Permalloy (Ni-Fe-Mo) Sputtering Targets, Size: 2”, Thickness: 0.125”

$205.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Nickel (Ni) Sputtering Targets, Purity: 99.995%, Size: 3”, Thickness: 0.250”

$205.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Magnesium (Mg) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.250”

$205.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Indium (In) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.125”

$204.00

Product 

Indium (In) Sputtering Targets, Purity: 99.999%, Size: 1'', Thickness: 0.125''

CAS No.

 7440-74-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

114.82 g/mol

Melting Point

 156.6 °C

Boiling Point

 2,072 °C

Density

 7.31 g/cm³

Product Codes

NCZ-2234K

Magnesium (Mg) Sputtering Targets, Purity: 99.98%, Size: 2”, Thickness: 0.125”

$204.00

Product 

Magnesium (Mg) Sputtering Targets, Purity: 99.98%, Size: 2'', Thickness: 0.125''

CAS No.

7439-95-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 24.305 g/mol

Melting Point

 650 °C

Boiling Point

 1,090 °C

Density

1.738 g/cm³

Product Codes

NCZ-2002K

Niobium (Nb) Sputtering Targets, Purity: 99.95% pure Ex Ta, Size: 2”, Thickness: 0.250”

$204.00

Product 

Niobium (Nb) Sputtering Targets, Purity: 99.95% pure Ex Ta, Size: 2'', Thickness: 0.250''

CAS No.

7440-03-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

92.906 g/mol

Melting Point

 2,468 °C

Boiling Point

 4,744 °C

Density

 8.57 g/cm³

Product Codes

NCZ-1817K

Dysprosium Oxide (Dy2O3) Nanopowder/Nanoparticles, High Purity: 99.95+%, Size: 28 nm

Price range: $41.00 through $204.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Dysprosium oxide nanoparticles show good magnetic and optical properties. these properties are applied in magneto-optical recording materials and in luminescence. It is a neutron absorbent and used in the measurement of neutron energy-spectrum and in nuclear reaction control rods. It is used as glass material in laser-based and optical devices with a Faraday Rotation affect.

Erbium Oxide (Er2O3) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 8-90 nm, Cubic

Price range: $27.00 through $204.00
Select options This product has multiple variants. The options may be chosen on the product page
1 gram/24 € 5 grams/37 € 25 grams/56 € 100 grams/180 €                  
Please contact us for quotes on larger quantities !!!

Erbium Oxide (Er2O3) Nanopowder/Nanoparticles

Purity: 99.95%, Size: 8-90 nm, Cubic

Applications:

Erbium oxide nanoparticles are used in electronic devices. It is used in capacitors, metal-oxide semiconductor transistors, and as a dopants for optical fiber and laser materials. It is also used as tunned insulator for Josephson junctions.  

Aluminum (Al) Nanopowder/Nanoparticles, Purity: 99.995%, Size: 68 nm, Metal Basis

Price range: $68.00 through $204.00
Select options This product has multiple variants. The options may be chosen on the product page

Aluminum (Al) Nanopowder/Nanoparticles

Purity: 99.995%, Size: 68 nm, Metal Basis

Technical Properties:

Bulk Density (g/cm3) 0,22
True Density (g/cm3) 2,7
Color black
Shape spherical
Crystal Structure cubic
Average Particle Size (nm) 68
Specific Surface Area (m2/g) 20-30
Elemental Analysis Al Si Fe Cu Mg, Mn, Pb, Ni, Zn
99.995 0.01 0.01 0.03 ≤0.01

Applications:

Aluminum nanoparticles are highly reactive and flammable, therefore it should be handled with care and rapid moves, vibrations should be avoided. Nanopowder should be kept away from sunlight, any kind of heating, moisture and impacts. Coagulation of the particles is a serious problem, so, nanopowder should be sealed under vacuum and should be kept in cool and dry conditions. Air contact should be avoided. Aluminum nanopowder can be used in catalysis applications as well as biomedical research. It can be added to heat transfer fluids, composite materials, package materials, transparent conductive fluids and wear resistant parts in order to strengthen their properties.

