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Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.125”

, , ,
$171.00
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 Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Aluminum which has the chemical symbol of Al, is a silvery white, soft, ductile metal that is the third most abundant element. Aluminum is notable due to for its light weight, strength, durability and for its ability to resist corrosion. Aluminum forms an extremely thin but very strong layer of oxide film. Aluminum has also high thermal and electrical conductivity. Aluminum sputtering targets have a particularly fine-grained microstructure. This property of Aluminum sputtering targets ensures that you benefit from uniform erosion and a low susceptibility to particle formation throughout the sputtering process.
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Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”

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$113.00
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Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Aluminum which has the chemical symbol of Al, is a silvery white, soft, ductile metal that is the third most abundant element. Aluminum is notable due to for its light weight, strength, durability and for its ability to resist corrosion. Aluminum forms an extremely thin but very strong layer of oxide film. Aluminum has also high thermal and electrical conductivity. Aluminum sputtering targets have a particularly fine-grained microstructure. This property of Aluminum sputtering targets ensures that you benefit from uniform erosion and a low susceptibility to particle formation throughout the sputtering process.
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Aluminum (Al) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.125”

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$165.00
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Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Aluminum which has the chemical symbol of Al, is a silvery white, soft, ductile metal that is the third most abundant element. Aluminum is notable due to for its light weight, strength, durability and for its ability to resist corrosion. Aluminum forms an extremely thin but very strong layer of oxide film. Aluminum has also high thermal and electrical conductivity. Aluminum sputtering targets have a particularly fine-grained microstructure. This property of Aluminum sputtering targets ensures that you benefit from uniform erosion and a low susceptibility to particle formation throughout the sputtering process.
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Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.250”

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$138.00
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Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Aluminum which has the chemical symbol of Al, is a silvery white, soft, ductile metal that is the third most abundant element. Aluminum is notable due to for its light weight, strength, durability and for its ability to resist corrosion. Aluminum forms an extremely thin but very strong layer of oxide film. Aluminum has also high thermal and electrical conductivity. Aluminum sputtering targets have a particularly fine-grained microstructure. This property of Aluminum sputtering targets ensures that you benefit from uniform erosion and a low susceptibility to particle formation throughout the sputtering process.
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Aluminum (Al) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.250”

, , ,
$177.00
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 Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Aluminum which has the chemical symbol of Al, is a silvery white, soft, ductile metal that is the third most abundant element. Aluminum is notable due to for its light weight, strength, durability and for its ability to resist corrosion. Aluminum forms an extremely thin but very strong layer of oxide film. Aluminum has also high thermal and electrical conductivity. Aluminum sputtering targets have a particularly fine-grained microstructure. This property of Aluminum sputtering targets ensures that you benefit from uniform erosion and a low susceptibility to particle formation throughout the sputtering process.
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Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.125”

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$96.00
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Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Aluminum which has the chemical symbol of Al, is a silvery white, soft, ductile metal that is the third most abundant element. Aluminum is notable due to for its light weight, strength, durability and for its ability to resist corrosion. Aluminum forms an extremely thin but very strong layer of oxide film. Aluminum has also high thermal and electrical conductivity. Aluminum sputtering targets have a particularly fine-grained microstructure. This property of Aluminum sputtering targets ensures that you benefit from uniform erosion and a low susceptibility to particle formation throughout the sputtering process.
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Aluminum (Al) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.125”

, , ,
$107.00
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Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Aluminum which has the chemical symbol of Al, is a silvery white, soft, ductile metal that is the third most abundant element. Aluminum is notable due to for its light weight, strength, durability and for its ability to resist corrosion. Aluminum forms an extremely thin but very strong layer of oxide film. Aluminum has also high thermal and electrical conductivity. Aluminum sputtering targets have a particularly fine-grained microstructure. This property of Aluminum sputtering targets ensures that you benefit from uniform erosion and a low susceptibility to particle formation throughout the sputtering process.
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Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.250”

, ,
$110.00
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Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Aluminum which has the chemical symbol of Al, is a silvery white, soft, ductile metal that is the third most abundant element. Aluminum is notable due to for its light weight, strength, durability and for its ability to resist corrosion. Aluminum forms an extremely thin but very strong layer of oxide film. Aluminum has also high thermal and electrical conductivity. Aluminum sputtering targets have a particularly fine-grained microstructure. This property of Aluminum sputtering targets ensures that you benefit from uniform erosion and a low susceptibility to particle formation throughout the sputtering process.
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Aluminum (Al) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.250”

