$390.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Product	Nickel Iron (Ni-Fe) Sputtering Targets, Purity: 99.95%, Size: 1'', Thickness: 0.125''
CAS No.	N/A
Appearance	Powder
Purity	≥99%, ≥99.9%, ≥95% (Other purities are also available)
APS	N/A (Size Can be customized), Ask for other available size ranges.
Ingredient	N/A
Molecular Weight	~57.6 g/mol
Melting Point	~1,400 – 1,450 °C
Boiling Point	~2,730 – 2,750 °C
Density	~8.6 – 8.7 g/cm³
Product Codes	NCZ-1849K

Product	Nickel Iron Sputtering Targets Ni/Fe
CAS No.	N/A
Appearance	Solid, metallic gray sputtering target
Purity	≥99%, ≥99.9%, ≥95%(Other purities are also available)
APS	N/A
Ingredient	NiFe
Molecular Weight	N/A
Melting Point	1,500 °C
Boiling Point	N/A
Density	8.7 g/cm³
Product Codes	NCZ-131H

MF:	Ni
Chemical Name:	Nickel
Purity:	> 99.99%
APS:	50 nm (Size Customization possible)
Form:	Nanopowder/Dispersion
Product Number:	#NCZ4601
CAS Number	7440-02-0

Product	Nickel Nanoparticles / nanopowder (Ni, 99.5%, 180nm)
CAS No.	7440-02-0
Appearance	Powder
Purity	≥99%, ≥99.9%, ≥95% (Other purities are also available)
APS	180nm (Size Can be customized), Ask for other available size ranges.
Ingredient	N/A
Molecular Weight	58.69 g/mol
Melting Point	1455 °C
Boiling Point	2913 °C
Density	8.90 g/cm³
Product Codes	NCZ-1055K

Product	Nickel Nanoparticles/ Nanopowder (Ni, 99.9% 60-80 nm)
CAS No.	7440-02-0
Appearance	Powder
Purity	≥99%, ≥99.9%, ≥95% (Other purities are also available)
APS	60-80 nm (Size Can be customized), Ask for other available size ranges.
Ingredient	N/A
Molecular Weight	58.69 g/mol
Melting Point	1455 °C
Boiling Point	2913 °C
Density	8.90 g/cm³
Product Codes	NCZ-1053K

Product	Nickel Nanoparticles/Nanopowder (Ni, 99.7% 40-60 nm)
CAS No.	7440-02-0
Appearance	Powder
Purity	≥99%, ≥99.9%, ≥95% (Other purities are also available)
APS	40-60 nm (Size Can be customized), Ask for other available size ranges.
Ingredient	N/A
Molecular Weight	58.69 g/mol
Melting Point	1455 °C
Boiling Point	2913 °C
Density	8.90 g/cm³
Product Codes	NCZ-1052K

Product	Nickel Nanopowder/ Nanoparticles ( Ni, 99.5%, 300nm)
CAS No.	7440-02-0
Appearance	Powder
Purity	≥99%, ≥99.9%, ≥95% (Other purities are also available)
APS	300nm (Size Can be customized), Ask for other available size ranges.
Ingredient	N/A
Molecular Weight	58.69 g/mol
Melting Point	1455 °C
Boiling Point	2913 °C
Density	8.90 g/cm³
Product Codes	NCZ-1057K

Product	Nickel Nanopowder/ Nanoparticles (Ni, 99.8%, 80~150nm)
CAS No.	7440-02-0
Appearance	Powder
Purity	≥99%, ≥99.9%, ≥95% (Other purities are also available)
APS	80~150nm (Size Can be customized), Ask for other available size ranges.
Ingredient	N/A
Molecular Weight	58.69 g/mol
Melting Point	1455 °C
Boiling Point	2913 °C
Density	8.90 g/cm³
Product Codes	NCZ-1056K

