams/380 €
Please contact us for quotes on larger quantities !!!

Molybdenum (Mo) Micron Powder

Purity: 99.95 %, Size: 3 µm

Technical Properties:

PURITY

99.95 %

PARTICLE SIZE

3 µm

CAS

7439-98-7

MELTING POINT

2610 °C

BOILING POINT

5560 °C

CRYSTAL STRUCTURE

Cubic, Body Centered

DENSITY                                      8.2 g/cm³
COEFF. OF EXPANSION @ 20ºC

5.1 x 10⁻⁶

ELECTRIC RESISTIVITY

5.17 microhm-cm

FORM  

Powder

APPLICATIONS

Aerospace Alloys Electronics Metal Injection Molding

                                                  

Ytterbium Oxide (Yb2O3) Powder 99.999% 5N, High Purity, 100g

$427.00
Product Ytterbium Oxide (Yb2O3) Powder 99.999% 5N, High Purity, 100g
CAS No. 1314-37-0
Appearance White
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 5µm (Size Can be customized),  Ask for other available size range.
Ingredient Yb2O3
Molecular Weight 394.08 g/mol
Melting Point 2,345 °C
Boiling Point 4,300 °C
Density N/A
Product Codes NCZ-599I

Nickel (Ni) Sputtering Targets, Purity: 99.995%, Size: 6”, Thickness: 0.125”

$427.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Carbon (C) (Pyrolytic Graphite) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.125”

$427.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Carbon (C) (Pyrolytic Graphite) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.125”

$427.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Cerium Oxide (CeO2) Nanopowder/Nanoparticles Water Dispersion, Size: 25-45 nm, 22 wt%

Price range: $29.00 through $427.00
Select options This product has multiple variants. The options may be chosen on the product page
25 grams/26 € 50 grams/48 € 100 grams/84 € 500 grams/226 € 1000 grams/376 €           
Please contact us for quotes on larger quantities !!!

Cerium Oxide (CeO2) Nanopowder/Nanoparticles Water Dispersion

Size: 25-45 nm, 22 wt%

Molybdenum Oxide (MoO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”

$426.00

Product 

Molybdenum Oxide (MoO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.250''

CAS No.

1313-27-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 143.94 g/mol

Melting Point

 ~795°C

Boiling Point

 ~1155°C

Density

 ~4.7 g/cm³

Product Codes

NCZ-1902K

Gadolinium Sputtering Target Gd

$426.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Gadolinium Sputtering Target Gd
CAS No. 7440-54-2
Appearance Solid, silvery-white metallic with slight oxidation tendency
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Gd
Molecular Weight 157.25 g/mol
Melting Point 1312 °C
Boiling Point 3273 °C
Density 7.90 g/cm³
Product Codes NCZ-114H

Silicon (Si) Sputtering Targets, N-type, Purity: 99.999%, Size: 6”, Thickness: 0.250”

$426.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Molybdenum Oxide (MoO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”

$426.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The composition of the target material can be assessed and even minuscule levels of impurities can be identified with the aid of the sputtering target.

Applications to sputtering targets in space are also possible. Sputtering is one kind of space weathering that modifies the chemical and physical properties of airless worlds such as asteroids and the Moon.

Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”

$426.00

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Sodium ascorbyl phosphate(Cosmetic grade) (540513)

$425.00
Select options This product has multiple variants. The options may be chosen on the product page
Magnesium ascorbyl phosphate(Cosmetic grade) (539640)
      Synonym Vitamin C magnesium phosphate, Magnesium L-Ascorbyl Phosphate Structure
Molecular Formula C12H12O18P2Mg3·10H2O

TEST SPECIFICATIONS
1. Appearance White to pale yellow powder
2. Assay ≥98.50%
3. Loss on Drying ≤20%
4. Heavy metals(Pb) ≤0.001%
5. Arsenic ≤0.0002%
6. pH(3%aqueous solution) 7.0-8.5
7. State of solution(3% aqueous solution Colorless to pale yellowish transparent
8. Color of solution(APHA) ≤70
9. Free ascorbic acid ≤0.5%
10. Free Phosphoric acid ≤1%
11. Ketogulonic acid and its derivatives ≤2.5%
12. Derivatives of ascorbic acid ≤3.5 %
13. Chloride ≤0.35%
14. Total aerobic coumt ≤100 per gram
15. Packaging 1 kg aluminum foil bag, 5/10kg carton, 25 kg barrel, according to customer requirements
16. Shelf life 3 yr after production
Product Codes- NCZ-2709K