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PAMAM dendrimer(Ethylenediamine core) -COONa End Group
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PAMAM dendrimer(Ethylenediamine core) -COONa End Group

Price range: $265.00 through $765.00
Select options This product has multiple variants. The options may be chosen on the product page
PAMAM dendrimer(Ethylenediamine core) -COONa End Group  
  -COONa End Group 105S 0.5 -COONa 8 1269 C46H72N10020Na8 265
115S 1.5 -COONa 16 2934 CllOHl76N26044 Na16 379
125S 2.5 -COONa 32 6266 C238H384N58092 Na32 425
135S 3.5 -COONa 64 12927 C494H800N1220188Na64 615
145S 4.5 -COONa 128 26251 C1006H1632N2500380Na128 765
  Product Codes- NCZ-2624K
Titanium diboride(TiB2, 99.5%, 2.6μm) (222827)
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Titanium diboride(TiB2, 99.5%, 2.6μm) (222827)

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Titanium diboride(TiB2, 99.5%, 2.6μm) (222827)
   

Test Items

Results

TiB2 (%)

99.79

Ti (%)

68.52

B (%)

31.03

D50 (µm)

2.6
Product Codes- NCZ-2693K
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Magnetic Graphene Aerogel, Content of Fe3O4: 65%, Diameter: 2±0.4 cm

Price range: $266.00 through $1,233.00
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Please contact us for quotes for larger quantities !   This aerogel is a self-assembled, 3d porous foam material with high quality sheet layer < 3 graphene oxide and Fe3O4 nanoparticles as raw materials. The aerogel has micron-sized macropores and nano-sized mesoporous pores to form a rich compound void structure. With stable chemical properties, large specific surface area and abundant pores, this aerogel is suitable for the adsorption of copper, chromium, lead and other heavy metals in water.
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Magnetic Graphene Aerogel, Content of Fe3O4: 50%, Diameter: 2±0.4 cm

Price range: $267.00 through $1,239.00
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Please contact us for quotes for larger quantities !   This aerogel is a self-assembled, 3d porous foam material with high quality sheet layer < 3 graphene oxide and Fe3O4 nanoparticles as raw materials. The aerogel has micron-sized macropores and nano-sized mesoporous pores to form a rich compound void structure. With stable chemical properties, large specific surface area and abundant pores, this aerogel is suitable for the adsorption of copper, chromium, lead and other heavy metals in water. Please Click for TDS
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Ultralight Graphene Aerogel, Diameter: 2±0.4 cm, Height: 2±0.4 cm

Price range: $267.00 through $1,069.00
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Please contact us for quotes for larger quantities !   Graphene aerogels are materials which have elasticity and they can easily gain their original form after some compression. In addition, the low density of graphene aerogels enables them to be very absorbent. This material can absorb more than 850 times of its own weight. This property means that it could be useful for environmental clean-ups like oil spills, and the aerogels only need to be picked up later after absorbing the spilled material. Graphene aerogel may also have some applications in both the storage and the transfer of energy by enabling the creation of lighter, higher-energy-density batteries and vigorous research is being done on the matter.
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Indium Zinc Oxide/IZO (InZnO) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”

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$267.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

Even very low quantities of contaminants can be detected with the aid of the sputtering target, allowing for the determination of the target material's composition.

Applications for sputtering targets are also found in space. One type of space weathering is sputtering, which modifies the chemical and physical characteristics of airless worlds like the Moon and asteroids.

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Copper (Cu) Sputtering Targets, Purity: 99.99%, Size: 8”, Thickness: 0.125”

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$268.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Activated carbon for supercapacitor(Aqueous electrolyte) (161817)
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Activated carbon for supercapacitor(Aqueous electrolyte) (161817)

$268.00
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Activated carbon for supercapacitor(Aqueous electrolyte) (161817) Product introduction The product is prepared by a series of process including carbonization, activation and purification based on biomass as the carbon precursor, which can be widely used in these filed including supercapacitors, lead-carbon batteries and hydrogen storage. It has some advantages such as high specific surface area, abundant pore volume, high bulk density, low ash and metallic iron content, which shows high energy and power density, as well as long cycle life as the electrode material for supercapacitors. Technical parameters
Items Results
Shape near-spherical
Average size D50 (μm) 11.2
Water content (%) 0.1
Ash content (%) 0.06
Specific surface area (m2/g) 1850
Pore volume (cm3/g) 0.6
pH value 6-7
Tap density (g/ml) 0.48
Iron Content (ppm) 7
Organic capacitance (F/g) 120
Inorganic capacitance (F/g) 240
Product Codes- NCZ-2757K
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Silicon (Si) Nanopowder/Nanoparticles, Purity: 97+%, Size: 25-35 nm, Laser Synthesized

