Titanium Nitride (TiN) Sputtering Targets, Purity: 99.5%, Size: 4”, Thickness: 0.250”

$1,111.00

Product 

Titanium Nitride (TiN) Sputtering Targets, Purity: 99.5%, Size: 4'', Thickness: 0.250''

CAS No.

25583-20-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

61.88 g/mol

Melting Point

 ~2950 °C

Boiling Point

~4300 °C

Density

5.22 g/cm³

Product Codes

NCZ-1600K

Graphite (C) Nanopowder/Nanoparticles, Purity: 99.9 %, Size: < 50 nm

Price range: $43.00 through $1,111.00
Select options This product has multiple variants. The options may be chosen on the product page
5 grams/38 € 25 grams/96 €                        
100 grams/245 €                     
500 grams/686 €                    
1000 grams/980 € Please contact us for quotes on larger quantities !!!

Graphite (C) Nanopowder/Nanoparticles

Purity: 99.9 %, Size: < 50 nm

Barium Titanate Sputtering Target BaTiO3

Price range: $920.00 through $1,110.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Barium Titanate Sputtering Target BaTiO3
CAS No. 12047-27-7
Appearance Solid, white to light gray ceramic
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient BaTiO3
Molecular Weight 304.98 g/mol
Melting Point 1,625 °C
Boiling Point N/A
Density 6.02 g/cm³
Product Codes NCZ-105H

Cerium Oxide (CeO2) Sputtering Targets, Purity: 99.99%, Size: 5”, Thickness: 0.125”

$1,110.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

The most prevalent rare-earth element in the crust of the earth is cerium, a metal that belongs to the lanthanide series. Cerium oxide's high refractive index and dielectric constant make it suitable for a wide range of optical and electrical applications. Additionally, cerium oxide can be used for corrosion protection coatings rather than coatings based on chromate.

Magnesium Oxide (MgO) Sputtering Targets, elastomer, Purity: 99.95%, Size: 2”, Thickness: 0.125”

$1,109.00

Product 

Magnesium Oxide (MgO) Sputtering Targets, elastomer, Purity: 99.95%, Size: 2'', Thickness: 0.125''

CAS No.

1309-48-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

40.30 g/mol

Melting Point

 ~2852 °C

Boiling Point

~3600 °C

Density

 ~3.58 g/cm³

Product Codes

NCZ-1958K

Gadolinium (Gd) Micron Powder, Purity: 99.5 %, Size: 325 mesh

Price range: $207.00 through $1,109.00
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25 grams/184€ 100 grams/595€ 500 grams/ 984€   Please contact us for quotes on larger quantities !!!

Gadolinium (Gd) Micron Powder

Purity: 99.5 %, Size: 325 mesh

Applications:

Gadolinium powder is relatively stable in dry air. It does however oxidize in moisture forming oxides. It can be found in minerals such as xenotime, monazite and bastnaesite. Gadolinium is a rare earth metal that possesses unique properties advantageous to specialized applications such as semiconductor fabrication and nuclear reactor shielding. Gadolinium has excellent magnetic properties. It is weakly magnetic at room temperature, but becomes strongly magnetic or ferromagnetic below room temperatures. Gadolinium powder has applications in electronics to increase the speed and capacity of computer memory. It has applications in medical magnetic resonance imaging (MRI) where it is used as intravenously administered, contrasting agents to enhance images. It also has applications as a dopant in glass.

Strong Graphene Aerogel, Diameter: 2±0.4 cm, Height: 2±0.4 cm

Price range: $276.00 through $1,109.00
Select options This product has multiple variants. The options may be chosen on the product page
Please contact us for quotes for larger quantities !   Graphene aerogels are materials which have elasticity and they can easily gain their original form after some compression. In addition, the low density of graphene aerogels enables them to be very absorbent. This material can absorb more than 850 times of its own weight. This property means that it could be useful for environmental clean-ups like oil spills, and the aerogels only need to be picked up later after absorbing the spilled material. Graphene aerogel may also have some applications in both the storage and the transfer of energy by enabling the creation of lighter, higher-energy-density batteries and vigorous research is being done on the matter.

