Strong Graphene Aerogel, Diameter: 1.2±0.1 cm, Height: 1.2±0.1 cm

Price range: $207.00 through $781.00
Select options This product has multiple variants. The options may be chosen on the product page
Please contact us for quotes for larger quantities !   Graphene aerogels are materials which have elasticity and they can easily gain their original form after some compression. In addition, the low density of graphene aerogels enables them to be very absorbent. This material can absorb more than 850 times of its own weight. This property means that it could be useful for environmental clean-ups like oil spills, and the aerogels only need to be picked up later after absorbing the spilled material. Graphene aerogel may also have some applications in both the storage and the transfer of energy by enabling the creation of lighter, higher-energy-density batteries and vigorous research is being done on the matter.

Iron Oxide (Fe3O4) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”

$780.00

Product 

Iron Oxide (Fe3O4) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.250''

CAS No.

1317‑61‑9

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 231.6 g/mol

Melting Point

~1,597 °C

Boiling Point

 ~2,623 °C (material may decompose before boiling)

Density

 ~5.17 g/cm³ (sintered target)

Product Codes

NCZ-2172K

Silicon Nitride (Si3N4) Sputtering Targets, Purity: 99.5%, Size: 3”, Thickness: 0.125”, Dark Gray to Black

$780.00

Product 

Silicon Nitride (Si3N4) Sputtering Targets, Purity: 99.5%, Size: 3'', Thickness: 0.125'', Dark Gray to Black

CAS No.

 12033-89-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 140.28 g/mol

Melting Point

 ~1900 °C

Boiling Point

N/A

Density

~3.2 g/cm³

Product Codes

NCZ-1697K

Strontium Titanate (SrTiO3) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”

$780.00

Product 

Strontium Titanate (SrTiO3) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.250''

CAS No.

12060-08-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

183.49 g/mol

Melting Point

 ~2080 °C

Boiling Point

N/A

Density

~5.12 g/cm³

Product Codes

NCZ-1677K

Tungsten Oxide (WO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”

$780.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Tin Oxide (SnO2) Sputtering Targets, elastomer, Purity: 99.99%, Size: 4”, Thickness: 0.125”

$780.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Tantalum (Ta) Sputtering Targets, Purity: 99.95%, Size: 6”, Thickness: 0.250”

$780.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Strontium Titanate (SrTiO3) Sputtering Targets, Purity: 99.9%, Size: 7”, Thickness: 0.250”

$780.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Yttrium Ferrite (Y3Fe5O12) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”

$780.00

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

(-OH) Functionalized Industrial Short Multi Walled Carbon Nanotubes, Purity: > 92%, Outside Diameter: 8-28 nm

Price range: $65.00 through $780.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Multi Walled Carbon Nanotubes have a variety of potential applications in different fields. These applications include medicine, mechanics, electric-electronics, chemicals, energy and others. It can be applied in, 1-drug delivery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium batteries, 8-gas-discharge tubes, 9-flat panel displays, 10-supercapacitors, 11-transistors, 12-solar cells, 13-photoluminescence, 14-templates  

Aluminum Oxide (Al2O3) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.125”

$777.00

Product 

Aluminum Oxide (Al2O3) Sputtering Targets, Purity: 99.99%, Size: 4'', Thickness: 0.125''

CAS No.

 1344-28-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

101.96 g/mol

Melting Point

~2,072 °C

Boiling Point

~2,977 °C

Density

~3.97–3.98 g/cm³

Product Codes

NCZ-2537K

Carbon (C) Sputtering Targets, indium, Purity: 99.999%, Size: 4”, Thickness: 0.125”

$777.00

Product 

Carbon (C) Sputtering Targets, indium, Purity: 99.999%, Size: 4'', Thickness: 0.125''

CAS No.

 7782‑42‑5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

12.01 g/mol

Melting Point

Sublimates at ~3,652 °C

Boiling Point

Sublimates at ~4,200 °C

Density

 ~2.25 g/cm³

Product Codes

NCZ-2345K

Cobalt (Co) Sputtering Targets, Purity: 99.95%, Size: 8”, Thickness: 0.250”

$777.00

Product 

Cobalt (Co) Sputtering Targets, Purity: 99.95%, Size: 8'', Thickness: 0.250''

CAS No.