Purity (%)	99.55+
Color	gray-black
Morphology	nearly spherical
Average Particle Size (nm)	10-40
Specific Surface Area (m²/g)	>95
Bulk Density (g/cm3)	0,8
True Density (g/cm3)	6,8
Elemental Analysis (%)	Al	Ba	Ca	Mg	Fe	Zn
	0.0017	0.0023	0.0092	0.0065	0.002	0.005

Purity (%)	99.99
Color	dark gray
Morphology	nearly spherical
Average Particle Size (nm)	18
Specific Surface Area (m²/g)	>95
Bulk Density (g/cm3)	0,8
True Density (g/cm3)	6,8
Crystal Structure	cubic
Elemental Analysis (%)	Cd	Pb	Co	Mg	Si	Bi
	0.001	0.001	0.002	0.001	0.001	0.001

Material	Nickel 99.99%, Adhesive Polymer Tape on the tab allows for immediate hot sealing
Length	50 mm
Width	3 mm
Thickness	0.09 mm
Max. Loading Current	3A
Net Weight	128 mg/pcs
Application	1. Connect to cathode current collector as polymer battery positive terminal 2. Suggested Sealing Method: (parameter below may vary from case to case) - Soft type heat-sealing blade (Blade with rubber) - 180-200 °C for upper blade - 160-180 °C for lower blade - 40 PSI (0.3 Mpa) - 3 seconds heating time

Alloy Ratio (Ni-Ti)	50-50
Average Particle Size (nm)	55
Elemental Analysis	Ni-Ti	Fe	Cu	Cr	Others
	≥99.9	≤0.025	≤0.02	≤0.018	≤0.01

Alloy Ratio (Ni-Ti)	50-50
Average Particle Size (nm)	55
Elemental Analysis	Ni-Ti	Fe	Cu	Cr	Others
	≥99.9	≤0.025	≤0.02	≤0.018	≤0.01

Purity (%)	99.5
Color	gray-black
Morphology	nearly spherical
Average Particle Size (nm)	8.0-18.0
Specific Surface Area (m²/g)	>95
Bulk Density (g/cm3)	0,8
True Density (g/cm3)	6,8
Elemental Analysis (%)	Al	Ba	Ca	Mg	Fe	Zn
	0.002	0.0025	0.0092	0.01	0.002	0.006

Product	Nickel Oxide (NiO) Sputtering Target
CAS No.	1313-99-1
Appearance	Powder
Purity	≥99%, ≥99.9%, ≥95% (Other purities are also available)
APS	NA (Size Can be customized), Ask for other available size ranges.
Ingredient	N/A
Molecular Weight	74.69 g/mol
Melting Point	~1,950 °C
Boiling Point	~2,730 °C
Density	~6.67 g/cm³
Product Codes	NCZ-1321K

Product	Nickel Oxide (NiO) Sputtering Targets, indium, Purity: 99.9%, Size: 2'', Thickness: 0.125''
CAS No.	1313-99-1
Appearance	Powder
Purity	≥99%, ≥99.9%, ≥95% (Other purities are also available)
APS	~3–5 µm (Size Can be customized), Ask for other available size ranges.
Ingredient	N/A
Molecular Weight	74.69 g/mol
Melting Point	1,950 °C
Boiling Point	2,730 °C
Density	6.67 g/cm³
Product Codes	NCZ-1834K

Product	Nickel Oxide (NiO) Sputtering Targets, Purity: 99.9%, Size:1'', Thickness: 0.125''
CAS No.	1313-99-1
Appearance	Powder
Purity	≥99%, ≥99.9%, ≥95% (Other purities are also available)
APS	~3–5 µm (Size Can be customized), Ask for other available size ranges.
Ingredient	N/A
Molecular Weight	74.69 g/mol
Melting Point	1,950 °C
Boiling Point	2,730 °C
Density	6.67 g/cm³
Product Codes	NCZ-1841K

MF:	NiO
Chemical Name:	Nickel oxide
Purity:	> 99.99%
APS:	50 nm (Size Customization possible)
Form:	Nanopowder
Product Number:	#NCZ4701
CAS Number	1313-99-1

