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Lithium (Li) Foil Thickness:0.6 mm, Width: 25 mm, Length: 100 mm, Purity: 99.9%

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Price range: $85.00 through $1,532.00
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APPLICATION AREAS
Lithium foil is used as an anode material in lithium ion batteries due to its high energy density. Lithium foil is wound in cylindrical cells in order to achieve a greater surface area. In button battery cells, lithium anodes can be stamped from lithium foil or cut from lithium rods.
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Holmium (Ho) Micron Powder, Purity: 99.5 %, Size: 325 mesh

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Price range: $24.00 through $1,531.00
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Applications:

Holmium has the highest magnetic moment of any naturally occurring element. It can be found in minerals such as gadolinite and monazite. It is stable in dry air at room temperature, but it oxidises rapidly in moist air and at elevated temperatures. Holmium has application in glass and ceramic manufacturing. It is used as a yellow and red glass colouriser. It is also used in cubic zirconia to give dichroic colour in yellow. Because of its high magnetic moment Holmium is used to create strong artificial magnetic fields. It is also used in microwave equipments that are used for eye-safe medical and dental technologies.
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Barium Fluoride (BaF2) Sputtering Targets, Purity: 99.99%, Size: 5”, Thickness: 0.125”

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$1,530.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered. With the sputtering target's assistance, the

It is possible to identify the target material and even detect incredibly tiny impurity amounts.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

A chemical compound consisting of barium and fluorine, barium fluoride (BaF2) is a salt. It is a solid that has the potential to be a clear crystal. One chemical compound for the 10–20 µm wavelength infrared area is barium fluoride. Enamel, glazing frits, and aluminum metallurgy all use barium fluoride.

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Barium Fluoride (BaF2) Sputtering Targets, Purity: 99.99%, Size: 5”, Thickness: 0.250”

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$1,530.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. When the target shatters,

Mass spectrometry measures the concentration and identity of sputtered atoms. The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

A chemical compound consisting of barium and fluorine, barium fluoride (BaF2) is a salt. It is a solid that has the potential to be a clear crystal. A is barium fluoride.

Bismuth Ferrite (BiFeO3) Sputtering Targets, Purity: 99.9%, Size: 8'', Thickness: 0.125''
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Bismuth Ferrite (BiFeO3) Sputtering Targets, Purity: 99.9%, Size: 8”, Thickness: 0.125”

$1,528.00
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Product 

 Bismuth Ferrite (BiFeO3) Sputtering Targets, Purity: 99.9%, Size: 8'', Thickness: 0.125''

CAS No.
 12010‑42‑3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 0.5–2 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 ≈ 312.82 g/mol

Melting Point

 ≈ 960 °C

Boiling Point

N/A

Density

  ≈ 8.34 g/cm³

Product Codes

NCZ-2417K
Surface Functionalized Superparamagnetic Iron Oxide Nanoparticle (SPION) High Concentration Suspension
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Surface Functionalized Superparamagnetic Iron Oxide Nanoparticle (SPION) High Concentration Suspension

Price range: $491.00 through $1,525.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Surface Functionalized Superparamagnetic Iron Oxide Nanoparticle (SPION) High Concentration Suspension
CAS No. 1317-61-9
Appearance Dark brown to black
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 12nm (Size Can be customized),  Ask for other available size range.
Ingredient Fe3O4-X
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-546I
99.95% (3N5) Anhydrous Indium Chloride (InCl3)
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99.95% (3N5) Anhydrous Indium Chloride (InCl3)

Price range: $425.00 through $1,525.00
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Product 99.95% (3N5) Anhydrous Indium Chloride (InCl3)
CAS No. 10025-82-8
Appearance White to off-white crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 5–20µm (Size Can be customized),  Ask for other available size range.
Ingredient InCl3
Molecular Weight 221.17 g/mol
Melting Point N/A
Boiling Point N/A
Density 3.56 g/cm³
Product Codes NCZ-232I
 
3N5 (99.95%) Cobalt (Co) Pellets Evaporation Materials
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3N5 (99.95%) Cobalt (Co) Pellets Evaporation Materials

Price range: $87.00 through $1,525.00
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Product 3N5 (99.95%) Cobalt (Co) Pellets Evaporation Materials
CAS No. 7440-48-4
Appearance Lustrous, Metallic, Greyish Tinge
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A.
Ingredient Co
Molecular Weight 58.93 g/mol
Melting Point 1495 °C
Boiling Point 2,870 °C
Density 8.9 g/cm3
Product Codes NCZ-143E
Lanthanum Manganate (LaMnO3) Sputtering Targets, Purity: 99.9%, Size: 5'', Thickness: 0.125''
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Lanthanum Manganate (LaMnO3) Sputtering Targets, Purity: 99.9%, Size: 5”, Thickness: 0.125”

$1,523.00
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Product 

 Lanthanum Manganate (LaMnO3) Sputtering Targets, Purity: 99.9%, Size: 5'', Thickness: 0.125''

CAS No.

