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Silicon Carbide (SiC) Nano Powder, 50g/bottle
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Silicon Carbide (SiC) Nano Powder, 50g/bottle

$517.00
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Product Silicon Carbide (SiC) Nano Powder, 50g/bottle
CAS No. 409-21-2
Appearance Gray to black
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 100nm (Size Can be customized),  Ask for other available size range.
Ingredient SiC
Molecular Weight 40.10 g/mol
Melting Point N/A
Boiling Point N/A
Density 3.21 g/cm³
Product Codes NCZ-515I
Monodisperse Mesoporous Silica Nanosphere (MSN) Stellate, 80 nm
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Monodisperse Mesoporous Silica Nanosphere (MSN) Stellate, 80 nm

Price range: $259.00 through $517.00
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Product Monodisperse Mesoporous Silica Nanosphere (MSN) Stellate, 80 nm
CAS No. 7631-86-9
Appearance White or off-white
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 80nm (Size Can be customized),  Ask for other available size range.
Ingredient SiO₂·xH₂O
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 0.2 – 0.4 g/cm³
Product Codes NCZ-456I
 
Carboxylated Solid Silica Nanoparticles Suspension, 25 mg/mL
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Carboxylated Solid Silica Nanoparticles Suspension, 25 mg/mL

$517.00
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Product Carboxylated Solid Silica Nanoparticles Suspension, 25 mg/mL
CAS No. 7440-21-3
Appearance White
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient SiO2
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-308I
 
Aminated Solid Silica Nanoparticles Suspension, 25 mg/mL
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Aminated Solid Silica Nanoparticles Suspension, 25 mg/mL

$517.00
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Product Aminated Solid Silica Nanoparticles Suspension, 25 mg/mL
CAS No. 7440-21-3
Appearance White suspension
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 20–800nm (Size Can be customized),  Ask for other available size range.
Ingredient C₉H₂₃NO₃Si
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 2 g/cm³
Product Codes NCZ-286I
 
Aminated Solid Silica Nanoparticles Powder, 20-900 nm
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Aminated Solid Silica Nanoparticles Powder, 20-900 nm

$517.00
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Product Aminated Solid Silica Nanoparticles Powder, 20-900 nm
CAS No. 7440-21-3
Appearance Fine white
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 20-900nm (Size Can be customized),  Ask for other available size range.
Ingredient C₉H₂₃NO₃Si
Molecular Weight 221.37 g/mol
Melting Point N/A
Boiling Point N/A
Density 2 g/cm³
Product Codes NCZ-285I
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Zinc Oxide (ZnO) with Alumina Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.250''
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Zinc Oxide (ZnO) with Alumina Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.250”

$517.00
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 Zinc Oxide (ZnO) with Alumina Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.250''

CAS No.

ZnO: 1314-13-2 Al₂O₃: 1344-28-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

ZnO + Al₂O₃ (AZO)(black granules) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 ZnO: 81.38 g/mol Al₂O₃: 101.96 g/mol

Melting Point

~1975 °C

Boiling Point

N/A

Density

 ~5.6 g/cm³

Product Codes

NCZ-1487K
Tin Sputtering Target Sn
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Tin Sputtering Target Sn

Price range: $157.00 through $517.00
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Product Tin Sputtering Target Sn
CAS No. N/A
Appearance Silvery Lustrous Gray, Metallic
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Sn
Molecular Weight 118.71 g/mol
Melting Point N/A
Boiling Point N/A
Density 7.365 g/cm³
Product Codes NCZ-143H
Carboxylated Solid Silica Nanoparticles Powder, 20-900 nm
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Carboxylated Solid Silica Nanoparticles Powder, 20-900 nm

$516.00
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Product Carboxylated Solid Silica Nanoparticles Powder, 20-900 nm
CAS No. N/A
Appearance White
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 20-900nm (Size Can be customized),  Ask for other available size range.
Ingredient Si–O–Si–(CH2)n–COOH
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 2.2 g/cm³
Product Codes NCZ-307I
High Purity Indium Oxide Powder ( 99.999+%, -325mesh)
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High Purity Indium Oxide Powder ( 99.999+%, -325mesh)