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Price range: $269.00 through $809.28
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Silicon (Si) Nanopowder/Nanoparticles Purity: 97+%, Size: 25-35 nm, Laser Synthesized Technical Properties: True Density (g/cm3) 2,3 Bulk Density (g/cm3) 0,1
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Boron Doped Graphene Nanopowder (B/G)

Price range: $269.00 through $1,765.00
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Applications of Boron Doped Graphene Nanopowder

  • Electro Catalyst
  • Field-effect Transistors
  • Sensors
  • Lithium-ion Batteries
  • Supercapacitors
  • 2D Materials
  • Energy Storage & Batteries
  • Fuel Cells
  • Nanomaterials Research
  • Semiconductors
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Monolayer Graphene on SiO2/Si Substrate, Size: 2″

Price range: $269.00 through $1,094.00
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1 piece/ 269 €    5 pieces/ 1094 €   Contact us for tailored quotes on larger quantities & experience exceptional solutions from our
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Boron Doped Graphene Nanopowder (B/G)

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Price range: $269.00 through $1,765.00
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100 gram: 269€ 5 grams: 1080€                          10 grams:
5N (99.999%) Copper (Cu) Pellets Evaporation Materials
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5N (99.999%) Copper (Cu) Pellets Evaporation Materials

Price range: $269.00 through $909.00
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Product 5N (99.999%) Copper (Cu) Pellets Evaporation Materials
CAS No. 7440-50-8
Appearance Reddish-orange, metallic 
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Cu
Molecular Weight 78.07 g/mol
Melting Point 1,083 °C
Boiling Point N/A
Density 8.96 g/cm³
Product Codes NCZ-104E
 
Zinc Oxide (ZnO) Sputtering Target
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Zinc Oxide (ZnO) Sputtering Target

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Price range: $269.00 through $618.00
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Product 

 Zinc Oxide (ZnO) Sputtering Target

CAS No.

1314-13-2

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 81.38 g/mol

Melting Point

~1,975 °C

Boiling Point

~2,360 °C

Density

 ~5.61 g/cm³

Product Codes

NCZ-1331K
4N (99.99%) Tin (Sn) Pellets Evaporation Materials
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4N (99.99%) Tin (Sn) Pellets Evaporation Materials

Price range: $269.00 through $1,249.00
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Product 4N (99.99%) Tin (Sn) Pellets Evaporation Materials
CAS No. 7440-31-5
Appearance Light Yellow Crystal Granule
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1-3mm (Size Can be customized),  Ask for other available size range.
Ingredient Sn
Molecular Weight 118.71 g/mol
Melting Point N/A
Boiling Point N/A
Density 7.31 g/cm³
Product Codes NCZ-174I
 
5N (99.999%) Copper (Cu) Pellets Evaporation Materials
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5N (99.999%) Copper (Cu) Pellets Evaporation Materials

Price range: $269.00 through $909.00
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Product 5N (99.999%) Copper (Cu) Pellets Evaporation Materials
CAS No. 7440-50-8
Appearance Reddish metallic solid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1–4 mm (Size Can be customized),  Ask for other available size range.
Ingredient Cu
Molecular Weight 63.55 g/mol
Melting Point 1,085 °C
Boiling Point 2,562 °C
Density N/A
Product Codes NCZ-198I
 
Silicon Dioxide (SiO2) Sputtering Targets, Fused Quartz, Purity: 99.995%, Size: 6'', Thickness: 0.125''
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Silicon Dioxide (SiO2) Sputtering Targets, Fused Quartz, Purity: 99.995%, Size: 6”, Thickness: 0.125”

$269.00
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Product 

 Silicon Dioxide (SiO2) Sputtering Targets, Fused Quartz, Purity: 99.995%, Size: 6'', Thickness: 0.125''

CAS No.

