Titanium Dioxide (TiO2) Sputtering Targets, indium, Purity: 99.9%, Size: 2”, Thickness: 0.125”, Grey to Black

$724.00

Product 

Titanium Dioxide (TiO2) Sputtering Targets, indium, Purity: 99.9%, Size: 2'', Thickness: 0.125'', Grey to Black

CAS No.

13463‑67‑7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

TiO₂ (black granules) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

79.94 g/mol

Melting Point

~1,843 °C

Boiling Point

~2,972 °C

Density

~4.23 g/cm³

Product Codes

NCZ-1425K

Bismuth Ferrite (BiFeO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”

$723.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered. With the sputtering target's assistance, the

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

One of the most promising multiferroic materials is bismuth ferrite, an inorganic chemical compound with a perovskite structure and the chemical formula BiFeO3. In order to create a one-phase material called bismuth ferrite (BiFeO3), a bismuth ferrite sputtering target is often manufactured by high temperature sinttering or recrystallizing the mixture of the oxide compound of Bi and Fe. For targets that are sputtering bismuth ferrite, indium bonding is advised.

Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”

$723.00

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Tungsten Titanium (TiW) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.125”

$721.00

Product 

Tungsten Titanium (TiW) Sputtering Targets, Purity: 99.99%, Size: 4'', Thickness: 0.125''

CAS No.

58397-70-9

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

~231.71 g/mol

Melting Point

~2,700–3,200 °C

Boiling Point

~4,500–5,000 °C

Density

~14.5–17.0 g/cm³

Product Codes

NCZ-1556K

Silver (Ag) Nanopowder/Nanoparticles Water Dispersion, Size: 2 nm, Colorless & Transparent, 2.200 ppm

Price range: $48.81 through $720.74
Select options This product has multiple variants. The options may be chosen on the product page
Silver (Ag) Nanopowder/Nanoparticles Water Dispersion Size: 2 nm, Colorless & Transparent, 2.200 ppm The silver water dispersion is a colorless

Cesium chloride(CsCl, 99%) (559836)

$720.00
Select options This product has multiple variants. The options may be chosen on the product page
Cesium chloride(CsCl, 99%) (559836) This product is for research purposes only and is NOT intended for use as drugs, food additives, households, pesticides, etc.
CsCl min% Impurities Max%
Li Na K Rb Ca Mg Fe Al Si Pb
99 0.001 0.02 0.02 0.5 0.005 0.001 0.001 0.001 0.001 0.001

 

Product Codes- NCZ-2742K

Tantalum (Ta) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.125”

$720.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Silver (Ag) Nanopowder/Nanoparticles Water Dispersion, Size: 2 nm, Colorless & Transparent, 2.200 ppm

Price range: $48.00 through $720.00
Select options This product has multiple variants. The options may be chosen on the product page
25 grams/43 € 50 grams/69 € 100 grams/108 € 500 grams/340 € 1000 grams/635 €           
Please contact us for quotes on larger quantities !!!

Silver (Ag) Nanopowder/Nanoparticles Water Dispersion

Size: 2 nm, Colorless & Transparent, 2.200 ppm

The silver water dispersion is a colorless & transparent or light yellow liquid, composed of nano silver that particle size is less than 2 nm. Silver (Ag) water dispersion is widely applicable for various fabrics including cotton, blending fabric, chemical fiber, non-woven fabric, leather, etc. We are glad to provide Ag in water with low prices.

High Purity Magnesium Oxide (MgO) Powder, 500 nm, 99.99% (4N) (Metal Basis)

$719.00
Select options This product has multiple variants. The options may be chosen on the product page
Product High Purity Magnesium Oxide (MgO) Powder, 500 nm, 99.99% (4N) (Metal Basis)
CAS No. 1309-48-4
Appearance White
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 500nm (Size Can be customized),  Ask for other available size range.
Ingredient MgO
Molecular Weight 40.30 g/mol
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-412I
 

CR2032 Coin Cell Case (Negative Case, Cone Spring, Spacer, Positive Case)

Price range: $248.00 through $719.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

CR2032 Coin Cell Case (Negative Case, Cone Spring, Spacer, Positive Case) for Battery Research CR2032 Coin Cell Cases (20d x 3.2t mm) with O-rings for Battery Research

Aluminum Nitride (AlN) Sputtering Targets, elastomer, Purity: 99.8%, Size: 1”, Thickness: 0.125”

$718.00

Product 

Aluminum Nitride (AlN) Sputtering Targets, elastomer, Purity: 99.8%, Size: 1'', Thickness: 0.125''

CAS No.

