Molybdenum Disulfide (MoS2) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”

$572.00

Product 

Molybdenum Disulfide (MoS2) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.250''

CAS No.

 1317-33-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 160.07 g/mol

Melting Point

 ~1185 °C

Boiling Point

 ~4500 °C

Density

 ~5.06 g/cm³

Product Codes

NCZ-1912K

Molybdenum Disulfide (MoS2) Sputtering Targets, Purity: 99.9%, Size: 6”, Thickness: 0.125”

$1,920.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Molybdenum Disulfide (MoS2) Sputtering Targets, Purity: 99.9%, Size: 6”, Thickness: 0.125”

$2,187.00

Product 

Molybdenum Disulfide (MoS2) Sputtering Targets, Purity: 99.9%, Size: 6'', Thickness: 0.125''

CAS No.

 1317-33-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 160.07 g/mol

Melting Point

 ~1185 °C

Boiling Point

 ~4500 °C

Density

 ~5.06 g/cm³

Product Codes

NCZ-1911K

Molybdenum Disulfide (MoS2) Sputtering Targets, Purity: 99.9%, Size: 6”, Thickness: 0.250”

$745.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Molybdenum Disulfide (MoS2) Sputtering Targets, Purity: 99.9%, Size: 6”, Thickness: 0.250”

$845.00

Product 

Molybdenum Disulfide (MoS2) Sputtering Targets, Purity: 99.9%, Size: 6'', Thickness: 0.250''

CAS No.

 1317-33-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 160.07 g/mol

Melting Point

 ~1185 °C

Boiling Point

 ~4500 °C

Density

 ~5.06 g/cm³

Product Codes

NCZ-1910K

Molybdenum Disulfide (MoS2) Sputtering Targets, Purity: 99.9%, Size: 8”, Thickness: 0.125”

$1,338.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Molybdenum Disulfide (MoS2) Sputtering Targets, Purity: 99.9%, Size: 8”, Thickness: 0.125”

$1,522.00

Product 

Molybdenum Disulfide (MoS2) Sputtering Targets, Purity: 99.9%, Size: 8'', Thickness: 0.125''

CAS No.

 1317-33-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 160.07 g/mol

Melting Point

 ~1185 °C

Boiling Point

 ~4500 °C

Density

 ~5.06 g/cm³

Product Codes

NCZ-1909K

Molybdenum disulfide(MoS2, 98.00%) (223629)

$375.00
Molybdenum disulfide(MoS2, 98.00%) (223629)

Molybdenum disulfide(MoS2) is a black powder that may be used as a solid lubricant.

Grades Large Particle Technical Grade Technical Fine Super Fine
MoS2 % (min) 98.00
Acid Insoluble% (max) 0.50 0.50 0.50 0.50
MoO3% (max) 0.05 0.05 0.10 0.15
SiO2 % (max) 0.10 0.10 0.10 0.10
Iron% (max) 0.25 0.25 0.25 0.25
Water% (max) 0.10 0.10 0.10 0.15
Oil% (max) 0.40 0.40 0.40 0.40
Carbon% (max) 0.50 0.50 0.50 0.50
Acid Number* mg KOH/g 0.5 0.50 0.50 2.0
D50 16-30 μm 12-16 μm 3-6 μm 1-1.5 μm
D99 190 μm 100 μm 36 μm 6 μm

.

* Acid number is determined at the end of production. Prolonged storage will result in an increase in

slight oxidation, which will result in an increase in acid number. The smaller particle size is more

susceptible to surface oxidation.

 
Product Codes- NCZ-2795K

Molybdenum Nanoparticles

$0.00

Molybdenum Nanoparticles

Molybdenum Nanopowder

Nano Molybdenum powder

MF: Mo
Chemical Name: Molybdenum
Purity: > 99.99%
APS: 50 nm (Size Customization possible)
Form: Nanopowder
Product Number: #NCZ4301
CAS Number 7439-98-7
Note: We supply different products of microparticles and Nanoparticles powder in all size range according to client’s requirements.

Molybdenum Nanoparticles/ Mo Nanopowder ( 99.7%, 40~60nm)

Price range: $116.00 through $333.00
Select options This product has multiple variants. The options may be chosen on the product page
$116/25g
$333/100g

Product 

Molybdenum Nanoparticles/ Mo Nanopowder ( 99.7%, 40~60nm)

CAS No.

