Cerium Oxide Powder(CeO2, 5-20um, 99.9%)

Price range: $110.00 through $175.00
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$110/500g
$175/kg

Product 

Cerium Oxide Powder(CeO2, 5-20um, 99.9%)

CAS No.

1306-38-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

5-20um (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

172.11 g/mol

Melting Point

 ~2,400 °C

Boiling Point

~3,500 °C

Density

~7.13 g/cm³

Product Codes

NCZ-1120K

Cerium Oxide Powder(CeO2, 5um, 99.9%)

$110.00
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$110/500g $175/kg
Product Cerium Oxide Powder(CeO2, 5um, 99.9%)
CAS No. 1306-38-3
Appearance White or light yellow powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS  5um (Size Can be customized),  Ask for other available size range.
Ingredient CeO2
Molecular Weight 172.115g/mol
Melting Point 2600°C
Boiling Point 3,500°C
Density 7.2g/cm³
Product Codes NCZ-104R
 

Cesium carbonate(Cs2CO3, 99.9%) (557836)

$576.00
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Cesium carbonate(Cs2CO3, 99.9%) (557836)  
Cs2CO3 min% Impurities Max ppm
Li K Na Ca Mg Fe Al Si Rb Pb
99.9 5 50 50 30 5 10 50 50 200 5
Product Codes- NCZ-2743K

Cesium chloride(CsCl, 99%) (559836)

$720.00
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Cesium chloride(CsCl, 99%) (559836) This product is for research purposes only and is NOT intended for use as drugs, food additives, households, pesticides, etc.
CsCl min% Impurities Max%
Li Na K Rb Ca Mg Fe Al Si Pb
99 0.001 0.02 0.02 0.5 0.005 0.001 0.001 0.001 0.001 0.001

 

Product Codes- NCZ-2742K

Cesium iodide(CsI, 99.999%) (553836)

$651.00
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Cesium iodide(CsI, 99.999%) (553836)
CAS NO.: 7789-17-5 [Formula] CsI [Properties] White crystal, soluble in water and alcohol. M. P. 621℃ [Standard of Quality]  
CsI min% Impurities Max ppm
Li K Na Ca Mg Fe Al Sr Rb Cr Mn SiO2
99.999 0.5 1 0.5 0.5 0.2 0.2 0.1 1 1 0.1 0.5 /
 
Product Codes- NCZ-2744K

Cesium sulfate, 99.999%

Price range: $16.00 through $84.00
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Product Cesium sulfate, 99.999%
CAS No. 10294-54-9
Appearance White crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Cs₂SO₄
Molecular Weight 361.87 g/mol
Melting Point 1010 °C
Boiling Point N/A
Density 4.243 g/cm³
Product Codes NCZ-146R

Cesium Tungsten Oxide (Cs0.33WO3) Nanopowder/Nanoparticles, Purity: 99+%, Size: 18 nm

Price range: $57.00 through $306.00
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1 gram/51 € 5 grams/94 €                       
25 grams/271 €                  
Please contact us for quotes on larger quantities !!!

Cesium Tungsten Oxide (Cs0.33WO3) Nanopowder/Nanoparticles

Purity: 99+%, Size: 18 nm

Applications:

Cesium Tungsten Oxide nanoparticles/nanopowder are used for making transparent insulation coating that has the best infrared transparent barrier feature. In non-metal surface treatment products Cesium Tungsten Oxide nanoparticles/nanopowder are also used.

Chitosan hydrochloride(from Aspergillus Niger, Water soluble) (337555)

$252.00
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Chitosan hydrochloride(from Mushroom, Water soluble) (334555)
ANALYSIS SPECIFICATION
Deacetylation ≥98%
Characters/appearance White to light yellow powder
Odor and taste Characteristic
pH 3-5
Viscosity in 1% Acetic acid 10-100 cps
Mesh size/sieve analysis 100% pass 80 mesh
Loss on drying ≤8%
Water solubility Soluble in water easily
Heavy Metals As Pb Cd Hg Sum ≤ 2.0 ppm ≤ 1.0 ppm ≤ 0.5 ppm ≤ 0.5 ppm ≤ 20.0 ppm
Microbiological quality Total Plate Count Yeast & Mold E.Coli. Salmonella <1000 cfu/g <100 cfu/g Negative Negative
  Product Codes- NCZ-2665K

Chitosan hydrochloride(from Mushroom, Water soluble) (334555)

