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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Product	Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets, Purity: 99.99%, Size: 4'', Thickness: 0.250''
CAS No.	• Indium Oxide (In₂O₃): 1312-43-2 • Tin Oxide (SnO₂): 18282-10-5
Appearance	Powder
Purity	≥99%, ≥99.9%, ≥95% (Other purities are also available)
APS	< 5 µm (Size Can be customized), Ask for other available size ranges.
Ingredient	N/A
Molecular Weight	Approx. 292.6 g/mol (based on 90:10 wt% In₂O₃:SnO₂ blend)
Melting Point	~1,800 °C (sintered ceramic composite; no sharp melting point)
Boiling Point	N/A
Density	~7.15 g/cm³
Product Codes	NCZ-2205K

Product	Indium Zinc Oxide/IZO (InZnO) Sputtering Targets, indium, Purity: 99.99%, Size: 2'', Thickness: 0.125''
CAS No.	Indium oxide (In₂O₃): 1312-43-2 Zinc oxide (ZnO): 1314-13-2
Appearance	Powder
Purity	≥99%, ≥99.9%, ≥95% (Other purities are also available)
APS	N/A (Size Can be customized), Ask for other available size ranges.
Ingredient	N/A
Molecular Weight	90% In₂O₃ (277.64 g/mol), 10% ZnO (81.38 g/mol) → ~260–270 g/mol (estimated)
Melting Point	Indium oxide: ~1910 °C Zinc oxide: ~1975 °C
Boiling Point	N/A
Density	~7.1 g/cm³
Product Codes	NCZ-2194K

Product	Indium(III) Oxide (In2O3) Nanopowder, 50nm, ≥99.99% (4N) Purity
CAS No.	1312-43-2
Appearance	Yellowish-white or pale tan
Purity	≥99%, ≥99.9%, ≥95%(Other purities are also available)
APS	50nm (Size Can be customized), Ask for other available size range.
Ingredient	In2O3
Molecular Weight	277.64 g/mol
Melting Point	N/A
Boiling Point	N/A
Density	7.18 g/cm³
Product Codes	NCZ-430I

Product	Industrial Grade Graphene (97%, <10nm)
CAS No.	7782-42-5
Appearance	Dark grey to black powder
Purity	≥99%, ≥99.9%, ≥95%(Other purities are also available)
APS	10nm (Size Can be customized), Ask for other available size range.
Ingredient	N/A
Molecular Weight	N/A
Melting Point	3697 °C
Boiling Point	4830 °C
Density	2.267 g/cm³
Product Codes	NCZ-105G

Product	Industrial Grade Graphene Oxides (97%, <2nm, diameter: 3~10um)
CAS No.	7782-42-5
Appearance	Black powder
Purity	≥99%, ≥99.9%, ≥95%(Other purities are also available)
APS	3-10um (Size Can be customized), Ask for other available size range.
Ingredient	(CₓOyHz)
Molecular Weight	1106.96 g/mol
Melting Point	N/A
Boiling Point	N/A
Density	1.36 g/cm³
Product Codes	NCZ-118G

Product	Iridium (Ir) Nanopowder, 20-30nm, ≥99.99% (4N) Purity, 1g
CAS No.	7439-88-5
Appearance	Gray to black metallic
Purity	≥99%, ≥99.9%, ≥95%(Other purities are also available)
APS	20-30nm (Size Can be customized), Ask for other available size range.
Ingredient	Ir
Molecular Weight	192.22 g/mol
Melting Point	N/A
Boiling Point	N/A
Density	22.56 g/cm³
Product Codes	NCZ-431I

Product	Iridium ACAC
CAS No.	15635-87-7
Appearance	Yellow-orange / orange-yellow crystalline
Purity	≥99%, ≥99.9%, ≥95%(Other purities are also available)
APS	N/A
Ingredient	Ir(O₂C₅H₇)₃)
Molecular Weight	489.5 g/mol
Melting Point	269–271 °C
Boiling Point	N/A
Density	N/A
Product Codes	NCZ-277R