13538-87-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 ~1–5 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 240.83 g/mol

Melting Point

 ~2300 °C

Boiling Point

N/A

Density

 ~6.3 – 6.8 g/cm³

Product Codes

NCZ-2135K
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 8'', Thickness: 0.250''
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Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 8”, Thickness: 0.250”

$1,523.00
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Product 

 Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 8'', Thickness: 0.250''

CAS No.

12031‑18‑4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 ~1–5 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  ~245.6 g/mol

Melting Point

N/A

Boiling Point

N/A

Density

  ~6.5 – 7.2 g/cm³ (depends on sintering quality)

Product Codes

NCZ-2112K
Molybdenum Disulfide (MoS2) Sputtering Targets, Purity: 99.9%, Size: 8'', Thickness: 0.125''
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Molybdenum Disulfide (MoS2) Sputtering Targets, Purity: 99.9%, Size: 8”, Thickness: 0.125”

$1,522.00
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Product 

 Molybdenum Disulfide (MoS2) Sputtering Targets, Purity: 99.9%, Size: 8'', Thickness: 0.125''

CAS No.

 1317-33-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  160.07 g/mol

Melting Point

 ~1185 °C

Boiling Point

 ~4500 °C

Density

  ~5.06 g/cm³

Product Codes

NCZ-1909K
Ytterbium (Yb) Sputtering Target
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Ytterbium (Yb) Sputtering Target

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Price range: $328.00 through $1,520.00
Select options This product has multiple variants. The options may be chosen on the product page

Product 

 Ytterbium (Yb) Sputtering Target

CAS No.

7440‑64‑4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 50.9415 g/mol

Melting Point

~824 °C

Boiling Point

~1,196 °C

Density

 ~6.9 g/cm³

Product Codes

NCZ-1309K
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Water Soluble Cadmium Selenide Quantum Dots (CdSe/ZnS) 450 nm

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Price range: $460.00 through $1,520.00
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APPLICATIONS

Water Soluble CdSe QDs have several sectors of application since they are biocompatible. Uses for water-soluble CdSe quantum dots include;

  • Heavy Metal Detection,
  • Bioconjugation,
  • Optoelectronic devices,
  • Biological imaging.
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Water Soluble Cadmium Selenide Quantum Dots (CdSe/ZnS) 470 nm

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Price range: $460.00 through $1,520.00
Select options This product has multiple variants. The options may be chosen on the product page

APPLICATIONS

Water Soluble CdSe QDs have several sectors of application since they are biocompatible. Uses for water-soluble CdSe quantum dots include;

  • Heavy Metal Detection,
  • Bioconjugation,
  • Optoelectronic devices,
  • Biological imaging.
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Water Soluble Cadmium Selenide Quantum Dots (CdSe/ZnS) 500 nm

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Price range: $460.00 through $1,520.00
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APPLICATIONS

Water Soluble CdSe QDs offer a wide range of applications because of their biocompatibility. Utilizing Water Soluble CdSe Quantum Dots in;

  • Heavy Metal Detection,
  • Bioconjugation,
  • Optoelectronic devices,
  • Biological imaging.
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Water Soluble Cadmium Selenide Quantum Dots (CdSe/ZnS) 525 nm

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Price range: $460.00 through $1,520.00
Select options This product has multiple variants. The options may be chosen on the product page

APPLICATIONS

Water Soluble CdSe QDs have several sectors of application since they are biocompatible. Uses for water-soluble CdSe quantum dots include;

  • Heavy Metal Detection,
  • Bioconjugation,
  • Optoelectronic devices,
  • Biological imaging.
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Water Soluble Cadmium Selenide Quantum Dots (CdSe/ZnS) 545 nm

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Price range: $460.00 through $1,520.00
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APPLICATIONS

Water Soluble CdSe QDs have several sectors of application since they are biocompatible. Uses for water-soluble CdSe quantum dots include;

  • Heavy Metal Detection,
  • Bioconjugation,
  • Optoelectronic devices,
  • Biological imaging.
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Water Soluble Cadmium Selenide Quantum Dots (CdSe/ZnS) 625 nm

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Price range: $0.00 through $1,520.00
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APPLICATIONS Water-soluble CdSe QDs have several sectors of application since they are biocompatible. Uses for water-soluble CdSe quantum dots include;
  • Heavy Metal Detection
  • Bioconjugation
  • Optoelectronic devices,
  • Biological imaging.
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Multi Walled Carbon Nanotubes N-butanol Dispersion, 4 wt%, Purity: > 95%, OD: 8-16 nm, Length: 45 µm