, , ,
$123.00
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Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Aluminum which has the chemical symbol of Al, is a silvery white, soft, ductile metal that is the third most abundant element. Aluminum is notable due to for its light weight, strength, durability and for its ability to resist corrosion. Aluminum forms an extremely thin but very strong layer of oxide film. Aluminum has also high thermal and electrical conductivity. Aluminum sputtering targets have a particularly fine-grained microstructure. This property of Aluminum sputtering targets ensures that you benefit from uniform erosion and a low susceptibility to particle formation throughout the sputtering process.
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Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”

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$62.00
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Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Aluminum which has the chemical symbol of Al, is a silvery white, soft, ductile metal that is the third most abundant element. Aluminum is notable due to for its light weight, strength, durability and for its ability to resist corrosion. Aluminum forms an extremely thin but very strong layer of oxide film. Aluminum has also high thermal and electrical conductivity. Aluminum sputtering targets have a particularly fine-grained microstructure. This property of Aluminum sputtering targets ensures that you benefit from uniform erosion and a low susceptibility to particle formation throughout the sputtering process.
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Aluminum (Al) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.125”

, , ,
$118.00
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Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Aluminum which has the chemical symbol of Al, is a silvery white, soft, ductile metal that is the third most abundant element. Aluminum is notable due to for its light weight, strength, durability and for its ability to resist corrosion. Aluminum forms an extremely thin but very strong layer of oxide film. Aluminum has also high thermal and electrical conductivity. Aluminum sputtering targets have a particularly fine-grained microstructure. This property of Aluminum sputtering targets ensures that you benefit from uniform erosion and a low susceptibility to particle formation throughout the sputtering process.
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Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”

, , ,
$97.00
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 Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Aluminum which has the chemical symbol of Al, is a silvery white, soft, ductile metal that is the third most abundant element. Aluminum is notable due to for its light weight, strength, durability and for its ability to resist corrosion. Aluminum forms an extremely thin but very strong layer of oxide film. Aluminum has also high thermal and electrical conductivity. Aluminum sputtering targets have a particularly fine-grained microstructure. This property of Aluminum sputtering targets ensures that you benefit from uniform erosion and a low susceptibility to particle formation throughout the sputtering process.
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Aluminum (Al) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.250”

, , ,
$128.00
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 Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Aluminum which has the chemical symbol of Al, is a silvery white, soft, ductile metal that is the third most abundant element. Aluminum is notable due to for its light weight, strength, durability and for its ability to resist corrosion. Aluminum forms an extremely thin but very strong layer of oxide film. Aluminum has also high thermal and electrical conductivity. Aluminum sputtering targets have a particularly fine-grained microstructure. This property of Aluminum sputtering targets ensures that you benefit from uniform erosion and a low susceptibility to particle formation throughout the sputtering process.
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Aligned Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: 8-18 nm, Length 25-95 µm

Price range: $49.00 through $269.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Aligned MWCNTs are made by gathering CNTs in bundles. They are arrayed in the same direction and aligned close to each other parallel to the direction of the bundle axis. Aligned MWCNTs  have excellent electrical conductivity and good dispersibility. Multi Walled Carbon Nanotubes  have a variety of potential applications in different fields. These applications include medicine, mechanics, electric-electronics, chemicals, energy and others. It can be applied in, drug delivery, biosensors, CNT composites, catalysis, nanoprobes, hydrogen storage, lithium batteries, gas-discharge tubes, flat panel displays, supercapacitors, transistors, solar cells, photoluminescence, templates.
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Short Single Walled Carbon Nanotubes, Purity: > 65%, SSA: 400 m2/g

Price range: $70.00 through $820.00
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Applications:

Single Walled Carbon Nanotubes have a variety of potential applications in different fields. These applications include medicine, mechanics, electric-electronics, chemicals, energy and others. It can be applied in drug delivery, biosensors, CNT composites, catalysis, nanoprobes, hydrogen storage, lithium batteries, gas-discharge tubes, flat panel displays, supercapacitors, transistors, solar cells, photoluminescence, templates.
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Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles, Gamma, Purity: 99.5+%, Size: 18 nm, Hydrophilic

