Prime Si+Si3N4 Wafer, Size: 4”, Orientaion: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2 Side Polished, Thickness: 380± 15 μm, Coating 1000 nm

Price range: $101.00 through $2,178.00
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1 piece/92 € 5 pieces/420 € 25 pieces/1975 € Please contact us for quotes on larger quantities !!!

Prime Si+Si3N4 Wafer

Size: 4”, Orientaion: (100), Boron Doped, Thickness: 380± 15 μm, Coating 1000 nm

Technical Properties:

Quality Prime
Materials Si+Si3N4
Size (inch) 4”
Orientation (100)
Coating 1000 nm
Thickness (μm) 380± 15
Doping Boron
Resistivity (ohm.cm) 1-10
Polished Double Side
Silicon nitride (Si3N4,SiN) offers excellent mechanical and thermal stability. It is commonly used for hard masks, as a dielectric material, or as a passivation layer. Silicon nitride is very hard by nature and has good thermal shock resistance and oxidation resistance. Silicon Nitride has good high temperature strength, creep resistance and oxidation resistance. Silicon Nitride's low thermal expansion coefficient gives good thermal shock resistance.

Platinum (Pt) Nanopowder/Nanoparticles Dispersion, Purity: 99.99%, Size: 10 nm, 1100 ppm

Price range: $101.00 through $1,974.00
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30 ml/92 € 60 ml/169 € 120 ml/284 € 500 ml/994 € 1000 ml/1790 € Please contact us for quotes on larger quantities !!

Platinum (Pt) Nanopowder/Nanoparticles Dispersion

Purity: 99.99%, Size: 10 nm, 1100 ppm

Technical Properties:

Pt Nanoparticle Purity (%) 99,99
Pt Concentration (wt%/ppm) 0,1/1100
pH 7,0
Average Particle Size (nm) 10
Color black

Applications:

Platinum nanopowder is known to have effective catalysis properties and oxidation resistance. It is also safe and antimicrobial which makes it a good preservative material for food storage, cosmetics and medical industry. Note: Platinum nanoparticle dispersion product contains no extra chemical reagent. It should be kept away from sunlight. It is a research grade product, it should be handled by professional people. If nanoparticles begin to agglomerate after stored for a long time, the dispersion can be simply mixed before use.  

Aluminum Silicon Copper (AlSiCu) Sputtering Targets, Purity: 99.999%, Size: 3” , Thickness: 0.250”

$101.00

Product 

Aluminum Silicon Copper (AlSiCu) Sputtering Targets, Purity: 99.999%, Size: 3'' , Thickness: 0.250''

CAS No.

Aluminum: 7429-90-5 Silicon: 7440-21-3 Copper: 7440-50-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

Weighted average depending on composition (example below)

Melting Point

 Approx. 570–660 °C

Boiling Point

 Approx. 2500–2650 °C

Density

~2.7 to 2.9 g/cm³

Product Codes

NCZ-2522K

Cobalt (Co) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.250”

$102.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When etching anisotropy is high, sputter etching is the preferred method.

is required, and selectivity is unimportant. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

The chemical element cobalt has the atomic number 27 and the symbol Co. Cobalt is a silver-gray, hard, and shiny metal. Because it is one of only three room temperature ferromagnets with unaxial symmetry and hence suitability for digital recording, cobalt is employed in the production of high-strength, wear-resistant alloys as well as magnetic recording.

Tungsten Titanium (TiW) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”

$102.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

vLanthanum Hexaboride (LaB6) Micron Powder, High Purity: 99.99%, Size: 1.5-18 µm

Price range: $103.00 through $1,505.00
Select options This product has multiple variants. The options may be chosen on the product page
25 grams/95 € 100 grams/284 € 500 grams/845 € 1000 grams/1380 €
Please contact us for quotes on larger quantities !!!

Lanthanum Hexaboride (LaB6) Micron Powder

High Purity: 99.99%, Size: 1.5-18 µm

Technical Properties:

Purity (%) 99.99
Average Particle Size (µm) 1.5-18
Density (g/cm3) 2,7
Melting Point (°C) 2210.0

Applications:

Lanthanum hexaboride powder main application is in hot cathodes. It is used as a single crystal ar as a coating in hot cathods. It is also used in electronics, radar aerospace, and infrared application. It has application in X-ray powder diffraction instrument as size/strain standard for the calibration of the instrument.  

