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5 mL Platinum (Pt) Nanoparticles Water Dispersion, 3-5nm, 0.2mg/mL
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5 mL Platinum (Pt) Nanoparticles Water Dispersion, 3-5nm, 0.2mg/mL

$1,331.00
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Product 5 mL Platinum (Pt) Nanoparticles Water Dispersion, 3-5nm, 0.2mg/mL
CAS No. 7440-06-4
Appearance Brownish to dark gray liquid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 3-5nm (Size Can be customized),  Ask for other available size range.
Ingredient Pt
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-183I
 
10 mL PEG-modified Gold (Au) Nanoparticles, 50 μg/mL
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10 mL PEG-modified Gold (Au) Nanoparticles, 50 μg/mL

Price range: $528.00 through $1,331.00
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Product 10 mL PEG-modified Gold (Au) Nanoparticles, 50 μg/mL
CAS No. 7440-57-5
Appearance Pale red to pink colloidal liquid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 20–60nm (Size Can be customized), Ask for other available size range.
Ingredient Au
Molecular Weight 196.97 g/mol
Melting Point N/A
Boiling Point N/A
Density 19.3 g/cm³
Product Codes NCZ-117I
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Yttrium (Y) Micron Powder Purity: 99.5 %, Size: 325 mesh

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Price range: $25.00 through $1,330.00
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1 gram/23 € 5 grams/90 € 25 grams/370 € 100 grams/1180 €  
1% Gold (Au) Nanoparticle Water Dispersion, 150nm, >99.95% Purity, 250mL/bottle
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1% Gold (Au) Nanoparticle Water Dispersion, 150nm, >99.95% Purity, 250mL/bottle

$1,327.00
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Product 1% Gold (Au) Nanoparticle Water Dispersion, 150nm, >99.95% Purity, 250mL/bottle
CAS No. 1344-28-1
Appearance Pink to red liquid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 150 nm Size Can be customized), Ask for other available size range.
Ingredient Au
Molecular Weight 196.97 g/mol
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-111I
 
Lanthanum Manganate (LaMnO3) Sputtering Targets, Purity: 99.9%, Size: 7'', Thickness: 0.250''
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Lanthanum Manganate (LaMnO3) Sputtering Targets, Purity: 99.9%, Size: 7”, Thickness: 0.250”

$1,326.00
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 Lanthanum Manganate (LaMnO3) Sputtering Targets, Purity: 99.9%, Size: 7'', Thickness: 0.250''

CAS No.

13538-87-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 ~1–5 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 240.83 g/mol

Melting Point

 ~2300 °C

Boiling Point

N/A

Density

 ~6.3 – 6.8 g/cm³

Product Codes

NCZ-2130K
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 8'', Thickness: 0.125''
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Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 8”, Thickness: 0.125”

$1,326.00
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 Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 8'', Thickness: 0.125''

CAS No.

12031‑18‑4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 ~1–5 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  ~245.6 g/mol

Melting Point

N/A

Boiling Point

N/A

Density

 ~6.3–7.0 g/cm³ (≥90% theoretical)

Product Codes

NCZ-2113K
Lanthanum Manganate (LaMnO3) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.250''
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Lanthanum Manganate (LaMnO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”

$1,325.00
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Product 

 Lanthanum Manganate (LaMnO3) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.250''

CAS No.

13538-87-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 ~1–5 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 240.83 g/mol

Melting Point

N/A

Boiling Point

N/A

Density

 ~6.3 – 6.8 g/cm³

Product Codes

NCZ-2138K
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Multi Walled Carbon Nanotubes Isopropanol Dispersion, 4 wt%, Purity: > 95%, OD: 18-35 nm, Length: 8-18 µm

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Price range: $299.00 through $1,325.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

MWCNTs have numerous potential uses in various industries. Midicine, mechanical, electric, chemical, energy, and other uses are among these. It can be used in a variety of applications, including medication delivery, biosensors, CNT composites, catalysis, nanoprobes, and hydrogen storage. seven lithium battalions tubes for 8 gas discharges, nine-panel flat display, 10-supercapacitor, 11-transistors, twelve solar cells Photoluminescence 13 and template 14
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Carbon Quantum Dots (CQD) 528 nm

