Manganese (Mn) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.250”

$592.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Manganese (Mn) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.125”

$910.00

Product 

Manganese (Mn) Sputtering Targets, Purity: 99.95%, Size: 3'', Thickness: 0.125''

CAS No.

 7439-96-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

54.93804 g/mol

Melting Point

 1,246 °C

Boiling Point

 2,061 °C

Density

 7.21 g/cm³

Product Codes

NCZ-1950K

Manganese (Mn) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.125”

$802.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Manganese (Mn) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.250”

$1,015.00

Product 

Manganese (Mn) Sputtering Targets, Purity: 99.95%, Size: 3'', Thickness: 0.250''

CAS No.

 7439-96-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

54.93804 g/mol

Melting Point

 1,246 °C

Boiling Point

 2,061 °C

Density

 7.21 g/cm³

Product Codes

NCZ-1949K

Manganese (Mn) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.250”

$894.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Manganese (Mn) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.125”

$537.00

Product 

Manganese (Mn) Sputtering Targets, Purity: 99.95%, Size: 4'', Thickness: 0.125''

CAS No.

 7439-96-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

54.93804 g/mol

Melting Point

 1,246 °C

Boiling Point

 2,061 °C

Density

 7.21 g/cm³

Product Codes

NCZ-1948K

Manganese (Mn) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.125”

$475.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Manganese (Mn) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.250”

$537.00

Product 

Manganese (Mn) Sputtering Targets, Purity: 99.95%, Size: 4'', Thickness: 0.250''

CAS No.

 7439-96-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

54.93804 g/mol

Melting Point

 1,246 °C

Boiling Point

 2,061 °C

Density

 7.21 g/cm³

Product Codes

NCZ-1947K

Manganese (Mn) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.250”

$475.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Manganese (Mn) Sputtering Targets, Purity: 99.95%, Size: 6”, Thickness: 0.250”

$577.00

Product 

Manganese (Mn) Sputtering Targets, Purity: 99.95%, Size: 6'', Thickness: 0.250''

CAS No.

 7439-96-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

54.93804 g/mol

Melting Point

 1,246 °C

Boiling Point

 2,061 °C

Density

 7.21 g/cm³

Product Codes

NCZ-1946K

Manganese (Mn) Sputtering Targets, Purity: 99.95%, Size: 6”, Thickness: 0.250”

$510.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Manganese (Mn) Sputtering Targets, Purity: 99.95%, Size: 8”, Thickness: 0.250”

$625.00

Product 

Manganese (Mn) Sputtering Targets, Purity: 99.95%, Size: 8'', Thickness: 0.250''

CAS No.

 7439-96-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

54.93804 g/mol

Melting Point

 1,246 °C

Boiling Point

 2,061 °C

Density

 7.21 g/cm³

Product Codes

NCZ-1945K

Manganese ACAC

Price range: $16.00 through $36.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Manganese ACAC
CAS No. N/A
Appearance Tan or light brown
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient C₁₀H₁₄MnO₄
Molecular Weight N/A
Melting Point 248–250 °C
Boiling Point N/A
Density 1.6 g/cm³
Product Codes NCZ-285R

Manganese Chloride Powder ( MnCl2, 99%, 5um)

Price range: $63.00 through $134.00
Select options This product has multiple variants. The options may be chosen on the product page
$63/25g
134/100g

Product 

Manganese Chloride Powder ( MnCl2, 99%, 5um)

CAS No.

7773-01-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

5um (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

125.84 g/mol

Melting Point

~650 °C

Boiling Point

~1,193 °C

Density

~2.98 g/cm³

Product Codes

NCZ-1154K

Manganese Iron Oxide (MnFe2O4) Nanopowder/Nanoparticles, Purity: 98.95%, Size: 55 nm

Price range: $29.00 through $121.00
Select options This product has multiple variants. The options may be chosen on the product page
5 grams/26 € 25 grams/51 € 100 grams/107 €
Please contact us for quotes on larger quantities !!!

Manganese Iron Oxide (MnFe2O4) Nanopowder/Nanoparticles

Purity: 98.95%, Size: 55 nm

Technical Properties:

Purity (%) 98.5
Average Particle Size (nm) 55
Morphology spherical

Applications:

Manganese iron oxide nanoparticle is used as a catalyst to reduce volatile organic compounds level in air emissions. It can reduce volatile compounds to part per billion concentrations.