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Price range: $177.00 through $516.00
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$177/25g
$516/100g

Product 

 High Purity Indium Oxide Powder ( 99.999+%, -325mesh)

CAS No.
1312-43-2

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 -325mesh (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  277.64 g/mol

Melting Point

 ~1,910 °C

Boiling Point

~3,400 °C (sublimes/decomposes)

Density

 ~7.18 g/cm³

Product Codes

NCZ-1145K
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Titanium Nitride (TiN) Sputtering Targets, Purity: 99.5%, Size: 2”, Thickness: 0.250”

, , ,
$516.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

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Tin Oxide (SnO2) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.125”

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$516.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

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Niobium Oxide (Nb2O5) Sputtering Targets, Purity: 99.5%, Size: 8”, Thickness: 0.250”

, ,
$516.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When etching anisotropy is high, sputter etching is the preferred method.

is required, and selectivity is unimportant. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

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Graphene NMP Dispersion, Purity: 99.5%, Graphene: 1,0 wt%

Price range: $70.00 through $516.00
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Application Fields

1) XPS patterns of Single Layer Graphene 2) Catalyst 3) Supercapacitors 4) Solar energy 5) Graphene semiconductor chips 6) Conductive graphene film 7) Graphene computer memory 8) Biomaterials 9) Transparent conductive coatings
Magnesium ascorbyl phosphate(Cosmetic grade) (539640)
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Magnesium ascorbyl phosphate(Cosmetic grade) (539640)

$515.00
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Magnesium ascorbyl phosphate(Cosmetic grade) (539640)

      Synonym Vitamin C magnesium phosphate, Magnesium L-Ascorbyl Phosphate Structure
Molecular Formula C12H12O18P2Mg3·10H2O

 TEST SPECIFICATIONS
1. Appearance White to pale yellow powder
2. Assay ≥98.50%
3. Loss on Drying ≤20%
4. Heavy metals(Pb) ≤0.001%
5. Arsenic ≤0.0002%
6. pH(3%aqueous solution) 7.0-8.5
7. State of solution(3% aqueous solution Colorless to pale yellowish transparent
8. Color of solution(APHA) ≤70
9. Free ascorbic acid ≤0.5%
10. Free Phosphoric acid ≤1%
11. Ketogulonic acid and its derivatives ≤2.5%
12. Derivatives of ascorbic acid ≤3.5 %
13. Chloride ≤0.35%
14. Total aerobic coumt ≤100 per gram
15. Packaging 1 kg aluminum foil bag, 5/10kg carton, 25 kg barrel, according to customer requirements
16. Shelf life 3 yr after production
Product Codes- NCZ-2709K
Tin (IV) Oxide (SnO2) Nanoparticles, 50nm, >99.9% Purity, 250g
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Tin (IV) Oxide (SnO2) Nanoparticles, 50nm, >99.9% Purity, 250g

$515.00
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Product Tin (IV) Oxide (SnO2) Nanoparticles, 50nm, >99.9% Purity, 250g
CAS No. 18282-10-5
Appearance White to pale yellow
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 5nm (Size Can be customized),  Ask for other available size range.
Ingredient SnO2
Molecular Weight 150.71 g/mol
Melting Point N/A
Boiling Point N/A
Density 6.95 g/cm³
Product Codes NCZ-562I
 
Samarium Oxide (Sm2O3) Nanopowder, 40nm, ≥99.99% (4N) Purity, 500g
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Samarium Oxide (Sm2O3) Nanopowder, 40nm, ≥99.99% (4N) Purity, 500g

$515.00
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Product Samarium Oxide (Sm2O3) Nanopowder, 40nm, ≥99.99% (4N) Purity, 500g
CAS No. 12060-10-1
Appearance White to pale yellow
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 40nm (Size Can be customized),  Ask for other available size range.
Ingredient Sm2O3
Molecular Weight 348.72 g/mol
Melting Point 2345 °C
Boiling Point N/A
Density 7.52 g/cm³
Product Codes NCZ-510I
 