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Price range: $313.00 through $1,519.00
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Multi Walled Carbon Nanotubes N-butanol Dispersion 4 wt%, Purity: > 95+ %, OD: 8-16 nm, Length: 45 µm Technical Properties: Purity
Bismuth Telluride (Bi2Te3) Sputtering Targets, Purity: 99.999%, Size: 3'', Thickness: 0.125''
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Bismuth Telluride (Bi2Te3) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.125”

$1,518.00
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Product 

 Bismuth Telluride (Bi2Te3) Sputtering Targets, Purity: 99.999%, Size: 3'', Thickness: 0.125''

CAS No.
 1304-82-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 800.55 g/mol

Melting Point

 ~585 °C

Boiling Point

~987 °C (sublimes)

Density

  ~7.7 g/cm³

Product Codes

NCZ-2400K
Bismuth Telluride (Bi2Te3) Sputtering Targets, Purity: 99.999%, Size: 3'', Thickness: 0.250''
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Bismuth Telluride (Bi2Te3) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.250”

$1,518.00
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Product 

 Bismuth Telluride (Bi2Te3) Sputtering Targets, Purity: 99.999%, Size: 3'', Thickness: 0.250''

CAS No.
 1304-82-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 800.55 g/mol

Melting Point

 ~585 °C

Boiling Point

~987 °C (sublimes)

Density

  ~7.7 g/cm³

Product Codes

NCZ-2399K
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Cadmium Selenide Quantum Dots (CdSe/ZnS QD) 645 nm

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Price range: $590.00 through $1,515.00
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APPLICATIONS CdSe QDs have several uses because of their photoluminescence and electroluminescence capabilities. Using CdSe quantum dots in;
  • Bioimaging,
  • Light Emitting Diodes (LEDs),
  • Solar Cell,
  • Sensors,
  • Single-electron transistors,
  • Display devices.
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Prime FZ-Si Wafer, Size: 4”, Orientation: (100), Phosphor Doped, Resistivity: 3000 – 100000 (ohm.cm), 2-Side Polished, Thickness: 200 ± 10 μm

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Price range: $89.00 through $1,515.00
Select options This product has multiple variants. The options may be chosen on the product page
1 piece/81 € 5 pieces/305 € 25 pieces/1365 € Please contact us for quotes on larger quantities !!! 

Prime FZ-Si Wafer

Size: 4”, Orientation: (100), Phosphor Doped, 2-Side Polished, Thickness: 200 ± 10 μm

Technical Properties:

Quality Prime
Materials FZ-Si
Size (inch) 4”
Orientation (100)
Coating
Thickness (μm) 200 ± 10
Doping Phosphor
Resistivity (ohm.cm) 3000 - 100000
Polished Double Side
Float zone is referred as a very pure silicon that is produced by vertical zone melting. Compared to Czochralski method, crystals of FZ Silicon have higher purities. Light impurities in FZ Si wafers provides a chance to control some of the defects and increase the mechanical strength. Flat zone silicons have very high resistivity distribution so they are specially used in detectors. There are some other properties that are needed to prevent detector noises. Some of these properties are minority carrier lifetime and bulk generation current. However, these two properties weigh less than the crstalline structure and purity of the wafer. Additionally multiple zone refining can be performed on a rod to further reduce the impurity concentrations.
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Prime FZ-Si Wafer, Size: 4”, Orientation: (100), Phosphor Doped, Resistivity: 5000 – 500000 (ohm.cm), 2-Side Polished, Thickness: 300 ± 10 μm

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Price range: $89.00 through $1,515.00
Select options This product has multiple variants. The options may be chosen on the product page
1 piece/81 € 5 pieces/305 € 25 pieces/1365 € Please contact us for quotes on larger quantities !!! 

Prime FZ-Si Wafer

Size: 4”, Orientation: (100), Phosphor Doped, 2-Side Polished, Thickness: 300 ± 10 μm

Technical Properties:

Quality Prime
Materials FZ-Si
Size (inch) 4”
Orientation (100)
Coating
Thickness (μm) 300 ± 10
Doping Phosphor
Resistivity (ohm.cm) 5000 - 500000
Polished Double Side
Float zone is referred as a very pure silicon that is produced by vertical zone melting. Compared to Czochralski method, crystals of FZ Silicon have higher purities. Light impurities in FZ Si wafers provides a chance to control some of the defects and increase the mechanical strength. Flat zone silicons have very high resistivity distribution so they are specially used in detectors. There are some other properties that are needed to prevent detector noises. Some of these properties are minority carrier lifetime and bulk generation current. However, these two properties weigh less than the crstalline structure and purity of the wafer. Additionally multiple zone refining can be performed on a rod to further reduce the impurity concentrations.
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Lithium Phosphate (Li3PO4) Sputtering Targets, elastomer, Purity: 99.95%, Size: 4”, Thickness: 0.125”

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$1,514.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Tungsten Oxide (WO3) Sputtering Targets, indium, Purity: 99.9%, Size: 2'', Thickness: 0.125''
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Tungsten Oxide (WO3) Sputtering Targets, indium, Purity: 99.9%, Size: 2”, Thickness: 0.125”

$1,512.00
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Product 

 Tungsten Oxide (WO3) Sputtering Targets, indium, Purity: 99.9%, Size: 2'', Thickness: 0.125''

CAS No.