Manganese Oxide (Mn2O3) Nanopowder/Nanoparticles, Purity: 99.4%, Size: 28 nm

Price range: $42.00 through $351.00
Select options This product has multiple variants. The options may be chosen on the product page
5 grams/37 € 25 grams/58 € 100 grams/126 € 500 grams/309 €                       
Please contact us for quotes on larger quantities !!!

Manganese Oxide (Mn2O3) Nanopowder/Nanoparticles

Purity: 99.4%, Size: 28 nm

Technical Properties:

Purity (%) 99.4
Color brown
Average Particle Size (nm) 28
Specific Surface Area (m2/g)    >155
Bulk Density (g/cm3) 0,4
Morphology spherical

Applications:

Manganese oxide nanoparticles can be applied for magnetic data storage and magnetic resonance imaging. It can be used in biosensors and in bioscience applications. It is also used in coatings, plastics, nanowires, nanofibers, and textiles.  

Manganese Oxide Micronpowder ( MnO2, 99%, ~5um)

Price range: $61.00 through $183.00
Select options This product has multiple variants. The options may be chosen on the product page
$61/100g
$113/500g
$183/1kg

Product 

Manganese Oxide Micronpowder ( MnO2, 99%, ~5um)

CAS No.

  1313-13-9

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

~5um (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 86.94 g/mol

Melting Point

Decomposes at ~535 °C (releases O₂)

Boiling Point

N/A

Density

 ~5.03 g/cm³

Product Codes

NCZ-1153K

Manganese Sputtering Target Mn

Price range: $303.00 through $1,025.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Manganese Sputtering Target Mn
CAS No. N/A
Appearance Silvery Metallic
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Mn
Molecular Weight N/A
Melting Point 1,244 °C
Boiling Point N/A
Density 7.2 g/cm³
Product Codes NCZ-128H

Meshed Lithium Air CR2032 Coin Cell Case with 304SS, Diameter: 20 mm, Height: 3.2 mm

Price range: $495.00 through $1,571.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Meshed Lithium Air CR2032 Coin Cell Case with 304SS is widely used for developing Zinc/Lithium Air battery.

Mesocarbon Microbeads (MCMB) Graphite Micron Powder for Lithium Ion Battery

Price range: $190.00 through $334.00
Select options This product has multiple variants. The options may be chosen on the product page
500 grams/168 € 1000 grams/295 €
Please contact us for quotes on larger quantities !!!

Mesocarbon Microbeads (MCMB) Graphite Micron Powder for Lithium Ion Battery

SSA: 1.539 m2/g, Black Powder

MCMB (mesocarbon microbeads) synthetic graphite is prepared from petroleum pitch or coal tar. MCMB is one of the promising carbon anode materials for Li-ion batteries. MCMB has high specific capacity and a spherical structure, which is benefitial for high packing density of the anode. The low surface area of MCMB can minimize the unfavorable side reactions during the charge-discharge process. We offer Mesocarbon Microbeads(MCMB) Graphite Micron Powder for Lithium Ion Battery with low prices.

Technical Properties:

Appearance of MCMB Black Powder
Linear Formula C
CAS Number of MCMB 7782-42-5
Packed Container sealed in Al vacuumed bag
 
 D10  µm  7.195
 D50  µm  11.440
 D90  µm  18.000
 Moisture  %  0.025
 Tap  G/cm3  1.215
 SSA  M2/g  1.539
 C%  %  99.945
 Capacity  mAh/g  332.66
 Efficiency  %  92.48

Mesocarbon Microbeads (MCMB) Graphite Micron Powder for Lithium Ion Battery

Price range: $210.00 through $369.00
Select options This product has multiple variants. The options may be chosen on the product page
500 grams/210 € 1000 grams/369 € Please contact us for quotes on larger quantities !!! Mesocarbon Microbeads (MCMB) Graphite Micron Powder for Lithium