7440‑48‑4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

58.93 g/mol (cobalt atomic weight)

Melting Point

~1,495 °C

Boiling Point

~2,870–2,927 °C

Density

~8.9 g/cm³

Product Codes

NCZ-2285K

Graphene Oxide Quantum Dots (GOQDs) Powder (Yellow Fluorescence), 100mg

$777.00
Product Graphene Oxide Quantum Dots (GOQDs) Powder (Yellow Fluorescence), 100mg
CAS No. N/A
Appearance Black
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 5-15nm (Size Can be customized),  Ask for other available size range.
Ingredient C_xO_yH_z
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 2.0–2.2 g/cm³
Product Codes NCZ-362I

Nickel Oxide (NiO) Sputtering Targets, Purity: 99.995%, Size:2”, Thickness: 0.125”

$777.00

Product 

Nickel Oxide (NiO) Sputtering Targets, Purity: 99.995%, Size:2'', Thickness: 0.125''

CAS No.

1313-99-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 ~3–5 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

74.69 g/mol

Melting Point

1,950 °C

Boiling Point

 2,730 °C

Density

 6.67 g/cm³

Product Codes

NCZ-1837K

Tantalum (Ta) Sputtering Targets, elastomer, Purity: 99.95%, Size: 3”, Thickness: 0.125”

$776.00

Product 

Tantalum (Ta) Sputtering Targets, elastomer, Purity: 99.95%, Size: 3'', Thickness: 0.125''

CAS No.

 7440-25-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

180.95 g/mol

Melting Point

 3017 °C

Boiling Point

 5458 °C

Density

 16.65 g/cm³

Product Codes

NCZ-1655K

Titanium Carbide (TiC) Sputtering Targets, Purity: 99.5%, Size: 3”, Thickness: 0.250”

$776.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 8”, Thickness: 0.250”

$776.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 8”, Thickness: 0.250”

$776.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

(-COOH) Functionalized Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: 18-28 nm

Price range: $48.00 through $776.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Multi Walled Carbon Nanotubes have a variety of potential applications in different fields. These applications include medicine, mechanics, electric-electronics, chemicals, energy and others. It can be applied in, 1-drug delivery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium batteries, 8-gas-discharge tubes, 9-flat panel displays, 10-supercapacitors, 11-transistors, 12-solar cells, 13-photoluminescence, 14-templates

Mesophase pitch(Petroleum, Spinning grade) (279575)

$775.00
Select options This product has multiple variants. The options may be chosen on the product page
Mesophase pitch(Petroleum, Spinning grade) (279575)
Softening point Content of mesophase Coking value Ash
275°C >98% 90% <0.01%
    Product Codes- NCZ-2674K

Samarium (Sm) Micron Powder, Purity: 99.5 %, Size: 325 mesh

$775.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Samarium is moderately stable at air but it ignites at 150°C. It is not found free in nature. It can be found in the minerals gadolinite, monazites, samarskite, cerite, and bastnäsite. Samarium is used as alloy in making permanent magnets. It is used in making samarium-cobalt permanent magnets which have high resistance to demagnetization. It is also used as a neutron absorber in nuclear reactors. It is used in the core of carbon arc lights with other metals which are used in studio lighting and projector lights.

Magnetic Graphene Aerogel, Content of Fe3O4: 50%, Diameter: 1±0.1 cm

Price range: $199.00 through $775.00
Select options This product has multiple variants. The options may be chosen on the product page
Please contact us for quotes for larger quantities !   This aerogel is a self-assembled, 3d porous foam material with high quality sheet layer < 3 graphene oxide and Fe3O4 nanoparticles as raw materials. The aerogel has micron-sized macropores and nano-sized mesoporous pores to form a rich compound void structure. With stable chemical properties, large specific surface area and abundant pores, this aerogel is suitable for the adsorption of copper, chromium, lead and other heavy metals in water.

(-OH) Functionalized Short Length Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: 28-48 nm

Price range: $41.00 through $775.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Multi Walled Carbon Nanotubes have a variety of potential applications in different fields. These applications include medicine, mechanics, electric-electronics, chemicals, energy and others. It can be applied in, 1-drug delivery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium batteries, 8-gas-discharge tubes, 9-flat panel displays, 10-supercapacitors, 11-transistors, 12-solar cells, 13-photoluminescence, 14-templates

Tin Oxide (SnO2) Sputtering Targets, elastomer, Purity: 99.99%, Size: 3”, Thickness: 0.125”

$774.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets, Purity: 99.99%, Size: 6”, Thickness: 0.125”

$772.00

Product 

Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets, Purity: 99.99%, Size: 6'', Thickness: 0.125''

CAS No.