 24304-00-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

40.99 g/mol

Melting Point

 ~2200 °C

Boiling Point

 N/A

Density

 ~3.26 g/cm³

Product Codes

NCZ-2553K

Molybdenum Disilicide (MoSi2) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.125”

$718.00

Product 

Molybdenum Disilicide (MoSi2) Sputtering Targets, Purity: 99.95%, Size: 3'', Thickness: 0.125''

CAS No.

12136-78-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

152.11 g/mol

Melting Point

 ~2030 °C

Boiling Point

 ~2300 °C to 2500 °C

Density

~6.26 g/cm³

Product Codes

NCZ-1925K

Silicon Carbide (SiC) Sputtering Targets, Purity: 99.5%, Size: 4”, Thickness: 0.125”

$718.00

Product 

Silicon Carbide (SiC) Sputtering Targets, Purity: 99.5%, Size: 4'', Thickness: 0.125''

CAS No.

 409‑21‑2

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

SiC (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

40.10 g/mol

Melting Point

~2730 °C

Boiling Point

N/A

Density

~3.21 g/cm³

Product Codes

NCZ-1393K

Chromium Oxide (Cr2O3) Sputtering Targets, Purity: 99.8%-99.9%, Size: 3”, Thickness: 0.250”

$717.00

Product 

Chromium Oxide (Cr2O3) Sputtering Targets, Purity: 99.8%-99.9%, Size: 3'', Thickness: 0.250''

CAS No.

1308-38-9

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 151.99 g/mol

Melting Point

2,435 °C

Boiling Point

 ~3,000 °C (approximate; may decompose before boiling)

Density

5.21 g/cm³

Product Codes

NCZ-2301K

Holmium Nitrate Pentahydrate (Ho(NO3)3 · 5H2O) 99.9% 3N

Price range: $343.00 through $717.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Holmium Nitrate Pentahydrate (Ho(NO3)3 · 5H2O) 99.9% 3N
CAS No. 207398-45-0
Appearance Pale pink to light yellow crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1–10µm (Size Can be customized),  Ask for other available size range.
Ingredient Ho(NO3)3 · 5H2O
Molecular Weight 446.02 g/mol
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-420I
 

3N (99.9%) Titanium Dioxide (TiO2) White Pieces (3-6mm) Evaporation Materials

Price range: $497.00 through $717.00
Select options This product has multiple variants. The options may be chosen on the product page
Product 3N (99.9%) Titanium Dioxide (TiO2) White Pieces (3-6mm) Evaporation Materials
CAS No. 13463-67-7
Appearance White-Beige, Gray-Black 
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 3-6mm (Size Can be customized),  Ask for other available size range.
Ingredient TiO2
Molecular Weight 79.9 g/mol
Melting Point 1,830°C
Boiling Point N/A
Density 7.86 g/cm³
Product Codes NCZ-121E

3N5 (99.95%) Iron (Fe) Pellets Evaporation Materials

Price range: $497.00 through $717.00
Select options This product has multiple variants. The options may be chosen on the product page
Product 3N5 (99.95%) Iron (Fe) Pellets Evaporation Materials
CAS No. 7439-89-6
Appearance Lustrous, Metallic, Grayish Tinge 
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 3–10 mm (Size Can be customized),  Ask for other available size range.
Ingredient Fe
Molecular Weight 95.96 g/mol
Melting Point 1535°C
Boiling Point 3000°C
Density 7.86 g/cm³
Product Codes NCZ-120E

Prime CZ-Si Wafer, Size: 3”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 1-Side Polished, Thickness: 381 ± 25 μm

Price range: $58.00 through $716.00
Select options This product has multiple variants. The options may be chosen on the product page
1 piece/52 € 5 pieces/160 € 25 pieces/640 € Please contact us for quotes on larger quantities !!!

