Lanthanum Manganate (LaMnO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”

$532.00

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Yttrium Oxide (Y2O3) Nanopowder/Nanoparticles, High Purity: 99.99%, Size: 18-38 nm

Price range: $40.00 through $532.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Yttrium oxide nanoparticles have applications in inorganic synthesis, material science, and in different electronic devices. In inorganic synthesis yttrium oxide is an important starting point for inorganic compound. It is used in making plasma and flat panel displays. It is also used in making fluorescent lamps, ultra-fast sensors, and photoelectric sensors. Yttrium oxide nanoparticle is used as additive in steel , iron, and non-ferrous alloys. It is also used as additive in coatings for high temperature applications.

Lithium Battery Strapping Tape, Width: 10 mm, Thickness: 0.03 mm, Length: 100 m

Price range: $154.00 through $532.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Lithium Battery Strapping Tape is mainly used on parts of lithium battery and for adhesion, packing, wrapping and holding purposes on battery assembling process.

Indium (In) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.125”

$531.00

Product 

Indium (In) Sputtering Targets, Purity: 99.999%, Size: 3'', Thickness: 0.125''

CAS No.

 7440-74-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

114.82 g/mol

Melting Point

 156.6 °C

Boiling Point

 2,072 °C

Density

 7.31 g/cm³

Product Codes

NCZ-2226K

Silicon (Si) Sputtering Targets, N-type, Purity: 99.999%, Size: 8”, Thickness: 0.250”

$531.00

Product 

Silicon (Si) Sputtering Targets, N-type, Purity: 99.999%, Size: 8'', Thickness: 0.250''

CAS No.

7440-21-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

28.0855 g/mol

Melting Point

 1,414 °C

Boiling Point

3,265 °C

Density

 2.33 g/cm³

Product Codes

NCZ-1754K

Vanadium Oxide (V2O5) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”

$531.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Antimony (Sb) Sputtering Targets, elastomer, Purity: 99.999%, Size: 2”, Thickness: 0.125”

$531.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. When the target shatters,

Mass spectrometry measures the concentration and identity of sputtered atoms. The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Group 15 of the periodic table contains antimony (Sb), which shares an atomic number of 51 with bismuth and arsenic. It gleams with a metallic sheen.

bluish-white in color. Despite not having the same reputation as a poison, antimony shares many of the same chemical characteristics as arsenic. Its average natural abundance in the earth's crust is 0.2 to 0.5 parts per million. Antimony sputtering targets can be utilized to create fire-retardant coatings since antimony has excellent fire retardance properties. Antimony sputtering targets can also be utilized for optoelectronic devices such as solar cells, laser diodes, photodiodes, and LEDs.

Graphene NMP Dispersion, Purity: 99.5%, Graphene: 1,0 wt%

Price range: $77.00 through $531.00
Select options This product has multiple variants. The options may be chosen on the product page
Graphene NMP Dispersion, Purity: 99.5%, Graphene: 1,0 wt%
Graphene Purity (%) 99,5
Graphene Thickness (nm) 0,6-1,2
Diameter (µm) 2,0-12,0
Appearance Black Liquid
Concentration (wt%) 1,0 (mg/ml)
Specific Surface Area (m2/g) 600-1200
Elemental Analysis (%) C            O 99,6    <0,4
Surfactant                                                                                                           YES

High-strength Potassium titanate whisker(D=3-10µm, L=10-30µm) (324801)

$530.00
Select options This product has multiple variants. The options may be chosen on the product page
High-strength Potassium titanate whisker(D=3-10µm, L=10-30µm) (324801)
  pH(Aqueous solution)=6-8 Moisture(%)<0.3 Bulk density(g/cm3)=1.03 D16= 4µm D50= 9µm D84<100 µm   XRF Chemical analysis(Wt%) TiO2=80-86 K2O=14-18 Other= 0.1max
 
Product Codes- NCZ-2751K

Potassium titanate whisker(D=0.2-0.5μm, L=5-15μm) (322801)

$530.00
Select options This product has multiple variants. The options may be chosen on the product page
Potassium titanate whisker(D=0.2-0.5μm, L=5-15μm) (322801)
pH(Aqueous solution)=7-9 Moisture(%)<0.3 Bulk density(g/cm3)=0.2-0.5 D10=1.69µm D50=5.36µm D90=8.56µm XRF Chemical analysis(Wt%) TiO2=80-86 K2O=14-18
 
Product Codes- NCZ-2750K

Manganese (Mn) Sputtering Targets, indium, Purity: 99.95%, Size: 1”, Thickness: 0.125”

$530.00

Product 

Manganese (Mn) Sputtering Targets, indium, Purity: 99.95%, Size: 1'', Thickness: 0.125''

CAS No.

