Prime Si+SiO2 Wafer (wet), Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1 – 10 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm, Coating 300 nm

Price range: $69.00 through $988.00
Select options This product has multiple variants. The options may be chosen on the product page
1 piece/63 € 5 pieces/210 € 25 pieces/890 € Please contact us for quotes on larger quantities !!! 

Prime Si+SiO2 Wafer (wet)

Size: 4”, Orientation: (100), Boron Doped, 1-Side Polished, Thickness: 525 ± 25 μm, Coating 300 nm

Technical Properties:

Quality Prime
Materials Si + SiO2 (wet)
Size (inch) 4”
Orientation (100)
Coating 300 nm
Thickness (μm) 525 ± 25
Doping Boron
Resistivity (ohm.cm) 1-10
Polished One Side
Silicon dioxide wafer – also referred as thermal oxide wafer- is produced at elevated temperatures. Thermal oxide is normally grown in a horizontal tube furnace, at temperature range from 900°C ~ 1200°C. Thermal oxide is a kind of "grown" oxide layer , compared to CVD deposited oxide layer , it has a higher uniformity, and higher dielectric strength , it is an excellent dielectric layer as an insulator. In most silicon-based devices, thermal oxide layer plays an important role to pacify the silicon surface to act as doping barriers and as surface dielectrics. It allows a very good thickness uniformity and purity. Therefore, this is the preferred way to produce high quality thin silicon oxide layers. Thicker oxide layers are typically produced by wet oxidation where the growth rate is significantly increased.

Prime Si+SiO2 Wafer (wet), Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1 – 10 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm, Coating 400 nm

Price range: $69.00 through $988.00
Select options This product has multiple variants. The options may be chosen on the product page
1 piece/63 € 5 pieces/210 € 25 pieces/890 € Please contact us for quotes on larger quantities !!! 

Prime Si+SiO2 Wafer (wet)

Size: 4”, Orientation: (100), Boron Doped, 1-Side Polished, Thickness: 525 ± 25 μm, Coating 400 nm

Technical Properties:

Quality Prime
Materials Si + SiO2 (wet)
Size (inch) 4”
Orientation (100)
Coating 400 nm
Thickness (μm) 525 ± 25
Doping Boron
Resistivity (ohm.cm) 1-10
Polished One Side
Silicon dioxide wafer – also referred as thermal oxide wafer- is produced at elevated temperatures. Thermal oxide is normally grown in a horizontal tube furnace, at temperature range from 900°C ~ 1200°C. Thermal oxide is a kind of "grown" oxide layer , compared to CVD deposited oxide layer , it has a higher uniformity, and higher dielectric strength , it is an excellent dielectric layer as an insulator. In most silicon-based devices, thermal oxide layer plays an important role to pacify the silicon surface to act as doping barriers and as surface dielectrics. It allows a very good thickness uniformity and purity. Therefore, this is the preferred way to produce high quality thin silicon oxide layers. Thicker oxide layers are typically produced by wet oxidation where the growth rate is significantly increased.

Prime Si+SiO2 Wafer (wet), Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1 – 10 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm, Coating 400 nm

Price range: $75.00 through $1,068.00
Select options This product has multiple variants. The options may be chosen on the product page
Prime Si+SiO2 Wafer (wet) Size: 4”, Orientation: (100), Boron Doped, 1-Side Polished, Thickness: 525 ± 25 μm, Coating 400 nm

Prime Si+SiO2 Wafer (wet), Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1 -10 (ohm.cm), 2-Side Polished, Thickness: 500 ± 15 μm, Coating 300 nm

Price range: $79.00 through $1,122.00
Select options This product has multiple variants. The options may be chosen on the product page
Prime Si+SiO2 Wafer (wet) Size: 4”, Orientation: (100), Boron Doped, 2-Side Polished, Thickness: 500 ± 15 μm, Coating 300 nm

Prime Si+SiO2 Wafer (wet), Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1 -10 (ohm.cm), 2-Side Polished, Thickness: 500 ± 15 μm, Coating 300 nm

Price range: $69.00 through $988.00
Select options This product has multiple variants. The options may be chosen on the product page
1 piece/63 € 5 pieces/210 € 25 pieces/890 € Please contact us for quotes on larger quantities !!!