Bismuth Ferrite (BiFeO3) Sputtering Targets, indium, Purity: 99.9%, Size: 2”, Thickness: 0.125”

$1,108.00

Product 

Bismuth Ferrite (BiFeO3) Sputtering Targets, indium, Purity: 99.9%, Size: 2'', Thickness: 0.125''

CAS No.

 12022-74-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 240.76 g/mol

Melting Point

 ~930 °C

Boiling Point

N/A

Density

 ~8.3–8.5 g/cm³

Product Codes

NCZ-2414K

Tungsten Oxide (WO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”

$1,107.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Aluminum Oxide (Al2O3) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.250”

$1,106.00

Product 

Aluminum Oxide (Al2O3) Sputtering Targets, Purity: 99.999%, Size: 4'', Thickness: 0.250''

CAS No.

 1344-28-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

101.96 g/mol

Melting Point

~2,072 °C

Boiling Point

~2,977 °C

Density

~3.97–3.98 g/cm³

Product Codes

NCZ-2534K

Lanthanum Manganate (LaMnO3) Sputtering Targets, Purity: 99.9%, Size: 6”, Thickness: 0.125”

$1,106.00

Product 

Lanthanum Manganate (LaMnO3) Sputtering Targets, Purity: 99.9%, Size: 6'', Thickness: 0.125''

CAS No.

13538-87-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 ~1–5 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

240.83 g/mol

Melting Point

 ~2300 °C

Boiling Point

N/A

Density

~6.3 – 6.8 g/cm³

Product Codes

NCZ-2133K

Barium Titanate (BaTiO3) Sputtering Targets, elastomer, Purity: 99.99%, Size: 3”, Thickness: 0.125”

$1,105.00

Product 

Barium Titanate (BaTiO3) Sputtering Targets, elastomer, Purity: 99.99%, Size: 3'', Thickness: 0.125''

CAS No.

 12047‑27‑7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

1 – 5 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

~233.19 g/mol

Melting Point

~1625 °C

Boiling Point

N/A

Density

 ~6.02 g/cm³

Product Codes

NCZ-2450K

Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles Dispersion in 1, 2-Propanediol, Size: 12 nm, Gamma, 18 wt%

Price range: $69.00 through $1,105.00
Select options This product has multiple variants. The options may be chosen on the product page
30 ml/69 € 60 ml/125 € 120 ml/235 € 500 ml/696 € 1000 ml/1105 €     Please contact us for quotes on larger quantities !!! Aluminum

Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles Dispersion in Ethylene Glycol, Size: 12 nm, Gamma, 18 wt%

Price range: $69.00 through $1,105.00
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Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles Dispersion in Ethylene Glycol Size: 12 nm, Gamma, 18 wt%