 7439-96-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

54.93804 g/mol

Melting Point

 1,246 °C

Boiling Point

 2,061 °C

Density

 7.21 g/cm³

Product Codes

NCZ-1944K

Tin Oxide (SnO2) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.250”

$530.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Silver (Ag) Nanopowder/Nanoparticles Dispersion, Purity: %99.99, Size: 3 nm, 2200 ppm

Price range: $46.00 through $530.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

This research grade product brings special properties of silver (Ag) nanoparticles into a solution. This way silver nanoparticles find further applications in the research studies. It is an easy to use dispersion and can be diluted with water addition and simple mixing. This dispersion can be used in the applications where antibacterial protection is needed. It can be used in antibacterial finishing of textiles (such as leather), paper products, deodorants for personal belongings (such as toys, footwear), deodorizing agents in paints and skin related medical products (such as antibacterial gels and lotions). Note: Silver nanoparticle dispersion product should be kept away from sunlight. It is a research grade product, it should be handled by professional people. If nanoparticles begin to agglomerate after stored for a long time, the dispersion can be simply mixed before use.

Tungsten Carbide Cobalt (WC/Co) Nanopowder/Nanoparticles, Purity: 99.99%, Size: 35-75 nm

Price range: $41.00 through $530.00
Select options This product has multiple variants. The options may be chosen on the product page
5 grams/37 € 
25 grams/73 € 100 grams/112 €
500 grams/264 €  1000 grams/468 € 
                      
Please contact us for quotes on larger quantities !!!

Tungsten Carbide Cobalt (WC/Co) Nanopowder/Nanoparticles

Purity: 99.99%, Size: 35-75 nm

Applications:

Tungsten carbide cobalt nanoparticles is a hard material, corrosion resistant, and waer resistant material. It is used in cutting tools, mining tolls, and chipless forming tools. It is also used in coatings such as corrosion-resistant coatings, wear-resistance coatings, and erosion-resistant coatings. In order to enhance hardness, strength, and wear resistance tungsten carbide cobalt nanoparticles is used in nano-compsites.

Graphdiyne Monomer Hexakis [(trimethylsilyl) ethynyl] Benzene (HEB-TMS) Powder, 500mg

$528.95
Product Graphdiyne Monomer Hexakis [(trimethylsilyl) ethynyl] Benzene (HEB-TMS) Powder, 500mg
CAS No. 92408-13-2
Appearance White to off-whit
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 75µm (Size Can be customized),  Ask for other available size range.
Ingredient C₃₆H₅₄Si₆
Molecular Weight 678.18 g/mol
Melting Point N/A
Boiling Point N/A
Density 1.9–2.1 g/cm³
Product Codes NCZ-358I
 

3N5 (99.95%) Manganese (Mn) Pieces (3-12mm) Evaporation Materials

Price range: $97.00 through $528.00
Select options This product has multiple variants. The options may be chosen on the product page
Product 3N5 (99.95%) Manganese (Mn) Pieces (3-12mm) Evaporation Materials
CAS No. 7439-96-5
Appearance Silvery Metallic
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 3-12mm (Size Can be customized),  Ask for other available size range.
Ingredient Mn
Molecular Weight 54.94 g/mol
Melting Point 1,244 °C
Boiling Point N/A
Density 77.2 g/cm3
Product Codes NCZ-159E

Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”

$528.00

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Calcium Copper Titanate (CaCu3Ti4O12) Nano Powder, D50: 360 nm, Purity: ≥ 99.5 %

Price range: $40.00 through $528.00
Select options This product has multiple variants. The options may be chosen on the product page
25 grams: 36 € 100 grams: 94 € 500 grams: 276 € 1000 grams: 465 € Calcium copper titanate (also abbreviated CCTO, for calcium copper titanium oxide) is an inorganic compound with the formula CaCu3Ti4O12. It is noteworthy for its extremely large dielectric constant (effective relative permittivity) of in excess of 10,000 at room temperature. Applications:
  • Calcium Copper Titanate can be used for capacitor and resistor, new energy battery industry
  • Calcium Copper Titanate can be applied to the dynamic random memory, that is stored DRAM.
  • Calcium Copper Titanate can be used electronics, the new battery, solar battery, new energy vehicle battery industry etc.