Prime CZ-Si Wafer

Size: 3”, Orientation: (100), Boron Doped, 1-Side Polished

Technical Properties:

Quality Prime
Materials CZ-Si
Size (inch) 3”
Orientation (100)
Coating
Thickness (μm) 381 ± 25
Doping Boron
Resistivity (ohm.cm) 1-10
Polished One Side
Silicon is one of the most common elements on earths crust. Main usage of Silicon wafers is electronics and technology. Silicon wafers have very flat and mirror like surfaces. It is produced by Czochralski method to obtain the highest purity. Depending on the usage area, silicon wafers can be doped with different materials to tailor its purity accordingly. The amount and type of dopants highly affect the electronic properties. Galium, indium, boron and nitrogen are some of the dopants that can be used in production process. Silicon wafers are used in semiconductors, microchips, integrated circuits, smartphones, computers etc. Silicon is the key platform for semiconductor gadgets. A wafer is just but a thin slice of the semiconductor material that acts as a substratum for microelectronic devices fitted in and above the wafer.

Dummy CZ-Si Wafer, Size: 3”, Orientation: (111), Phosphor Doped, Resistivity: 0,001-100 (ohm.cm), 1-Side Polished, Thickness: 340 ± 25 μm

Price range: $58.00 through $716.00
Select options This product has multiple variants. The options may be chosen on the product page
1 piece/52 € 5 pieces/160 € 25 pieces/640 €   Please ask for amount of stock before placing an order on Wafer Products Please contact us for quotes on larger quantities !!!

Dummy CZ-Si Wafer

Size: 3”, Orientation: (111), Phosphor Doped, 1-Side Polished

Technical Properties:

Quality Dummy
Materials CZ-Si
Size (inch) 3”
Orientation (111)
Coating
Thickness (μm) 340 ± 25
Doping Phosphor
Resistivity (ohm.cm) 0,001-100
Polished One Side
Dummy is a grade of wafers, which is also referred as “test wafer” a grade lower than prime. Dummy CZ Si wafers are often doped with arsenic. Test grade wafers are high quality but have less stringent properties than prime grade wafers, usually failing for one or more of the Semiconductor Equipment and Materials International (SEMI) standards. Test grade wafers are often used in applications that require a large quantity of wafers for equipment and fabrication testing. Even if you are doing very high end R&D work it is much more cost effective to develop a process using test wafers and then do the final checks using Prime or Epi-Prime wafers.

Prime CZ-Si Wafer, Size: 2”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2-Side Polished, Thickness: 500 ± 25 μm

Price range: $59.00 through $716.00
Select options This product has multiple variants. The options may be chosen on the product page
1 piece/53 € 5 pieces/160 € 25 pieces/640 €   Please ask for stock status before placing an order on wafer products Please contact us for quotes on larger quantities !!!

Prime CZ-Si Wafer

Size: 2”, Orientation: (100), Boron Doped, 2-Side Polished

Technical Properties:

Quality Prime
Materials CZ-Si
Size (inch) 2”
Orientation (100)
Coating
Thickness (μm) 500 ± 25
Doping Boron
Resistivity (ohm.cm) 1-10
Polished Double Side
Silicon is one of the most common elements on earths crust. Main usage of Silicon wafers is electronics and technology. Silicon wafers have very flat and mirror like surfaces. It is produced by Czochralski method to obtain the highest purity. Depending on the usage area, silicon wafers can be doped with different materials to tailor its purity accordingly. The amount and type of dopants highly affect the electronic properties. Galium, indium, boron and nitrogen are some of the dopants that can be used in production process. Silicon wafers are used in semiconductors, microchips, integrated circuits, smartphones, computers etc. Silicon is the key platform for semiconductor gadgets. A wafer is just but a thin slice of the semiconductor material that acts as a substratum for microelectronic devices fitted in and above the wafer.

Poly(trimethylene carbonate)(PTMC) (605989)

$715.00
Poly(trimethylene carbonate)(PTMC) (605989)
Grade Description Inherent viscosity (dL/g) Weight average molecular weight (x10000)
PTMC-05 PTMC 0.3-0.5 2-5
PTMC-10 PTMC 0.5-1.0 5-12
PTMC-15 PTMC 1.0-1.5 12-20
PTMC-20 PTMC 1.5-2.0 20-30
Product Codes- NCZ-2647K

Poly(ε-Caprolactone)(PCL) (609989)

$715.00
Poly(ε-Caprolactone)(PCL) (609989)
Grade Description Inherent viscosity (dL/g) Weight average molecular weight (x10000)
PCL-05 PCL 0.3-0.5 2-5
PCL-10 PCL 0.5-1.0 5-12
PCL-15 PCL 1.0-1.5 12-20
PCL-20 PCL 1.5-2.0 20-30
Product Codes- NCZ-2645K

Nickel Oxide (NiO) Sputtering Targets, Purity: 99.995%, Size:1”, Thickness: 0.250”

$715.00

Product 

Nickel Oxide (NiO) Sputtering Targets, Purity: 99.995%, Size:1'', Thickness: 0.250''

CAS No.