7439-98-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

40~60nm (microns) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

95.95 g/mol

Melting Point

2623 °C

Boiling Point

4639 °C

Density

10.28 g/cm³

Product Codes

NCZ-1048K

Molybdenum Nanoparticles/ Mo Nanopowder (99.7%, 60~80nm)

Price range: $107.00 through $310.00
Select options This product has multiple variants. The options may be chosen on the product page
$107/25g
$310/100g

Product 

Molybdenum Nanoparticles/ Mo Nanopowder (99.7%, 60~80nm)

CAS No.

7439-98-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

60~80nm (microns) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

95.95 g/mol

Melting Point

~2623°C

Boiling Point

4639 °C

Density

10.28 g/cm³

Product Codes

NCZ-1049K

Molybdenum Oxide (MoO3) Nanopowder/Nanoparticles, High Purity: 99.96+%, Size: 8-75 nm

Price range: $35.00 through $539.00
Select options This product has multiple variants. The options may be chosen on the product page
1 gram/31 € 5 grams/60 €    
25 grams/175 € 100 grams/475 €
 
Please contact us for quotes on larger quantities !!! 

Molybdenum Oxide (MoO3) Nanopowder/Nanoparticles

High Purity: 99.96+%, Size: 8-75 nm

Technical Properties:

Purity (%) 99.96
Color white-light gray
Average Particle Size (nm) 8.0-75.0
Specific Surface Area (m2/g)    >40
Molecular Weight (g/mol) 143.9
Elemental Analysis (%) Fe Ni Cu Cr Co
0.0012 0.0002 0.023 0.0012 0.00006

Applications:

Molybdenum oxide nanoparticles are widely used in catalysis. It is used as catalysts, cracking catalysts, and hydrogenation catalysts. It is a component of the co-catalyst used in the industrial production of acrylonitrile by the oxidation of propane and ammonia. It is also used in glass and ceramics production.  

Molybdenum Oxide (MoO3) Sputtering Target

Price range: $578.00 through $1,056.00
Select options This product has multiple variants. The options may be chosen on the product page

Product 

Molybdenum Oxide (MoO3) Sputtering Target

CAS No.

 1313-27-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

143.94 g/mol

Melting Point

 795–802 °C

Boiling Point

1,155 °C

Density

4.69 – 4.70 g/cm³

Product Codes

NCZ-1375K

Molybdenum Oxide (MoO3) Sputtering Targets, indium, Purity: 99.9%, Size: 2”, Thickness: 0.125”

$607.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Molybdenum Oxide (MoO3) Sputtering Targets, indium, Purity: 99.9%, Size: 2”, Thickness: 0.125”

$688.00

Product 

Molybdenum Oxide (MoO3) Sputtering Targets, indium, Purity: 99.9%, Size: 2'', Thickness: 0.125''

CAS No.

1313-27-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 143.94 g/mol

Melting Point

 ~795°C

Boiling Point

 ~1155°C

Density

 ~4.7 g/cm³

Product Codes

NCZ-1897K

Molybdenum Oxide (MoO3) Sputtering Targets, indium, Purity: 99.9%, Size: 3”, Thickness: 0.125”

$859.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Molybdenum Oxide (MoO3) Sputtering Targets, indium, Purity: 99.9%, Size: 3”, Thickness: 0.125”

$975.00

Product 

Molybdenum Oxide (MoO3) Sputtering Targets, indium, Purity: 99.9%, Size: 3'', Thickness: 0.125''

CAS No.

1313-27-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 143.94 g/mol

Melting Point

 ~795°C

Boiling Point

 ~1155°C

Density

 ~4.7 g/cm³

Product Codes

NCZ-1896K

Molybdenum Oxide (MoO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”

$214.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Molybdenum Oxide (MoO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”

$239.00

Product 

Molybdenum Oxide (MoO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.125''

CAS No.

1313-27-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 143.94 g/mol

Melting Point

 ~795°C

Boiling Point

 ~1155°C

Density

 ~4.7 g/cm³

Product Codes

NCZ-1904K

Molybdenum Oxide (MoO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”

$664.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Molybdenum Oxide (MoO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”

$753.00

Product 

Molybdenum Oxide (MoO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.250''

CAS No.