Graphene Water Dispersion, Purity: 99.5%, Black Liquid, Graphene: 1,0 wt%

Price range: $75.00 through $527.00
Select options This product has multiple variants. The options may be chosen on the product page

Graphene Water Dispersion

Purity: 99.5%, Black Liquid, Graphene: 1,0 wt%

Graphene water dispersion raises environmentally safe handing of graphene for coating, composite, and other material applications. Graphene water dispersion is obtained by bath sonication of natural graphite flakes in water mixtures. Graphene water dispersion has outperformed commercial nano graphite at much lower loadings. Nanografi supplies Graphene Water Dispersion with high quantity and more types for different applications.

(-OH) Functionalized Industrial Short Multi Walled Carbon Nanotubes, Purity: > 92%, Outside Diameter: 28-48 nm

Price range: $86.00 through $527.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Multi Walled Carbon Nanotubes have a variety of potential applications in different fields. These applications include medicine, mechanics, electric-electronics, chemicals, energy and others. It can be applied in, 1-drug delivery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium batteries, 8-gas-discharge tubes, 9-flat panel displays, 10-supercapacitors, 11-transistors, 12-solar cells, 13-photoluminescence, 14-templates

Cobalt Iron Boron (Co-Fe-B) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.125”

$526.00

Product 

Cobalt Iron Boron (Co-Fe-B) Sputtering Targets, Purity: 99.95%, Size: 2'', Thickness: 0.125''

CAS No.

N/A

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 ~135.943 g/mol

Melting Point

N/A

Boiling Point

N/A

Density

0.986 g/cm³ (SAM — verify via COA due to low value)

Product Codes

NCZ-2280K

Aluminum Oxide (Al2O3) Sputtering Target

Price range: $174.00 through $526.00
Select options This product has multiple variants. The options may be chosen on the product page

Product 

Aluminum Oxide (Al2O3) Sputtering Target

CAS No.

1344-28-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

101.96 g/mol

Melting Point

2,072 °C

Boiling Point

 ~2,977 °C

Density

 3.95 – 4.1 g/cm³

Product Codes

NCZ-1365K

Niobium Oxide (Nb2O5) Sputtering Target

Price range: $115.00 through $526.00
Select options This product has multiple variants. The options may be chosen on the product page

Product 

Niobium Oxide (Nb2O5) Sputtering Target

CAS No.

1313-96-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

265.81 g/mol

Melting Point

~1,510 °C

Boiling Point

N\A

Density

~4.6–4.9 g/cm³

Product Codes

NCZ-1322K

Titanium Dioxide (TiO2) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”, Grey to Black

$526.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Chromium Oxide (Cr2O3) Sputtering Targets, Purity: 99.8%-99.9%, Size: 3”, Thickness: 0.125”

$526.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

The inorganic chemical with the formula Cr2O3 is chromium oxide. Applications for chromium oxide sputtering targets are numerous. Let's examine a few instances where chromium oxide sputtering targets are employed instead. Low friction coefficients and high hardness values are displayed by Cr2O3 thin films. Because of these qualities, chromium oxide is a strong contender to take the place of Al2O3 or transition metal nitrides in certain applications.

Nickel Chromium (Ni-Cr) Alloy Micron Powder, Size: 325 mesh, Ni-80%, Cr-20%

Price range: $20.00 through $526.00
Select options This product has multiple variants. The options may be chosen on the product page
5 grams/18 € 25 grams/47 €                        
100 grams/145 €                     
500 grams/280 €                    
1000 grams/465 € Please contact us for quotes on larger quantities !!!