$252.00
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Chitosan hydrochloride(from Mushroom, Water soluble) (334555)
ANALYSIS SPECIFICATION
Deacetylation ≥98%
Characters/appearance White to light yellow powder
Odor and taste Characteristic
pH 3-5
Viscosity in 1% Acetic acid 10-100 cps
Mesh size/sieve analysis 100% pass 80 mesh
Loss on drying ≤8%
Water solubility Soluble in water easily
Heavy Metals As Pb Cd Hg Sum ≤ 2.0 ppm ≤ 1.0 ppm ≤ 0.5 ppm ≤ 0.5 ppm ≤ 20.0 ppm
Microbiological quality Total Plate Count Yeast & Mold E.Coli. Salmonella <1000 cfu/g <100 cfu/g Negative Negative
  Product Codes- NCZ-2665K

Chitosan hydrochloride(Medical grade, water soluble) (335668)

$274.00
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Product 

Chitosan hydrochloride(Medical grade, water soluble) (335668)

CAS No.

9012‑76‑4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

  80–200 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

50,000–300,000 g/mol

Melting Point

Decomposes at ~185–200 °C

Boiling Point

N/A

Density

~1.35–1.40 g/cm³

Product Codes

NCZ-2621K

Test Items Specifications
DAC degree ≥ 90%
Protein ≤ 0.2%
Endotoxin ≤ 0.5EU/mg
Heavy metals ≤ 10ppm

Chitosan hydrochloride(Water soluble) (234668)

$156.00
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Product

Chitosan hydrochloride(Water soluble) (234668)

CAS No.

70694‑72‑3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

  N/A(Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

Polymer; ~215 g/mol per unit; overall range: a few kDa to >1 MDa

Melting Point

N/A

Boiling Point

N/A

Density

~1.5 g/cm³

Product Codes

NCZ-2655K

Chitosan Oligosaccharide(Agriculture grade) (238589)

$315.00
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Chitosan Oligosaccharide(Agriculture grade) (238589)

Chitosan Oligosaccharide is a mixture of oligomers of D-glucosamine. It is the only known positively charged alkaline amino oligosaccharide which is derived from rich marine biological resources (shrimp & crab shells) with enzymatic degradation. Its degree of polymerization is 2-10 with molecular weight average 2,000.

Synonym Chitosan Oligomers, Chitooligosaccharide, Oligochitosan

Molecular Formula (C6H11NO4)n, n=2-10

Characteristics Chitosan Oligosaccharide is the only known alkaline, positively charged, water-soluble and lipophilic amino oligosaccharide.

Features Low dosage (Optimal concentration 50-100ppm) Nature safe & Biological decomposable Superior biocompatibility No drug fastness Proven effective and reliable for Crops, Vegetables, Fruits & Flowers

Benefits 1. Activate plant protection against Fungal, Bacterial, Virus diseases, Pest & Environment stress

Experimental examples  Tested pathogenic microorganisms 
Antiviral (Control effects 63-90%) Downy Mildew Powdery Mildew Banana Bunchy Black Heart, etc.
Antifungal Cucurbits Fusarium Wilt Tomato Gray Mold Seedling Blight Cucumber Downy Mildew Potato Late Blight, etc.
Antibacterial Eggplant Bacterial Wilt Tomato Bacterial Canker Tomato Bacterial Wilt Potato Soft Rot Cucumber Bacterial Angular Leaf Spot, etc.
  1. Promote plant growth -Promote plant seed germination and seedling growth -Promote plant root, stalk and leaf growth -Promote plant fruit growth, and improve yield & profits -Mineral absorption accelerant
  2. Improve soil structure

-Prevent and restrain nematodes

-Activating the growth of useful microbes, suppressing harmful microbes -Restoration of soil ecology

Applications

  1. Biofertilizer: Plant growth regulator, Foliar spray fertilizer ingredients, Fertigation feritilizer

    ingredients

  1. Biopesticide & Biofungicide ingredients
  2. Nematocide ingredients
  3. Seed treatment
  4. Root dipping

Recommended dosage 50-100ppm, i.e., 189.32-378.64mg/US gallon, or about 15-20 g/hectare for foliar spray; about 225-375 g/hectare for root drench.

May use 2-3 times the dose during period of illness.

Specifications

Test Items Specifications
Appearance Yellowish-Brown powder
Molecular Weight ≤3000 Da
Particle size ≥100 Mesh
Moisture ≤10.0%
Ash Content ≤1.0%
Insoluble ≤1.0%
pH value 4.5-7.0
Pb ≤1.0ppm
As ≤1.0ppm
Mercury ≤1.0ppm
Total plate count ≤1000cfu/g
Yeast and Mold ≤50cfu/g
Pathogen Negative
Product Codes- NCZ-2659K

Chitosan Oligosaccharide(Feed grade) (239589)

$315.00
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Chitosan Oligosaccharide(Feed grade) (239589)
Molecular Formula: (C6H11NO4)n(n=2~10)

Characteristic:

The only known alkaline, positively charged, water-soluble, lipophilic, amino oligosaccharide.

