Praseodymium Nitrate Hexahydrate (Pr(NO3)3 · 6H2O) 99% 2N

Price range: $187.00 through $847.00
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Product Praseodymium Nitrate Hexahydrate (Pr(NO3)3 · 6H2O) 99% 2N
CAS No. 15012-76-5
Appearance Light green crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 10–50µm (Size Can be customized),  Ask for other available size range.
Ingredient Pr(NO3)3·6H2O
Molecular Weight 438.92 g/mol
Melting Point N/A
Boiling Point N/A
Density 2.3–2.5 g/cm³
Product Codes NCZ-503I
 

99% Anhydrous Zirconium(IV) Chloride (ZrCl4) Powder

Price range: $154.00 through $847.00
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Product 99% Anhydrous Zirconium(IV) Chloride (ZrCl4) Powder
CAS No. 10026-11-6
Appearance Black
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1-10μm. (Size Can be customized),  Ask for other available size range.
Ingredient ZrCl4
Molecular Weight 233.04 g/mol
Melting Point N/A
Boiling Point N/A
Density 2.8 g/cm³
Product Codes NCZ-210I
 

Tungsten Oxide (WO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”

$847.00

Product 

Tungsten Oxide (WO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.125''

CAS No.

1314-35-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

231.84 g/mol

Melting Point

1,473 °C

Boiling Point

1,700–1,850 °C

Density

7.16 g/cm³

Product Codes

NCZ-1574K

5N (99.999%) Antimony (Sb) Pieces Evaporation Materials

Price range: $154.00 through $847.00
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Product 5N (99.999%) Antimony (Sb) Pieces Evaporation Materials
CAS No. 7440-36-0
Appearance Silvery-gray, brittle metallic solid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Sb
Molecular Weight 121.76 g/mol
Melting Point 630.6 °C
Boiling Point 1,580 °C
Density 6.697 g/cm³
Product Codes NCZ-193I

10mL Hollow Gold Nanoshell in Water, 50μg/mL

$847.00
Product 10mL Hollow Gold Nanoshell in Water, 50μg/mL
CAS No. 7440-57-5
Appearance Brown to grayish
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 40–60nm (Size Can be customized),  Ask for other available size range.
Ingredient Au
Molecular Weight 196.97 g/mol
Melting Point N/A
Boiling Point N/A
Density 19.32 g/cm³
Product Codes NCZ-129I

5N (99.999%) Antimony (Sb) Pieces Evaporation Materials

Price range: $154.00 through $847.00
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Product 5N (99.999%) Antimony (Sb) Pieces Evaporation Materials
CAS No. 7440-36-0
Appearance Silvery, Lustrous Gray, Semi-metallic 
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1–10mm (Size Can be customized),  Ask for other available size range.
Ingredient Sb
Molecular Weight 121.76 g/mol
Melting Point N/A
Boiling Point N/A
Density 6.69 g/cm³
Product Codes NCZ-135E

Zinc Oxide (ZnO) with Alumina Sputtering Targets, indium, Purity: 99.99%, Size: 3”, Thickness: 0.125”

$847.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Tantalum (Ta) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.250”

$846.00

Product 

Tantalum (Ta) Sputtering Targets, Purity: 99.95%, Size: 4'', Thickness: 0.250''

CAS No.

 7440-25-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 180.95 g/mol

Melting Point

3017 °C

Boiling Point

 5458 °C

Density

16.65 g/cm³

Product Codes

NCZ-1660K

Graphitized Multi Walled Carbon Nanotubes, Purity: > 99.99%, Outside Diameter: 4-16 nm

Price range: $75.00 through $846.00
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Applications:

Multi Walled Carbon Nanotubes have a variety of potential applications in different fields. These applications include medicine, mechanics, electric-electronics, chemicals, energy and others. It can be applied in, 1-drug delivery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium batteries, 8-gas-discharge tubes, 9-flat panel displays, 10-supercapacitors, 11-transistors, 12-solar cells, 13-photoluminescence, 14-templates

Magnesium diboride(MgB2, 99%-99.9%, 200 mesh) (750530)

Price range: $655.00 through $845.00
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Magnesium diboride(MgB2, 99%-99.9%, 200 mesh) (750530)

Synonym: Magnesium boride

Product Codes- NCZ-2694K

Magnesium Oxide (MgO) Sputtering Targets, Purity: 99.95%, Size: 6”, Thickness: 0.250”

$845.00

Product 

Magnesium Oxide (MgO) Sputtering Targets, Purity: 99.95%, Size: 6'', Thickness: 0.250''

CAS No.