Nickel Chromium (Ni-Cr) Alloy Micron Powder

Size: 325 mesh, Ni-80%, Cr-20%

O-Carboxymethyl Chitosan(Water soluble) (235669)

$525.00
Select options This product has multiple variants. The options may be chosen on the product page
O-Carboxymethyl Chitosan(Water soluble) (235669)
Item

standard

Appearance

white or slight yellow powder or flaky

Insoluble matter %

≤1.0

Moisture %

≤15

Viscosity mpa.s

10-1000

Degree of substitution %

≥80

pH

7-9

Heavy Metals ppm

≤10

Arsenic ppm

≤0.5

Product Codes- NCZ-2656K

Germanium (Ge) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.250”

$525.00

Product 

Germanium (Ge) Sputtering Targets, Purity: 99.999%, Size: 4'', Thickness: 0.250''

CAS No.

7440-56-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 72.63 g/mol

Melting Point

 938.3 °C

Boiling Point

2,833 °C

Density

 5.32 g/cm³

Product Codes

NCZ-2237K

Hydrothermal Synthesis Autoclave Reactor with PTFE Lined Vessel 50 ml

Price range: $120.00 through $525.00
Select options This product has multiple variants. The options may be chosen on the product page
APPLICATIONs
  • Chemical synthesis
  • Synthesizing of nanoparticles
  • For cultured crystal growth
  • Polymerization reaction
  • Hydrothermal decomposition
  • Catalyst synthesis
  • Hydrothermal oxidation
  • Hydrothermal precipitation
  • Material Digester / digestion
  • Crystallization process
  • Dissolve of heavy metals, refractory material, organic chemicals etc.
 

Fe doped Ti3AlC2 MXene

Price range: $25.00 through $525.00
Select options This product has multiple variants. The options may be chosen on the product page

Product Name: V4C3 MXene Powder

Product Code: NCZ-MX-212
Product

 V4C3 MXene Powder

Colour Black Powder
Purity ≥98 wt%
Ingredient  V4C3
CAS NO 12316-56-2
APPLICATION FIELDS High-temperature coating, Mxene precursor, conductive self-lubricating ceramic, lithium-ion battery, supercapacitor, electrochemical catalysis. RELATED INFORMATION Storage Conditions: Airtight sealed, avoid light and keep dry at room temperature. Please email us for the customization. Email: contact@nanochemazone.com

Cobalt doped Ti3AlC2 MXene powder

Price range: $25.00 through $525.00
Select options This product has multiple variants. The options may be chosen on the product page

Product Name: Cobalt doped Ti3AlC2 MXene powder

Product Code: NCZ-MX-105-20B

Product Cobalt doped Ti3AlC2 MXene powder
Colour Black Powder
Purity ≥98 wt%
Ingredient Co@Ti3AlC2, Also available other doping such as Fe, Mn, S (Ask for the customization)
CAS NO 196506-01-1

Cobalt doped Ti3AlC2 MXene powder APPLICATION FIELDS:

High-temperature coating, Mxene precursor, conductive self-lubricating ceramic, lithium-ion battery, supercapacitor, electrochemical catalysis. RELATED INFORMATION Storage Conditions: Airtight sealed, avoid light and keep dry at room temperature. Please email us for the customization. Email: contact@nanochemazone.com

Copper doped Ti3AlC2 MAXene powder

Price range: $25.00 through $525.00
Select options This product has multiple variants. The options may be chosen on the product page

Product Name:  Copper Doped Ti3AlC2 MAXene Powder

Product Code: NCZ-MX-105-20A

Product Cu doped Ti3AlC2 MAXene powder
Colour Black Powder
Purity ≥98 wt%
Ingredient Cu@Ti3AlC2
CAS NO 196506-01-1

Copper doped Ti3AlC2 MAXene powder application field:

High-temperature coating, Mxene precursor, conductive self-lubricating ceramic, lithium-ion battery, supercapacitor, electrochemical catalysis. RELATED INFORMATION Storage Conditions: Airtight sealed, avoid light and keep dry at room temperature. Please email us for the customization. Email: contact@nanochemazone.com

Synthetic Urine for Corrosion Testing of Urological Implants, Stabilized

Price range: $95.00 through $525.00
Select options This product has multiple variants. The options may be chosen on the product page

Synthetic Urine

Synthetic Urine

Product Number: NCZ-APS-0014-20

Packaging: 100 mL to 1000 mL

NOTE: Custom pH formulations can be made in the pH range from 2.0 to 9.0. For custom component formulations please contact sales@nanochemazone.com for a quote. Artificial Urine This ready-to-use solution has the same composition as Real Urine Medium and closely resembles human urine. This formulation contains a non-toxic preservatives to avoid bacteria growth and can be stored at room temperature. The pH of the Artificial Urine Stabilized is 6.5.