• Indium Oxide (In₂O₃): 1312-43-2 • Tin Oxide (SnO₂): 18282-10-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

< 5 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 Approx. 292.6 g/mol (based on 90:10 wt% In₂O₃:SnO₂ blend)

Melting Point

 ~1,800 °C (sintered ceramic composite; no sharp melting point)

Boiling Point

N/A

Density

 ~7.15 g/cm³

Product Codes

NCZ-2204K

Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 6”, Thickness: 0.250”

$772.00

Product 

Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 6'', Thickness: 0.250''

CAS No.

123273‑09‑6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 ~313.9 g/mol

Melting Point

 ~1,550 °C (approximate; ceramic decomposition likely above)

Boiling Point

N/A

Density

 ~5.3 g/cm³ @ room temp

Product Codes

NCZ-2147K

Strontium Titanate (SrTiO3) Sputtering Targets, Purity: 99.9%, Size: 6”, Thickness: 0.250”

$772.00

Product 

Strontium Titanate (SrTiO3) Sputtering Targets, Purity: 99.9%, Size: 6'', Thickness: 0.250''

CAS No.

12060-08-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

183.49 g/mol

Melting Point

 ~2080 °C

Boiling Point

N/A

Density

~5.12 g/cm³

Product Codes

NCZ-1673K

Indium Oxide (In2O3) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.250”

$772.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Prime Si+SiO2 Wafer (dry), Size: 2”, Orientation: (100), Boron Doped, Resistivity: 1 -10 (ohm.cm), 1-Side Polished, Thickness: 279 ± 20 μm, Coating 100 nm

Price range: $60.00 through $772.00
Select options This product has multiple variants. The options may be chosen on the product page
1 piece/54 € 5 pieces/175 € 25 pieces/690 € Please contact us for quotes on larger quantities !!! 

Prime Si+SiO2 Wafer (dry)

Size: 2”, Orientation: (100), Boron Doped, 1-Side Polished, Thickness: 279 ± 20 μm, Coating 100 nm

Technical Properties:

Quality Prime
Materials Si + SiO2 (dry)
Size (inch) 2”
Orientation (100)
Coating 100 nm
Thickness (μm) 279 ± 20
Doping Boron
Resistivity (ohm.cm) 1-10
Polished One Side
Silicon dioxide wafer – also referred as thermal oxide wafer- is produced at elevated temperatures. Thermal oxide is normally grown in a horizontal tube furnace, at temperature range from 900°C ~ 1200°C. Thermal oxide is a kind of "grown" oxide layer , compared to CVD deposited oxide layer , it has a higher uniformity, and higher dielectric strength , it is an excellent dielectric layer as an insulator. In most silicon-based devices, thermal oxide layer plays an important role to pacify the silicon surface to act as doping barriers and as surface dielectrics. It allows a very good thickness uniformity and purity. Therefore, this is the preferred way to produce high quality thin silicon oxide layers. Thicker oxide layers are typically produced by wet oxidation where the growth rate is significantly increased.

(-OH) Functionalized Industrial Short Multi Walled Carbon Nanotubes, Purity: > 92%, Outside Diameter: 8-28 nm

Price range: $64.00 through $772.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Multi Walled Carbon Nanotubes have a variety of potential applications in different fields. These applications include medicine, mechanics, electric-electronics, chemicals, energy and others. It can be applied in, 1-drug delivery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium batteries, 8-gas-discharge tubes, 9-flat panel displays, 10-supercapacitors, 11-transistors, 12-solar cells, 13-photoluminescence, 14-templates  

(-COOH) Functionalized Single Walled Carbon Nanotubes, Purity: > 65%

Price range: $66.00 through $772.00
Select options This product has multiple variants. The options may be chosen on the product page

(-COOH) Functionalized Single Walled Carbon Nanotubes

Purity: > 65%, SSA: 400 m2/g, Dia: 1.0 nm

Single walled carbon nanotubes (SWCNTs, SWNTs) comprise of one-atom-thick sheets of graphene that rolled up to form long hollow tubes. SWCNTs possess exceptional thermal, mechanical and electrical properties. These remarkable properties lead to advances in performance in a wide range of materials and devices. Single-walled carbon nanotubes are actively used in diverse area including energy storage, molecular electronics, nano mechanial devices, composites and bio-sensing. You can buy (-COOH) Functionalized Single Walled Carbon Nano Tubes with low prices and high purity.