Barium Fluoride, BaF2 99.99% 4N High Purity Powder
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Barium Fluoride, BaF2 99.99% 4N High Purity Powder

$515.00
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Product Barium Fluoride, BaF2 99.99% 4N High Purity Powder
CAS No. 7787-32-8
Appearance White to off-white
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 40µm (Size Can be customized),  Ask for other available size range.
Ingredient BaF2
Molecular Weight 175.32 g/mol
Melting Point 1368 °C
Boiling Point 2260 °C
Density 4.89 g/cm³
Product Codes NCZ-295I
 
Aluminum Copper (Al/Cu) Sputtering Target
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Aluminum Copper (Al/Cu) Sputtering Target

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Price range: $150.00 through $515.00
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Product 

 Aluminum Copper (Al/Cu) Sputtering Target

CAS No.

12004‑15‑8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 89.911 g/mol

Melting Point

~ 548 °C

Boiling Point

≈ 2,400 °C to 2,550 °C

Density

 6.52 g/cm³

Product Codes

NCZ-1312K
Silicon Nitride Nanoparticles/ Nanopowder ( Si3N4, amorphous, 99%, 20 nm)
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Silicon Nitride Nanoparticles/ Nanopowder ( Si3N4, amorphous, 99%, 20 nm)

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Price range: $73.00 through $515.00
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$73/25g
$110/100g
$275/500g
$515/1kg

Product 

 Silicon Nitride Nanoparticles/ Nanopowder ( Si3N4, amorphous, 99%, 20 nm)

CAS No.

12033-89-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

20 nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 140.28 g/mol

Melting Point

~1,900 °C

Boiling Point

N/A

Density

 ~3.2 g/cm³

Product Codes

NCZ-1176K
Indium Tin Oxide Nanoparticles (ITO, Blue, In2O3:SnO2=95:5, 99.99%, 20-70 nm)
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Indium Tin Oxide Nanoparticles (ITO, Blue, In2O3:SnO2=95:5, 99.99%, 20-70 nm)

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Price range: $121.00 through $515.00
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$121/5g
$221/25g
$515/100g

Product 

 Indium Tin Oxide Nanoparticles (ITO, Blue, In2O3:SnO2=95:5, 99.99%, 20-70 nm)

CAS No.
1312-43-2

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 20-70nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 ~277.6 g/mol

Melting Point

~1,800 °C

Boiling Point

Decomposes

Density

 ~7.1 g/cm³

Product Codes

NCZ-1143K
Indium Tin Oxide Nanoparticles/Nanopowder (ITO, Blue, In2O3:SnO2=90:10, 99.99%, 20~70nm)
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Indium Tin Oxide Nanoparticles/Nanopowder (ITO, Blue, In2O3:SnO2=90:10, 99.99%, 20~70nm) (Copy)

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Price range: $121.00 through $515.00
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$121/5g
$221/25g
$515/100g

Product 

 Indium Tin Oxide Nanoparticles/Nanopowder (ITO, Blue, In2O3:SnO2=90:10, 99.99%, 20~70nm)

CAS No.
1312-43-2

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 20~70nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 ~277.6 g/mol

Melting Point

~1,800 °C

Boiling Point

Decomposes

Density

 ~7.1 g/cm³

Product Codes

NCZ-1142K
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Cerium Oxide (CeO2) Nanopowder/Nanoparticles Water Dispersion, Size: 25-45 nm, 42 wt%

Price range: $53.00 through $515.00
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30 ml/47 € 60 ml/72 € 120 ml/106 € 500 ml/253 € 1000 ml/453 €    
Please contact us for quotes on larger quantities !!!