Prime Si+SiO2 Wafer (wet)

Size: 4”, Orientation: (100), Boron Doped, 2-Side Polished, Thickness: 500 ± 15 μm, Coating 300 nm

Technical Properties:

Quality Prime
Materials Si + SiO2 (wet)
Size (inch) 4”
Orientation (100)
Coating 300 nm
Thickness (μm) 500 ± 15
Doping Boron
Resistivity (ohm.cm) 1-10
Polished Double Side
Silicon dioxide wafer – also referred as thermal oxide wafer- is produced at elevated temperatures. Thermal oxide is normally grown in a horizontal tube furnace, at temperature range from 900°C ~ 1200°C. Thermal oxide is a kind of "grown" oxide layer , compared to CVD deposited oxide layer , it has a higher uniformity, and higher dielectric strength , it is an excellent dielectric layer as an insulator. In most silicon-based devices, thermal oxide layer plays an important role to pacify the silicon surface to act as doping barriers and as surface dielectrics. It allows a very good thickness uniformity and purity. Therefore, this is the preferred way to produce high quality thin silicon oxide layers. Thicker oxide layers are typically produced by wet oxidation where the growth rate is significantly increased.

Prime Si+SiO2 Wafer (wet), Size: 4”, Orientation: (111), Phosphor Doped, Resistivity: 1 – 10 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm, Coating 1000 nm

Price range: $76.00 through $1,182.00
Select options This product has multiple variants. The options may be chosen on the product page
1 piece/69 € 5 pieces/245 € 25 pieces/1065 € Please contact us for quotes on larger quantities !!! 

Prime Si+SiO2 Wafer (wet)

Size: 4”, Orientation: (111), Phosphor Doped, 1-Side Polished, Thickness: 525 ± 25 μm, Coating 1000 nm

Technical Properties:

Quality Prime
Materials Si + SiO2 (wet)
Size (inch) 4”
Orientation (111)
Coating 1000 nm
Thickness (μm) 525 ± 25
Doping Phosphor
Resistivity (ohm.cm) 1-10
Polished One Side
Silicon dioxide wafer – also referred as thermal oxide wafer- is produced at elevated temperatures. Thermal oxide is normally grown in a horizontal tube furnace, at temperature range from 900°C ~ 1200°C. Thermal oxide is a kind of "grown" oxide layer , compared to CVD deposited oxide layer , it has a higher uniformity, and higher dielectric strength , it is an excellent dielectric layer as an insulator. In most silicon-based devices, thermal oxide layer plays an important role to pacify the silicon surface to act as doping barriers and as surface dielectrics. It allows a very good thickness uniformity and purity. Therefore, this is the preferred way to produce high quality thin silicon oxide layers. Thicker oxide layers are typically produced by wet oxidation where the growth rate is significantly increased.

Prime Si+SiO2 Wafer (wet), Size: 4”, Orientation: (111), Phosphor Doped, Resistivity: 1 – 10 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm, Coating 1000 nm

Price range: $76.00 through $1,278.00
Select options This product has multiple variants. The options may be chosen on the product page
Prime Si+SiO2 Wafer (wet) Size: 4”, Orientation: (111), Phosphor Doped, 1-Side Polished, Thickness: 525 ± 25 μm, Coating 1000 nm

Pt Doped Monoatomic Nb2C MXene

$0.00

Product Name: Pt Doped Monoatomic Nb2C MXene

Product Pt Doped Monoatomic Nb2C MXene
CAS No. 12316-56-2
Appearance Powder
Purity 99%
APS 1 – 5 microns (can be customized)
Ingredient HCl + LiF treatment process, stripped into a single layer at ultra-low temperature, and then doped with Pt atoms in the reduction method
Product Code NCZ-MX-301

APPLICATION

Energy storage, Catalysis, Analytical Chemistry, Mechanics, Adsorption, Biology, Microelectronics, Sensors, and other sizes can be customized   RELATED INFORMATION Storage Conditions: Airtight sealed, avoid light and keep dry at room temperature. Please email us for the customization. Email: contact@nanochemazone.com

PTFE Inside Chamber for Hydrothermal Synthesis Autoclave Reactors, Volume:50,100,500 ml

Price range: $47.50 through $217.50
Select options This product has multiple variants. The options may be chosen on the product page
50ml   47,5€ 100ml  80€ 500ml  217,5€ Product Information Product Name PTFE Inside Chamber for Hydrothermal Synthesis Autoclave Reactors Size

PTFE Nanopowder/Nanoparticles [Polytetrafluoroethylene, (C2F4)n)], Purity: 99.9%

Price range: $14.00 through $254.00
Select options This product has multiple variants. The options may be chosen on the product page
5 grams/14 € 25 grams/28 € 100 grams/69 €                      500 grams/148 €     

PTFE Nanopowder/Nanoparticles [Polytetrafluoroethylene, (C2F4)n)], Purity: 99.9%

Price range: $10.00 through $191.00
Select options This product has multiple variants. The options may be chosen on the product page
5 grams/9 € 25 grams/18 € 100 grams/46 €                      500 grams/98 €                     1000 grams/169 €
Please contact us for quotes on larger quantities !!!

