Molybdenum Titanium Aluminum Carbide (Mo2TiAlC2) MAX Phase Micron-Powder, 5g

$473.00
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Product Molybdenum Titanium Aluminum Carbide (Mo2TiAlC2) MAX Phase Micron-Powder, 5g
CAS No. 7783-40-6
Appearance Gray to black fine
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1 – 5µm (Size Can be customized),  Ask for other available size range.
Ingredient Mo2Ti2AlC3
Molecular Weight 347.69 g/mol
Melting Point 1400 °C
Boiling Point N/A
Density 5.0–6.0 g/cm³
Product Codes NCZ-453I

Silicon Carbide (SiC) Sputtering Targets, Purity: 99.5%, Size: 2”, Thickness: 0.125”

$473.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Calcium Manganate (CaMnO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”

$473.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Silicon Carbide (SiC) Sputtering Targets, Purity: 99.5%, Size: 1”, Thickness: 0.125”

$472.00

Product 

Silicon Carbide (SiC) Sputtering Targets, Purity: 99.5%, Size: 1'', Thickness: 0.125''

CAS No.

 409-21-2

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 40.10 g/mol

Melting Point

~2,700 °C

Boiling Point

N/A

Density

~3.21 g/cm³

Product Codes

NCZ-1730K

Calcium sulfate whisker(CaSO4, L/D=10-80) (215675)

$470.00
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Calcium sulfate whisker(CaSO4, L/D=10-80) (215675)

Chemical Composition: CaSO4

Appearance: White Powder

Particle Shape: Rod-like Shape Fiber

Purity(%): ≥95

Average Length(μm): 5-200

L/D Ratio: 10-80

Whiteness(%): >85

Gravity(g/cm3): 2.69

Loose Density(g/cm3): 0.1-0.6

Moisture(%): <1.5

Heat Resistance(°C): 1000

Melting Point(°C): 1450

Ph: 7+/-0.5

Mohs Hardness: 3

 
Product Codes- NCZ-2756K

Indium Zinc Oxide/IZO (InZnO) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.250”

$470.00

Product 

Indium Zinc Oxide/IZO (InZnO) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness: 0.250''

CAS No.

Indium oxide (In₂O₃): 1312-43-2
Zinc oxide (ZnO): 1314-13-2

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

Approx. 260–270 g/mol (depends on ratio)

Melting Point

Indium oxide: ~1910 °C Zinc oxide: ~1975 °C

Boiling Point

N/A

Density

~7.1 g/cm³

Product Codes

NCZ-2198K

Tantalum Oxide (Ta2O5) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.250”

$470.00

Product 

Tantalum Oxide (Ta2O5) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness: 0.250''

CAS No.

1314-61-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 441.89 g/mol

Melting Point

 ~1872 °C

Boiling Point

N/A

Density

~8.2 g/cm³

Product Codes

NCZ-1653K

Zinc Oxide Nano-dispersion in Ethanol

$470.00
Select options This product has multiple variants. The options may be chosen on the product page
$470/500g

Product 

Zinc Oxide Nano-dispersion in Ethanol

CAS No.

1314-13-2

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

~10–50 nm(Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

81.38 g/mol

Melting Point

~1,975 °C

Boiling Point

~2,360 °C

Density

 ~5.61 g/cm³

Product Codes

NCZ-1223K

Vanadium Oxide (V2O5) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”

$470.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Tungsten (W) Sputtering Targets, elastomer, Purity: 99.95%, Size: 2”, Thickness: 0.125”

$470.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered. The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target. There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Selenium (Se) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.250”

$470.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Indium Oxide (In2O3) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.125”

$470.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Cerium Oxide (CeO2) Nanopowder/Nanoparticles Water Dispersion, Size: 25-45 nm, 22 wt%

Price range: $33.00 through $470.00
Select options This product has multiple variants. The options may be chosen on the product page
Cerium Oxide (CeO2) Nanopowder/Nanoparticles Water Dispersion Size: 25-45 nm, 22 wt%  