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Price range: $750.00 through $1,325.00
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APPLICATIONS Carbon quantum dots are employed in the following because of their optical, electrical, and biological characteristics:
  • Bioimaging,
  • Photovoltaics,
  • Photocatalysis,
  • Drug delivery,
  • Sensors,
  • Optronics.
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Multi Walled Carbon Nanotubes Ethanol Dispersion, 3 wt%, Purity: > 95%, OD: 18-28 nm, Length: 8-28 µm

Price range: $275.00 through $1,323.00
Select options This product has multiple variants. The options may be chosen on the product page
15 ml/250 € 30 ml/416 € 60 ml/720 € 120 ml/1200 €    
Please contact us for quotes on larger quantities !!!

Multi Walled Carbon Nanotubes Ethanol Dispersion

3 wt%, Purity: > 95+ %, OD: 18-28 nm, Length: 8-28 µm

Technical Properties:

Purity > 95+ wt%
Color black
Average Outside Diameter (nm) 18-28
Average Inside Diameter (nm) 5.0-10.0
Length (µm) 8-28
Tap Density (g/cm3) 0.30
True Density (g/cm3) 2.4
Specific Surface Area (m2/g) 120
Ash < 1.5 wt%
Electrical Conductivity (S/cm) > 98
Manufacturing Method CVD

Applications:

MWCNTs have a variety of potential applications in different fields. These applications include medicine, mechanical, electric, chemical, energy and others. It can be applied in, 1-drug delivery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium batteries, 8-gas-discharge tubes, 9-flat panel display, 10-supercapacitor, 11-transistors, 12-solar cells, 13-photoluminescence, 14-template
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Lanthanum Manganate (LaMnO3) Sputtering Targets, Purity: 99.9%, Size: 5”, Thickness: 0.125”

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$1,320.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

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Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 8”, Thickness: 0.250”

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$1,320.00
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Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Lanthanum nickel oxide with the chemical formula of LaNiO3 is an important perovskite-type oxide with metallic conductivity. Lanthanum nickel oxide is a ternary compound with unique chemical and physical properties. It shows an extended range of oxygen-deficient compositions, an uncommon intrinsic n-type metallic conductance, a perovskite crystal structure and thermal and chemical stability. These characteristics make LNO a technologically important perovskite oxide electrode in many potential applications such as ferroelectric thin film capacitors, solid oxide fuel cells, nonvolatile ferroelectric random access memories and multilayer actuators. Furthermore, LNO films have potential to be used as oxygen pressure and ethanol active sensing layers. Also, the reduced La–Ni mixed oxides are reported to be good catalyst precursors to synthesized organic compounds and to grow large amounts of regular diameter distribution controlled carbon nanotubes. Different chemical and physical thin film deposition techniques have been used to prepare LNO on various substrates. Chemical methods such as chemical vapor deposition, metallo-organic chemical vapor deposition and chemical solution deposition have been used to prepare LNO films. Physical methods such as sputtering, pulsed laser deposition and mist plasma evaporation have also been reported. Wet chemical solution deposition techniques provide simple and versatile alternative methods for thin film preparation.
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Lanthanum Manganate (LaMnO3) Sputtering Targets, Purity: 99.9%, Size: 5”, Thickness: 0.125”

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$1,320.00
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Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.
5N (99.999%) Aluminum (Al) Pellets Evaporation Materials
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5N (99.999%) Aluminum (Al) Pellets Evaporation Materials

Price range: $145.00 through $1,318.00
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Product 5N (99.999%) Aluminum (Al) Pellets Evaporation Materials
CAS No. 7429-90-5
Appearance Silvery-white metallic solid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1–5mm (Size Can be customized),  Ask for other available size range.
Ingredient Al
Molecular Weight 26.98 g/mol
Melting Point 660.3 °C
Boiling Point 2,470 °C
Density 2.70 g/cm³
Product Codes NCZ-192I
 
5N (99.999%) Aluminum (Al) Pellets Evaporation Materials
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5N (99.999%) Aluminum (Al) Pellets Evaporation Materials