1309-48-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

40.30 g/mol

Melting Point

 ~2852 °C

Boiling Point

~3600 °C

Density

 ~3.58 g/cm³

Product Codes

NCZ-1965K

Molybdenum Disulfide (MoS2) Sputtering Targets, Purity: 99.9%, Size: 6”, Thickness: 0.250”

$845.00

Product 

Molybdenum Disulfide (MoS2) Sputtering Targets, Purity: 99.9%, Size: 6'', Thickness: 0.250''

CAS No.

 1317-33-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 160.07 g/mol

Melting Point

 ~1185 °C

Boiling Point

 ~4500 °C

Density

 ~5.06 g/cm³

Product Codes

NCZ-1910K

High Purity Graphene -N2 Functionalized (98%, 1~3nm)

Price range: $235.00 through $845.00
Select options This product has multiple variants. The options may be chosen on the product page
$235/1g $845/5g
Product High Purity Graphene -N2 Functionalized (98%, 1~3nm)
CAS No. 1034343-98-0
Appearance Black powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1-3nm (Size Can be customized),  Ask for other available size range.
Ingredient N/A
Molecular Weight N/A
Melting Point 3697 °C
Boiling Point 4200 °C
Density N/A
Product Codes NCZ-104G
 

Tantalum Carbide Nanopowder/ Nanoparticles ( TaC, 99.5%, <2um)

Price range: $155.00 through $845.00
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$155/100g
$475/500g
$845/1kg

Product 

Tantalum Carbide Nanopowder/ Nanoparticles ( TaC, 99.5%, <2um)

CAS No.

12070-06-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

<2 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

192.96 g/mol

Melting Point

~3,768–3,880 °C

Boiling Point

~4,780–5,470 °C

Density

~14.3–14.7 g/cm³

Product Codes

NCZ-1193K

Lithium Cobalt Oxide (LiCoO2) Coated Aluminum Foil

Price range: $198.00 through $845.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Specification Item Specification Product Name Lithium Cobalt Oxide (LiCoO2) Coated Aluminum Foil Substrate Aluminum Foil Substrate Thickness 20μm Foil Substrate

Lithium Cobalt Oxide (LiCoO2) Coated Aluminum Foil

Price range: $198.00 through $845.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Specification Item Specification Product Name Lithium Cobalt Oxide (LiCoO2) Coated Aluminum Foil Substrate Aluminum Foil Substrate Thickness 20μm Foil Substrate

Graphene Quantum Dots (1mg/ml) (GQD)

Price range: $65.00 through $845.00
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Applications of Graphene Quantum Dots

Due to their small size, biocompatibility and low toxicity Graphene Quantum Dots have better usage than graphene and graphene oxide in terms of medical applications like:
  • Drug delivery systems.
Due to their electrical and photoluminescence properties they can also be used in:
  • Bioimaging,
  • Solar cells,
  • LEDs,
  • Sensors,
  • Supercapacitors/microsupercapacitors.

Barium Fluoride (BaF2) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.250”

$844.00

Product 

Barium Fluoride (BaF2) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness: 0.250''

CAS No.

7787‑32‑8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

BaF₂ (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

175.32 g/mol

Melting Point

~1368–1390 °C

Boiling Point

~2260 °C

Density

~4.89–4.9 g/cm³

Product Codes

NCZ-1401K

Chromium Oxide (Cr2O3) Sputtering Targets, Purity: 99.8%-99.9%, Size: 4”, Thickness: 0.250”

$844.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

The inorganic chemical with the formula Cr2O3 is chromium oxide. Applications for chromium oxide sputtering targets are numerous. Let's examine a few instances where chromium oxide sputtering targets are employed instead. Low friction coefficients and high hardness values are displayed by Cr2O3 thin films. Because of these qualities, chromium oxide is a strong contender to take the place of Al2O3 or transition metal nitrides in certain applications.

