Chloro(norbornadiene)rhodium (II) dimer

Price range: $224.00 through $1,095.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Chloro(norbornadiene)rhodium (II) dimer
CAS No. 12108-74-8
Appearance Red crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient C₁₂H₁₂Cl₂Rh₂
Molecular Weight 461.0 g/mol
Melting Point N/A
Boiling Point N/A
Density 1.5 to 1.6 g/cm³
Product Codes NCZ-214R
 

Chloro(triphenylphosphine)gold (I)

Price range: $127.00 through $636.00
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Product Chloro(triphenylphosphine)gold (I)
CAS No. 12244-57-4
Appearance White to pale yellow crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient C₁₈H₁₅AuClP
Molecular Weight 539.7 g/mol
Melting Point 190–195 °C
Boiling Point N/A
Density 2.38 g/cm³
Product Codes NCZ-216R
 

Chlorocarbonylbis(triphenylphosphine)rhodium (I)

Price range: $116.00 through $585.00
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Product Chlorocarbonylbis(triphenylphosphine)rhodium (I)
CAS No. 14610-29-8
Appearance Yellow to orange crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient C₃₇H₃₀ClORhP₂
Molecular Weight 660.3 g/mol
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-210R
 

Chlorohydridotris(triphenylphosphine)ruthenium (II)

Price range: $95.00 through $483.00
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Product Chlorohydridotris(triphenylphosphine)ruthenium (II)
CAS No. 14691-86-0
Appearance Dark red to brown crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient C₅₇H₄₇ClPRu
Molecular Weight 700.2 g/mol
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-213R

Chlorotris(triphenylphosphine)cobalt (I)

Price range: $52.00 through $279.00
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Product Chlorotris(triphenylphosphine)cobalt (I)
CAS No. 15505-86-9
Appearance Dark red to brown crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient C₅₄H₄₅ClCoP₃
Molecular Weight 915.3 g/mol
Melting Point N/A
Boiling Point N/A
Density 1.3 – 1.4 g/cm³
Product Codes NCZ-215R

Chlorotris(triphenylphosphine)copper (I)

Price range: $113.00 through $568.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Chlorotris(triphenylphosphine)copper (I)
CAS No. 14925-96-3
Appearance White to off-white crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient C₅₄H₄₅ClCuP₃
Molecular Weight N/A
Melting Point 240–245 °C
Boiling Point N/A
Density 1.32 – 1.38 g/cm³
Product Codes NCZ-217R

CHOOSE OPTIONS COMPARE QUICK VIEW Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”

$1,006.00

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs  in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

CHOOSE OPTIONS COMPARE QUICK VIEW Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”

$303.00
but allow experts a large degree of control over the growth and microstructure of the area.

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Chrominum ACAC

Price range: $16.00 through $36.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Chrominum ACAC
CAS No. 21679-31-2
Appearance Deep maroon to purple crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Cr(C₅H₇O₂)₃
Molecular Weight 349.32 g/mol
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-263R

Chromium (Cr) Micron Powder, Purity: 99.9 %, Size: 100 mesh

Price range: $15.00 through $260.00
Select options This product has multiple variants. The options may be chosen on the product page
25 grams/14 €  100 grams/48 €   500 grams/156 €  1000 grams/230 €  Please contact us for quotes on larger quantities !!!

Chromium (Cr) Micron Powder

Purity: 99.9 %, Size: 100 mesh

Technical Properties:

PURITY

99.9 %

PARTICLE SIZE

100 Mesh

CAS

7440-47-3

DENSITY

7.19 g/cm³

BOILING POINT

2475 °C

MELTING POINT

1875 °C

COEFF. OF EXPANSION @ 20ºC

6.2 x 10 ⁻⁶

MOHS HARDNESS @ 20ºC

9

ELECTRIC RESISTIVITY

12.9 microhm-cm

CRYSTAL STRUCTURE

Cubic, Body Centered

FORM  

Powder

APPLICATIONS

Alloys, Catalyst, Customer Manufacturing, Industrial- general

              
                   

Chromium (Cr) Micron Powder, Purity: 99.98 %, Size: 10 µm

Price range: $27.00 through $266.00
Select options This product has multiple variants. The options may be chosen on the product page
25 grams/24 €  100 grams/54 €   500 grams/165 €  1000 grams/235 €  Please contact us for quotes on larger quantities !!!