Cerium Oxide (CeO2) Nanopowder/Nanoparticles Water Dispersion

Size: 25-45 nm, 42 wt%

Multilayer Titanium Nitride (Ti2N) MXene Material, 1g
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Multilayer Titanium Nitride (Ti2N) MXene Material, 1g

$514.00
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Product Multilayer Titanium Nitride (Ti2N) MXene Material, 1g
CAS No. 12169-08-3
Appearance Dark gray to black
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1-5μm ( (Size Can be customized),  Ask for other available size range.
Ingredient TiNbC
Molecular Weight 109.74 g/mol
Melting Point N/A
Boiling Point N/A
Density 4.88 g/cm³
Product Codes NCZ-467I
Lithium Niobate (LiNbO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''
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Lithium Niobate (LiNbO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”

$514.00
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Product 

 Lithium Niobate (LiNbO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''

CAS No.

12031-63-9

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  147.85 g/mol

Melting Point

~1,240–1,257 °C

Boiling Point

N/A

Density

 ~4.30 g/cm³ (ceramic); up to 4.65 g/cm³ (crystal)

Product Codes

NCZ-2040K
Lithium Titanate (Li2TiO3) Sputtering Targets, Purity: 99.95%, Size: 3'', Thickness: 0.125''
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Lithium Titanate (Li2TiO3) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.125”

$514.00
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Product 

 Lithium Titanate (Li2TiO3) Sputtering Targets, Purity: 99.95%, Size: 3'', Thickness: 0.125''

CAS No.

12031-82-2

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 109.75 g/mol

Melting Point

Decomposes before melting (~1,200 °C)

Boiling Point

N/A

Density

 ~3.41 g/cm³

Product Codes

NCZ-2012K
Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.125''
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Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”

$514.00
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Product 

 Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.125''

CAS No.

7783-40-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  62.30 g/mol

Melting Point

~1263 °C

Boiling Point

~2260 °C

Density

  3.18 g/cm³

Product Codes

NCZ-1980K
Nickel Vanadium (NiV) Sputtering Targets, Purity: 99.95%, Size: 8'', Thickness: 0.250''
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Nickel Vanadium (NiV) Sputtering Targets, Purity: 99.95%, Size: 8”, Thickness: 0.250”

$514.00
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Product 

 Nickel Vanadium (NiV) Sputtering Targets, Purity: 99.95%, Size: 8'', Thickness: 0.250''

CAS No.

11137-91-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  Ni: 58.69 g/molV: 50.94 g/mol

Melting Point

~1,350–1,450 °C

Boiling Point

N/A

Density

  ~8.5 g/cm³

Product Codes

NCZ-1821K
Niobium Oxide (Nb2O5) Sputtering Targets, Purity: 99.5%, Size: 4'', Thickness: 0.125''
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Niobium Oxide (Nb2O5) Sputtering Targets, Purity: 99.5%, Size: 4”, Thickness: 0.125”

$514.00
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Product 

 Niobium Oxide (Nb2O5) Sputtering Targets, Purity: 99.5%, Size: 4'', Thickness: 0.125''

CAS No.

1313-96-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  265.81 g/mol

Melting Point

~1512 °C

Boiling Point

N/A

Density

  4.6 – 4.9 g/cm³

Product Codes

NCZ-1806K
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Indium (In) Nanopowder/Nanoparticles, Purity: 99.995%, Size: 70 nm, Tetragonal

$514.00
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Indium (In) Nanopowder/Nanoparticles

Purity: 99.995%, Size: 70 nm, Tetragonal

Technical Properties:

True Density (g/cm3) 7,3
Color black
Crystal Structure tetragonal
Average Particle Size (nm) 70
Specific Surface Area (m2/g) 14,9
Elemental Analysis In Cd Zn Pb Ti Others
≥99.995 ≤0.0015 ≤0.0015 ≤0.001 ≤0.001 ≤0.0007

Properties, Storage and Cautions:

Indium nanoparticles are highly reactive and flammable, therefore it should be handled with care and rapid moves, vibrations should be avoided. Nanopowder should be kept away from sunlight, any kind of heating, moisture and impacts. Coagulation of the particles is a serious problem, so, nanopowder should be sealed under vacuum and should be kept in cool and dry conditions. Air contact should be avoided.