Price range: $145.00 through $1,318.00
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Product 5N (99.999%) Aluminum (Al) Pellets Evaporation Materials
CAS No. 7429-90-5
Appearance Silvery, Metallic
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Al
Molecular Weight 26.98 g/mol
Melting Point 660°C
Boiling Point N/A
Density 2.7 g/cm³
Product Codes NCZ-100E
 
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Indium Phosphide Quantum Dots (InP/ZnS QD) 480 nm

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Price range: $565.00 through $1,315.00
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APPLICATIONS InPQDs are employed in because of their electrical and optical characteristics in:
  • Light emitting diodes (LEDs),
  • Biomedical applications like bioimaging,
  • Electronic devices,
  • Solar cells.
Barium Strontium Titanate (BaO4SrTi) Sputtering Targets, elastomer, Purity: 99.99%, Size: 3'', Thickness: 0.125''
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Barium Strontium Titanate (BaO4SrTi) Sputtering Targets, elastomer, Purity: 99.99%, Size: 3”, Thickness: 0.125”

$1,313.00
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Product 

 Barium Strontium Titanate (BaO4SrTi) Sputtering Targets, elastomer, Purity: 99.99%, Size: 3'', Thickness: 0.125''

CAS No.
 12060-08-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

~1–5 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 ~233–300 g/mol (composition dependent)

Melting Point

  ~1625 °C (approximate)

Boiling Point

N/A

Density

 ~5.5–6.0 g/cm³ (depending on Ba:Sr ratio)

Product Codes

NCZ-2474K
Lithium Phosphate (Li3PO4) Sputtering Targets, Purity: 99.95%, Size: 5'', Thickness: 0.125''
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Lithium Phosphate (Li3PO4) Sputtering Targets, Purity: 99.95%, Size: 5”, Thickness: 0.125”

$1,313.00
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Product 

 Lithium Phosphate (Li3PO4) Sputtering Targets, Purity: 99.95%, Size: 5'', Thickness: 0.125''

CAS No.

10377-52-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  115.79 g/mol

Melting Point

 ~837 °C

Boiling Point

N/A

Density

  ~2.53 g/cm³

Product Codes

NCZ-2027K
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Bismuth Ferrite (BiFeO3) Sputtering Targets, Purity: 99.9%, Size: 8”, Thickness: 0.125”

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$1,310.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation.

In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered. The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering. One of the most promising multiferroic materials is bismuth ferrite, an inorganic chemical compound with a perovskite structure and the chemical formula BiFeO3. In order to create a one-phase material called bismuth ferrite (BiFeO3), a bismuth ferrite sputtering target is often manufactured by high temperature sinttering or recrystallizing the mixture of the oxide compound of Bi and Fe. For targets that are sputtering bismuth ferrite, indium bonding is advised.

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Carbon Quantum Dots (CQD) 535 nm

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Price range: $735.00 through $1,310.00
Select options This product has multiple variants. The options may be chosen on the product page
APPLICATIONS Carbon quantum dots are employed in the following because of their optical, electrical, and biological characteristics:
  • Bioimaging,
  • Photovoltaics,
  • Photocatalysis,
  • Drug delivery,
  • Sensors,
  • Optronics.
10mL Gold (Au) Nanoparticles Dispersion in Organic Solvent, 50μg/mL
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10mL Gold (Au) Nanoparticles Dispersion in Organic Solvent, 50μg/mL

Price range: $572.00 through $1,309.00
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Product 10mL Gold (Au) Nanoparticles Dispersion in Organic Solvent, 50μg/mL
CAS No. 7440-57-5
Appearance Red, ruby-red, or purple
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 5–20nm (Size Can be customized),  Ask for other available size range.
Ingredient Au
Molecular Weight 196.97 g/mol
Melting Point N/A
Boiling Point N/A
Density 19.32 g/cm³
Product Codes NCZ-126I
 
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Tungsten Oxide (WO3) Sputtering Targets, indium, Purity: 99.9%, Size: 2”, Thickness: 0.125”

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$1,308.00
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Applications of Sputtering Targets;

