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Magnesium ACAC
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Magnesium ACAC

Price range: $16.00 through $36.00
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Product Magnesium ACAC
CAS No. 13963-72-1
Appearance White crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Mg(C₅H₇O₂)₂
Molecular Weight 214.42 g/mol
Melting Point 150–160 °C
Boiling Point N/A
Density N/A
Product Codes NCZ-284R
 
Magnesium ascorbyl phosphate(Cosmetic grade) (539640)
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Magnesium ascorbyl phosphate(Cosmetic grade) (539640)

$515.00
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Magnesium ascorbyl phosphate(Cosmetic grade) (539640)

      Synonym Vitamin C magnesium phosphate, Magnesium L-Ascorbyl Phosphate Structure
Molecular Formula C12H12O18P2Mg3·10H2O

 TEST SPECIFICATIONS
1. Appearance White to pale yellow powder
2. Assay ≥98.50%
3. Loss on Drying ≤20%
4. Heavy metals(Pb) ≤0.001%
5. Arsenic ≤0.0002%
6. pH(3%aqueous solution) 7.0-8.5
7. State of solution(3% aqueous solution Colorless to pale yellowish transparent
8. Color of solution(APHA) ≤70
9. Free ascorbic acid ≤0.5%
10. Free Phosphoric acid ≤1%
11. Ketogulonic acid and its derivatives ≤2.5%
12. Derivatives of ascorbic acid ≤3.5 %
13. Chloride ≤0.35%
14. Total aerobic coumt ≤100 per gram
15. Packaging 1 kg aluminum foil bag, 5/10kg carton, 25 kg barrel, according to customer requirements
16. Shelf life 3 yr after production
Product Codes- NCZ-2709K
Magnesium borate whisker(Mg2B2O5, L/D≥10) (121665)
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Magnesium borate whisker(Mg2B2O5, L/D≥10) (121665)

$335.00
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Magnesium borate whisker(Mg2B2O5, L/D≥10) (121665)
Test Items Specifications
Mg2B2O5 ≥99%
Acid insoluble matter ≤0.5%
Water content ≤0.5%
L/D ≥10
 
Product Codes- NCZ-2754K
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Magnesium Carbonate (MgCO3) Nanopowder/Nanoparticles, Purity: 99.55%, Size: 8 nm

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Price range: $49.00 through $506.00
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25 grams/44 € 100 grams/133 € 500 grams/269 € 1000 grams/446 € Please contact us for quotes on larger quantities !!!

Magnesium Carbonate (MgCO3) Nanopowder/Nanoparticles

Purity: 99.55%, Size: 8 nm

Technical Properties:

Purity (%) 99.55
Color white
Average Particle Size (nm) 8
Specific Surface Area (m2/g)    >50
Bulk Density (g/cm3) 0,1
Whiteness 97.7
Loss of Weight in Drying (%) 2,2
Loss of Weight on Ignitioin (%) 54.0
Elemental Analysis (%) Cl K Na SO4 Ca Fe
0.009 0.005 0.05 0.01 0.05 0.001

Applications:

Magnesium carbonate nanoparticle have many applications in industry. It can be used as drying agent, filler material, color retention, smoke suppressant, and reinforcing agent in rubber. It is used in daily used products. for example it is used in cosmetics, toothpaste, fireproofing, and fire extinguishing compositions.  
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Magnesium Carbonate (MgCO3) Nanopowder/Nanoparticles, Purity: 99.95 %, Size: 10-70 nm

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Price range: $49.00 through $504.00
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25 grams/44 €                        
100 grams/133 €                     
500 grams/269 €                    
1000 grams/446 € Please contact us for quotes on larger quantities !!!

