Indium Tin Oxide (ITO) Nanopowder/Nanoparticles, 90:10, Purity: 99.999+%, Size: 18-65 nm

Price range: $44.00 through $215.00
Select options This product has multiple variants. The options may be chosen on the product page
5 grams/39 € 25 grams/76 € 100 grams/190 €                                   
Please contact us for quotes on larger quantities !!!

Indium Tin Oxide (ITO) Nanopowder/Nanoparticles

90:10, Purity: 99.999+%, Size: 18-65 nm

Technical Properties:

Purity (%) 99.999
Bulk Density (g/cm3) 0.85
True Density (g/cm3) 7.20
Color yellowish green
Average Particle Size (nm) 18-65
Specific Surface Area (m2/g) 40
Morphology irregular
Making Method chemical precipitation
Elemental Analysis Al Sb Cd Cu Fe Pb Ni Si Zn Co As P Ca Mg Bi
1.88 ppm 3.30 ppm 1.00 ppm 2.55 ppm 3.50 ppm 9.38 ppm 1.0 ppm 5.88 ppm 2.55 ppm 0.58 ppm 1.48 ppm 0.52 ppm 1.39 ppm 2.49 ppm 9.12 ppm

Applications:

Indium Tin oxide nanoparticles can be used in transparent electric conductive materials shuch as conductive glue. It is an excellent anti-radiation material. It can be used for infrared ray protection.

Indium Tin Oxide (ITO) Nanopowder/Nanoparticles, 95:5, Purity: 99.97+%, Size: 18-73 nm

Price range: $49.00 through $215.00
Select options This product has multiple variants. The options may be chosen on the product page
5 grams/44 € 
25 grams/80 € 100 grams/190 €                       
Please contact us for quotes on larger quantities !!! 

Indium Tin Oxide (ITO) Nanopowder/Nanoparticles

95:5, Purity: 99.97+%, Size: 18-73 nm

Technical Properties:

Purity (%) 99.97
Bulk Density (g/cm3) 0.85
True Density (g/cm3) 7.20
Color yellowish green
Average Particle Size (nm) 18-73
Specific Surface Area (m2/g) 40
Morphology irregular
Manufacturing Method chemical precipitation
Elemental Analysis Al Sb Cd Cu Fe Pb Ni Si Zn Co As P Ca Mg Bi
1.88 ppm 3.30 ppm 1.00 ppm 2.55 ppm 3.50 ppm 9.38 ppm 1.0 ppm 5.88 ppm 2.55 ppm 0.58 ppm 1.48 ppm 0.52 ppm 1.39 ppm 2.49 ppm 9.12 ppm

Applications:

Indium Tin oxide nanoparticles can be used in transparent electric conductive materials such as conductive glue. It is an excellent anti-radiation material. It can be used for infrared ray protection.  

Copper (Cu) Nanopowder/Nanoparticles, Purity: 99.85%, Size: 22 nm, Partially Passivated

Price range: $52.00 through $215.00
Select options This product has multiple variants. The options may be chosen on the product page

Copper (Cu) Nanopowder/Nanoparticles

Purity: 99.85%, Size: 22 nm, Partially Passivated

Technical Properties:

Cu Purity (%) 99,8 (partially passivated by coating nanoparticles with 0,8 wt%   Oxygen for only safe shipping)
Bulk Density (g/cm3) 0,2-0,4
True Density (g/cm3) 8,9
Color dark brown
Shape spherical
Crystal Structure cubic
Average Particle Size (nm) 22
Specific Surface Area (m2/g) 35,0-55,0
Elemental Analysis Cu Si Others
99.8 0.1 0.01

Properties, Storage and Cautions:

Copper nanoparticles are highly reactive and flammable, therefore it should be handled with care and rapid moves, vibrations should be avoided. Nanopowder should be kept away from sunlight, any kind of heating, moisture and impacts. Coagulation of the particles is a serious problem, so, nanopowder should be sealed under vacuum and should be kept in cool and dry conditions. Air contact should be avoided.