For film deposition, sputtering targets are employed. A sputtering technique called "deposition made by sputter targets" entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Targets are etched using semiconductor sputtering targets. When etching anisotropy is required to a great degree and selectivity is not an issue, sputter etching is the method of choice. By etching away the target material, sputter targets are also utilized for investigation. In one instance, the target sample is sputtered at a steady pace in secondary ion spectroscopy (SIMS). Using mass spectrometry, the concentration and identity of the spewed atoms are determined when the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Bismuth Ferrite Sputtering Target BiFeO3
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Bismuth Ferrite Sputtering Target BiFeO3

Price range: $758.00 through $1,306.00
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Product Bismuth Ferrite Sputtering Target BiFeO3
CAS No. 12022-86-1
Appearance Solid, dark gray to black ceramic
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 0.5–2 µm (Size Can be customized),  Ask for other available size range.
Ingredient BiFeO₃
Molecular Weight 240.76 g/mol
Melting Point 960 °C
Boiling Point N/A
Density 8.34 g/cm³
Product Codes NCZ-106H
Bismuth Ferrite (BiFeO3) Sputtering Targets, Purity: 99.9%, Size: 6'', Thickness: 0.125''
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Bismuth Ferrite (BiFeO3) Sputtering Targets, Purity: 99.9%, Size: 6”, Thickness: 0.125”

$1,305.00
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Product 

 Bismuth Ferrite (BiFeO3) Sputtering Targets, Purity: 99.9%, Size: 6'', Thickness: 0.125''

CAS No.
 12010‑42‑3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 0.5–2 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 ~312.82 g/mol

Melting Point

  ~1255 °C (bulk material)

Boiling Point

N/A

Density

 ~8.22 g/cm³

Product Codes

NCZ-2421K
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Bismuth Telluride (Bi2Te3) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.250”

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$1,305.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Bi2Te3, or bismuth telluride, is a gray powder that is a combination of bismuth and tellurium. It is a semiconductor that becomes an effective thermoelectric material for refrigeration or portable power generation when alloyed with antimony or selenium. Since Bi2Te3 is a topological insulator, its physical characteristics depend on its thickness.

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Graphene Sheet, Size: 29 cm x 59 cm, Thickness: 35 µm, Highly Conductive

Price range: $111.00 through $1,304.00
Select options This product has multiple variants. The options may be chosen on the product page
Graphene sheets are essentially the finest materials in the world. Graphene sheet is a one-atom-thick planar sheet of carbon iotas which are intensively packed in a hexagonal lattice structure. Graphene sheets show high electrical conductance at room temperatures. They are used as fillers for the improvement of electrical and mechanical properties in composite materials. Graphene sheets have a vital importance for applications in biomaterials, biosensors, biomedical devices and drug delivery. Our company sells Graphene Sheet with low prices and high quality
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Silicon Carbide Wafer (SiC-4H) – 4H , Size: 2”, Thickness: 350 μm, Mechanical Grade, 4H Area: 80%

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Price range: $297.00 through $1,302.00
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Silicon Carbide Wafer (SiC-4H) – 4H Size: 2”, Thickness: 350 μm, 4H Area: 80% Technical Properties: Quality  Mechanical Grade Size (inch)  2”
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Multi Walled Carbon Nanotubes Ethanol Dispersion, 4 wt%, Purity: > 96 %, OD: 45-75 nm,Length 8-28 µm

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Price range: $285.00 through $1,301.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

MWCNTs have a variety of potential applications in different fields. These applications include midicine, mechanical, electric, chemical, energy and others. It can be applied in, 1-drug dilevery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium battaries, 8-gas-discharge tubes, 9-flat panel display, 10-supercapacitor, 11-transistors, 12-solar cells, 13-photoluminescence, 14-template
Lithium Phosphate (Li3PO4) Sputtering Targets, Purity: 99.95%, Size: 4'', Thickness: 0.125''
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Lithium Phosphate (Li3PO4) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.125”

$1,300.00
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Product 

 Lithium Phosphate (Li3PO4) Sputtering Targets, Purity: 99.95%, Size: 4'', Thickness: 0.125''

CAS No.