Chromium Oxide (Cr2O3) Sputtering Targets, Purity: 99.8%-99.9%, Size: 4”, Thickness: 0.250”

$844.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

The inorganic chemical with the formula Cr2O3 is chromium oxide. Applications for chromium oxide sputtering targets are numerous. Let's examine a few instances where chromium oxide sputtering targets are employed instead. Low friction coefficients and high hardness values are displayed by Cr2O3 thin films. Because of these qualities, chromium oxide is a strong contender to take the place of Al2O3 or transition metal nitrides in certain applications.

Lithium Iron Phosphate (LiFePO4) Coated Aluminum Foil

Price range: $198.00 through $844.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Specification   Item Specification Product Name Lithium Iron Phosphate (LiFePO4) Coated Aluminum Foil Substrate Aluminum Foil Substrate Thickness 20μm Foil

Carbon-Coated Aluminum Foil

Price range: $198.00 through $844.00
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Product Specification Item Specification Product Name Carbon-Coated Aluminum Foil Substrate Aluminum Foil Substrate Thickness 20μm Foil Substrate Width 210±0.5mm Foil Substrate Length

Lithium Iron Phosphate (LiFePO4) Coated Aluminum Foil

Price range: $198.00 through $844.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Specification   Item Specification Product Name Lithium Iron Phosphate (LiFePO4) Coated Aluminum Foil Substrate Aluminum Foil Substrate Thickness 20μm Foil

Carbon-Coated Aluminum Foil

Price range: $198.00 through $844.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Specification Item Specification Product Name Carbon-Coated Aluminum Foil Substrate Aluminum Foil Substrate Thickness 20μm Foil Substrate Width 210±0.5mm Foil Substrate Length

vNeodymium Oxide (Nd2O3) Micron Powder, Purity: 99.99%, Size: 325 mesh

Price range: $71.00 through $844.00
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Applications:

Neodymium oxide is used in solid state laser manufacturing. It is used as a dopant in glass to color the glass and to improve its properties. It gives purple color when is doped to glass and give dichroic properties to it.

Barium (Ba) Micron Powder, Purity: 99.9+%, Size: 325 mesh

Price range: $14.00 through $844.00
Select options This product has multiple variants. The options may be chosen on the product page
5 grams/13 € 25 grams/46 €                      
100 grams/114 €                    
500 grams/435 €                   
1000 grams/745 € Please contact us for quotes on larger quantities !!!

Barium (Ba) Micron Powder

Purity: 99.9+%, Size: 325 mesh

3N (99.9%) Chromium Oxide Cr2O3 Pieces Evaporation Materials

Price range: $154.00 through $843.00
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Product 3N (99.9%) Chromium Oxide Cr2O3 Pieces Evaporation Materials
CAS No. 1308-38-9
Appearance Green, Crystalline Solid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1–6mm (Size Can be customized),  Ask for other available size range.
Ingredient Cr2O3
Molecular Weight 151.99 g/mol
Melting Point 1,529 °C
Boiling Point N/A
Density 5.22 g/cm3
Product Codes NCZ-163E
 

Silicon Carbide (SiC) Sputtering Targets, indium, Purity: 99.5%, Size: 2”, Thickness: 0.125”

$843.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Short Single Walled Carbon Nanotubes, Purity: > 65%, SSA: 400 m2/g

Price range: $73.00 through $843.00
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Short Single Walled Carbon Nanotubes

Purity: > 65%, SSA: 400 m2/g, black

Short single walled carbon nanotubes (SWCNTs, SWNTs) comprise of one-atom-thick sheets of graphene that rolled up to form long hollow tubes. Short SWCNTs possess exceptional thermal, mechanical and electrical properties. These remarkable properties lead to advances in performance in a wide range of materials and devices. Short Single-walled carbon nanotubes are actively used in diverse area including energy storage, molecular electronics, nanomechanial devices, composites and bio-sensing. We sell a range of Short Single Wall Carbon Nanotubes with different purities and lengths with low prices.

Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”

$842.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered. By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized. There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering. An inorganic substance is lead zirconium titanate. This ceramic perovskite material has a strong piezoelectric effect, which means that when an electric field is applied, the compound changes shape. Lead zirconium titanate is employed in a number of practical applications such as ultrasonic transducers and piezoelectric resonators.  

Bismuth Ferrite (BiFeO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”

$841.00

Product 

Bismuth Ferrite (BiFeO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''

CAS No.