High Purity (>95 wt%) Hydroxylate Single-walled Carbon Nanotube (Floating Catalyst Method), 1g

Price range: $297.00 through $469.00
Select options This product has multiple variants. The options may be chosen on the product page
Product High Purity (>95 wt%) Hydroxylate Single-walled Carbon Nanotube (Floating Catalyst Method), 1g
CAS No. N/A
Appearance Black to dark gray
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient N/A
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-385I

Conductive Graphene Slurry in NMP, 1kg

$469.00
Product Conductive Graphene Slurry in NMP, 1kg
CAS No. 7782-42-5
Appearance Black viscous liquid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1µm (Size Can be customized),  Ask for other available size range.
Ingredient C
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 1.03 g/cm³
Product Codes NCZ-322I

Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.125”

$469.00

Product 

Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 4'', Thickness: 0.125''

CAS No.

7440-33-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 183.84 g/mol

Melting Point

3422 °C

Boiling Point

 5555 °C

Density

19.25 g/cm³

Product Codes

NCZ-1589K

Nickel Iron Sputtering Targets Ni/Fe

Price range: $165.00 through $469.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Nickel Iron Sputtering Targets Ni/Fe
CAS No. N/A
Appearance Solid, metallic gray sputtering target
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient NiFe
Molecular Weight N/A
Melting Point 1,500 °C
Boiling Point N/A
Density 8.7 g/cm³
Product Codes NCZ-131H
 

Molybdenum (Mo) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.250”

$469.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Manganese (Mn) Sputtering Targets, indium, Purity: 99.95%, Size: 1”, Thickness: 0.125”

$469.00

Applications of Sputtering Targets;

For film deposition, sputtering targets are employed. A sputtering technique called "deposition made by sputter targets" entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Targets are etched using semiconductor sputtering targets. When etching anisotropy is required to a great degree and selectivity is not an issue, sputter etching is the method of choice. By etching away the target material, sputter targets are also utilized for investigation. In one instance, the target sample is sputtered at a steady pace in secondary ion spectroscopy (SIMS). Using mass spectrometry, the concentration and identity of the spewed atoms are determined when the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”

$469.00

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Nickel-Coated Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: 8-18 nm

Price range: $75.00 through $469.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

MWCNTs are given a nickel coating to create a one-dimensional magnetic material. Ferromagnetic materials include nickel. A template for ferromagnetic nickel is made using MWCNTs. MWCNTs with nickel coating exhibit strong magnetic characteristics. MWCNTs with nickel coatings have numerous potential uses in various industries. Medicine, mechanics, electric-electronics, chemistry, energy, and other fields are among these uses. It can be used in drug delivery, biosensors, CNT composites, and other applications. four, nanoprobes, five, six, and hydrogen storage seven lithium batteries, tubes for 8 gas discharges, the nine flat panel displays, Supercapacitors ten, transistors eleven twelve solar cellstemplates, 13-photoluminescence, and 14

Grade 702 Zirconium (Zr) Pellets Evaporation Materials

Price range: $107.00 through $468.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Grade 702 Zirconium (Zr) Pellets Evaporation Materials
CAS No. 7440-67-7
Appearance Silvery White, Metallic 
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Zr
Molecular Weight 26.98 g/mol
Melting Point 1,852°C
Boiling Point N/A
Density 6.52 g/cm³
Product Codes NCZ-101E

Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”

$468.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”

$468.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Lanthanum hexaboride(LaB6, 99.9%, -360 mesh) (575927)

$467.00
Select options This product has multiple variants. The options may be chosen on the product page
Lanthanum hexaboride(LaB6, 99.9%, -360 mesh) (575927)
 
Product Codes- NCZ-2698K

Double Walled Carbon Nanotubes ( DWNTs, 60%, 2~4nm)

Price range: $136.00 through $467.00
Select options This product has multiple variants. The options may be chosen on the product page
$90/1g
$313/5g

Product 

Double Walled Carbon Nanotubes ( DWNTs, 60%, 2~4nm)

CAS No.