Mesocarbon Microbeads (MCMB) Graphite Micron Powder for Lithium Ion Battery

Price range: $210.00 through $369.00
Select options This product has multiple variants. The options may be chosen on the product page
500 grams/210 € 1000 grams/369 € Please contact us for quotes on larger quantities !!! Mesocarbon Microbeads (MCMB) Graphite Micron Powder for Lithium

Mesophase pitch(Naphthalene, as impregnant or binder) (068610)

$885.00
Select options This product has multiple variants. The options may be chosen on the product page
Mesophase pitch(Naphthalene, as impregnant or binder) (068610)
Mesophase pitch, a liquid crystal state pitch prepared from naphthalene, exhibits many outstanding properties, such as high strength, high thermal conductivity and high electric conductivity, etc. It shows a very low softening point and low viscosity at molten stage while retaining a high coking value.  Mesophase pitch can be used as precursors of carbon fiber, carbon foam and lithium-ion battery anode material, or as matrix materials in carbon/carbon composite processing. Specifications
Softening point(K) 483-553
Content of mesophase (%) >90
Volatile constitution(wt.%) 18-28
Insoluble of toluene (wt.%) 35-60
Insoluble of pyridine(wt.%) 20-35
Coking value(wt.%) 80-92
    Product Codes- NCZ-2671K

Mesophase pitch(Petroleum, Carbon foam grade) (277575)

$445.00
Select options This product has multiple variants. The options may be chosen on the product page
Mesophase pitch(Petroleum, Carbon foam grade) (277575)
 
Softening point Content of mesophase Coking value Ash
310-375°C >95% >88% 0.01%
    Product Codes- NCZ-2673K

Mesophase pitch(Petroleum, Impregnant grade) (273575)

$315.00
Select options This product has multiple variants. The options may be chosen on the product page
Mesophase pitch(Petroleum, Impregnant grade) (273575)

Softening point Content of mesophase Ash Sulfur
150-295°C 10-95% 0.01% 0.5%
    Product Codes- NCZ-2672K

Mesophase pitch(Petroleum, Spinning grade) (279575)

$775.00
Select options This product has multiple variants. The options may be chosen on the product page
Mesophase pitch(Petroleum, Spinning grade) (279575)
Softening point Content of mesophase Coking value Ash
275°C >98% 90% <0.01%
    Product Codes- NCZ-2674K

Mesoporous SiO2 Coated Upconverting Nanoparticles Solution, 10mg/bottle

$1,452.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Mesoporous SiO2 Coated Upconverting Nanoparticles Solution, 10mg/bottle
CAS No. 7783-40-6
Appearance White to off-white crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1 – 10µm (Size Can be customized),  Ask for other available size range.
Ingredient MgF2
Molecular Weight 62.30 g/mol
Melting Point 1,261 °C
Boiling Point 2,260 °C
Density 3.15 g/cm³
Product Codes NCZ-451I

Methoxy poly(ethylene glycol)-b-poly(D,L-lactide)(mPEG-PLA) (721989)

$919.00
Methoxy poly(ethylene glycol)-b-poly(D,L-lactide)(mPEG-PLA) (721989)Appearance                    white irregular blocks m-PEG                        1900, 5000 Inherent Viscosity               0.10-1.00dl/g Melting Range                  amorphous Residual Solvent                 0.05% Residual Monomer               0.5% Residual Catalyst(Tin)           200ppm .
Grade Mw of PLA Mw of mPEG Price($/20g)
mPEG-PLA-01 2000-4000 1900 919
mPEG-PLA-02 5000-10,000 1900 919
mPEG-PLA-03 20,000-40,000 1900 919
mPEG-PLA-04 60,000-80,000 1900 919
mPEG-PLA-05 100,000-200,000 1900 919
mPEG-PLA-06 2000-4000 5000 919
mPEG-PLA-07 5000-10,000 5000 919
mPEG-PLA-08 20,000-40,000 5000 919
mPEG-PLA-09 60,000-80,000 5000 919
mPEG-PLA-10 100,000-200,000 5000 919
  Product Codes- NCZ-2639K

Mg-Al Hydrotalcite (323558)