Applications:

Indium is known for its low melting point (157 oC) and its electronic properties. It is mainly used in LCD panels, semiconductors, thin film solar cells, vacuum seals, heat sinks in microprocessors etc.
Iron Oxide (Fe3O4) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.250''
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Iron Oxide (Fe3O4) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”

$513.00
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Product 

 Iron Oxide (Fe3O4) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.250''

CAS No.

1317‑61‑9

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  231.6 g/mol

Melting Point

~1,597 °C

Boiling Point

 ~2,623 °C (material may decompose before boiling)

Density

  ~5.17 g/cm³ (sintered target)

Product Codes

NCZ-2174K
Nitrogen-Doped Carbon-Rhodium Single-Atom Catalyst, Rh-N-C SAC, 1g
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Nitrogen-Doped Carbon-Rhodium Single-Atom Catalyst, Rh-N-C SAC, 1g

$513.00
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Product Nitrogen-Doped Carbon-Rhodium Single-Atom Catalyst, Rh-N-C SAC, 1g
CAS No. N/A
Appearance Black or dark gray
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 0.2–5μm (Size Can be customized),  Ask for other available size range.
Ingredient Rh–Nₓ–C
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 0.3–0.6 g/cm³
Product Codes NCZ-484I
Molybdenum Disulfide (MoS2) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''
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Molybdenum Disulfide (MoS2) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”

$513.00
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Product 

 Molybdenum Disulfide (MoS2) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''

CAS No.

 1317-33-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  160.07 g/mol

Melting Point

 ~1185 °C

Boiling Point

 ~4500 °C

Density

  ~5.06 g/cm³

Product Codes

NCZ-1917K
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Ytterbium Oxide (Yb2O3) Sputtering Targets, Purity: 99.99%, Size: 1'', Thickness: 0.125''
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Ytterbium Oxide (Yb2O3) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”

$513.00
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Product 

 Ytterbium Oxide (Yb2O3) Sputtering Targets, Purity: 99.99%, Size: 1'', Thickness: 0.125''

CAS No.

1314-37-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 394.08 g/mol

Melting Point

2346 °C

Boiling Point

4127 °C

Density

  9.17 g/cm³

Product Codes

NCZ-1529K
Vanadium Oxide (V2O5) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.250''
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Vanadium Oxide (V2O5) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”

$512.00
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Product 

 Vanadium Oxide (V2O5) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.250''

CAS No.

1314‑62‑1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 181.88 g/mol

Melting Point

690 °C

Boiling Point

~1750 °C

Density

 ~3.35 g/cm³

Product Codes

NCZ-1540K
4N (99.99%) Zinc Sulfide (ZnS) Pieces (3-12mm) Evaporation Materials
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4N (99.99%) Zinc Sulfide (ZnS) Pieces (3-12mm) Evaporation Materials

Price range: $154.00 through $511.00
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Product 4N (99.99%) Zinc Sulfide (ZnS) Pieces (3-12mm) Evaporation Materials
CAS No. 1314-98-3
Appearance Yellow-Red, Crystalline Solid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 3-12mm (Size Can be customized),  Ask for other available size range.
Ingredient ZnS
Molecular Weight 97.47 g/mol
Melting Point N/A
Boiling Point N/A
Density 3.98 g/cm³
Product Codes NCZ-179I
 
4N (99.99%) Zinc Sulfide (ZnS) Pieces (3-12mm) Evaporation Materials
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4N (99.99%) Zinc Sulfide (ZnS) Pieces (3-12mm) Evaporation Materials

Price range: $154.00 through $511.00
Select options This product has multiple variants. The options may be chosen on the product page
Product 4N (99.99%) Zinc Sulfide (ZnS) Pieces (3-12mm) Evaporation Materials
CAS No. 1314-98-3
Appearance White, Crystalline Solid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 3-12mm (Size Can be customized),  Ask for other available size range.
Ingredient ZnS
Molecular Weight 97.47 g/mol
Melting Point 1,700 °C
Boiling Point N/A
Density 3.98 g/cm3
Product Codes NCZ-151E
 
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Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.250”

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$511.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

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Nickel Oxide (NiO) Sputtering Targets, Purity: 99.9%, Size:1”, Thickness: 0.125”

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$511.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

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Lithium Cobalt Oxide (LiCoO2) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”

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$511.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Formula LiCoO2 represents the chemical compound lithium cobalt oxide. A crystalline solid that is dark blue or bluish-gray in color, lithium cobalt oxide is frequently utilized in the positive electrodes of lithium-ion batteries.

