Boron Doped Graphene Nanopowder (B/C)

Price range: $223.00 through $1,461.00
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Boron Doped Graphene

Boron-doped Graphene (BG) is a novel nanomaterial based on graphene, a single sheet of carbon atoms in a hexagonal lattice. The addition of boron atom impurities into pure graphene increases the activation region on its surface, enhances its catalytic ability, accelerates redox reactions, and opens the band gap, giving it numerous applications in fuel cell chemistry, semiconductor devices, ultracapacitors, sensors, and other technologies. Nanografi also manufactures nitrogen-doped graphene and boron/nitrogen co-doped graphene. Please request a quote above to receive pricing information based on your specifications.

Magnesium (Mg) Sputtering Targets, Purity: 99.98%, Size: 3”, Thickness: 0.250”

$223.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Potassium myristate(Cosmetic grade) (439614)

$223.00
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Potassium myristate(Cosmetic grade) (439614)
  Product name: Potassium myristate Molecular formula: CH3(CH2)12COOK Properties: Potassium myristate is fine white crystal powder; soluble in hot water and hot ethyl alcohol; lightly soluble in organic solvent, such as ethyl alcohol and ether; Main uses Potassium myristate is used as emulsifying agent, lubricating agent, surface active agent, dispersing agent in cosmetics, dyeing and medical fields.   Quality standard
Testing item Testing standard
appearance white crystal powder
acid value 244-248
iodine value ≤4.0
loss on drying, % ≤5.0
heavy metal(in Pb), % ≤0.0010
arsenic, % ≤0.0003
content, % ≥98.0
Product Codes- NCZ-2714K

Chromium (Cr) Nanopowder/Nanoparticles, Purity: 99.95 %, Size: 100 nm, Metal Basis

Price range: $224.00 through $4,574.00
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Chromium (Cr) Nanopowder/Nanoparticles

Purity: 99.95 %, Size: 100 nm, Metal Basis

Chromium is a chemical element with symbol Cr and atomic number 24. It is the first element in group 6. It is a steely-grey, lustrous, hard and brittle metal which takes a high polish, resists tarnishing, and has a high melting point. Chromium is an element which is very useful and used in many different areas. There are too many different application areas where Chromium Nanoparticles/Nanopowder can be used like in metallurgy, metal ceramics, in diamond tool manufacturing. Also for Chromium plating Chromium Nanoparticles/Nanopowder are very useful and they give a shiny effect to the surface and also protect it. Nanopowder/Nanoparticle Chromium is a very hard metal. Therefore, in nanopowder/nanoparticle form, Chromium can be widely used in applications where mechanical strength is required. Chromium Nanoparticles/Nanopowder are used in ceramics, cutting and shaping tools and steel industry. In addition, Chromium Nanopowders/Nanoparticle are widely used as a catalyst.

Chromium (Cr) Nanopowder/Nanoparticles, Purity: 99.95 %, Size: 100 nm, Metal Basis

Price range: $224.00 through $4,573.00
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25 grams/198 €                        
100 grams/540 €                     
500 grams/2150 €                    
1000 grams/4030 € Please contact us for quotes on larger quantities !!!

Chromium (Cr) Nanopowder/Nanoparticles

Purity: 99.95 %, Size: 100 nm, Metal Basis

Chromium is a chemical element with symbol Cr and atomic number 24. It is the first element in group 6. It is a steely-grey, lustrous, hard and brittle metal which takes a high polish, resists tarnishing, and has a high melting point. Chromium is an element which is very useful and used in many different areas. There are too many different application areas where Chromium Nanoparticles/Nanopowder can be used like in metallurgy, metal ceramics, in diamond tool manufacturing. Also for Chromium plating Chromium Nanoparticles/Nanopowder are very useful and they give a shiny effect to the surface and also protect it. Nanopowder/Nanoparticle Chromium is a very hard metal. Therefore, in nanopowder/nanoparticle form, Chromium can be widely used in applications where mechanical strength is required. Chromium Nanoparticles/Nanopowder are used in ceramics, cutting and shaping tools and steel industry. In addition, Chromium Nanopowders/Nanoparticle are widely used as a catalyst.