 12010‑42‑3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 0.5–2 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

~312.82 g/mol

Melting Point

 ~1255 °C (bulk material)

Boiling Point

N/A

Density

~8.22 g/cm³

Product Codes

NCZ-2429K

3N (99.9%) Cerium (Ce) Pieces Evaporation Materials

Price range: $264.00 through $841.00
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Product 3N (99.9%) Cerium (Ce) Pieces Evaporation Materials
CAS No. 1313-27-5
Appearance Silvery White, Metallic 
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 3mm (Size Can be customized),  Ask for other available size range.
Ingredient Ce
Molecular Weight 143.95 g/mol
Melting Point 798 °C
Boiling Point 3,360 °C
Density 4.69 g/cm³
Product Codes NCZ-133E

Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”

$840.00

Product 

Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.125''

CAS No.

7440-65-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

88.91 g/mol

Melting Point

1522 °C

Boiling Point

3338 °C

Density

4.47 g/cm³

Product Codes

NCZ-1517K

Tantalum (Ta) Sputtering Targets, Purity: 99.95%, Size: 8”, Thickness: 0.250”

$840.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Lithium Titanate (Li2TiO3) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.250”

$838.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Fullerene-C70, Purity: 95%

Price range: $185.00 through $838.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

1. Pharmaceutical: Diagnostic reagents, super drugs, cosmetics, nuclear magnetic resonance (NMR) with the developer. DNA affinity 2. Energy: Solar battery, fuel cell, secondary battery. 3. Industry: Wear resistant material, flame retardant materials, lubricants, polymer additives, high-performance membrane, catalyst, artificial diamond, hard alloy, electric viscous fluid, ink filters, high-performance coatings, fire retardant coatings, manufacturing bioactive materials , memory materials, embedded molecular and other characteristics, composite materials etc. 4. Information industry: Semiconductor record medium, magnetic materials, printing ink, toner, ink, paper special purposes. 5. Electronic parts: Superconducting semiconductor, diodes, transistors, inductor. 6. Optical materials, electronic camera, fluorescence display tube, nonlinear optical materials. 7. Environment: Gas adsorption, gas storage.

Cubic Boron Nitride (CBN) Superabrasive Micropowder

Price range: $429.00 through $836.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Cubic Boron Nitride (CBN) Superabrasive Micropowder
CAS No. 10043-11-5
Appearance Black or dark gray
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 0.5–1µm (Size Can be customized),  Ask for other available size range.
Ingredient Bn
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 1.9 to 2.1 g/cm³
Product Codes NCZ-332I

Cobalt Sputtering Target Co

Price range: $344.00 through $836.00
Select options This product has multiple variants. The options may be chosen on the product page
Product
Cobalt Sputtering Target Co
CAS No. 7440-48-4
Appearance Solid, silvery-gray metallic with a slightly bluish tint
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Co
Molecular Weight 58.93 g/mol
Melting Point N/A
Boiling Point N/A
Density 8.90 g/cm³
Product Codes NCZ-112H
 

3-O-Ethyl-L-ascorbic acid (335637)

$835.00
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3-O-Ethyl-L-ascorbic acid (335637)

INCI Name  3-O-Ethyl Ascorbic Acid CAS No.  86404-04-8 MW  204.18 MF  C8H12O6 Structure     Functions        Inhibits the activity of Tyrosinase, prevents the formation of Melanin; Resists inflammation caused by sunburn; Improves skin’s complexion, promotes the synthesis of collagen, enhances skin’s elasticity.   Application Whitening agent, antioxidant agent, anti-ageing agent, anti-inflammatory agent. Suitable to lotion, gel, essence and emulsion, etc. The suggested pH is between 3.0-6.0.   Specifications
 Item Standards
Appearance White to off-white crystalline powder
Content of water ≤1.00%
pH(3% solution) 3.00-4.50
Solubility (100g/L) Colorless to light yellow, clear liquid
Melting point 111.0-116.0 ℃
Purity ≥99.0%
Total bacteria < 100 CFU/g
Yeast and mold < 10 CFU/g
Hg < 0.05 mg/kg
Ar < 2 mg/kg
Pb < 5 mg/kg
Usage 0.1~3.0%. Applicable to whitening products and anti-wrinkle/anti-aging products.   Adding method Evenly dissolved in deionized water at about 50°C.   Package                                                                                                1.0kg/aluminum foil bag, 10 aluminum foil bags/carton.   Storage Stored in sealed receptacles at room temperature, away from the light and moisture, two-year validity.
Product Codes- NCZ-2710K

Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”

$835.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

An inorganic substance is lead zirconium titanate. This ceramic perovskite material has a strong piezoelectric effect, which means that when an electric field is applied, the compound changes shape. Lead zirconium titanate is employed in a number of practical applications such as ultrasonic transducers and piezoelectric resonators.