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Ytterbium Oxide (Yb2O3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”

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$511.00
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Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.
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Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”

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$511.00
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Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.
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Graphene Water Dispersion, Purity: 99.5%, Black Liquid, Graphene: 1,0 wt%

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Price range: $73.00 through $511.00
Select options This product has multiple variants. The options may be chosen on the product page
Graphene Water Dispersion Purity: 99.5%, Black Liquid, Graphene: 1,0 wt% Graphene water dispersion raises environmentally safe handing of graphene for coating,
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Graphene Water Dispersion, Purity: 99.5%, Black Liquid, Graphene: 1,0 wt%

Price range: $73.00 through $511.00
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30 ml/73 € 60 ml/104 €                          120 ml/181 €     
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Titanium (Ti) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 25-45 nm, Metal Basis

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$510.76
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Titanium (Ti) Nanopowder/Nanoparticles Purity: 99.95%, Size: 25-45 nm, Metal Basis Technical Properties: True Density (g/cm3) 4,5 Shape spherical Average Particle Size
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Manganese (Mn) Sputtering Targets, Purity: 99.95%, Size: 6”, Thickness: 0.250”

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$510.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

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Carbon (C) (Pyrolytic Graphite) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.250”

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$510.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

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Boron Nitride (BN) Sputtering Targets, Purity: 99.5%, Size: 4”, Thickness: 0.125”

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$510.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

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Cobalt (Co) Micron Powder, Purity: 99.99%, Size: 10 µm

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Price range: $24.00 through $509.00
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25 grams/22 €  100 grams/78 €  500 grams/244 €  1000 grams/450 €  Please contact us for quotes on larger quantities !!!

Cobalt (Co) Micron Powder

Purity: 99.99%, Size: 10 µm

Technical Properties:

PURITY

99.99 %
PARTICLE SIZE

10 µm
CAS

7440-48-4
DENSITY

8.92 g/cm³
BOILING POINT

2900 °C
MELTING POINT

1495 °C
COEFF. OF EXPANSION @ 20ºC

12.5 x 10 ⁻⁶
ELECTRIC RESISTIVITY

6.24 microhm-cm
CRYSTAL STRUCTURE

Hexagonal
FORM  

Powder
APPLICATIONS

Alloys, Customer Manufacturing, Industrial- general
                       
             
           
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(-COOH) Functionalized Industrial Multi Walled Carbon Nanotubes, Purity: > 92%, Outside Diameter: 20-40 nm

Price range: $27.00 through $509.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Multi Walled Carbon Nanotubes have a variety of potential applications in different fields. These applications include medicine, mechanics, electric-electronics, chemicals, energy and others. It can be applied in, 1-drug delivery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium batteries, 8-gas-discharge tubes, 9-flat panel displays, 10-supercapacitors, 11-transistors, 12-solar cells, 13-photoluminescence, 14-templates
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Conductive Carbon Black Nanopowder/Nanoparticles, Size: 20 nm

Price range: $66.00 through $508.00
Select options This product has multiple variants. The options may be chosen on the product page
Application Areas The recommended application areas of carbon black are as industrial paints, architectural paints, relief ink, screen ink, synthetic fiber and lastly as synthetic leather. Additionally, this product is also can be used in powder coating, gravure ink, and as flexographic ink.
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Conductive Carbon Black Nanopowder/Nanoparticles, Size: 20 nm

Price range: $66.00 through $508.00
Select options This product has multiple variants. The options may be chosen on the product page
Conductive Carbon Black Nanopowder/Nanoparticles, Size: 20 nm 25 grams/59 € 100 grams/164 € 500 grams/295 € 1 kg/448 €   Please contact us for quotes on larger quantities ! Conductive Carbon Black Nanopowder/Nanoparticles, Size: 20 nm   Application Areas The recommended application areas of carbon black are as industrial paints, architectural paints, relief ink, screen ink, synthetic fiber and lastly as synthetic leather. Additionally, this product is also can be used in powder coating, gravure ink, and as flexographic ink.   Technical Properties:  
PARTICLE SIZE