Applications:

Copper nanoparticles are known for their high electrical conductivity. It is mainly used in electronics industry. It can be used in conducting coatings, inks and pastes, raw material for electronic parts, catalysis for reactions such as methanol production, microelectronic devices, additive for lubricants, for wear resistant coatings, sintering additives etc.

Molybdenum Oxide (MoO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”

$214.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”

$214.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.250”

$214.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”

$214.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Erbium oxide with a chemical formula of Er2Ois an oxide of erbium metal. The applications of erbium oxide are varied due to their electrical, optical and photoluminescence properties. Nanoscale materials doped with Er+3 are of much interest because they have special particle-size-dependent optical and electrical properties. Erbium oxide doped nanoparticle materials can be dispersed in glass or plastic for display purposes, such as display monitors. The spectroscopy of Er+3 electronic transitions in host crystals lattices of nanoparticles combined with ultrasonically formed geometries in aqueous solution of carbon nanotubes is of great interest for synthesis of photoluminescence nanoparticles in ‘green’ chemistry. Erbium oxide is among the most important rare earth metals used in biomedicine. Erbium oxides are also used as gate dielectrics in semiconductor devices since it has a high dielectric constant (10-14) and a large band gap. Erbium is sometimes used as a coloring for glasses and erbium oxide can also be used as a burnable neutron poison for nuclear fuel. Erbium oxide films obtained by sputtering can be used for their photoluminescence effect.

Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.250”

$213.00

Product 

Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 4'', Thickness: 0.250''

CAS No.

 7429-90-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 26.98 g/mol

Melting Point

 660.3 °C

Boiling Point

 2519 °C

Density

 2.70 g/cm³

Product Codes

NCZ-2572K

1g Reduced Monolayer Graphene Oxide

$213.00
Product 1g Reduced Monolayer Graphene Oxide
CAS No. 7782-42-5
Appearance Black or dark gray
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 0.5–10µmnm (Size Can be customized),  Ask for other available size range.
Ingredient C₁₀H₂O₁
Molecular Weight N/A
Melting Point 300°C
Boiling Point N/A
Density 1.8 – 2.2 g/cm³
Product Codes NCZ-141I
 

1g Amine Functionalized Graphene Oxide Powder

$213.00
Product 1g Amine Functionalized Graphene Oxide Powder
CAS No. 7782-42-5
Appearance Black
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 0.5–5µm (Size Can be customized),  Ask for other available size range.
Ingredient CₓHᵧONₙ
Molecular Weight 79.87 g/mol
Melting Point N/A
Boiling Point N/A
Density 0.0993 g/cm³
Product Codes NCZ-137I

Titanium Oxide Nanoparticles / Nanopowder (TiO2) Rutile, 99.5% 10-30nm

Price range: $59.00 through $213.00
Select options This product has multiple variants. The options may be chosen on the product page
  $59/100g $129/500g
$213/1kg

Product 

Titanium Oxide Nanoparticles / Nanopowder (TiO2) Rutile, 99.5% 10-30nm

CAS No.

 13463-67-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 10-30nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

79.87 g/mol

Melting Point

~1,843 °C

Boiling Point

~2,972 °C

Density

~4.23 g/cm³

Product Codes

NCZ-1198K

Titanium Oxide Nanoparticles / Nanopowder (TiO2, anatase, 99.5%, 10~30nm)

Price range: $59.00 through $213.00
Select options This product has multiple variants. The options may be chosen on the product page
$59/100g
$129/500g
$213/1kg

Product 

Titanium Oxide Nanoparticles / Nanopowder (TiO2, anatase, 99.5%, 10~30nm)

CAS No.

1317‑70‑0 / 13463‑67‑7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

10~30nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

79.87 g/mol

Melting Point

1,550–1,843 °C

Boiling Point

~1,840–2,970 °C

Density

~14.3–14.7 g/cm³

Product Codes

NCZ-1194K

Boron Nitride Powder (BN, hexagonal, 99+%, 3~4um)

Price range: $76.00 through $213.00
Select options This product has multiple variants. The options may be chosen on the product page
$76/100g
$213/500g

Product 

Boron Nitride Powder (BN, hexagonal, 99+%, 3~4um)

CAS No.