Features:

1 Not be digested by ferment produced by the animals(It can be digested by ferment produced by the beneficial microorganism living in intestine) 2 Excellent Acid and Thermal Stability 3 No Drug Fastness 4 High Solubility in Water

Benefits for Animals:

1. Advance Growth, Increase Weight and Lower Feed Conversion Rate 2. Increase the Serum IgM Antibody Content to Boost Immunity 3. Enhance Antioxidative Capacity of Blood Serum and Liver 4. Increase the Content of Volatile Fatty Acids 5. Stimulate the Growth of Lactobacillus and Bifidobacterium

Applications:

1 Livestock and Poultry Feed Additive:pigs, poultry, dairy, beef, milk cow, equine, rabbits, pets. 2 Aquaculture Feed Additive:Fishes, Bbalone, Prawn, Holothurian.

Specifications:

Test Items Specifications
Appearance Yellowish-Brown Power
Content (%) ≥90
Molecular Weight (Da) ≤3000
DAC (%) ≥90
Particle Size (Mesh) ≥80
Moisture (%) ≤10.0
Ash Content (%) ≤1.0
Insoluble (%) ≤1.0
pH value 4.5-7.0
Pb (mg/kg) ≤1.0
As (mg/kg) ≤1.0
Hg (mg/kg) ≤1.0
Total plate count (cfu/g ) ≤1000
Coliform (cfu/g ) ≤50
Yeast (cfu/g ) ≤30
Mold (cfu/g ) ≤30
Pathogenic Bacterium (cfu/g ) Negative
Product Codes- NCZ-2658K

Chitosan Oligosaccharide(Food grade) (237589)

$315.00
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Chitosan Oligosaccharide(Food grade) (237589)
  Molecular Formula: (C6H11NO4)n(n=2~10)

Specifications:

Test Items Specifications
Appearance Light Yellow Power
Deacetylation ≥90%
Molecular Weight ≤1500 Da
Particle size ≥100 Mesh
Moisture ≤10.0%
Ash Content ≤0.5%
Insoluble ≤1.0%
pH value 4.5-7.0
Pb ≤1.0ppm
As ≤1.0ppm
Mercury ≤0.5ppm
Total plate count ≤1000cfu/g
Yeast and Mold ≤30cfu/g
Pathogen Negative
Product Codes- NCZ-2657K

Chitosan Oligosaccharide(from Aspergillus Niger) (239555)

$252.00
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Chitosan Oligosaccharide(from Aspergillus Niger) (239555)
ANALYSIS SPECIFICATION RUSULT
Deacetylation ≥98% 98.16%
Appearance Light yellow -brown powder Complies
pH 5.5-7 5.8
Mesh size 150mesh 100% pass 150 mesh
Molecular weight ≤ 5500Da 5000Da
Moisture ≤10% 5.12%
Total ash ≤ 2% 0.41%
Heavy Metals ≤ 10 ppm 7ppm
As ≤ 2.0ppm 1ppm
Pb ≤ 1.0ppm 0.5ppm
Cd ≤ 0.5ppm Negative
Hg ≤ 0.5ppm Negative
Microbiological quality Total Plate Count Yeast & Mold E.Coliform Salmonella . <1000cfu/g <100cfu/g Negative Negative . 200cfu/g 70cfu/g Negative Negative
  Product Codes- NCZ-2664K

Chitosan Oligosaccharide(from Mushroom) (238555)

$292.00
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Chitosan Oligosaccharide(from Mushroom) (238555)
ANALYSIS SPECIFICATION RUSULT
Deacetylation ≥98% 98.2%
Appearance Light yellow -brown powder Complies
pH 5.5-7 5.7
Mesh size 150mesh 100% pass 150 mesh
Molecular weight ≤5500Da 5100Da
Moisture ≤10% 5.1%
Total ash ≤ 2% 0.45%
Heavy Metals ≤ 10 ppm 6ppm
As ≤ 2.0ppm 1ppm
Pb ≤ 1.0ppm 0.5ppm
Cd ≤ 0.5ppm Negative
Hg ≤ 0.5ppm Negative
Microbiological quality Total Plate Count Yeast & Mold E.Coliform Salmonella . <1000cfu/g <100cfu/g Negative Negative . 200cfu/g 50cfu/g Negative Negative
  Product Codes- NCZ-2663K

Chitosan(Food grade) (332668)