1313-27-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 143.94 g/mol

Melting Point

 ~795°C

Boiling Point

 ~1155°C

Density

 ~4.7 g/cm³

Product Codes

NCZ-1905K

Molybdenum Oxide (MoO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”

$397.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Molybdenum Oxide (MoO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”

$448.00

Product 

Molybdenum Oxide (MoO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''

CAS No.

1313-27-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 143.94 g/mol

Melting Point

 ~795°C

Boiling Point

 ~1155°C

Density

 ~4.7 g/cm³

Product Codes

NCZ-1903K

Molybdenum Oxide (MoO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”

$378.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Molybdenum Oxide (MoO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”

$426.00

Product 

Molybdenum Oxide (MoO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.250''

CAS No.

1313-27-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 143.94 g/mol

Melting Point

 ~795°C

Boiling Point

 ~1155°C

Density

 ~4.7 g/cm³

Product Codes

NCZ-1902K

Molybdenum Oxide (MoO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”

$409.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

Molybdenum Oxide (MoO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”

$462.00

Product 

Molybdenum Oxide (MoO3) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.125''

CAS No.

1313-27-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 143.94 g/mol

Melting Point

 ~795°C

Boiling Point

 ~1155°C

Density

 ~4.7 g/cm³

Product Codes

NCZ-1901K

Molybdenum Oxide (MoO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”

$426.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The composition of the target material can be assessed and even minuscule levels of impurities can be identified with the aid of the sputtering target.

Applications to sputtering targets in space are also possible. Sputtering is one kind of space weathering that modifies the chemical and physical properties of airless worlds such as asteroids and the Moon.

Molybdenum Oxide (MoO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”

$481.00

Product 

Molybdenum Oxide (MoO3) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.250''

CAS No.

1313-27-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 143.94 g/mol

Melting Point

 ~795°C

Boiling Point

 ~1155°C

Density

 ~4.7 g/cm³

Product Codes

NCZ-1900K

Molybdenum Oxide (MoO3) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”

$475.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Molybdenum Oxide (MoO3) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”

$537.00

Product 

Molybdenum Oxide (MoO3) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.125''

CAS No.

1313-27-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 143.94 g/mol

Melting Point

 ~795°C

Boiling Point

 ~1155°C

Density

 ~4.7 g/cm³

Product Codes

NCZ-1899K

Molybdenum Oxide (MoO3) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”

$486.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Molybdenum Oxide (MoO3) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”

$549.00

Product 

Molybdenum Oxide (MoO3) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.250''

CAS No.

1313-27-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 143.94 g/mol

Melting Point

 ~795°C

Boiling Point

 ~1155°C

Density

 ~4.7 g/cm³

Product Codes

NCZ-1898K

Molybdenum Oxide Nanoparticles

$0.00

Molybdenum Oxide Nanoparticles

MF: MoO3, MoO2
Chemical Name: Molybdenum Oxide
Purity: >99.99%
APS: 50 nm (Size Customization possible)
Form: Nanopowder
Product Number: #NCZ4401
CAS Number 1313-27-5
Note: We supply different products of microparticles and Nanoparticles powder in all sizes range according to the client’s requirements.

Molybdenum Oxide Nanoparticles/ Nanopowder ( MoO3, 99.5%, 100nm)

Price range: $81.00 through $253.00
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$81/5g
$253/25g

Product 

Molybdenum Oxide Nanoparticles/ Nanopowder ( MoO3, 99.5%, 100nm)

CAS No.

1313-27-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

100nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

143.94 g/mol

Melting Point

 ~795 °C

Boiling Point

~1,155 °C (sublimes)

Density

~4.69 g/cm³

Product Codes

NCZ-1155K

Molybdenum Pentachloride Powder ( MoCl5, 99%)

Price range: $345.00 through $695.00
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$345/500g
$695/1kg

Product 

Molybdenum Pentachloride Powder ( MoCl5, 99%)

CAS No.