Titanium Oxynitride Nanoparticle, APS: 20 nm, Purity: 99.9%

Price range: $88.00 through $1,105.00
Select options This product has multiple variants. The options may be chosen on the product page
25 grams: 78€ 100 grams: 245 € 500 grams: 584 € 1 kg: 976€ Titanium Oxynitride Nanoparticles, Average Particle Size: 20 nm, Purity: 99.9 % Performance characteristics Nano titanium oxynitride powder is prepared by high-frequency plasma gas phase synthesis method, with high purity, no free carbon black dot impurities, no ammonium chloride impurities, small particle size, uniform distribution, large specific surface area, high surface activity, and low bulk density The nano-TiON in the photocatalyst has the advantages of stable chemical properties, strong oxidation-reduction and resistance to photocathode corrosion, insoluble, non-toxic, and low cost; it is widely used as a catalyst for photocatalytic oxidation reactions. It removes pollutants in the atmosphere and water and becomes an ideal material for solving energy and environmental problems. Applications
  • Nano titanium oxynitride is used in sewage treatment: Industrial sewage contains a lot of toxic and harmful organic substances, and these pollutants are difficult to eliminate with biological treatment technology. Nano-TiON has a strong oxidizing effect under light conditions, which can cause the hydrocarbons, halogenated substances, carboxylic acids, etc. in the water to undergo redox reactions, and gradually degrade, completely oxidized into environmentally friendly CO2 and H2O and other harmless substances;
  • Nano titanium oxynitride is used in photocatalyst: The band gap of nano-TiON is less than 3.2eV, so it can still achieve catalytic degradation of toxic and harmful substances in the air under the condition of visible light with wavelengths above 400nm, and achieve the effect of purifying the environment, which is better than pure sharp Titanium dioxide photocatalyst;
  • Nano titanium oxynitride is used in self-cleaning coatings: the product has a strong catalytic oxidation effect. Adding it to the coating body can automatically decompose the organic pollutants that fall or adhere to the coating surface, and degrade into CO2, water and other substances. , Taken away with the circulation of air, in order to achieve the effect of self-cleaning;
  • Nano titanium oxynitride is used as an antibacterial agent: Nano-TiON has a strong photocatalytic sterilization effect. Under visible light irradiation, TiON decomposes water into free radicals, which enter the cell wall of bacteria, destroy the cell wall, degrade the tissue structure of the cell, and then kill the cell, which has an antibacterial and bactericidal effect;
  • Nano titanium oxynitride is used in antibacterial composite materials: TiON has a strong photocatalytic ability. Add an appropriate amount of nano TiON to polymer materials such as plastics, rubber, and fibers to make polymer composite materials, even in weak light environments , It can also prevent products from mildew and bacteria breeding;
  • nanometer titanium oxynitride is mainly used in the aerospace field. It can be used as a very thin coating to harden and protect smooth surfaces. It can also be used as a non-toxic product in medical transplantation.
Packaging and storage This product is packaged in an inert gas plastic bag, sealed and stored in a dry, cool environment. It should not be exposed to the air to prevent oxidation and agglomeration due to moisture, which will affect the dispersion performance and use effect; the number of packages can be provided according to customer requirements and packed.

Lithium Phosphate (Li3PO4) Sputtering Targets, elastomer, Purity: 99.95%, Size: 3”, Thickness: 0.125”

$1,104.00

Product 

Lithium Phosphate (Li3PO4) Sputtering Targets, elastomer, Purity: 99.95%, Size: 3'', Thickness: 0.125''

CAS No.

10377-52-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 115.79 g/mol

Melting Point

 ~837 °C

Boiling Point

N/A

Density

 ~2.53 g/cm³

Product Codes

NCZ-2017K

Holmium (Ho) Micron Powder, Purity: 99.5 %, Size: 325 mesh

Price range: $16.00 through $1,104.00
Select options This product has multiple variants. The options may be chosen on the product page
1 gram/15 € 5 grams/49 € 25 grams/195 € 100 grams/980 €  

Hafnium (Hf) Micron Powder, Purity: 99.9 %, Size: 325 mesh

Price range: $107.00 through $1,104.00
Select options This product has multiple variants. The options may be chosen on the product page
25 grams/95 € 100 grams/247 € 500 grams/690 € 1000 grams/980 €
Please contact us for quotes on larger quantities !!!

Hafnium (Hf) Micron Powder

Purity: 99.9 %, Size: 325 mesh

Technical Properties:

PURITY

99.9 %

PARTICLE SIZE

325 mesh

CAS

7440-58-6

DENSITY

13.09 g/cm³

BOILING POINT

5400 °C

MELTING POINT

2222 °C

COEFF. OF EXPANSION @ 20ºC

5.9 x 10⁻⁶

ELECTRIC RESISTIVITY

35.1 microhm-cm

CRYSTAL STRUCTURE

Hexagonal

FORM  

Powder

APPLICATIONS

Alloys Electronics Fillers Nuclear

                                                            Please Click for MSDS

Indium Zinc Oxide/IZO (InZnO) Sputtering Targets, indium, Purity: 99.99%, Size: 3”, Thickness: 0.125”

$1,102.00

Product 

Indium Zinc Oxide/IZO (InZnO) Sputtering Targets, indium, Purity: 99.99%, Size: 3'', Thickness: 0.125''

CAS No.