Price range: $12.00 through $244.00
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Applications  Aluminum Oxide Nanoparticles show high hardness and high dimensional stability. It is used to improve toughness, wear resistance, thermal fatigue resistance, and ceramic density for rubber, plastics, and ceramics. It is used in high strength aluminum oxide ceramic, high purity crucibles, furnace tubes, and cutting tools. It is added to metal products, semiconductors, tapes, polishing materials, and glass products. Aluminum Oxide Nanoparticles have excellent properties for far infrared emission. It is used in fiber fabric products and high pressure sodium lamp as far-infrared emission and thermal insulation materials. In addition it is used in the field of catalysis as catalyst or catalyst carrier.
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Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: 8-18 nm

Price range: $35.00 through $1,090.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Multi Walled Carbon Nanotubes  have a variety of potential applications in different fields. These applications include medicine, mechanics, electric-electronics, chemicals, energy and others. It can be applied in, drug delivery, biosensors, CNT composites, catalysis, nanoprobes, hydrogen storage, lithium batteries, gas-discharge tubes, flat panel displays,supercapacitors, transistors, solar cells, photoluminescence, templates.
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Lead Zirconate Titanate (PZT) Nanopowder/Nanoparticles, Purity: 99.5+ %, Size: < 100 nm

Price range: $47.00 through $1,968.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Lead Zirconate Titanate (PZT)

Lead Zirconate Titanate nanoparticles/nanopowder are commonly used in applications that require high temperatures and sensitivity. Lead Zirconate Titanate nanoparticles/nanopowder based materials are components of ultrasound transducers and ceramic capacitors, STM/AFM actuators. Lead Zirconate Titanate nanoparticles/nanopowder are also used in the manufacture of ceramic resonators for  reference timing in electronic circuitry.
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Graphene Oxide, 2-5 Layer, Dia: 4,5 µm, SA: 420 m2/gr

Price range: $75.00 through $742.50
Select options This product has multiple variants. The options may be chosen on the product page
1 gram / 75 € 5 grams / 269.50 € 25 grams / 742.50 €                       
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Reduced Graphene Oxide (rGO),Purity: 99%, S.A: 15.62 m2/g, 2-5 layers

Price range: $53.00 through $985.00
Select options This product has multiple variants. The options may be chosen on the product page
1 gram: 53 € 5 grams: 105 € 25 grams: 434 € 100 grams: 985 €  Contact us for tailored quotes on larger quantities & experience exceptional solutions from
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PTFE Nanopowder/Nanoparticles [Polytetrafluoroethylene, (C2F4)n)], Purity: 99.9%

Price range: $14.00 through $254.00
Select options This product has multiple variants. The options may be chosen on the product page
5 grams/14 € 25 grams/28 € 100 grams/69 €                      500 grams/148 €     
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Graphene Nanoplatelet, Purity: 99.9%, Size: 3 nm, S.A: 800 m2/g, Dia: 1.5 μm

Price range: $7.00 through $874.00
Select options This product has multiple variants. The options may be chosen on the product page
1 gram: 7 € 5 grams: 21 € 25 grams: 37 € 100 grams: 125 € 500 grams: 480 € 1000 grams: 874 €  Contact us for tailored quotes on larger
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Graphene Sheet, Size: 10 cm x 10 cm, Thickness: 35 µm, Highly Conductive

Price range: $13.50 through $126.50
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

  • Consumer electronics: smartphones, tablets, PCs, TVs
  • LED lighting
  • Energy storage
  • Automotive
  • Industrial
  • Medical
  • Military and aerospace
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Cellulose Nanofiber (Cellulose Nanofibril, Nanofibrillated Cellulose, CNFs)

Price range: $36.00 through $953.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

1.Body Armor Applications

Crystal structure of nanocellulose is consisting from packed array of needle-like crystals. These crystal structures are incredibly tough and their strength value is nearly eight times higher than stainless steel. Therefore, nanocellulose can be perfect building material for the future body armor studies. 2.Flexible Batteries Generally, separator parts inside batteries made up from thick and stiff material which cannot be used for bendable applications. Instead of these materials, flexible and thin nanocellulose combined with graphene material, flexible battery as the one of the big dream in electrical industry can be produced.