Chromium (Cr) Micron Powder

Purity: 99.98 %, Size: 10 µm

Technical Properties:

PURITY

99.98 %

PARTICLE SIZE

10 µm

CAS

7440-47-3

DENSITY

7.19 g/cm³

BOILING POINT

2475 °C

MELTING POINT

1875 °C

COEFF. OF EXPANSION @ 20ºC

6.2 x 10 ⁻⁶

MOHS HARDNESS @ 20ºC

9

ELECTRIC RESISTIVITY

12.9 microhm-cm

CRYSTAL STRUCTURE

Cubic, Body Centered

FORM  

Powder

APPLICATIONS

Aerospace, Alloys, Nuclear, Plasma Spray

                               
                
                   

Chromium (Cr) Micron Powder, Purity: 99.99 %, Size: 325 mesh

Price range: $32.00 through $322.00
Select options This product has multiple variants. The options may be chosen on the product page
25 grams/29 €  100 grams/67 €  500 grams/174 €  1000 grams/285 €  Please contact us for quotes on larger quantities !!!

Chromium (Cr) Micron Powder

Purity: 99.99 %, Size: 325 mesh

Technical Properties:

PURITY

99.99 %

PARTICLE SIZE

325 mesh

CAS

7440-47-3

DENSITY

7.19 g/cm³

BOILING POINT

2475 °C

MELTING POINT

1875 °C

COEFF. OF EXPANSION @ 20ºC

6.2 x 10 ⁻⁶

MOHS HARDNESS @ 20ºC

9

ELECTRIC RESISTIVITY

12.9 microhm-cm

CRYSTAL STRUCTURE

Cubic, Body Centered

FORM  

Powder

APPLICATIONS

Aerospace, Alloys, Ceramics, Electronics, Nuclear

 
       
                 

Chromium (Cr) Nanopowder/Nanoparticles, Purity: 99.95 %, Size: 100 nm, Metal Basis

Price range: $224.00 through $4,573.00
Select options This product has multiple variants. The options may be chosen on the product page
25 grams/198 €                        
100 grams/540 €                     
500 grams/2150 €                    
1000 grams/4030 € Please contact us for quotes on larger quantities !!!

Chromium (Cr) Nanopowder/Nanoparticles

Purity: 99.95 %, Size: 100 nm, Metal Basis

Chromium is a chemical element with symbol Cr and atomic number 24. It is the first element in group 6. It is a steely-grey, lustrous, hard and brittle metal which takes a high polish, resists tarnishing, and has a high melting point. Chromium is an element which is very useful and used in many different areas. There are too many different application areas where Chromium Nanoparticles/Nanopowder can be used like in metallurgy, metal ceramics, in diamond tool manufacturing. Also for Chromium plating Chromium Nanoparticles/Nanopowder are very useful and they give a shiny effect to the surface and also protect it. Nanopowder/Nanoparticle Chromium is a very hard metal. Therefore, in nanopowder/nanoparticle form, Chromium can be widely used in applications where mechanical strength is required. Chromium Nanoparticles/Nanopowder are used in ceramics, cutting and shaping tools and steel industry. In addition, Chromium Nanopowders/Nanoparticle are widely used as a catalyst.

Chromium (Cr) Nanopowder/Nanoparticles, Purity: 99.95 %, Size: 100 nm, Metal Basis

Price range: $224.00 through $4,574.00
Select options This product has multiple variants. The options may be chosen on the product page

Chromium (Cr) Nanopowder/Nanoparticles

Purity: 99.95 %, Size: 100 nm, Metal Basis

Chromium is a chemical element with symbol Cr and atomic number 24. It is the first element in group 6. It is a steely-grey, lustrous, hard and brittle metal which takes a high polish, resists tarnishing, and has a high melting point. Chromium is an element which is very useful and used in many different areas. There are too many different application areas where Chromium Nanoparticles/Nanopowder can be used like in metallurgy, metal ceramics, in diamond tool manufacturing. Also for Chromium plating Chromium Nanoparticles/Nanopowder are very useful and they give a shiny effect to the surface and also protect it. Nanopowder/Nanoparticle Chromium is a very hard metal. Therefore, in nanopowder/nanoparticle form, Chromium can be widely used in applications where mechanical strength is required. Chromium Nanoparticles/Nanopowder are used in ceramics, cutting and shaping tools and steel industry. In addition, Chromium Nanopowders/Nanoparticle are widely used as a catalyst.

