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Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 4'', Thickness: 0.125''
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Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.125”

$326.00
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Product 

 Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 4'', Thickness: 0.125''

CAS No.
7440-50-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 63.55 g/mol

Melting Point

 1,084 °C

Boiling Point

 2,562 °C

Density

 8.96 g/cm³

Product Codes

NCZ-2261K
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Silver (Ag) Nanopowder/Nanoparticles Dispersion, Purity: 99.99%, Size: 14 nm, 1200 ppm

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Price range: $56.75 through $325.75
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Silver (Ag) Nanopowder/Nanoparticles Dispersion Purity: 99.99%, Size: 14 nm, 1200 ppm Technical Properties: Ag Nanoparticle Purity (%) 99,99 Ag Concentration (wt%/ppm) 0,10/1200
Ectoin (539511)
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Ectoin (539511)

$325.00
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Ectoin (539511) Description: Ectoin is a cyclic amino acid derivative obtained through fermentation technology. As an important substance for microorganism to survive in extreme environments, ectoin can effectively bind the surrounding water molecules and form a protective layer on the surface of cell membrane, to fully protect intracellular substance from UV light and high temperature, etc. Ectoin has remarkable moisturizing, soothing and repairing effects, and is widely used in various cosmetic formulations. INCI Name: Ectoin CAS No.: 96702-03-3 Structural formula: . . . . . Applications: essence, lotion, face cream, facial mask, cosmetic water, etc. User guide: adding at low temperature after emulsification Recommended dosage: 0.1%-5% Shelf life: 24 months Storage: stored in sealed and cool condition, at room temperature Physical and chemical properties 
Items Standard
Appearance White or off-white powder or granules
Assay ≥ 98%.
pH 5.0~7.5
Transmittance ≥ 98%
Specific rotation +139° ~ +145°
Chlorine ≤ 0.05%
Loss on drying ≤ 1.0%
Ignition residue ≤ 1.0%
Heavy metals ≤ 10.0 ppm
Pb ≤ 2.0 ppm
Total Plate Count ≤ 100 cfu/g
Molds and yeasts count ≤ 50 cfu/g
Thermophilic coliform Negative
Pseudomonas Aeruginosa Negative
Staphylococcus aureus Negative
Product Codes- NCZ-2716K
Alginate Oligosaccharide(Food grade) (233589)
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Alginate Oligosaccharide(Food grade) (233589)

$325.00
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Alginate Oligosaccharide(Food grade) (233589)

Alginate oligosaccharide, produced by the degradation of algin, is a linear polysaccharide consisting of α-L-guluronate (G) and β-D-mannuronate (M) is the latest generation of functional oligosaccharides.

Specifications:

Test Items Specifications
Appearance Off white Powder
Content (%) ≥85
Particle size (Mesh) ≥100
Moisture(%) ≤10.0
Ash Content(%) ≤1.0
Insoluble(%) ≤0.6
pH value 4.5-7.0
Pb(ppm) ≤1.0
As(ppm) ≤0.5
Mercury(ppm) ≤0.5
Total plate count(cfu/g) ≤1000
Yeast and Mold(cfu/g) ≤30
Pathogen(cfu/g) Negative
Product Codes- NCZ-2660K
α-Tricalcium phosphate(α-Ca3(PO4)2, >95%) (207982)
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α-Tricalcium phosphate(α-Ca3(PO4)2, >95%) (207982)

$325.00
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Product 
α-Tricalcium phosphate(α-Ca3(PO4)2, >95%) (207982)

CAS No.
7758‑87‑4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

  <80um (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 ~310.18 g/mol

Melting Point

 ~1670 °C

Boiling Point

N/A

Density

 ~2.866 g/cm³

Product Codes

NCZ-2610K
Yttrium Oxide Nanoparticles / Nanopowder (Y2O3, 99.995%, 0.5~1um)
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Yttrium Oxide Nanoparticles / Nanopowder (Y2O3, 99.995%, 0.5~1um)

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Price range: $105.00 through $325.00
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$105/100g
$225/500g
$325/Kg

Product 

 Yttrium Oxide Nanoparticles / Nanopowder (Y2O3, 99.995%, 0.5~1um)

CAS No.

1314-36-9

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 

0.5~1um (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 225.81 g/mol

Melting Point

~2,430 °C

Boiling Point

~4,300 °C

Density

 ~5.01 g/cm³

Product Codes

NCZ-1210K
Silicon Carbide Fiber (SiC, Beta, 99+%)
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Silicon Carbide Fiber (SiC, Beta, 99+%)

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Price range: $64.00 through $325.00
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$64/10g
$113/25g
$325/100g

Product 

 Silicon Carbide Fiber (SiC, Beta, 99+%)

CAS No.