PTFE Nanopowder/Nanoparticles [Polytetrafluoroethylene, (C2F4)n)]

Purity: 99.9%

PTFE Nanopowder/Nanoparticles [Polytetrafluoroethylene, (C2F4)n)], Purity: 99.9%

Price range: $14.00 through $254.00
Select options This product has multiple variants. The options may be chosen on the product page
5 grams/14 € 25 grams/28 € 100 grams/69 €                      500 grams/148 €     

PTFE Separator Film for Battery Applications Thickness: 50μm, Width: 60mm, Length: 600 m, 1 roll: 600 m

Price range: $358.00 through $1,238.00
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Product Information Product Name PTFE Separator Film for Battery Applications Thickness 50μm Width 60mm±0.005 Length 600m Product No NG10BEW0942 Elongation

Pure Aluminum Powder

Product Pure Aluminum Powder
CAS No. 7429-90-5
Appearance Silvery-gray metallic powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 10–45 µm (Size Can be customized),  Ask for other available size range.
Ingredient Al
Molecular Weight 26.98 g/mol
Melting Point N/A
Boiling Point N/A
Density 2.70 g/cm³
Product Codes NCZ-168M
 

Pure Copper Powder

Product Pure Copper Powder
CAS No. 7440-50-8
Appearance Reddish-brown metallic powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 10–45 µm (Size Can be customized),  Ask for other available size range.
Ingredient Cu
Molecular Weight 63.55 g/mol
Melting Point N/A
Boiling Point N/A
Density 8.94 g/cm³
Product Codes NCZ-169M

Pure Titanium Powder

Product Pure Titanium Powder
CAS No. 7440-32-6
Appearance Silvery-gray metallic powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1–10 µm (Size Can be customized),  Ask for other available size range.
Ingredient Ti
Molecular Weight 47.87 g/mol
Melting Point 1660 °C
Boiling Point N/A
Density N/A
Product Codes NCZ-170M

PVDF Binder for Li-ion Battery Electrodes (set: 80g )

Price range: $95.00 through $2,035.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

PVDF Binder for Li-ion Battery Electrodes 80g/bag PVDF (Polyvinylidene fluoride ) binder is for mixing together with cathode powder to prepare Li-ion battery electrode 80g/bag, vacuum sealed in plastic bag.

PVDF Binder for Li-ion Battery Electrodes (set: 80g )

Price range: $95.00 through $2,035.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

PVDF Binder for Li-ion Battery Electrodes 80g/bag PVDF (Polyvinylidene fluoride ) binder is for mixing together with cathode powder to prepare Li-ion battery electrode 80g/bag, vacuum sealed in plastic bag.

PVDF Binder for Li-ion Battery Electrodes (set: 80g )

Price range: $95.00 through $2,035.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

PVDF Binder for Li-ion Battery Electrodes 80g/bag PVDF (Polyvinylidene fluoride ) binder is for mixing together with cathode powder to prepare Li-ion battery electrode 80g/bag, vacuum sealed in plastic bag.

Quartz Wafer, (AT-Cut), Size: 4”, 2-Side Polished, Thickness: 500 ± 25 μm

Price range: $100.00 through $1,758.00
Select options This product has multiple variants. The options may be chosen on the product page
Quartz Wafer (AT-Cut), Size: 4”, 2-Side Polished, Thickness: 500 ± 25 μm Technical Properties: Quality Prime Materials Quartz Size (inch)

Quartz Wafer, (AT-Cut), Size: 4”, 2-Side Polished, Thickness: 500 ± 25 μm

Price range: $93.00 through $1,626.00
Select options This product has multiple variants. The options may be chosen on the product page
1 piece/84 € 5 pieces/325 € 25 pieces/1465 € Quartz Wafer, (AT-Cut), Size: 4”, 2-Side Polished, Thickness: 500 ± 25 μm Please contact us for quotes on larger quantities !!!