$210.00
Select options This product has multiple variants. The options may be chosen on the product page
Mg-Al Hydrotalcite (323558) Added into PVC resin, the following properties will be improved: 1. Volume resistivity 2. Congo-red index 3. Initial coloring . Typical Analysis Value
Items Analysis value
Molar ratio(MgO/Al2O3) 4.21
Loss on drying(105°C, 1hr) % 0.38
Specific surface area(BET) m2/g 10.1
Average particle size µm 0.44
Na(XRF result) ppm 150
. Performance Formulation: PVC 100 TOTM 50 Stab 6.8(HT 70%)
Congo-red 200°C(min) 255
Volume resistivity(1014Ωcm) 11.90
Coloring 190°C 5min Good
Coloring 190°C 30min Good
Product Codes- NCZ-2764K

Microsphere(solid, from fly ash) (336621)

$80.00
Microsphere (solid, from fly ash) (336621) Powder shape: perfectly spherical Fineness: 0.3-300μm True density: 2.2-2.6g / cc Bulk density: 0.7-0.9g / cc Water content: ≤0.5% Color: L value = 64 to 69 pH: 3-12
Grade 12µm 24µm 45µm 300µm D(0.9) D(0.5) Price($/kg)
336621-F200 99.5% 7-10µm 80
336621-F400 99.5% 11-16µm 80
336621-F600 99.5% 18-26µm 80
336621-F800 100% 15-45µm 80
  Product Codes- NCZ-2682K

Microwave-Alkali extraction, Molecular weight 10000-20000g/mol, Ash ≤0.05%, Lignin ≤0.8%

$815.00
Select options This product has multiple variants. The options may be chosen on the product page

Product 

Microwave-Alkali extraction, Molecular weight 10000-20000g/mol, Ash ≤0.05%, Lignin ≤0.8%

CAS No.

 Generic for cellulose: 9004-34-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 ~10 – 50 nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 8,000 – 20,000 g/mol

Melting Point

N/A

Boiling Point

N/A

Density

~1.5 – 1.6 g/cm³

Product Codes

NCZ-2600K

Microwave-Alkali extraction, Molecular weight 8000-20000g/mol, Ash ≤0.06%, Lignin ≤0.8%

$385.00
Select options This product has multiple variants. The options may be chosen on the product page

Product 

Microwave-Alkali extraction, Molecular weight 8000-20000g/mol, Ash ≤0.06%, Lignin ≤0.8%

CAS No.

 Generic for cellulose: 9004-34-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 ~10 – 50 nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 8,000 – 20,000 g/mol

Melting Point

N/A

Boiling Point

N/A

Density

~1.5 – 1.6 g/cm³

Product Codes

NCZ-2599K

Mn2AlC MAXene Powder

$0.00

Product Name: Mn2AlC MAXene Powder

Product

Mn2AlC MAXene powder

Colour Black Powder
Purity ≥98 wt%
Ingredient Mn2AlC
Product Code NCZ-MX-114

APPLICATION FIELDS

High-temperature coating, MXene precursor, conductive self-lubricating ceramic, lithium-ion battery, supercapacitor, electrochemical catalysis.

RELATED INFORMATION

Storage Conditions: Airtight sealed, avoid light and keep dry at room temperature. Please email us for the customization. Email: contact@nanochemazone.com

Mn3AlC2 MAXene Powder

$0.00

Mn3AlC2 MAXene Powder

Product Name: Mn3AlC2 MAXene Powder

Product Mn3AlC2 MAXene 
Colour Black Powder
Purity ≥98 wt%
Ingredient Mn3AlC2
CAS NO 7439-96-5/1299-86-1
Product No.  NCZMAX525

 APPLICATION FIELDS

High-temperature coating, Mxene precursor, conductive self-lubricating ceramic, lithium-ion battery, supercapacitor, electrochemical catalysis. RELATED INFORMATION Storage Conditions: Airtight sealed, avoid light and keep dry at room temperature. Please email us for the customization. Email: contact@nanochemazone.com

Mo2C MXenes Powder

$0.00

Product Name: Mo2C MXenes Powder

Product

Mo2C MXene Powder

CAS No. 12316-56-2
Appearance Powder
Purity 99%
APS 1 – 5 microns (can be customized)
Ingredient Mo2C
Product Code NCZ-MX-303