Multi Walled Carbon Nanotubes N-butanol Dispersion, 4 wt%, Purity: >96%, OD: 45-75 nm, Length 8-28 µm

Price range: $158.00 through $772.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

MWCNTs have a variety of potential applications in different fields. These applications include midicine, mechanical, electric, chemical, energy and others. It can be applied in, 1-drug dilevery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium battaries, 8-gas-discharge tubes, 9-flat panel display, 10-supercapacitor, 11-transistors, 12-solar cells, 13-photoluminescence, 14-tamplate  

Strontium Titanate (SrTiO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”

$771.00

Product 

Strontium Titanate (SrTiO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.250''

CAS No.

12060-08-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

183.49 g/mol

Melting Point

 ~2080 °C

Boiling Point

N/A

Density

~5.12 g/cm³

Product Codes

NCZ-1681K

Tantalum Oxide (Ta2O5) Sputtering Targets, indium, Purity: 99.99%, Size: 2”, Thickness: 0.125”

$771.00

Product 

Tantalum Oxide (Ta2O5) Sputtering Targets, indium, Purity: 99.99%, Size: 2'', Thickness: 0.125''

CAS No.

1314-61-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 441.89 g/mol

Melting Point

 ~1872 °C

Boiling Point

N/A

Density

~8.2 g/cm³

Product Codes

NCZ-1648K

Zinc Oxide (ZnO) with Alumina Sputtering Targets, indium, Purity: 99.99%, Size: 8”, Thickness: 0.250”

$771.00

Product 

Zinc Oxide (ZnO) with Alumina Sputtering Targets, indium, Purity: 99.99%, Size: 8'', Thickness: 0.250''

CAS No.

ZnO: 1314-13-2 Al₂O₃: 1344-28-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

ZnO + Al₂O₃ (AZO)(black granules) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

ZnO: 81.38 g/mol Al₂O₃: 101.96 g/mol

Melting Point

~1975 °C

Boiling Point

N/A

Density

~5.6 g/cm³

Product Codes

NCZ-1483K

Nisin(1000IU, 30000IU) (526557)

Price range: $180.00 through $770.00
Select options This product has multiple variants. The options may be chosen on the product page
Nisin(1000IU, 30000IU) (526557)
  • ITEM DESCRIPTION
    Product Name Nisin 2.5% in NaCl for 1000IU/mg Nisin 75% in NaCl for 30000IU/mg
    Titer 1000IU/mg, 30000IU/mg
    Strain Lactococcus lactis subsp lactis
    Appearance White or Off white to light brown powder
    EU No. E234
    Molecular Formula C143H228N42O37S7
    CAS 1414-45-5
    Solubility 5-10g/100ml in pH=2.5-3.5 of aqueous for 1000IU/mg 0.1g/100ml in pH=2.5-3.5 of aqueous for 30000IU/mg
    Stability pH 2.5-3.5 Nisin is relatively stable. pH 3.5-6.5 100°C 30minutes, Nisin is less stable, but the stability will be improved when Nisin is existing with food proteins. pH>7.0 Nisin is comparatively less stable
    Carrier NaCl 50.0% Min for 1000IU/mg NaCl 6.0% Min for 30000IU/mg
    Moisture 3.0% Max.
    Heavy Metals Not more than 10mg/Kg
    Usage The additive may be applied in cheese, desserts, yoghurt, processed meat, fruit and vegetable juices, bakeries, egg products and canned food
    pH pH=3.3-3.8, 10% solution for 1000IU/mg pH=3.0-3.8, 10% solution for 30000IU/mg
    Total colony count Mesophillic aerobic not more than 10 CFU/g
    E-Coli. 25g Negative
    Saimonelia 25g Negative
    Storage Nisin is stable under room temperature. Sunlight, oxidant and heavy metal will hurt the activity of it. To be stored in dry , shady and cool place(below 20°C)with sealed packing
    Shelf life 24 months
 
Product Codes- NCZ-2790K

Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 8”, Thickness: 0.250”

$770.00

Product 

Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 8'', Thickness: 0.250''

CAS No.