10241-05-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

1–10 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

273.2 g/mol

Melting Point

~190 °C

Boiling Point

~268–270 °C

Density

~2.70 g/cm³

Product Codes

NCZ-1156K

Molybdenum Powder

Product Molybdenum Powder
CAS No. 7439-98-7
Appearance Gray to black metallic powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1–10 µm (Size Can be customized),  Ask for other available size range.
Ingredient Mo
Molecular Weight N/A
Melting Point 2623°C
Boiling Point 4639°C
Density 10.2 g/cm³
Product Codes NCZ-164M
 

Molybdenum Powder ( 500~800nm, 99.9%)

Price range: $190.00 through $434.00
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$190/100g
$305/500g
$434/1000g

Product 

Molybdenum Powder ( 500~800nm, 99.9%)

CAS No.

7439-98-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

500~800nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

95.95 g/mol

Melting Point

~2623°C

Boiling Point

4639 °C

Density

10.28 g/cm³

Product Codes

NCZ-1050K

Molybdenum Sputtering Target Mo

Price range: $126.00 through $265.00
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Product Molybdenum Sputtering Target Mo
CAS No. N/A
Appearance Grey, Metallic
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Mo
Molecular Weight 95.96 g/mol
Melting Point 2,617 °C
Boiling Point N/A
Density N/A
Product Codes NCZ-129H
 

Molybdenum Titanium Aluminum Carbide (Mo2Ti2AlC3) MAX Phase Micron-Powder, 5g

$506.00
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Product Molybdenum Titanium Aluminum Carbide (Mo2Ti2AlC3) MAX Phase Micron-Powder, 5g
CAS No. 7783-40-6
Appearance Gray to black fine
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1 – 5µm (Size Can be customized),  Ask for other available size range.
Ingredient Mo2Ti2AlC3
Molecular Weight 408.49 g/mol
Melting Point 1400 °C
Boiling Point N/A
Density 5.0–6.0 g/cm³
Product Codes NCZ-452I
 

Molybdenum Titanium Aluminum Carbide (Mo2TiAlC2) MAX Phase Micron-Powder, 5g

$473.00
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Product Molybdenum Titanium Aluminum Carbide (Mo2TiAlC2) MAX Phase Micron-Powder, 5g
CAS No. 7783-40-6
Appearance Gray to black fine
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1 – 5µm (Size Can be customized),  Ask for other available size range.
Ingredient Mo2Ti2AlC3
Molecular Weight 347.69 g/mol
Melting Point 1400 °C
Boiling Point N/A
Density 5.0–6.0 g/cm³
Product Codes NCZ-453I

Monoclinic Zirconium Oxide (Zirconia) ZrO2 Nanoparticles, 20nm to 40nm, >99.9% High Purity

Price range: $198.00 through $2,185.00
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Product Monoclinic Zirconium Oxide (Zirconia) ZrO2 Nanoparticles, 20nm to 40nm, >99.9% High Purity
CAS No. N/A
Appearance White
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 20–40nm (Size Can be customized),  Ask for other available size range.
Ingredient ZrO2
Molecular Weight 123.22 g/mol
Melting Point 2,715 °C
Boiling Point N/A
Density 5.68 g/cm³
Product Codes NCZ-454I
 

Monoclinic Zirconium Oxide (Zirconia) ZrO2 Nanoparticles, 50nm to 80nm, >99.9% High Purity

Price range: $198.00 through $2,185.00
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Product Monoclinic Zirconium Oxide (Zirconia) ZrO2 Nanoparticles, 50nm to 80nm, >99.9% High Purity
CAS No. 1314-23-4
Appearance White or off-white
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 50–80nm (Size Can be customized),  Ask for other available size range.
Ingredient ZrO2
Molecular Weight 123.22 g/mol
Melting Point 2,715 °C
Boiling Point N/A
Density 5.68 g/cm³
Product Codes NCZ-455I

Monocrystalline Silicon Nanoflakes (Si, 97%, <1um)

Price range: $190.00 through $815.00
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$190/100 g
$815/500g

Product 

 Monocrystalline Silicon Nanoflakes (Si, 97%, <1um)

CAS No.

7440-21-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

<1um (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

28.0855 g/mol

Melting Point

1,414 °C

Boiling Point

3,265 °C

Density

~2.33 g/cm³

Product Codes

NCZ-1069K

Monocrystalline Silicon Nanoparticles/ Nanopowder (Si, 99% 1um)

Price range: $190.00 through $815.00
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$190/100g
$815/500g

Product 

Monocrystalline Silicon Nanoparticles/ Nanopowder (Si, 99% 1um)

CAS No.