Chromium Diboride, CrB2, 99% Powder, 1 kg

$834.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Chromium Diboride, CrB2, 99% Powder, 1 kg
CAS No. 12007-16-8
Appearance Gray to black crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 10μm (Size Can be customized),  Ask for other available size range.
Ingredient CrB2
Molecular Weight 73.62 g/mol
Melting Point N/A
Boiling Point N/A
Density 5.15 g/cm³
Product Codes NCZ-320I
 

Zinc Oxide (ZnO) Sputtering Targets, elastomer, Purity: 99.9%, Size: 2”, Thickness: 0.125”

$834.00

Product 

Zinc Oxide (ZnO) Sputtering Targets, elastomer, Purity: 99.9%, Size: 2'', Thickness: 0.125''

CAS No.

1314-13-2

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 (ZnO) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

81.38 g/mol

Melting Point

1975 °C

Boiling Point

N/A

Density

5.61 g/cm³

Product Codes

NCZ-1497K

Lithium Cobalt Oxide (LiCoO2) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”

$834.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Formula LiCoO2 represents the chemical compound lithium cobalt oxide. A crystalline solid that is dark blue or bluish-gray in color, lithium cobalt oxide is frequently utilized in the positive electrodes of lithium-ion batteries.

Calcium Fluoride (CaF2) Sputtering Target

Price range: $316.00 through $833.00
Select options This product has multiple variants. The options may be chosen on the product page

Product 

Calcium Fluoride (CaF2) Sputtering Target

CAS No.

 7789‑75‑5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

78.07–78.08 g/mol

Melting Point

~1,418 °C

Boiling Point

 ~2,533 °C

Density

≈ 3.18–3.2 g/cm³

Product Codes

NCZ-1385K

Calcium Fluoride (CaF2) Sputtering Target

Price range: $316.00 through $833.00
Select options This product has multiple variants. The options may be chosen on the product page

Product 

Calcium Fluoride (CaF2) Sputtering Target

CAS No.

 7789‑75‑5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

78.07–78.08 g/mol

Melting Point

~1,418 °C

Boiling Point

 ~2,533 °C

Density

≈ 3.18–3.2 g/cm³

Product Codes

NCZ-1385K

Titanium Carbide (TiC) Sputtering Target

Price range: $316.00 through $833.00
Select options This product has multiple variants. The options may be chosen on the product page

Product 

Titanium Carbide (TiC) Sputtering Target

CAS No.

 12070‑08‑5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

59.89 g/mol

Melting Point

3,140–3,160 °C

Boiling Point

4,820 °C

Density

4.93 g/cm³

Product Codes

NCZ-1383K

Zirconium Oxide (ZrO2) Sputtering Target

Price range: $316.00 through $833.00
Select options This product has multiple variants. The options may be chosen on the product page

Product 

Zirconium Oxide (ZrO2) Sputtering Target

CAS No.

 1314‑23‑4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

123.22 g/mol

Melting Point

2 715 °C

Boiling Point

~4 300 °C

Density

~5.68 g/cm³

Product Codes

NCZ-1381K

Lead Oxide (PbO) Sputtering Target

Price range: $316.00 through $833.00
Select options This product has multiple variants. The options may be chosen on the product page

Product 

Lead Oxide (PbO) Sputtering Target

CAS No.

1317-36-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

223.20 g/mol

Melting Point

 888 °C

Boiling Point

 1470 °C

Density

9.53 g/cm³

Product Codes

NCZ-1373K

Tellurium (Te) Sputtering Target

Price range: $316.00 through $833.00
Select options This product has multiple variants. The options may be chosen on the product page

Product 

Tellurium (Te) Sputtering Target

CAS No.