7440‑47‑3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 51.9961 g/mol

Melting Point

 1,857 °C

Boiling Point

 2,672 °C

Density

 7.14 g/cm³

Product Codes

NCZ-2309K

Tri-Nitrogen-doped Graphdiyne Powder, 10 mg/bottle

$770.00
Product Tri-Nitrogen-doped Graphdiyne Powder, 10 mg/bottle
CAS No. N/A
Appearance Black
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 50–200nm (Size Can be customized),  Ask for other available size range.
Ingredient CₙN₃
Molecular Weight 137.8 g/mol
Melting Point N/A
Boiling Point N/A
Density 1.3 – 1.5 g/cm³
Product Codes NCZ-581I

(-OH) Functionalized Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: 18-28 nm

Price range: $47.00 through $770.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Multi Walled Carbon Nanotubes have a variety of potential applications in different fields. These applications include medicine, mechanics, electric-electronics, chemicals, energy and others. It can be applied in, 1-drug delivery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium batteries, 8-gas-discharge tubes, 9-flat panel displays, 10-supercapacitors, 11-transistors, 12-solar cells, 13-photoluminescence, 14-templates

Indium (In) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.125”

$769.00

Product 

Indium (In) Sputtering Targets, Purity: 99.999%, Size: 4'', Thickness: 0.125''

CAS No.

 7440-74-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

114.82 g/mol

Melting Point

 156.6 °C

Boiling Point

 2,072 °C

Density

 7.31 g/cm³

Product Codes

NCZ-2222K

Zinc Sulfide (ZnS) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.250”

$769.00

Product 

Zinc Sulfide (ZnS) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.250''

CAS No.

1314-98-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 (ZnS) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

97.45 g/mol

Melting Point

~1700 °C

Boiling Point

N/A

Density

 4.09 g/cm³

Product Codes

NCZ-1504K

Magnetic Graphene Aerogel, Content of Fe3O4: 65%, Diameter: 1±0.1 cm

Price range: $198.00 through $769.00
Select options This product has multiple variants. The options may be chosen on the product page
Please contact us for quotes for larger quantities !   This aerogel is a self-assembled, 3d porous foam material with high quality sheet layer < 3 graphene oxide and Fe3O4 nanoparticles as raw materials. The aerogel has micron-sized macropores and nano-sized mesoporous pores to form a rich compound void structure. With stable chemical properties, large specific surface area and abundant pores, this aerogel is suitable for the adsorption of copper, chromium, lead and other heavy metals in water.

Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 7”, Thickness: 0.250”

$768.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 7”, Thickness: 0.250”

$768.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Nickel (Ni) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 790 nm, Metal Basis

Price range: $52.00 through $768.00
Select options This product has multiple variants. The options may be chosen on the product page

Nickel (Ni) Nanopowder/Nanoparticles

Purity: 99.95%, Size: 790 nm, Metal Basis

Technical Properties:

True Density (g/cm3) 8,9
Color dark gray
Crystal Structure cubic
Tmelting (oC) 1455
Tboiling (oC) 2730
Average Particle Size (nm) 790
Elemental Analysis Ni Co Mg Pb Others
99.9 0.002 0.001 0.001 0.001

Properties, Storage and Cautions:

Nickel nanoparticles are highly reactive and flammable, therefore it should be handled with care and rapid moves, vibrations should be avoided. Nanopowder should be kept away from sunlight, any kind of heating, moisture and impacts. Coagulation of the particles is a serious problem, so, nanopowder should be sealed under vacuum and should be kept in cool and dry conditions. Air contact should be avoided.

