Tantalum Oxide (Ta2O5) Sputtering Targets, indium, Purity: 99.99%, Size: 3”, Thickness: 0.125”

$999.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Tantalum Oxide (Ta2O5) Sputtering Targets, indium, Purity: 99.99%, Size: 3”, Thickness: 0.125”

$1,156.00

Product 

Tantalum Oxide (Ta2O5) Sputtering Targets, indium, Purity: 99.99%, Size: 3'', Thickness: 0.125''

CAS No.

1314-61-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 441.89 g/mol

Melting Point

 ~1872 °C

Boiling Point

N/A

Density

~8.2 g/cm³

Product Codes

NCZ-1647K

Tantalum Oxide (Ta2O5) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”

$577.00

Product 

Tantalum Oxide (Ta2O5) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.125''

CAS No.

1314-61-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 441.89 g/mol

Melting Point

 ~1872 °C

Boiling Point

N/A

Density

~8.2 g/cm³

Product Codes

NCZ-1650K

Tantalum Oxide (Ta2O5) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”

$501.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Tantalum Oxide (Ta2O5) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.125”

$452.00

Product 

Tantalum Oxide (Ta2O5) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness: 0.125''

CAS No.

1314-61-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 441.89 g/mol

Melting Point

 ~1872 °C

Boiling Point

N/A

Density

~8.2 g/cm³

Product Codes

NCZ-1654K

Tantalum Oxide (Ta2O5) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.125”

$393.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Tantalum Oxide (Ta2O5) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.125”

$393.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Tantalum Oxide (Ta2O5) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.250”

$470.00

Product 

Tantalum Oxide (Ta2O5) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness: 0.250''

CAS No.

1314-61-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 441.89 g/mol

Melting Point

 ~1872 °C

Boiling Point

N/A

Density

~8.2 g/cm³

Product Codes

NCZ-1653K

Tantalum Oxide (Ta2O5) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.250”

$409.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Tantalum Oxide (Ta2O5) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”

$634.00

Product 

Tantalum Oxide (Ta2O5) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.125''

CAS No.

1314-61-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 441.89 g/mol

Melting Point

 ~1872 °C

Boiling Point

N/A

Density

~8.2 g/cm³

Product Codes

NCZ-1652K

Tantalum Oxide (Ta2O5) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”

$550.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Tantalum Oxide (Ta2O5) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.250”

$855.00

Product 

Tantalum Oxide (Ta2O5) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.250''

CAS No.

1314-61-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 441.89 g/mol

Melting Point

 ~1872 °C

Boiling Point

N/A

Density

~8.2 g/cm³

Product Codes

NCZ-1651K

Tantalum Oxide (Ta2O5) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.250”

$740.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Tantalum Oxide (Ta2O5) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.125”

$548.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Tantalum Oxide (Ta2O5) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.125”

$632.00

Product 

Tantalum Oxide (Ta2O5) Sputtering Targets, Purity: 99.99%, Size: 4'', Thickness: 0.125''

CAS No.

1314-61-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 441.89 g/mol

Melting Point

 ~1872 °C

Boiling Point

N/A

Density

~8.2 g/cm³

Product Codes

NCZ-1649K

Tantalum Sputtering Target Ta

Price range: $206.00 through $1,855.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Tantalum Sputtering Target Ta
CAS No. 7440-25-7
Appearance Gray Blue, Metallic
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Ta
Molecular Weight 180.94788 g/mol
Melting Point 3,017 °C
Boiling Point N/A
Density 16.6 g/cm3
Product Codes NCZ-141H
 

TC11 Powder

Product TC11 Powder
CAS No. N/A
Appearance Gray, spherical powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 15–53 µm (Size Can be customized),  Ask for other available size range.
Ingredient TiAlMoZrSi
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 2.1–2.4 g/cm³
Product Codes NCZ-175M

TC18 Powder

Product TC18 Powder
CAS No. N/A
Appearance Metallic gray
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 15–53 µm (Size Can be customized),  Ask for other available size range.
Ingredient Ti–Al–Mo–V–Cr–Fe
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 2.3–2.5 g/cm³
Product Codes NCZ-176M
 

TC4 ELI Powder

Product TC4 ELI Powder
CAS No. N/A
Appearance Metallic gray spherical powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 15–45 µm (Size Can be customized),  Ask for other available size range.
Ingredient Ti–6Al–4V
Molecular Weight N/A
Melting Point 1604 °C
Boiling Point N/A
Density 4.43 g/cm³
Product Codes NCZ-177M