10043-11-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 3~4um (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

24.82 g/mol

Melting Point

>2,973 °C (sublimes without melting)

Boiling Point

Sublimes at ~2,973 °C

Density

~2.1–2.3 g/cm³

Product Codes

NCZ-1104K

Silicon Dioxide (SiO2) Sputtering Targets, Fused Quartz, Purity: 99.995%, Size: 5”, Thickness: 0.250”

$213.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Aluminum (Al) Sputtering Targets, Purity: 99.999%, Size: 6”, Thickness: 0.125”

$213.00

 Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Aluminum which has the chemical symbol of Al, is a silvery white, soft, ductile metal that is the third most abundant element. Aluminum is notable due to for its light weight, strength, durability and for its ability to resist corrosion. Aluminum forms an extremely thin but very strong layer of oxide film. Aluminum has also high thermal and electrical conductivity. Aluminum sputtering targets have a particularly fine-grained microstructure. This property of Aluminum sputtering targets ensures that you benefit from uniform erosion and a low susceptibility to particle formation throughout the sputtering process.

Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 6”, Thickness: 0.250”

$213.00

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Aluminum which has the chemical symbol of Al, is a silvery white, soft, ductile metal that is the third most abundant element. Aluminum is notable due to for its light weight, strength, durability and for its ability to resist corrosion. Aluminum forms an extremely thin but very strong layer of oxide film. Aluminum has also high thermal and electrical conductivity. Aluminum sputtering targets have a particularly fine-grained microstructure. This property of Aluminum sputtering targets ensures that you benefit from uniform erosion and a low susceptibility to particle formation throughout the sputtering process.

Indium Hydroxide (In(OH)3) Nanopowder/Nanoparticles, High Purity: 99.996%, Size: 15-65 nm

Price range: $52.00 through $213.00
Select options This product has multiple variants. The options may be chosen on the product page
5 grams/46 € 
25 grams/67 € 100 grams/188 €                       
Please contact us for quotes on larger quantities !!! 

Indium Hydroxide (In(OH)3) Nanopowder/Nanoparticles

High Purity: 99.996%, Size: 15-65 nm

Applications:

Indium hydroxide nanoparticles are used as substitute for mercury as a battery inhibitor.

Carbon (C) (Graphite) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.250”

$212.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Nickel Tab with Adhesive Polymer Tape as Negative Terminal for Pouch Cell, Width: 4 mm

Price range: $55.00 through $212.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

4 mm Wide Nickel Tabs for use as the Negative Terminal of Polymer Li-ion Batteries

Nickel Tab with Adhesive Polymer Tape as Negative Terminal for Pouch Cell, Width: 4 mm

Price range: $55.00 through $212.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

4 mm Wide Nickel Tabs for use as the Negative Terminal of Polymer Li-ion Batteries

Titanium oxynitride (537616)

$211.00
Select options This product has multiple variants. The options may be chosen on the product page
Titanium oxynitride (537616)
D50=0.8-1.5μm D90=3-5μm
 
Product Codes- NCZ-2771K

Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.250”

$211.00

Product 

Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.250''

CAS No.

12061-16-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

382.52 g/mol

Melting Point

~2,343 °C

Boiling Point

N/A

Density

~8.64 g/cm³

Product Codes

NCZ-2245K

Nickel Iron (Ni-Fe) Sputtering Targets, Purity: 99.5%, Size: 2”, Thickness: 0.125”

$211.00

Product 

Nickel Iron (Ni-Fe) Sputtering Targets, Purity: 99.5%, Size: 2'', Thickness: 0.125''

CAS No.

N/A

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 ~57.6 g/mol

Melting Point

 ~1,400 – 1,450 °C

Boiling Point

~2,730 – 2,750 °C

Density

 ~8.6 – 8.7 g/cm³

Product Codes

NCZ-1847K

Niobium (Nb) Sputtering Targets, Purity: 99.95% pure Ex Ta, Size: 3”, Thickness: 0.125”

$211.00

Product 

Niobium (Nb) Sputtering Targets, Purity: 99.95% pure Ex Ta, Size: 3'', Thickness: 0.125''

CAS No.