7440-21-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

1um(Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

28.0855 g/mol

Melting Point

1,414 °C

Boiling Point

3,265 °C

Density

~2.33 g/cm³

Product Codes

NCZ-1067K

Monodisperse Mesoporous Silica Nanosphere (MSN) Stellate, 80 nm

Price range: $259.00 through $517.00
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Product Monodisperse Mesoporous Silica Nanosphere (MSN) Stellate, 80 nm
CAS No. 7631-86-9
Appearance White or off-white
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 80nm (Size Can be customized),  Ask for other available size range.
Ingredient SiO₂·xH₂O
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 0.2 – 0.4 g/cm³
Product Codes NCZ-456I
 

Monolayer Graphene on SiO2/Si Substrate, Size: 2″

Price range: $269.00 through $1,094.00
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1 piece/ 269 €    5 pieces/ 1094 €   Contact us for tailored quotes on larger quantities & experience exceptional solutions from our

Monolayer Graphene on SiO2/Si Substrate, Size: 2″

Price range: $277.00 through $1,126.00
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Applications:

Graphene research; Supercapacitors; Catalyst; Solar energy; Graphene optoelectronics, plasmonics and nanophotonics; Graphene semiconductor chips; Conductive graphene film; Graphene computer memory; Biomaterials and Bioelectronics

Monolayer Graphene on SiO2/Si Substrate, Size: 3″

Price range: $324.00 through $1,369.00
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Applications

Graphene research; Supercapacitors; Catalyst; Solar energy; Graphene optoelectronics, plasmonics and nanophotonics; Graphene semiconductor chips; Conductive graphene film; Graphene computer memory; Biomaterials and Bioelectronics.

Monolayer Graphene on SiO2/Si Substrate, Size: 3″

Price range: $333.00 through $1,409.00
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Applications:

Graphene research; Supercapacitors; Catalyst; Solar energy; Graphene optoelectronics, plasmonics and nanophotonics; Graphene semiconductor chips; Conductive graphene film; Graphene computer memory; Biomaterials and Bioelectronics.

Monolayer Graphene on SiO2/Si Substrate, Size: 4″

Price range: $423.00 through $1,864.00
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Applications

Graphene research; Supercapacitors; Catalyst; Solar energy; Graphene optoelectronics, plasmonics and nanophotonics; Graphene semiconductor chips; Conductive graphene film; Graphene computer memory; Biomaterials and Bioelectronics.

Monolayer Graphene on SiO2/Si Substrate, Size: 4″

Price range: $435.00 through $1,918.00
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Applications:

Graphene research; Supercapacitors; Catalyst; Solar energy; Graphene optoelectronics, plasmonics and nanophotonics; Graphene semiconductor chips; Conductive graphene film; Graphene computer memory; Biomaterials and Bioelectronics.

Monolayer Molybdenum Disulfide (MoS2) Nanopowder, Nano Flakes

Price range: $506.00 through $1,089.00
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Product Monolayer Molybdenum Disulfide (MoS2) Nanopowder, Nano Flakes
CAS No. 1317-33-5
Appearance Black to dark gray
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 100nm (Size Can be customized),  Ask for other available size range.
Ingredient MoS2
Molecular Weight 160.07 g/mol
Melting Point N/A
Boiling Point N/A
Density 5.06 g/cm³
Product Codes NCZ-457I

Monolayer Molybdenum Disulfide (MoS2) Powder, Micron-Size Flakes

Price range: $374.00 through $616.00
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Product Monolayer Molybdenum Disulfide (MoS2) Powder, Micron-Size Flakes
CAS No. 1317-33-5
Appearance Black to dark gray
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1–5μm (Size Can be customized),  Ask for other available size range.
Ingredient MoS2
Molecular Weight 160.07 g/mol
Melting Point N/A
Boiling Point N/A
Density 5.06 g/cm³
Product Codes NCZ-458I
 

Monolayer Molybdenum Disulfide (MoS2) Quantum Dots Nano Powder

Price range: $561.00 through $1,287.00
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Product Monolayer Molybdenum Disulfide (MoS2) Quantum Dots Nano Powder
CAS No. 1317-33-5
Appearance Light gray to yellow-green
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 10nm ( (Size Can be customized),  Ask for other available size range.
Ingredient MoS2
Molecular Weight 160.07 g/mol
Melting Point N/A
Boiling Point N/A
Density 5.06 g/cm³
Product Codes NCZ-459I
 

Multi Walled Carbon Nanotubes Ethanol Dispersion, 3 wt%, Purity: > 95%, OD: 18-28 nm, Length: 8-28 µm

Price range: $275.00 through $1,323.00
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15 ml/250 € 30 ml/416 € 60 ml/720 € 120 ml/1200 €    
Please contact us for quotes on larger quantities !!!