Hafnium Diboride Nanopowder, Purity:99.5 %, APS:50 nm

Price range: $224.00 through $4,246.00
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Hafnium Diboride Nanopowder, Purity:99.5 %, APS:50 nm Performance characteristics Nano hafnium diboride powder is prepared by high-frequency plasma gas phase synthesis. It is gray-black with metallic luster crystals, with a melting point of 3250°C, high conductivity, and stable chemical properties. It hardly reacts with all chemical reagents (except HF) at room temperature. New ceramic materials with high melting point, high thermal conductivity, oxidation resistance and other high-temperature comprehensive properties are mainly used in high-temperature ceramics, high-speed aircraft nose cones, aviation, aerospace and other fields Applications
  • Wear-resistant coating; crucible lining and corrosion-resistant chemical equipment; anti-oxidation composite materials; refractory materials, where the corrosion of molten metal is resistant;
  • Heat-enhancing additives; high-temperature resistance; high-temperature, corrosion-resistant and oxidation-resistant special coatings;
  • Mainly used as a material for the production of composite ceramics; can be used as a neutron absorber;
  • High-temperature ceramics, high-speed aircraft nose cones and aviation, aerospace and other fields.
Packaging and storage This product is packaged in an inert gas plastic bag, sealed and stored in a dry, cool environment. It should not be exposed to the air to prevent oxidation and agglomeration due to moisture, which will affect the dispersion performance and use effect; the number of packages can be provided according to customer requirements and packed.

Carbon (C) (Graphite) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.250”

$224.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Bismuth (Bi) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.125”

$225.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered. With the sputtering target's assistance, the

Even incredibly low amounts of contaminants are recognized, and the target material can be identified.

Applications for sputtering targets are also found in space. One type of space weathering is sputtering, which modifies the chemical and physical characteristics of airless worlds like the Moon and asteroids.

The silvery metal bismuth has a hint of pink and is fragile. It is stable in both water and air. Even though bismuth has bad thermal and electrical properties, it is used to make fusible alloys, a class of materials with low melting points that are useful for a variety of products, such as thermal fuses and solders. Because pure bismuth absorbs gamma rays highly, it can be used as a window or filter for these at the same time allowing neutrons to flow through.

Nickel Vanadium (NiV) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.125”

$225.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Silicon Nitride (Si3N4) Sputtering Targets, Purity: 99.5%, Size: 1”, Thickness: 0.125”, Dark Gray to Black

$225.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Zinc Sulfide (ZnS) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”

$225.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Boron Nanoparticles/ Nanopowders ( B, 97.5%, <400nm)

Price range: $225.00 through $635.00
Select options This product has multiple variants. The options may be chosen on the product page
$225/25g
$635/100g

Product 

Boron Nanoparticles/ Nanopowders ( B, 97.5%, <400nm)

CAS No.

7440-42-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

<400nm (Size Can be customized), Ask for other available size ranges.

Ingredient

AlN

Molecular Weight

10.81 g/mol

Melting Point

2076°C

Boiling Point

4,000°C

Density

~2.34 g/cm³

Product Codes

NCZ-1020K

SWNTs -COOH Functionalized 95+%

Price range: $225.00 through $795.00
Select options This product has multiple variants. The options may be chosen on the product page
$225/1g
$795/5g

Product 

SWNTs -COOH Functionalized 95+%

CAS No.

7727-54-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

30- 50 nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

228.20 g/mol

Melting Point

 ~120 °C

Boiling Point

N/A

Density

1.98 g/cm³

Product Codes

NCZ-1257K

SWNTs -NH2 Functionalized 95+%

Price range: $225.00 through $795.00
Select options This product has multiple variants. The options may be chosen on the product page
$225/1g
$795/5g

Product 

SWNTs -NH2 Functionalized 95+%

CAS No.

308068-56-6 or 1007206-89-2)

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

30- 50 nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

N/A

Melting Point

N/A

Boiling Point

N/A

Density

~1.3–1.4 g/cm³

Product Codes

NCZ-1258K

Single Walled Nanotubes – OH Functionalized (SWNTs -OH, 95%)

Price range: $225.00 through $795.00
Select options This product has multiple variants. The options may be chosen on the product page
$225/1g
$795/5g

Product 

Single Walled Nanotubes - OH Functionalized (SWNTs -OH, 95%)

CAS No.

7727-54-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 1-2 nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

228.20 g/mol

Melting Point

120 °C

Boiling Point

NA

Density

1.98 g/cm³

Product Codes

NCZ-1261K

3N (99.9%) 50nm Silicon (Si) Nanopowder

Price range: $225.00 through $915.00
Select options This product has multiple variants. The options may be chosen on the product page
Product 3N (99.9%) 50nm Silicon (Si) Nanopowder
CAS No. 7440-21-3
Appearance Gray to black fine
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 50nm (Size Can be customized), Ask for other available size range.
Ingredient Si
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 2.33 g/cm3
Product Codes NCZ-159I
 

Indium (In) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.125”

$225.00

Product 

Indium (In) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness: 0.125''

CAS No.