Indium oxide (In₂O₃): 1312-43-2
Zinc oxide (ZnO): 1314-13-2

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

90% In₂O₃ (277.64 g/mol), 10% ZnO (81.38 g/mol) → ~260–270 g/mol (estimated)

Melting Point

Indium oxide: ~1910 °C Zinc oxide: ~1975 °C

Boiling Point

N/A

Density

~7.1 g/cm³

Product Codes

NCZ-2193K

Aluminum Oxide (Al2O3) Sputtering Targets, Purity: 99.99%, Size: 6”, Thickness: 0.125”

$1,101.00

Product 

Aluminum Oxide (Al2O3) Sputtering Targets, Purity: 99.99%, Size: 6'', Thickness: 0.125''

CAS No.

 1344-28-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

101.96 g/mol

Melting Point

~2,072 °C

Boiling Point

~2,977 °C

Density

~3.97–3.98 g/cm³

Product Codes

NCZ-2533K

Aluminum Oxide (Al2O3) Sputtering Targets, Purity: 99.99%, Size: 6”, Thickness: 0.250”

$1,101.00

Product 

Aluminum Oxide (Al2O3) Sputtering Targets, Purity: 99.99%, Size: 6'', Thickness: 0.250''

CAS No.

 1344-28-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

101.96 g/mol

Melting Point

~2,072 °C

Boiling Point

~2,977 °C

Density

~3.97–3.98 g/cm³

Product Codes

NCZ-2531K

Barium Zirconate (BaZrO3) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.250”

$1,101.00

Product 

Barium Zirconate (BaZrO3) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.250''

CAS No.

12009‑21‑1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

1 – 5 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

276.55 g/mol

Melting Point

N/A

Boiling Point

N/A

Density

~5.52 g/cm³ (theoretical)

Product Codes

NCZ-2443K

Tungsten Oxide (WO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”

$1,101.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Prime CZ-Si Wafer, Size: 8”, Orientation: (100), Phospor Doped, Resistivity: 0.001-0.005 (ohm.cm), 1-Side Polished, Thickness: 725 ± 20 μm

Price range: $56.00 through $1,100.00
Select options This product has multiple variants. The options may be chosen on the product page
Prime CZ-Si Wafer Size: 8”, Orientation: (100), Phospor Doped, 1-Side Polished, Thickness: 725 ± 20 μm Technical Properties: Quality Prime

Borosilicate Wafer, Size: 4”, 2-Side polished, Thickness: 500 ± 20 μm

Price range: $74.00 through $1,098.00
Select options This product has multiple variants. The options may be chosen on the product page
Boroslicate Wafer Size: 4”, 2-Side polished, Thickness: 500 ± 20 Technical Properties: Materials Borosilicate Size (inch) 4” Orientation Coating Thickness (μm)

Praseodymium Calcium Manganate (Pr0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”

$1,097.00

Product 

Praseodymium Calcium Manganate (Pr0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''

CAS No.

N/A

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

1–5 μm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

237.66 g/mol

Melting Point

N/A

Boiling Point

N/A

Density

~6.4–6.8 g/cm³

Product Codes

NCZ-1781K

Neodymium (Nd) Micron Powder, Purity: 99.5 %, Size: 325 mesh

Price range: $18.00 through $1,097.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Neodymium is the most abundant of the rare earths after cerium and lanthanum. It can be found in monazite and bastnäsite ores. It is a reactive metal and it reacts with oxygen forming oxide which breaks into small particles leading to more oxidation of the metal. Neodymium has excellent magnetic properties. Its magnets are the strongest permanent magnets known. It is used in electronics such as computer hard drives, loudspeakers, microphones, ear buds, and hearing aids. Neodymium magnets are also found in many products, such as elevators, hybrid cars, industrial motors, air conditioners, industrial tools and electricity turbine generators. Neodymium is also used as a dopant agent in glass and optical fiber industry. 