Magnesium Carbonate (MgCO3) Nanopowder/Nanoparticles

Purity: 99.95 %, Size: 10-70 nm

Magnesium carbonate trihydrate whisker(MgCO3·3H2O, ≥99%, L=30-50µm, D=0.2-0.5µm) (126665)
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Magnesium carbonate trihydrate whisker(MgCO3·3H2O, ≥99%, L=30-50µm, D=0.2-0.5µm) (126665)

$682.00
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Magnesium carbonate trihydrate whisker(MgCO3·3H2O, ≥99%, L=30-50µm, D=0.2-0.5µm) (126665)

     

MgO

30.16%

Length-Diameter ratio

50-100

Length/µm

30-50

Diameter/µm

0.2-0.5
 
Product Codes- NCZ-2753K
Magnesium carbonate whisker(MgCO3, ≥98%, D=1-2um, L=20-60um) (125665)
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Magnesium carbonate whisker(MgCO3, ≥98%, D=1-2um, L=20-60um) (125665)

$540.00
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Magnesium carbonate whisker(MgCO3, ≥98%, D=1-2um, L=20-60um) (125665)

     

MgO

≥47.3%

Length-Diameter ratio

20-50

Length/um

20-60

Diameter/um

1-2
 
Product Codes- NCZ-2752K
Magnesium diboride(MgB2, 99%-99.9%, 200 mesh) (750530)
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Magnesium diboride(MgB2, 99%-99.9%, 200 mesh) (750530)

Price range: $655.00 through $845.00
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Magnesium diboride(MgB2, 99%-99.9%, 200 mesh) (750530)

Synonym: Magnesium boride

Product Codes- NCZ-2694K
Magnesium Fluoride (MgF2) Sputtering Target
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Magnesium Fluoride (MgF2) Sputtering Target

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Price range: $421.00 through $975.00
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Product 

 Magnesium Fluoride (MgF2) Sputtering Target

CAS No.

7783-40-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 62.30 g/mol

Melting Point

~1,261 °C

Boiling Point

~2,260 °C

Density

  ~3.15 g/cm³

Product Codes

NCZ-1340K
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Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”

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$307.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.125''
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Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”

$350.00
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 Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.125''

CAS No.

7783-40-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  62.30 g/mol

Melting Point

~1263 °C

Boiling Point

~2260 °C

Density

  3.18 g/cm³

Product Codes

NCZ-1986K
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Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”

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$384.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.250''
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Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”

$440.00
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Product 

 Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.250''

CAS No.

7783-40-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  62.30 g/mol

Melting Point

~1263 °C

Boiling Point

~2260 °C

Density

  3.18 g/cm³

Product Codes

NCZ-1985K
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Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”

, ,
$495.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''
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Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”

$568.00
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Product 

 Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''

CAS No.

7783-40-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  62.30 g/mol

Melting Point

~1263 °C

Boiling Point

~2260 °C

Density

  3.18 g/cm³

Product Codes

NCZ-1984K
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Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250′

, ,
$540.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.250''
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Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”

$621.00
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Product 

 Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.250''

CAS No.

7783-40-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  62.30 g/mol

Melting Point

~1263 °C

Boiling Point

~2260 °C

Density

  3.18 g/cm³

Product Codes

NCZ-1983K
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Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”

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$567.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.125''
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Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”

$652.00
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Product 

 Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.125''

CAS No.

7783-40-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  62.30 g/mol

Melting Point

~1263 °C

Boiling Point

~2260 °C

Density

  3.18 g/cm³

Product Codes

NCZ-1982K
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Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”

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$324.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.250''
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Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”

$370.00
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Product 

 Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.250''

CAS No.

7783-40-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  62.30 g/mol

Melting Point

~1263 °C

Boiling Point

~2260 °C

Density

  3.18 g/cm³

Product Codes

NCZ-1981K
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Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”

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$448.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.125''
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Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”

$514.00
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Product 

 Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.125''

CAS No.

7783-40-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  62.30 g/mol

Melting Point

~1263 °C

Boiling Point

~2260 °C

Density

  3.18 g/cm³

Product Codes

NCZ-1980K
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Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”

,
$495.00
Add to cart

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.250''
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Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”

$560.00
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Product 

 Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.250''

CAS No.

7783-40-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  62.30 g/mol

Melting Point

~1263 °C

Boiling Point

~2260 °C

Density

  3.18 g/cm³

Product Codes

NCZ-1979K
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Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 6”, Thickness: 0.250”

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$792.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 6'', Thickness: 0.250''
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Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 6”, Thickness: 0.250”

$899.00
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Product 

 Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 6'', Thickness: 0.250''

CAS No.