Carbon (C) (Pyrolytic Graphite) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.125”

$202.00

Product 

Carbon (C) (Pyrolytic Graphite) Sputtering Targets, Purity: 99.999%, Size: 1'', Thickness: 0.125''

CAS No.

 7782-42-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 12.01 g/mol

Melting Point

Sublimes ~3652 °C (no true melting)

Boiling Point

Sublimes directly ~4,200°C

Density

 ~2.2–2.25 g/cm³

Product Codes

NCZ-2344K

Nickel (Ni) Sputtering Targets, Purity: 99.995%, Size: 2”, Thickness: 0.250”

$202.00

Product 

Nickel (Ni) Sputtering Targets, Purity: 99.995%, Size: 2'', Thickness: 0.250''

CAS No.

7440-02-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 58.69 g/mol

Melting Point

~1,453 °C

Boiling Point

~2,913 °C

Density

 8.90 g/cm³

Product Codes

NCZ-1887K

Nickel (Ni) Sputtering Targets, Purity: 99.995%, Size: 3”, Thickness: 0.125”

$202.00

Product 

Nickel (Ni) Sputtering Targets, Purity: 99.995%, Size: 3'', Thickness: 0.125''

CAS No.

7440-02-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 58.69 g/mol

Melting Point

~1453–1455 °C

Boiling Point

~2913 °C

Density

 8.90 g/cm³

Product Codes

NCZ-1884K

Tantalum (Ta) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.125”

$202.00

Product 

Tantalum (Ta) Sputtering Targets, Purity: 99.95%, Size: 1'', Thickness: 0.125''

CAS No.

 7440-25-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 180.95 g/mol

Melting Point

3017 °C

Boiling Point

 5458 °C

Density

16.65 g/cm³

Product Codes

NCZ-1667K

Titanium Dioxide (TiO2) Nanopowder/Nanoparticles Dispersion in Water, Anatase, Size: 25-45 nm, 42 wt%

Price range: $59.00 through $202.00
Select options This product has multiple variants. The options may be chosen on the product page
100 ml/54 € 500 ml/95 € 1000 ml/184 €     
Please contact us for quotes on larger quantities !!!

Titanium Dioxide (TiO2) Nanopowder/Nanoparticles Dispersion in Water

Anatase, Size: 25-45 nm, 42 wt%

Titanium Dioxide (TiO2) Dispersion in PGMEA or PGME, Size: 1 µm, Rutile, 20 wt%

Price range: $59.00 through $202.00
Select options This product has multiple variants. The options may be chosen on the product page
120 ml/54 € 500 ml/95 € 1000 ml/184 €      
Please contact us for quotes on larger quantities !!!

Titanium Dioxide (TiO2) Dispersion in PGMEA or PGME

Size: 1 µm, Rutile, 20 wt%

 

Aluminum (Al) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.250”

$201.00

Product 

Aluminum (Al) Sputtering Targets, Purity: 99.999%, Size: 3'', Thickness: 0.250''

CAS No.

 7429-90-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 26.98 g/mol

Melting Point

 660.3 °C

Boiling Point

 2519 °C

Density

 2.70 g/cm³

Product Codes

NCZ-2574K

Aluminum Silicon (AlSi) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.250”

$201.00

Product 

Aluminum Silicon (AlSi) Sputtering Targets, Purity: 99.999%, Size: 3'', Thickness: 0.250''

CAS No.

Aluminum: 7429-90-5 Silicon: 7440-21-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 Al: 26.98 g/mol Si: 28.09 g/mol

Melting Point

 ~577–660 °C (depends on Si content)

Boiling Point

~2519 °C (approx.)

Density

~2.6–2.7 g/cm³

Product Codes

NCZ-2514K

Magnesium (Mg) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.125”

$201.00

Product 

Magnesium (Mg) Sputtering Targets, Purity: 99.95%, Size: 2'', Thickness: 0.125''

CAS No.