$180.00
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Chitosan(Food grade) (332668)
Item
Food grade
Appearance
White powder
Degree of deacetylation
90%, 95%
pH
7.0-8.0
Loss on drying
<10.0%
Residue on ignition
<1.5%
Insoluble
<1.0%
Heavy metal (measured by Pb)
≤10ppm
As
≤0.5ppm
Total bacterial count
≤1000cfu/g
Viscosity 50-800mpa·s
Granularity 80mesh, 100mesh
Product Codes- NCZ-2654K

Chitosan(from Aspergillus Niger) (237555)

$240.00
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Chitosan(from Aspergillus Niger) (237555)
ANALYSIS SPECIFICATION RUSULT
Deacetylation ≥90% 90.18%
Appearance White or yellow powder Complies
Viscosity in 1% Acetic acid ≥15cps 18cps
Mesh size 100% pass 80 mesh Complies
Loss on drying ≤8% 7.2%
Total ash ≤ 2% 0.43%
Heavy Metals ≤20.0ppm 10ppm
As ≤ 2.0ppm 1ppm
Pb ≤ 1.0ppm 0.87ppm
Cd ≤ 0.5ppm Negative
Hg ≤ 0.5ppm Negative
Microbiological quality Total Plate Count Yeast & Mold E.Coli. Salmonella . <1000cfu/g <100cfu/g Negative Negative . 85cfu/g 18cfu/g Negative Negative
  Product Codes- NCZ-2662K

Chitosan(from Mushroom) (236555)

$390.00
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Chitosan(from Mushroom) (236555)

ANALYSIS SPECIFICATION
Deacetylation ≥90%
Appearance White or light yellow powder
pH 7-8
Viscosity in 1% Acetic acid ≥15cps
Mesh size 100% pass 80 mesh
Loss on drying ≤8%
Total ash ≤ 2%
Heavy Metals ≤20.0ppm
As ≤ 2.0ppm
Pb ≤ 1.0ppm
Cd ≤ 0.5ppm
Hg ≤ 0.5ppm
Microbiological quality Total Plate Count Yeast & Mold E.Coli. Salmonella . <1000cfu/g <100cfu/g Negative Negative
  Product Codes- NCZ-2661K

Chitosan(Industrial grade) (333668)

$252.00
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Chitosan(Food grade) (332668)
Item
Food grade
Appearance
White powder
Degree of deacetylation
90%, 95%
pH
7.0-8.0
Loss on drying
<10.0%
Residue on ignition
<1.5%
Insoluble
<1.0%
Heavy metal (measured by Pb)
≤10ppm
As
≤0.5ppm
Total bacterial count
≤1000cfu/g
Viscosity 50-800mpa·s
Granularity 80mesh, 100mesh
Product Codes- NCZ-2654K

Chitosan(Medical grade) (431668)

$254.00
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Product 

Chitosan(Medical grade) (431668)

CAS No.

9012‑76‑4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

  N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 161.16 g/mol

Melting Point

 ~102.5 °C

Boiling Point

N/A

Density

 ~1.0 g/cm³

Product Codes

NCZ-2620K

Test Items Specifications
DAC degree ≥ 90%
Protein ≤ 0.2%
Endotoxin ≤ 0.5EU/mg
Heavy metals ≤ 10ppm

Chlorine Functionalized Graphene Quantum Dots Solution, 1mg/mL

Price range: $319.00 through $555.00
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Product Chlorine Functionalized Graphene Quantum Dots Solution, 1mg/mL
CAS No. N/A
Appearance Clear yellowish aqueous
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 4–12nm (Size Can be customized),  Ask for other available size range.
Ingredient CₓHᵧO_zCl_w
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-317I

Chloro(1,5-cyclooctadiene)iridium (I) dimer

Price range: $113.00 through $568.00
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Product Chloro(1,5-cyclooctadiene)iridium (I) dimer
CAS No. 12108-71-5
Appearance Orange-red crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient C₁₆H₂₄Cl₂Ir₂
Molecular Weight 589.0 g/mol
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-211R

Chloro(1,5-cyclooctadiene)rhodium (I) dimer

Price range: $113.00 through $568.00
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Product Chloro(1,5-cyclooctadiene)rhodium (I) dimer
CAS No. 12108-73-7
Appearance Red to orange crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient C₁₆H₂₄Cl₂Rh₂
Molecular Weight 523.1 g/mol
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-212R
 

Chloro(norbornadiene)rhodium (II) dimer

Price range: $224.00 through $1,095.00
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Product Chloro(norbornadiene)rhodium (II) dimer
CAS No. 12108-74-8
Appearance Red crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient C₁₂H₁₂Cl₂Rh₂
Molecular Weight 461.0 g/mol
Melting Point N/A
Boiling Point N/A
Density 1.5 to 1.6 g/cm³
Product Codes NCZ-214R
 