7727-54-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

2~4nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

228.20 g/mol

Melting Point

 120 °C

Boiling Point

N/A

Density

1.98 g/cm³

Product Codes

NCZ-1246K

High Purity Short MWNTs 98+%, <8nm

Price range: $136.00 through $467.00
Select options This product has multiple variants. The options may be chosen on the product page
$120/5g
$320/25g
$615/100g

Product 

High Purity Short MWNTs 98+%, <8nm

CAS No.

7727-54-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

<8nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

228.20 g/mol

Melting Point

 120 °C

Boiling Point

N/A

Density

1.98 g/cm³

Product Codes

NCZ-1241K

Single Walled Nanotubes (SWNTs 95%)

Price range: $136.00 through $467.00
Select options This product has multiple variants. The options may be chosen on the product page
$205/1g
$725/5g

Product 

Single Walled Nanotubes (SWNTs 95%)

CAS No.

7727-54-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 1-2 nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 228.20 g/mol

Melting Point

 120 °C

Boiling Point

N/A

Density

1.98 g/cm³

Product Codes

NCZ-1237K

Zirconium Carbide Nanoparticles/ Nanopowder ( ZrC, 97+%, 60nm)

Price range: $136.00 through $467.00
Select options This product has multiple variants. The options may be chosen on the product page
$136/25g
$467/100g

Product 

Zirconium Carbide Nanoparticles/ Nanopowder ( ZrC, 97+%, 60nm)

CAS No.

12070-14-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

60nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

103.23 g/mol

Melting Point

~3,532 °C

Boiling Point

~5,100 °C

Density

 ~6.73 g/cm³

Product Codes

NCZ-1228K

Zinc Oxide (ZnO) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.250”

$466.00

Product 

Zinc Oxide (ZnO) Sputtering Targets, Purity: 99.999%, Size: 1'', Thickness: 0.250''

CAS No.

1314‑13‑2

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

ZnO (black granules) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

81.38 g/mol

Melting Point

~1975 °C

Boiling Point

~2360 °C

Density

 ~5.61 g/cm³

Product Codes

NCZ-1454K

Zirconium Oxide (ZrO2) Nanopowder/Nanoparticles Water Dispersion, Size: 40-50 nm, 22 wt%

Price range: $38.00 through $466.00
Select options This product has multiple variants. The options may be chosen on the product page
Zirconium Oxide (ZrO2) Nanopowder/Nanoparticles Water Dispersion Size: 40-50 nm, 22 wt%

Carbon Nanotube-Mica Prepared by Electrostatic Adsorption, CNTs: 15 wt%; Mica: 85 wt%

Price range: $91.00 through $466.00
Select options This product has multiple variants. The options may be chosen on the product page
Carbon Nanotube-Mica Prepared by Electrostatic Adsorption CNTs: 15 wt%; Mica: 85 wt% Technical Properties: Carbon Nanotubes Purity >95 wt% Outside

Carbon Nanotube-Mica Prepared by Electrostatic Adsorption, CNTs: 15 wt%; Mica: 85 wt%

Price range: $91.00 through $466.00
Select options This product has multiple variants. The options may be chosen on the product page
5 grams/83 € 25 grams/168 € 100 grams/423 €                                     
Please contact us for quotes on larger quantities !!!

Carbon Nanotube-Mica Prepared by Electrostatic Adsorption

CNTs: 15 wt%; Mica: 85 wt%

Technical Properties:

Carbon Nanotubes
Purity >95 wt%
Outside Diameter (nm) >50
Inside Diameter (nm) 5.0-15.0
Length (μm) 5.0-20.0
Manufacturing Method CVD
Color black
CNTs 10 wt%; Mica 90 wt%
Specific Surface Area (m2/g) 10
Volume Resistivity (Ω.cm) <5

Applications:

Mica is a layered structure of potassium aluminum silicate, the surface of Mica is negatively charged. Carbon nanotubes are treated with cationic surfactant (Cetyl trimethyl ammonium bromide). Carbon Nanotube-Mica self assemble by electrostatic adsorption forming uniform and stable complex. It is easy to disperse and has good static conductive properties. It also show excellent mechanical and corrosion resistance properties. It can be used in petrochemical industry, coal industry and many coating.  