20 nm
CAS

1333-86-4
Surface Area

195 m2/g
DBP Oil Absorption

99 ± 4 cc/100g
pH Value

2.4 ± 1
Tint Strength VS SRB3#

≥137 %
Magnesium (Mg) Sputtering Target
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Magnesium (Mg) Sputtering Target

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Price range: $184.00 through $507.00
Select options This product has multiple variants. The options may be chosen on the product page

Product 

 Magnesium (Mg) Sputtering Target

CAS No.

7439-92-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 24.305 g/mol

Melting Point

650 °C

Boiling Point

1,090 °C

Density

 1.738 g/cm³

Product Codes

NCZ-1296K
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Vanadium Oxide (V2O5) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”

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$507.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

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Tungsten Disulfide (WS2) Sputtering Targets, Purity: 99.9%, Size: 5”, Thickness: 0.250”

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$507.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

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Titanium Nitride (TiN) Sputtering Targets, Purity: 99.5%, Size: 2”, Thickness: 0.125”

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$507.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

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Nickel-Coated Multi Walled Carbon Nanotubes, Purity: > 99%, Outside Diameter: 18-28 nm

Price range: $81.00 through $507.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Nickel is coated on MWCNTs to have one dimentional magnetic material. Nickel is ferromagnetic material. MWCNTs are used as template for ferromagnetic nickel. Nickel-coated MWCNTs show good magnetic properties. Nickel-coated MWCNTs have a variety of potential applications in different fields. These applications include medicine, mechanics, electric-electronics, chemicals, energy and others. It can be applied in, 1-drug delivery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium batteries, 8-gas-discharge tubes, 9-flat panel displays, 10-supercapacitors, 11-transistors, 12-solar cells, 13-photoluminescence, 14-templates  
Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets, Purity: 99.99%, Size: 1'', Thickness: 0.125''
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Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”

$506.00
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Product 

 Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets, Purity: 99.99%, Size: 1'', Thickness: 0.125''

CAS No.
• Indium Oxide (In₂O₃): 1312-43-2 • Tin Oxide (SnO₂): 18282-10-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

< 5 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  Approx. 292.6 g/mol (based on 90:10 wt% In₂O₃:SnO₂ blend)

Melting Point

  ~1,800 °C (sintered ceramic composite; no sharp melting point)

Boiling Point

N/A

Density

  ~7.15 g/cm³

Product Codes

NCZ-2212K
Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.125''
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Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”

$506.00
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Product 

 Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.125''

CAS No.
• Indium Oxide (In₂O₃): 1312-43-2 • Tin Oxide (SnO₂): 18282-10-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

< 5 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  Approx. 292.6 g/mol (based on 90:10 wt% In₂O₃:SnO₂ blend)

Melting Point

  ~1,800 °C (sintered ceramic composite; no sharp melting point)

Boiling Point

N/A

Density

  ~7.15 g/cm³

Product Codes

NCZ-2208K
Molybdenum Titanium Aluminum Carbide (Mo2Ti2AlC3) MAX Phase Micron-Powder, 5g
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Molybdenum Titanium Aluminum Carbide (Mo2Ti2AlC3) MAX Phase Micron-Powder, 5g

$506.00
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Product Molybdenum Titanium Aluminum Carbide (Mo2Ti2AlC3) MAX Phase Micron-Powder, 5g
CAS No. 7783-40-6
Appearance Gray to black fine
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1 – 5µm (Size Can be customized),  Ask for other available size range.
Ingredient Mo2Ti2AlC3
Molecular Weight 408.49 g/mol
Melting Point 1400 °C
Boiling Point N/A
Density 5.0–6.0 g/cm³
Product Codes NCZ-452I
 
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Zinc Oxide (ZnO) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.125”

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$506.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.