TC4 Powder

Product TC4 Powder
CAS No. 13463-67-7
Appearance Grey or metallic silver powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 10-100 µm (Size Can be customized),  Ask for other available size range.
Ingredient TiAlV​
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 4.43 g/cm³
Product Codes NCZ-135M

Teflon (PTFE) Sputtering Target, 99.9% Purity

Price range: $376.00 through $735.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Teflon (PTFE) Sputtering Target, 99.9% Purity
CAS No. 9002-84-0
Appearance Solid white, slightly opaque disk
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient (C₂F₄)ₙ
Molecular Weight 100.01 g/mol
Melting Point N/A
Boiling Point N/A
Density 2.2 g/cm³
Product Codes NCZ-142H

Tellurium (Te) Micron Powder Purity: 99.95 %, Size: 325 mesh

Price range: $9.00 through $394.00
Select options This product has multiple variants. The options may be chosen on the product page
1 gram/8 € 5 grams/30 € 25 grams/98 € 100 grams/350 €

Tellurium (Te) Sputtering Target

Price range: $316.00 through $833.00
Select options This product has multiple variants. The options may be chosen on the product page

Product 

Tellurium (Te) Sputtering Target

CAS No.

13494-80-9

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 127.60 g/mol

Melting Point

449.5 °C

Boiling Point

 988 °C

Density

6.24 g/cm³

Product Codes

NCZ-1361K

TEMPO hydrolyzed CNC

$615.00
Select options This product has multiple variants. The options may be chosen on the product page

Product 

TEMPO hydrolyzed CNC

CAS No.

No unique CAS – classified under Cellulose (CAS: 9004-34-6)

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

~5–15 nm diameter, 100–300 nm length(Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 Not fixed – polymer; repeat unit: 162.14 g/mol (before modification)

Melting Point

N/A

Boiling Point

N/A

Density

~1.5–1.6 g/cm³

Product Codes

NCZ-2597K

TEMPO oxidized CNF

$545.00
Select options This product has multiple variants. The options may be chosen on the product page

Product 

TEMPO oxidized CNF

CAS No.

9004-34-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

~3–10 nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 Undefined – it's a polymer (but ~162.14 g/mol per glucose unit)

Melting Point

N/A

Boiling Point

N/A

Density

~1.3–1.5 g/cm³ (bulk powder form)

Product Codes

NCZ-2591K

Terbium (III,IV) Oxide (Tb4O7) 99.995% 4N5 Powder

Price range: $513.00 through $4,649.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Terbium (III,IV) Oxide (Tb4O7) 99.995% 4N5 Powder
CAS No. 12036-41-8
Appearance Dark brown to black
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 5μm (Size Can be customized),  Ask for other available size range.
Ingredient Tb4O7
Molecular Weight 747.69 g/mol
Melting Point 3880 °C
Boiling Point N/A
Density 7.3 g/cm³
Product Codes NCZ-552I

Terbium (Tb) Micron Powder Purity: 99.5 %, Size: 325 mesh

Price range: $51.00 through $3,325.00
Select options This product has multiple variants. The options may be chosen on the product page
1 gram/48 € 5 grams/218 € 25 grams/870 € 100 grams/2950 €

Terbium (Tb) Micron Powder, Purity: 99.5 %, Size: 325 mesh

Price range: $60.00 through $3,688.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Terbium is not found free in nature. It can be found in cerite, gadolinite, and monazite. It is moderately stable in air and oxidizes slowly. Its compounds are brightly fluorescent. Terbium is used as a dopant element in different materials that are used in solid state devices. It is used in alloys and as a component of Terfenol-D (Terbium Dysprosium and Iron) which is used in many electronics. It is also used as crystal stabilizer in fuel cells.

Terbium (Tb) Sputtering Target

Price range: $510.00 through $1,249.00
Select options This product has multiple variants. The options may be chosen on the product page

Product 

Terbium (Tb) Sputtering Target

CAS No.