Mo2C MXenes Powder RELATED INFORMATION

Storage Conditions: Airtight sealed, avoid light and keep dry at room temperature. Please email us for the customization. Email: contact@nanochemazone.com

Mo2Ga2C MAXene Powder

$0.00

Product Name: Mo2Ga2C MAXene Powder

Product Mo2Ga2C MAXene
Colour Black Powder
Purity ≥98 wt%
Ingredient Mo2Ga2C
Product Code NCZ-MX-115

Mo2Ga2C MAXene powder APPLICATION FIELDS

High-temperature coating, MXene precursor, conductive self-lubricating ceramic, lithium-ion battery, supercapacitor, electrochemical catalysis. RELATED INFORMATION Storage Conditions: Airtight sealed, avoid light and keep dry at room temperature. Please email us for the customization. Email: contact@nanochemazone.com

Mo2Ti2AlC3 MAXene Powder

$0.00

Product Name: Mo2Ti2AlC3 MAXene Powder

Product Mo2Ti2AlC3 MAXene Powder
CAS No. 12316-56-2
Appearance Powder
Purity 99%
APS 1 – 5 microns (can be customized)
Ingredient Mo2Ti2AlC3
Product Code NCZ-MX-320

Mo2Ti2AlC3 MAXene Powder INTRODUCTION:

MAX phase ceramics (including titanium silicon carbide, Ti3AlC2 materials, etc.) are a new type of processing conductive ceramic materials that have attracted much attention. These ceramics contain more than sixty kinds of ternary carbides or nitrides. M represents the transitional front metal elements. ; A represents the main group element, mainly the elements of the third main group and the fourth main group; X represents a carbon or nitrogen element. Among them, Ti3SiC2 is the most widely studied. Ti3SiC2 was successfully synthesized by the hot pressing method in 1996 by Professor Barsoum M of Drexel University in the United States, and its excellent performance was found. Due to the unique nano-layered crystal structure, these ceramic materials have antioxidant, self-lubricating properties, high room temperature fracture toughness, and electrical conductivity. Such materials can be widely used as high-temperature structural materials, electrode brush materials, chemical anticorrosive materials, and high-temperature heating elements. The products are mainly used for high-temperature coating, MXene precursor, conductive self-lubricating ceramic, lithium-ion battery, supercapacitor, electrochemical catalysis.  

Mo2Ti2AlC3 MAXene Powder RELATED INFORMATION:

Storage Conditions: Airtight sealed, avoid light and keep dry at room temperature. Please email us for the customization. Email: contact@nanochemazone.com

Mo2TiAlC2 MAXene Powder

$0.00

Product Name: Mo2TiAlC2 MAXene Powder

Product Code: NCZ-MX-214A

Product Mo2TiAlC2 MAXene
Colour Black Powder
Purity ≥98 wt%
Ingredient Mo2TiAlC2
CAS NO 12316-56-2

Mo2TiAlC2 MAXene Powder APPLICATION FIELDS:

High-temperature coating, Mxene precursor, conductive self-lubricating ceramic, lithium-ion battery, supercapacitor, electrochemical catalysis. RELATED INFORMATION: Storage Conditions: Airtight sealed, avoid light and keep dry at room temperature. Please email us for the customization. Email: contact@nanochemazone.com

Mo2TiC2 MXenes Powder

$0.00

Product Name: Mo2TiC2 MXenes Powder

Product Mo2TiC2 MXene Powder
CAS No. 12316-56-2
Appearance Powder
Purity 99%
APS 1 – 5 microns (can be customized)
Ingredient Mo2TiC2
Product Code NCZ-MX-304

Mo2TiC2 MXenes Powder APPLICATION:

Energy Storage Catalysis, Analytical Chemistry, Mechanics, adsorption, etc.   RELATED INFORMATION Storage Conditions: Airtight sealed, avoid light and keep dry at room temperature. Please email us for the customization. Email: contact@nanochemazone.com

Mo3AlC2 MAXene Powder

$0.00

Product Name: Mo3AlC2 MAXene Powder

Product Code: NCZ-MX-215
Product Mo3AlC2 MAXene
Colour Black Powder
Purity ≥98 wt%
Ingredient Mo3AlC2
CAS NO 12316-56-2