Silicon (Si) Sputtering Targets, undoped, Purity: 99.999%, Size: 1”, Thickness: 0.250”

$103.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Tin (Sn) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”

$103.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Graphene NanoPowder (C, 11-15 nm)

Price range: $103.00 through $240.00
Select options This product has multiple variants. The options may be chosen on the product page
$103/25g $240/100g

Product 

Graphene NanoPowder (C, 11-15 nm)

CAS No.

1034343-98-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

11-15 nm (Size Can be customized), Ask for other available size ranges.

Ingredient

AlN

Molecular Weight

12.01 g/mol

Melting Point

~ 3,900 °C

Boiling Point

~600–800 °C

Density

0.03–0.2 g/cm³

Product Codes

NCZ-1027K

Titanium Oxide Nanoparticles / Nanopowder 99.5% 10-30nm Anatase and Rutile Mixture

Price range: $103.00 through $312.00
Select options This product has multiple variants. The options may be chosen on the product page
  $103/100g $221/500g
$312/1kg

Product 

Titanium Oxide Nanoparticles / Nanopowder 99.5% 10-30nm Anatase and Rutile Mixture

CAS No.

 13463-67-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 10-30nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

79.87 g/mol

Melting Point

~1,843 °C

Boiling Point

~2,972 °C

Density

~4.23 g/cm³

Product Codes

NCZ-1197K

High Purity Zinc Oxide 99.999% 200-800 nm

Price range: $103.00 through $405.00
Select options This product has multiple variants. The options may be chosen on the product page
$103/25g
$231/100g
$405/500g

Product 

High Purity Zinc Oxide 99.999% 200-800 nm

CAS No.

1314-13-2

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

200-800 nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

81.38 g/mol

Melting Point

~1,975 °C

Boiling Point

~2,360 °C

Density

~5.61 g/cm³

Product Codes

NCZ-1217K

Graphene NanoPowder (C, 11-15 nm)

Price range: $103.00 through $240.00
Select options This product has multiple variants. The options may be chosen on the product page
$103/25g $240/100g
Product Graphene NanoPowder (C, 11-15 nm)
CAS No. 7782-42-5
Appearance Black powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 11-15nm (Size Can be customized),  Ask for other available size range.
Ingredient C
Molecular Weight 12.01 g/mol
Melting Point 3697 °C
Boiling Point 4830 °C
Density 0.2 g/cm³
Product Codes NCZ-109G
 

Prime FZ-Si Wafer, Size: 3”, Orientation: (100), None Doped, Resistivity: 10000 – 100000 (ohm.cm), 2-Side Polished, Thickness: 380 ± 25 μm

Price range: $103.95 through $1,751.40
Select options This product has multiple variants. The options may be chosen on the product page
Prime FZ-Si Wafer Size: 3”, Orientation: (100), None Doped, 2-Side Polished, Thickness: 380 ± 25 μm Technical Properties: Quality Prime

Graphene Water Dispersion, Purity: 99.5%, Black Liquid, Graphene: 2 wt%

Price range: $104.00 through $644.00
Select options This product has multiple variants. The options may be chosen on the product page
30 ml/104 € 60 ml/174 €                          120 ml/ 259

Iron (Fe) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.250”

$104.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Iron (Fe) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”

$104.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Silver Ag nanopowder/ nanoparticles self-dispersing 15 nm 25%

Price range: $104.00 through $815.00
Select options This product has multiple variants. The options may be chosen on the product page
$104/5g $345/25g $815/100g

Product 

Silver Ag nanopowder/ nanoparticles self-dispersing 15 nm 25%

CAS No.

24304-00-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

15 nm 25% (Size Can be customized), Ask for other available size ranges.

Ingredient

AlN

Molecular Weight

40.982 g/mol

Melting Point

2200 °C

Boiling Point

2517 °C

Density

3.3 g/cm³

Product Codes

NCZ-1008K

Boron powder ( B, 99.99%, -325 mesh)

Price range: $104.00 through $432.00
Select options This product has multiple variants. The options may be chosen on the product page
$104/5g
$432/25g

Product 

Boron powder ( B, 99.99%, -325 mesh)

CAS No.

7440-42-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

-325 mesh (Size Can be customized), Ask for other available size ranges.