 7440-74-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

114.82 g/mol

Melting Point

 156.6 °C

Boiling Point

 2,072 °C

Density

 7.31 g/cm³

Product Codes

NCZ-2231K

Graphene on Silicon substrate (795508)

Price range: $225.00 through $925.00
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Graphene on Silicon substrate (795508) Silicon parameter Thickness :700μm SiO2 thickness:300nm Graphene parameter and price
 
Substrate Layers Size Sheet Resistance(Ω/sq) Notes Price($/pc)
Si/SiO2 monolayer 10mm×10mm 300-500 monolayer coverage ≥95% 161
monolayer 15mm×15mm 300-500 monolayer coverage ≥95% 325
monolayer 20mm×20mm 300-500 monolayer coverage ≥95% 405
monolayer 50mm×50mm 300-500 monolayer coverage ≥95% 845
multilayer 10mm×10mm 200-300 2-4 layers 225
multilayer 15mm×15mm 200-300 2-4 layers 405
multilayer 20mm×20mm 200-300 2-4 layers 495
multilayer 50mm×50mm 200-300 2-4 layers 925
Product Codes- NCZ-2589K

Graphene Sample Pack (Includes 9 products)

Price range: $226.00 through $623.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

 Use as a high performance additive for composites with PPO, POM ,PPS, PC, ABS, PP, PE, PS, Nylon and rubbers.  Can improve composites tensile strength, stiffness, corrosion resistance, abrasion resistance and anti-static electricity and lubricant properties.  For all mechanical properties modifications, typical amounts are about 2-6 wt%  For conductivity modification, typical amounts are about 2-8 wt% The addition of Graphene to different composites show improvements in their physical properties. These improvements include electrical conductivity, thermal conductivity, hardness, strength, viscosity etc. Moreover, graphene can replace materials that are used in today’s applications resulting in enhancement of their applications. For example graphene can be integrated into plastics such as epoxy to create a material that can replace steel in the structure of aircraft, improving fuel efficiency, range and reducing weight. It could even be used to coat aircraft surface material to prevent electrical damage resulting from lightning strikes due to its high conductivity.

Silicon (Si) Sputtering Targets, P-type, indium, Purity: 99.999%, Size: 1”, Thickness: 0.250”

$226.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Tin (Sn) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”

$226.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Silver (Ag) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”

$226.00

Product 

Silver (Ag) Sputtering Targets, Purity: 99.99%, Size: 1'', Thickness: 0.250''

CAS No.

 7440-22-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

107.87 g/mol

Melting Point

 961.78 °C

Boiling Point

 2162 °C

Density

 10.49 g/cm³

Product Codes

NCZ-1693K

Nickel Chromium (Ni-Cr) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”

$226.00

Product 

Nickel Chromium (Ni-Cr) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.125''

CAS No.

 11106-97-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 ~110.69 g/mol

Melting Point

 ~1,400 °C

Boiling Point

 ~2,730–2,750 °C

Density

 ~8.4 – 8.5 g/cm³

Product Codes

NCZ-1857K

Magnesium (Mg) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.250”

$226.00

Product 

Magnesium (Mg) Sputtering Targets, Purity: 99.95%, Size: 2'', Thickness: 0.250''

CAS No.

7439-95-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 24.305 g/mol

Melting Point

 650 °C

Boiling Point

 1,090 °C

Density

1.738 g/cm³

Product Codes

NCZ-2001K

Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.125”

$226.00

Product 

Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 3'', Thickness: 0.125''

CAS No.

7440‑47‑3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 51.9961 g/mol

Melting Point

 1,857 °C

Boiling Point

 2,672 °C

Density

 7.14 g/cm³

Product Codes

NCZ-2314K

Carbon (C) (Pyrolytic Graphite) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.250”

$226.00

Product 

Carbon (C) (Pyrolytic Graphite) Sputtering Targets, Purity: 99.999%, Size: 1'', Thickness: 0.250''

CAS No.