7631-86-9

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 60.08 g/mol

Melting Point

~1710°C

Boiling Point

 ~2,950 °C

Density

 ~2.20 g/cm³

Product Codes

NCZ-1712K
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Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 6”, Thickness: 0.250”

, , ,
$270.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

4N (99.99%) Calcium Fluoride (CaF2) Pieces Evaporation Materials
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4N (99.99%) Calcium Fluoride (CaF2) Pieces Evaporation Materials

Price range: $270.00 through $867.00
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Product 4N (99.99%) Calcium Fluoride (CaF2) Pieces Evaporation Materials
CAS No. 7789-75-5
Appearance White, Crystalline Solid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 3–6mm (Size Can be customized),  Ask for other available size range
Ingredient CaF2
Molecular Weight 78.07 g/mol
Melting Point 1,418 °C
Boiling Point 907°C
Density 3.18 g/cm³
Product Codes NCZ-103E
4N (99.99%) Calcium Fluoride (CaF2) Pieces Evaporation Materials
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4N (99.99%) Calcium Fluoride (CaF2) Pieces Evaporation Materials

Price range: $270.00 through $867.00
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Product 4N (99.99%) Calcium Fluoride (CaF2) Pieces Evaporation Materials
CAS No. 7789-75-5
Appearance White crystalline solid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 3-8mm (Size Can be customized),  Ask for other available size range.
Ingredient CaF2
Molecular Weight 78.07 g/mol
Melting Point 1,418 °C
Boiling Point 2,500 °C
Density 3.18 g/cm³
Product Codes NCZ-167I
 
Aluminum (Al) Sputtering Targets, Purity: 99.999%, Size: 6'', Thickness: 0.250''
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Aluminum (Al) Sputtering Targets, Purity: 99.999%, Size: 6”, Thickness: 0.250”

$270.00
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Product 

 Aluminum (Al) Sputtering Targets, Purity: 99.999%, Size: 6'', Thickness: 0.250''

CAS No.
 7429-90-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  26.98 g/mol

Melting Point

  660.3 °C

Boiling Point

 2519 °C

Density

  2.70 g/cm³

Product Codes

NCZ-2566K
Natamycin(95%) (523557)
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Natamycin(95%) (523557)

$270.00
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Natamycin(95%) (523557)
  • Natamycin (pimaricin) is a polyene macrolide antibiotic produced by submerged aerobic fermentation of Streptomycesnatalensis and related species. Fermentation is conducted for several days, and the antibiotic is isolated either by broth extraction or by extraction of the mycelium. The activity of natamycin against yeasts and moulds, but not bacteria, makes it convenient for use in foods that undergo a ripening period after processing. Its low solubility in water and most organic solvents makes it suitable for the surface treatment of foods.
    ITEM DESCRIPTION
    Product Name 95% Natamycin
    Strain Streptomycesnatalensis
    Appearance White to creamy-white powder and odorless
    EU No. E235
    Molecular Formula C33H47NO13
    CAS 7681-93-8
    Solubility Practically insoluble in water; slightly soluble in methanol; soluble in acetic acid and in dimethylformamide
    Stability pH 3-9 Natamycin is relatively stable
    Moisture 8.0% Max.
    Assay(On dried basis) More than 95.0%
    Sulphated ash Not more than 0.5%
    Heavy Metals Not more than 10mg/Kg
    Specific rotation +250° - +295°
    Usage The additive may be applied in cheese, meat food as a preservative
    pH pH=5.5-7.5, 1% aqueous solution
    Total colony count Mesophillic aerobic not more than 100 CFU/g
    Coliforms 25g Negative
    Listeria monocytogenes 25g Negative
    Storage Natamycin is stable under room temperature. Sunlight, oxidant or heavy metal will hurt the activity of it. To be stored in dry, shady and cool place(below 20°C) with sealed packing
    Shelf life 24 months
  • Its medical use is now confined to topical treatment of corneal fungal infections and the prevention of such infections in users of contact lens. Natamycin is used topically in veterinary medicine to treat mycotic infections, such as ringworm in cattle and horses. Previously, it was used topically against fungal infections of the skin and mucous membranes in humans.
 
Product Codes- NCZ-2789K
3N (99.9%) Erbium (Er) Pieces Evaporation Materials
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3N (99.9%) Erbium (Er) Pieces Evaporation Materials

Price range: $271.00 through $953.00
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Product 3N (99.9%) Erbium (Er) Pieces Evaporation Materials
CAS No. 7440-52-0
Appearance Silvery White, Metallic
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1–15mm (Size Can be customized),  Ask for other available size range.
Ingredient Er
Molecular Weight N/A
Melting Point 1,529 °C
Boiling Point N/A
Density 9.07 g/cm3
Product Codes NCZ-162E
Samarium (Sm) Sputtering Target
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Samarium (Sm) Sputtering Target

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Price range: $272.00 through $803.00
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Product 

 Samarium (Sm) Sputtering Target

CAS No.

7440-19-9

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  150.36 g/mol

Melting Point

 1,072 °C

Boiling Point

 1,794 °C

Density

 7.54 g/cm³

Product Codes

NCZ-1302K
Silicon Nitride (Si3N4) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.125'', White to Gray
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Silicon Nitride (Si3N4) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”, White to Gray

$272.00
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Product 

 Silicon Nitride (Si3N4) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.125'', White to Gray

CAS No.