7439-95-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 24.305 g/mol

Melting Point

 650 °C

Boiling Point

 1,090 °C

Density

1.738 g/cm³

Product Codes

NCZ-2003K

Praseodymium (Pr) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”

$201.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Praseodymium (Pr) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”

$201.00

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Aluminum (Al) Micron Powder, Purity: 99.9+ %, Size: 5 µm

Price range: $27.00 through $201.00
Select options This product has multiple variants. The options may be chosen on the product page
25 grams/24 € 100 grams/66 €    500 grams/178 €   1000 grams/279 €
Please contact us for quotes on larger quantities !!!

Aluminum (Al) Micron Powder

Purity: 99.9+ %, Size: 5 µm

Hollow glass microsphere (337620)

$200.00
Hollow glass microsphere (337620) Hollow glass microsphere is a kind of ultra-lightweight inorganic non-metallic material with hollow structure, and it is a versatile and high-performance new lightweight material developed in recent years. Its true density is 0.20-0.60g/cm3 with 2-150μm in diameter. It features light weight, large bulky, low thermal conductivity, high compressive strength, smoothly mobility, etc. It can be used in paint and coatings, rubber, plastics, FRP, artificial stone, putty and other products as filler and weight-reducing agent. Because of its high compressive properties, it can be used to produce high-strength, low-density cement slurry and low-density drilling fluid in oil and gas extraction industry.
  1. Chemical composition
Silica(SiO2) 68-75%
Soda(Na2O) 22-30%
Lime(CaO)
Others 2-3%
  1. True Density
 Product Requirement (g/cm3) True Density (g/cm3)
Minimum Maximum
H20 0.20 0.18 0.22
H25 0.25 0.23 0.27
H32 0.32 0.30 0.34
H38H 0.38 0.36 0.40
H40 0.40 0.38 0.42
H46 0.46 0.44 0.48
H60 0.60 0.57 0.63
Y12000 0.60 0.57 0.63
  1. Nitrogen Isostatic Crush Strength
 Product Test Pressure (MPa/Psi) Target  Fractional Survival Minimum Fractional Survival
H20 3.45/500 90% 80%
H25 5/750 90% 80%
H32 14/2000 90% 80%
H38H 38/5500 90% 80%
H40 28/4000 90% 80%
H46 41/6000 90% 80%
H60 55/8000 90% 80%
Y12000 82/12000 90% 80%
  1. Thermal Stability
Appreciable changes in glass microspheres properties may occur above 600°C depending on temperature and duration of exposure.
  1. Chemical Resistance
In general, the chemical properties of hollow glass microspheres resemble those of a soda-lime borosilicate glass.
  1. Thermal Conductivity
 Product Thermal Conductivity (W·m-1·K-1) at 20°C
H20 0.039
H25 0.045
H32 0.050
H38H 0.054
H40 0.056
H46 0.062
H60 0.074
Y12000 0.078
  1. Flotation
 Product  Floaters (% by bulk volume)
Typical Minimum
H20 96% 93%
H25 96% 93%
H32 96% 92%
H38H 95% 92%
H40 95% 92%
H46 95% 92%
H60 95% 92%
Y12000 95% 92%
  1. Oil Absorption
0.45-0.65g oil/cm3 of hollow glass microspheres.
  1. Particle Size
 Product Particle Size(μm, by volume)
10% 50% 90% d50 Size
H20 35 65 120 68 2-150
H25 30 60 115 60 2-150
H32 25 55 105 55 2-130
H38H 22 40 70 40 2-100
H40 25 50 90 48 2-100
H46 25 50 90 46 2-100
H60 25 50 85 43 2-95
Y12000 25 50 85 43 2-95
  1. pH
7-9
  1. Appearance
White.
  1. Flow
Hollow glass microspheres remain free flowing for at least half a year from the date of shipment if stored properly.
  1. Storage and Handling
Storage: Store in dry, well ventilated and out of direct sunlight place. Have Waterproof Functions. Keep away from fire and heat. Store away from acids and mixed storage not allowed. With the suitable material for leakage in storage area. Handling: Airtight operation and local exhaust. The operator should be treated professionally and observe instructions seriously. The operator is suggested to wear self-inhalation filter type dust mask, protective chemical safety glasses, and protective gloves. Avoid producing dust and contacting with acids. Handle gently when loading and unloading to avoid breakage of packages. Equipped with emergency treatment equipment to avoid leakage.
  1. Health and Safety Information
For product Health and Safety Information, refer to product label and Material Safety Data Sheet (MSDS) before using product.   Product Codes- NCZ-2683K