Quartz Wafer

(AT-Cut), Size: 4”, 2-Side Polished, Thickness: 500 ± 25 μm

Technical Properties:

Quality Prime
Materials Quartz
Size (inch) 4”
Orientation (AT -Cut)
Coating  
Thickness (μm) 500 ± 25
Doping  
Resistivity (ohm.cm)  
Polished Double Side
High working temperature, high corrosion resistivity, thermal conductivity and low dielectric loss are the specifications that make quartz wafers a good candidate for semiconductor, photomask, microwave filter and optical lense applications. Since quartz is a monocrystalline material with numerous different crystal orientations, it can be supplied in different cut versions. During this process high quality particles of quartz are positioned at the bottom of a vessel which is loaded with NaOH. Quartz starts to crystallize at around 400°C and between 1000 and 1500 bar pressure. This crystallization eventually creates monocrystals and may take even days. The generated quartz monocrystals are polished after being sliced into wafers and finally reveal Quartz 4”,(AT-Cut) Wafers. Quartz 4”,(X-Cut) has high thermal conductivity, high anti-corrosion, feature of high working temperature and good optical transmittance. For all these reasons Quartz Wafer is appropriate for the production of optical lenses, photomasks, microwave filters, semiconductors and for optical fiber applications.

Quartz Wafer, (ST-Cut), Size: 4”, 1-Side Polished, Thickness: 625 ± 25 μm

Price range: $100.00 through $1,758.00
Select options This product has multiple variants. The options may be chosen on the product page
Quartz Wafer (ST-Cut), Size: 4”, 1-Side Polished, Thickness: 625 ± 25 μm Technical Properties: Quality Prime Materials Quartz Size (inch) 4”

Quartz Wafer, (ST-Cut), Size: 4”, 1-Side Polished, Thickness: 625 ± 25 μm

Price range: $93.00 through $1,626.00
Select options This product has multiple variants. The options may be chosen on the product page
1 piece/84 € 5 pieces/325 € 25 pieces/1465 € Please contact us for quotes on larger quantities !!! 

Quartz Wafer

(ST-Cut), Size: 4”, 1-Side Polished, Thickness: 625 ± 25 μm

Technical Properties:

Quality Prime
Materials Quartz
Size (inch) 4”
Orientation (ST -Cut)
Coating
Thickness (μm) 625 ± 25
Doping
Resistivity (ohm.cm)
Polished One Side
High working temperature, high corrosion resistivity, thermal conductivity and low dielectric loss are the specifications that make quartz wafers a good candidate for semiconductor, photomask, microwave filter and optical lense applications. Since quartz is a monocrystalline material with numerous different crystal orientations, it can be supplied in different cut versions. During this process high quality particles of quartz are positioned at the bottom of a vessel which is loaded with NaOH. Quartz starts to crystallize at around 400°C and between 1000 and 1500 bar pressure. This crystallization eventually creates monocrystals and may take even days. The generated quartz monocrystals are polished after being sliced into wafers and finally reveal Quartz 4”,(AT-Cut) Wafers. Quartz 4”,(X-Cut) has high thermal conductivity, high anti-corrosion, feature of high working temperature and good optical transmittance. For all these reasons Quartz Wafer is appropriate for the production of optical lenses, photomasks, microwave filters, semiconductors and for optical fiber applications.

Quartz Wafer, (X-Cut), Size: 2”, 2-Side Polished, Thickness: 500 ± 25 μm

Price range: $66.15 through $806.40
Select options This product has multiple variants. The options may be chosen on the product page
Quartz Wafer (X-Cut), Size: 2”, 2-Side Polished, Thickness: 500 ± 25 μm Technical Properties: Quality Prime Materials Quartz Size (inch)

Quartz Wafer, (X-Cut), Size: 2”, 2-Side Polished, Thickness: 500 ± 25 μm

Price range: $57.00 through $710.00
Select options This product has multiple variants. The options may be chosen on the product page
1 piece/52 € 5 pieces/160 € 25 pieces/640 € Please contact us for quotes on larger quantities !!! 

Quartz Wafer

(X-Cut), Size: 2”, 2-Side Polished, Thickness: 500 ± 25 μm

Technical Properties:

Quality Prime
Materials Quartz
Size (inch) 2”
Orientation (X-Cut)
Coating
Thickness (μm) 500 ± 25
Doping
Resistivity (ohm.cm)
Polished Double Side
High working temperature, high corrosion resistivity, thermal conductivity and low dielectric loss are the specifications that make quartz wafers a good candidate for semiconductor, photomask, microwave filter and optical lense applications. Since quartz is a monocrystalline material with numerous different crystal orientations, it can be supplied in different cut versions. During this process high quality particles of quartz are positioned at the bottom of a vessel which is loaded with NaOH. Quartz starts to crystallize at around 400°C and between 1000 and 1500 bar pressure. This crystallization eventually creates monocrystals and may take even days. The generated quartz monocrystals are polished after being sliced into wafers and finally reveal Quartz 4”,(AT-Cut) Wafers. Quartz 4”,(X-Cut) has high thermal conductivity, high anti-corrosion, feature of high working temperature and good optical transmittance. For all these reasons Quartz Wafer is appropriate for the production of optical lenses, photomasks, microwave filters, semiconductors and for optical fiber applications.