409-21-2

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 10–15 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 40.10 g/mol

Melting Point

~2,730 °C

Boiling Point

~3,100 °C

Density

 ~3.21 g/cm³

Product Codes

NCZ-1175K
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Molybdenum (Mo) Sputtering Targets, Purity: 99.95%, Size: 6”, Thickness: 0.250”

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$325.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Silicon Nitride (Si3N4) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.250'', White to Gray
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Silicon Nitride (Si3N4) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”, White to Gray

$324.00
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Product 

 Silicon Nitride (Si3N4) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.250'', White to Gray

CAS No.

 12033-89-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  140.28 g/mol

Melting Point

 ~1900 °C

Boiling Point

N/A

Density

 ~3.2 g/cm³

Product Codes

NCZ-1702K
Titanium Dioxide (TiO2) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.250'', Grey to Black
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Titanium Dioxide (TiO2) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”, Grey to Black

$324.00
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Product 

 Titanium Dioxide (TiO2) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.250'', Grey to Black

CAS No.

13463‑67‑7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

TiO₂ (black granules) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 79.94 g/mol

Melting Point

~1,843 °C

Boiling Point

~2,972 °C

Density

 ~4.23 g/cm³

Product Codes

NCZ-1443K
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Titanium Boride (TiB2) Sputtering Targets, Purity: 99.5%, Size: 1”, Thickness: 0.250”

, , ,
$324.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

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Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”

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$324.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

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Thermoplastic Carbon Paste, Drying Temperature: <100 °C

Price range: $160.00 through $324.00
Select options This product has multiple variants. The options may be chosen on the product page

Application:

  • Perovskite Solar Cell
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Thermoplastic Carbon Paste for Long-term Cell Degradation

Price range: $160.00 through $324.00
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Application:

  • Perovskite Solar Cell
Molybdenum (Mo) Sputtering Targets, Purity: 99.95%, Size: 8'', Thickness: 0.250''
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Molybdenum (Mo) Sputtering Targets, Purity: 99.95%, Size: 8”, Thickness: 0.250”

$323.00
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Product 

 Molybdenum (Mo) Sputtering Targets, Purity: 99.95%, Size: 8'', Thickness: 0.250''

CAS No.

 7439-98-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 95.95 g/mol

Melting Point

 2623 °C

Boiling Point

 4639 °C

Density

 10.28 g/cm³

Product Codes

NCZ-1930K
Vanadium (V) Sputtering Targets, Purity: 99.5%, Size: 2'', Thickness: 0.250''
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Vanadium (V) Sputtering Targets, Purity: 99.5%, Size: 2”, Thickness: 0.250”

$323.00
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Product 

 Vanadium (V) Sputtering Targets, Purity: 99.5%, Size: 2'', Thickness: 0.250''

CAS No.

7440-62-2

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 50.9415 g/mol

Melting Point

1910 °C

Boiling Point

3407 °C

Density

 6.11 g/cm³

Product Codes

NCZ-1549K
Aluminum Zinc Oxide Micropowder (AZO, D50: 0.5~1.5um)
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Aluminum Zinc Oxide Micropowder (AZO, D50: 0.5~1.5um)

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Price range: $82.00 through $323.00
Select options This product has multiple variants. The options may be chosen on the product page
$82/100g
$201/500g
$323/kg

Product 

 Aluminum Zinc Oxide Micropowder (AZO, D50: 0.5~1.5um)

CAS No.
952185-00-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

0.5~1.5um (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

~80.6 g/mol

Melting Point

1,900–2,000 °C

Boiling Point

 2,360 °C

Density

 5.5 to 5.6  g/cm³

Product Codes

NCZ-1094K
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Praseodymium (Pr) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”

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$322.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

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Nickel (Ni) Sputtering Targets, Purity: 99.995%, Size: 4”, Thickness: 0.250”

, ,
$322.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

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Praseodymium (Pr) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”

, ,
$322.00
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Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.
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Chromium (Cr) Micron Powder, Purity: 99.99 %, Size: 325 mesh

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Price range: $32.00 through $322.00
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25 grams/29 €  100 grams/67 €  500 grams/174 €  1000 grams/285 €  Please contact us for quotes on larger quantities !!!