3.Flexible Screens

Nanocellulose is bendable, transparent, light and strong material therefore it can easily take place of the plastic or glass. In the future, nanocellulose will be one of the best material for bendable screen studies.

4.Filters

Nanocellulose can be used to filter and purify many types of liquids such as purifying saltwater to be drinkable, trapping dangerous chemicals in cigarette and filtering out blood cell during transfusion.

5.Absorbent Aerogels

When the nanocellulose are mixed with the aerogel foam, incredibly porous and adsorbent material can be obtained that could make strong and light wound-dressing and tampons.

6.Fuel Efficient Cars

Nanocellulose can be obtained by algae and actually, this is quite cheap production method. Therefore, it will be possible to use it in serious bulk materials. In the cars, components from stuff to interior trim will be produced from the light composites reinforced with nanocellulose. By this way, decrease in the weight of the components will save the fuel consumption of the cars.

7.Biofuel

During the production of nanocellulose by algae, it is possible to obtain biofuel at the same time by changing the DNA of the helpful bugs. Result of these process actually will not produce real nanocellulose material, but it will bring into useful byproduct.
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Cellulose Nanocrystal (Nanocrystalline Cellulose,CNC)

Price range: $22.00 through $918.00
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5 grams/22 €                          25 grams/43 €         
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MOL-C Dry 206 Black

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Product Description Heat-curing dry-film paint-like solid lubricants. Dry 206 Black AFCs are formulated with PTFE (polytetrafluoroethylene) in organic binder-solvent system as a
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MOL-C Dry 207 Grey

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Product Description Heat-curing, solid dry-film paint-like lubricants. Dry 207 Grey AFC are formulated with MoS2 (Molybdenum Disulfide), white solids and epoxy
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Mol-C Dry 305 Spray

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Applications

For metal/metal combinations with slow to medium fast movements and high loads. Both the liquid coating and aerosolized spray have been used for improving the running-in process and for lubrication of plain bearings, bushings and sleeves, power screw drives, threaded connections/fasteners, and high voltage switches – even under high vacuum and at extreme temperatures. Additionally, Mol-C Dry 305 Spray is used frequently for slides, guides and tracks. Mol-C Dry 305 Spray is frequently used on hard to reach surfaces or for emergency boundary lubrication as well as on chains or as a multi-purpose penetrant.
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Hydrothermal Synthesis Autoclave Reactor with PPL Lined Vessel 500 ml

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Price range: $495.00 through $2,215.00
Select options This product has multiple variants. The options may be chosen on the product page
APPLICATIONs
  • Chemical synthesis
  • Synthesizing of nanoparticles
  • For cultured crystal growth
  • Polymerization reaction
  • Hydrothermal decomposition
  • Catalyst synthesis
  • Hydrothermal oxidation
  • Hydrothermal precipitation
  • Material Digester / digestion
  • Crystallization process
  • Dissolve of heavy metals, refractory material, organic chemicals etc.
 
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PPL Inside Chamber for Hydrothermal Synthesis Autoclave Reactors

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Price range: $97.50 through $293.75
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50ml   97,5€ 100ml  106,25€ 500ml  293,75€ Product Information Product Name PPL Inside Chamber for Hydrothermal Synthesis Autoclave Reactors Size
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PTFE Inside Chamber for Hydrothermal Synthesis Autoclave Reactors, Volume:50,100,500 ml

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Price range: $47.50 through $217.50
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50ml   47,5€ 100ml  80€ 500ml  217,5€ Product Information Product Name PTFE Inside Chamber for Hydrothermal Synthesis Autoclave Reactors Size
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Hydrothermal Synthesis Autoclave Reactor with PTFE Lined Vessel 500 ml

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Price range: $423.00 through $1,845.00
Select options This product has multiple variants. The options may be chosen on the product page
APPLICATIONs
  • Chemical synthesis
  • Synthesizing of nanoparticles
  • For cultured crystal growth
  • Polymerization reaction
  • Hydrothermal decomposition
  • Catalyst synthesis
  • Hydrothermal oxidation
  • Hydrothermal precipitation
  • Material Digester / digestion
  • Crystallization process
  • Dissolve of heavy metals, refractory material, organic chemicals etc.
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Hydrothermal Synthesis Autoclave Reactor with PTFE Lined Vessel 50 ml