Quartz Wafer, (X-Cut), Size: 4”, 2-Side Polished, Thickness: 200 ± 25 μm

Price range: $115.00 through $2,520.00
Select options This product has multiple variants. The options may be chosen on the product page
Quartz Wafer (X-Cut), Size: 4”, 2-Side Polished, Thickness: 200 ± 25 μm Technical Properties: Quality Prime Materials Quartz Size (inch)

Quartz Wafer, (X-Cut), Size: 4”, 2-Side Polished, Thickness: 200 ± 25 μm

Price range: $106.00 through $2,331.00
Select options This product has multiple variants. The options may be chosen on the product page
1 piece/96 € 5 pieces/440 € 25 pieces/2100 €                       Please contact us for quotes on larger quantities !!! 

Quartz Wafer

(X-Cut), Size: 4”, 2-Side Polished, Thickness: 200 ± 25 μm

Technical Properties:

Quality Prime
Materials Quartz
Size (inch) 4”
Orientation (X-Cut)
Coating  
Thickness (μm) 200 ± 25
Doping  
Resistivity (ohm.cm)  
Polished Double Side
High working temperature, high corrosion resistivity, thermal conductivity and low dielectric loss are the specifications that make quartz wafers a good candidate for semiconductor, photomask, microwave filter and optical lense applications. Since quartz is a monocrystalline material with numerous different crystal orientations, it can be supplied in different cut versions. During this process high quality particles of quartz are positioned at the bottom of a vessel which is loaded with NaOH. Quartz starts to crystallize at around 400°C and between 1000 and 1500 bar pressure. This crystallization eventually creates monocrystals and may take even days. The generated quartz monocrystals are polished after being sliced into wafers and finally reveal Quartz 4”,(AT-Cut) Wafers. Quartz 4”,(X-Cut) has high thermal conductivity, high anti-corrosion, feature of high working temperature and good optical transmittance. For all these reasons Quartz Wafer is appropriate for the production of optical lenses, photomasks, microwave filters, semiconductors and for optical fiber applications.

Quartz Wafer, (X-Cut), Size: 4”, 2-Side Polished, Thickness: 300 ± 25 μm

Price range: $100.00 through $1,758.00
Select options This product has multiple variants. The options may be chosen on the product page
Quartz Wafer (X-Cut), Size: 4”, 2-Side Polished, Thickness: 300 ± 25 μm Technical Properties: Quality Prime Materials Quartz Size (inch) 4” Orientation

Quartz Wafer, (X-Cut), Size: 4”, 2-Side Polished, Thickness: 300 ± 25 μm

Price range: $93.00 through $1,626.00
Select options This product has multiple variants. The options may be chosen on the product page
1 piece/84 € 5 pieces/325 € 25 pieces/1465 €                         Please contact us for quotes on larger quantities !!! 

Quartz Wafer

(X-Cut), Size: 4”, 2-Side Polished, Thickness: 300 ± 25 μm

Technical Properties:

Quality Prime
Materials Quartz
Size (inch) 4”
Orientation (X-Cut)
Coating  
Thickness (μm) 300 ± 25
Doping  
Resistivity (ohm.cm)  
Polished Double Side
High working temperature, high corrosion resistivity, thermal conductivity and low dielectric loss are the specifications that make quartz wafers a good candidate for semiconductor, photomask, microwave filter and optical lense applications. Since quartz is a monocrystalline material with numerous different crystal orientations, it can be supplied in different cut versions. During this process high quality particles of quartz are positioned at the bottom of a vessel which is loaded with NaOH. Quartz starts to crystallize at around 400°C and between 1000 and 1500 bar pressure. This crystallization eventually creates monocrystals and may take even days. The generated quartz monocrystals are polished after being sliced into wafers and finally reveal Quartz 4”,(AT-Cut) Wafers. Quartz 4”,(X-Cut) has high thermal conductivity, high anti-corrosion, feature of high working temperature and good optical transmittance. For all these reasons Quartz Wafer is appropriate for the production of optical lenses, photomasks, microwave filters, semiconductors and for optical fiber applications.

QUICK VIEW Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”

$396.00

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Reduced Graphene Oxide (rGO), S.A: 1562 m2/g, 2-5 layers

Price range: $54.00 through $1,014.00
Select options This product has multiple variants. The options may be chosen on the product page
Reduced Graphene Oxide (rGO) is derived by deoxygenation of graphene oxide via chemical, thermal, electrochemical process or through IR or UV irradiation to get a powder form. Reduced graphene oxide is the most suitable solution for bulk material applications such as energy storage thanks to be manufactured easily in large quantities with desired quantity level. For applications requiring the highest uniformity in size, we offer high purity of Reduced Graphene Oxide (rGO) with lowest prices.