Chloro(triphenylphosphine)gold (I)

Price range: $127.00 through $636.00
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Product Chloro(triphenylphosphine)gold (I)
CAS No. 12244-57-4
Appearance White to pale yellow crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient C₁₈H₁₅AuClP
Molecular Weight 539.7 g/mol
Melting Point 190–195 °C
Boiling Point N/A
Density 2.38 g/cm³
Product Codes NCZ-216R
 

Chlorocarbonylbis(triphenylphosphine)rhodium (I)

Price range: $116.00 through $585.00
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Product Chlorocarbonylbis(triphenylphosphine)rhodium (I)
CAS No. 14610-29-8
Appearance Yellow to orange crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient C₃₇H₃₀ClORhP₂
Molecular Weight 660.3 g/mol
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-210R
 

Chlorohydridotris(triphenylphosphine)ruthenium (II)

Price range: $95.00 through $483.00
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Product Chlorohydridotris(triphenylphosphine)ruthenium (II)
CAS No. 14691-86-0
Appearance Dark red to brown crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient C₅₇H₄₇ClPRu
Molecular Weight 700.2 g/mol
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-213R

Chlorotris(triphenylphosphine)cobalt (I)

Price range: $52.00 through $279.00
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Product Chlorotris(triphenylphosphine)cobalt (I)
CAS No. 15505-86-9
Appearance Dark red to brown crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient C₅₄H₄₅ClCoP₃
Molecular Weight 915.3 g/mol
Melting Point N/A
Boiling Point N/A
Density 1.3 – 1.4 g/cm³
Product Codes NCZ-215R

Chlorotris(triphenylphosphine)copper (I)

Price range: $113.00 through $568.00
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Product Chlorotris(triphenylphosphine)copper (I)
CAS No. 14925-96-3
Appearance White to off-white crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient C₅₄H₄₅ClCuP₃
Molecular Weight N/A
Melting Point 240–245 °C
Boiling Point N/A
Density 1.32 – 1.38 g/cm³
Product Codes NCZ-217R

CHOOSE OPTIONS COMPARE QUICK VIEW Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”

$1,006.00

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs  in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

CHOOSE OPTIONS COMPARE QUICK VIEW Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”

$303.00
but allow experts a large degree of control over the growth and microstructure of the area.

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Chrominum ACAC

Price range: $16.00 through $36.00
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Product Chrominum ACAC
CAS No. 21679-31-2
Appearance Deep maroon to purple crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Cr(C₅H₇O₂)₃
Molecular Weight 349.32 g/mol
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-263R

Chromium (Cr) Micron Powder, Purity: 99.9 %, Size: 100 mesh

Price range: $15.00 through $260.00
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25 grams/14 €  100 grams/48 €   500 grams/156 €  1000 grams/230 €  Please contact us for quotes on larger quantities !!!

Chromium (Cr) Micron Powder

Purity: 99.9 %, Size: 100 mesh

Technical Properties:

PURITY

99.9 %

PARTICLE SIZE

100 Mesh

CAS

7440-47-3

DENSITY

7.19 g/cm³

BOILING POINT

2475 °C

MELTING POINT

1875 °C

COEFF. OF EXPANSION @ 20ºC

6.2 x 10 ⁻⁶

MOHS HARDNESS @ 20ºC

9

ELECTRIC RESISTIVITY

12.9 microhm-cm

CRYSTAL STRUCTURE

Cubic, Body Centered

FORM  

Powder

APPLICATIONS

Alloys, Catalyst, Customer Manufacturing, Industrial- general

              
                   

Chromium (Cr) Micron Powder, Purity: 99.98 %, Size: 10 µm

Price range: $27.00 through $266.00
Select options This product has multiple variants. The options may be chosen on the product page
25 grams/24 €  100 grams/54 €   500 grams/165 €  1000 grams/235 €  Please contact us for quotes on larger quantities !!!

Chromium (Cr) Micron Powder

Purity: 99.98 %, Size: 10 µm

Technical Properties:

PURITY

99.98 %

PARTICLE SIZE

10 µm

CAS

7440-47-3

DENSITY

7.19 g/cm³

BOILING POINT

2475 °C

MELTING POINT

1875 °C

COEFF. OF EXPANSION @ 20ºC

6.2 x 10 ⁻⁶

MOHS HARDNESS @ 20ºC

9

ELECTRIC RESISTIVITY

12.9 microhm-cm

CRYSTAL STRUCTURE

Cubic, Body Centered

FORM  

Powder

APPLICATIONS

Aerospace, Alloys, Nuclear, Plasma Spray

                               
                
                   

Chromium (Cr) Micron Powder, Purity: 99.99 %, Size: 325 mesh

Price range: $32.00 through $322.00
Select options This product has multiple variants. The options may be chosen on the product page
25 grams/29 €  100 grams/67 €  500 grams/174 €  1000 grams/285 €  Please contact us for quotes on larger quantities !!!