7440-27-9

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

158.93 g/mol

Melting Point

1,356 °C

Boiling Point

3,123 °C

Density

 8.23 g/cm³

Product Codes

NCZ-1362K

Terbium ACAC

Price range: $37.00 through $212.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Terbium ACAC
CAS No. 14284-95-8
Appearance Off-white to white
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient C₁₅H₂₁O₆Tb
Molecular Weight 456.25 g/mol
Melting Point 127 °C
Boiling Point N/A
Density N/A
Product Codes NCZ-298R
 

Terbium HFAC

Price range: $16.00 through $100.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Terbium HFAC
CAS No. N/A
Appearance Colorless needle-shaped crystals
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient (C₈H₂₀N)[Tb(C₅HF₆O₂)₄]
Molecular Weight 1117.41 g/mol
Melting Point 260 °C
Boiling Point N/A
Density 1.885 g/cm³
Product Codes NCZ-330R

Terbium Oxide (Tb4O7) Micron Powder, Purity: 99.99%, Size: 325 mesh

Price range: $35.00 through $600.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Terbium oxide has good magnetic and optical properties. It is used in magneto-optical glasses, and magneto-ptical recording materials. It is also used in glass materials with Faraday Rotation effect for optical and laser based devices. It has catalytic application in automobile exhust converter, and is used as activating agent for fluorescent powder.

Terbium Oxide (Tb4O7) Nanopowder/Nanoparticles, Purity: 99.97%, Size: 8-110 nm, Cubic

Price range: $75.00 through $387.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Terbium oxide nanoparticles have good magnetic and optical properties. It is used in magneto-optical glasses, and magneto-optical recording materials. It is also used in glass materials with Faraday Rotation effect for optical and laser based devices. It has catalytic application in automobile exhaust converter, and is used as activating agent for fluorescent powder.

Terbium Oxide (Tb4O7) Nanopowder/Nanoparticles, Purity: 99.97%, Size: 8-110 nm, Cubic

Price range: $67.00 through $350.00
Select options This product has multiple variants. The options may be chosen on the product page
1 gram/60 € 5 grams/126 € 
25 grams/309 €                       
Please contact us for quotes on larger quantities !!! 

Terbium Oxide (Tb4O7) Nanopowder/Nanoparticles

Purity: 99.97%, Size: 8-110 nm, Cubic

Technical Properties:

Purity (%) 99.97
Color dark brown-black
Morphology spherical
Average Particle Size (nm) 8-110
Specific Surface Area (m2/g) 15
Bulk Density (g/cm3) 0.8
True Density (g/cm3) 7,1
Elemental Analysis (%) NiO Fe2O3 CaO SiO2 Cl
0.001 0.001 0.0045 0.0005 0.024

Applications:

Terbium oxide nanoparticles have good magnetic and optical properties. It is used in magneto-optical glasses, and magneto-optical recording materials. It is also used in glass materials with Faraday Rotation effect for optical and laser based devices. It has catalytic application in automobile exhaust converter, and is used as activating agent for fluorescent powder.

Terbium TMHD

Price range: $44.00 through $242.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Terbium TMHD
CAS No. 15492-51-0
Appearance White/off-white crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient C₃₃H₅₇O₆Tb
Molecular Weight 708.73–708.74 g/mol
Melting Point 155–164 °C
Boiling Point N/A
Density N/A
Product Codes NCZ-364R

Test CZ-Si Wafer, Size: 4”, Orientation: (100), Boron Doped, Resistivity: 0,001-0,005 (ohm.cm), 2-Side Polished, Thickness: 200 ± 10 μm

Price range: $51.00 through $951.00
Select options This product has multiple variants. The options may be chosen on the product page
1 piece/46 € 5 pieces/190 € 25 pieces/850 € Please contact us for quotes on larger quantities !!!

Test CZ-Si Wafer

Size: 4”, Orientation: (100), Boron Doped, 2-Side Polished 

Technical Properties:

Quality Test
Materials CZ-Si
Size (inch) 4”
Orientation (100)
Coating
Thickness (μm) 525 ± 25
Doping Boron
Resistivity (ohm.cm) 0,001-0,005
Polished Double Side
Dummy is a grade of wafers, which is also referred as “test wafer” a grade lower than prime. Dummy CZ Si wafers are often doped with arsenic. Test grade wafers are high quality but have less stringent properties than prime grade wafers, usually failing for one or more of the Semiconductor Equipment and Materials International (SEMI) standards. Test grade wafers are often used in applications that require a large quantity of wafers for equipment and fabrication testing. Even if you are doing very high end R&D work it is much more cost effective to develop a process using test wafers and then do the final checks using Prime or Epi-Prime wafers.