Niobium Oxide (Nb2O5) Sputtering Targets, Purity: 99.5%, Size: 2”, Thickness: 0.125”

$200.00

Product 

Niobium Oxide (Nb2O5) Sputtering Targets, Purity: 99.5%, Size: 2'', Thickness: 0.125''

CAS No.

1313-96-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 265.81 g/mol

Melting Point

~1512 °C

Boiling Point

N/A

Density

 4.6 – 4.9 g/cm³

Product Codes

NCZ-1810K

Praseodymium (Pr) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”

$200.00

Product 

Praseodymium (Pr) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.125''

CAS No.

7440-10-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 140.91 g/mol

Melting Point

931 °C

Boiling Point

 3520 °C

Density

 6.77 g/cm³

Product Codes

NCZ-1791K

Zinc (Zn) Sputtering Targets, Purity: 99.99% Size: 3”, Thickness: 0.125”

$200.00

Product 

Zinc (Zn) Sputtering Targets, Purity: 99.99% Size: 3'', Thickness: 0.125''

CAS No.

7440‑66‑6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

Zn (black granules) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

65.38 g/mol

Melting Point

419.5 °C

Boiling Point

 907 °C

Density

7.14 g/cm³

Product Codes

NCZ-1471K

Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.125”

$200.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Silicon (Si) Sputtering Targets, P-type, Purity: 99.999%, Size: 2”, Thickness: 0.125”

$200.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Silicon (Si) Sputtering Targets, N-type, Purity: 99.999%, Size: 2”, Thickness: 0.125”

$200.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Nickel Iron (Ni-Fe) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.125”

$200.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Magnesium (Mg) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.125”

$200.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Magnesium (Mg) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.250”

$200.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Zinc Oxide (ZnO) with Alumina Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”

$199.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Silver (Ag) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”

$199.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.125”

$199.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Silvery, shiny, hard, and brittle, chromium is a metal that resists corrosion and has a high mirror polish. The automotive industry finds extensive use for chromium sputtering targets. Chromium sputtering targets work well as a shiny coating for bumpers and wheels. Chromium sputtering targets can be employed in a variety of vacuum applications, such as automotive glass coatings.

Carbon (C) (Pyrolytic Graphite) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.250”

$199.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 5”, Thickness: 0.125”

$198.00

Product 

Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 5'', Thickness: 0.125''

CAS No.

 7429-90-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 26.98 g/mol

Melting Point

 660.3 °C

Boiling Point

 2519 °C

Density

 2.70 g/cm³

Product Codes

NCZ-2570K

Cobalt (Co) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.250”

$198.00

Product 

Cobalt (Co) Sputtering Targets, Purity: 99.95%, Size: 3'', Thickness: 0.250''

CAS No.

7440‑48‑4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

58.93 g/mol (cobalt atomic weight)

Melting Point

~1,495 °C

Boiling Point

~2,870–2,927 °C

Density

~8.9 g/cm³

Product Codes

NCZ-2290K

Holmium Chloride Hexahydrate (HoCl3 · 6H2O) 99.9% 3N

$198.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Holmium Chloride Hexahydrate (HoCl3 · 6H2O) 99.9% 3N
CAS No. 14914-87-1
Appearance Pale yellow to pink crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 0–50µm (Size Can be customized),  Ask for other available size range.
Ingredient HoCl3·6H2O
Molecular Weight 379.32 g/mol
Melting Point N/A
Boiling Point N/A
Density 2.6 – 3.0 g/cm³
Product Codes NCZ-419I

Molybdenum (Mo) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.250”

$198.00

Product 

Molybdenum (Mo) Sputtering Targets, Purity: 99.95%, Size: 3'', Thickness: 0.250''

CAS No.