Lithium Cobalt Oxide (LiCoO2) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”

$1,096.00

Product 

Lithium Cobalt Oxide (LiCoO2) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.250''

CAS No.

12190‑79‑3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

97.87 g/mol

Melting Point

~1,130 °C

Boiling Point

N/A

Density

~4.80–4.95 g/cm³

Product Codes

NCZ-2048K

Antimony Telluride (Sb2Te3) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.125”

$1,095.00

Product 

Antimony Telluride (Sb2Te3) Sputtering Targets, Purity: 99.999%, Size: 3'', Thickness: 0.125''

CAS No.

12068-69-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

626.32 g/mol

Melting Point

620 °C

Boiling Point

N/A

Density

 6.50 g/cm³

Product Codes

NCZ-2497K

Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 7”, Thickness: 0.125”

$1,095.00

Product 

Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 7'', Thickness: 0.125''

CAS No.

 12201-04-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

<5 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

234.80 g/mol

Melting Point

~1,770 °C (ceramic decomposes)

Boiling Point

N/A

Density

 ~6.5–6.6 g/cm³

Product Codes

NCZ-2082K

(-COOH) Functionalized Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: 18-28 nm

Price range: $42.00 through $1,095.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Multi Walled Carbon Nanotubes have a variety of potential applications in different fields. These applications include medicine, mechanics, electric-electronics, chemicals, energy and others. It can be applied in, 1-drug delivery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium batteries, 8-gas-discharge tubes, 9-flat panel displays, 10-supercapacitors, 11-transistors, 12-solar cells, 13-photoluminescence, 14-templates

Aluminum Laminated Film for Pouch Cell Case

Price range: $357.00 through $1,095.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Aluminum Laminated Film for Pouch Cell Case is used as casing material for polymer Li-Ion battery.

Monolayer Graphene on SiO2/Si Substrate, Size: 2″

Price range: $269.00 through $1,094.00
Select options This product has multiple variants. The options may be chosen on the product page
1 piece/ 269 €    5 pieces/ 1094 €   Contact us for tailored quotes on larger quantities & experience exceptional solutions from our

Platinum Foil, Purity 99.95%, Thickness: 0.5mm, 1×1 cm

Price range: $232.00 through $1,094.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications

  • Dental veneers
  • Fabrication of electrochemically stable microelectrode arrays
  • A counter electrode for the fabrication of supercapacitors
  • An enzyme electrode probe for potential usage in biosensors
  • Arc-casting, hot-pressing, machining, vacuum-arc melting, casting, custom-alloying, extruding, rolling, cutting, vacuum-sealing, and bonding.
  • Electronics industry for electrical contacts which might be subject to high temperatures
  • Make weights and measure standards

Aluminum Oxide (Al2O3) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.125”

$1,091.00

Product 

Aluminum Oxide (Al2O3) Sputtering Targets, Purity: 99.999%, Size: 4'', Thickness: 0.125''

CAS No.

 1344-28-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

101.96 g/mol

Melting Point

~2,072 °C

Boiling Point

~2,977 °C

Density

~3.97–3.98 g/cm³

Product Codes

NCZ-2536K

Prime CZ-Si Wafer, Size: 6”, Orientation: (111), Phosphor Doped, Resistivity: 10-20 (ohm.cm), 1-Side Polished, Thickness: 675 ± 20 μm

Price range: $58.00 through $1,091.00
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1 piece/52 € 5 pieces/220 € 25 pieces/975 € Please contact us for quotes on larger quantities !!!