7440-03-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

92.906 g/mol

Melting Point

 2,468 °C

Boiling Point

 4,744 °C

Density

 8.57 g/cm³

Product Codes

NCZ-1816K

Niobium (Nb) Sputtering Targets, Purity: 99.95% pure Ex Ta, Size: 4”, Thickness: 0.125”

$211.00

Product 

Niobium (Nb) Sputtering Targets, Purity: 99.95% pure Ex Ta, Size: 4'', Thickness: 0.125''

CAS No.

7440-03-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

92.906 g/mol

Melting Point

 2,468 °C

Boiling Point

 4,744 °C

Density

 8.57 g/cm³

Product Codes

NCZ-1814K

Praseodymium Oxide (Pr6O11) Nanopowder/Nanoparticles, Purity: 99.99%, Size: 13-57 nm

Price range: $30.00 through $211.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Praseodymium oxide nanoparticle is widely used in magnetic materials. It has also applications in catalysis.

Nitinol Shape Memory Alloy Sheet, Thickness: 1 mm, AF: 50-55°C

Price range: $6.20 through $210.90
Select options This product has multiple variants. The options may be chosen on the product page
1cm x 1cm/ 6,20  €                     2 cm x 2cm/   12,45 €    

Mg-Al Hydrotalcite (323558)

$210.00
Select options This product has multiple variants. The options may be chosen on the product page
Mg-Al Hydrotalcite (323558) Added into PVC resin, the following properties will be improved: 1. Volume resistivity 2. Congo-red index 3. Initial coloring . Typical Analysis Value
Items Analysis value
Molar ratio(MgO/Al2O3) 4.21
Loss on drying(105°C, 1hr) % 0.38
Specific surface area(BET) m2/g 10.1
Average particle size µm 0.44
Na(XRF result) ppm 150
. Performance Formulation: PVC 100 TOTM 50 Stab 6.8(HT 70%)
Congo-red 200°C(min) 255
Volume resistivity(1014Ωcm) 11.90
Coloring 190°C 5min Good
Coloring 190°C 30min Good
Product Codes- NCZ-2764K

Aluminum Silicon (AlSi) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.250”

$210.00

Product 

Aluminum Silicon (AlSi) Sputtering Targets, Purity: 99.999%, Size: 2'', Thickness: 0.250''

CAS No.

Aluminum: 7429-90-5 Silicon: 7440-21-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 Al: 26.98 g/mol Si: 28.09 g/mol

Melting Point

 ~577–660 °C (depends on Si content)

Boiling Point

~2519 °C (approx.)

Density

~2.6–2.7 g/cm³

Product Codes

NCZ-2516K

Vanadium (V) Sputtering Targets, Purity: 99.5%, Size: 2”, Thickness: 0.125”

$210.00

Product 

Vanadium (V) Sputtering Targets, Purity: 99.5%, Size: 2'', Thickness: 0.125''

CAS No.

7440‑62‑2

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

V(Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

50.94 g/mol

Melting Point

1890 °C

Boiling Point

3380 °C

Density

 ~6.11 g/cm³

Product Codes

NCZ-1396K

Erbium Oxide Micron powder ( Er2O3 Micron powder, 99.9%, 1um)

Price range: $40.00 through $210.00
Select options This product has multiple variants. The options may be chosen on the product page
$40/25g $90/100g $210/500g
Product Erbium Oxide Micron powder ( Er2O3 Micron powder, 99.9%, 1um)
CAS No. 12061-16-4
Appearance Pink powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1um (Size Can be customized),  Ask for other available size range.
Ingredient Er2O3
Molecular Weight 382.56g/mol
Melting Point 2344°C
Boiling Point 3290°C
Density 8.64g/cm³
Product Codes NCZ-107R
 

Erbium Oxide Micron powder ( Er2O3 Micron powder, 99.9%, 1um)

Price range: $40.00 through $210.00
Select options This product has multiple variants. The options may be chosen on the product page
$40/25g
$90/100g
$210/500g

Product 

Erbium Oxide Micron powder ( Er2O3 Micron powder, 99.9%, 1um)

CAS No.