Chromium (Cr) Micron Powder

Purity: 99.99 %, Size: 325 mesh

Technical Properties:

PURITY

99.99 %
PARTICLE SIZE

325 mesh
CAS

7440-47-3
DENSITY

7.19 g/cm³
BOILING POINT

2475 °C
MELTING POINT

1875 °C
COEFF. OF EXPANSION @ 20ºC

6.2 x 10 ⁻⁶
MOHS HARDNESS @ 20ºC

9
ELECTRIC RESISTIVITY

12.9 microhm-cm
CRYSTAL STRUCTURE

Cubic, Body Centered
FORM  

Powder
APPLICATIONS

Aerospace, Alloys, Ceramics, Electronics, Nuclear
 
       
                 
Bismuth Oxide (Bi2O3) Nanopowder
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Bismuth Oxide (Bi2O3) Nanopowder/Nanoparticles, Purity: 99.99%, Size: 75-195 nm

Price range: $27.00 through $322.00
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5 grams/24 € 25 grams/49 € 100 grams/97 € 500 grams/195 € 1000 grams/284 €                 
Please contact us for quotes on larger quantities !!!

Bismuth Oxide (Bi2O3) Nanopowder/Nanoparticles

Purity: 99.99%, Size: 75-195 nm

Applications:

Bismuth Oxide nanoparticles have applications in electronic and in glass and ceramic industry. In electronics it is used in capacitors, pressure-senstive resistors and solid electrolytes. In ceramic it is added to improve the performance of ceramic materials. It also increases the index of refraction when added to glass. It is used as a substitute for lead oxide in glass and it is the best substitute of (Lead Glaze). Bismuth Oxide nanoparticles also are used as a composite in polymers, rubber, fireproofing papers, disinfectant, and magnets. It has also applications in medicine and artificial bone imaging.
Zinc Sputtering Target Zn
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Zinc Sputtering Target Zn

Price range: $130.00 through $321.00
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Product Zinc Sputtering Target Zn
CAS No. 7440-66-6
Appearance Shiny silvery-grey metal
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Zn
Molecular Weight 65.38 g/mol.
Melting Point N/A
Boiling Point N/A
Density 7.14 g/cm³
Product Codes NCZ-149H
 
Aluminum (Al) Micron Powder
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Aluminum (Al) Micron Powder, Purity: 99.95 %, Size: 70 µm

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Price range: $17.00 through $321.00
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25 grams/16 € 100 grams/49 €    500 grams/147 €    1000 grams/284 € 
Please contact us for quotes on larger quantities !!!

Aluminum (Al) Micron Powder

Purity: 99.95 %, Size: 70 µm

Multi Walled Nanotubes (MWNTs, 95%,
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Multi Walled Nanotubes (MWNTs, 95%, <8 nm)

Price range: $58.00 through $320.00
Select options This product has multiple variants. The options may be chosen on the product page
$58/5g
$101/25g
$320/100g
 

Product 

 Multi Walled Nanotubes (MWNTs, 95%, <8 nm)

CAS No.

7727-54-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

<8 nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 228.20 g/mol

Melting Point

 120 °C

Boiling Point

N/A

Density

  1.98 g/cm³

Product Codes

NCZ-1231K
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Tungsten Titanium (TiW) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.250”

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$320.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Titanate Nanotubes Powder, 1g/bottle
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Titanate Nanotubes Powder, 1g/bottle

$319.00
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Product Titanate Nanotubes Powder, 1g/bottle
CAS No. 12031-82-2
Appearance Fine, white/off-white
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 10–20nm (Size Can be customized),  Ask for other available size range.
Ingredient H₂Ti₃O₇
Molecular Weight 242.52 g/mol
Melting Point N/A
Boiling Point N/A
Density 3.12–3.16 g/cm³
Product Codes NCZ-567I
Silicon Quantum Dots Solution (Blue Fluorescence)
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Silicon Quantum Dots Solution (Blue Fluorescence)

$319.00
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Product Silicon Quantum Dots Solution (Blue Fluorescence)
CAS No. N/A
Appearance Clear to slightly colored colloidal
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 2–4nm (Size Can be customized),  Ask for other available size range.
Ingredient Si
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 2.33 g/cm³
Product Codes NCZ-520I
 
High Purity Lead (II) Iodide (PbI2) Trace Metals Basis, Perovskite Grade, 99.999%, 5N, 10g
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High Purity Lead (II) Iodide (PbI2) Trace Metals Basis, Perovskite Grade, 99.999%, 5N, 10g