Ingredient

AlN

Molecular Weight

10.81 g/mol

Melting Point

2076°C

Boiling Point

2808 °C

Density

19.32 g/cm³

Product Codes

NCZ-1018K

Platinum (Pt) Nanopowder/Nanoparticles Dispersion, Purity: 99.99%, Size: 10 nm, 1100 ppm

Price range: $104.42 through $1,790.00
Select options This product has multiple variants. The options may be chosen on the product page
Description 30 ml/92 € 60 ml/169 € 120 ml/284 € 500 ml/994 € 1000 ml/1790 € Technical Properties: Pt Nanoparticle Purity (%) 99,99 Pt Concentration

Crystalline Boron (B) Micron Powder, Average Particle Size: -325 Mesh, Purity: 99+%

Price range: $105.00 through $1,776.00
Select options This product has multiple variants. The options may be chosen on the product page
25 grams/95 € 100 grams/284 € 500 grams/975 € 1000 grams/1568 € Crystalline Boron (B) Micron Powder, Average Particle Size: -325 Mesh, Purity: 99+%
PRODUCT PROPERTIES
Molecular Weight 10.811
Appearance Black/Brown
Melting Point       2100oC / 3812oF
Boiling Point 2600oC / 4712oF
Density 2.34 cryst. g/cm3
Form Crystalline powder
Resistivity 1.5E12 μΩ-cm, 20 °C
Average Particle Size -325 Mesh
Storage temperature RT
Mohs Hardness @20oC 9.3
Applications Aerospace, Ceramic Material, Fuel Source, Nuclear
  Elemental Analysis (%)
B 99%
Fe 0.10 %
Al 0.10 %
Ca 0.09 %
Si 0.05 %
Cu 0.001 %
Sn 0.001 %
Mg 0.29 %
Mn 0.0006 %
  APPLICATIONS
  • A black - brown color powder used primarily for its thermal properties.
  • Corrosion inhibition: Boron compounds produced with boron nanopowders make it useful in anti-freeze, brake fluids, hydrolic systems, and other applications where ferrous materials need protection against corrosion.
  • Abrasive: boron can serve as a rugged, highly abrasive surface for any number of purposes. Combined with its thermal properties, this makes it highly effective for high speed cutting and similar tasks.
  • Photoelectric applications: Boron powder offers unique applications in photography, tanning, electrolytic condensation, fuel cells, and a host of other photoelectric fields.
  • Biocide: Borates in general work to kill a variety of insects and similar pests through simple physical destruction, making them one of the most universally effective pest control options.
  • Ignition: The thermal properties of boron powder make it an excellent ignition aid for any number of applications. This sees it used in charcoal briquettes, fuels, torches, and countless other applications.
 

Lanthanum Hexaboride (LaB6) Micron Powder, High Purity: 99.95+%, Size: 200 mesh (No reviews yet)

Price range: $105.00 through $1,350.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Lanthanum hexaboride powder main application is in hot cathodes. It is used as a single crystal ar as a coating in hot cathods. It is also used in electronics, radar aerospace, and infrared application. It has application in X-ray powder diffraction instrument as size/strain standard for the calibration of the instrument.

Barium Titanate Nanoparticles/Nanopowder (BaTiO3, 99.9%, 50~70nm, Cubic)

Price range: $105.00 through $193.00
Select options This product has multiple variants. The options may be chosen on the product page
$105/100g
$193/500g

Product 

Barium Titanate Nanoparticles/Nanopowder (BaTiO3, 99.9%, 50~70nm, Cubic)

CAS No.

12047-27-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

50~70nm, Cubic (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

233.19 g/mol

Melting Point

~1,625 °C

Boiling Point

 N/A

Density

~6.02 g/cm³

Product Codes

NCZ-1097K

Sulfur Nanoparticles/ Nanopowder (S, 99.99%, <55nm)

Price range: $105.00 through $355.00
Select options This product has multiple variants. The options may be chosen on the product page
$105/25g
$185/100g
$355/500g

Product 

Sulfur Nanoparticles/ Nanopowder (S, 99.99%, <55nm)

CAS No.

7704-34-9

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 <55nm(Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

256.48 g/mol (S₈)

Melting Point

~115 °C (α-Sulfur)

Boiling Point

~444.6 °C

Density

 ~2.07 g/cm³

Product Codes

NCZ-1163K

Tin Oxide Nanoparticles/ Nanopowder ( SnO2, 99.9%, 50-70 nm)

Price range: $105.00 through $430.00
Select options This product has multiple variants. The options may be chosen on the product page
$105/100g
$240/500g
$430/1kg

Product 

Tin Oxide Nanoparticles/ Nanopowder ( SnO2, 99.9%, 50-70 nm)

CAS No.