12061-16-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

1um (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

382.52 g/mol

Melting Point

~2,340 °C

Boiling Point

~3,800 °C

Density

~8.64 g/cm³

Product Codes

NCZ-1131K

Bismuth Oxide Nanoparticles / Nanopowder ( Bi2O3, <200nm)

Price range: $44.00 through $210.00
Select options This product has multiple variants. The options may be chosen on the product page
$44/25g
$87/100g
$210/500g

Product 

Bismuth Oxide Nanoparticles / Nanopowder ( Bi2O3, <200nm)

CAS No.

1304-76-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

<200nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

465.96 g/mol

Melting Point

~817 °C

Boiling Point

N/A

Density

~8.9 g/cm³

Product Codes

NCZ-1105K

Nickel Nanoparticles/ Nanopowder (Ni, 99.9% 60-80 nm)

Price range: $72.00 through $210.00
Select options This product has multiple variants. The options may be chosen on the product page
$72/25g
$210/100g

Product 

Nickel Nanoparticles/ Nanopowder (Ni, 99.9% 60-80 nm)

CAS No.

7440-02-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

60-80 nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

58.69 g/mol

Melting Point

1455 °C

Boiling Point

2913 °C

Density

8.90 g/cm³

Product Codes

NCZ-1053K

Zinc (Zn) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.250”

$210.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Magnesium (Mg) Sputtering Targets, Purity: 99.98%, Size: 3”, Thickness: 0.125”

$210.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.125”

$210.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Erbium oxide is an oxide of erbium metal, having the chemical formula Er2O3.

Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.125”

$210.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Erbium oxide with a chemical formula of Er2Ois an oxide of erbium metal. The applications of erbium oxide are varied due to their electrical, optical and photoluminescence properties. Nanoscale materials doped with Er+3 are of much interest because they have special particle-size-dependent optical and electrical properties. Erbium oxide doped nanoparticle materials can be dispersed in glass or plastic for display purposes, such as display monitors. The spectroscopy of Er+3 electronic transitions in host crystals lattices of nanoparticles combined with ultrasonically formed geometries in aqueous solution of carbon nanotubes is of great interest for synthesis of photoluminescence nanoparticles in ‘green’ chemistry. Erbium oxide is among the most important rare earth metals used in biomedicine. Erbium oxides are also used as gate dielectrics in semiconductor devices since it has a high dielectric constant (10-14) and a large band gap. Erbium is sometimes used as a coloring for glasses and erbium oxide can also be used as a burnable neutron poison for nuclear fuel. Erbium oxide films obtained by sputtering can be used for their photoluminescence effect.

Titanium Silicon Carbide (Ti3SiC2) MAX Phase Micron-Powder, 20g

$209.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Titanium Silicon Carbide (Ti3SiC2) MAX Phase Micron-Powder, 20g
CAS No. 12202-82-3
Appearance Gray-black
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 40–50µm (Size Can be customized),  Ask for other available size range.
Ingredient TiO2
Molecular Weight 195.7–195.71 g/mol
Melting Point N/A
Boiling Point N/A
Density 4.5 g/cm³
Product Codes NCZ-579I

Silicon-doped Carbon Quantum Dots Solution (Green Fluorescence), 1mg/mL

$209.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Silicon-doped Carbon Quantum Dots Solution (Green Fluorescence), 1mg/mL
CAS No. N/A
Appearance Pale yellow to light green
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 2–10nm (Size Can be customized),  Ask for other available size range.
Ingredient C_xSi_yH_zO_w
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-521I

99.999% 5N 30-50 nm Aluminum Oxide (Alumina) Al2O3 Powder, 500 g

$209.00
Product 99.999% 5N 30-50 nm Aluminum Oxide (Alumina) Al2O3 Powder, 500 g
CAS No. 1344-28-1
Appearance White to off-white
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 30-50nm (Size Can be customized),  Ask for other available size range.
Ingredient Al2O3
Molecular Weight 101.96 g/mol
Melting Point N/A
Boiling Point N/A
Density 3.65 g/cm³
Product Codes NCZ-258I
 