Product	Nickel Oxide Nanoparticles/ Nanopowder (NiO, 99.9%, 50nm)
CAS No.	1313-99-1
Appearance	Powder
Purity	≥99%, ≥99.9%, ≥95% (Other purities are also available)
APS	50nm (Size Can be customized), Ask for other available size ranges.
Ingredient	N/A
Molecular Weight	74.69 g/mol
Melting Point	~1,980 °C
Boiling Point	~2,730 °C
Density	~6.72 g/cm³
Product Codes	NCZ-1160K

Product	Nickel Powder ( Ni, 99.9%, -325 mesh )
CAS No.	7440-02-0
Appearance	Powder
Purity	≥99%, ≥99.9%, ≥95% (Other purities are also available)
APS	-325 mesh (Size Can be customized), Ask for other available size ranges.
Ingredient	N/A
Molecular Weight	58.69 g/mol
Melting Point	1455 °C
Boiling Point	2913 °C
Density	8.90 g/cm³
Product Codes	NCZ-1058K

Product	Nickel Powder (99.5%, 1.0-1.5 um)
CAS No.	7440-02-0
Appearance	Powder
Purity	≥99%, ≥99.9%, ≥95% (Other purities are also available)
APS	1.0-1.5 um (Size Can be customized), Ask for other available size ranges.
Ingredient	N/A
Molecular Weight	58.69 g/mol
Melting Point	1455 °C
Boiling Point	2913 °C
Density	8.90 g/cm³
Product Codes	NCZ-1051K

Product	Nickel Sputtering Target Ni
CAS No.	7440-02-0
Appearance	Silvery-white lustrous metals
Purity	≥99%, ≥99.9%, ≥95%(Other purities are also available)
APS	N/A
Ingredient	Ni
Molecular Weight	58.69 g/mol
Melting Point	1453.0 °C
Boiling Point	2732.0 °C
Density	N/A
Product Codes	NCZ-132H

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Applications of Sputtering Targets;

Applications of Sputtering Targets;

Applications of Sputtering Targets;

Applications of Sputtering Targets;

Applications of Sputtering Targets;

Applications of Sputtering Targets;

Nickel Iron Oxide (NiFe2O4) Nanopowder/Nanoparticles

Purity: 98.99%, Size: 25 nm

Applications:

Nano Nickel powder

Nickel Oxide (NiO) Nanopowder/Nanoparticles

High Purity: 99.55+%, Size: 10-40 nm

Technical Properties:

Nickel Oxide (NiO) Nanopowder/Nanoparticles

High Purity: 99.99%, Size: 18 nm, Cubic

Technical Properties:

Applications:

Nickel Oxide (NiO) Nanopowder/Nanoparticles

Purity: 99.5%, Size: 8-18 nm

Technical Properties:

Applications:

Applications of Sputtering Targets;

Applications of Sputtering Targets;

Applications of Sputtering Targets;

Applications of Sputtering Targets;

Applications of Sputtering Targets;

Applications of Sputtering Targets;

Applications of Sputtering Targets;

Applications of Sputtering Targets;

Applications of Sputtering Targets;

Applications of Sputtering Targets;

Applications of Sputtering Targets;

Nickel oxide Nanopowder

Applications:

Nickel Tab with Adhesive Polymer Tape as Negative Terminal for Pouch Cell

Width: 4 mm

Technical Properties:

Applications:

Applications:

Applications:

Nickel Tabs

Width: 3 mm

Technical Properties:

Applications:

Applications:

Nickel Titanium (Ni-Ti) Alloy Nanopowder/Nanoparticles

Size: 55 nm, Ni:Ti/50:50

Technical Properties:

Properties, Storage and Cautions:

Applications:

Nickel Titanium (Ni-Ti) Alloy Nanopowder/Nanoparticles

Size: 55 nm, Ni:Ti/50:50

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Properties, Storage and Cautions:

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