1314-35-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 231.84 g/mol

Melting Point

1,473 °C

Boiling Point

1,700–1,850 °C

Density

 7.16 g/cm³

Product Codes

NCZ-1566K
3N (99.9%) Gadolinium (Gd) Pieces Evaporation Materials
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3N (99.9%) Gadolinium (Gd) Pieces Evaporation Materials

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Price range: $352.00 through $1,507.00
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Product 3N (99.9%) Gadolinium (Gd) Pieces Evaporation Materials
CAS No. N/A
Appearance Grayish White, Semi-Metallic
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A.
Ingredient Ge
Molecular Weight N/A
Melting Point 937 °C
Boiling Point N/A
Density N/A
Product Codes NCZ-148E
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vLanthanum Hexaboride (LaB6) Micron Powder, High Purity: 99.99%, Size: 1.5-18 µm

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Price range: $103.00 through $1,505.00
Select options This product has multiple variants. The options may be chosen on the product page
25 grams/95 € 100 grams/284 € 500 grams/845 € 1000 grams/1380 €
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Lanthanum Hexaboride (LaB6) Micron Powder

High Purity: 99.99%, Size: 1.5-18 µm

Technical Properties:

Purity (%) 99.99
Average Particle Size (µm) 1.5-18
Density (g/cm3) 2,7
Melting Point (°C) 2210.0

Applications:

Lanthanum hexaboride powder main application is in hot cathodes. It is used as a single crystal ar as a coating in hot cathods. It is also used in electronics, radar aerospace, and infrared application. It has application in X-ray powder diffraction instrument as size/strain standard for the calibration of the instrument.  
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 6'', Thickness: 0.125''
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Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 6”, Thickness: 0.125”

$1,504.00
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Product 

 Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 6'', Thickness: 0.125''

CAS No.
 1306-38-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  172.11 g/mol

Melting Point

 2,400–2,600 °C

Boiling Point

Sublimes above 3,000 °C

Density

  7.13 g/cm³

Product Codes

NCZ-2324K
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Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”

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$1,500.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

An inorganic substance is lead zirconium titanate. This ceramic perovskite material has a strong piezoelectric effect, which means that when an electric field is applied, the compound changes shape. Lead zirconium titanate is employed in a number of practical applications such as ultrasonic transducers and piezoelectric resonators.

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Multi Walled Carbon Nanotubes Ethanol Dispersion, 3 wt%, Purity: > 95%, OD: 18-28 nm, Length: 8-28 µm

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Price range: $312.00 through $1,500.00
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Multi Walled Carbon Nanotubes Ethanol Dispersion 3 wt%, Purity: > 95+ %, OD: 18-28 nm, Length: 8-28 µm Technical Properties: Purity
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Fullerene-C70, Purity: 99.5%

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Price range: $319.00 through $1,500.00
Select options This product has multiple variants. The options may be chosen on the product page
1 gram/285 € 5 grams/1340 €                          
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Fullerene-C70

Purity: 99.5% 

Technical Properties:

Fullerene Compound Formula C70
Fullerene  Molecular Weight 840.77 g/mol
Fullerene  Purity 99.5%
Fullerene  Melting Point >280 °C
Fullerene  Appearance Black Powder
Fullerene  CAS 115383-22-7

Applications:

1. Pharmaceutical: Diagnostic reagents, super drugs, cosmetics, nuclear magnetic resonance (NMR) with the developer. DNA affinity 2. Energy: Solar battery, fuel cell, secondary battery. 3. Industry: Wear resistant material, flame retardant materials, lubricants, polymer additives, high-performance membrane, catalyst, artificial diamond, hard alloy, electric viscous fluid, ink filters, high-performance coatings, fire retardant coatings, manufacturing bioactive materials , memory materials, embedded molecular and other characteristics, composite materials etc. 4. Information industry: Semiconductor record medium, magnetic materials, printing ink, toner, ink, paper special purposes. 5. Electronic parts: Superconducting semiconductor, diodes, transistors, inductor.  , 6. Optical materials, electronic camera, fluorescence display tube, nonlinear optical materials. 7. Environment: Gas adsorption, gas storage.
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Fused Silica Wafer, Size: 6”, 2-Side Polished, Thickness: 700 ± 25 μm

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Price range: $71.00 through $1,498.00
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Fused Silica Wafer