1313-99-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 ~3–5 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

74.69 g/mol

Melting Point

1,950 °C

Boiling Point

 2,730 °C

Density

 6.67 g/cm³

Product Codes

NCZ-1838K

Silicon Carbide (SiC) Sputtering Targets, Purity: 99.5%, Size: 3”, Thickness: 0.125”

$715.00

Product 

Silicon Carbide (SiC) Sputtering Targets, Purity: 99.5%, Size: 3'', Thickness: 0.125''

CAS No.

 409-21-2

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 40.10 g/mol

Melting Point

~2,700 °C

Boiling Point

N/A

Density

~3.21 g/cm³

Product Codes

NCZ-1726K

10mL Gold (Au) Nanorods Dispersion in Organic Solvent, 0.1mg/mL

Price range: $714.00 through $715.00
Select options This product has multiple variants. The options may be chosen on the product page
Product 10mL Gold (Au) Nanorods Dispersion in Organic Solvent, 0.1mg/mL
CAS No. 7440-57-5
Appearance Red, ruby-red, or purple
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 20–100 nm (Size Can be customized),  Ask for other available size range.
Ingredient Au
Molecular Weight 196.97 g/mol
Melting Point N/A
Boiling Point N/A
Density 19.3 g/cm³
Product Codes NCZ-127I

Indium Bonding on Cu Backing Plate for Sputtering Targets

Price range: $405.00 through $715.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Indium Bonding on Cu Backing Plate for Sputtering Targets
CAS No. 7440-74-6
Appearance Soft, silvery-white metal
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient In
Molecular Weight N/A
Melting Point 114.82 g/mol
Boiling Point N/A
Density 7.31 g/cm³
Product Codes NCZ-120H

4N5 (99.995%) Nickel (Ni) Pellets Evaporation Materials

Price range: $336.00 through $715.00
Select options This product has multiple variants. The options may be chosen on the product page
Product 4N5 (99.995%) Nickel (Ni) Pellets Evaporation Materials
CAS No. 7440-02-0
Appearance Lustrous, Metallic, Silvery Tinge
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1–10 mm (Size Can be customized),  Ask for other available size range.
Ingredient Ni
Molecular Weight 58.69 g/mol
Melting Point 1,453°C
Boiling Point 2,913 °C
Density 8.91 g/cm³
Product Codes NCZ-122E
 

Tungsten Carbide Nanoparticles/ Nanopowder ( WC, 80nm)

Price range: $115.00 through $715.00
Select options This product has multiple variants. The options may be chosen on the product page
$115/25g
$305/100g
$715/500g

Product 

Tungsten Carbide Nanoparticles/ Nanopowder ( WC, 80nm)

CAS No.

12070-12-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 

80nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

195.85 g/mol

Melting Point

~2,870 °C

Boiling Point

~6,000 °C

Density

~15.63 g/cm³

Product Codes

NCZ-1205K

Cobalt (Co) Sputtering Targets, Purity: 99.95%, Size: 6”, Thickness: 0.250”

$715.00

Applications of Sputtering Targets;.

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

The chemical element cobalt has the atomic number 27 and the symbol Co. Cobalt is a silver-gray, hard, and shiny metal. Because it is one of only three room temperature ferromagnets with unaxial symmetry and hence suitability for digital recording, cobalt is employed in the production of high-strength, wear-resistant alloys as well as magnetic recording.

Barium Titanate (BaTiO3) Sputtering Targets, elastomer, Purity: 99.99%, Size: 1”, Thickness: 0.125”

$715.00

Applications of Sputtering Targets;.

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. When the target shatters,

Mass spectrometry measures the concentration and identity of sputtered atoms. The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Formulated as BaTiO3, barium titanate is an inorganic substance. When manufactured, barium titanate is transparent and has a white powder appearance.

