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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Product	Vanadium (V) Sputtering Targets, Purity: 99.5%, Size: 3'', Thickness: 0.250''
CAS No.	7440-62-2
Appearance	Powder
Purity	≥99%, ≥99.9%, ≥95% (Other purities are also available)
APS	N/A (Size Can be customized), Ask for other available size ranges.
Ingredient	N/A
Molecular Weight	50.9415 g/mol
Melting Point	1910 °C
Boiling Point	3407 °C
Density	6.11 g/cm³
Product Codes	NCZ-1547K

Product	Vanadium Aluminum Carbide (V2AlC) MAX Phase Micron-Powder (1-40μm), 10g
CAS No.	12179-42-9
Appearance	Dark gray to black
Purity	≥99%, ≥99.9%, ≥95%(Other purities are also available)
APS	1-40μm (Size Can be customized), Ask for other available size range.
Ingredient	V2AlC
Molecular Weight	140.8 g/mol
Melting Point	N/A
Boiling Point	N/A
Density	3.99–4.85 g/cm³
Product Codes	NCZ-592I

Product	Vanadium Aluminum Carbide (V4AlC3) MAX Phase Micron-Powder
CAS No.	1019635-34-7
Appearance	Dark gray to black
Purity	≥99%, ≥99.9%, ≥95%(Other purities are also available)
APS	40μm (Size Can be customized), Ask for other available size range.
Ingredient	V4AlC3
Molecular Weight	266.78 g/mol
Melting Point	N/A
Boiling Point	N/A
Density	5.24 g/cm³
Product Codes	NCZ-593I

Product	Vanadium Carbide (V2C) MXene Multilayer Flakes
CAS No.	12179-42-9
Appearance	Dark gray to black
Purity	≥99%, ≥99.9%, ≥95%(Other purities are also available)
APS	100nm (Size Can be customized), Ask for other available size range.
Ingredient	V2C
Molecular Weight	108.9 g/mol
Melting Point	N/A
Boiling Point	N/A
Density	6.0 g/cm³
Product Codes	NCZ-594I

Product	Vanadium Carbide (VC) Sputtering Target
CAS No.	12070-10-9
Appearance	Powder
Purity	≥99%, ≥99.9%, ≥95% (Other purities are also available)
APS	NA (Size Can be customized), Ask for other available size ranges.
Ingredient	N/A
Molecular Weight	62.95 g/mol
Melting Point	~2,810 °C
Boiling Point	~3,900 °C
Density	~5.77 g/cm³
Product Codes	NCZ-1338K

Product	Vanadium Carbide Powder -100/+270 Mesh
CAS No.	12070-10-9
Appearance	Powder
Purity	≥99%, ≥99.9%, ≥95% (Other purities are also available)
APS	-100/+270 Mesh (Size Can be customized), Ask for other available size ranges.
Ingredient	N/A
Molecular Weight	62.95 g/mol
Melting Point	~2,810 °C
Boiling Point	~3,900 °C
Density	~5.77 g/cm³
Product Codes	NCZ-1207K

Product	Vanadium Carbide Powder ( VC, 99.5%, <2um)
CAS No.	12070-10-9
Appearance	Powder
Purity	≥99%, ≥99.9%, ≥95% (Other purities are also available)
APS	<2um (Size Can be customized), Ask for other available size ranges.
Ingredient	N/A
Molecular Weight	62.95 g/mol
Melting Point	~2,810 °C
Boiling Point	~3,900 °C
Density	~5.77 g/cm³
Product Codes	NCZ-1206K

Product	Vanadium Oxide (V2O5) Sputtering Target
CAS No.	1314-62-1
Appearance	Powder
Purity	≥99%, ≥99.9%, ≥95% (Other purities are also available)
APS	NA (Size Can be customized), Ask for other available size ranges.
Ingredient	N/A
Molecular Weight	181.88 g/mol
Melting Point	~690 °C
Boiling Point	~1,750 °C
Density	~3.36 g/cm³
Product Codes	NCZ-1329K

Product	Vanadium Oxide (V2O5) Sputtering Targets, elastomer, Purity: 99.9%, Size: 2'', Thickness: 0.125''
CAS No.	1314‑62‑1
Appearance	Powder
Purity	≥99%, ≥99.9%, ≥95% (Other purities are also available)
APS	N/A (Size Can be customized), Ask for other available size ranges.
Ingredient	N/A
Molecular Weight	181.88 g/mol
Melting Point	690 °C
Boiling Point	~1750 °C
Density	~3.35 g/cm³
Product Codes	NCZ-1533K

Appearance	Black Powder
Purity	>99.90 %
Particle Size	30-60 nm
Al	<0.05%
Fe	<0.05%
Bi	<0.05%
Zn	<0.01%
Ti	<0.01%
Ca	<0.01%
Na	<0.01%
Pb	<0.0002%
Sn	<0.0002%

Purity (%)	99.99
Average Particle Size (µm)	1.5-18
Density (g/cm3)	2,7
Melting Point (°C)	2210.0

Product	Vanadium Sputtering Target V
CAS No.	7440-62-2
Appearance	Bluish-silver metal
Purity	≥99%, ≥99.9%, ≥95%(Other purities are also available)
APS	N/A
Ingredient	V
Molecular Weight	50.94 g/mol
Melting Point	N/A
Boiling Point	N/A
Density	6.11 g/cm³
Product Codes	NCZ-147H

Product	Vanadyl ACAC
CAS No.	3153-26-2
Appearance	Blue-green crystalline
Purity	≥99%, ≥99.9%, ≥95%(Other purities are also available)
APS	N/A
Ingredient	C₁₀H₁₄O₅V
Molecular Weight	265.16 g/mol
Melting Point	N/A
Boiling Point	N/A
Density	N/A
Product Codes	NCZ-302R

Product	Vanadyl BZACAC
CAS No.	N/A
Appearance	Yellow to orange crystalline
Purity	≥99%, ≥99.9%, ≥95%(Other purities are also available)
APS	N/A
Ingredient	N/A
Molecular Weight	400–450 g/mol
Melting Point	N/A
Boiling Point	N/A
Density	N/A
Product Codes	NCZ-303R

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Applications of Sputtering Targets;

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Vanadium Carbide (VC) Nanopowder/Nanoparticles

Purity: 99.95%, Size: 550-750 nm, Cubic

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Applications of Sputtering Targets;

Applications of Sputtering Targets;

Applications of Sputtering Targets;

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Applications of Sputtering Targets;

Applications of Sputtering Targets;

Applications of Sputtering Targets;

Applications of Sputtering Targets;

Applications of Sputtering Targets;

Applications of Sputtering Targets;

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Applications of Sputtering Targets;

Applications of Sputtering Targets;

Vanadium Oxide (VO2) Nanopowder/Nanoparticles

Purity: 99.9+%, Size: 30-60 nm

Lanthanum Hexaboride (LaB6) Micron Powder

High Purity: 99.99%, Size: 1.5-18 µm

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