(-COOH) Functionalized Industrial Multi Walled Carbon Nanotubes, Purity: > 92%, Outside Diameter: 10-30 nm

Price range: $38.00 through $768.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Multi Walled Carbon Nanotubes have a variety of potential applications in different fields. These applications include medicine, mechanics, electric-electronics, chemicals, energy and others. It can be applied in, 1-drug delivery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium batteries, 8-gas-discharge tubes, 9-flat panel displays, 10-supercapacitors, 11-transistors, 12-solar cells, 13-photoluminescence, 14-templates

Calcium Manganate (CaMnO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”

$767.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”

$767.00

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Large Inner Diameter Thin Multi-Wall Carbon Nanotubes, Purity: > 92%, OD: 28-58 nm, ID: 18-48 nm

Price range: $208.00 through $767.00
Select options This product has multiple variants. The options may be chosen on the product page
Applications:

Alcohol pyrolysis in a floating reactor produced large inner diameter thin multi-wall carbon nanotubes using ferrocene as a catalyst. They have a wide range of potential applications in various fields. Medicine, mechanics, electronics, chemicals, and energy are among the applications. It can be used in 1-drug delivery, 2-biosensors, 3-CNT composites, and so on. 4-catalysis, 5-nanoprobes, Storage of 6-hydrogen, lithium-ion batteries, eight gas discharge tubes nine flat panel displays, ten supercapacitors, eleven transistors , 12-solar cells, 13-photoluminescence,                   14-templates

Antimony Telluride (Sb2Te3) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.250”

$766.00

Product 

Antimony Telluride (Sb2Te3) Sputtering Targets, Purity: 99.999%, Size: 2'', Thickness: 0.250''

CAS No.

1327‑50‑0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

Sb₂Te₃ (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

626.32 g/mol

Melting Point

~620–629 °C

Boiling Point

 ≈ 1174 °C

Density

~6.50 g/cm³

Product Codes

NCZ-1410K

Barium Fluoride (BaF2) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.125”

$766.00

Product 

Barium Fluoride (BaF2) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness: 0.125''

CAS No.

7787-32-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

BaF₂ (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

175.32 g/mol

Melting Point

~1368 °C

Boiling Point

~2260 °C

Density

~4.89 g/cm³

Product Codes

NCZ-1409K

Bismuth Telluride (Bi2Te3) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.250”

$766.00

Product 

Bismuth Telluride (Bi2Te3) Sputtering Targets, Purity: 99.999%, Size: 2'', Thickness: 0.250''

CAS No.

1304‑82‑1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

Bi₂Te₃ (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

800.76 g/mol

Melting Point

~585 °C

Boiling Point

N/A

Density

~7.64–7.74 g/cm³

Product Codes

NCZ-1400K

Multi Walled Carbon Nanotubes Isopropanol Dispersion, 4 wt%, Purity: >96%, OD: 45-75 nm, Length 8-28 µm (No reviews

Price range: $154.00 through $766.00
Select options This product has multiple variants. The options may be chosen on the product page
15 ml/140 € 30 ml/245 € 60 ml/410 € 120 ml/695 €
Please contact us for quotes on larger quantities !!!

Multi Walled Carbon Nanotubes Isopropanol Dispersion

4 wt%, Purity: >96+%, OD: 45-75 nm, Length 8-28 µm

Technical Properties:

Purity > 96%
Color black
Average Outside Diameter (nm) 45-75
Average Inside Diameter (nm) 5.0-10.0
Length (μm) 8-28
Tap Density (g/cm3) 0.30
True Density (g/cm3) 2.4
Specific Surface Area (m2/g) 50
Ash < 1.5 wt%
Electrical Conductivity (S/cm) > 98
Manufacturing Method CVD

Applications:

MWCNTs have a variety of potential applications in different fields. These applications include midicine, mechanical, electric, chemical, energy and others. It can be applied in, 1-drug delivery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium battaries, 8-gas-discharge tubes, 9-flat panel display, 10-supercapacitor, 11-transistors, 12-solar cells, 13-photoluminescence, 14-template

Cuprous Oxide (Cu2O) Nanopowder/Nanoparticles, Purity: 99.5+%, Size: 80 nm

Price range: $73.00 through $766.00
Select options This product has multiple variants. The options may be chosen on the product page
25 grams/65 €                       
100 grams/186 €                     
500 grams/385 €                    
1000 grams/674 € Please contact us for quotes on larger quantities !!!