7783-40-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  62.30 g/mol

Melting Point

~1263 °C

Boiling Point

~2260 °C

Density

  3.18 g/cm³

Product Codes

NCZ-1978K
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Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 8”, Thickness: 0.250”

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$1,138.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 8'', Thickness: 0.250''
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Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 8”, Thickness: 0.250”

$1,294.00
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Product 

 Magnesium Fluoride (MgF2) Sputtering Targets, Purity: 99.9%, Size: 8'', Thickness: 0.250''

CAS No.

7783-40-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  62.30 g/mol

Melting Point

~1263 °C

Boiling Point

~2260 °C

Density

  3.18 g/cm³

Product Codes

NCZ-1977K
Magnesium Fluoride, MgF2 99.99% 4N High Purity Powder
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Magnesium Fluoride, MgF2 99.99% 4N High Purity Powder

Price range: $189.00 through $489.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Magnesium Fluoride, MgF2 99.99% 4N High Purity Powder
CAS No. 7783-40-6
Appearance White, odorless crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1-10nm (Size Can be customized),  Ask for other available size range.
Ingredient MgF2
Molecular Weight 62.30 g/mol
Melting Point 1,261 °C
Boiling Point 2,260 °C
Density 3.15 g/cm³
Product Codes NCZ-450I
 
Magnesium Fluoride, MgF2 99% Powder
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Magnesium Fluoride, MgF2 99% Powder

$121.00
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Product Magnesium Fluoride, MgF2 99% Powder
CAS No. 7783-40-6
Appearance White to off-white crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1-20nm (Size Can be customized),  Ask for other available size range.
Ingredient MgF2
Molecular Weight 62.30 g/mol
Melting Point N/A
Boiling Point N/A
Density 3.15 g/cm³
Product Codes NCZ-449I
Magnesium HFAC
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Magnesium HFAC

Price range: $16.00 through $92.00
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Product Magnesium HFAC
CAS No. 19648-85-2 
Appearance White to light yellowish-red crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient C₁₀H₆F₁₂MgO₆
Molecular Weight 474.44 g/mol
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-321R
 
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Magnesium Hydroxide (Mg(OH)2) Nanopowder/Nanoparticles, Purity: 99.5%, Size: 8 nm

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Price range: $27.00 through $221.00
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5 grams/24 € 
25 grams/37 € 100 grams/58 €
500 grams/112 €  1000 grams/195 € 
                      
Please contact us for quotes on larger quantities !!! 

Magnesium Hydroxide (Mg(OH)2) Nanopowder/Nanoparticles

Purity: 99.5%, Size: 8 nm

Technical Properties:

Purity (%) 99.5
Color white
Average Particle Size (nm) 8
Specific Surface Area (m2/g)    >95
Bulk Density (g/cm3) 0,2
True Density (g/cm3) 2,4
Loss of Weight in Drying (%) 1,8
Loss of Weight on Ignitioin (%) 31.0
Elemental Analysis (%) Na K Ca
0.1 0.045 0.28

Applications:

Magnesium Hydroxide nanoparticles can be used in fire retarding and smoke suppressing. It undergoes endothermic decomposition releasing water which enables it to delay ignition and to dilute combustible gases. plus it inhibits oxygen from aiding the combustion. In industry magnesium hydroxide is used to neutralise acidic waste-waters.
Magnesium myristate(Cosmetic grade) (437614)
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Magnesium myristate(Cosmetic grade) (437614)

$217.00
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Magnesium myristate(Cosmetic grade) (437614)
Product name: Magnesium myristate Molecular formula: [CH3(CH2)12COO]2Mg Properties: Magnesium myristate is fine white crystal powder; soluble in hot water and hot ethyl alcohol; lightly soluble in organic solvent, such as ethyl alcohol and ether; Main uses It is used as emulsifying agent, lubricating agent, surface active agent, dispersing agent in personal-care supply field.   Quality standard
Testing item Testing standard
appearance white fine powder
loss on drying, % ≤6.0
magnesium oxide content, % 8.2~8.9
melting point, ℃ 132~138
free acid, % ≤3.0
iodine value ≤1.0
fineness  , %  200 mesh passing≥99.0
heavy metal(in Pb), % ≤0.0020
lead, % ≤0.0010
arsenic, % ≤0.0005
Product Codes- NCZ-2715K
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Magnesium Oxide (MgO) Nanopowder/Nanoparticles Ethanol Dispersion, Size: 45 nm, 22 wt%