Prime CZ-Si Wafer

Size: 6”, Orientation: (111), Phosphor Doped, 1-Side Polished, Thickness: 675 ± 20 μm

Technical Properties:

Quality Prime
Materials CZ-Si
Size (inch) 6”
Orientation (111)
Coating  
Thickness (μm) 675 ± 20
Doping Phosphor
Resistivity (ohm.cm) 10-20
Polished One Side
Silicon is one of the most common elements on earths crust. Main usage of Silicon wafers is electronics and technology. Silicon wafers have very flat and mirror like surfaces. It is produced by Czochralski method to obtain the highest purity. Depending on the usage area, silicon wafers can be doped with different materials to tailor its purity accordingly. The amount and type of dopants highly affect the electronic properties. Galium, indium, boron and nitrogen are some of the dopants that can be used in production process. Silicon wafers are used in semiconductors, microchips, integrated circuits, smartphones, computers etc. Silicon is the key platform for semiconductor gadgets. A wafer is just but a thin slice of the semiconductor material that acts as a substratum for microelectronic devices fitted in and above the wafer.

Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: 8-18 nm

Price range: $35.00 through $1,090.00
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Applications:

Multi Walled Carbon Nanotubes  have a variety of potential applications in different fields. These applications include medicine, mechanics, electric-electronics, chemicals, energy and others. It can be applied in, drug delivery, biosensors, CNT composites, catalysis, nanoprobes, hydrogen storage, lithium batteries, gas-discharge tubes, flat panel displays,supercapacitors, transistors, solar cells, photoluminescence, templates.

Boron Carbide (B4C) Sputtering Targets, indium, Purity: 99.5%, Size: 4”, Thickness: 0.125”

$1,089.00

Product 

Boron Carbide (B4C) Sputtering Targets, indium, Purity: 99.5%, Size: 4'', Thickness: 0.125''

CAS No.

12069‑32‑8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 ≈ 55.26 g/mol

Melting Point

~2350 °C

Boiling Point

 > 3500 °C (decomposes and volatilizes quickly above ~2800 °C)

Density

approximately ~2.5 g/cm³ for typical solid form

Product Codes

NCZ-2376K

Vanadium Aluminum Carbide (V4AlC3) MAX Phase Micron-Powder

Price range: $539.00 through $1,089.00
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Product Vanadium Aluminum Carbide (V4AlC3) MAX Phase Micron-Powder
CAS No. 1019635-34-7
Appearance Dark gray to black
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 40μm (Size Can be customized),  Ask for other available size range.
Ingredient V4AlC3
Molecular Weight 266.78 g/mol
Melting Point N/A
Boiling Point N/A
Density 5.24 g/cm³
Product Codes NCZ-593I

Titanate Molecular Sieve (TS-1) Powder, 100-300 nm

Price range: $407.00 through $1,089.00
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Product Titanate Molecular Sieve (TS-1) Powder, 100-300 nm
CAS No. 1318-02-1
Appearance Dry, white
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 100-300nm (Size Can be customized),  Ask for other available size range.
Ingredient Ti–SiO₂
Molecular Weight 60.08 g/mol
Melting Point N/A
Boiling Point N/A
Density 1.9–2.3 g/cm³
Product Codes NCZ-566I
 

Surface Modified Vanadium Carbide (V4C3Tx) MXene Multilayer Nanosheet

Price range: $407.00 through $1,089.00
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Product Surface Modified Vanadium Carbide (V4C3Tx) MXene Multilayer Nanosheet
CAS No. 1317-61-9
Appearance Dark gray to black
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 10–10nm (Size Can be customized),  Ask for other available size range.
Ingredient V₄C₃Tₓ
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 2.0–3.5 g/cm³
Product Codes NCZ-547I
 

Monolayer Molybdenum Disulfide (MoS2) Nanopowder, Nano Flakes

Price range: $506.00 through $1,089.00
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Product Monolayer Molybdenum Disulfide (MoS2) Nanopowder, Nano Flakes
CAS No. 1317-33-5
Appearance Black to dark gray
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 100nm (Size Can be customized),  Ask for other available size range.
Ingredient MoS2
Molecular Weight 160.07 g/mol
Melting Point N/A
Boiling Point N/A
Density 5.06 g/cm³
Product Codes NCZ-457I

High Purity 5N (99.999%) Sulfur (S) Flakes (1-10mm)