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Price range: $120.00 through $525.00
Select options This product has multiple variants. The options may be chosen on the product page
APPLICATIONs
  • Chemical synthesis
  • Synthesizing of nanoparticles
  • For cultured crystal growth
  • Polymerization reaction
  • Hydrothermal decomposition
  • Catalyst synthesis
  • Hydrothermal oxidation
  • Hydrothermal precipitation
  • Material Digester / digestion
  • Crystallization process
  • Dissolve of heavy metals, refractory material, organic chemicals etc.
 
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Hydrothermal Synthesis Autoclave Reactor with PPL Lined Vessel 100 ml

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Price range: $172.00 through $688.00
Select options This product has multiple variants. The options may be chosen on the product page
APPLICATIONs
  • Chemical synthesis
  • Synthesizing of nanoparticles
  • For cultured crystal growth
  • Polymerization reaction
  • Hydrothermal decomposition
  • Catalyst synthesis
  • Hydrothermal oxidation
  • Hydrothermal precipitation
  • Material Digester / digestion
  • Crystallization process
  • Dissolve of heavy metals, refractory material, organic chemicals etc.
   
teflon-lined-hydrothermal-autoclave
Autoclave-Reactor-for-Hydrothermal-Synthesis
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Hydrothermal Synthesis Autoclave Reactor with PTFE Lined Vessel 100 ml

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$160.00
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APPLICATIONs
  • Chemical synthesis
  • Synthesizing of nanoparticles
  • For cultured crystal growth
  • Polymerization reaction
  • Hydrothermal decomposition
  • Catalyst synthesis
  • Hydrothermal oxidation
  • Hydrothermal precipitation
  • Material Digester / digestion
  • Crystallization process
  • Dissolve of heavy metals, refractory material, organic chemicals etc.
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Roll to Roll PE-CVD System for Continuous Graphene or 2D Film Growth

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Applications:

  • Single layer (transparent) barrier coatings
  • Optical Coatings
  • Dielectric Coating
  • Protection Coating
  • Hard Coating Film
  • Solar Cell Technology
  • Surface Modification
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Three Roll Mill Lab Model

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$16,248.75
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1 piece/16,248.75 € Please contact us for quotes on larger quantities !!! Three Roll Mill Lab Model Three roll mills can serve
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Three Roll Mill

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Applications:

  • Printing Inks
  • Electronic Thick Film Inks
  • High Performance Ceramics
  • Cosmetics
  • Plastisols
  • Carbon/Graphite
  • Paints
  • Pharmaceuticals
  • Chemicals
  • Glass Coatings
  • Dental Composites
  • Pigment
  • Coatings
  • Adhesives
  • Sealants
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High Energy Ball Mill

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$3,940.00
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Applications:

  • Mechanical Alloying
  • Refractory Material Production
  • Paints
  • Pharmaceuticals
  • Geology and Mining
  • Environmental Science
  • Energy and Battery Industry
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High Speed Homogenizer, 27.000 rpm

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$1,868.75
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1 piece/1868.75 € Please contact us for quotes on larger quantities !!! High Speed Homogeniser 27.000 rpm 10~2000 ml Mixing Capacity
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Ultrasonic Homogenizer

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$3,700.00
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Applications of Ultrasonic Homogenizer

Ultrasonic homogenizers have a wide range of applications, including disintegrating cells and biological tissues, DNA protein extraction, RNA hydrolysis, and protein microencapsulation in biology. In chemistry, they are used to accelerate and increase reactions output. They are also used for Earth and sediments treatments in the environment field, as well as quality control, R&D, sample gas removal, dissolution and homogenization, emulsion, and dispersion in general analysis. Additionally, ultrasonic homogenizers can be used in an anti-noise cabin to insulate high noises emitted by ultrasound effects. Our ultrasonic homogenizer packing includes a host, ultrasonic probe, power cord, cable, fuse, operating user manual, sound box, and lifting platform. Choose Nanografi for reliable and high-quality ultrasonic homogenizer solutions tailored to your specific needs.