 18282-10-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

50-70 nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

150.71 g/mol

Melting Point

~1,630 °C

Boiling Point

~1,800 °C

Density

 6.95 g/cm³

Product Codes

NCZ-1179K

Titanium Oxide Nanoparticles / Nanopowder (TiO2, Rutile, 99.5%, 20~40nm, Coated with SiO2, highly Hydrophilic)

Price range: $105.00 through $327.00
Select options This product has multiple variants. The options may be chosen on the product page
  $105/100g $225/500g
$327/1kg

Product 

Titanium Oxide Nanoparticles / Nanopowder (TiO2, Rutile, 99.5%, 20~40nm, Coated with SiO2, highly Hydrophilic)

CAS No.

 13463-67-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

  20~40nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

79.87 g/mol

Melting Point

~1,843 °C

Boiling Point

~2,972 °C

Density

~4.23 g/cm³

Product Codes

NCZ-1199K

Yttrium Oxide Nanoparticles / Nanopowder (Y2O3, 99.995%, 0.5~1um)

Price range: $105.00 through $325.00
Select options This product has multiple variants. The options may be chosen on the product page
$105/100g
$225/500g
$325/Kg

Product 

Yttrium Oxide Nanoparticles / Nanopowder (Y2O3, 99.995%, 0.5~1um)

CAS No.

1314-36-9

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 

0.5~1um (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

225.81 g/mol

Melting Point

~2,430 °C

Boiling Point

~4,300 °C

Density

~5.01 g/cm³

Product Codes

NCZ-1210K

Yttrium Oxide Nanoparticles / Nanopowder (Y2O3, 99.995%, 0.5~1um)

Price range: $105.00 through $225.00
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$105/100g $225/500g $325/kg
Product Yttrium Oxide Nanoparticles / Nanopowder (Y2O3, 99.995%, 0.5~1um)
CAS No. 1314-36-9
Appearance White powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 0.5-1nm (Size Can be customized),  Ask for other available size range.
Ingredient Y2O3
Molecular Weight 225.81 g/mol
Melting Point 2425°C
Boiling Point 4300°C
Density 5.01 g/cm³
Product Codes NCZ-122R
 

MWNTs -OH Functionalized 95% 50-100 nm

Price range: $105.00 through $793.00
Select options This product has multiple variants. The options may be chosen on the product page
$105/5g
$253/25g
$793/100g

Product 

MWNTs -OH Functionalized 95% 50-100 nm

CAS No.

7727-54-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

50-100 nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

228.20 g/mol

Melting Point

 ~120 °C

Boiling Point

N/A

Density

~1.98 g/cm³

Product Codes

NCZ-1255K

Silicon Dioxide (SiO2) Sputtering Target

Price range: $105.00 through $388.00
Select options This product has multiple variants. The options may be chosen on the product page

Product 

Silicon Dioxide (SiO2) Sputtering Target

CAS No.

7631-86-9

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 60.08 g/mol

Melting Point

~1,710 °C

Boiling Point

~2,950 °C

Density

~2.2–2.65 g/cm³

Product Codes

NCZ-1323K

Cobalt (Co) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.125”

$105.00

Product 

Cobalt (Co) Sputtering Targets, Purity: 99.95%, Size: 1'', Thickness: 0.125''

CAS No.

7440‑48‑4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

58.93 g/mol (cobalt atomic weight)

Melting Point

~1,495 °C

Boiling Point

~2,870–2,927 °C

Density

~8.9 g/cm³

Product Codes

NCZ-2295K

Spherical Alumina(5μm) (105559)

$105.00
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Spherical Alumina(5μm) (105559)  
Typical Physical Data
Items Unit Typical value Test Method
Particle Size Distribution D10 μm 2.4 Layer analyzer
D50 μm 5.9
D90 μm 19.3
Specific Surface Area m2/g 0.6 BET method
Specific Gravity g/cm3 3.6 pycnometer method
Electrical Conductivity μS/cm 24.3 Conductivity Meter
pH - 6.8 pH Meter
Circularity % 95.0 Particle Image Analyzer
 
Typical Chemical data
Test Items Unit Typical value Test Method
Chemical Analysis Al2O3 % 99.6 ICP
Na2O ppm 120.0 ICP
SiO2 ppm 85.0 ICP
Fe2O3 ppm 100.0 ICP
Ionic  Impurities Na+ ppm 35.0 Atomic Absorption Spectrometer
Cl- ppm 1.1 Auto Electric Potential Titrator
Fe++ ppm 15.0 IC
Product Codes- NCZ-2678K