(-OH) Functionalized Industrial Short Multi Walled Carbon Nanotubes, Purity: > 92%, Outside Diameter: 8-28 nm

Price range: $59.00 through $715.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Multi Walled Carbon Nanotubes have a wide range of possible uses in several industries. These applications span a variety of fields, including energy, chemistry, mechanics, and electric-electronics. Drug delivery, biosensors, CNT composites, catalysis, nanoprobes, and hydrogen storage are just a few applications for it. 7, lithium-ion batteries, eight gas discharge tubes nine flat-panel screens, ten supercapacitors, and eleven transistors a dozen solar cells, 14 templates, 13 photoluminescence

Tungsten Sputtering Target W

Price range: $232.00 through $714.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Tungsten Sputtering Target W
CAS No. 7440-33-7
Appearance Grayish White, Lustrous, Metallic
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient W
Molecular Weight 183.84 g/mol
Melting Point 3410°C
Boiling Point N/A
Density 19.3 g/cm³
Product Codes NCZ-145H
 

Bismuth Ferrite (BiFeO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”

$712.00

Product 

Bismuth Ferrite (BiFeO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.125''

CAS No.

 12010‑42‑3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 0.5–2 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

~312.82 g/mol

Melting Point

 ~1255 °C (bulk material)

Boiling Point

N/A

Density

~8.22 g/cm³

Product Codes

NCZ-2431K

Lanthanum Manganate (LaMnO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”

$712.00

Product 

Lanthanum Manganate (LaMnO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.125''

CAS No.

13538-87-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 ~1–5 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

240.83 g/mol

Melting Point

N/A

Boiling Point

N/A

Density

~6.3 – 6.8 g/cm³

Product Codes

NCZ-2142K

Zinc Sulfide (ZnS) Sputtering Targets, indium, Purity: 99.99%, Size: 2”, Thickness: 0.125”

$710.00

Product 

Zinc Sulfide (ZnS) Sputtering Targets, indium, Purity: 99.99%, Size: 2'', Thickness: 0.125''

CAS No.

1314-98-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 (ZnS) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

97.45 g/mol

Melting Point

~1700 °C

Boiling Point

N/A

Density

 4.09 g/cm³

Product Codes

NCZ-1501K

Tungsten Oxide Nanoparticles/Nanopowder ( WO3, 99.5%, APS <100nm)

Price range: $67.00 through $710.00
Select options This product has multiple variants. The options may be chosen on the product page
$67/25g
$151/100g $411/500g
$710/kg

Product 

Tungsten Oxide Nanoparticles/Nanopowder ( WO3, 99.5%, APS <100nm)

CAS No.

1314-35-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 

<100nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 231.84 g/mol

Melting Point

~1,470 °C

Boiling Point

~1,700–1,735 °C

Density

~7.16 g/cm³

Product Codes

NCZ-1202K

Silicon (Si) Sputtering Targets, P-type, indium, Purity: 99.999%, Size: 3”, Thickness: 0.125”

$710.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 7”, Thickness: 0.125”

$710.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 8”, Thickness: 0.125”

$710.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Silvery, shiny, hard, and brittle, chromium is a metal that resists corrosion and has a high mirror polish. The automotive industry finds extensive use for chromium sputtering targets. Chromium sputtering targets work well as a shiny coating for bumpers and wheels. Chromium sputtering targets can be employed in a variety of vacuum applications, such as automotive glass coatings.

Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 7”, Thickness: 0.125”

$710.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

(-OH) Functionalized Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: 28-48 nm

Price range: $42.00 through $710.00
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Applications:

Multi Walled Carbon Nanotubes have a wide range of possible uses in several industries. These applications span a variety of fields, including energy, chemistry, mechanics, and electric-electronics. It can be used for a number of things, including medication administration, biosensors, CNT composites, catalysis, nanoprobes, and hydrogen storage. 7, lithium-ion batteries, eight gas discharge tubes nine flat-panel screens, ten supercapacitors, and eleven transistors a dozen solar cells, 14 templates, 13 photoluminescence

(-OH) Functionalized Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: 18-28 nm

Price range: $44.00 through $710.00
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Applications:

Multi Walled Carbon Nanotubes have a wide range of possible uses in several industries. These applications span a variety of fields, including energy, chemistry, mechanics, and electric-electronics. Drug delivery, biosensors, CNT composites, catalysis, nanoprobes, and hydrogen storage are just a few applications for it. 7, lithium-ion batteries, eight gas discharge tubes nine flat-panel screens, ten supercapacitors, and eleven transistors a dozen solar cells, 14 templates, 13 photoluminescence

Quartz Wafer, (X-Cut), Size: 2”, 2-Side Polished, Thickness: 500 ± 25 μm

Price range: $57.00 through $710.00
Select options This product has multiple variants. The options may be chosen on the product page
1 piece/52 € 5 pieces/160 € 25 pieces/640 € Please contact us for quotes on larger quantities !!! 