Chromium (Cr) Micron Powder

Purity: 99.99 %, Size: 325 mesh

Technical Properties:

PURITY

99.99 %

PARTICLE SIZE

325 mesh

CAS

7440-47-3

DENSITY

7.19 g/cm³

BOILING POINT

2475 °C

MELTING POINT

1875 °C

COEFF. OF EXPANSION @ 20ºC

6.2 x 10 ⁻⁶

MOHS HARDNESS @ 20ºC

9

ELECTRIC RESISTIVITY

12.9 microhm-cm

CRYSTAL STRUCTURE

Cubic, Body Centered

FORM  

Powder

APPLICATIONS

Aerospace, Alloys, Ceramics, Electronics, Nuclear

 
       
                 

Chromium (Cr) Nanopowder/Nanoparticles, Purity: 99.95 %, Size: 100 nm, Metal Basis

Price range: $224.00 through $4,573.00
Select options This product has multiple variants. The options may be chosen on the product page
25 grams/198 €                        
100 grams/540 €                     
500 grams/2150 €                    
1000 grams/4030 € Please contact us for quotes on larger quantities !!!

Chromium (Cr) Nanopowder/Nanoparticles

Purity: 99.95 %, Size: 100 nm, Metal Basis

Chromium is a chemical element with symbol Cr and atomic number 24. It is the first element in group 6. It is a steely-grey, lustrous, hard and brittle metal which takes a high polish, resists tarnishing, and has a high melting point. Chromium is an element which is very useful and used in many different areas. There are too many different application areas where Chromium Nanoparticles/Nanopowder can be used like in metallurgy, metal ceramics, in diamond tool manufacturing. Also for Chromium plating Chromium Nanoparticles/Nanopowder are very useful and they give a shiny effect to the surface and also protect it. Nanopowder/Nanoparticle Chromium is a very hard metal. Therefore, in nanopowder/nanoparticle form, Chromium can be widely used in applications where mechanical strength is required. Chromium Nanoparticles/Nanopowder are used in ceramics, cutting and shaping tools and steel industry. In addition, Chromium Nanopowders/Nanoparticle are widely used as a catalyst.

Chromium (Cr) Nanopowder/Nanoparticles, Purity: 99.95 %, Size: 100 nm, Metal Basis

Price range: $224.00 through $4,574.00
Select options This product has multiple variants. The options may be chosen on the product page

Chromium (Cr) Nanopowder/Nanoparticles

Purity: 99.95 %, Size: 100 nm, Metal Basis

Chromium is a chemical element with symbol Cr and atomic number 24. It is the first element in group 6. It is a steely-grey, lustrous, hard and brittle metal which takes a high polish, resists tarnishing, and has a high melting point. Chromium is an element which is very useful and used in many different areas. There are too many different application areas where Chromium Nanoparticles/Nanopowder can be used like in metallurgy, metal ceramics, in diamond tool manufacturing. Also for Chromium plating Chromium Nanoparticles/Nanopowder are very useful and they give a shiny effect to the surface and also protect it. Nanopowder/Nanoparticle Chromium is a very hard metal. Therefore, in nanopowder/nanoparticle form, Chromium can be widely used in applications where mechanical strength is required. Chromium Nanoparticles/Nanopowder are used in ceramics, cutting and shaping tools and steel industry. In addition, Chromium Nanopowders/Nanoparticle are widely used as a catalyst.

Chromium (Cr) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 30-40 nm, Metal Basis

Price range: $208.00 through $539.00
Select options This product has multiple variants. The options may be chosen on the product page

Chromium (Cr) Nanopowder/Nanoparticles

Purity: 99.95%, Size: 30-40 nm, Metal Basis

Technical Properties:

Bulk Density (g/cm3) 0,15
True Density (g/cm3) 8,9
Color black
Average Particle Size (nm) 30-40
Specific Surface Area (m2/g) 10,0-40,0
Elemental Analysis Cr Fe Al Si Others
99.9 0.05 0.02 0.01 ≤0.01

Properties, Storage and Cautions:

Chromium nanopowder is highly reactive and flammable, therefore it should be handled with care and rapid moves, vibrations should be avoided. Powder should be kept away from sunlight, any kind of heating, moisture and impacts. Coagulation of the particles is a serious problem, so, Cr powder should be sealed under vacuum and should be kept in cool and dry conditions. Air contact should be avoided.