10377-52-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  115.79 g/mol

Melting Point

 ~837 °C

Boiling Point

~158 °C (likely decomposition)

Density

  ~2.53 g/cm³

Product Codes

NCZ-2029K
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Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 6”, Thickness: 0.125”

, , ,
$1,300.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

The most prevalent rare-earth element in the crust of the earth is cerium, a metal that belongs to the lanthanide series. Cerium oxide's high refractive index and dielectric constant make it suitable for a wide range of optical and electrical applications. Additionally, cerium oxide can be used for corrosion protection coatings rather than coatings based on chromate.

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Indium Phosphide Quantum Dots (InP/ZnS QD) 525 nm

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Price range: $560.00 through $1,300.00
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APPLICATIONS InPQDs are employed in because of their electrical and optical characteristics in:
  • Light emitting diodes (LEDs),
  • Biomedical applications like bioimaging,
  • Electronic devices,
  • Solar cells.
99.999% 5N Germanium (Ge) Powder, 100 Mesh
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99.999% 5N Germanium (Ge) Powder, 100 Mesh

Price range: $429.00 through $1,298.00
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Product 99.999% 5N Germanium (Ge) Powder, 100 Mesh
CAS No. 7440-56-4
Appearance Gray to dark gray fine
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 149µm (Size Can be customized),  Ask for other available size range.
Ingredient Ge
Molecular Weight 72.63 g/mol
Melting Point N/A
Boiling Point N/A
Density 5.323 g/cm³
Product Codes NCZ-263I
 
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Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”

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$1,298.00
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Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.
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Graphene Ethanol Dispersion, Purity: 99.5%, Graphene: 2 wt%

Price range: $93.00 through $1,298.00
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30 ml: 93 € 60 ml: 163 € 120 ml: 272 € 500 ml: 863 € 1000 ml: 1298 € Contact us for
Molybdenum Disilicide (MoSi2) Sputtering Targets, indium, Purity: 99.95%, Size: 4'', Thickness: 0.125''
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Molybdenum Disilicide (MoSi2) Sputtering Targets, indium, Purity: 99.95%, Size: 4”, Thickness: 0.125”

$1,296.00
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Product 

 Molybdenum Disilicide (MoSi2) Sputtering Targets, indium, Purity: 99.95%, Size: 4'', Thickness: 0.125''

CAS No.

12136-78-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 152.11 g/mol

Melting Point

 ~2030 °C

Boiling Point

 ~2300 °C to 2500 °C

Density

 ~6.26 g/cm³

Product Codes

NCZ-1920K
Boron Nitride (BN) Nanopowder
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Boron Nitride (BN) Nanopowder/Nanoparticles, Purity: 99.85+%, Size: 65-75 nm, Hexagonal

Price range: $36.00 through $1,295.00
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5 grams/32 € 25 grams/80 € 100 grams/202 € 500 grams/666 € 1000 grams/1142 €
Please contact us for quotes on larger quantities !!!

Boron Nitride (BN) Nanopowder/Nanoparticles

Purity: 99.85+%, Size: 65-75 nm, Hexagona

 

Storage Condition:

Boron nitride nanoparticles should be sealed in vacuum and stored in cool and dry room. It should not be exposure to air and avoid stress.

Applications:

Boron nitride nanoparticles is a super hard material. It has applications in subsurface investigation, oil drilling, and high-speed cutting tools. It is used as a metal forming and metal drawing lubricant release agent. It can be pressed into different shapes and used as high voltage, high temperature, insulation,and cooling components. It is used in transistors, plasma arc's insulators, high-voltage high frequency electricity, semi-conducting solid phase admixtures, high-frequency induction furnace materials,  atom reactor's structure materials, preventing neutron radiation's packing materials, automatic welding high-temperature coating, radar antenna's mediums, radar's pass box, and rocket engine's components. Boron nitride nanoparticles is also used as a catalyst for high temperature and high pressure treatments. It is used as a composite for ceramics, as thermally conductive filler for polymers, and as high temperature lubricant. It has also applications in the aerospace industry. It is used in heat shielding materials.
Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 8'', Thickness: 0.250''
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Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 8”, Thickness: 0.250”

$1,294.00
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Product 

 Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 8'', Thickness: 0.250''

CAS No.