Cuprous Oxide (Cu2O) Nanopowder/Nanoparticles

Purity: 99.5+%, Size: 80 nm

Technical Properties:  

Purity % 99.5
Color red-brown
AVERAGE PARTICLE SIZE (nm) 80
SPECIFIC SURFACE AREA (m2/g) 55.0
Melting Point (°C) 1240.0
Boiling Point (°C) 1800.0

Applications:

The importance of nanoparticles/nanopowder is growing day by day in today's world because of their unique properties. Like other nanoparticles/nanopowder, Cuprous Oxide nanoparticles/nanopowder are used in many different applications. Nanoparticles/Nanopowder of Cuprous Oxide can be used as antifouling agent for marine paints. In this application Nanoparticles/Nanopowder of Cuprous Oxide and can help extend operating life of stain proof paint. Cuprous Oxide Nanoparticles/Nanopowder can be used as stabilizing additive for anti-fouling paint. Cuprous Oxide Nanoparticles/Nanopowder are also used as catalyst as combustion improver additive in solid propellant and explosive. Cuprous Oxide Nanoparticles/Nanopowder are widely used in various fields based on their unique magnetic, electronic and optical properties, such as CO oxidation, gas sensing, photodegradation and photocatalyst.

PAMAM dendrimer(Ethylenediamine core) – COOCH3 End Group

Price range: $379.00 through $765.00
Select options This product has multiple variants. The options may be chosen on the product page
PAMAM dendrimer(Ethylenediamine core) - COOCH3 End Group  
- COOCH3 End Group 115E 1.5 -COOCH3 16 2807 C126H224N26044 379
125E 2.5 -COOCH3 32 6011 C270H480N58092 425
135E 3.5 -COOCH3 64 12418 C558H992N1220188 615
145E 4.5 -COOCH3 128 25233 C1134H2016N2500380 765
  Product Codes- NCZ-2625K

PAMAM dendrimer(Ethylenediamine core) -COONa End Group

Price range: $265.00 through $765.00
Select options This product has multiple variants. The options may be chosen on the product page
PAMAM dendrimer(Ethylenediamine core) -COONa End Group  
  -COONa End Group 105S 0.5 -COONa 8 1269 C46H72N10020Na8 265
115S 1.5 -COONa 16 2934 CllOHl76N26044 Na16 379
125S 2.5 -COONa 32 6266 C238H384N58092 Na32 425
135S 3.5 -COONa 64 12927 C494H800N1220188Na64 615
145S 4.5 -COONa 128 26251 C1006H1632N2500380Na128 765
  Product Codes- NCZ-2624K

PAMAM dendrimer(Ethylenediamine core)-COOH End Group

Price range: $127.00 through $765.00
Select options This product has multiple variants. The options may be chosen on the product page
PAMAM dendrimer(Ethylenediamine core) –COOH End Group  
    -COOH End Group lOOC 0 -COOH 4 917 C38H64N10016 127
llOC 1 -COOH 8 2230 C94Hl60N26036 265
120C 2 -COOH 16 4856 C206H352N58076 379
130C 3 -COOH 32 10109 C430H736N1220156 425
140C 4 -COOH 64 20619 C878H1504N2500316 615
150C 5 -COOH 128 41635 C1774H3040N5060636 765
  Product Codes- NCZ-2623K

PAMAM dendrimer(Ethylenediamine core) -OH End Group

Price range: $127.00 through $765.00
Select options This product has multiple variants. The options may be chosen on the product page
PAMAM dendrimer(Ethylenediamine core) -OH  End Group  
      -OH End Group lOOH 0 -OH 4 521 C22H44N608 127
110H 1 -OH 8 1438 C62H120N18020 265
120H 2 -OH 16 3272 C142H272N42044 379
130H 3 -OH 32 6941 C302H576N90092 425
140H 4 -OH 64 14279 C622Hll84Nl860188 615
150H 5 -OH 128 30551 C1262H2400N3780480 765
  Product Codes- NCZ-2622K  

Bismuth Oxide (Bi2O3) Sputtering Targets, indium, Purity: 99.9%, Size: 3”, Thickness: 0.125”

$765.00

Product 

Bismuth Oxide (Bi2O3) Sputtering Targets, indium, Purity: 99.9%, Size: 3'', Thickness: 0.125''

CAS No.

 1304-76-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

465.96 g/mol

Melting Point

 ~817 °C

Boiling Point

N/A

Density

 ~8.9 g/cm³

Product Codes

NCZ-2404K