Chromium (Cr) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 30-40 nm, Metal Basis

Price range: $208.00 through $539.00
Select options This product has multiple variants. The options may be chosen on the product page

Chromium (Cr) Nanopowder/Nanoparticles

Purity: 99.95%, Size: 30-40 nm, Metal Basis

Technical Properties:

Bulk Density (g/cm3) 0,15
True Density (g/cm3) 8,9
Color black
Average Particle Size (nm) 30-40
Specific Surface Area (m2/g) 10,0-40,0
Elemental Analysis Cr Fe Al Si Others
99.9 0.05 0.02 0.01 ≤0.01

Properties, Storage and Cautions:

Chromium nanopowder is highly reactive and flammable, therefore it should be handled with care and rapid moves, vibrations should be avoided. Powder should be kept away from sunlight, any kind of heating, moisture and impacts. Coagulation of the particles is a serious problem, so, Cr powder should be sealed under vacuum and should be kept in cool and dry conditions. Air contact should be avoided.

Applications:

Chromium is a very hard metal. Therefore, in nanopowder form,  it can be widely used in applications where mechanical strength is required. It can be used in ceramics, cutting and shaping tools and steel industry

Chromium (Cr) Sputtering Target

Price range: $81.00 through $405.00
Select options This product has multiple variants. The options may be chosen on the product page

Product 

Chromium (Cr) Sputtering Target

CAS No.

7440-47-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

51.996 g/mol

Melting Point

1,907 °C

Boiling Point

2,671 °C

Density

7.19 g/cm³

Product Codes

NCZ-1287K

Chromium (Cr) Sputtering Targets, indium, Purity: 99.95%, Size: 3”, Thickness: 0.125”

$750.00

Product 

Chromium (Cr) Sputtering Targets, indium, Purity: 99.95%, Size: 3'', Thickness: 0.125''

CAS No.

7440‑47‑3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 52.00 g/mol

Melting Point

 1,857 °C

Boiling Point

 2,672 °C

Density

 7.14 g/cm³

Product Codes

NCZ-2307K

Chromium (Cr) Sputtering Targets, indium, Purity: 99.95%, Size: 3”, Thickness: 0.125”

$649.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Silvery, shiny, hard, and brittle, chromium is a metal that resists corrosion and has a high mirror polish. Chromium sputtering targets are widely used in the automotive sector. Chromium sputtering targets work well as a shiny coating for bumpers and wheels. Chromium sputtering targets can be employed in a variety of vacuum applications, such as automotive glass coatings.

Because of its strong resistance to corrosion, chromium sputtering targets are a good choice for producing coatings that are resistant to corrosion. Hard material coatings made from chromium sputtering targets are used in industry to best protect engine parts like piston rings from premature wear and so increase the useful life of critical engine components.

Additionally, the production of batteries and solar cells uses chromium sputtering targets. In conclusion, chromium sputtering targets are employed in a variety of technologies for the physical deposition of thin films and functional coatings (the PVD method), in the manufacturing of electronic components, displays, and tools; in the vacuum chroming of watches, parts of household appliances, and the working surfaces of

Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.125”

$226.00

Product 

Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 3'', Thickness: 0.125''

CAS No.

7440‑47‑3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 51.9961 g/mol

Melting Point

 1,857 °C

Boiling Point

 2,672 °C

Density

 7.14 g/cm³

Product Codes

NCZ-2314K

Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.125”

$199.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Silvery, shiny, hard, and brittle, chromium is a metal that resists corrosion and has a high mirror polish. The automotive industry finds extensive use for chromium sputtering targets. Chromium sputtering targets work well as a shiny coating for bumpers and wheels. Chromium sputtering targets can be employed in a variety of vacuum applications, such as automotive glass coatings.

Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.125”

$423.00

Product 

Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 4'', Thickness: 0.125''

CAS No.

7440‑47‑3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 51.9961 g/mol

Melting Point

 1,857 °C

Boiling Point

 2,672 °C

Density

 7.14 g/cm³

Product Codes

NCZ-2313K

Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.125”

$368.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. W

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Silvery, shiny, hard, and brittle, chromium is a metal that resists corrosion and has a high mirror polish. The automotive industry finds extensive use for chromium sputtering targets. Chromium sputtering targets work well as a shiny coating for bumpers and wheels. Chromium sputtering targets can be employed in a variety of vacuum applications, such as automotive glass coatings.

hen selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.250”

$488.00

Product 

Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 4'', Thickness: 0.250''

CAS No.

7440‑47‑3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 51.9961 g/mol

Melting Point

 1,857 °C

Boiling Point

 2,672 °C

Density

 7.14 g/cm³

Product Codes

NCZ-2312K

Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.250”

$424.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Silvery, shiny, hard, and brittle, chromium is a metal that resists corrosion and has a high mirror polish. The automotive industry finds extensive use for chromium sputtering targets. Chromium sputtering targets work well as a shiny coating for bumpers and wheels. Chromium sputtering targets can be employed in a variety of vacuum applications, such as automotive glass coatings.