Artificial Urine's Application:

Artificial Urine for Corrosion Testing of Urological Implants, Stabilized

Artificial Urine

Price range: $95.00 through $525.00
Select options This product has multiple variants. The options may be chosen on the product page

Artificial Urine

Product Number: NCZ-APS-0014

Packaging: 100 mL to 1000 mL (Also available in 25 Litre Containers)

Artificial Urine for Corrosion Testing of Urological Implants, Stabilize

Artificial is designed for testing metallic biomaterials used to produce urological implants and catheters. This convenient product is a ready-to-use solution. Artificial Urine formulation contains a non-toxic preservatives to avoid bacteria growth and can be stored at room temperature. The pH of the final solution is 6.0.

Sodium Chloride 6.773 g/LSodium Phosphate Monobasic, Dihydrate 1.33 g/LPotassium Chloride 6.065 g/LCalcium Chloride Dihydrate 0.883 g/LSodium Citrate Dihydrate 0.584 g/L Sodium Phosphate Dibasic 0.435 g/LSodium Sulfate 2.431 g/LMagnesium Sulfate, Heptahydrate 0.731 g/LAmmonium Chloride 2.322 g/LPro-Clean 0.3 mL/L
Artificial Urine FOR TESTING STERILE URETHRAL CATHETERS Artificial specifies the method to test sterile urethral catheters. This ready-to-use solution should be stored frozen to avoid bacteria growth. The pH of the solution is 6.6.
The pH of the solution 6.6 /- 0.1Urea  25.0 g/LSodium Chloride 9.0 g/LDisodium Hydrogen Orthophosphate, anhydrous 2.5 g/L Potassium Dihydrogen Orthophosphate 2.5 g/LAmmonium Chloride 3.0 g/LCreatinine 2.0 g/LSodium Sulphite, hydrated 3.0 g/L
Medium for Growing Urological Pathogens This ready-to-use solution closely resembles the composition of human urine and can be used for clinical studies as well as for product testing. This formulation supports growth of wide range of urinary pathogens and it is also capable of forming crystals similar to those found in natural urinary tract infections. It can be used as negative controls in laboratory testing. pH of the Artificial Urine Medium is 6.5. This product is stored frozen. Artificial Urine Stabilized This ready-to-use solution has the same composition as Artificial Urine Medium and closely resembles human urine. This formulation contains non-toxic preservative to avoid bacteria growth and can be stored at room temperature. The pH of Artificial Urine Stabilized is 6.5. Contact us for Customization: sales@nanochemazone.com We accept customization in the pH range and composition of Simulated Urine.

ARTIFICIAL ECCRINE PERSPIRATION

Price range: $95.00 through $525.00
Select options This product has multiple variants. The options may be chosen on the product page

Artificial Eccrine Perspiration

ARTIFICIAL SWEAT

Product Number: NCZ-APS-0011

Packaging: 100 mL to 1000 mL

Artificial Eccrine Perspiration we offer is a ready-to-use solution and is the closest mimic to true human eccrine sweat. It consists of nineteen amino acids, the seven most abundant minerals, and the four most abundant metabolites at a pH of 4.5. All concentrations closely match experimentally determined values for adult human eccrine sweat.

The stabilized solution is preserved with a fungicide and bactericide for two years of shelf life at room temperature. The non-stabilized product is kept frozen and has a shelf life of one year.

Note: Custom formulations at varying pH (2-9) can be made as either the stabilized or non- stabilized solutions.

The stabilized version has a preservative that prevents microbial growth and can then be stored at room temperature. The not stabilized version has no preservative and must be kept frozen until you intend to use it. You may need this version if you are testing a product that claims to prevent microbial growth or odor from perspiration. Our Artificial Eccrine Perspiration normally comes at pH 4.5, however, we can make it custom from pH 2.0 – 9.0.

Simulated Saliva Applications:

Makers of smartwatches, high-performance textiles, biosensors, heads-up displays, and fitness monitors all have one thing in common – the need to test their products for quality assurance. Personal electronics and wearable technology manufacturers perform sweat testing on materials including touch screens, watchbands, keyboards, eyeglasses, and any other product material or surface that would benefit from guaranteed reproducible results with artificial perspiration. By using artificial eccrine perspiration, our customers are able to save time and ensure the same repeatable results anywhere, anytime.