7783-40-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  62.30 g/mol

Melting Point

~1263 °C

Boiling Point

~2260 °C

Density

  3.18 g/cm³

Product Codes

NCZ-1977K
Magnesium Oxide (MgO) Sputtering Targets, Purity: 99.95%, Size: 8'', Thickness: 0.125''
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Magnesium Oxide (MgO) Sputtering Targets, Purity: 99.95%, Size: 8”, Thickness: 0.125”

$1,294.00
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Product 

 Magnesium Oxide (MgO) Sputtering Targets, Purity: 99.95%, Size: 8'', Thickness: 0.125''

CAS No.

1309-48-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 40.30 g/mol

Melting Point

 ~2852 °C

Boiling Point

~3600 °C

Density

  ~3.58 g/cm³

Product Codes

NCZ-1962K
4N (99.99%) Cerium Oxide CeO2 Pieces Evaporation Materials
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4N (99.99%) Cerium Oxide CeO2 Pieces Evaporation Materials

Price range: $251.00 through $1,292.00
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Product 4N (99.99%) Cerium Oxide CeO2 Pieces Evaporation Materials
CAS No. 1306-38-3
Appearance Yellow-white to pale off-white solid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 3–10mm (Size Can be customized), Ask for other available size range.
Ingredient CeO2
Molecular Weight 172.11 g/mol
Melting Point 2600 °C
Boiling Point N/A
Density 7.13 g/cm³
Product Codes NCZ-168I
4N (99.99%) Cerium Oxide (CeO2) Pieces Evaporation Materials
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4N (99.99%) Cerium Oxide (CeO2) Pieces Evaporation Materials

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Product 4N (99.99%) Cerium Oxide (CeO2) Pieces Evaporation Materials
CAS No. 1306-38-3
Appearance White or Pale Yellow, Crystalline Solid 
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1-4mm (Size Can be customized),  Ask for other available size range.
Ingredient CeO2
Molecular Weight 40.30 g/mol
Melting Point 2600 °C
Boiling Point N/A
Density 7.13 g/cm³
Product Codes NCZ-130E
Lanthanum Manganate (LaMnO3) Sputtering Targets, Purity: 99.9%, Size: 7'', Thickness: 0.125''
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Lanthanum Manganate (LaMnO3) Sputtering Targets, Purity: 99.9%, Size: 7”, Thickness: 0.125”

$1,291.00
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Product 

 Lanthanum Manganate (LaMnO3) Sputtering Targets, Purity: 99.9%, Size: 7'', Thickness: 0.125''

CAS No.

13538-87-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 ~1–5 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 240.83 g/mol

Melting Point

 ~2300 °C

Boiling Point

N/A

Density

 ~6.3 – 6.8 g/cm³

Product Codes

NCZ-2131K
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.250''
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Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”

$1,291.00
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Product 

 Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.250''

CAS No.

12031‑18‑4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 ~1–5 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  ~245.6 g/mol

Melting Point

Decomposes at ~1300–1500 °C

Boiling Point

N/A

Density

  ~6.5–7.0 g/cm³

Product Codes

NCZ-2126K
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Indium Phosphide Quantum Dots (InP/ZnS QD) 560 nm

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Price range: $555.00 through $1,290.00
Select options This product has multiple variants. The options may be chosen on the product page
APPLICATIONS InPQDs are employed in because of their electrical and optical characteristics in:
  • Light emitting diodes (LEDs),
  • Biomedical applications like bioimaging,
  • Electronic devices,
  • Solar cells.
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Carbon Quantum Dots (CQD) 565 nm

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Price range: $720.00 through $1,290.00
Select options This product has multiple variants. The options may be chosen on the product page
APPLICATIONS Carbon quantum dots are employed in the following because of their optical, electrical, and biological characteristics:
  • Bioimaging,
  • Photovoltaics,
  • Photocatalysis,
  • Drug delivery,
  • Sensors,
  • Optronics.
Iron Oxide (Fe3O4) Sputtering Targets, indium, Purity: 99.9%, Size: 3'', Thickness: 0.125''
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Iron Oxide (Fe3O4) Sputtering Targets, indium, Purity: 99.9%, Size: 3”, Thickness: 0.125”

$1,287.00
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Product 

 Iron Oxide (Fe3O4) Sputtering Targets, indium, Purity: 99.9%, Size: 3'', Thickness: 0.125''

CAS No.