Quartz Wafer

(X-Cut), Size: 2”, 2-Side Polished, Thickness: 500 ± 25 μm

Technical Properties:

Quality Prime
Materials Quartz
Size (inch) 2”
Orientation (X-Cut)
Coating
Thickness (μm) 500 ± 25
Doping
Resistivity (ohm.cm)
Polished Double Side
High working temperature, high corrosion resistivity, thermal conductivity and low dielectric loss are the specifications that make quartz wafers a good candidate for semiconductor, photomask, microwave filter and optical lense applications. Since quartz is a monocrystalline material with numerous different crystal orientations, it can be supplied in different cut versions. During this process high quality particles of quartz are positioned at the bottom of a vessel which is loaded with NaOH. Quartz starts to crystallize at around 400°C and between 1000 and 1500 bar pressure. This crystallization eventually creates monocrystals and may take even days. The generated quartz monocrystals are polished after being sliced into wafers and finally reveal Quartz 4”,(AT-Cut) Wafers. Quartz 4”,(X-Cut) has high thermal conductivity, high anti-corrosion, feature of high working temperature and good optical transmittance. For all these reasons Quartz Wafer is appropriate for the production of optical lenses, photomasks, microwave filters, semiconductors and for optical fiber applications.

Graphene Sheet, Size: 29 cm x 29 cm, Thickness: 35 µm, Highly Conductive

Price range: $63.00 through $709.00
Select options This product has multiple variants. The options may be chosen on the product page
Potential applications include: • Thermal management and heat spreading • EMI Shielding • Electrodes for batteries and Supercapacitors

Applications:

  • Consumer electronics: smartphones, tablets, PCs, TVs
  • LED lighting
  • Energy storage
  • Automotive
  • Industrial
  • Medical
  • Military and aerospace

Borosilicate Wafer, Size: 4”, 1-Side polished, Thickness: 700 ± 25 μm

Price range: $62.00 through $708.00
Select options This product has multiple variants. The options may be chosen on the product page
Boroslicate Wafer Size: 4”, 1-Side polished, Thickness: 700 ± 25 μm Technical Properties: Materials Borosilicate Size (inch) 4” Orientation Coating

Tungsten (VI) Oxide (WO3) 99.99% 4N Powder

$707.00
Product Tungsten (VI) Oxide (WO3) 99.99% 4N Powder
CAS No. 1314-35-8
Appearance Light Yellow
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 100nm (Size Can be customized),  Ask for other available size range.
Ingredient WO3
Molecular Weight 231.84 g/mol
Melting Point N/A
Boiling Point N/A
Density 7.16 g/cm³
Product Codes NCZ-583I
 

Nickel Sputtering Target Ni

Price range: $149.00 through $706.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Nickel Sputtering Target Ni
CAS No. 7440-02-0
Appearance Silvery-white lustrous metals
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Ni
Molecular Weight 58.69 g/mol
Melting Point 1453.0 °C
Boiling Point 2732.0 °C 
Density N/A
Product Codes NCZ-132H

Phosphorus (P) Micron Powder, Purity: 99.95%, Size: 1 µm, Metal Basis

Price range: $22.00 through $706.00
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Hydroxyapatite Microsphere(Ca10(PO4)6(OH)2, Spherical, 30-110um,, D50=60um,, Medical grade) (828982)

$705.00
Select options This product has multiple variants. The options may be chosen on the product page

Product 

Hydroxyapatite Microsphere(Ca10(PO4)6(OH)2, Spherical, 30-110um,, D50=60um,, Medical grade) (828982)

CAS No.