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Price range: $60.00 through $392.00
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Magnesium Oxide (MgO) Nanopowder/Nanoparticles Ethanol Dispersion Size: 45 nm, 22 wt%
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Magnesium Oxide (MgO) Nanopowder/Nanoparticles Water Dispersion, Size: 45 nm, 22 wt%

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Price range: $42.00 through $283.00
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  30 ml/38 € 60 ml/64 € 120 ml/98 € 500 ml/166 € 1000 ml/251 €      
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Magnesium Oxide (MgO) Nanopowder/Nanoparticles Water Dispersion

Size: 45 nm, 22 wt%

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Magnesium Oxide (MgO) Nanopowder/Nanoparticles Water Dispersion, Size: 45 nm, 22 wt%

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Price range: $41.00 through $183.00
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30 ml/38 € 60 ml/64 € 120 ml/98 € 500 ml/166 € 1000 ml/251 €      
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Magnesium Oxide (MgO) Nanopowder/Nanoparticles Water Dispersion

Size: 45 nm, 22 wt%

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Magnesium Oxide (MgO) Nanopowder/Nanoparticles, Purity: 99.5+%, Size: < 55 nm

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Price range: $19.00 through $152.00
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25 grams/17 € 
100 grams/47 € 500 grams/94 €
1000 grams/135 € 
                     
Please contact us for quotes on larger quantities !!! 

Magnesium Oxide (MgO) Nanopowder/Nanoparticles

Purity: 99.5+%, Size: < 55 nm

Technical Properties:

Purity (%) 99.5+
Color white
Average Particle Size (nm) <55
Morphology polyhedral
True Density (g/cm3) 3,6
Elemental Analysis (%) Na K Ca
0.16 0.023 0.096

Applications:

Magnesium oxide nanoparticles have wide applications in catalysis, ceramics, electronics, coatings, and petrochemical products. It is used as fire retardant and is added to plastics and fibers. It is also used as dehydration agent for the production of high grade ceramic material, silicon steel sheet, and electronic industry material. Magnesium oxide nanoparticle is a good insulating material. It is used for making insulating conduits, smelters, crucibles, electrode bars and sheets. In electronics magnesium oxide nanoparticle is used in radio industry. It is used for making high frequency magnetic rod antenna, magnetic device filler, and insulating material filler. Magnesium oxide nanoparticle is used as fuel additive, antistatic agent, cleaner, and corrosion inhibitor. It has other wide applications in industry. It is used along with other materials to improve their properties such as, refractory fibers and refractory materials, refractory and insulating instruments, optical materials, materials for steel-smelting furnace and other high-temperature furnaces, heating materials, and ceramic base plates.  
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Magnesium Oxide (MgO) Nanopowder/Nanoparticles, Purity: 99.5+%, Size: < 90 nm

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Price range: $29.00 through $152.00
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25 grams/26 € 100 grams/47 € 500 grams/94 € 1000 grams/135 €
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Magnesium Oxide (MgO) Nanopowder/Nanoparticles

Purity: 99.5+%, Size: < 90 nm

Technical Properties:

Purity (%) 99.5+
Color white
Average Particle Size (nm) < 90
Morphology polyhedral
Bulk Density (g/cm3) 0.2
True Density (g/cm3) 3,6
Elemental Analysis (%) Na K Ca
0.16 0.023 0.096

Applications:

Magnesium oxide nanoparticles have wide applications in catalysis, ceramics, electronics, coatings, and petrochemical products. It is used as fire retardant and is added to plastics and fibers. It is also used as dehydration agent for the production of high grade ceramic material, silicon steel sheet, and electronic industry material. Magnesium oxide nanoparticle is a good insulating material. It is used for making insulating conduits, smelters, crucibles, electrode bars and sheets. In electronics magnesium oxide nanoparticle is used in radio industry. It is used for making high frequency magnetic rod antenna, magnetic device filler, and insulating material filler. Magnesium oxide nanoparticle is used as fuel additive, antistatic agent, cleaner, and corrosion inhibitor. It has other wide applications in industry. It is used along with other materials to improve their properties such as, refractory fibers and refractory materials, refractory and insulating instruments, optical materials, materials for steel-smelting furnace and other high- temperature furnaces, heating materials, and ceramic base plates.  
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Magnesium Oxide (MgO) Nanopowder/Nanoparticles, Purity: 99.5+%, Size: 18 nm

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Price range: $29.00 through $152.00
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25 grams/26 € 
100 grams/46 € 500 grams/94 €
1000 grams/135 € 
                      
Please contact us for quotes on larger quantities !!! 

Magnesium Oxide (MgO) Nanopowder/Nanoparticles

Purity: 99.5+%, Size: 18 nm

Technical Properties:

Purity (%) 99.5+
Color white
Average Particle Size (nm) 18
Specific Surface Area (m2/g)    >65
Morphology polyhedral
Bulk Density (g/cm3) 0,2
True Density (g/cm3) 3,6
Elemental Analysis (%) Na K Ca
0.16 0.023 0.096

Applications:

Magnesium oxide nanoparticles have wide applications in catalysis, ceramics, electronics, coatings, and petrochemical products. It is used as fire retardant and is added to plastics and fibers. It is also used as dehydration agent for the production of high grade ceramic material, silicon steel sheet, and electronic industry material. Magnesium oxide nanoparticle is a good insulating material. It is used for making insulating conduits, smelters, crucibles, electrode bars and sheets. In electronics magnesium oxide nanoparticle is used in radio industry. It is used for making high frequency magnetic rod antenna, magnetic device filler, and insulating material filler. Magnesium oxide nanoparticle is used as fuel additive, antistatic agent, cleaner, and corrosion inhibitor. It has other wide applications in industry. It is used along with other materials to improve their properties such as, refractory fibers and refractory materials, refractory and insulating instruments, optical materials, materials for steel-smelting furnace and other high- temperature furnaces, heating materials, and ceramic base plates.
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Magnesium Oxide (MgO) Nanopowder/Nanoparticles, Purity: 99.5+%, Size: 35 nm

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Price range: $29.00 through $152.00
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25 grams/26 € 100 grams/46 €
500 grams/94 € 1000 grams/135 
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Magnesium Oxide (MgO) Nanopowder/Nanoparticles

Purity: 99.5+%, Size: 35 nm

Technical Properties:

Purity (%) 99.5+
Color white
Average Particle Size (nm) 35
Specific Surface Area (m2/g)    >25
Morphology polyhedral
True Density (g/cm3) 3,6
Elemental Analysis (%) Na K Ca
0.075 0.022 0.076

Applications:

Magnesium oxide nanoparticles have wide applications in catalysis, ceramics, electronics, coatings, and petrochemical products. It is used as fire retardant and is added to plastics and fibers. It is also used as dehydration agent for the production of high grade ceramic material, silicon steel sheet, and electronic industry material. Magnesium oxide nanoparticle is a good insulating material. It is used for making insulating conduits, smelters, crucibles, electrode bars and sheets. In electronics magnesium oxide nanoparticles is used in radio industry. It is used for making high frequency magnetic rod antenna, magnetic device filler, and insulating material filler. Magnesium oxide nanoparticle is used as fuel additive, antistatic agent, cleaner, and corrosion inhibitor. It has other wide applications in industry. It is used along with other materials to improve their properties such as, refractory fibers and refractory materials, refractory and insulating instruments, optical materials, materials for steel-smelting furnace and other high- temperature furnaces, heating materials, and ceramic base plates.  
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Magnesium Oxide (MgO) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 45 nm