Size: 6”, 2-Side Polished, Thickness: 700 ± 25 μm

Technical Properties:

Quality Prime
Materials Fused Silica
Size (inch) 6”
Orientation
Coating
Thickness (μm) 700 ± 25
Doping
Resistivity (ohm.cm)
Polished Double Side
Fused silica – also referred as fused quartz- is an amorphous phase of silica. Compared to borosilicate wafers, fused silica has no additives. Is almost chemically inactive. Has a very high thermal resistance. Has an improved optical transmission in deep UV (ultraviolet). Silica dust particles are deposited on the substrate first, solidification of these molten particles creates a pure fused phase on the surface with the help of flame hydrolysis.
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Fused Silica Wafer, Size: 4”, 2-Side Polished, Thickness: 500 ± 25 μm

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Price range: $71.00 through $1,498.00
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Fused Silica Wafer

Size: 4”, 2-Side Polished, Thickness: 500 ± 25 μm

Technical Properties:

Quality Prime
Materials Fused Silica
Size (inch) 4”
Orientation  
Coating  
Thickness (μm) 500 ± 25
Doping  
Resistivity (ohm.cm)  
Polished Double Side
Fused silica – also referred as fused quartz- is an amorphous phase of silica. Compared to borosilicate wafers, fused silica has no additives. Is almost chemically inactive. Has a very high thermal resistance. Has an improved optical transmission in deep UV (ultraviolet). Silica dust particles are deposited on the substrate first, solidification of these molten particles creates a pure fused phase on the surface with the help of flame hydrolysis.
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Prime FZ-Si Wafer, Size: 4”, Orientation: (111), None Doped, Resistivity: 10000 – 100000 (ohm.cm), 2-Side Polished, Thickness: 300 ± 20 μm

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Price range: $73.00 through $1,498.00
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Prime FZ-Si Wafer

Size: 4”, Orientation: (111), None Doped, 2-Side Polished, Thickness: 300 ± 20 μm

Technical Properties:

Quality Prime
Materials FZ-Si
Size (inch) 4”
Orientation (111)
Coating  
Thickness (μm) 300 ± 20
Doping  
Resistivity (ohm.cm) 10000 - 100000
Polished Double Side
Float zone is referred as a very pure silicon that is produced by vertical zone melting. Compared to Czochralski method, crystals of FZ Silicon have higher purities. Light impurities in FZ Si wafers provides a chance to control some of the defects and increase the mechanical strength. Flat zone silicons have very high resistivity distribution so they are specially used in detectors. There are some other properties that are needed to prevent detector noises. Some of these properties are minority carrier lifetime and bulk generation current. However, these two properties weigh less than the crstalline structure and purity of the wafer. Additionally multiple zone refining can be performed on a rod to further reduce the impurity concentrations.
Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.125''
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Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”

$1,497.00
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Product 

 Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.125''

CAS No.

 ~68189‑52‑4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

<5 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 234–237 g/mol

Melting Point

 ~1300–1400 °C

Boiling Point

N/A

Density

 ~6.3–6.5 g/cm³

Product Codes

NCZ-2103K
Multilayer Titanium Niobium Carbide (TiNbC) MXene Material
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Multilayer Titanium Niobium Carbide (TiNbC) MXene Material

$1,496.00
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Product Multilayer Titanium Niobium Carbide (TiNbC) MXene Material
CAS No. N/A
Appearance Dark gray to black
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1-5μm (Size Can be customized),  Ask for other available size range.
Ingredient TiNbC
Molecular Weight 152.8 g/mol
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-466I
 
Barium Titanate (BaTiO3) Sputtering Targets, elastomer, Purity: 99.99%, Size: 4'', Thickness: 0.125''
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Barium Titanate (BaTiO3) Sputtering Targets, elastomer, Purity: 99.99%, Size: 4”, Thickness: 0.125”

$1,494.00
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Product 

 Barium Titanate (BaTiO3) Sputtering Targets, elastomer, Purity: 99.99%, Size: 4'', Thickness: 0.125''

CAS No.
 12047‑27‑7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

1 – 5 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 ~233.19 g/mol

Melting Point

 ~1625 °C

Boiling Point

N/A

Density

  ~6.02 g/cm³

Product Codes

NCZ-2449K
Cerium Oxide (CeO2) Sputtering Target
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Cerium Oxide (CeO2) Sputtering Target

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Price range: $511.00 through $1,492.00
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Product 

 Cerium Oxide (CeO2) Sputtering Target

CAS No.