Ultrasonic Homogenizer Packing List

  1. Host: 1
  2. Ultrasonic Probe: 1
  3. Power Cord: 1
  4. Cable: 1
  5. Fuse: 3
  6. Operating User Manual: 1
  7. Sound Box: 1
  8. Lifting Platform: 1
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Lead Oxide (PbO) Micron Powder, Purity: 99.99 %, Size: 325 mesh, Yellow

Price range: $43.00 through $171.00
Select options This product has multiple variants. The options may be chosen on the product page
100 grams/43 € 500 grams/95 € 1000 grams/171 €    Contact us for tailored quotes on larger quantities & experience exceptional solutions from our
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Phosphorus (P) Micron Powder, Purity: 99.95%, Size: 1 µm, Metal Basis

Price range: $22.00 through $706.00
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Copper (Cu) Micron Powder, Purity: 99.9 %, Size: 325 mesh, Spherical

Price range: $9.00 through $431.00
Select options This product has multiple variants. The options may be chosen on the product page
5 grams/9 €  25 grams/35 €  100 grams/117 €  500 grams/218 €  1000 grams/431 €  Please contact us for quotes on larger quantities !!! Copper (Cu)
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Nitinol Shape Memory Alloy Sheet, Thickness: 1 mm, AF: 50-55°C

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Price range: $6.20 through $210.90
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1cm x 1cm/ 6,20  €                     2 cm x 2cm/   12,45 €    
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Nitinol Shape Memory Alloy Sheet, Thickness: 2 mm, AF: -10 – -15°C

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Price range: $4.50 through $160.00
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1cm x 1cm/  4,50  €                     2 cm x 2cm/  6,75 €    
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Nitinol Shape Memory Alloy Sheet, Thickness: 0,5 mm, AF: 80-85°C

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Price range: $6.80 through $230.75
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1cm x 1cm/  6,80  €                     2 cm x 2cm/   16 €    
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Nitinol Shape Memory Alloy Sheet, Thickness: 0,5 mm, AF: 35-40°C

Price range: $6.85 through $230.75
Select options This product has multiple variants. The options may be chosen on the product page
1cm x 1cm/  6,85  €                     2 cm x 2cm/   16 €    
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Nitinol Shape Memory Alloy Wire, Diameter: 2 mm, AF: 80-85°C

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Price range: $9.75 through $49.25
Select options This product has multiple variants. The options may be chosen on the product page
1 meter / 9.75 € 5 meters /  33.75 € 10 meters /  49.25 €  Please contact us for quotes
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Nitinol Shape Memory Alloy Wire, Diameter: 1 mm, AF: 45-50°C

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Price range: $4.50 through $24.65
Select options This product has multiple variants. The options may be chosen on the product page
1 meter / 4,50 € 5 meters /  18 € 10 meters /  24,65 €  Please contact us for quotes
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Nitinol Shape Memory Alloy Wire, Diameter: 1 mm, AF: 15-20°C

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Price range: $4.50 through $24.65
Select options This product has multiple variants. The options may be chosen on the product page
1 meter / 4.50 € 5 meters /  18 € 10 meters /  24.65 €  Please contact us for quotes
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Nitinol Shape Memory Alloy Wire, Diameter: 0,5 mm, AF: -10 – -15°C

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Price range: $4.65 through $24.90
Select options This product has multiple variants. The options may be chosen on the product page
1 meter/  4.65  € 5 meters/  18.50  € 10 meters/  24.90   €  Please contact us for quotes on larger quantities !
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Nitinol Shape Memory Alloy Wire, Diameter: 1,5 mm, AF: 35-40°C

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Price range: $5.60 through $30.75
Select options This product has multiple variants. The options may be chosen on the product page
1 meter / 5.60 € 5 meters /  21 € 10 meters /  30.75 €  Nitinol Shape Memory Alloy Wire
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Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”

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$149.00
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Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.
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Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”

, , ,
$277.00
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Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.
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Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”

, , ,
$401.00
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Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.
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Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”

, , ,
$464.00
Add to cart

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.
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Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”

, , , ,
$528.00
Add to cart

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.
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Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”

, , ,
$610.00
Add to cart

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.
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Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”

, , ,
$729.00
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Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.