Price range: $335.00 through $1,089.00
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Product High Purity 5N (99.999%) Sulfur (S) Flakes (1-10mm)
CAS No. 7704-34-9
Appearance Pale yellow to bright yellow
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1-10mm (Size Can be customized),  Ask for other available size range.
Ingredient S
Molecular Weight 32.07 g/mol
Melting Point 115 °C
Boiling Point 445 °C
Density 2.07 g/cm³
Product Codes NCZ-397I

99.9wt% Carboxylated Hollow Mesoporous Silica Solution, 5 mg/mL (Spherical)

Price range: $678.00 through $1,089.00
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Product 99.9wt% Carboxylated Hollow Mesoporous Silica Solution, 5 mg/mL (Spherical)
CAS No. 7631-86-9
Appearance White to slightly opalescent
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 100–500nm (Size Can be customized),  Ask for other available size range.
Ingredient (SiO2)x(-COOH)y
Molecular Weight 60.08 g/mol
Melting Point N/A
Boiling Point N/A
Density 2.0–2.2 g/cm³
Product Codes NCZ-270I

99.9wt% Aminated Hollow Mesoporous Silica Solution, 5 mg/mL (Spherical)

Price range: $678.00 through $1,089.00
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Product 99.9wt% Aminated Hollow Mesoporous Silica Solution, 5 mg/mL (Spherical)
CAS No. 7631-86-9
Appearance Milky-white or slightly translucent
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 100–500nm (Size Can be customized),  Ask for other available size range.
Ingredient SiO₂
Molecular Weight 60.08 g/mol
Melting Point N/A
Boiling Point N/A
Density 2.0–2.2 g/cm³
Product Codes NCZ-268I

10 mL Gold (Au) Nanowire Dispersion

$1,089.00
Product 10 mL Gold (Au) Nanowire Dispersion
CAS No. 7440-57-5
Appearance Pale yellow, light red, or brownish tint
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Au
Molecular Weight 196.97 g/mol
Melting Point 1064 °C
Boiling Point 2970 °C
Density N/A
Product Codes NCZ-115I
 

Zirconium Sputtering Target Zr

Price range: $99.00 through $1,089.00
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Product Zirconium Sputtering Target Zr
CAS No. 7440-67-7
Appearance Silvery-white, lustrous metal. 
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Zr
Molecular Weight 91.224 g/mol
Melting Point N/A
Boiling Point N/A
Density 6.52 g/cm³
Product Codes NCZ-150H

Carbon Nanotubes(CNT) Modified Graphene Aerogel, Diameter: 2±0.4 cm, Height: 2±0.4 cm

Price range: $273.00 through $1,089.00
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1 piece/ 273 € 5 pieces/ 1089 €  Contact us for tailored quotes on larger quantities & experience exceptional solutions from our experts.

Iron Oxide (Fe3O4) Sputtering Targets, Purity: 99.9%, Size: 6”, Thickness: 0.250”

$1,088.00

Product 

Iron Oxide (Fe3O4) Sputtering Targets, Purity: 99.9%, Size: 6'', Thickness: 0.250''

CAS No.

1317‑61‑9

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 231.6 g/mol

Melting Point

~1,597 °C

Boiling Point

 ~2,623 °C (material may decompose before boiling)

Density

 ~5.17 g/cm³ (sintered target)

Product Codes

NCZ-2166K

Boron (B) Micron Powder, Purity: 99 %, Size: < 1 µm, Amorphous

Price range: $90.00 through $1,087.00
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25 grams/80 € 100 grams/150 € 500 grams/670 € 1000 grams/960 €
Please contact us for quotes on larger quantities !!!