99.995% 4N5 Indium Foil (100x100x0.3 mm) for Heat Sink and Solid State Battery

$209.00
Select options This product has multiple variants. The options may be chosen on the product page
Product 99.995% 4N5 Indium Foil (100x100x0.3 mm) for Heat Sink and Solid State Battery
CAS No. 7440-74-6
Appearance Silvery, shiny metal foil
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 10–100µm (Size Can be customized),  Ask for other available size range.
Ingredient In
Molecular Weight 138.205 g/mol
Melting Point 156.6 °C
Boiling Point N/A
Density 7.31 g/cm³
Product Codes NCZ-254I
 

Zinc (Zn) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.125”

$209.00

Product 

Zinc (Zn) Sputtering Targets, Purity: 99.95%, Size: 3'', Thickness: 0.125''

CAS No.

7440‑66‑6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

Zn (black granules) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

65.38 g/mol

Melting Point

419.5 °C

Boiling Point

 907 °C

Density

7.14 g/cm³

Product Codes

NCZ-1470K

Zinc (Zn) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.250”

$209.00

Product 

Zinc (Zn) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.250''

CAS No.

7440‑66‑6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

Zn (black granules) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

65.38 g/mol

Melting Point

419.5 °C

Boiling Point

 907 °C

Density

7.14 g/cm³

Product Codes

NCZ-1469K

Silicon Dioxide (SiO2) Sputtering Targets, Fused Quartz, Purity: 99.995%, Size: 4”, Thickness: 0.250”

$209.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Lithium Nickel Manganese Oxide (LMNO) for Li-Ion Cathode Material, LiNi0.5Mn1.5O4

Price range: $44.00 through $209.00
Select options This product has multiple variants. The options may be chosen on the product page
100 grams/44 €                     500 grams/123 €               

Conductive Carbon Black Nanopowder/Nanoparticles, Purity: 95%, Size: 148 nm (Plant)

Price range: $10.00 through $209.00
Select options This product has multiple variants. The options may be chosen on the product page

Conductive Carbon Black

Purity: 95%, Size: 148 nm (Plant)

Technical Properties:

True Density (g/cm3) 0,41
Color black
pH 9,5-10,0
Ash/H2O Content (%) <3,5/<5,0
Shape spherical
Average Particle Size (nm) 148
Specific Surface Area (m2/g) 690
Resistivity  (Ω.cm) 0,3

Applications:

Carbon Black nanopowder has considerably high surface area which makes it reactive, therefore it should be handled with care and rapid moves, vibrations should be avoided. Nanopowder should be kept away from sunlight, any kind of heating, moisture and impacts. Coagulation of the particles is a serious problem, so, nanopowder should be sealed under vacuum and should be kept in cool and dry conditions. Air contact should be avoided. This nanopowder is all natural, produced from plants and that makes it non-polluting. It can be easily dispersed in various solvents. With its attracting properties, it can be used in polymeric materials such as plastics and rubber, electronic applications and materials used for their anti-static properties.

Antimony (Sb) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.250”

$208.00

Product 

Antimony (Sb) Sputtering Targets, Purity: 99.95%, Size: 2'', Thickness: 0.250''

CAS No.

 7440-36-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 121.76 g/mol

Melting Point

 630.6 °C

Boiling Point

 1587 °C

Density

 6.69 g/cm³

Product Codes

NCZ-2509K

Praseodymium Chloride (PrCl3) 99% 2N

$207.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Praseodymium Chloride (PrCl3) 99% 2N
CAS No. 10361-79-2
Appearance Light green to greenish-white crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1–10µm (Size Can be customized),  Ask for other available size range.
Ingredient PrCl3
Molecular Weight 247.27 g/mol
Melting Point N/A
Boiling Point N/A
Density 4.19 g/cm³
Product Codes NCZ-501I
 

5N (99.999%) Silicon (P-type Si) Pieces (1-6mm) Evaporation Materials

Price range: $145.00 through $207.00
Select options This product has multiple variants. The options may be chosen on the product page
Product 5N (99.999%) Silicon (P-type Si) Pieces (1-6mm) Evaporation Materials
CAS No. 7440-21-3
Appearance Dark Gray with a Bluish Tinge, Semi-Metallic
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1-6mm (Size Can be customized),  Ask for other available size range.
Ingredient Si
Molecular Weight 28.0855 g/mol
Melting Point 1,410 °C
Boiling Point N/A
Density 2.32 g/cm3
Product Codes NCZ-146E