Hexagonal Boron Nitride Nanotube Dia:<50nm, Length:5-20um, 99%

Price range: $106.00 through $1,860.00
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Hexagonal Boron Nitride Nanotube Dia:<50nm, Length:5-20um, 99% Product description Boron nitride nanotubes are formed by replacing the C atoms in CNTs with alternating B and N atoms, and do not change the spatial structure of CNTs. Compared with CNT, hexagonal BNNT with graphite-like structure has chemical stability and unique thermal, electrical and optical properties. BN has both high thermal conductivity and low electrical conductivity; it has good thermal shock resistance; even at a high temperature of 1000 °C or in harsh environments, BN is still quite stable and has excellent corrosion resistance; BN's The coefficient of friction is about twice that of graphite and does not change substantially with temperature. Although BNNT cannot be prepared in large quantities at present, due to its good strength, thermal stability and electrical properties, people have made some explorations on the application of BNNT and made certain progress. Compared with CNT, BNNT has better thermal stability, and theoretical calculations show that BNNT has higher defect generation energy, which is still positive under high stress, so it has higher yield resistance; in addition, it also It has higher thermal conductivity and the strength is also the highest among known insulating fibers. Therefore, BNNT as a mechanical reinforcement material will have more advantages than traditional fibers and CNT in terms of strength and oxidation resistance, and BNNT can also be combined with nano-ceramic fibers to form new fiber composite materials. These properties determine the broad application prospects of BN nanomaterials in the fields of nanoelectronics, electronic heat dissipation components, solid/liquid lubricants, nanocomposites and high-temperature structural components.   Performance characteristics Hexagonal boron nitride nanotubes are prepared by high-frequency plasma gas phase synthesis, and have excellent physical and chemical properties: high temperature resistance, oxidation resistance, chemical corrosion resistance, self-lubricating, good processability, high thermal conductivity, and good medium It is widely used in high-tech fields such as machinery, metallurgy, electronics, aerospace and so on. Applications Filling the high thermal conductivity and high stability boron nitride fiber filler into the polymer plastic system can effectively improve the low thermal conductivity and poor thermal stability of the composite material system. Thereby, the high temperature stability and oxidation resistance of the inorganic-organic polymer materials are effectively improved, and the working temperature of the packaged materials, such as LEDs, is effectively reduced, and the working time thereof is prolonged. CB-BNNT as a mechanical reinforcement material will have more advantages than traditional fibers and CNT in terms of strength and oxidation resistance, and CB-BNNT can also be combined with nano-ceramic fibers to form a new fiber composite material. These properties determine the broad application prospects of BN nanomaterials in the fields of nanoelectronics, electronic heat dissipation components, solid/liquid lubricants, nanocomposites and high-temperature structural components. Packaging and storage This product is packaged in an inert gas plastic bag, sealed and stored in a dry, cool environment. It should not be exposed to the air to prevent oxidation and agglomeration due to moisture, which will affect the dispersion performance and use effect.

Tungsten Carbide (WC) Nanopowder/Nanoparticles, Purity: 99.96%, Size: 25-95 nm

Price range: $106.00 through $608.00
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5 grams/94 € 
25 grams/182 € 100 grams/536 €                       
Please contact us for quotes on larger quantities !!!

Tungsten Carbide (WC) Nanopowder/Nanoparticles

Purity: 99.96%, Size: 25-95 nm

Storage Condition:

Tungsten carbide nanoparticles should be sealed in vacuum and stored in cool and dry room. It should not be exposure to air and avoid stress.

Applications:

Tungsten carbide nanoparticles is a hard material, corrosion resistant, and waer resistant material. It is used in cutting tools, mining tolls, and chipless forming tools. It is also used in coatings such as corrosion-resistant coatings, wear-resistance coatings, and erosion-resistant coatings. In order to enhance hardness, strength, and wear resistance tungsten carbide nanoparticles is used in nano-compsites. It is used in producing super fine horniness alloy and high capability nano-crystalline. It is also used as in catalysis as petrochemical cracking catalyst.

Polyhydroxylated Fullerene (Fullerenols)/ C60, (-OH) Functionalized, Dispersed in Water, 130 ppm Dry powder

Price range: $106.00 through $2,082.00
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25 ml/95 € 100 ml/290 € 500 ml/1140 € 1000 ml/1860 € Please contact us for quotes on larger quantities.       

Polyhydroxylated Fullerene (Fullerenols)/ C60

(-OH) Functionalized, Dispersed in Water, 130 ppm Dry powder

The starting material is >98% purity C60 fullerenes. C60 bearing over 40 hydroxyl groups that have higher water solubility (>50 mg/mL). These exist as monodisperse nanoparticles in water, and have a valiant polishing effect. They exhibit superior antioxidant and anti-inflammatory properties.