Mo3AlC2 MAXene Powder APPLICATION FIELDS

High-temperature coating, Mxene precursor, conductive self-lubricating ceramic, lithium-ion battery, supercapacitor, electrochemical catalysis. RELATED INFORMATION Storage Conditions: Airtight sealed, avoid light and keep dry at room temperature. Please email us for the customization. Email: contact@nanochemazone.com

Mo3AlC2 MAXene Powder

$0.00

Product Name: Mo3AlC2 MAXene Powder

Product Mo3AlC2 MAXene
Colour Black Powder
Purity ≥98 wt%
Ingredient Mo3AlC2
Product Code NCZ-MX-116

Mo3AlC2 MAXene Powder APPLICATION FIELDS:

High-temperature coating, MXene precursor, conductive self-lubricating ceramic, lithium-ion battery, supercapacitor, electrochemical catalysis. RELATED INFORMATION Storage Conditions: Airtight sealed, avoid light and keep dry at room temperature. Please email us for the customization. Email: contact@nanochemazone.com

Mo3C2 MXene Powder

$0.00

Product Name: Mo3C2 MXene Powder

Product Code: NCZ-MX-217

Product Mo3C2 MAXene
Colour Black Powder
Purity ≥98 wt%
Ingredient Mo3C2
CAS NO 12316-56-2

Mo3C2 MXene Powder APPLICATION FIELDS

High-temperature coating, Mxene precursor, conductive self-lubricating ceramic, lithium-ion battery, supercapacitor, electrochemical catalysis. RELATED INFORMATION Storage Conditions: Airtight sealed, avoid light and keep dry at room temperature. Please email us for the customization. Email: contact@nanochemazone.com

MoAlB MAXene Powder

$0.00

Product Name:  MoAlB MAXene Powder

Product Code: NCZ-MX-205
Product

MoAlB MAXene Powder

Colour Black Powder
Purity ≥98 wt%
Ingredient MoAlB
CAS NO 12316-56-2

APPLICATION FIELDS

High-temperature coating, Mxene precursor, conductive self-lubricating ceramic, lithium-ion battery, supercapacitor, electrochemical catalysis. RELATED INFORMATION Storage Conditions: Airtight sealed, avoid light and keep dry at room temperature. Please email us for the customization. Email: contact@nanochemazone.com

MOL-C Dry 206 Black

Product Description Heat-curing dry-film paint-like solid lubricants. Dry 206 Black AFCs are formulated with PTFE (polytetrafluoroethylene) in organic binder-solvent system as a

MOL-C Dry 207 Grey

Product Description Heat-curing, solid dry-film paint-like lubricants. Dry 207 Grey AFC are formulated with MoS2 (Molybdenum Disulfide), white solids and epoxy

Mol-C Dry 305 Spray

Applications

For metal/metal combinations with slow to medium fast movements and high loads. Both the liquid coating and aerosolized spray have been used for improving the running-in process and for lubrication of plain bearings, bushings and sleeves, power screw drives, threaded connections/fasteners, and high voltage switches – even under high vacuum and at extreme temperatures. Additionally, Mol-C Dry 305 Spray is used frequently for slides, guides and tracks. Mol-C Dry 305 Spray is frequently used on hard to reach surfaces or for emergency boundary lubrication as well as on chains or as a multi-purpose penetrant.

Molybdenum (Mo) Micron Powder, Purity: 99.95 %, Size: 20 µm

Price range: $31.00 through $372.00
Select options This product has multiple variants. The options may be chosen on the product page
25 grams/28 € 100 grams/90 € 500 grams/220 € 1000 grams/330 €
Please contact us for quotes on larger quantities !!! 

Molybdenum (Mo) Micron Powder

Purity: 99.95 %, Size: 20 µm

Technical Properties:

PURITY

99.95 %

PARTICLE SIZE

20 µm

CAS

7439-98-7

MELTING POINT

2610 °C

BOILING POINT

5560 °C

CRYSTAL STRUCTURE

Cubic, Body Centered

DENSITY 8.2 g/cm³
COEFF. OF EXPANSION @ 20ºC

    5.1 x 10⁻⁶

ELECTRIC RESISTIVITY

5.17 microhm-cm

FORM  

Powder

APPLICATIONS

Aerospace Alloys Electronics Metal Injection Molding

                                                             

Molybdenum (Mo) Micron Powder, Purity: 99.95 %, Size: 3 µm

Price range: $51.00 through $428.00
Select options This product has multiple variants. The options may be chosen on the product page
25 grams/46 € 100 grams/94 € 500 grams/265 € 1000 grams/380 €
Please contact us for quotes on larger quantities !!!