316 Stainless Steel Wave Spring (Belleville Washers) for CR2032, Diameter: 15.8 mm, Thickness: 0.5 mm

Price range: $58.00 through $207.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

316 Stainless Steel Wave Spring (Belleville Washers) for CR2032 for Battery Research

304SS Coin Cell Battery Spacer, Diameter: 15.8 mm, Thickness: 0.5 mm

Price range: $57.00 through $207.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

304 Stainless Steel Coin Cell Battery Spacer (15.8 mm Dia x 0.5 mm) for Battery Research

Tungsten (VI) Oxide (WO3) 99.9% 3N Nanopowder, 50g

$206.00
Product Tungsten (VI) Oxide (WO3) 99.9% 3N Nanopowder, 50g
CAS No. 1314-35-8
Appearance Yellow to light greenish
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 100nm (Size Can be customized),  Ask for other available size range.
Ingredient WO3
Molecular Weight 231.84 g/mol
Melting Point N/A
Boiling Point N/A
Density 7.16 g/cm³
Product Codes NCZ-582I

1g Ordered Mesoporous Carbon CMK-3 Nano Powder

$206.00
Product 1g Ordered Mesoporous Carbon CMK-3 Nano Powder
CAS No. 99685-96-8
Appearance Black 
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 100nm (Size Can be customized), Ask for other available size range.
Ingredient C
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 2.0 – 2.2 g/cm³
Product Codes NCZ-140I

Magnesium (Mg) Sputtering Targets, Purity: 99.98%, Size: 2”, Thickness: 0.250”

$206.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

99.99% 4N 200 nm Alpha Aluminum Oxide (Alumina) Al2O3 Powder, 500 g

$205.00
Product 99.99% 4N 200 nm Alpha Aluminum Oxide (Alumina) Al2O3 Powder, 500 g
CAS No. 1344-28-1
Appearance White
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 200nm (Size Can be customized),  Ask for other available size range.
Ingredient Al2O3
Molecular Weight 101.96 g/mol
Melting Point 2,050 °C
Boiling Point N/A
Density 3.95–4.00 g/cm³
Product Codes NCZ-240I

500 nm High Purity 99.99% Alpha Aluminum Oxide Nanoparticles

Price range: $128.00 through $205.00
Select options This product has multiple variants. The options may be chosen on the product page
Product 500 nm High Purity 99.99% Alpha Aluminum Oxide Nanoparticles
CAS No. 1344-28-1
Appearance White
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 500nm (Size Can be customized),  Ask for other available size range.
Ingredient Al2O3
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 101.96 g/cm³
Product Codes NCZ-186I
 

300 nm High Purity 99.99% Alpha Aluminum Oxide Nanoparticles

Price range: $128.00 through $205.00
Select options This product has multiple variants. The options may be chosen on the product page
Product 300 nm High Purity 99.99% Alpha Aluminum Oxide Nanoparticles
CAS No. 1344-28-1
Appearance White
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 300nm (Size Can be customized),  Ask for other available size range.
Ingredient Al₂O₃
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-153I
 

Cerium Oxide Nanopowder/ Nanoparticles (Nanoceria or CeO2, 10~30nm, 99.9%)

Price range: $55.00 through $205.00
Select options This product has multiple variants. The options may be chosen on the product page
$55/25g $115/100g $205/500g $315/kg
Product Cerium Oxide Nanopowder/ Nanoparticles (Nanoceria or CeO2, 10~30nm, 99.9%)
CAS No. 1306-38-3
Appearance White Powder
Purity ≥99%,  ≥99.9%,  ≥95% (Other purities are also available)
APS 15-30 nm  (Size Can be customized),  Ask for other available size range.
Ingredient CeO2
Molecular Weight 172.115g/mol
Melting Point 2400°C
Boiling Point 3,500°C
Density 7.2 g/cm³
Product Code NCZ-100R
 

Tantalum (Ta) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.250”

$205.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.