1306-38-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 172.11 g/mol

Melting Point

~2,400 °C

Boiling Point

~3,500 °C

Density

 ~7.22 g/cm³

Product Codes

NCZ-1315K
High Purity 5N (≥99.999%) Germanium (Ge) Powder (-200 mesh)
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High Purity 5N (≥99.999%) Germanium (Ge) Powder (-200 mesh)

$1,489.00
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Product High Purity 5N (≥99.999%) Germanium (Ge) Powder (-200 mesh)
CAS No. 7440-56-4
Appearance Gray to dark gray fine
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 75µm (Size Can be customized),  Ask for other available size range.
Ingredient Ge
Molecular Weight 72.63 g/mol
Melting Point N/A
Boiling Point N/A
Density 5.32 g/cm³
Product Codes NCZ-398I
 
5N (99.999%) Silicon (P-type Si) Pieces (1-6mm) Evaporation Materials
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5N (99.999%) Silicon (P-type Si) Pieces (1-6mm) Evaporation Materials

Price range: $380.00 through $1,489.00
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Product 5N (99.999%) Silicon (P-type Si) Pieces (1-6mm) Evaporation Materials
CAS No. 7440-21-3
Appearance Dark Gray with a Bluish Tinge, Semi-Metallic
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1-6mm (Size Can be customized),  Ask for other available size range.
Ingredient Si
Molecular Weight N/A
Melting Point 1,410 °C
Boiling Point N/A
Density 2.32 g/cm³
Product Codes NCZ-201I
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Prime Si+Si3N4 Wafer, Size: 3”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2 Side Polished, Thickness: 381± 25 μm, Coating 300 nm

, ,
Price range: $72.00 through $1,488.00
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Prime Si+Si3N4 Wafer

Size: 3”, Orientation: (100), Boron Doped, Thickness: 381± 25 μm, Coating 300 nm

Technical Properties:

Quality Prime
Materials Si+Si3N4
Size (inch) 3”
Orientation (100)
Coating 300 nm
Thickness (μm) 381± 25
Doping Boron
Resistivity (ohm.cm) 1-10
Polished Double Side
Silicon nitride (Si3N4,SiN) offers excellent mechanical and thermal stability. It is commonly used for hard masks, as a dielectric material, or as a passivation layer. Silicon nitride is very hard by nature and has good thermal shock resistance and oxidation resistance. Silicon Nitride has good high temperature strength, creep resistance and oxidation resistance. Silicon Nitride's low thermal expansion coefficient gives good thermal shock resistance.
Barium Zirconate (BaZrO3) Sputtering Targets, Purity: 99.99%, Size: 4'', Thickness: 0.250''
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Barium Zirconate (BaZrO3) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.250”

$1,487.00
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Product 

 Barium Zirconate (BaZrO3) Sputtering Targets, Purity: 99.99%, Size: 4'', Thickness: 0.250''

CAS No.
12009‑21‑1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

1 – 5 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 276.55 g/mol

Melting Point

 Decomposes before melting (~2600 °C)

Boiling Point

N/A

Density

 ~5.52 g/cm³

Product Codes

NCZ-2441K
3N (99.9%) Lithium Fluoride (LiF) Pieces Evaporation Materials
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3N (99.9%) Lithium Fluoride (LiF) Pieces Evaporation Materials

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Price range: $679.00 through $1,485.00
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Product 3N (99.9%) Lithium Fluoride (LiF) Pieces Evaporation Materials
CAS No. 7789-24-4
Appearance White, Crystalline Solid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 3-6mm (Size Can be customized),  Ask for other available size range.
Ingredient LiF
Molecular Weight N/A
Melting Point 845 °C
Boiling Point N/A
Density 2.64 g/cm³
Product Codes NCZ-142E
 
Zinc Oxide Nano-dispersion in water
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Zinc Oxide Nano-dispersion in water

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Price range: $475.00 through $1,480.00
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$475/500g
$1480/1000ML

Product 

 Zinc Oxide Nano-dispersion in water

CAS No.

1314-13-2

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

~10–50 nm(Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 81.38 g/mol

Melting Point

~1,975 °C

Boiling Point

~2,360 °C

Density

  ~5.61 g/cm³

Product Codes

NCZ-1222K
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.250''
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Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.250”

$1,478.00
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Product 

 Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.250''

CAS No.
 1306-38-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  172.11 g/mol

Melting Point

 2,400–2,600 °C

Boiling Point

Sublimes above 3,000 °C

Density

  7.13 g/cm³

Product Codes

NCZ-2329K
Tantalum (V) Oxide (Ta2O5) 99.9% 3N Powder
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Tantalum (V) Oxide (Ta2O5) 99.9% 3N Powder

Price range: $249.00 through $1,476.00
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Product Tantalum (V) Oxide (Ta2O5) 99.9% 3N Powder
CAS No. 1314-61-0
Appearance White to off-white
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1–10µm (Size Can be customized),  Ask for other available size range.
Ingredient Ta2O5
Molecular Weight 441.89 g/mol
Melting Point N/A
Boiling Point N/A
Density 8.2 g/cm³
Product Codes NCZ-548I
Cerium (III) Oxide (Ce2O3) Powder, Purity 99.9%
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Cerium (III) Oxide (Ce2O3) Powder, Purity 99.9%