Reduced Graphene Oxide (rGO),Purity: 99%, S.A: 15.62 m2/g, 2-5 layers

Price range: $53.00 through $985.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Reduced Graphene Oxide

  • Energy Storage
  • Biomedical Applications
  • Biosensors
  • Use as a high performance additive for composites with PPO, POM ,PPS, PC, ABS, PP, PE, PS, Nylon and rubbers.
  • Can improve composites tensile strength, stiffness, corrosion resistance, abrasion resistance and anti-static.
  • Electricity and lubricant properties.
  • For all mechanical properties modifications, typical amounts are about 2-6 wt%
  • For conductivity modification, typical amounts are about 2-8 wt%
Additional Information: The addition of Reduced Graphene Oxide (rGO) to different composites show improvements in their physical properties. These improvements include electrical conductivity, thermal conductivity, hardness, strength, viscosity etc. Moreover, graphene can replace materials that are used in today’s applications resulting in enhancement of their applications. For example Reduced Graphene Oxide (rGO)can be integrated into plastics such as epoxy to create a material that can replace steel in the structure of aircraft, improving fuel efficiency, range and reducing weight. It could even be used to coat aircraft surface material to prevent electrical damage resulting from lightning strikes due to its high conductivity. 

Reduced Graphene Oxide (rGO),Purity: 99%, S.A: 15.62 m2/g, 2-5 layers

Price range: $53.00 through $985.00
Select options This product has multiple variants. The options may be chosen on the product page
1 gram: 53 € 5 grams: 105 € 25 grams: 434 € 100 grams: 985 €  Contact us for tailored quotes on larger quantities & experience exceptional solutions from

Reduced Graphene Oxide Water Dispersion, Purity: 99.5%, rGO: 2,0 wt%

Price range: $168.00 through $961.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Reduced Graphene Oxide Water Dispersion

  • Energy Storage
  • Biomedical Applications
  • Biosensors
  • Use as a high performance additive for composites with PPO, POM ,PPS, PC, ABS, PP, PE, PS, Nylon and rubbers.
  • Can improve composites tensile strength, stiffness, corrosion resistance, abrasion resistance and anti-static.
  • Electricity and lubricant properties.
  • For all mechanical properties modifications, typical amounts are about 2-6 wt%
  • For conductivity modification, typical amounts are about 2-8 wt%

Reduced Graphene Oxide Water Dispersion, Purity: 99.5%, rGO: 2,0 wt%

Price range: $172.00 through $989.00
Select options This product has multiple variants. The options may be chosen on the product page
Reduced Graphene Oxide (rGO) is derived by deoxygenation of graphene oxide via chemical, thermal, electrochemical process or through IR or UV irradiation to get a powder form. Reduced graphene oxide is the most suitable solution for bulk material applications such as energy storage thanks to be manufactured easily in large quantities with desired quantity level. For applications requiring the highest uniformity in size, we offer high purity of Reduced Graphene Oxide (rGO) with lowest prices.

Reference Electrode Filling Solution

Price range: $39.00 through $65.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Reference Electrode Filling Solution
CAS No. 7447-40-7
Appearance Clear, colorless liquid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient KCl
Molecular Weight 74.55 g/mol
Melting Point N/A
Boiling Point N/A
Density 1.1 to 1.2 g/cm³
Product Codes NCZ-505I
 

Rhodium (Rh) Nanopowder, 20nm, ≥99.99% (4N) Purity, 1g

$1,928.00
Product Rhodium (Rh) Nanopowder, 20nm, ≥99.99% (4N) Purity, 1g
CAS No. 7440-16-6
Appearance Dark gray to black
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 20nm (Size Can be customized),  Ask for other available size range.
Ingredient Rh
Molecular Weight 102.91 g/mol
Melting Point N/A
Boiling Point N/A
Density 12.41 g/cm³
Product Codes NCZ-506I

Rhodium ACAC

Price range: $116.00 through $585.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Rhodium ACAC
CAS No. 14284-92-5
Appearance Yellow to orange crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Rh(C₅H₇O₂)₃
Molecular Weight 400.23 g/mol
Melting Point 263–264 °C
Boiling Point N/A
Density N/A
Product Codes NCZ-291R

Rhodium TFAC

Price range: $106.00 through $426.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Rhodium TFAC
CAS No. 14284-92-5
Appearance Yellow-orange solid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Rh(C₅H₄F₃O₂)₃
Molecular Weight 400.23 g/mol
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-255R