$319.00
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Product High Purity Lead (II) Iodide (PbI2) Trace Metals Basis, Perovskite Grade, 99.999%, 5N, 10g
CAS No. 10101-63-0
Appearance Bright yellow to orange crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient PbI2
Molecular Weight 461.01 g/mol
Melting Point N/A
Boiling Point N/A
Density 6.16 g/cm³
Product Codes NCZ-410I
 
Lithium Titanate (Li2TiO3) Sputtering Targets, indium, Purity: 99.95%, Size: 2'', Thickness: 0.125''
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Lithium Titanate (Li2TiO3) Sputtering Targets, indium, Purity: 99.95%, Size: 2”, Thickness: 0.125”

$319.00
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Product 

 Lithium Titanate (Li2TiO3) Sputtering Targets, indium, Purity: 99.95%, Size: 2'', Thickness: 0.125''

CAS No.

12031-82-2

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 109.75 g/mol

Melting Point

Decomposes before melting (~1,200 °C)

Boiling Point

N/A

Density

 ~3.41 g/cm³

Product Codes

NCZ-2009K
High Purity (>99.9 wt%) Graphitized Hydroxylate Multi-Walled Carbon Nanotube, 30g
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High Purity (>99.9 wt%) Graphitized Hydroxylate Multi-Walled Carbon Nanotube, 30g

Price range: $315.00 through $319.00
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Product High Purity (>99.9 wt%) Graphitized Hydroxylate Multi-Walled Carbon Nanotube, 30g
CAS No. 308068-56-6
Appearance Black fine
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1–10µm (Size Can be customized),  Ask for other available size range.
Ingredient (C)x(COOH)y
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 2.1 g/cm³
Product Codes NCZ-393I
99.99% 4N 10-20 nm Aluminum Oxide (Alumina) Al2O3 Powder, 500 g
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99.99% 4N 10-20 nm Aluminum Oxide (Alumina) Al2O3 Powder, 500 g

$319.00
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Product 99.99% 4N 10-20 nm Aluminum Oxide (Alumina) Al2O3 Powder, 500 g
CAS No. 1344-28-1
Appearance White to off-white
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 10-20nm (Size Can be customized),  Ask for other available size range.
Ingredient Al2O3
Molecular Weight 101.96 g/mol
Melting Point N/A
Boiling Point N/A
Density 3.6–3.7 g/cm³
Product Codes NCZ-238I
99.99% 4N 10 - 30 nm Gamma Aluminum Oxide (Alumina) Al2O3 Powder, 500 g
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99.99% 4N 10 – 30 nm Gamma Aluminum Oxide (Alumina) Al2O3 Powder, 500 g

$319.00
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Product 99.99% 4N 10 - 30 nm Gamma Aluminum Oxide (Alumina) Al2O3 Powder, 500 g
CAS No. 1344-28-1
Appearance White to off-white
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 10-30nm (Size Can be customized),  Ask for other available size range.
Ingredient Al2O3
Molecular Weight 101.96 g/mol
Melting Point N/A
Boiling Point N/A
Density 3.5–3.7 g/cm³
Product Codes NCZ-237I
 
99.99% 4N 10 - 20 nm Gamma Aluminum Oxide (Alumina) Al2O3 Powder, 500 g
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99.99% 4N 10 – 20 nm Gamma Aluminum Oxide (Alumina) Al2O3 Powder, 500 g

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Product 99.99% 4N 10 - 20 nm Gamma Aluminum Oxide (Alumina) Al2O3 Powder, 500 g
CAS No. 1344-28-1
Appearance White
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 10-20nm (Size Can be customized),  Ask for other available size range.
Ingredient Al2O3
Molecular Weight 101.96 g/mol
Melting Point N/A
Boiling Point N/A
Density 3.6 g/cm³
Product Codes NCZ-236I
 
3N (99.9%) Copper (II) Oxide (CuO) Powder, 1~2 um
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3N (99.9%) Copper (II) Oxide (CuO) Powder, 1~2 um

Price range: $209.00 through $319.00
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Product 3N (99.9%) Copper (II) Oxide (CuO) Powder, 1~2 um
CAS No. 1317-38-0
Appearance Black
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1-2um (Size Can be customized), Ask for other available size range.
Ingredient CuO
Molecular Weight 79.54 g/mol
Melting Point N/A
Boiling Point N/A
Density 2.33 g/cm3
Product Codes NCZ-160I
3N5 (99.95%) Tantalum (Ta) Wire Evaporation Materials, 1 meter length
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3N5 (99.95%) Tantalum (Ta) Wire Evaporation Materials, 1 meter length