 12033-89-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  140.28 g/mol

Melting Point

 ~1900 °C

Boiling Point

N/A

Density

 ~3.2 g/cm³

Product Codes

NCZ-1704K
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Multi Walled Carbon Nanotubes N-butanol Dispersion, 4 wt%, Purity: > 96%, OD: 18-28 nm, Length: 8-18 µm

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Price range: $273.00 through $1,191.00
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15 ml/248 € 30 ml/415 € 60 ml/712 € 120 ml/1080 € Please contact us for quotes on larger quantities !!!

Multi Walled Carbon Nanotubes N-butanol Dispersion

4 wt%, Purity: > 96+ %, OD: 18-28 nm, Length: 8-18 µm

Technical Properties:

Purity > 96+ %
Color black
Average Outside Diameter (nm) 18-28
Average Inside Diameter (nm) 5.0-10.0
Length (μm) 8-18
Tap Density (g/cm3) 0.30
True Density (g/cm3) 2.4
Specific Surface Area (m2/g) 120
Ash < 1.5 wt%
Electrical Conductivity (S/cm) > 98
Manufacturing Method CVD

Applications:

MWCNTs have a variety of potential applications in different fields. These applications include midicine, mechanical, electric, chemical, energy and others. It can be applied in, 1-drug dilevery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium battaries, 8-gas-discharge tubes, 9-flat panel display, 10-supercapacitor, 11-transistors, 12-solar cells, 13-photoluminescence, 14-template  
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Carbon Nanotubes(CNT) Modified Graphene Aerogel, Diameter: 2±0.4 cm, Height: 2±0.4 cm

Price range: $273.00 through $1,089.00
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1 piece/ 273 € 5 pieces/ 1089 €  Contact us for tailored quotes on larger quantities & experience exceptional solutions from our experts.
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Multi Walled Carbon Nanotubes N-butanol Dispersion, 4 wt%, Purity: > 96%, OD: 18-28 nm, Length: 8-18 µm

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Price range: $273.00 through $1,188.00
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Multi Walled Carbon Nanotubes N-butanol Dispersion 4 wt%, Purity: > 96+ %, OD: 18-28 nm, Length: 8-18 µm Technical Properties: Purity
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Praseodymium (Pr) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”

, ,
$273.00
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Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.
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Boron (B) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”

, , ,
$273.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

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Boron (B) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”

, , ,
$273.00
Add to cart

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

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Praseodymium (Pr) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”

, , ,
$273.00
Add to cart

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Permalloy (Ni-Fe-Mo) Sputtering Targets, Size: 2'', Thickness: 0.250''
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Permalloy (Ni-Fe-Mo) Sputtering Targets, Size: 2”, Thickness: 0.250”

$273.00
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Product 

 Permalloy (Ni-Fe-Mo) Sputtering Targets, Size: 2'', Thickness: 0.250''

CAS No.

 Nickel: 7440-02-0 Iron: 7439-89-6 Molybdenum: 7439-98-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  Not defined (alloy), but elemental weights: Ni: 58.69 g/mol Fe: 55.85 g/mol Mo: 95.95 g/mol

Melting Point

 ~1450 °C

Boiling Point

 ~2730–3000 °C

Density

 ~8.7 g/cm³

Product Codes

NCZ-1800K
Nickel (Ni) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.250''
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Nickel (Ni) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”

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 Nickel (Ni) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.250''

CAS No.

7440-02-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  58.69 g/mol

Melting Point

 1,455 °C

Boiling Point

 2,732 °C

Density

  8.90 g/cm³

Product Codes

NCZ-1877K
Aluminum Silicon (AlSi) Sputtering Targets, Purity: 99.999%, Size: 4'', Thickness: 0.125''
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Aluminum Silicon (AlSi) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.125”

$273.00
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 Aluminum Silicon (AlSi) Sputtering Targets, Purity: 99.999%, Size: 4'', Thickness: 0.125''

CAS No.
Aluminum: 7429-90-5 Silicon: 7440-21-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  Al: 26.98 g/mol Si: 28.09 g/mol

Melting Point

  ~577–660 °C (depends on Si content)

Boiling Point

~2519 °C (approx.)