Roll to Roll PE-CVD System for Continuous Graphene or 2D Film Growth

Applications:

  • Single layer (transparent) barrier coatings
  • Optical Coatings
  • Dielectric Coating
  • Protection Coating
  • Hard Coating Film
  • Solar Cell Technology
  • Surface Modification

Rubidium ACAC

Price range: $16.00 through $59.00
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Product Rubidium ACAC
CAS No. 66169-93-5
Appearance White or tan
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient RbC₅H₇O₂
Molecular Weight N/A
Melting Point 200 °C
Boiling Point N/A
Density N/A
Product Codes NCZ-292R
 

Ruthenium (III) acetate

Price range: $109.00 through $551.00
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Product Ruthenium (III) acetate
CAS No. 3260-64-0
Appearance Dark red to brown crystalline solid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Ru₂(CH₃COO)₄Cl
Molecular Weight 384.5 g/mol
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-242R
 

Ruthenium ACAC

Price range: $16.00 through $126.00
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Product Ruthenium ACAC
CAS No. 14284-93-6
Appearance Dark red (or chestnut-red) crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Ru(C₅H₇O₂)₃
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 1.54 g/cm³
Product Codes NCZ-293R

Ruthenium Nanopowder/Nanoparticles (Ru, 99.9%, ~20nm)

Price range: $275.00 through $475.00
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$275/0.5g
$475/1g

Product 

Ruthenium Nanopowder/Nanoparticles (Ru, 99.9%, ~20nm)

CAS No.

7440-18-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 ~20nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

101.07 g/mol

Melting Point

2,334 °C

Boiling Point

4,150 °C

Density

12.45 g/cm³

Product Codes

NCZ-1064K

S2 Powder

Product S2 Powder
CAS No. N/A
Appearance Gray to dark gray metallic powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 10–150 µm (Size Can be customized),  Ask for other available size range.
Ingredient S₂
Molecular Weight N/A
Melting Point 1320–1350 °C
Boiling Point N/A
Density 7.7 g/cm³
Product Codes NCZ-171M

Samarium (III) Oxide (Sm2O3) 99.99% 4N Powder

Price range: $239.00 through $580.00
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Product Samarium (III) Oxide (Sm2O3) 99.99% 4N Powder
CAS No. 12060-10-1
Appearance White to pale yellow
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1–10µm (Size Can be customized),  Ask for other available size range.
Ingredient Sm2O3
Molecular Weight 348.72 g/mol
Melting Point 2345 °C
Boiling Point N/A
Density 7.52 g/cm³
Product Codes NCZ-507I

Samarium (Sm) Micron Powder Purity: 99.5 %, Size: 325 mesh

$559.00
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100 grams/496 €     

Samarium (Sm) Micron Powder, Purity: 99.5 %, Size: 325 mesh

$775.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Samarium is moderately stable at air but it ignites at 150°C. It is not found free in nature. It can be found in the minerals gadolinite, monazites, samarskite, cerite, and bastnäsite. Samarium is used as alloy in making permanent magnets. It is used in making samarium-cobalt permanent magnets which have high resistance to demagnetization. It is also used as a neutron absorber in nuclear reactors. It is used in the core of carbon arc lights with other metals which are used in studio lighting and projector lights.

Samarium (Sm) Sputtering Target

Price range: $272.00 through $803.00
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Product 

Samarium (Sm) Sputtering Target

CAS No.

7440-19-9

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 150.36 g/mol

Melting Point

 1,072 °C

Boiling Point

 1,794 °C

Density

7.54 g/cm³

Product Codes

NCZ-1302K

Samarium ACAC

Price range: $69.00 through $276.00
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Product Samarium ACAC
CAS No. 14589-42-5
Appearance White to off-white
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Sm(C₅H₇O₂)₃
Molecular Weight 447.7 g/mol
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-294R
 

Samarium Chloride Hexahydrate (SmCl3 · 6H2O) 99.9% 3N

$297.00
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Product Samarium Chloride Hexahydrate (SmCl3 · 6H2O) 99.9% 3N
CAS No. 13465-64-0
Appearance Light yellow to white crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 100–500µm (Size Can be customized),  Ask for other available size range.
Ingredient SmCl3·6H2O
Molecular Weight 364.79 g/mol
Melting Point 2345 °C
Boiling Point N/A
Density 2.16 g/cm³
Product Codes NCZ-508I
 