1317‑61‑9

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  231.6 g/mol

Melting Point

~1,597 °C

Boiling Point

 ~2,623 °C (material may decompose before boiling)

Density

  ~5.17 g/cm³ (sintered target)

Product Codes

NCZ-2161K
Monolayer Molybdenum Disulfide (MoS2) Quantum Dots Nano Powder
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Monolayer Molybdenum Disulfide (MoS2) Quantum Dots Nano Powder

Price range: $561.00 through $1,287.00
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Product Monolayer Molybdenum Disulfide (MoS2) Quantum Dots Nano Powder
CAS No. 1317-33-5
Appearance Light gray to yellow-green
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 10nm ( (Size Can be customized),  Ask for other available size range.
Ingredient MoS2
Molecular Weight 160.07 g/mol
Melting Point N/A
Boiling Point N/A
Density 5.06 g/cm³
Product Codes NCZ-459I
 
Tantalum Nanoparticles/ Nanopowder ( Ta, 99.7% 60-80 nm)
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Tantalum Nanoparticles/ Nanopowder ( Ta, 99.7% 60-80 nm)

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Price range: $398.00 through $1,287.00
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$398/25g
$1287/100g

Product 

 Tantalum Nanoparticles/ Nanopowder ( Ta, 99.7% 60-80 nm)

CAS No.
7440-25-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

60-80 nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

180.95 g/mol

Melting Point

3,017 °C

Boiling Point

5,458 °C

Density

 16.69 g/cm³

Product Codes

NCZ-1076K
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.125''
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Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”

$1,286.00
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Product 

 Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.125''

CAS No.

12031‑18‑4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 ~1–5 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  ~245.6 g/mol

Melting Point

Decomposes at ~1300–1500 °C

Boiling Point

N/A

Density

  ~6.5–7.0 g/cm³

Product Codes

NCZ-2127K
Ampcera Sodium Beta Alumina Solid Electrolyte Powder, Na2O·Al2O3, 99.99% Purity
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Ampcera Sodium Beta Alumina Solid Electrolyte Powder, Na2O·Al2O3, 99.99% Purity

Price range: $285.00 through $1,285.00
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Product Ampcera Sodium Beta Alumina Solid Electrolyte Powder, Na2O·Al2O3, 99.99% Purity
CAS No. N/A
Appearance White or light blue
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS ≥1μm (Size Can be customized), Ask for other available size range.
Ingredient Na₂O·Al₂O₃
Molecular Weight 143.94 g/mol
Melting Point N/A
Boiling Point N/A
Density 0.5-0.6g/cm3
Product Codes NCZ-104I
Ampcera Mg-doped Sodium Beta Alumina Solid Electrolyte Powder, β''-Al2O3 + Mg, 99.99% Purity
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Ampcera Mg-doped Sodium Beta Alumina Solid Electrolyte Powder, β”-Al2O3 + Mg, 99.99% Purity

Price range: $285.00 through $1,285.00
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Product Ampcera Mg-doped Sodium Beta Alumina Solid Electrolyte Powder, β''-Al2O3 + Mg, 99.99% Purity
CAS No. 10031-22-8
Appearance White or light blue
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 75–95nm (Size Can be customized), Ask for other available size range.
Ingredient Na₁.₆₇Mg₀.₆₇Al₁₀.₃₃O₁₇
Molecular Weight 606 g/mol
Melting Point N/A
Boiling Point N/A
Density 0.5-0.6 g/cm3
Product Codes NCZ-103I
 
Ampcera Li-doped Sodium Beta Alumina Solid Electrolyte Powder, β''-Al2O3 + Li, 99.99% Purity
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Ampcera Li-doped Sodium Beta Alumina Solid Electrolyte Powder, β”-Al2O3 + Li, 99.99% Purity

Price range: $285.00 through $1,285.00
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Product Ampcera Li-doped Sodium Beta Alumina Solid Electrolyte Powder, β''-Al2O3 + Li, 99.99% Purity
CAS No. 10031-22-8
Appearance White or light blue
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS <100 nm(Size Can be customized), Ask for other available size range.
Ingredient Na0.9Li0.1Al11O17​
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 3.15 g/cm³
Product Codes NCZ-102I
High Purity Graphene Aqueous Paste (98%,
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High Purity Graphene Aqueous Paste (98%, <10nm)