Density

 ~2.6–2.7 g/cm³

Product Codes

NCZ-2513K
Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 6'', Thickness: 0.125''
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Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 6”, Thickness: 0.125”

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 Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 6'', Thickness: 0.125''

CAS No.
 7429-90-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  26.98 g/mol

Melting Point

  660.3 °C

Boiling Point

 2519 °C

Density

  2.70 g/cm³

Product Codes

NCZ-2569K
Aluminum (Al) Sputtering Targets, Purity: 99.999%, Size: 4'', Thickness: 0.250''
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Aluminum (Al) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.250”

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 Aluminum (Al) Sputtering Targets, Purity: 99.999%, Size: 4'', Thickness: 0.250''

CAS No.
 7429-90-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  26.98 g/mol

Melting Point

  660.3 °C

Boiling Point

 2519 °C

Density

  2.70 g/cm³

Product Codes

NCZ-2571K
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Polyhydroxylated Fullerene (Fullerenols)/ C60, (-OH) Functionalized, Dispersed in Water, 1000 ppm Dry powder

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Price range: $274.00 through $3,000.00
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25 ml/245 € 100 ml/586 € 500 ml/1740 € 1000 ml/2680 € Please contact us for quotes on larger quantities !!!  

Polyhydroxylated Fullerene (Fullerenols)/ C60

(-OH) Functionalized, Dispersed in Water, 1000 ppm Dry powder

The starting material is >98% purity C60 fullerenes. C60 bearing over 40 hydroxyl groups that have higher water solubility (>50 mg/mL). These exist as monodisperse nanoparticles in water, and have a valiant polishing effect. They exhibit superior antioxidant and anti-inflammatory properties.

Applications:

1. Pharmaceutical: Diagnostic reagents, super drugs, cosmetics, nuclear magnetic resonance (NMR) with the developer. DNA affinity, anti-HIV drugs, anti-cancer drugs, chemotherapy drugs, cosmetics additives and scientific research. 2. Energy: Solar battery, fuel cell, secondary battery. 3. Industry: Wear resistant material, flame retardant materials, lubricants, polymer additives, high-performance membrane, catalyst, artificial diamond, hard alloy, electric viscous fluid, ink filters, high-performance coatings, fire retardant coatings, manufacturing bioactive materials , memory materials, embedded molecular and other characteristics, composite materials etc. 4. Information industry: Semiconductor record medium, magnetic materials, printing ink, toner, ink, paper special purposes. 5. Electronic parts: Superconducting semiconductor, diodes, transistors, inductor.  , 6. Optical materials, electronic camera, fluorescence display tube, nonlinear optical materials. 7. Environment: Gas adsorption, gas storage.
Lead Sputtering Target Pb
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Lead Sputtering Target Pb

Price range: $274.00 through $789.00
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Product Lead Sputtering Target Pb
CAS No. 7439-92-1
Appearance Bluish White, Metallic
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Pb
Molecular Weight 207.2 g/mol
Melting Point N/A
Boiling Point N/A
Density 1.34 g/cm³
Product Codes NCZ-125H
 
Tantalum (Ta) Sputtering Targets, Purity: 99.95%, Size: 2'', Thickness: 0.125''
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Tantalum (Ta) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.125”

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Product 

 Tantalum (Ta) Sputtering Targets, Purity: 99.95%, Size: 2'', Thickness: 0.125''

CAS No.

 7440-25-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  180.95 g/mol

Melting Point

3017 °C

Boiling Point

 5458 °C

Density

 16.65 g/cm³

Product Codes

NCZ-1665K
Magnesium (Mg) Sputtering Targets, Purity: 99.95%, Size: 4'', Thickness: 0.250''
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Magnesium (Mg) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.250”

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Product 

 Magnesium (Mg) Sputtering Targets, Purity: 99.95%, Size: 4'', Thickness: 0.250''

CAS No.

7439-95-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  24.305 g/mol

Melting Point

 650 °C

Boiling Point

 1,090 °C

Density

 1.738 g/cm³

Product Codes

NCZ-1993K
Chitosan hydrochloride(Medical grade, water soluble) (335668)
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Chitosan hydrochloride(Medical grade, water soluble) (335668)

$274.00
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Product 
Chitosan hydrochloride(Medical grade, water soluble) (335668)

CAS No.
9012‑76‑4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

  80–200 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 50,000–300,000 g/mol

Melting Point

 Decomposes at ~185–200 °C

Boiling Point

N/A

Density

 ~1.35–1.40 g/cm³

Product Codes

NCZ-2621K
Test Items Specifications
DAC degree ≥ 90%
Protein ≤ 0.2%
Endotoxin ≤ 0.5EU/mg
Heavy metals ≤ 10ppm
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Iron Nickel Cobalt (Fe-Ni-Co) Alloy Nanopowder/Nanoparticles, Size: 35-95 nm, Fe:Ni:Co/55:28:17