Applications:

1. Pharmaceutical: Diagnostic reagents, super drugs, cosmetics, nuclear magnetic resonance (NMR) with the developer. DNA affinity, anti-HIV drugs, anti-cancer drugs, chemotherapy drugs, cosmetics additives and scientific research. 2. Energy: Solar battery, fuel cell, secondary battery. 3. Industry: Wear resistant material, flame retardant materials, lubricants, polymer additives, high-performance membrane, catalyst, artificial diamond, hard alloy, electric viscous fluid, ink filters, high-performance coatings, fire retardant coatings, manufacturing bioactive materials , memory materials, embedded molecular and other characteristics, composite materials etc. 4. Information industry: Semiconductor record medium, magnetic materials, printing ink, toner, ink, paper special purposes. 5. Electronic parts: Superconducting semiconductor, diodes, transistors, inductor.  , 6. Optical materials, electronic camera, fluorescence display tube, nonlinear optical materials. 7. Environment: Gas adsorption, gas storage.

Quartz Wafer, (X-Cut), Size: 4”, 2-Side Polished, Thickness: 200 ± 25 μm

Price range: $106.00 through $2,331.00
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1 piece/96 € 5 pieces/440 € 25 pieces/2100 €                       Please contact us for quotes on larger quantities !!! 

Quartz Wafer

(X-Cut), Size: 4”, 2-Side Polished, Thickness: 200 ± 25 μm

Technical Properties:

Quality Prime
Materials Quartz
Size (inch) 4”
Orientation (X-Cut)
Coating  
Thickness (μm) 200 ± 25
Doping  
Resistivity (ohm.cm)  
Polished Double Side
High working temperature, high corrosion resistivity, thermal conductivity and low dielectric loss are the specifications that make quartz wafers a good candidate for semiconductor, photomask, microwave filter and optical lense applications. Since quartz is a monocrystalline material with numerous different crystal orientations, it can be supplied in different cut versions. During this process high quality particles of quartz are positioned at the bottom of a vessel which is loaded with NaOH. Quartz starts to crystallize at around 400°C and between 1000 and 1500 bar pressure. This crystallization eventually creates monocrystals and may take even days. The generated quartz monocrystals are polished after being sliced into wafers and finally reveal Quartz 4”,(AT-Cut) Wafers. Quartz 4”,(X-Cut) has high thermal conductivity, high anti-corrosion, feature of high working temperature and good optical transmittance. For all these reasons Quartz Wafer is appropriate for the production of optical lenses, photomasks, microwave filters, semiconductors and for optical fiber applications.

Graphene Oxide Quantum Dots (GOQDs) Solution (Blue Fluorescence)

Price range: $106.00 through $869.00
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Product Graphene Oxide Quantum Dots (GOQDs) Solution (Blue Fluorescence)
CAS No. N/A
Appearance Light blue solution
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 2-5nm (Size Can be customized),  Ask for other available size range.
Ingredient CₓOᵧH_z
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 1.0–1.2 g/cm³
Product Codes NCZ-363I

Aluminum Silicon Copper (AlSiCu) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.125”

$106.00

Product 

Aluminum Silicon Copper (AlSiCu) Sputtering Targets, Purity: 99.999%, Size: 4'', Thickness: 0.125''

CAS No.

Aluminum: 7429-90-5 Silicon: 7440-21-3 Copper: 7440-50-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

Weighted average depending on composition (example below)

Melting Point

 Approx. 570–660 °C

Boiling Point

 Approx. 2500–2650 °C

Density

~2.7 to 2.9 g/cm³

Product Codes

NCZ-2521K

Graphene Water Dispersion, Purity: 99.5%, Black Liquid, Graphene: 2 wt%

Price range: $107.00 through $664.00
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Graphene Water Dispersion, Purity: 99.5%, Black Liquid, Graphene: 2 wt%
Graphene Purity (%) 99,5
Graphene Thickness (nm) 0,6-1,2
Diameter (µm) 2,0-12,0
Appearance Black Liquid
Concentration (wt%)  2 (mg/ml)
Specific Surface Area (m2/g) 600-1200
Elemental Analysis (%) C            O 99,6    <0,4
Surfactant                                                                                                           YES

Diamond (C) Nanopowder/Nanoparticles, Purity: >98.3%, Size: 3.5-11 nm

Price range: $107.00 through $6,102.00
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Diamond (C) Nanopowder/Nanoparticles