 7439-98-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

95.95 g/mol

Melting Point

 2623 °C

Boiling Point

 4639 °C

Density

10.28 g/cm³

Product Codes

NCZ-1936K

Aqueous Conductive Graphene Slurry, 1kg

$198.00
Product Aqueous Conductive Graphene Slurry, 1kg
CAS No. 1034343-98-0
Appearance Black slurry
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 4–6µm (Size Can be customized),  Ask for other available size range.
Ingredient CH₂O
Molecular Weight 12.01 g/mol
Melting Point N/A
Boiling Point N/A
Density 1.05–1.20 g/cm³
Product Codes NCZ-289I
 

Silver (Ag) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”

$198.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Titanium Dioxide (TiO2) Nanopowder/Nanoparticles Dispersion in Water, Anatase, Size: 3-28 nm, 16 wt%

Price range: $69.00 through $198.00
Select options This product has multiple variants. The options may be chosen on the product page
120 ml/69 € 500 ml/134 € 1000 ml/198 €  Please contact us for quotes on larger quantities !!! Titanium Dioxide (TiO2) Nanopowder/Nanoparticles Dispersion in Water Anatase, Size:

Barium Titanate (BaTiO3) Nanopowder/Nanoparticles, Purity: 99.99%, Size: 500 nm, Tetragonal

Price range: $19.00 through $198.00
Select options This product has multiple variants. The options may be chosen on the product page
5 grams/17 € 
25 grams/31 € 100 grams/46 €
500 grams/105 €  1000 grams/175 € 
                      
Please contact us for quotes on larger quantities !!!

Barium Titanate (BaTiO3) Nanopowder/Nanoparticles

Purity: 99.99%, Size: 500 nm, Tetragonal

Technical Properties:

Purity (%) 99.99
Color white
Average Particle Size (nm) 500
Specific Surface Area (m2/g) 2.10
True Density (g/cm3) 5.90
Crystallinity tetragonal
Morphology spherical
Ba/Ti 1.00
Elemental Analysis (wt%) Na Ca Fe K Mg Sr
0.001 0.001 0.001 0.001 0.001 0.019

Applications:

Barium Titanate nanoparticles show high density optical data storage. This property can be used in optical computing, optical image processing, piezoelectric devices, pyroelectric sensors, lasers, nonlinear optical devices, pattern recognition, micro-capacitors, dielectric amplifiers, and other optoelectronic devices.

Barium Titanate (BaTiO3) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 370 nm, Tetragonal

Price range: $19.00 through $198.00
Select options This product has multiple variants. The options may be chosen on the product page
5 grams/17 € 25 grams/31 € 100 grams/46 € 500 grams/105 € 1000 grams/175 €                    
Please contact us for quotes on larger quantities !!!

Barium Titanate (BaTiO3) Nanopowder/Nanoparticles

Purity: 99.95%, Size: 370 nm, Tetragonal

Technical Properties:

Purity (%) 99.95
Color white
Average Particle Size (nm) 370
Specific Surface Area (m2/g) 2.80
True Density (g/cm3) 5.90
Crystallinity tetragonal
Morphology spherical
Ba/Ti 1.00
Elemental Analysis (wt%) Na Ca Fe K Mg Sr
0.001 0.001 0.001 0.001 0.001 0.019

Applications:

Barium Titanate nanoparticles show high density optical data storage. This property can be used in optical computing, optical image processing, piezoelectric devices, pyroelectric sensors, lasers, nonlinear optical devices, pattern recognition, micro-capacitors, dielectric amplifiers, and other optoelectronic devices.

Barium Titanate (BaTiO3) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 280 nm, Tetragonal

Price range: $19.00 through $198.00
Select options This product has multiple variants. The options may be chosen on the product page
5 grams/17 € 
25 grams/31 € 100 grams/46 €
500 grams/105 €  1000 grams/175 € 
                      
Please contact us for quotes on larger quantities !!!