Boron (B) Micron Powder

Purity: 99 %, Size: < 1 µm, Amorphous

Technical Properties:

PURITY

 99 %

PARTICLE SIZE

< 1 µm

CAS

7440-42-8

BOILING POINT

2100 °C

MELTING POINT

2600 °C

ELECTRIC RESISTIVITY

4 x 10 ⁶ microhm-cm

MOHS HARDNESS @ 20ºC

9.3

FORM  

Powder

APPLICATIONS

Aerospace, Ceramics, Fuel Source, Nuclear

                     

(-COOH) Functionalized Short Single Walled Carbon Nanotubes, Purity: > 65%

Price range: $101.00 through $1,086.00
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Applications:

Single Walled Carbon Nanotubes have a variety of potential applications in different fields. These applications include medicine, mechanics, electric-electronics, chemicals, energy and others. It can be applied in, 1-drug delivery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium batteries, 8-gas-discharge tubes, 9-flat panel displays, 10-supercapacitors, 11-transistors, 12-solar cells, 13-photoluminescence, 14-templates  

Praseodymium (III, IV) Oxide (Pr6O11) 99.9% 3N Powder

Price range: $194.00 through $1,085.00
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Product Praseodymium (III, IV) Oxide (Pr6O11) 99.9% 3N Powder
CAS No. 12037-29-5
Appearance Dark brown to black
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1–10µm (Size Can be customized),  Ask for other available size range.
Ingredient Pr6O11
Molecular Weight 1021.44 g/mol
Melting Point 2,180 °C
Boiling Point N/A
Density 6.5–6.9 g/cm³
Product Codes NCZ-498I

Europium (III) Oxide (Eu2O3) 99.999% 5N Powder

Price range: $183.00 through $1,085.00
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Product Europium (III) Oxide (Eu2O3) 99.999% 5N Powder
CAS No. 1308-96-9
Appearance White
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 10–100µm (Size Can be customized),  Ask for other available size range.
Ingredient Eu2O3
Molecular Weight 351.296  g/mol
Melting Point 2350°C
Boiling Point N/A
Density 7.42 g/cm³
Product Codes NCZ-343I
 

Graphene Ethanol Dispersion, Purity: 99.5%, Graphene: 1 wt%

Price range: $75.00 through $1,083.00
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30 ml: 75 € 60 ml: 130 €                         

Nickel Oxide (NiO) Sputtering Targets, indium, Purity: 99.95%, Size: 2”, Thickness: 0.125”

$1,082.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Molybdenum Disilicide (MoSi2) Sputtering Targets, indium, Purity: 99.95%, Size: 3”, Thickness: 0.125”

$1,082.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

18650 Cylinder Cell Case

Price range: $230.00 through $1,082.00
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Applications

18650 Cylinder Cell Case with Anti-Explosive Cap & Insulation O-ring

Magnesium Oxide (MgO) Sputtering Targets, Purity: 99.95%, Size: 7”, Thickness: 0.250”

$1,080.00

Product 

Magnesium Oxide (MgO) Sputtering Targets, Purity: 99.95%, Size: 7'', Thickness: 0.250''

CAS No.

1309-48-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

40.30 g/mol

Melting Point

 ~2852 °C

Boiling Point

~3600 °C

Density

 ~3.58 g/cm³

Product Codes

NCZ-1963K

Titanium Dioxide (TiO2) Sputtering Targets, indium, Purity: 99.9%, Size: 3”, Thickness: 0.125”, Grey to Black

$1,080.00

Product 

Titanium Dioxide (TiO2) Sputtering Targets, indium, Purity: 99.9%, Size: 3'', Thickness: 0.125'', Grey to Black

CAS No.

13463‑67‑7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

TiO₂ (black granules) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

79.94 g/mol

Melting Point

~1,843 °C

Boiling Point

~2,972 °C

Density

~4.23 g/cm³

Product Codes

NCZ-1423K

Zinc Oxide (ZnO) Sputtering Targets, indium, Purity: 99.9%, Size: 3”, Thickness: 0.125”

$1,079.00

Product 

Zinc Oxide (ZnO) Sputtering Targets, indium, Purity: 99.9%, Size: 3'', Thickness: 0.125''

CAS No.

1314-13-2

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 (ZnO) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

81.38 g/mol

Melting Point

1975 °C

Boiling Point

N/A

Density

5.61 g/cm³

Product Codes

NCZ-1494K