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Price range: $41.00 through $438.00
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25 grams/37 € 100 grams/58 € 500 grams/119 € 1000 grams/388 €
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Magnesium Oxide (MgO) Nanopowder/Nanoparticles

Purity: 99.95%, Size: 45 nm

Technical Properties:

Purity (%) 99.95
Color white
Average Particle Size (nm) 45
Specific Surface Area (m2/g)    >45
Morphology polyhedral
True Density (g/cm3) 3,6
Elemental Analysis (%) Na K Ca
0.023 0.0089 0.016

Applications:

Magnesium oxide nanoparticles have wide applications in catalysis, ceramics, electronics, coatings, and petrochemical products. It is used as fire retardant and is added to plastics and fibers. It is also used as dehydration agent for the production of high grade ceramic material, silicon steel sheet, and electronic industry material. Magnesium oxide nanoparticle is a good insulating material. It is used for making insulating conduits, smelters, crucibles, electrode bars and sheets. In electronics magnesium oxide nanoparticle is used in radio industry. It is used for making high frequency magnetic rod antenna, magnetic device filler, and insulating material filler. Magnesium oxide nanoparticles is used as fuel additive, antistatic agent, cleaner, and corrosion inhibitor. It has other wide applications in industry. It is used along with other materials to improve their properties such as, refractory fibers and refractory materials, refractory and insulating instruments, optical materials, materials for steel-smelting furnace and other high- temperature furnaces, heating materials, and ceramic base plates.
Magnesium Oxide (MgO) Sputtering Target
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Magnesium Oxide (MgO) Sputtering Target

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Price range: $423.00 through $901.00
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Product 

 Magnesium Oxide (MgO) Sputtering Target

CAS No.

1309-48-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 40.30 g/mol

Melting Point

 ~2,800 °C

Boiling Point

 ~3,600 °C

Density

 ~3.58 g/cm³

Product Codes

NCZ-1320K
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Magnesium Oxide (MgO) Sputtering Targets, elastomer, Purity: 99.95%, Size: 2”, Thickness: 0.125”

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$976.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Magnesium Oxide (MgO) Sputtering Targets, elastomer, Purity: 99.95%, Size: 2'', Thickness: 0.125''
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Magnesium Oxide (MgO) Sputtering Targets, elastomer, Purity: 99.95%, Size: 2”, Thickness: 0.125”

$1,109.00
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Product 

 Magnesium Oxide (MgO) Sputtering Targets, elastomer, Purity: 99.95%, Size: 2'', Thickness: 0.125''

CAS No.

1309-48-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 40.30 g/mol

Melting Point

 ~2852 °C

Boiling Point

~3600 °C

Density

  ~3.58 g/cm³

Product Codes

NCZ-1958K
Magnesium Oxide (MgO) Sputtering Targets, indium, Purity: 99.95%, Size: 2'', Thickness: 0.125''
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Magnesium Oxide (MgO) Sputtering Targets, elastomer, Purity: 99.95%, Size: 2”, Thickness: 0.125”

$1,145.00
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Product 

 Magnesium Oxide (MgO) Sputtering Targets, indium, Purity: 99.95%, Size: 2'', Thickness: 0.125''

CAS No.

1309-48-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 40.30 g/mol

Melting Point

 ~2852 °C

Boiling Point

~3600 °C

Density

  ~3.58 g/cm³

Product Codes

NCZ-1959K
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Magnesium Oxide (MgO) Sputtering Targets, indium, Purity: 99.95%, Size: 2”, Thickness: 0.125”

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$1,008.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

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Magnesium Oxide (MgO) Sputtering Targets, indium, Purity: 99.95%, Size: 2”, Thickness: 0.125”

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$1,008.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

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Magnesium Oxide (MgO) Sputtering Targets, indium, Purity: 99.95%, Size: 2”, Thickness: 0.250”

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$111.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Magnesium Oxide (MgO) Sputtering Targets, indium, Purity: 99.95%, Size: 2'', Thickness: 0.250''
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Magnesium Oxide (MgO) Sputtering Targets, indium, Purity: 99.95%, Size: 2”, Thickness: 0.250”

$121.00
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Product 

 Magnesium Oxide (MgO) Sputtering Targets, indium, Purity: 99.95%, Size: 2'', Thickness: 0.250''

CAS No.