$275.00
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Iron Nickel Cobalt (Fe-Ni-Co) Alloy Nanopowder/Nanoparticles

Size: 35-95 nm, Fe:Ni:Co/55:28:17

Technical Properties:

Alloy Ratio (Fe-Ni-Co) 55-28-17
Average Particle Size (nm) 35-95

Properties, Storage and Cautions:

Fe-Ni-Co alloy nanoparticles are highly reactive, therefore it should be handled with care and rapid moves, vibrations should be avoided. The powder should be kept away from sunlight, any kind of heating, moisture and impacts. Coagulation of the particles is a serious problem, so, the powder should be sealed under vacuum and should be kept in cool and dry conditions. Air contact should be avoided.
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Iron Nickel Cobalt (Fe-Ni-Co) Alloy Nanopowder/Nanoparticles, Size: 35-95 nm, Fe:Ni:Co/55:28:17

$275.00
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Iron Nickel Cobalt (Fe-Ni-Co) Alloy Nanopowder/Nanoparticles

Size: 35-95 nm, Fe:Ni:Co/55:28:17

Technical Properties:

Alloy Ratio (Fe-Ni-Co) 55-28-17
Average Particle Size (nm) 35-95

Properties, Storage and Cautions:

Fe-Ni-Co alloy nanoparticles are highly reactive, therefore it should be handled with care and rapid moves, vibrations should be avoided. The powder should be kept away from sunlight, any kind of heating, moisture and impacts. Coagulation of the particles is a serious problem, so, the powder should be sealed under vacuum and should be kept in cool and dry conditions. Air contact should be avoided.
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Iron Nickel Cobalt (Fe-Ni-Co) Alloy Nanopowder/Nanoparticles, Size: 35-95 nm, Fe:Ni:Co/55:28:17

$275.00
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Iron Nickel Cobalt (Fe-Ni-Co) Alloy Nanopowder/Nanoparticles

Size: 35-95 nm, Fe:Ni:Co/55:28:17

Technical Properties:

Alloy Ratio (Fe-Ni-Co) 55-28-17
Average Particle Size (nm) 35-95

Properties, Storage and Cautions:

Fe-Ni-Co alloy nanoparticles are highly reactive, therefore it should be handled with care and rapid moves, vibrations should be avoided. The powder should be kept away from sunlight, any kind of heating, moisture and impacts. Coagulation of the particles is a serious problem, so, the powder should be sealed under vacuum and should be kept in cool and dry conditions. Air contact should be avoided.

Applications:

Fe-Ni-Co alloys are known for their low thermal expansion coefficient comparable to glasses used in high temperatures. Different than metals, they can be sealed to borosilicate glass. It gives applications to the alloy such as vacuum tubes, light bulbs, electronic devices, cathode ray tubes...  
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Iron Nickel Cobalt (Fe-Ni-Co) Alloy Nanopowder/Nanoparticles, Size: 35-95 nm, Fe:Ni:Co/55:28:17

,
$275.00
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5 grams/243 €                                            
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Iron Nickel Cobalt (Fe-Ni-Co) Alloy Nanopowder/Nanoparticles

Size: 35-95 nm, Fe:Ni:Co/55:28:17

Technical Properties:

Alloy Ratio (Fe-Ni-Co) 55-28-17
Average Particle Size (nm) 35-95

Properties, Storage and Cautions:

Fe-Ni-Co alloy nanoparticles are highly reactive, therefore it should be handled with care and rapid moves, vibrations should be avoided. The powder should be kept away from sunlight, any kind of heating, moisture and impacts. Coagulation of the particles is a serious problem, so, the powder should be sealed under vacuum and should be kept in cool and dry conditions. Air contact should be avoided.

Applications:

Fe-Ni-Co alloys are known for their low thermal expansion coefficient comparable to glasses used in high temperatures. Different than metals, they can be sealed to borosilicate glass. It gives applications to the alloy such as vacuum tubes, light bulbs, electronic devices, cathode ray tubes...
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Multi Walled Carbon Nanotubes Ethanol Dispersion, 3 wt%, Purity: > 95%, OD: 18-28 nm, Length: 8-28 µm

Price range: $275.00 through $1,323.00
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Multi Walled Carbon Nanotubes Ethanol Dispersion

3 wt%, Purity: > 95+ %, OD: 18-28 nm, Length: 8-28 µm

Technical Properties:

Purity > 95+ wt%
Color black
Average Outside Diameter (nm) 18-28
Average Inside Diameter (nm) 5.0-10.0
Length (µm) 8-28
Tap Density (g/cm3) 0.30
True Density (g/cm3) 2.4
Specific Surface Area (m2/g) 120
Ash < 1.5 wt%
Electrical Conductivity (S/cm) > 98
Manufacturing Method CVD

Applications:

MWCNTs have a variety of potential applications in different fields. These applications include medicine, mechanical, electric, chemical, energy and others. It can be applied in, 1-drug delivery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium batteries, 8-gas-discharge tubes, 9-flat panel display, 10-supercapacitor, 11-transistors, 12-solar cells, 13-photoluminescence, 14-template
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Multi Walled Carbon Nanotubes N-Methyl-2-Pyrrolidinone Dispersion, 4 wt%, Purity: > 96%, OD: 4-13 nm, Length: 45 µm

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Price range: $275.00 through $1,113.00
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Multi Walled Carbon Nanotubes N-Methyl-2-Pyrrolidinone Dispersion

4 wt%, Purity: > 96+ %, OD: 4-13 nm, Length: 45 µm

Technical Properties:

Purity > 96+ %
Color black
Average Outside Diameter (nm) 4-13
Average Inside Diameter (nm) 3.0-5.0
Length (µm) 45
Tap Density (g/cm3) 0.30
True Density (g/cm3) 2.4
Specific Surface Area (m2/g) 240
Ash < 1.5 wt%
Electrical Conductivity (S/cm) > 98
Manufacturing Method CVD

Applications:

MWCNTs have a variety of potential applications in different fields. These applications include medicine, mechanical, electric, chemical, energy and others. It can be applied in, 1-drug delivery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium batteries, 8-gas-discharge tubes, 9-flat panel display, 10-supercapacitor, 11-transistors, 12-solar cells, 13-photoluminescence, 14-template Please click for the MSDS
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Multi Walled Carbon Nanotubes N-butanol Dispersion, 4 wt%, Purity: > 95%, OD: 8-16 nm, Length: 45 µm

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Price range: $275.00 through $1,339.00
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15 ml/250 € 30 ml/420 €  60 ml/720 € 120 ml/1215 €
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Multi Walled Carbon Nanotubes N-butanol Dispersion

4 wt%, Purity: > 95+ %, OD: 8-16 nm, Length: 45 µm

Technical Properties:

Purity > 95+ %
Color black
Average Outside Diameter (nm) 8-16
Average Inside Diameter (nm) 3.0-5.0
Length (µm) 45
Tap Density (g/cm3) 0.30
True Density (g/cm3) 2.4
Specific Surface Area (m2/g) 240
Ash < 1.5 wt%
Electrical Conductivity (S/cm) > 98
Manufacturing Method CVD

Applications:

MWCNTs have a variety of potential applications in different fields. These applications include medicine, mechanical, electric, chemical, energy and others. It can be applied in, 1-drug delivery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium batteries, 8-gas-discharge tubes, 9-flat panel display, 10-supercapacitor, 11-transistors, 12-solar cells, 13-photoluminescence, 14-template
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Bismuth (Bi) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.125”

, , ,
$275.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer.

Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered. With the sputtering target's assistance, the

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

The metal bismuth is silvery with a hint of pink and is fragile. Both in air and water, it is stable. Despite having poor thermal and electrical qualities, bismuth is used to create fusible alloys, a class of materials with low melting points that can be used in a variety of applications, such as thermal fuses and solders. Because pure bismuth exhibits a high absorption of gamma rays, it can be used as a window or filter for these particles while allowing neutrons to pass through.

Ruthenium Nanopowder/Nanoparticles (Ru, 99.9%, ~20nm)
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Ruthenium Nanopowder/Nanoparticles (Ru, 99.9%, ~20nm)

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Price range: $275.00 through $475.00
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$275/0.5g
$475/1g

Product 

Ruthenium Nanopowder/Nanoparticles (Ru, 99.9%, ~20nm)

CAS No.
7440-18-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 ~20nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

101.07 g/mol

Melting Point

2,334 °C

Boiling Point

4,150 °C

Density

 12.45 g/cm³

Product Codes

NCZ-1064K
4N (99.99%) Zinc Selenide (ZnSe) Pieces Evaporation Materials
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4N (99.99%) Zinc Selenide (ZnSe) Pieces Evaporation Materials