Price range: $121.00 through $319.00
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Product 3N5 (99.95%) Tantalum (Ta) Wire Evaporation Materials, 1 meter length
CAS No. 7440-25-7
Appearance Gray Blue, Metallic
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 0.25-0.30 mm (Size Can be customized),  Ask for other available size range.
Ingredient Ta
Molecular Weight 180.95 g/mol
Melting Point 3,017 °C
Boiling Point N/A
Density 16.6 g/cm3
Product Codes NCZ-154E
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Boron Nitride (BN) Sputtering Targets, Purity: 99.5%, Size: 1”, Thickness: 0.125”

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$319.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

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Silicon Dioxide (SiO2) Sputtering Targets, Fused Quartz, indium, Purity: 99.995%, Size: 1”, Thickness: 0.125”

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$318.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

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High Capacity and High Purity Graphite Micron Powder for Li-ion Battery (Copy)

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Price range: $48.00 through $318.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

High Capacity and High Purity Graphite Micron Powder for Li-ion Battery (NG08BE0304) can be used for all kinds of Li-ion Battery. For example: Electric Bicycle, Drone Aircraft battery, Unmanned Aerial Vehicle, Electric tools.
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High Capacity and High Purity Graphite Micron Powder for Li-ion Battery

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Applications:

High Capacity and High Purity Graphite Micron Powder for Li-ion Battery (NG08BE0304) can be used for all kinds of Li-ion Battery. For example: Electric Bicycle, Drone Aircraft battery, Unmanned Aerial Vehicle, Electric tools...i.e
Ytterbium Nitrate Pentahydrate (Yb(NO3)3 · 5H2O) 99.95% 3N5
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Ytterbium Nitrate Pentahydrate (Yb(NO3)3 · 5H2O) 99.95% 3N5

$317.00
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Product Ytterbium Nitrate Pentahydrate (Yb(NO3)3 · 5H2O) 99.95% 3N5
CAS No. 35725-34-9
Appearance White crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1–10µm (Size Can be customized),  Ask for other available size range.
Ingredient Yb(NO₃)₃·5H₂O
Molecular Weight 449.13 g/mol
Melting Point N/A
Boiling Point N/A
Density 2.3–2.5 g/cm³
Product Codes NCZ-597I
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Zinc (Zn) Sputtering Targets, Purity: 99.95%, Size: 8'', Thickness: 0.250''
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Zinc (Zn) Sputtering Targets, Purity: 99.95%, Size: 8”, Thickness: 0.250”

$317.00
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 Zinc (Zn) Sputtering Targets, Purity: 99.95%, Size: 8'', Thickness: 0.250''

CAS No.

7440‑66‑6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

Zn (black granules) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 65.38 g/mol

Melting Point

419.5 °C

Boiling Point

 907 °C

Density

 7.14 g/cm³

Product Codes

NCZ-1463K
3N (99.9%) Neodymium (Nd) Pieces (1-6mm) Evaporation Materials,100g
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3N (99.9%) Neodymium (Nd) Pieces (1-6mm) Evaporation Materials,100g

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$317.00
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Product 3N (99.9%) Neodymium (Nd) Pieces (1-6mm) Evaporation Materials,100g
CAS No. 7440-00-8
Appearance Silvery White, Yellowish Tinge, Metallic 
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1–6mm (Size Can be customized),  Ask for other available size range.
Ingredient Nd
Molecular Weight 144.24 g/mol
Melting Point 1,021°C
Boiling Point N/A
Density 7.01 g/cm³
Product Codes NCZ-111E
 
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Graphite (C) Micron Powder, Purity: ≥99.99%, Size: 1 μm

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Price range: $19.00 through $317.00
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5 grams/17 € 25 grams/38 €                       
100 grams/108 €                     
500 grams/195 €                   
1000 grams/280 € Please contact us for quotes on larger quantities !!!

Graphite (C) Micron Powder

Purity: ≥99.99%, Size: 1 μm

Bismuth (Bi) Sputtering Targets, Purity: 99.999%, Size: 3'', Thickness: 0.125''
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Bismuth (Bi) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.125”

$316.00
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Product 

 Bismuth (Bi) Sputtering Targets, Purity: 99.999%, Size: 3'', Thickness: 0.125''

CAS No.
7440‑69‑9

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

1 – 5 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 ~208.98 g/mol

Melting Point

  271.4 °C

Boiling Point

~1560 °C

Density

  ~9.78–9.80 g/cm³

Product Codes

NCZ-2436K
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Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.250''
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Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”

$316.00
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Product 

 Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.250''

CAS No.