13494-80-9

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 127.60 g/mol

Melting Point

449.5 °C

Boiling Point

 988 °C

Density

6.24 g/cm³

Product Codes

NCZ-1361K

Strontium Titanate Sputtering Target SrTiO3

Price range: $632.00 through $833.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Strontium Titanate Sputtering Target SrTiO3
CAS No. 12060-59-2
Appearance Off-white to grey
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient SrTiO3
Molecular Weight 183.49 g/mol
Melting Point 2,080 °C
Boiling Point N/A
Density 5.11 g/cm3
Product Codes NCZ-140H

Lanthanum Aluminate (LaAlO3) Sputtering Targets, indium, Purity: 99.9%, Size: 2”, Thickness: 0.125”

$833.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Lanthanum Aluminate (LaAlO3) Sputtering Targets, indium, Purity: 99.9%, Size: 2”, Thickness: 0.125”

$833.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”

$832.00

Product 

Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.250''

CAS No.

 12201-04-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

<5 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 234.77 g/mol (exact ~234.839 g/mol)

Melting Point

 Approx. 2,200 °C

Boiling Point

N/A

Density

N/A

Product Codes

NCZ-2091K

Tantalum (Ta) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.125”

$832.00

Product 

Tantalum (Ta) Sputtering Targets, Purity: 99.95%, Size: 4'', Thickness: 0.125''

CAS No.

 7440-25-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 180.95 g/mol

Melting Point

3017 °C

Boiling Point

 5458 °C

Density

16.65 g/cm³

Product Codes

NCZ-1661K

Barium Titanate (BaTiO3) Sputtering Targets, elastomer, Purity: 99.99%, Size: 1”, Thickness: 0.125”

$831.00

Product 

Barium Titanate (BaTiO3) Sputtering Targets, elastomer, Purity: 99.99%, Size: 1'', Thickness: 0.125''

CAS No.

 12047‑27‑7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

1 – 5 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

~233.19 g/mol

Melting Point

~1625 °C

Boiling Point

N/A

Density

 ~6.02 g/cm³

Product Codes

NCZ-2452K

Nickel Oxide (NiO) Sputtering Targets, Purity: 99.9%, Size:2”, Thickness: 0.250”

$831.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Graphene Oxide Dispersion, 8 mg/mL, in H2O

Price range: $42.00 through $830.00
Select options This product has multiple variants. The options may be chosen on the product page
Graphene Oxide Dispersion Purity: 99,5+%, 8 mg/mL, in H2O Graphene Oxide (GO) is the oxidized form of graphene nanoplatelets. It can be

Graphene Oxide Dispersion, 8 mg/mL, in H2O

Price range: $42.00 through $830.00
Select options This product has multiple variants. The options may be chosen on the product page

 Applications:

  • Graphite oxide, formerly called graphitic oxide or graphitic acid, is a compound of carbonoxygen, and hydrogen in variable ratios, obtained by treating graphite with strong oxidizers.
  • Graphene The maximally oxidized bulk product is a yellow solid with C:O ratio between 2.1 and 2.9, that retains the layer structure of graphite but with a much larger and irregular spacing.
  • Graphene The bulk material disperses in basic solutions to yield monomolecular sheets, known as graphene oxide by analogy to graphene, the single-layer form of graphite.
  • Graphene oxide sheets have been used to prepare strong paper-like materials, membranes, thin films, and composite materials.
  • Initially graphene oxide attracted substantial interest as a possible intermediate for the manufacture of graphene.
  • The graphene obtained by reduction of graphene oxide still has many chemical and structural defects which is a problem for some applications but an advantage for some others. 

Silicon (Si) Sputtering Targets, P-type, indium, Purity: 99.999%, Size: 3”, Thickness: 0.125”

$829.00

Product 

Silicon (Si) Sputtering Targets, P-type, indium, Purity: 99.999%, Size: 3'', Thickness: 0.125''

CAS No.

7440-21-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

28.0855 g/mol

Melting Point

 1,414 °C

Boiling Point

3,265 °C

Density

 2.33 g/cm³

Product Codes

NCZ-1739K

Magnesium Oxide (MgO) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.125”

$828.00

Product 

Magnesium Oxide (MgO) Sputtering Targets, Purity: 99.95%, Size: 2'', Thickness: 0.125''

CAS No.

1309-48-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

40.30 g/mol

Melting Point

 ~2852 °C

Boiling Point

~3600 °C

Density

 ~3.58 g/cm³

Product Codes

NCZ-1974K