Zinc (Zn) Sputtering Targets, indium, Purity: 99.95%, Size: 2”, Thickness: 0.125”

$465.00

Product 

Zinc (Zn) Sputtering Targets, indium, Purity: 99.95%, Size: 2'', Thickness: 0.125''

CAS No.

7440‑66‑6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

Zn (black granules) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

65.38 g/mol

Melting Point

419.5 °C

Boiling Point

 907 °C

Density

7.14 g/cm³

Product Codes

NCZ-1459K

Antimony Tin Oxide Nanoparticles/ Nanopowder (ATO, 99.9%, <20nm)

Price range: $68.00 through $465.00
Select options This product has multiple variants. The options may be chosen on the product page
$68/25g
$185/100g
$275/500g
$465/1kg

Product 

Antimony Tin Oxide Nanoparticles/ Nanopowder (ATO, 99.9%, <20nm)

CAS No.

1332-09-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

<20nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

~150–180 g/mol

Melting Point

~1,100–1,300 °C

Boiling Point

N/A

Density

~6.5–7.2 g/cm³

Product Codes

NCZ-1181K

Antimony Tin Oxide Nanoparticles/ Nanopowder (ATO, 99.9%, 40nm)

Price range: $68.00 through $465.00
Select options This product has multiple variants. The options may be chosen on the product page
$68/25g
$135/100g
$285/500g
$465/1kg

Product 

Antimony Tin Oxide Nanoparticles/ Nanopowder (ATO, 99.9%, 40nm)

CAS No.

1332-09-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

40nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

~153–170 g/mol

Melting Point

~1,100–1,300 °C

Boiling Point

N/A

Density

~6.5–7.2 g/cm³

Product Codes

NCZ-1180K

Silicon Nitride (Si3N4) Sputtering Targets, Purity: 99.5%, Size: 2”, Thickness: 0.250”, Dark Gray to Black

$465.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

(-COOH) Functionalized Industrial Multi Walled Carbon Nanotubes, Purity: > 92%, Outside Diameter: 20-40 nm

Price range: $25.00 through $465.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Multi Walled Carbon Nanotubes have a wide range of possible uses in several industries. These applications span a variety of fields, including energy, chemistry, mechanics, and electric-electronics. It can be used for a number of things, including medication administration, biosensors, CNT composites, catalysis, nanoprobes, and hydrogen storage. 7, lithium-ion batteries, eight gas discharge tubes nine flat-panel screens, ten supercapacitors, and eleven transistors a dozen solar cells, 14 templates, 13 photoluminescence

(-OH) Functionalized Industrial Short Multi Walled Carbon Nanotubes, Purity: > 92%, Outside Diameter: 28-48 nm

Price range: $71.00 through $465.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Multi Walled Carbon Nanotubes have a variety of potential applications in different fields. These applications include medicine, mechanics, electric-electronics, chemicals, energy and others. It can be applied in, 1-drug delivery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium batteries, 8-gas-discharge tubes, 9-flat panel displays, 10-supercapacitors, 11-transistors, 12-solar cells, 13-photoluminescence, 14-templates

Molybdenum Disilicide (MoSi2) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.125”

$464.00

Product 

Molybdenum Disilicide (MoSi2) Sputtering Targets, Purity: 99.95%, Size: 2'', Thickness: 0.125''

CAS No.

12136-78-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

152.11 g/mol

Melting Point

 ~2030 °C

Boiling Point

 ~2300 °C to 2500 °C

Density

~6.26 g/cm³

Product Codes

NCZ-1927K

Niobium Oxide (Nb2O5) Sputtering Targets, indium, Purity: 99.5%, Size: 4”, Thickness: 0.125”

$464.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”

$464.00

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Sodium carboxymethyl cellulose(Food grade) (553866)

$463.00
Select options This product has multiple variants. The options may be chosen on the product page

Product 

Sodium carboxymethyl cellulose(Food grade) (553866)

CAS No.