Samarium HFAC

Price range: $33.00 through $193.00
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Product Samarium HFAC
CAS No. N/A
Appearance White
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient C₁₅H₁₂F₉O₆Sm
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-326R

Samarium Nitrate Hexahydrate (Sm(NO3)3 · 6H2O) 99.99% 4N

Price range: $429.00 through $755.00
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Product Samarium Nitrate Hexahydrate (Sm(NO3)3 · 6H2O) 99.99% 4N
CAS No. 13759-83-6
Appearance Colorless to pale pink crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 10–50 µm  .(Size Can be customized),  Ask for other available size range.
Ingredient Sm(NO3)3·6H2O
Molecular Weight 434.46 g/mol
Melting Point 2345 °C
Boiling Point N/A
Density 2.45 g/cm³
Product Codes NCZ-509I

Samarium Oxide (Sm2O3) Micron Powder, Purity: 99.99%, Size: 325 mesh

Price range: $10.00 through $281.00
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Applications:

Samarium Oxide is used in high permittivity ceramics for dielectric resonators and substrates. It is used in nuclear reaction piles as structural and shielding materials. It is also used as a component material for making gas sensors, catalysts, and solid oxide fuel cell.

Samarium Oxide (Sm2O3) Nanopowder, 40nm, ≥99.99% (4N) Purity, 500g

$515.00
Product Samarium Oxide (Sm2O3) Nanopowder, 40nm, ≥99.99% (4N) Purity, 500g
CAS No. 12060-10-1
Appearance White to pale yellow
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 40nm (Size Can be customized),  Ask for other available size range.
Ingredient Sm2O3
Molecular Weight 348.72 g/mol
Melting Point 2345 °C
Boiling Point N/A
Density 7.52 g/cm³
Product Codes NCZ-510I
 

Samarium Oxide (Sm2O3) Nanopowder/Nanoparticles, Purity: 99.955%, Size: 13-47 nm

Price range: $25.00 through $395.00
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Applications:

Samarium Oxide nanoparticles is used in high permittivity ceramics for dielectric resonators and substrates. It is used in nuclear reaction piles as structural and shielding materials. It is also used as a component material for making gas sensors, catalysts, and solid oxide fuel cell.

Samarium Oxide (Sm2O3) Nanopowder/Nanoparticles, Purity: 99.955%, Size: 13-47 nm

Price range: $22.00 through $357.00
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1 gram/20 € 5 grams/37 € 
25 grams/51 € 100 grams/99 €
500 grams/180 €  1000 grams/316 € 
                     
Please contact us for quotes on larger quantities !!! 

Samarium Oxide (Sm2O3) Nanopowder/Nanoparticles

Purity: 99.955%, Size: 13-47 nm

Technical Properties:

Purity (%) 99.955
Color pale yellow
Average Particle Size (nm) 13-47
Specific Surface Area (m2/g) 25-55
Bulk Density (g/cm3) <0.05
True Density (g/cm3) 2,2

Applications:

Samarium Oxide nanoparticles is used in high permittivity ceramics for dielectric resonators and substrates. It is used in nuclear reaction piles as structural and shielding materials. It is also used as a component material for making gas sensors, catalysts, and solid oxide fuel cell.

Samarium Oxide (Sm2O3) Sputtering Target

Price range: $284.00 through $762.00
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Product 

Samarium Oxide (Sm2O3) Sputtering Target

CAS No.

 12060‑58‑1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

~348.8 g/mol

Melting Point

~2,335 °C

Boiling Point

~4,118 °C

Density

 ~8.35 – 7.60 g/cm³

Product Codes

NCZ-1376K

Samarium Oxide Micronpowder( Sm2O3, 99.9%, 3~5um)

Price range: $75.00 through $181.00
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$75/25g $115/100g $181/500g
Product Samarium Oxide Micronpowder( Sm2O3, 99.9%, 3~5um)
CAS No. 12060-58-1
Appearance Pale yellow or off-white powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 3-5um (Size Can be customized),  Ask for other available size range.
Ingredient Sm₂O₃
Molecular Weight 348.72 g/mol
Melting Point 2335° C
Boiling Point 4118° C
Density 8.347g/cm3
Product Codes NCZ-119R
 

Samarium Oxide Micronpowder( Sm2O3, 99.9%, 3~5um)

Price range: $75.00 through $181.00
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$75/25g
$115/100g
$181/500g

Product 

Samarium Oxide Micronpowder( Sm2O3, 99.9%, 3~5um)

CAS No.

12060-58-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

3~5um (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

348.72 g/mol

Melting Point

~2,336 °C

Boiling Point

~4,000 °C

Density

8.35 g/cm³

Product Codes

NCZ-1178K