Purity: >98.3%, Size: 3.5-11 nm

Technical Properties:

Bulk Density (g/cm3) 0,16-0,20
True Density (g/cm3) 3,2
Color gray
Shape spherical
Ash Content (%) 1,12
Tdecomposition (oC) 615
Toxidation (oC) 530
Average Particle Size (nm) 3.5-11
Specific Surface Area (m2/g) 275,2
Resistivity (Ω.cm) 0,2-1,8
Magnetic Susceptibility (m3/kg) 1,0x10-8
Elemental Analysis C H N O Fe Ca Others
98,5 (98,3 % diamond) 0,15 0,02 0,83 0,03 0,005 ≤0.001

Cobalt Chromium (Co-Cr) Alloy Powder, Size: < 44 µm, Co: 20%, Cr: 80%

Price range: $107.00 through $328.00
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100 grams/95 €                     
500 grams/174 €                    
1000 grams/290 € Please contact us for quotes on larger quantities !!!

Cobalt Chromium (Co-Cr) Alloy Powder

Size: < 44 µm, Co: 20%, Cr: 80%

Cobalt Chromium (Co-Cr) Alloy Powder, Size: < 44 µm, Co: 20%, Cr: 80%

Price range: $107.00 through $328.00
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100 grams/95 €                     
500 grams/174 €                    
1000 grams/290 € Please contact us for quotes on larger quantities !!!

Cobalt Chromium (Co-Cr) Alloy Powder

Size: < 44 µm, Co: 20%, Cr: 80%

Hafnium (Hf) Micron Powder, Purity: 99.9 %, Size: 325 mesh

Price range: $107.00 through $1,104.00
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25 grams/95 € 100 grams/247 € 500 grams/690 € 1000 grams/980 €
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Hafnium (Hf) Micron Powder

Purity: 99.9 %, Size: 325 mesh

Technical Properties:

PURITY

99.9 %

PARTICLE SIZE

325 mesh

CAS

7440-58-6

DENSITY

13.09 g/cm³

BOILING POINT

5400 °C

MELTING POINT

2222 °C

COEFF. OF EXPANSION @ 20ºC

5.9 x 10⁻⁶

ELECTRIC RESISTIVITY

35.1 microhm-cm

CRYSTAL STRUCTURE

Hexagonal

FORM  

Powder

APPLICATIONS

Alloys Electronics Fillers Nuclear

                                                            Please Click for MSDS

Niobium (Nb) Micron Powder Purity: 99.95%, Size: 325 mesh

Price range: $107.00 through $1,234.00
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25 grams/95 € 100 grams/265 € 500 grams/645 € 1000 grams/1095 €

Zirconium (Zr) Micron Powder Purity: 99.9 %, Size: 325 mesh

Price range: $107.00 through $1,125.00
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25 grams/95 € 100 grams/235 € 500 grams/756 € 1000 grams/998 €

Aluminum (Al) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.125”

$107.00

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Aluminum which has the chemical symbol of Al, is a silvery white, soft, ductile metal that is the third most abundant element. Aluminum is notable due to for its light weight, strength, durability and for its ability to resist corrosion. Aluminum forms an extremely thin but very strong layer of oxide film. Aluminum has also high thermal and electrical conductivity. Aluminum sputtering targets have a particularly fine-grained microstructure. This property of Aluminum sputtering targets ensures that you benefit from uniform erosion and a low susceptibility to particle formation throughout the sputtering process.

Copper (Cu) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.125”

$107.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Silicon Dioxide (SiO2) Sputtering Targets, Fused Quartz, Purity: 99.995%, Size: 2” , Thickness: 0.250”

$107.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Graphene Nanopowder (C, 99.5+%, 1-5 nm)

$107.00
$107/25g

Product 

Graphene Nanopowder (C, 99.5+%, 1-5 nm)

CAS No.

1034343-98-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

1-5 nm (Size Can be customized), Ask for other available size ranges.

Ingredient

AlN

Molecular Weight

12.01 g/mol

Melting Point

~ 3,900 °C

Boiling Point

~3,900 °C

Density

~ 2.2 g/cm³

Product Codes

NCZ-1026K

Molybdenum Nanoparticles/ Mo Nanopowder (99.7%, 60~80nm)

Price range: $107.00 through $310.00
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$107/25g
$310/100g

Product 

Molybdenum Nanoparticles/ Mo Nanopowder (99.7%, 60~80nm)

CAS No.