Barium Titanate (BaTiO3) Nanopowder/Nanoparticles

Purity: 99.95%, Size: 280 nm, Tetragonal

Technical Properties:

Purity (%) 99.95
Color white
Average Particle Size (nm) 280
Specific Surface Area (m2/g) 3.80
True Density (g/cm3) 5.90
Crystallinity tetragonal
Morphology spherical
Ba/Ti 1.00
Elemental Analysis (wt%) Na Ca Fe K Mg Sr
0.001 0.001 0.001 0.001 0.001 0.019

Applications:

Barium Titanate nanoparticles show high density optical data storage. This property can be used in optical computing, optical image processing, piezoelectric devices, pyroelectric sensors, lasers, nonlinear optical devices, pattern recognition, micro-capacitors, dielectric amplifiers, and other optoelectronic devices.

Barium Titanate (BaTiO3) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 90 nm, Cubic

Price range: $19.00 through $198.00
Select options This product has multiple variants. The options may be chosen on the product page
5 grams/17 € 25 grams/31 € 100 grams/46 € 500 grams/105 € 1000 grams/175 €                  
Please contact us for quotes on larger quantities !!! 

Barium Titanate (BaTiO3) Nanopowder/Nanoparticles

Purity: 99.95%, Size: 90 nm, Cubic

Technical Properties:

Purity (%) 99.95
Color white
Average Particle Size (nm) 90
Specific Surface Area (m2/g) 10.50
True Density (g/cm3) 5.90
Crystallinity cubic
Morphology spherical
Ba/Ti 1.00
Elemental Analysis (wt%) Na Ca Fe K Mg Sr
0.001 0.001 0.001 0.001 0.001 0.019

Applications:

Barium Titanate nanoparticles show high density optical data storage. This property can be used in optical computing, optical image processing, piezoelectric devices, pyroelectric sensors, lasers, nonlinear optical devices, pattern recognition, micro-capacitors, dielectric amplifiers, and other optoelectronic devices.

Copper Nanowires immersed in ethanol

$197.00
Select options This product has multiple variants. The options may be chosen on the product page
$197/5g

Product 

Copper Nanowires immersed in ethanol

CAS No.

7440-50-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

150 nm (Size Can be customized), Ask for other available size ranges.

Ingredient

AlN

Molecular Weight

63.55 g/mol

Melting Point

1084.62 °C

Boiling Point

2562 °C

Density

8.96 g/cm³

Product Codes

NCZ-1038K

Holmium Oxide Powder (Ho2O3, 99.9%, 1-10um)

$195.00
Select options This product has multiple variants. The options may be chosen on the product page
$195/200g

Product 

Holmium Oxide Powder (Ho2O3, 99.9%, 1-10um)

CAS No.

12055-62-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

1–10 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

377.86 g/mol

Melting Point

 ~2,335 °C

Boiling Point

 ~3,900 °C

Density

 ~8.41 g/cm³

Product Codes

NCZ-1139K

Iron (Fe) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.250”

$194.00

Product 

Iron (Fe) Sputtering Targets, Purity: 99.99%, Size: 4'', Thickness: 0.250''

CAS No.

 7439-89-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 55.85 g/mol

Melting Point

 1538 °C

Boiling Point

 2862 °C

Density

 7.87 g/cm³

Product Codes

NCZ-2178K

99.99% 4N 0.3-0.5 um Alpha Aluminum Oxide (Alumina) Al2O3 Powder, 500 g

$194.00
Product 99.99% 4N 0.3-0.5 um Alpha Aluminum Oxide (Alumina) Al2O3 Powder, 500 g
CAS No. 1344-28-1
Appearance White
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 0.3-0.5um (Size Can be customized),  Ask for other available size range.
Ingredient Al2O3
Molecular Weight 101.96 g/mol
Melting Point 2,072 °C
Boiling Point N/A
Density 0.4–1.0 g/cm³
Product Codes NCZ-235I

Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.125”

$194.00

Product 

Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 4'', Thickness: 0.125''

CAS No.