Applications:

Chromium is a very hard metal. Therefore, in nanopowder form,  it can be widely used in applications where mechanical strength is required. It can be used in ceramics, cutting and shaping tools and steel industry

Chromium (Cr) Sputtering Target

Price range: $81.00 through $405.00
Select options This product has multiple variants. The options may be chosen on the product page

Product 

Chromium (Cr) Sputtering Target

CAS No.

7440-47-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

51.996 g/mol

Melting Point

1,907 °C

Boiling Point

2,671 °C

Density

7.19 g/cm³

Product Codes

NCZ-1287K

Chromium (Cr) Sputtering Targets, indium, Purity: 99.95%, Size: 3”, Thickness: 0.125”

$750.00

Product 

Chromium (Cr) Sputtering Targets, indium, Purity: 99.95%, Size: 3'', Thickness: 0.125''

CAS No.

7440‑47‑3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 52.00 g/mol

Melting Point

 1,857 °C

Boiling Point

 2,672 °C

Density

 7.14 g/cm³

Product Codes

NCZ-2307K

Chromium (Cr) Sputtering Targets, indium, Purity: 99.95%, Size: 3”, Thickness: 0.125”

$649.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Silvery, shiny, hard, and brittle, chromium is a metal that resists corrosion and has a high mirror polish. Chromium sputtering targets are widely used in the automotive sector. Chromium sputtering targets work well as a shiny coating for bumpers and wheels. Chromium sputtering targets can be employed in a variety of vacuum applications, such as automotive glass coatings.

Because of its strong resistance to corrosion, chromium sputtering targets are a good choice for producing coatings that are resistant to corrosion. Hard material coatings made from chromium sputtering targets are used in industry to best protect engine parts like piston rings from premature wear and so increase the useful life of critical engine components.

Additionally, the production of batteries and solar cells uses chromium sputtering targets. In conclusion, chromium sputtering targets are employed in a variety of technologies for the physical deposition of thin films and functional coatings (the PVD method), in the manufacturing of electronic components, displays, and tools; in the vacuum chroming of watches, parts of household appliances, and the working surfaces of

Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.125”

$226.00

Product 

Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 3'', Thickness: 0.125''

CAS No.

7440‑47‑3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 51.9961 g/mol

Melting Point

 1,857 °C

Boiling Point

 2,672 °C

Density

 7.14 g/cm³

Product Codes

NCZ-2314K

Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.125”

$199.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Silvery, shiny, hard, and brittle, chromium is a metal that resists corrosion and has a high mirror polish. The automotive industry finds extensive use for chromium sputtering targets. Chromium sputtering targets work well as a shiny coating for bumpers and wheels. Chromium sputtering targets can be employed in a variety of vacuum applications, such as automotive glass coatings.

Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.125”

$423.00

Product 

Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 4'', Thickness: 0.125''

CAS No.

7440‑47‑3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 51.9961 g/mol

Melting Point

 1,857 °C

Boiling Point

 2,672 °C

Density

 7.14 g/cm³

Product Codes

NCZ-2313K

Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.125”

$368.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. W

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Silvery, shiny, hard, and brittle, chromium is a metal that resists corrosion and has a high mirror polish. The automotive industry finds extensive use for chromium sputtering targets. Chromium sputtering targets work well as a shiny coating for bumpers and wheels. Chromium sputtering targets can be employed in a variety of vacuum applications, such as automotive glass coatings.

hen selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.250”

$488.00

Product 

Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 4'', Thickness: 0.250''

CAS No.

7440‑47‑3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 51.9961 g/mol

Melting Point

 1,857 °C

Boiling Point

 2,672 °C

Density

 7.14 g/cm³

Product Codes

NCZ-2312K

Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.250”

$424.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Silvery, shiny, hard, and brittle, chromium is a metal that resists corrosion and has a high mirror polish. The automotive industry finds extensive use for chromium sputtering targets. Chromium sputtering targets work well as a shiny coating for bumpers and wheels. Chromium sputtering targets can be employed in a variety of vacuum applications, such as automotive glass coatings.

Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 6”, Thickness: 0.125”

$524.00

Product 

Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 6'', Thickness: 0.125''

CAS No.