Molybdenum (Mo) Micron Powder

Purity: 99.95 %, Size: 3 µm

Technical Properties:

PURITY

99.95 %

PARTICLE SIZE

3 µm

CAS

7439-98-7

MELTING POINT

2610 °C

BOILING POINT

5560 °C

CRYSTAL STRUCTURE

Cubic, Body Centered

DENSITY                                      8.2 g/cm³
COEFF. OF EXPANSION @ 20ºC

5.1 x 10⁻⁶

ELECTRIC RESISTIVITY

5.17 microhm-cm

FORM  

Powder

APPLICATIONS

Aerospace Alloys Electronics Metal Injection Molding

                                                  

Molybdenum (Mo) Micron Powder, Purity: 99.95 %, Size: 325 mesh

Price range: $43.00 through $287.00
Select options This product has multiple variants. The options may be chosen on the product page
25 grams/39 € 100 grams/90 € 500 grams/195 € 1000 grams/255 €  
Please contact us for quotes on larger quantities !!!

Molybdenum (Mo) Micron Powder

Purity: 99.95 %, Size: 325 mesh

Technical Properties:

PURITY

99.95 %

PARTICLE SIZE

325 Mesh

CAS

7439-98-7

MELTING POINT

2610 °C

BOILING POINT

5560 °C

CRYSTAL STRUCTURE

Cubic, Body Centered

DENSITY                                                 8.2 g/cm³
COEFF. OF EXPANSION @ 20ºC

5.1 x 10⁻⁶

ELECTRIC RESISTIVITY

5.17 microhm-cm

FORM  

Powder

APPLICATIONS

Aerospace Alloys Electronics Metal Injection Molding

                       

Molybdenum (Mo) Micron Powder, Purity: 99.95%, Size: 1-10 µm, Metal Basis

Price range: $13.00 through $304.00
Select options This product has multiple variants. The options may be chosen on the product page
5 grams/12 € 25 grams/28 €                         
100 grams/54 €                      
500 grams/168 €                   
1000 grams/270 € Please contact us for quotes on larger quantities !!!

Molybdenum (Mo) Micron Powder

Purity: 99.95%, Size: 1-10 µm, Metal Basis

Molybdenum is a chemical element with symbol Mo and atomic number 42. Molybdenum does not occur naturally as a free metal on Earth; it is found only in various oxidation states in minerals. Industrially, molybdenum compounds (about 14% of world production of the element) are used in high-pressure and high-temperature applications as pigments and catalysts.

Applications:

Molybdenum micronparticles/micronpowder give very good result in situations where a lubricant needs to withstand high temperatures. Molybdenum micronparticles/micronpowder are used in steel as anti-corrosive additives, vacuum valves, sintering additives, hard alloys and cutting tools. In the manufacture of high pressure vacuum tubes, heat tubes, X-Ray tubes Molybdenum Micronparticles / Micronpowder can be useful. Molybdenum micronparticles/micronpowder are well-known as a coating of choice in high-friction, heavy load environments, due to the extreme lubrication they offer. Molybdenum micronparticles/micronpowder offer a simple, effective way to apply such coatings with extreme precision.

Molybdenum (Mo) Micron Powder, Purity: 99.99 %, Size: 1 µm

Price range: $54.00 through $445.00
Select options This product has multiple variants. The options may be chosen on the product page
25 grams/48 € 100 grams/98 € 500 grams/295 € 1000 grams/395 €  
Please contact us for quotes on larger quantities !!!