  9004-34-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

<100 μm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

~17,000–800,000 g/mol

Melting Point

 ~274 °C (decomposes)

Boiling Point

N/A

Density

~1.5–1.6 g/cm³

Product Codes

NCZ-2602K

Manganese (Mn) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.125”

$463.00

Product 

Manganese (Mn) Sputtering Targets, Purity: 99.95%, Size: 2'', Thickness: 0.125''

CAS No.

 7439-96-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

54.93804 g/mol

Melting Point

 1,246 °C

Boiling Point

 2,061 °C

Density

 7.21 g/cm³

Product Codes

NCZ-1952K

Molybdenum Disilicide (MoSi2) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.250”

$463.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered. By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized. There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Two-dimensional NiFe Layered Double Oxide (NiFe-LDO) Powder, 500 mg/bottle

$462.00
Product Two-dimensional NiFe Layered Double Oxide (NiFe-LDO) Powder, 500 mg/bottle
CAS No. N/A
Appearance Brown
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 10–30nm (Size Can be customized),  Ask for other available size range.
Ingredient NiFe₂O₄
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 4.5 – 5.0 g/cm³
Product Codes NCZ-587I

Molybdenum Oxide (MoO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”

$462.00

Product 

Molybdenum Oxide (MoO3) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.125''

CAS No.

1313-27-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 143.94 g/mol

Melting Point

 ~795°C

Boiling Point

 ~1155°C

Density

 ~4.7 g/cm³

Product Codes

NCZ-1901K

99.9wt% Carboxylated Hollow Mesoporous Silica Powder (Spherical)

Price range: $253.00 through $462.00
Select options This product has multiple variants. The options may be chosen on the product page
Product 99.9wt% Carboxylated Hollow Mesoporous Silica Powder (Spherical)
CAS No. 7631-86-9
Appearance White or off-white fine
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 100–500nm (Size Can be customized),  Ask for other available size range.
Ingredient (SiO2)x(-COOH)y
Molecular Weight 60.08 g/mol
Melting Point N/A
Boiling Point N/A
Density 2.0–2.2 g/cm³
Product Codes NCZ-269I
 

Industrial Grade Short Multi Walled Carbon Nanotubes, Purity: > 92%, Outside Diameter: 28-48 nm

Price range: $71.00 through $462.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Multi Walled Carbon Nanotubes have a variety of potential applications in different fields. These applications include medicine, mechanics, electric-electronics, chemicals, energy and others. It can be applied in, 1-drug delivery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium batteries, 8-gas-discharge tubes, 9-flat panel displays, 10-supercapacitors, 11-transistors, 12-solar cells, 13-photoluminescence, 14-templates

Lanthanum Nitrate Hexahydrate (La(NO3)3 · 6H2O) 99.9% 3N

$461.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Lanthanum Nitrate Hexahydrate (La(NO3)3 · 6H2O) 99.9% 3N
CAS No. 10294-41-4
Appearance White crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1-10nm (Size Can be customized),  Ask for other available size range.
Ingredient La(NO3)3·6H2O
Molecular Weight 433.01 g/mol
Melting Point N/A
Boiling Point N/A
Density 2.3 g/cm³
Product Codes NCZ-440I

Vanadium Carbide (VC) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 550-750 nm, Cubic

Price range: $76.00 through $461.00
Select options This product has multiple variants. The options may be chosen on the product page
5 grams/67 € 25 grams/133 € 100 grams/407 €
Please contact us for quotes on larger quantities !!!

Vanadium Carbide (VC) Nanopowder/Nanoparticles

Purity: 99.95%, Size: 550-750 nm, Cubic

Applications:

Vanadium carbide nanoparticles is an extremely hard refractory ceramic material. It is used in cutting tools and tool bits. It also has good high temperature property and chemical stability. It is used as an additive to tungsten carbides in order to fine the carbide crystals to improve the cermet properties.