7439-98-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

60~80nm (microns) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

95.95 g/mol

Melting Point

~2623°C

Boiling Point

4639 °C

Density

10.28 g/cm³

Product Codes

NCZ-1049K

Calcium Carbonate Nanoparticles, surface modified for printing inks

$107.00
Select options This product has multiple variants. The options may be chosen on the product page
$55/100g
$107/kg

Product 

Calcium Carbonate Nanoparticles, surface modified for printing inks

CAS No.

471-34-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

15-40nm(Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

100.09 g/mol

Melting Point

 Decomposes at ~825 °C

Boiling Point

N/A

Density

~2.71 g/cm³

Product Codes

NCZ-1112K

Graphene Nanopowder (C, 99.5+%, 1-5 nm)

$107.00
Select options This product has multiple variants. The options may be chosen on the product page
$107/25g
Product Graphene Nanopowder (C, 99.5+%, 1-5 nm)
CAS No. 7782-42-5
Appearance Black powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1-5nm (Size Can be customized),  Ask for other available size range.
Ingredient C
Molecular Weight 12.01 g/mol
Melting Point 3697 °C
Boiling Point 4830 °C
Density 2.2 g/cm³
Product Codes NCZ-108G
 

Grade 702 Zirconium (Zr) Pellets Evaporation Materials

Price range: $107.00 through $468.00
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Product Grade 702 Zirconium (Zr) Pellets Evaporation Materials
CAS No. 7440-67-7
Appearance Silvery White, Metallic 
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Zr
Molecular Weight 26.98 g/mol
Melting Point 1,852°C
Boiling Point N/A
Density 6.52 g/cm³
Product Codes NCZ-101E

Lead (Pb) Sputtering Target

Price range: $107.00 through $519.00
Select options This product has multiple variants. The options may be chosen on the product page

Product 

Lead (Pb) Sputtering Target

CAS No.

7439-92-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

207.2 g/mol

Melting Point

327.5 °C

Boiling Point

1,744 °C

Density

11.34 g/cm³

Product Codes

NCZ-1295K

Tin (Sn) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”

$107.00

Product 

Tin (Sn) Sputtering Targets, Purity: 99.99%, Size: 1'', Thickness: 0.125''

CAS No.

7440-31-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

118.71 g/mol

Melting Point

231.93 °C

Boiling Point

2602 °C

Density

~7.31 g/cm³

Product Codes

NCZ-1646K

Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.125”

$107.00

Product 

Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness: 0.125''

CAS No.

 7429-90-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 26.98 g/mol

Melting Point

 660.3 °C

Boiling Point

 2519 °C

Density

 2.70 g/cm³

Product Codes

NCZ-2581K

Silicon (Si) Nanopowder for Battery Applications

Price range: $108.00 through $1,918.00
Select options This product has multiple variants. The options may be chosen on the product page
5 grams/96 € 25 grams/195 €                       
100 grams/590 €                     
500 grams/1280 €                    
1000 grams/1690 €

Carbon Nanotubes Doped with 32 wt% Silicon (Si) and 32 wt% Graphene Nanopowder/Nanoparticles

Price range: $108.00 through $627.00
Select options This product has multiple variants. The options may be chosen on the product page
Applications:  

Carbon NanoTubes doped with Graphene nanoplatelets and Silicon nanopowders demonstrate significant improvements in electrical and mechanical properties. Hardness, tensile strength, specific strength, and elastic modulus are examples of such enhancements. Because of these advancements, these materials are now widely used in a variety of applications. Some of these programs. 1 -drug delivery, 2 biosensors, 3 CNT composites 4-catalysis, 5-nanoprobes, Storage of 6-hydrogen, 7-lithium-ion batteries, There are 8 gas discharge tubes and 9 - flat panel displays, 10-supercapacitors, 11- transistors , 12-solar cells, 13-photoluminescence ,14-templates.

 

Niobium (Nb) Sputtering Targets, Purity: 99.95% pure Ex Ta, Size: 1”, Thickness: 0.125”

$108.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Iron (Fe) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”

$108.00

Product 

Iron (Fe) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.125''

CAS No.

 7439-89-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 55.85 g/mol

Melting Point

 1538 °C

Boiling Point

 2862 °C

Density

 7.87 g/cm³

Product Codes

NCZ-2183K

Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”

$108.00

Product 

Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 1'', Thickness: 0.250''

CAS No.

 7429-90-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 26.98 g/mol

Melting Point

 660.3 °C

Boiling Point

 2519 °C

Density

 2.70 g/cm³

Product Codes

NCZ-2582K