7440‑47‑3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 51.9961 g/mol

Melting Point

 1,857 °C

Boiling Point

 2,672 °C

Density

 7.14 g/cm³

Product Codes

NCZ-2311K

Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 6”, Thickness: 0.125”

$455.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Silvery, shiny, hard, and brittle, chromium is a metal that resists corrosion and has a high mirror polish. The automotive industry finds extensive use for chromium sputtering targets. Chromium sputtering targets work well as a shiny coating for bumpers and wheels. Chromium sputtering targets can be employed in a variety of vacuum applications, such as automotive glass coatings.

Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 6”, Thickness: 0.250”

$661.00

Product 

Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 6'', Thickness: 0.250''

CAS No.

7440‑47‑3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 51.9961 g/mol

Melting Point

 1,857 °C

Boiling Point

 2,672 °C

Density

 7.14 g/cm³

Product Codes

NCZ-2310K

Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 6”, Thickness: 0.250”

$572.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Silvery, shiny, hard, and brittle, chromium is a metal that resists corrosion and has a high mirror polish. The automotive industry finds extensive use for chromium sputtering targets. Chromium sputtering targets work well as a shiny coating for bumpers and wheels. Chromium sputtering targets can be employed in a variety of vacuum applications, such as automotive glass coatings.

Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 8”, Thickness: 0.125”

$821.00

Product 

Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 8'', Thickness: 0.125''

CAS No.

7440‑47‑3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 51.9961 g/mol

Melting Point

 1,857 °C

Boiling Point

 2,672 °C

Density

 7.14 g/cm³

Product Codes

NCZ-2308K

Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 8”, Thickness: 0.125”

$710.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Silvery, shiny, hard, and brittle, chromium is a metal that resists corrosion and has a high mirror polish. The automotive industry finds extensive use for chromium sputtering targets. Chromium sputtering targets work well as a shiny coating for bumpers and wheels. Chromium sputtering targets can be employed in a variety of vacuum applications, such as automotive glass coatings.

Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 8”, Thickness: 0.250”

$770.00

Product 

Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 8'', Thickness: 0.250''

CAS No.

7440‑47‑3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 51.9961 g/mol

Melting Point

 1,857 °C

Boiling Point

 2,672 °C

Density

 7.14 g/cm³

Product Codes

NCZ-2309K

Chromium (III) Oxide (Cr2O3) 99.99% 4N Powder

Price range: $205.00 through $1,916.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Chromium (III) Oxide (Cr2O3) 99.99% 4N Powder
CAS No. 1308-38-9
Appearance Green
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1–5µm (Size Can be customized),  Ask for other available size range.
Ingredient Cr2O3
Molecular Weight 151.99 g/mol
Melting Point 2,435 °C
Boiling Point N/A
Density 5.22 g/cm³
Product Codes NCZ-318I
 

Chromium (III) Oxide (Cr2O3) Nanoparticles, 50nm, >99.9% Purity, 25g

$303.00
Product Chromium (III) Oxide (Cr2O3) Nanoparticles, 50nm, >99.9% Purity, 25g
CAS No. 1308-38-9
Appearance Green fine
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 50nm (Size Can be customized),  Ask for other available size range.
Ingredient Cr2O3
Molecular Weight 151.99 g/mol
Melting Point N/A
Boiling Point N/A
Density 5.22 g/cm³
Product Codes NCZ-319I

Chromium BZACAC

Price range: $16.00 through $50.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Chromium BZACAC
CAS No. 16432-36-3
Appearance Green fine crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Cr(C₁₀H₇O₂)₃
Molecular Weight 535.53 g/mol
Melting Point 237.5 °C
Boiling Point N/A
Density N/A
Product Codes NCZ-264R
 

Chromium Carbide (Cr3C2) Nanopowder/Nanoparticles, Purity: 99.75+%, Size: 25-125 nm

Price range: $49.00 through $401.00
Select options This product has multiple variants. The options may be chosen on the product page
5 grams/44 € 25 grams/156 € 100 grams/354 €
Please contact us for quotes on larger quantities !!!

Chromium Carbide (Cr3C2) Nanopowder/Nanoparticles

Purity: 99.75+%, Size: 25-125 nm

Applications:

Chromium carbide nanoparticles is used as a thermal spray material for protection of the metal surface beneath and as a coating for seals, bearings, and valve seals. It also used as additive to corrosion resistant and wear resistant materials. It is also used as fine crystal phase in sintered carbides.  

Chromium carbide nanoparticles

$0.00

Chromium Carbide Nanoparticles

Chromium Carbide Nanopowder

Nano Chromium Carbide Powder

MF: Cr3C2
Chemical Name: Chromium Carbide
Purity: > 99.99%
APS: 100 nm (Size Customization possible)
Form: Nanopowder
Product Number: #NCZ1501
CAS Number 12012-35-0
Note: We can supply different size products of microparticles and Nanoparticles Size range powder according to client’s requirements.