Multi Walled Carbon Nanotubes Ethanol Dispersion

3 wt%, Purity: > 95+ %, OD: 18-28 nm, Length: 8-28 µm

Technical Properties:

Purity > 95+ wt%
Color black
Average Outside Diameter (nm) 18-28
Average Inside Diameter (nm) 5.0-10.0
Length (µm) 8-28
Tap Density (g/cm3) 0.30
True Density (g/cm3) 2.4
Specific Surface Area (m2/g) 120
Ash < 1.5 wt%
Electrical Conductivity (S/cm) > 98
Manufacturing Method CVD

Applications:

MWCNTs have a variety of potential applications in different fields. These applications include medicine, mechanical, electric, chemical, energy and others. It can be applied in, 1-drug delivery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium batteries, 8-gas-discharge tubes, 9-flat panel display, 10-supercapacitor, 11-transistors, 12-solar cells, 13-photoluminescence, 14-template

Multi Walled Carbon Nanotubes Ethanol Dispersion, 3 wt%, Purity: > 95%, OD: 18-28 nm, Length: 8-28 µm

Price range: $312.00 through $1,500.00
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Multi Walled Carbon Nanotubes Ethanol Dispersion 3 wt%, Purity: > 95+ %, OD: 18-28 nm, Length: 8-28 µm Technical Properties: Purity

Multi Walled Carbon Nanotubes Ethanol Dispersion, 3 wt%, Purity: > 95%, OD: 18-28 nm, Length: 8-28 µm

Price range: $295.00 through $1,425.00
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Applications:

MWCNTs have numerous potential uses in various industries. Medical, mechanical, electric, chemical, energy, and other uses are among these. It can be used in the delivery of one medication, biosensors, CNT composites, catalysts, nanoprobes, hydrogen storage, nanomaterials for catalysis, eight gas discharge tubes, seven lithium batteries, nine-panel flat display, 11 transistors, 10 supercapacitors, twelve solar cells Photoluminescence 13 and template 14

Multi Walled Carbon Nanotubes Ethanol Dispersion, 4 wt%, Purity: > 96 %, OD: 45-75 nm,Length 8-28 µm

Price range: $277.00 through $1,268.00
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15 ml/252 € 30 ml/420 €  60 ml/720 € 120 ml/1150 €  
Please contact us for quotes on larger quantities !!!

Multi Walled Carbon Nanotubes Ethanol Dispersion

4 wt%, Purity: > 96+ %, OD: 45-75 nm, Length 8-28 µm

Technical Properties:

Purity > 96+ %
Color black
Average Outside Diameter (nm) 45-75
Average Inside Diameter (nm) 5.0-10.0
Length (μm) 8-28
Tap Density (g/cm3) 0.30
True Density (g/cm3) 2.4
Specific Surface Area (m2/g) 50
Ash < 1.5 wt%
Electrical Conductivity (S/cm) > 98
Manufacturing Method CVD

Applications:

MWCNTs have a variety of potential applications in different fields. These applications include midicine, mechanical, electric, chemical, energy and others. It can be applied in, 1-drug dilevery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium battaries, 8-gas-discharge tubes, 9-flat panel display, 10-supercapacitor, 11-transistors, 12-solar cells, 13-photoluminescence, 14-template  

Multi Walled Carbon Nanotubes Ethanol Dispersion, 4 wt%, Purity: > 96 %, OD: 45-75 nm,Length 8-28 µm

Price range: $278.00 through $1,265.00
Select options This product has multiple variants. The options may be chosen on the product page
Multi Walled Carbon Nanotubes Ethanol Dispersion 4 wt%, Purity: > 96+ %, OD: 45-75 nm, Length 8-28 µm Technical Properties: Purity