Contact us for Customization: sales@nanochemazone.com

ARTIFICIAL SWEAT

Price range: $95.00 through $525.00
Select options This product has multiple variants. The options may be chosen on the product page

Artificial Sweat/Eccrine Perspiration

ARTIFICIAL SWEAT/SYNTHETIC SWEAT

Product Number: NCZ-APS-0011-20

Packaging: 100 mL to 1000 mL

NOTE: Custom pH formulations can be made in the pH range from 2.0 to 9.0. For custom component formulations please contact sales@nanochemazone.com for a quote.

Artificial Eccrine Perspiration we offer is a ready-to-use solution and is the closest mimic to true human eccrine sweat. It consists of nineteen amino acids, the seven most abundant minerals, and the four most abundant metabolites at a pH of 4.5. All concentrations closely match experimentally determined values for adult human eccrine sweat.

Artificial Sweat stabilized solution is preserved with a fungicide and bactericide for two years of shelf life at room temperature. The non-stabilized product is kept frozen and has a shelf life of one year.

Note: Custom formulations at varying pH (2-9) can be made as either the stabilized or non- stabilized solutions.

Artificial Eccrine Perspiration stabilized version has a preservative that prevents microbial growth and can then be stored at room temperature. The not stabilized version has no preservative and must be kept frozen until you intend to use it. You may need this version if you are testing a product that claims to prevent microbial growth or odor from perspiration. Our Artificial Eccrine Perspiration normally comes at pH 4.5, however, we can make it custom from pH 2.0 – 9.0.

Artificial Eccrine Perspiration Applications:

Makers of smartwatches, skin drug testing, pharmaceutical industries, high-performance textiles, biosensors, heads-up displays, and fitness monitors all have one thing in common – the need to test their products for quality assurance. Personal electronics and wearable technology manufacturers perform sweat testing on materials including touch screens, watchbands, keyboards, eyeglasses, and any other product material or surface that would benefit from guaranteed reproducible results with artificial perspiration. By using artificial eccrine perspiration, our customers are able to save time and ensure the same repeatable results anywhere, anytime.

Contact us for Customization: sales@nanochemazone.com

Artificial Saliva

Price range: $95.00 through $525.00
Select options This product has multiple variants. The options may be chosen on the product page

Artificial Saliva

Product Number: NCZ-APS-0012

Packaging: 100 mL to 1000 mL

We provide several formulations of artificial saliva based on official testing methods as well as published scientific data. To increase the stability of some products during storage, several artificial saliva formulations come as 2-part formulations that need to be combined before use. Custom formulations to accommodate specific pH or ingredient requirements are also available upon request.

Simulated Saliva Applications:

For testing of products for corrosion, colorfastness, and discoloration

For testing biodegradability of dental metal alloys

To determine colorfastness of products intended to be taken into the mouth

ARTIFICIAL SALIVA FOR PHARMACEUTICAL RESEARCH

Artificial Saliva is formulated according to literature for pharmaceutical research such as studies of drug dissolution and drug delivery through the oral mucosa. This is ready to use formulation that should be stored refrigerated. The pH of the solution is 6.8.

ARTIFICIAL SALIVA FOR MEDICAL AND DENTAL RESEARCH

This Artificial Saliva is formulated according to literature references for medical and dental research. This formulation has a similar composition to commercially available products used to treat dry mouth and other conditions. This ready-to-use solution contains Sodium Carboxymethyl Cellulose to increase the viscosity of the solution and make it behave similarly to natural human saliva. This formulation can be stored at room temperature and has a pH of 6.8. This solution is only intended for product testing and research, and not for medical use.

pH and contents are customizable upon request.

Artificial Saliva is formulated to Test Products for Colorfastness and Biodegradability of Dental Metal Alloys

Contact us for Customization: sales@nanochemazone.com

Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 6”, Thickness: 0.125”

$524.00

Product 

Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 6'', Thickness: 0.125''

CAS No.