Test CZ-Si Wafer, Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1-20 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm

Price range: $43.00 through $783.00
Select options This product has multiple variants. The options may be chosen on the product page
1 piece/39 € 5 pieces/160 € 25 pieces/700 € Please contact us for quotes on larger quantities !!! 

Test CZ-Si Wafer

Size: 4”, Orientation: (100), Boron Doped, 1-Side Polished

Technical Properties:

Quality Test
Materials CZ-Si
Size (inch) 4”
Orientation (100)
Coating
Thickness (μm) 525 ± 25
Doping Boron
Resistivity (ohm.cm) 1-20
Polished One Side
Dummy is a grade of wafers, which is also referred as “test wafer” a grade lower than prime. Dummy CZ Si wafers are often doped with arsenic. Test grade wafers are high quality but have less stringent properties than prime grade wafers, usually failing for one or more of the Semiconductor Equipment and Materials International (SEMI) standards. Test grade wafers are often used in applications that require a large quantity of wafers for equipment and fabrication testing. Even if you are doing very high end R&D work it is much more cost effective to develop a process using test wafers and then do the final checks using Prime or Epi-Prime wafers.

Test CZ-Si Wafer, Size: 4”, Orientation: (100), Phosphor Doped, Resistivity: 1-30 (ohm.cm), 1-Side Polished, Thickness: 525 ± 20 μm

Price range: $43.00 through $783.00
Select options This product has multiple variants. The options may be chosen on the product page
1 piece/39 € 5 pieces/160 € 25 pieces/700 € Please contact us for quotes on larger quantities !!! 

Test CZ-Si Wafer

Size: 4”, Orientation: (100), Phosphor Doped, 1-Side Polished

Technical Properties:

Quality Test
Materials CZ-Si
Size (inch) 4”
Orientation (100)
Coating
Thickness (μm) 525 ± 20
Doping Phosphor
Resistivity (ohm.cm) 1-30
Polished One Side
Dummy is a grade of wafers, which is also referred as “test wafer” a grade lower than prime. Dummy CZ Si wafers are often doped with arsenic. Test grade wafers are high quality but have less stringent properties than prime grade wafers, usually failing for one or more of the Semiconductor Equipment and Materials International (SEMI) standards. Test grade wafers are often used in applications that require a large quantity of wafers for equipment and fabrication testing. Even if you are doing very high end R&D work it is much more cost effective to develop a process using test wafers and then do the final checks using Prime or Epi-Prime wafers.

Tetra-needle like Zinc oxide whisker(ZnO, D=0.5-5μm, L=10-50μm) (124671)

$460.00
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Tetra-needle like Zinc oxide whisker(ZnO, D=0.5-5μm, L=10-50μm) (124671)

Property Descriptions
Appearance white and loose powder
Microstructure Tetra-needle like with nanotips
Crystal structure Single crystal, wurtzite
Length of needle(μm) 10~50
Diameter of needle root (μm) 0.5~5
Apparent density (g/cm3) 0.2±0.1
True density (g/cm3) 5.5±0.2
Whiteness (%) ≥80
Powder resistivity (Ω.cm) 105 ~108
Thermal expansion coefficient (%/℃) 4.0×10-6
Heat resistance (℃) ≥1000℃
    Features 1. High strength: T-ZnOw is of single wurtzite crystal with almost no structure defects. It is nearly a kind of ideal crystal with high mechanical strength and modulus of elasticity. Its tensile strength and modulus of elasticly reach 1.0×104 Mpa and 3.5×105 Mpa respectively, close to the theoretical values. 2. Isotropic behaviour: the unique three-dimensional tetra-needle like structure give it isotropic reinforcing and modification effect, guaranteeing products with isotropic mechanical properties, dimension homogeneity, thermal contraction and other characteristics. 3. Excellent heat resistance: Melting point of ZnO is higher than 1800°C, and T-ZnOw can resist 1750°C . Higher than 1000°C under atmospheric pressure may result in structure damage at the needle tip. 4.  Adjustable electric properties: ZnO is a n-type of semiconductor that can be doped to control its conductivity, piezoelectricity, piezosensitivity and other electric and electronic properties. 5.  Activity of nanosemiconductor: T-ZnOw has special nanoactivity due to its unique structure. With the nonstoichiometric characteristic, T-ZnOw can release reactive oxygen species, giving it high efficient, broad spectrum and long-term antibacterial and environmental cleaning property. Applications  1.  Antistatic polymer (white, high efficient, permanent and reinforcing effect, wear resistant property) 2. Wear-resistant and antiskidding materials (high-grade rubber tyres, brake, gear, rubber belt conveyer, etc.) 3.  Microwave-absorption materials (wave-absorbing and stealthy materials, electromagnetic shielding materials, etc.) 4. Vibration and damping materials (structural vibration, industrial damping, noise reduction materials) 5. Toughening for ceramic materials (craft ceramics, structural ceramics, special ceramics) 6. Enhanced composite materials (to improve the mechanical properties, processing performance, strength and elasticity modulus) 7. Antibacterial and antialgae composite materials (home appliances, daily necessities, textiles, paints) 8.  Decomposition of formaldehyde and other organic compounds (from decoration materials, indoor air) Instruction for use Mix matrix materials with T-ZnOw and other auxiliary agents and process as original production technology. Coupling agent and dispersing agent are recommended to add for strengthening the combining ability between T-ZnOw and matrix materials. Dosage Usually 5wt% to 15wt%. Note This product is only available to customers in USA and Canada by FedEx Ground.  
Product Codes- NCZ-2755K