7440-65-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 88.91 g/mol

Melting Point

1522 °C

Boiling Point

3338 °C

Density

 4.47 g/cm³

Product Codes

NCZ-1522K
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Nickel Iron (Ni-Fe) Sputtering Targets, Purity: 99.95%, Size:3”, Thickness: 0.250”

, , ,
$316.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

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Gadolinium Oxide (Gd2O3) Nanopowder/Nanoparticles, Purity: 99.99%, Size: 13-95 nm

, ,
Price range: $38.00 through $316.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Gadolinium oxide nanoparticles are used in different fluorescent, luminescence and electric devices. It is used in electroluminescent devices, cathode-ray tube, field emission displays, ferroelectric memory, plasma display panels, ultraviolet detectors, and high resolution x-ray medical imaging.
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KETJENBLACK EC-600JD Conductive Carbon Black

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Price range: $29.00 through $316.00
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25 gram: 26€ 100 gram: 65€ 500 gram:187€ 1000 gram: 279€ Ketjen Black EC-600JD Conductive Carbon Black  KETJENBLACK is a unique electro-conductive carbon black that has received favorable evaluations for its superior performance and stability of quality. Mixed with plastic, rubber or other materials, KETJENBLACK has garnered high marks for providing the same level of electro-conductivity with a lower loading quantity as conventional carbon black. PRODUCT PROPERTIES

PORE VULUME, DBP (ml/100)

480-510 ml/100g

pH

9.0-10.5

GRIT (wt%)

≤30 mg/kg

VOLATILE (wt%)

≤1.0 %

ASH (wt)

≤0.1 %

IODIE VALUE

1000-1100 mg/g

FINE (wt %)

≤7 %

APPARENT BULK DENSITY (g/L)

100-120 kg/m³

MOISTURE (wt%)

≤0.5 %

APPEARANCE

Black free-flowing pellets
  Applications of Ketjenblack EC-600JD is a very pure carbon black extremely suitable for antistatic and electroconductive applications. Due to its unique morphology and the extremely high surface area of approx. 1400 m2/g (BET), only one sixth the amount of Ketjenblack EC600-JD is needed compared to conventional electroconductive blacks in order to achieve the same conductivity. The extreme low loading of Ketjenblack EC600-JD allows easier processing for those compounds sensitive to filler addition, thus minimizing loss in mechanical and rheological properties. Ketjenblack EC-600JD when thoroughly dispersed with the polymer significantly increases the conductivity of the resulting compound. Ketjenblack EC-600JD can be used in all types of polymers, thermoset, thermoplastic as well as elastomers. Due to its unique morphology and structure with very low amounts of Ketjenblack EC-600JD excellent conductive material can be made. The loading needed to obtain a certain conductivity can vary significantly per type of polymer. Ketjenblack Features (1) Same level of electro-conductivity as conventional carbon black but with 1/2 to 1/3 of the loading quantity (2) Effective at a lower loading quantity, has minimal effect on the physical properties of base resins or paint (3) Minimal reduction in electro-conductivity when mixed with other materials
Mesophase pitch(Petroleum, Impregnant grade) (273575)
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Mesophase pitch(Petroleum, Impregnant grade) (273575)

$315.00
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Mesophase pitch(Petroleum, Impregnant grade) (273575)

Softening point Content of mesophase Ash Sulfur
150-295°C 10-95% 0.01% 0.5%
    Product Codes- NCZ-2672K
Chitosan Oligosaccharide(Agriculture grade) (238589)
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Chitosan Oligosaccharide(Agriculture grade) (238589)

$315.00
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Chitosan Oligosaccharide(Agriculture grade) (238589)

Chitosan Oligosaccharide is a mixture of oligomers of D-glucosamine. It is the only known positively charged alkaline amino oligosaccharide which is derived from rich marine biological resources (shrimp & crab shells) with enzymatic degradation. Its degree of polymerization is 2-10 with molecular weight average 2,000.

Synonym Chitosan Oligomers, Chitooligosaccharide, Oligochitosan

Molecular Formula (C6H11NO4)n, n=2-10

Characteristics Chitosan Oligosaccharide is the only known alkaline, positively charged, water-soluble and lipophilic amino oligosaccharide.