1309-48-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 40.30 g/mol

Melting Point

 ~2852 °C

Boiling Point

~3600 °C

Density

  ~3.58 g/cm³

Product Codes

NCZ-1957K
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Magnesium Oxide (MgO) Sputtering Targets, indium, Purity: 99.95%, Size: 3”, Thickness: 0.125”

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$1,282.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Magnesium Oxide (MgO) Sputtering Targets, indium, Purity: 99.95%, Size: 3'', Thickness: 0.125''
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Magnesium Oxide (MgO) Sputtering Targets, indium, Purity: 99.95%, Size: 3”, Thickness: 0.125”

$1,458.00
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Product 

 Magnesium Oxide (MgO) Sputtering Targets, indium, Purity: 99.95%, Size: 3'', Thickness: 0.125''

CAS No.

1309-48-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 40.30 g/mol

Melting Point

 ~2852 °C

Boiling Point

~3600 °C

Density

  ~3.58 g/cm³

Product Codes

NCZ-1956K
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Magnesium Oxide (MgO) Sputtering Targets, indium, Purity: 99.95%, Size: 4”, Thickness: 0.125”

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$1,849.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.
Manganese (Mn) Sputtering Targets, Purity: 99.95%, Size: 1'', Thickness: 0.125''
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Magnesium Oxide (MgO) Sputtering Targets, indium, Purity: 99.95%, Size: 4”, Thickness: 0.125”

$2,106.00
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Product 

 Magnesium Oxide (MgO) Sputtering Targets, indium, Purity: 99.95%, Size: 4'', Thickness: 0.125''

CAS No.

1309-48-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 40.30 g/mol

Melting Point

 ~2852 °C

Boiling Point

~3600 °C

Density

  ~3.58 g/cm³

Product Codes

NCZ-1955K
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Magnesium Oxide (MgO) Sputtering Targets, indium, Purity: 99.95%, Size:1”, Thickness: 0.125”

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$868.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Magnesium Oxide (MgO) Sputtering Targets, indium, Purity: 99.95%, Size:1'', Thickness: 0.125''
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Magnesium Oxide (MgO) Sputtering Targets, indium, Purity: 99.95%, Size:1”, Thickness: 0.125”

$986.00
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Product 

 Magnesium Oxide (MgO) Sputtering Targets, indium, Purity: 99.95%, Size:1'', Thickness: 0.125''

CAS No.

1309-48-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 40.30 g/mol

Melting Point

 ~2852 °C

Boiling Point

~3600 °C

Density

  ~3.58 g/cm³

Product Codes

NCZ-1960K
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Magnesium Oxide (MgO) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.125”

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$602.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Magnesium Oxide (MgO) Sputtering Targets, Purity: 99.95%, Size: 1'', Thickness: 0.125''
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Magnesium Oxide (MgO) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.125”

$682.00
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Product 

 Magnesium Oxide (MgO) Sputtering Targets, Purity: 99.95%, Size: 1'', Thickness: 0.125''

CAS No.

1309-48-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 40.30 g/mol

Melting Point

 ~2852 °C

Boiling Point

~3600 °C

Density

  ~3.58 g/cm³

Product Codes

NCZ-1976K
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Magnesium Oxide (MgO) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.250”

,
$675.00
Add to cart

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When etching anisotropy is high, sputter etching is the preferred method.

is required, and selectivity is unimportant. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Magnesium Oxide (MgO) Sputtering Targets, Purity: 99.95%, Size: 1'', Thickness: 0.250''
Add to compare
Quick view
Add to wishlist

Magnesium Oxide (MgO) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.250”

$765.00
Add to cart

Product 

 Magnesium Oxide (MgO) Sputtering Targets, Purity: 99.95%, Size: 1'', Thickness: 0.250''

CAS No.

1309-48-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 40.30 g/mol

Melting Point

 ~2852 °C

Boiling Point

~3600 °C

Density

  ~3.58 g/cm³

Product Codes

NCZ-1975K