Bismuth (Bi) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 78 nm, Metal Basis

$461.00
Select options This product has multiple variants. The options may be chosen on the product page
100 grams/405 €
Please contact us for quotes on larger quantities !!!

Bismuth (Bi) Nanopowder/Nanoparticles

Purity: 99.95%, Size: 78 nm, Metal Basis

Technical Properties:

Shape spherical
Tmelting (oC) 271
Tboiling (oC) 1560
Average Particle Size (nm) 78
Specific Surface Area (m2/g) 17-28
Elemental Analysis Bi O S C Si Na Others
99.95 0.07 0.005 0.004 0.002 0.002 0.001
 

Industrial Grade Short Multi Walled Carbon Nanotubes, Purity: > 92%, Outside Diameter: 28-48 nm

Price range: $71.00 through $461.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Multi Walled Carbon Nanotubes have a variety of potential applications in different fields. These applications include medicine, mechanics, electric-electronics, chemicals, energy and others. It can be applied in, 1-drug delivery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium batteries, 8-gas-discharge tubes, 9-flat panel displays, 10-supercapacitors, 11-transistors, 12-solar cells, 13-photoluminescence, 14-templates

Tetra-needle like Zinc oxide whisker(ZnO, D=0.5-5μm, L=10-50μm) (124671)

$460.00
Select options This product has multiple variants. The options may be chosen on the product page
Tetra-needle like Zinc oxide whisker(ZnO, D=0.5-5μm, L=10-50μm) (124671)

Property Descriptions
Appearance white and loose powder
Microstructure Tetra-needle like with nanotips
Crystal structure Single crystal, wurtzite
Length of needle(μm) 10~50
Diameter of needle root (μm) 0.5~5
Apparent density (g/cm3) 0.2±0.1
True density (g/cm3) 5.5±0.2
Whiteness (%) ≥80
Powder resistivity (Ω.cm) 105 ~108
Thermal expansion coefficient (%/℃) 4.0×10-6
Heat resistance (℃) ≥1000℃
    Features 1. High strength: T-ZnOw is of single wurtzite crystal with almost no structure defects. It is nearly a kind of ideal crystal with high mechanical strength and modulus of elasticity. Its tensile strength and modulus of elasticly reach 1.0×104 Mpa and 3.5×105 Mpa respectively, close to the theoretical values. 2. Isotropic behaviour: the unique three-dimensional tetra-needle like structure give it isotropic reinforcing and modification effect, guaranteeing products with isotropic mechanical properties, dimension homogeneity, thermal contraction and other characteristics. 3. Excellent heat resistance: Melting point of ZnO is higher than 1800°C, and T-ZnOw can resist 1750°C . Higher than 1000°C under atmospheric pressure may result in structure damage at the needle tip. 4.  Adjustable electric properties: ZnO is a n-type of semiconductor that can be doped to control its conductivity, piezoelectricity, piezosensitivity and other electric and electronic properties. 5.  Activity of nanosemiconductor: T-ZnOw has special nanoactivity due to its unique structure. With the nonstoichiometric characteristic, T-ZnOw can release reactive oxygen species, giving it high efficient, broad spectrum and long-term antibacterial and environmental cleaning property. Applications  1.  Antistatic polymer (white, high efficient, permanent and reinforcing effect, wear resistant property) 2. Wear-resistant and antiskidding materials (high-grade rubber tyres, brake, gear, rubber belt conveyer, etc.) 3.  Microwave-absorption materials (wave-absorbing and stealthy materials, electromagnetic shielding materials, etc.) 4. Vibration and damping materials (structural vibration, industrial damping, noise reduction materials) 5. Toughening for ceramic materials (craft ceramics, structural ceramics, special ceramics) 6. Enhanced composite materials (to improve the mechanical properties, processing performance, strength and elasticity modulus) 7. Antibacterial and antialgae composite materials (home appliances, daily necessities, textiles, paints) 8.  Decomposition of formaldehyde and other organic compounds (from decoration materials, indoor air) Instruction for use Mix matrix materials with T-ZnOw and other auxiliary agents and process as original production technology. Coupling agent and dispersing agent are recommended to add for strengthening the combining ability between T-ZnOw and matrix materials. Dosage Usually 5wt% to 15wt%. Note This product is only available to customers in USA and Canada by FedEx Ground.  
Product Codes- NCZ-2755K

Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”

$460.00

Product 

Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''

CAS No.

7440-65-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

88.91 g/mol

Melting Point

1522 °C

Boiling Point

3338 °C

Density

4.47 g/cm³

Product Codes

NCZ-1521K

(-COOH) Functionalized Industrial Short Multi Walled Carbon Nanotubes, Purity: > 92%, Outside Diameter: 28-48 nm

Price range: $75.00 through $460.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Multi Walled Carbon Nanotubes have a wide range of possible uses in several industries. These applications span a variety of fields, including energy, chemistry, mechanics, and electric-electronics. It can be used for a number of things, including medication administration, biosensors, CNT composites, catalysis, nanoprobes, and hydrogen storage. 7, lithium-ion batteries, eight gas discharge tubes nine flat-panel screens, ten supercapacitors, and eleven transistors a dozen solar cells, 14 templates, 13 photoluminescence

Industrial Grade Short Multi Walled Carbon Nanotubes, Purity: > 92%, Outside Diameter: 28-48 nm

Price range: $71.00 through $460.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Multi Walled Carbon Nanotubes have a variety of potential applications in different fields. These applications include medicine, mechanics, electric-electronics, chemicals, energy and others. It can be applied in, 1-drug delivery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium batteries, 8-gas-discharge tubes, 9-flat panel displays, 10-supercapacitors, 11-transistors, 12-solar cells, 13-photoluminescence, 14-templates

B-doped Graphene Quantum Dots Solution (Blue Fluorescence)

Price range: $264.00 through $459.00
Select options This product has multiple variants. The options may be chosen on the product page
Product B-doped Graphene Quantum Dots Solution (Blue Fluorescence)
CAS No. 1034343-98-0
Appearance Clear to pale yellow or light brown
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 4–6nm (Size Can be customized),  Ask for other available size range.
Ingredient B20C980​
Molecular Weight 12.01 g/mol
Melting Point N/A
Boiling Point N/A
Density 1.0–1.1 g/cm³
Product Codes NCZ-293I
 

Silicon Nitride (Si3N4) Sputtering Targets, Purity: 99.5%, Size: 2”, Thickness: 0.125”, Dark Gray to Black

$459.00

Product 

Silicon Nitride (Si3N4) Sputtering Targets, Purity: 99.5%, Size: 2'', Thickness: 0.125'', Dark Gray to Black

CAS No.

 12033-89-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 140.28 g/mol

Melting Point

 ~1900 °C

Boiling Point

N/A

Density

~3.2 g/cm³

Product Codes

NCZ-1701K

Titanium Nitride (TiN) Nanopowder/Nanoparticles, Purity: 99.3+%, Size: 790 nm, Cubic

Price range: $57.00 through $459.00
Select options This product has multiple variants. The options may be chosen on the product page
5 grams/51 € 100 grams/112 € 500 grams/269 € 1000 grams/405 €
Please contact us for quotes on larger quantities !!!

Titanium Nitride (TiN) Nanopowder/Nanoparticles

Purity: 99.3+%, Size: 790 nm, Cubic

Applications:

Titanium nitride powder has high hardness, high-temperature chemical stability and excellent thermal conductivity properties. It is used in biological materials cutting tools, prostheses, artificial limbs, wearresistant coatings, plastic molds, and barrier layer in contact and interconnect metallization. It is also used in electronics such as gate electrode in metal oxide semiconductor transistors, and low barrier Schottky diode.