7429‑90‑5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

Al (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

26.98 g/mol

Melting Point

660.3 °C

Boiling Point

2467 °C

Density

 2.70 g/cm³

Product Codes

NCZ-1402K

Zinc (Zn) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.125”

$194.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Lithium Titanate (Li2TiO3) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.250”

$194.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Silicon (Si) Sputtering Targets, undoped, Purity: 99.999%, Size: 2”, Thickness: 0.125”

$193.00

Product 

Silicon (Si) Sputtering Targets, undoped, Purity: 99.999%, Size: 2'', Thickness: 0.125''

CAS No.

7440-21-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

28.0855 g/mol

Melting Point

1,414 °C

Boiling Point

 3,265 °C

Density

 2.33 g/cm³

Product Codes

NCZ-1735K

Barium Titanate Nanoparticles/Nanopowder (BaTiO3, 99.9%, 50~70nm, Cubic)

Price range: $105.00 through $193.00
Select options This product has multiple variants. The options may be chosen on the product page
$105/100g
$193/500g

Product 

Barium Titanate Nanoparticles/Nanopowder (BaTiO3, 99.9%, 50~70nm, Cubic)

CAS No.

12047-27-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

50~70nm, Cubic (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

233.19 g/mol

Melting Point

~1,625 °C

Boiling Point

 N/A

Density

~6.02 g/cm³

Product Codes

NCZ-1097K

Nickel (Ni) Sputtering Targets, Purity: 99.995%, Size: 2”, Thickness: 0.125”

$191.00

Product 

Nickel (Ni) Sputtering Targets, Purity: 99.995%, Size: 2'', Thickness: 0.125''

CAS No.

7440-02-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 58.69 g/mol

Melting Point

~1,453 °C

Boiling Point

~2,732 – 2,914 °C

Density

 8.90 g/cm³

Product Codes

NCZ-1890K

Tin (Sn) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.250”

$191.00

Product 

Tin (Sn) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness: 0.250''

CAS No.

7440-31-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

118.71 g/mol

Melting Point

231.93 °C

Boiling Point

2602 °C

Density

~7.31 g/cm³

Product Codes

NCZ-1642K

PTFE Nanopowder/Nanoparticles [Polytetrafluoroethylene, (C2F4)n)], Purity: 99.9%

Price range: $10.00 through $191.00
Select options This product has multiple variants. The options may be chosen on the product page
5 grams/9 € 25 grams/18 € 100 grams/46 €                      500 grams/98 €                     1000 grams/169 €
Please contact us for quotes on larger quantities !!!

PTFE Nanopowder/Nanoparticles [Polytetrafluoroethylene, (C2F4)n)]

Purity: 99.9%

Spherical Magnesium oxide(MgO, 99%) (127665)

$190.00
Select options This product has multiple variants. The options may be chosen on the product page
Spherical Magnesium oxide(MgO, 99%) (127665)
10, 20, 30, 40µmProduct Codes- NCZ-2681K

Manganese (Mn) Micron Powder, Purity: 99.99 %, Size: 10 µm

Price range: $21.00 through $190.00
Select options This product has multiple variants. The options may be chosen on the product page
25 grams/19 € 100 grams/54 € 500 grams/110 € 1000 grams/169 €
Please contact us for quotes on larger quantities !!!

Manganese (Mn) Micron Powder

Purity: 99.99 %, Size: 10 µm

Technical Properties:

PURITY

99.99 %

PARTICLE SIZE

10 µm

CAS

7439-96-5

MELTING POINT

1245 °C

BOILING POINT

2150 °C

CRYSTAL STRUCTURE

Cubic

DENSITY

7.43 g/cm³

COEFF. OF EXPANSION @ 20ºC

22 x 10⁻⁶

MOHS HARDNESS @ 20ºC

5

FORM  

Powder

APPLICATIONS

Alloys Ceramics Chemical reactions