1306‑06‑5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

  30–110 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

~1004.7 g/mol

Melting Point

~1650–1670 °C

Boiling Point

N/A

Density

 ~3.16 g/cm³

Product Codes

NCZ-2605K

Hydroxyapatite Microsphere(Ca10(PO4)6(OH)2, Spherical, 5-35um, D50=15um, Medical grade) (826982)

$705.00
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Product 

Hydroxyapatite Microsphere(Ca10(PO4)6(OH)2, Spherical, 5-35um, D50=15um, Medical grade) (826982)

CAS No.

1306‑06‑5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 <15 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 ~1004.7 g/mol

Melting Point

~1650–1670 °C

Boiling Point

N/A

Density

 ~3.16 g/cm³

Product Codes

NCZ-2603K

Titanium Carbide (TiC) Sputtering Targets, Purity: 99.5%, Size: 3”, Thickness: 0.125”

$705.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Titanium Dioxide (TiO2) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”, Beige to White

$705.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Titanium Aluminum Nitride (Ti4AlN3) MAX Phase Micron-Powder

Price range: $370.00 through $704.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Titanium Aluminum Nitride (Ti4AlN3) MAX Phase Micron-Powder
CAS No. 60317-94-4
Appearance Dark gray to black
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1-40µm (Size Can be customized),  Ask for other available size range.
Ingredient Ti4AlN3
Molecular Weight 260.47 g/mol
Melting Point N/A
Boiling Point N/A
Density 4.74 g/cm³
Product Codes NCZ-574I
 

Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 7”, Thickness: 0.250”

$704.00

Product 

Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 7'', Thickness: 0.250''

CAS No.

7440-50-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

63.55 g/mol

Melting Point

1,084 °C

Boiling Point

 2,562 °C

Density

8.96 g/cm³

Product Codes

NCZ-2254K

4N (99.99%) Boron (B) 3-8mm Pieces Evaporation Materials

Price range: $143.00 through $704.00
Select options This product has multiple variants. The options may be chosen on the product page
Product 4N (99.99%) Boron (B) 3-8mm Pieces Evaporation Materials
CAS No. 7440-42-8
Appearance Black, brittle, crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 3-8mm (Size Can be customized),  Ask for other available size range.
Ingredient B
Molecular Weight 123.22 g/mol
Melting Point 2,076 °C
Boiling Point 3,927 °C
Density 2.46 g/cm³
Product Codes NCZ-166I

4N (99.99%) Boron (B) 3-8mm Pieces Evaporation Materials

Price range: $143.00 through $704.00
Select options This product has multiple variants. The options may be chosen on the product page
Product 4N (99.99%) Boron (B) 3-8mm Pieces Evaporation Materials
CAS No. 7440-42-8
Appearance Black, Semi-metallic
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 3–8mm (Size Can be customized),  Ask for other available size range.
Ingredient B
Molecular Weight 10.81 g/mol
Melting Point 2,079 °C
Boiling Point N/A
Density 2.34 g/cm3
Product Codes NCZ-149E
 

Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”

$702.00

Product 

Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.250''

CAS No.

7440-65-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

88.91 g/mol

Melting Point

1522 °C

Boiling Point

3338 °C

Density

4.47 g/cm³

Product Codes

NCZ-1518K

Germanium Oxide (GeO2) Powder, 99.9999% (6N) (Metal Basis), Ultra-High Purity

$700.00
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Product Germanium Oxide (GeO2) Powder, 99.9999% (6N) (Metal Basis), Ultra-High Purity
CAS No. 1310-53-8
Appearance White
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient GeO2
Molecular Weight 104.64 g/mol
Melting Point N/A
Boiling Point N/A
Density 4.228 g/cm³
Product Codes NCZ-354I
 

Titanium Boride (TiB2) Sputtering Targets, Purity: 99.5%, Size: 3”, Thickness: 0.125”

$700.00

Product 

Titanium Boride (TiB2) Sputtering Targets, Purity: 99.5%, Size: 3'', Thickness: 0.125''

CAS No.

 12045-63-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

69.49 g/mol

Melting Point

 ~3225 °C

Boiling Point

N/A

Density

 4.52 g/cm³

Product Codes

NCZ-1618K

Neodymium Sputtering Target Nd

Price range: $313.00 through $700.00
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Product Neodymium Sputtering Target Nd
CAS No. 7440-00-8
Appearance Silvery-white, metallic
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Nd
Molecular Weight 144.24 g/mol
Melting Point 1,021°C
Boiling Point N/A
Density N/A
Product Codes NCZ-130H