Molybdenum (Mo) Micron Powder

Purity: 99.99 %, Size: 1 µm

Technical Properties:

PURITY

99.99 %

PARTICLE SIZE

1 µm

CAS

7439-98-7

MELTING POINT

2610 °C

BOILING POINT

5560 °C

CRYSTAL STRUCTURE

Cubic, Body Centered

DENSITY                                         8.2 g/cm³
COEFF. OF EXPANSION @ 20ºC

5.1 x 10⁻⁶

ELECTRIC RESISTIVITY

5.17 microhm-cm

FORM  

Powder

APPLICATIONS

Aerospace Alloys Electronics Metal Injection Molding

                               

Molybdenum (Mo) Micron Powder, Purity: 99.99 %, Size: 10 µm

Price range: $45.00 through $419.00
Select options This product has multiple variants. The options may be chosen on the product page
25 grams/40 € 100 grams/90 € 500 grams/260 € 1000 grams/372 €
Please contact us for quotes on larger quantities !!!

Molybdenum (Mo) Micron Powder

Purity: 99.99 %, Size: 10 µm

Technical Properties:

PURITY

99.99 %

PARTICLE SIZE

10 µm

CAS

7439-98-7

MELTING POINT

2610 °C

BOILING POINT

5560 °C

CRYSTAL STRUCTURE

Cubic, Body Centered

DENSITY                                            8.2 g/cm³
COEFF. OF EXPANSION @ 20ºC

5.1 x 10⁻⁶

ELECTRIC RESISTIVITY

5.17 microhm-cm

FORM  

Powder

APPLICATIONS

Aerospace Alloys Electronics Metal Injection Molding

                                    

Molybdenum (Mo) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 30-40 nm, Metal Basis

Price range: $122.00 through $306.00
Select options This product has multiple variants. The options may be chosen on the product page

Molybdenum (Mo) Nanopowder/Nanoparticles

Purity: 99.95%, Size: 30-40 nm, Metal Basis

Technical Properties:

Bulk Density (g/cm3) 0,25
True Density (g/cm3) 10,2
Color black
Shape spherical
Crystal Structure cubic
Average Particle Size (nm) 30-40
Specific Surface Area (m2/g) 22,0-35,0
Elemental Analysis Mo Fe C Mg Al Others
99.95 0.004 0.002 0.001 0.001 0.001

Properties, Storage and Cautions:

Molybdenum nanoparticles are highly reactive and flammable, therefore it should be handled with care and rapid moves, vibrations should be avoided. Nanopowder should be kept away from sunlight, any kind of heating, moisture and impacts. Coagulation of the particles is a serious problem, so, nanopowder should be sealed under vacuum and should be kept in cool and dry conditions. Air contact should be avoided.

Molybdenum (Mo) Sputtering Target

Price range: $98.00 through $414.00
Select options This product has multiple variants. The options may be chosen on the product page

Product 

Molybdenum (Mo) Sputtering Target

CAS No.

7439-96-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

54.938 g/mol

Melting Point

1,246 °C

Boiling Point

2,061 °C

Density

1.738 g/cm³

Product Codes

NCZ-1298K

Molybdenum (Mo) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.125”

$141.00

Product 

Molybdenum (Mo) Sputtering Targets, Purity: 99.95%, Size: 1'', Thickness: 0.125''

CAS No.

 7439-98-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

95.95 g/mol

Melting Point

 2623 °C

Boiling Point

 4639 °C

Density

10.28 g/cm³

Product Codes

NCZ-1941K

Molybdenum (Mo) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.125”

$128.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Molybdenum (Mo) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.250”

$159.00

Product 

Molybdenum (Mo) Sputtering Targets, Purity: 99.95%, Size: 1'', Thickness: 0.250''

CAS No.

 7439-98-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

95.95 g/mol

Melting Point

 2623 °C

Boiling Point

 4639 °C

Density

10.28 g/cm³

Product Codes

NCZ-1940K

Molybdenum (Mo) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.250”

$469.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Molybdenum (Mo) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.125”

$163.00

Product 

Molybdenum (Mo) Sputtering Targets, Purity: 99.95%, Size: 2'', Thickness: 0.125''

CAS No.

 7439-98-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

95.95 g/mol

Melting Point

 2623 °C

Boiling Point

 4639 °C

Density

10.28 g/cm³

Product Codes

NCZ-1939K

Molybdenum (Mo) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.125”

$148.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.