PURITY	99.99 %
PARTICLE SIZE	100 mesh
CAS	7439-89-6
DENSITY	7.87 g/cm³
BOILING POINT	3000 °C
MELTING POINT	1536 °C
COEFF. OF EXPANSION @ 20ºC	12.6 x 10⁻⁶
BRINNELL HARDNESS	82 – 100
ELECTRIC RESISTIVITY	9.71 microhm-cm
CRYSTAL STRUCTURE	Cubic, Body Centered
FORM	Powder
APPLICATIONS	Fillers Plastics Polymers

Fe Purity (%)	≥99,55	(partially passivated by coating nanoparticles with 8,7wt% Carbon for only safe shipping)
Bulk Density (g/cm³)	0,15-0,30
True Density (g/cm³)	7,9
Color	black
Crystal Structure	cubic
Average Particle Size (nm)	22
Specific Surface Area (m²/g)	45,0-65,0
Elemental Analysis	Fe	Al	Mn	Ni	Cr	Others
	≥99.55	≤0.12	≤0,09	≤0.009	≤0.006	≤0.004

Fe Purity (%)	≥99,5	(partially passivated by coating nanoparticles with 0,9 wt% Oxygen for only safe shipping)
Bulk Density (g/cm³)	0,15-0,30
True Density (g/cm³)	7,9
Color	black
Crystal Structure	cubic
Average Particle Size (nm)	22
Specific Surface Area (m²/g)	45,0-65,0
Elemental Analysis	Fe	Al	Mn	Ni	Cr	Others
	≥99.5	≤0.16	≤0,08	≤0.007	≤0.006	≤0.004

True Density (g/cm³)	7,9
Color	dark gray
Crystal Structure	cubic
T_melting (^oC)	1538
T_boiling (^oC)	2862
Average Particle Size (nm)	790
Elemental Analysis	Fe	Mn	Ni	Al	Ca	Others
	≥99.5	≤0.13	≤0.12	≤0.09	≤0.05	≤0.02

Product	Iron (Fe) Sputtering Target
CAS No.	7439-88-5
Appearance	Powder
Purity	≥99%, ≥99.9%, ≥95% (Other purities are also available)
APS	NA (Size Can be customized), Ask for other available size ranges.
Ingredient	N/A
Molecular Weight	192.22 g/mol
Melting Point	2,446 °C
Boiling Point	4,428 °C
Density	22.56 g/cm³
Product Codes	NCZ-1358K

Product	Iron (Fe) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''
CAS No.	7439-89-6
Appearance	Powder
Purity	≥99%, ≥99.9%, ≥95% (Other purities are also available)
APS	N/A (Size Can be customized), Ask for other available size ranges.
Ingredient	N/A
Molecular Weight	55.85 g/mol
Melting Point	1538 °C
Boiling Point	2862 °C
Density	7.87 g/cm³
Product Codes	NCZ-2189K

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Iron (Fe) Micron Powder

Purity: 99.99 %, Size: 100 mesh

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Iron (Fe) Micron Powder

Purity: 99.99 %, Size: 325 mesh

Iron (Fe) Micron Powder

Purity: 99.99 %, Size: 5 µm

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Iron (Fe) Nanopowder/Nanoparticles

Purity: 99.55%, Size: 22 nm, Carbon Coated

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Iron (Fe) Nanopowder/Nanoparticles

Purity: 99.55%, Size: 22 nm, Partially Passivated

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Iron (Fe) Nanopowder/Nanoparticles

Purity: 99.55%, Size: 790 nm

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Iron (Fe) Nanopowder/Nanoparticles

Purity: 99.55+%, Size: 30-40 nm, Metal Basis

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Iron (Fe) Nanopowder/Nanoparticles

Purity: 99.55+%, Size: 60-70 nm, Metal Basis

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Iron (Fe) Nanopowder/Nanoparticles

Purity 99.55+%, 90-100 nm, Metal Basis

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Applications of Sputtering Targets;

Applications of Sputtering Targets;

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