7440‑47‑3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 51.9961 g/mol

Melting Point

 1,857 °C

Boiling Point

 2,672 °C

Density

 7.14 g/cm³

Product Codes

NCZ-2311K

Copper (Cu) Sputtering Targets, Purity: 99.99%, Size: 8”, Thickness: 0.250”

$524.00

Product 

Copper (Cu) Sputtering Targets, Purity: 99.99%, Size: 8'', Thickness: 0.250''

CAS No.

7440-50-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

63.55 g/mol

Melting Point

1,084 °C

Boiling Point

 2,562 °C

Density

8.96 g/cm³

Product Codes

NCZ-2251K

Nickel Chromium (Ni-Cr) Alloy Micron Powder, Size: 325 mesh, Ni-80%, Cr-20%

Price range: $20.00 through $524.00
Select options This product has multiple variants. The options may be chosen on the product page
5 grams/18 € 25 grams/47 €                        
100 grams/145 €                     
500 grams/280 €                    
1000 grams/465 € Please contact us for quotes on larger quantities !!!

Nickel Chromium (Ni-Cr) Alloy Micron Powder

Size: 325 mesh, Ni-80%, Cr-20%

Aluminum Oxide (Al2O3) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”

$523.00

Product 

Aluminum Oxide (Al2O3) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.125''

CAS No.

 1344-28-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

101.96 g/mol

Melting Point

~2,072 °C

Boiling Point

~2,977 °C

Density

~3.97–3.98 g/cm³

Product Codes

NCZ-2541K

Magnesium (Mg) Sputtering Targets, Purity: 99.98%, Size: 6”, Thickness: 0.250”

$523.00

Product 

Magnesium (Mg) Sputtering Targets, Purity: 99.98%, Size: 6'', Thickness: 0.250''

CAS No.

7439-95-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 24.305 g/mol

Melting Point

 650 °C

Boiling Point

 1,090 °C

Density

1.738 g/cm³

Product Codes

NCZ-1989K

Molybdenum Disilicide (MoSi2) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.250”

$523.00

Product 

Molybdenum Disilicide (MoSi2) Sputtering Targets, Purity: 99.95%, Size: 2'', Thickness: 0.250''

CAS No.

12136-78-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

152.11 g/mol

Melting Point

 ~2030 °C

Boiling Point

 ~2300 °C to 2500 °C

Density

~6.26 g/cm³

Product Codes

NCZ-1926K

Silicon Sputtering Target Si N-Type

Price range: $237.00 through $523.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Silicon Sputtering Target Si N-Type
CAS No. 7440-21-3
Appearance Dark Gray with a Bluish Tinge, Semi-Metallic
Purity ≥99%,  ≥99.9%,  ≥95% (Other purities are also available)
APS 1–20µm (Size Can be customized),  Ask for other available size range.
Ingredient Si
Molecular Weight 28.0855 g/mol
Melting Point 1,410 °C
Boiling Point 2,355 °C
Density 2.33 g/cm³
Product Codes NCZ-137H
 

Yttrium Ferrite (Y3Fe5O12) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”

$522.00

Product 

Yttrium Ferrite (Y3Fe5O12) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''

CAS No.

12068-40-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

706.32 g/mol

Melting Point

~1,790 °C

Boiling Point

N/A

Density

~5.17 – 5.36

Product Codes

NCZ-1513K

Indium Zinc Oxide/IZO (InZnO) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.125”

$522.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Cobalt Iron Boron (Co-Fe-B) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.125”

$522.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

An alloy consisting of cobalt, iron, and boron can be utilized as a sputtering target. Let's examine the possible uses for cobalt, iron, and boron alloys.

Iron (Fe) Nanopowder/Nanoparticles, Purity: 99.55%, Size: 790 nm

Price range: $27.00 through $522.00
Select options This product has multiple variants. The options may be chosen on the product page

Iron (Fe) Nanopowder/Nanoparticles

Purity: 99.55%, Size: 790 nm

Technical Properties:

True Density (g/cm3) 7,9
Color dark gray
Crystal Structure cubic
Tmelting (oC) 1538
Tboiling (oC) 2862
Average Particle Size (nm) 790
Elemental Analysis Fe Mn Ni Al Ca Others
99.5 0.13 0.12 0.09 0.05 0.02

Properties, Storage and Cautions:

Iron nanoparticles are highly reactive and flammable, therefore it should be handled with care and rapid moves, vibrations should be avoided. Nanopowder should be kept away from sunlight, any kind of heating, moisture and impacts. Coagulation of the particles is a serious problem, so, nanopowder should be sealed under vacuum and should be kept in cool and dry conditions. Air contact should be avoided.

Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”

$521.00

Product 

Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.125''

CAS No.

123273‑09‑6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 ~313.9 g/mol

Melting Point

 ~1,550 °C (approximate; ceramic decomposition likely above)

Boiling Point

N/A

Density

 ~5.3 g/cm³ @ room temp

Product Codes

NCZ-2152K

Lithium Phosphate (Li3PO4) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.125”

$521.00

Product 

Lithium Phosphate (Li3PO4) Sputtering Targets, Purity: 99.95%, Size: 2'', Thickness: 0.125''

CAS No.

10377-52-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 115.79 g/mol

Melting Point

 ~837 °C

Boiling Point

~158 °C (likely decomposition)

Density

 ~2.53 g/cm³

Product Codes

NCZ-2033K

Nickel (Ni) Sputtering Targets, Purity: 99.99%, Size: 8”, Thickness: 0.250”

$520.00

Product 

Nickel (Ni) Sputtering Targets, Purity: 99.99%, Size: 8'', Thickness: 0.250''

CAS No.

7440-02-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 58.69 g/mol

Melting Point

 1,455 °C

Boiling Point

 2,732 °C

Density

 8.90 g/cm³

Product Codes

NCZ-1863K

Yttrium Ferrite (Y3Fe5O12) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”

$520.00

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Lead (Pb) Sputtering Target

Price range: $107.00 through $519.00
Select options This product has multiple variants. The options may be chosen on the product page

Product 

Lead (Pb) Sputtering Target

CAS No.

7439-92-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

207.2 g/mol

Melting Point

327.5 °C

Boiling Point

1,744 °C

Density

11.34 g/cm³

Product Codes

NCZ-1295K

Nickel Oxide (NiO) Sputtering Targets, Purity: 99.995%, Size:1”, Thickness: 0.125”

$519.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Barium Titanate (BaTiO3) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”

$519.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. When the target shatters,

Mass spectrometry measures the concentration and identity of sputtered atoms. The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Formulated as BaTiO3, barium titanate is an inorganic substance. When manufactured, barium titanate is transparent and has a white powder appearance.

Lanthanum hexaboride(LaB6, 99.9%, -500 mesh) (579927)

$518.00
Select options This product has multiple variants. The options may be chosen on the product page
Lanthanum hexaboride(LaB6, 99.9%, -500 mesh) (579927)
Product Codes- NCZ-2699K

Silicon (Si) Sputtering Targets, N-type, Purity: 99.999%, Size: 8”, Thickness: 0.125”

$518.00

Product 

Silicon (Si) Sputtering Targets, N-type, Purity: 99.999%, Size: 8'', Thickness: 0.125''

CAS No.

7440-21-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

28.0855 g/mol

Melting Point

 1,414 °C

Boiling Point

3,265 °C

Density

 2.33 g/cm³

Product Codes

NCZ-1755K

Two-dimensional MgAl Layered Double Hydroxide (MgAl-LDH) Powder, 500 mg/bottle

$517.00
Product Two-dimensional MgAl Layered Double Hydroxide (MgAl-LDH) Powder, 500 mg/bottle
CAS No. 11097-59-9
Appearance Fine white
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1–4µm (Size Can be customized),  Ask for other available size range.
Ingredient Mg₆Al₂(OH)₁₆CO₃·4H₂O
Molecular Weight 603.97 g/mol
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-584I

Solid Silica Nanoparticles Powder, 20 nm-900 nm

$517.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Solid Silica Nanoparticles Powder, 20 nm-900 nm
CAS No. 7631-86-9
Appearance White to off-white fine
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 20-900nm (Size Can be customized),  Ask for other available size range.
Ingredient SiO₂
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 2.0–2.2 g/cm³
Product Codes NCZ-530I
 

Silicon Quantum Dots Powder (Green Fluorescence), 25mg

$517.00
Product Silicon Quantum Dots Powder (Green Fluorescence), 25mg
CAS No. 7440-21-3
Appearance Off-white to pale yellow
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 2–5nm (Size Can be customized),  Ask for other available size range.
Ingredient Si
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 2.33 g/cm³
Product Codes NCZ-519I