Price range: $285.00 through $1,285.00
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$285/1g $1285/5g
Product High Purity Graphene Aqueous Paste (98%, <10nm)
CAS No. 7782-42-5
Appearance Aqueous paste powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 10nm (Size Can be customized),  Ask for other available size range.
Ingredient C
Molecular Weight 12.01 g/mol
Melting Point 3697 °C
Boiling Point 4200 °C
Density N/A
Product Codes NCZ-107G
 
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Multi Walled Carbon Nanotubes Isopropanol Dispersion, 4wt%, Purity: > 96%, OD: 4-12 nm, Length: 55 µm

, ,
Price range: $299.00 through $1,285.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

MWCNTs have numerous potential uses in various industries. Medical, mechanical, electric, chemical, energy, and other uses are among these. It can be used in the delivery of one medication, biosensors, CNT composites, catalysts, nanoprobes, hydrogen storage, nanomaterials for catalysis, eight gas discharge tubes, seven lithium batteries, nine-panel flat display, 11 transistors, 10 supercapacitors, twelve solar cells Photoluminescence 13 and template 14
Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 5'', Thickness: 0.125''
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Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 5”, Thickness: 0.125”

$1,284.00
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Product 

 Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 5'', Thickness: 0.125''

CAS No.
 1306-38-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  172.11 g/mol

Melting Point

 2,400–2,600 °C

Boiling Point

Sublimes above 3,000 °C

Density

  7.13 g/cm³

Product Codes

NCZ-2326K
4N 99.99% Zirconium Disulfide (ZrS2) Powder
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4N 99.99% Zirconium Disulfide (ZrS2) Powder

Price range: $733.00 through $1,283.00
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Product 4N 99.99% Zirconium Disulfide (ZrS2) Powder
CAS No. 12039-15-5
Appearance Red Brown
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient ZrS2
Molecular Weight 155.35 g/mol
Melting Point 1,480 °C
Boiling Point N/A
Density N/A
Product Codes NCZ-181I
 
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Magnesium Oxide (MgO) Sputtering Targets, indium, Purity: 99.95%, Size: 3”, Thickness: 0.125”

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$1,282.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

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Barium Titanate (BaTiO3) Sputtering Targets, elastomer, Purity: 99.99%, Size: 4”, Thickness: 0.125”

, , ,
$1,281.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered. With the sputtering target's assistance, the

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Formulated as BaTiO3, barium titanate is an inorganic substance. When formed as big crystals, barium titanate is clear and has a white powdery appearance. It is a ferroelectric ceramic material with piezoelectric and photorefractive characteristics. The applications of barium titanate sputtering agents are numerous. For instance, barium titanate films, which are produced by sputtering targets, can be employed in particular electronic ceramics. Barium titanate can be utilized in the building of electrical devices such as sensors, capacitors, and detectors.

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Indium Phosphide Quantum (InP/ZnS QD) Dots 600 nm

,
Price range: $545.00 through $1,280.00
Select options This product has multiple variants. The options may be chosen on the product page
APPLICATIONS InPQDs are employed in because of their electrical and optical characteristics in:
  • Light emitting diodes (LEDs),
  • Biomedical applications like bioimaging,
  • Electronic devices,
  • Solar cells.
Tungsten Oxide (WO3) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.125''
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Tungsten Oxide (WO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”

$1,279.00
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Product 

 Tungsten Oxide (WO3) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.125''

CAS No.

1314-35-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 231.84 g/mol

Melting Point

1,473 °C

Boiling Point

1,700–1,850 °C

Density

 7.16 g/cm³

Product Codes

NCZ-1570K
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Borosilicate Wafer, Size: 6”, 2- Side polished, Thickness: 1100 ± 20 μm

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Price range: $82.00 through $1,278.00
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Boroslicate Wafer Size: 6”, 2- Side polished, Thickness: 1100 ± 20 μm Technical Properties: Materials Borosilicate Size (inch) 6” Orientation