Tetraacetatochlorodiruthenium (II,III)

Price range: $80.00 through $330.00
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Product Tetraacetatochlorodiruthenium (II,III)
CAS No. 38833-34-0
Appearance Red-brown solid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient C₈H₁₂Cl₂O₈Ru₂
Molecular Weight 384.5 g/mol
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-243R

Tetracalcium phosphate(Ca4(PO4)2O, Biomedicine grade, >98%) (204982)

$542.00
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Product 

Tetracalcium phosphate(Ca4(PO4)2O, Biomedicine grade, >98%) (204982)

CAS No.

1306‑01‑0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

  <80um (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

~366.25 g/mol

Melting Point

Decomposes at ~1450 °C

Boiling Point

N/A

Density

 Not widely documented (but typical calcium phosphates range ~2.9–3.2 g/cm³)

Product Codes

NCZ-2612K

Tetrakis(triphenylphosphine)palladium, Pd(PPh3)4, >98%

Price range: $283.00 through $2,189.00
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Product Tetrakis(triphenylphosphine)palladium, Pd(PPh3)4, >98%
CAS No. 14221-01-3
Appearance Yellow crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 10–100µm (Size Can be customized),  Ask for other available size range.
Ingredient Pd(PPh₃)₄
Molecular Weight 1155.52 g/mol
Melting Point 121–123 °C
Boiling Point N/A
Density 7.3 g/cm³
Product Codes NCZ-553I
 

Tetratitanium heptoxide(Ti4O7, 99.9%) (537552)

$485.00
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Tetratitanium heptoxide(Ti4O7, 99.9%) (537552)
Coating material Chemical formula Purity(%) Refractive index at 550nm Transparency range(nm) Melting point(°C) Density (g/cm3) Particle size(mm)
Titanium heptoxide Ti4O7 99.9 2.1-2.4 400-12000 1760 4.6 0.1-2 1-3
Product Codes- NCZ-2785K

Thallium ACAC

Price range: $16.00 through $69.00
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Product Thallium ACAC
CAS No. 25955-51-5
Appearance White
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient C₅H₇O₂Tl
Molecular Weight 303.5 g/mol
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-299R

Thallium HFAC

Price range: $30.00 through $177.00
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Product Thallium HFAC
CAS No. 15444-43-6
Appearance Yellow crystalline solid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Tl(CF₃COCHCOCF₃))
Molecular Weight N/A
Melting Point 126–128 °C
Boiling Point N/A
Density N/A
Product Codes NCZ-331R
 

Thallium TMHD

Price range: $20.00 through $130.00
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Product Thallium TMHD
CAS No. 56713-38-3
Appearance Off-white crystalline solid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Tl(C₁₁H₁₉O₂)
Molecular Weight 387.6 g/moll
Melting Point 159–164 °C
Boiling Point N/A
Density N/A
Product Codes NCZ-365R
 

Thermoplastic Carbon Paste for Long-term Cell Degradation

Price range: $160.00 through $324.00
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Application:

  • Perovskite Solar Cell

Thermoplastic Carbon Paste, Drying Temperature: <100 °C

Price range: $160.00 through $324.00
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Application:

  • Perovskite Solar Cell

Thermoplastic Carbon Paste, Drying Temperature: 120˚C for 10 minutes

Price range: $165.00 through $345.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

  • Printed Electronics,
  • Touch Sensors,
  • Heaters,
  • Medical Devices

Thermoset Carbon Paste (140 ℃, 100 ohm/sqr/25µm), 15-20 µm

Price range: $165.00 through $260.00
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Applications:

  • Printed electronics,
  • Sensors and biosensor,
  • PV cells,
  • Membrane keyboards,
  • Energy storage devices,
  • Automative electronics

Thermoset Carbon Paste (140 ℃, 1000 ohm/sqr/25µm, 10-15 µm)

Price range: $165.00 through $345.00
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Applications:

  • Biosensors,
  • Membrane Keyboards,
  • Printed Sensors,
  • PV cell,
  • Printed resistors

Thermoset Carbon Paste (140℃, <20 ohm/sqr/25µm), 10-12 µm

Price range: $165.00 through $260.00
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 Applications:

  • Printed electronics,
  • Sensors and biosensor,
  • PV cells,
  • Membrane keyboards,
  • Energy storage devices,
  • Aautomative electronics.

Thin Graphene Nanoplatelets, 1g

$235.00
Product Thin Graphene Nanoplatelets, 1g
CAS No. 1034343-98-0
Appearance Black to dark gray
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 0.5–25µm  (Size Can be customized),  Ask for other available size range.
Ingredient C
Molecular Weight Black to dark gray
Melting Point N/A
Boiling Point N/A
Density 2.2 g/cm³
Product Codes NCZ-554I

Three Roll Mill

Applications:

  • Printing Inks
  • Electronic Thick Film Inks
  • High Performance Ceramics
  • Cosmetics
  • Plastisols
  • Carbon/Graphite
  • Paints
  • Pharmaceuticals
  • Chemicals
  • Glass Coatings
  • Dental Composites
  • Pigment
  • Coatings
  • Adhesives
  • Sealants

Three Roll Mill Lab Model

$16,248.75
1 piece/16,248.75 € Please contact us for quotes on larger quantities !!! Three Roll Mill Lab Model Three roll mills can serve

Thulium (Tm) Metal 99.9% 3N, 1kg

$1,965.00
Product Thulium (Tm) Metal 99.9% 3N, 1kg
CAS No. 7440-31-5
Appearance Silvery-gray metallic solid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1-100µm  (Size Can be customized),  Ask for other available size range.
Ingredient Tm
Molecular Weight 168.93 g/mol
Melting Point 1545 °C
Boiling Point N/A
Density 9.32 g/cm³
Product Codes NCZ-555I
 

Thulium (Tm) Micron Powder Purity: 99.5 %, Size: 325 mesh

Price range: $129.00 through $8,207.00
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1 gram/115 € 5 grams/480 € 25 grams/1985 € 100 grams/7280 € 

Thulium (Tm) Micron Powder, Purity: 99.5 %, Size: 325 mesh

Price range: $180.00 through $11,375.00
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Applications:

Thulium is the least abundant element of the rare earth metals. It is moderately stable in air but should be avoided moisture. It emits blue upon excitation. Thulium is used in the manufacturing of optoelectronics. It is used in the manufacturing of flat panel screens. It is also used to create laser lights. 

Thulium ACAC

Price range: $42.00 through $235.00
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Product Thulium ACAC
CAS No. 14589-44-7
Appearance White
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Tm(C₅H₇O₂)₃
Molecular Weight 466.26 g/mol
Melting Point 103–104 °C
Boiling Point N/A
Density N/A
Product Codes NCZ-300R
 

Thulium Chloride Hexahydrate (TmCl3 · 6H2O) 99.95% 3N5

$264.00
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Product Thulium Chloride Hexahydrate (TmCl3 · 6H2O) 99.95% 3N5
CAS No. 13461-29-7
Appearance Light pink to pale violet crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 5–50µm (Size Can be customized),  Ask for other available size range.
Ingredient TmCl3·6H2O
Molecular Weight 354.26 g/mol
Melting Point N/A
Boiling Point N/A
Density 1.98 g/cm³
Product Codes NCZ-556I