Features Low dosage (Optimal concentration 50-100ppm) Nature safe & Biological decomposable Superior biocompatibility No drug fastness Proven effective and reliable for Crops, Vegetables, Fruits & Flowers

Benefits 1. Activate plant protection against Fungal, Bacterial, Virus diseases, Pest & Environment stress

Experimental examples  Tested pathogenic microorganisms 
Antiviral (Control effects 63-90%) Downy Mildew Powdery Mildew Banana Bunchy Black Heart, etc.
Antifungal Cucurbits Fusarium Wilt Tomato Gray Mold Seedling Blight Cucumber Downy Mildew Potato Late Blight, etc.
Antibacterial Eggplant Bacterial Wilt Tomato Bacterial Canker Tomato Bacterial Wilt Potato Soft Rot Cucumber Bacterial Angular Leaf Spot, etc.
  1. Promote plant growth -Promote plant seed germination and seedling growth -Promote plant root, stalk and leaf growth -Promote plant fruit growth, and improve yield & profits -Mineral absorption accelerant
  2. Improve soil structure

-Prevent and restrain nematodes

-Activating the growth of useful microbes, suppressing harmful microbes -Restoration of soil ecology

Applications

  1. Biofertilizer: Plant growth regulator, Foliar spray fertilizer ingredients, Fertigation feritilizer

    ingredients

  1. Biopesticide & Biofungicide ingredients
  2. Nematocide ingredients
  3. Seed treatment
  4. Root dipping

Recommended dosage 50-100ppm, i.e., 189.32-378.64mg/US gallon, or about 15-20 g/hectare for foliar spray; about 225-375 g/hectare for root drench.

May use 2-3 times the dose during period of illness.

Specifications

Test Items Specifications
Appearance Yellowish-Brown powder
Molecular Weight ≤3000 Da
Particle size ≥100 Mesh
Moisture ≤10.0%
Ash Content ≤1.0%
Insoluble ≤1.0%
pH value 4.5-7.0
Pb ≤1.0ppm
As ≤1.0ppm
Mercury ≤1.0ppm
Total plate count ≤1000cfu/g
Yeast and Mold ≤50cfu/g
Pathogen Negative
Product Codes- NCZ-2659K
Chitosan Oligosaccharide(Feed grade) (239589)
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Chitosan Oligosaccharide(Feed grade) (239589)

$315.00
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Chitosan Oligosaccharide(Feed grade) (239589)
Molecular Formula: (C6H11NO4)n（n=2~10）

Characteristic:

The only known alkaline, positively charged, water-soluble, lipophilic, amino oligosaccharide.

Features:

1 Not be digested by ferment produced by the animals(It can be digested by ferment produced by the beneficial microorganism living in intestine) 2 Excellent Acid and Thermal Stability 3 No Drug Fastness 4 High Solubility in Water

Benefits for Animals:

1. Advance Growth, Increase Weight and Lower Feed Conversion Rate 2. Increase the Serum IgM Antibody Content to Boost Immunity 3. Enhance Antioxidative Capacity of Blood Serum and Liver 4. Increase the Content of Volatile Fatty Acids 5. Stimulate the Growth of Lactobacillus and Bifidobacterium

Applications:

1 Livestock and Poultry Feed Additive：pigs, poultry, dairy, beef, milk cow, equine, rabbits, pets. 2 Aquaculture Feed Additive：Fishes, Bbalone, Prawn, Holothurian.

Specifications:

Test Items Specifications
Appearance Yellowish-Brown Power
Content (%) ≥90
Molecular Weight (Da) ≤3000
DAC (%) ≥90
Particle Size (Mesh) ≥80
Moisture (%) ≤10.0
Ash Content (%) ≤1.0
Insoluble (%) ≤1.0
pH value 4.5-7.0
Pb (mg/kg) ≤1.0
As (mg/kg) ≤1.0
Hg (mg/kg) ≤1.0
Total plate count (cfu/g ) ≤1000
Coliform (cfu/g ) ≤50
Yeast (cfu/g ) ≤30
Mold (cfu/g ) ≤30
Pathogenic Bacterium (cfu/g ) Negative
Product Codes- NCZ-2658K
Chitosan Oligosaccharide(Food grade) (237589)
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Chitosan Oligosaccharide(Food grade) (237589)

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Chitosan Oligosaccharide(Food grade) (237589)
  Molecular Formula: (C6H11NO4)n（n=2~10）

Specifications:

Test Items Specifications
Appearance Light Yellow Power
Deacetylation ≥90%
Molecular Weight ≤1500 Da
Particle size ≥100 Mesh
Moisture ≤10.0%
Ash Content ≤0.5%
Insoluble ≤1.0%
pH value 4.5-7.0
Pb ≤1.0ppm
As ≤1.0ppm
Mercury ≤0.5ppm
Total plate count ≤1000cfu/g
Yeast and Mold ≤30cfu/g
Pathogen Negative
Product Codes- NCZ-2657K
Sodium phytate(from rice, Food Grade, for research use only) (340604)
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Sodium phytate(from rice, Food Grade, for research use only) (340604)

$315.00
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Product 
Sodium phytate(from rice, Food Grade, for research use only) (340604)

CAS No.
14306‑25‑3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

   10–500 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 684.03 g/mol

Melting Point

  53.3–53.9 °C

Boiling Point

N/A

Density

  2.04 g/cm³ at 20 °C

Product Codes

NCZ-2619K
Titanium (IV) Dioxide (TiO2) Anatase 99.8% 2N8 Nano Powder 50 nm
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Titanium (IV) Dioxide (TiO2) Anatase 99.8% 2N8 Nano Powder 50 nm

Price range: $183.00 through $315.00
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Product Titanium (IV) Dioxide (TiO2) Anatase 99.8% 2N8 Nano Powder 50 nm
CAS No. 13463-67-7
Appearance White fine
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 50nm (Size Can be customized),  Ask for other available size range.
Ingredient TiO2
Molecular Weight 79.87 g/mol
Melting Point N/A
Boiling Point N/A
Density 3.9–4.1 g/cm³
Product Codes NCZ-569I
Thulium Nitrate Pentahydrate (Tm(NO3)3 · 5H2O) 99.95% 3N5
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Thulium Nitrate Pentahydrate (Tm(NO3)3 · 5H2O) 99.95% 3N5

Price range: $95.00 through $315.00
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Product Thulium Nitrate Pentahydrate (Tm(NO3)3 · 5H2O) 99.95% 3N5
CAS No. 10101-98-1
Appearance Colorless to pale pink crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 50µm (Size Can be customized),  Ask for other available size range.
Ingredient Tm(NO3)3·5H2O
Molecular Weight 406.94 g/mol
Melting Point N/A
Boiling Point N/A
Density 2.7 g/cm³
Product Codes NCZ-557I
Praseodymium Carbonate (Pr2(CO3)3) 99% 2N
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Praseodymium Carbonate (Pr2(CO3)3) 99% 2N

$315.00
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Product Praseodymium Carbonate (Pr2(CO3)3) 99% 2N
CAS No. 38245-38-4
Appearance Pale green to light yellow
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1–10µm (Size Can be customized),  Ask for other available size range.
Ingredient Pr2(CO3)3
Molecular Weight 457.83 g/mol
Melting Point N/A
Boiling Point N/A
Density 3.3–3.5 g/cm³
Product Codes NCZ-500I
High Purity Magnesium Metaphosphate (Mg(PO3)2), 99.999% 5N, 1kg
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High Purity Magnesium Metaphosphate (Mg(PO3)2), 99.999% 5N, 1kg

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Product High Purity Magnesium Metaphosphate (Mg(PO3)2), 99.999% 5N, 1kg
CAS No. 13762-84-6
Appearance White to off-white crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Mg(PO3)2
Molecular Weight 222.57 g/mol
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-411I
Barium Metaphosphate Ba(PO3)2 Powder 99.995% 4N5, 1 kg
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Barium Metaphosphate Ba(PO3)2 Powder 99.995% 4N5, 1 kg

$315.00
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Product

Barium Metaphosphate Ba(PO3)2 Powder 99.995% 4N5, 1 kg
CAS No. 13762-83-9
Appearance White
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1–5µm (Size Can be customized),  Ask for other available size range.
Ingredient Ba(PO₃)₂
Molecular Weight 295.27 g/mol
Melting Point 1368 °C
Boiling Point 2260 °C
Density 3.63 g/cm³
Product Codes NCZ-296I
Praseodymium (Pr) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.125''
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Praseodymium (Pr) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”

$315.00
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Product 

 Praseodymium (Pr) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.125''

CAS No.

7440-10-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  140.91 g/mol

Melting Point

931 °C

Boiling Point

 3520 °C

Density

  6.77 g/cm³

Product Codes

NCZ-1789K