Price range: $275.00 through $425.00
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Product 4N (99.99%) Zinc Selenide (ZnSe) Pieces Evaporation Materials
CAS No. 1315-09-9
Appearance Yellow-Red, Crystalline Solid 
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1-6mm (Size Can be customized),  Ask for other available size range.
Ingredient ZnSe
Molecular Weight 144.35 g/mol
Melting Point 1100°C
Boiling Point N/A
Density 5.42 g/cm³
Product Codes NCZ-137E
3N (99.9%) Magnesium Aluminate (MgAl2O4) Pieces (3-12mm) Evaporation Materials
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3N (99.9%) Magnesium Aluminate (MgAl2O4) Pieces (3-12mm) Evaporation Materials

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Product 3N (99.9%) Magnesium Aluminate (MgAl2O4) Pieces (3-12mm) Evaporation Materials
CAS No. 12068-51-8
Appearance White 
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 3-12mm (Size Can be customized),  Ask for other available size range.
Ingredient MgAl2O4
Molecular Weight 142.27  g/mol
Melting Point 2,135 °C
Boiling Point N/A
Density 3.64 g/cm3
Product Codes NCZ-160E
4N (99.99%) Zinc Selenide (ZnSe) Pieces Evaporation Materials
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4N (99.99%) Zinc Selenide (ZnSe) Pieces Evaporation Materials

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Product 4N (99.99%) Zinc Selenide (ZnSe) Pieces Evaporation Materials
CAS No. 1315-09-9
Appearance Yellow-Red, Crystalline Solid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient ZnSe
Molecular Weight 144.35 g/mol
Melting Point N/A
Boiling Point N/A
Density 5.42 g/cm³
Product Codes NCZ-178I
Cobalt Iron Oxide (CoFe2O4) Nanopowder, 30nm, ≥99.9% (3N) Purity
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Cobalt Iron Oxide (CoFe2O4) Nanopowder, 30nm, ≥99.9% (3N) Purity

Price range: $275.00 through $1,060.00
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Product Cobalt Iron Oxide (CoFe2O4) Nanopowder, 30nm, ≥99.9% (3N) Purity
CAS No. 12052-28-7
Appearance Black or brownish-black fine
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 30nm (Size Can be customized),  Ask for other available size range.
Ingredient CoFe2O4
Molecular Weight 234.63 g/mol
Melting Point N/A
Boiling Point N/A
Density 5.3 g/cm³
Product Codes NCZ-321I
Iron (Fe) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.125''
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Iron (Fe) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”

$275.00
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Product 

 Iron (Fe) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.125''

CAS No.

 7439-89-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  55.85 g/mol

Melting Point

 1538 °C

Boiling Point

 2862 °C

Density

  7.87 g/cm³

Product Codes

NCZ-2181K
Tin Dioxide (SnO2) Quantum Dots Water Dispersion, 50mL/bottle
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Tin Dioxide (SnO2) Quantum Dots Water Dispersion, 50mL/bottle

$275.00
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Product Tin Dioxide (SnO2) Quantum Dots Water Dispersion, 50mL/bottle
CAS No. N/A
Appearance Yellow
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 2-5nm (Size Can be customized),  Ask for other available size range.
Ingredient SnO2
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 4.5 g/cm³
Product Codes NCZ-565I
Yttrium (III) Nitrate Hexahydrate Y(NO3)3 · 6H2O 99.999% 5N
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Yttrium (III) Nitrate Hexahydrate Y(NO3)3 · 6H2O 99.999% 5N

Price range: $275.00 through $480.00
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Product Yttrium (III) Nitrate Hexahydrate Y(NO3)3 · 6H2O 99.999% 5N
CAS No. 13494-98-9
Appearance White to colorless crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 50–200µm (Size Can be customized),  Ask for other available size range.
Ingredient Y(NO3)3·6H2O
Molecular Weight 383.01 g/mol
Melting Point 80 °C
Boiling Point N/A
Density N/A
Product Codes NCZ-601I
 
Bismuth (Bi) Sputtering Targets, Purity: 99.999%, Size: 1'', Thickness: 0.250''
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Bismuth (Bi) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.250”

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Product 

 Bismuth (Bi) Sputtering Targets, Purity: 99.999%, Size: 1'', Thickness: 0.250''

CAS No.
7440‑69‑9

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

1 – 5 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 ~208.98 g/mol

Melting Point

  271.4 °C

Boiling Point

~1560 °C

Density

  ~9.78–9.80 g/cm³

Product Codes

NCZ-2439K
Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 8'', Thickness: 0.125''
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Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 8”, Thickness: 0.125”

$275.00
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Product 

 Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 8'', Thickness: 0.125''

CAS No.
 7429-90-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  26.98 g/mol

Melting Point

  660.3 °C

Boiling Point

 2519 °C

Density

  2.70 g/cm³

Product Codes

NCZ-2565K