Price range: $503.00 through $1,476.00
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Product Cerium (III) Oxide (Ce2O3) Powder, Purity 99.9%
CAS No. 12037-29-5
Appearance Pale yellow to light brown
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Ce2O3
Molecular Weight 328.24 g/mol
Melting Point N/A
Boiling Point N/A
Density 7.22 g/cm³
Product Codes NCZ-311I
PEDOT:PSS Conductive Polymer (Clevios HTL Solar) for Organic Photovoltaic (OPV) Solar Cells
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PEDOT:PSS Conductive Polymer (Clevios HTL Solar) for Organic Photovoltaic (OPV) Solar Cells

Price range: $242.00 through $1,474.00
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Product PEDOT:PSS Conductive Polymer (Clevios HTL Solar) for Organic Photovoltaic (OPV) Solar Cells
CAS No. 155090-83-8
Appearance Deep-blue opaque aqueous
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 30nm (Size Can be customized),  Ask for other available size range.
Ingredient (C6​H4​O2​S)n​
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-487I
 
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(-OH) Functionalized Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: < 8 nm

, ,
Price range: $49.00 through $1,470.00
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Applications:

Multi-walled carbon nanotubes have numerous potential uses in various industries. Medicine, mechanics, electric-electronics, chemistry, energy, and other fields are among these uses. Drug delivery, biosensors, CNT composites, catalysis, nanoprobes, hydrogen storage, flat panel displays, supercapacitors, transistors, solar cells, photoluminescence, and templates are just a few areas where it can be used.
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(-COOH) Functionalized Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: < 8 nm

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Price range: $49.00 through $1,470.00
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Applications:

Multi-walled carbon nanotubes have numerous potential uses in various industries. Medicine, mechanics, electric-electronics, chemistry, energy, and other fields are among these uses. Drug delivery, biosensors, CNT composites, catalysis, nanoprobes, hydrogen storage, flat panel displays, supercapacitors, transistors, solar cells, photoluminescence, and templates are just a few areas where it can be used.
Vanadium Carbide (VC) Sputtering Target
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Vanadium Carbide (VC) Sputtering Target

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Price range: $502.00 through $1,468.00
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Product 

 Vanadium Carbide (VC) Sputtering Target

CAS No.

 12070-10-9

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 62.95 g/mol

Melting Point

~2,810 °C

Boiling Point

~3,900 °C

Density

 ~5.77 g/cm³

Product Codes

NCZ-1338K
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Boron Doped Graphene Nanopowder (B/C)

Price range: $223.00 through $1,461.00
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Boron Doped Graphene

Boron-doped Graphene (BG) is a novel nanomaterial based on graphene, a single sheet of carbon atoms in a hexagonal lattice. The addition of boron atom impurities into pure graphene increases the activation region on its surface, enhances its catalytic ability, accelerates redox reactions, and opens the band gap, giving it numerous applications in fuel cell chemistry, semiconductor devices, ultracapacitors, sensors, and other technologies. Nanografi also manufactures nitrogen-doped graphene and boron/nitrogen co-doped graphene. Please request a quote above to receive pricing information based on your specifications.
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Boron Doped Graphene Nanopowder (B/C)

Price range: $223.00 through $1,461.00
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Boron Doped Graphene

Boron-doped Graphene (BG) is a novel nanomaterial based on graphene, a single sheet of carbon atoms in a hexagonal lattice. The addition of boron atom impurities into pure graphene increases the activation region on its surface, enhances its catalytic ability, accelerates redox reactions, and opens the band gap, giving it numerous applications in fuel cell chemistry, semiconductor devices, ultracapacitors, sensors, and other technologies. Nanografi also manufactures nitrogen-doped graphene and boron/nitrogen co-doped graphene. Please request a quote above to receive pricing information based on your specifications.
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Prime FZ-Si Wafer, Size: 4”, Orientation: (100), None Doped, Resistivity: 1000 – 10000 (ohm.cm), 2-Side Polished, Thickness: 500 ± 25 μm

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Price range: $87.00 through $1,459.00
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1 piece/79 € 5 pieces/295 € 25 pieces/1315 € Please contact us for quotes on larger quantities !!!

Prime FZ-Si Wafer

Size: 4”, Orientation: (100), None Doped, 2-Side Polished, Thickness: 500 ± 25 μm

Technical Properties:

Quality Prime
Materials FZ-Si
Size (inch) 4”
Orientation (100)
Coating
Thickness (μm) 525 ± 25
Doping
Resistivity (ohm.cm) 1000 - 10000
Polished Double Side
Float zone is referred as a very pure silicon that is produced by vertical zone melting. Compared to Czochralski method, crystals of FZ Silicon have higher purities. Light impurities in FZ Si wafers provides a chance to control some of the defects and increase the mechanical strength. Flat zone silicons have very high resistivity distribution so they are specially used in detectors. There are some other properties that are needed to prevent detector noises. Some of these properties are minority carrier lifetime and bulk generation current. However, these two properties weigh less than the crstalline structure and purity of the wafer. Additionally multiple zone refining can be performed on a rod to further reduce the impurity concentrations.
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Prime Si+SiO2 Wafer (dry), Size: 6”, Orientation: (100), Boron Doped, Resistivity: 1 – 10 (ohm.cm), 2-Side Polished, Thickness: 675 ± 15 μm, Coating 200 nm

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Price range: $87.00 through $1,459.00
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1 piece/79 € 5 pieces/295 € 25 pieces/1315 € Please contact us for quotes on larger quantities !!!

Prime Si+SiO2 Wafer (dry)

Size: 6”, Orientation: (100), Boron Doped, 2-Side Polished, Thickness: 675 ± 15 μm, Coating 200 nm

Technical Properties:

Quality Prime
Materials Si + SiO2 (dry)
Size (inch) 6”
Orientation (100)
Coating 200 nm
Thickness (μm) 675 ± 15
Doping Boron
Resistivity (ohm.cm) 1-10
Polished Double  Side
Silicon dioxide wafer – also referred as thermal oxide wafer- is produced at elevated temperatures. Thermal oxide is normally grown in a horizontal tube furnace, at temperature range from 900°C ~ 1200°C. Thermal oxide is a kind of "grown" oxide layer , compared to CVD deposited oxide layer , it has a higher uniformity, and higher dielectric strength , it is an excellent dielectric layer as an insulator. In most silicon-based devices, thermal oxide layer plays an important role to pacify the silicon surface to act as doping barriers and as surface dielectrics. It allows a very good thickness uniformity and purity. Therefore, this is the preferred way to produce high quality thin silicon oxide layers. Thicker oxide layers are typically produced by wet oxidation where the growth rate is significantly increased.
Bismuth Ferrite (BiFeO3) Sputtering Targets, Purity: 99.9%, Size: 7'', Thickness: 0.250''
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Bismuth Ferrite (BiFeO3) Sputtering Targets, Purity: 99.9%, Size: 7”, Thickness: 0.250”

$1,458.00
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Product 

 Bismuth Ferrite (BiFeO3) Sputtering Targets, Purity: 99.9%, Size: 7'', Thickness: 0.250''

CAS No.
 12010‑42‑3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 0.5–2 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 ~312.82 g/mol

Melting Point

  ~1255 °C (bulk material)

Boiling Point

N/A

Density

 ~8.22 g/cm³

Product Codes

NCZ-2418K
Magnesium Oxide (MgO) Sputtering Targets, indium, Purity: 99.95%, Size: 3'', Thickness: 0.125''
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Magnesium Oxide (MgO) Sputtering Targets, indium, Purity: 99.95%, Size: 3”, Thickness: 0.125”

$1,458.00
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Product 

 Magnesium Oxide (MgO) Sputtering Targets, indium, Purity: 99.95%, Size: 3'', Thickness: 0.125''

CAS No.

1309-48-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 40.30 g/mol

Melting Point

 ~2852 °C

Boiling Point

~3600 °C

Density

  ~3.58 g/cm³

Product Codes

NCZ-1956K
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Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets, Purity: 99.9%, Size: 7”, Thickness: 0.250”

, ,
$1,458.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

An inorganic substance is lead zirconium titanate. This ceramic perovskite material has a strong piezoelectric effect, which means that when an electric field is applied, the compound changes shape. Lead zirconium titanate is employed in a number of practical applications such as ultrasonic transducers and piezoelectric resonators.

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Copper (Cu) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 65 nm, Metal Basis

Price range: $132.00 through $1,457.00
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Copper (Cu) Nanopowder/Nanoparticles

Purity: 99.95%, Size: 65 nm, Metal Basis

Technical Properties:

Bulk Density (g/cm3) 0,22
True Density (g/cm3) 8,9
Color warm copper brown
Shape spherical
Crystal Structure cubic
Average Particle Size (nm) 65
Specific Surface Area (m2/g) 6,5-7,5
Elemental Analysis Cu Fe Ni Others
≥99.9 ≤0.006 ≤0.005 ≤0.002

Properties, Storage and Cautions:

Copper nanoparticles are highly reactive and flammable, therefore it should be handled with care and rapid moves, vibrations should be avoided. Nanopowder should be kept away from sunlight, any kind of heating, moisture and impacts. Coagulation of the particles is a serious problem, so, nanopowder should be sealed under vacuum and should be kept in cool and dry conditions. Air contact should be avoided.