 7782-42-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 12.01 g/mol

Melting Point

Sublimes ~3652 °C (no true melting)

Boiling Point

Sublimes directly ~4,200°C

Density

 ~2.2–2.25 g/cm³

Product Codes

NCZ-2343K

5N (99.999%) Perovskite Grade Cesium Bromide (CsBr), 10g

$227.00
Product 5N (99.999%) Perovskite Grade Cesium Bromide (CsBr), 10g
CAS No. 7787-69-1
Appearance White 
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS <50µm (Size Can be customized), Ask for other available size range.
Ingredient CsBr
Molecular Weight 212.81 g/mol
Melting Point 636 °C
Boiling Point N/A
Density 4.44 g/cm³
Product Codes NCZ-100I

Zinc Oxide (ZnO) with Alumina Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”

$227.00

Product 

Zinc Oxide (ZnO) with Alumina Sputtering Targets, Purity: 99.99%, Size: 1'', Thickness: 0.250''

CAS No.

ZnO: 1314-13-2 Al₂O₃: 1344-28-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

ZnO + Al₂O₃ (AZO)(black granules) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

ZnO: 81.38 g/mol Al₂O₃: 101.96 g/mol

Melting Point

~1975 °C

Boiling Point

N/A

Density

~5.6 g/cm³

Product Codes

NCZ-1492K

Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.125”

$227.00

Product 

Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 2'', Thickness: 0.125''

CAS No.

7440-33-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 183.84 g/mol

Melting Point

3422 °C

Boiling Point

 5555 °C

Density

19.25 g/cm³

Product Codes

NCZ-1593K

8YSZ Zirconium Oxide Yttria Stabilized Nanoparticles 20nm to 40nm

Price range: $227.00 through $2,515.00
Select options This product has multiple variants. The options may be chosen on the product page
Product 8YSZ Zirconium Oxide Yttria Stabilized Nanoparticles 20nm to 40nm
CAS No. 66402-68-4
Appearance White fine
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 20-40nm (Size Can be customized),  Ask for other available size range.
Ingredient (ZrO₂)_0.92(Y₂O₃)_0.08
Molecular Weight 123.22 g/mol
Melting Point N/A
Boiling Point N/A
Density 5.88–5.91 g/cm³
Product Codes NCZ-207I

8YSZ Zirconium Oxide Yttria Stabilized Nanoparticles 50nm to 80nm

Price range: $227.00 through $2,515.00
Select options This product has multiple variants. The options may be chosen on the product page
Product 8YSZ Zirconium Oxide Yttria Stabilized Nanoparticles 50nm to 80nm
CAS No. 114168-16-0
Appearance White fine
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 50-80nm (Size Can be customized),  Ask for other available size range.
Ingredient (ZrO₂)_0.92 (Y₂O₃)_0.08
Molecular Weight 123.22 g/mol
Melting Point N/A
Boiling Point N/A
Density 5.9 g/cm³
Product Codes NCZ-208I
 

Silver (Ag) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”

$227.00

Product 

Silver (Ag) Sputtering Targets, Purity: 99.99%, Size: 1'', Thickness: 0.125''

CAS No.

 7440-22-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

107.87 g/mol

Melting Point

 961.78 °C

Boiling Point

 2162 °C

Density

 10.49 g/cm³

Product Codes

NCZ-1694K

Nickel Titanium (Ni-Ti) Alloy Nanopowder/Nanoparticles, Size: 55 nm, Ni:Ti/50:50

$228.00
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Nickel Titanium (Ni-Ti) Alloy Nanopowder/Nanoparticles

Size: 55 nm, Ni:Ti/50:50

Technical Properties:

Alloy Ratio (Ni-Ti) 50-50
Average Particle Size (nm) 55
Elemental Analysis Ni-Ti Fe Cu Cr Others
≥99.9 0.025 0.02 0.018 0.01

Properties, Storage and Cautions:

Ni-Ti alloy nanoparticles are highly reactive, therefore it should be handled with care and rapid moves, vibrations should be avoided. The powder should be kept away from sunlight, any kind of heating, moisture and impacts. Coagulation of the particles is a serious problem, so, the powder should be sealed under vacuum and should be kept in cool and dry conditions. Air contact should be avoided.

Nickel Titanium (Ni-Ti) Alloy Nanopowder/Nanoparticles, Size: 55 nm, Ni:Ti/50:50

$228.00
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Nickel Titanium (Ni-Ti) Alloy Nanopowder/Nanoparticles

Size: 55 nm, Ni:Ti/50:50

Technical Properties:

Alloy Ratio (Ni-Ti) 50-50
Average Particle Size (nm) 55
Elemental Analysis Ni-Ti Fe Cu Cr Others
≥99.9 0.025 0.02 0.018 0.01

Properties, Storage and Cautions:

Ni-Ti alloy nanoparticles are highly reactive, therefore it should be handled with care and rapid moves, vibrations should be avoided. The powder should be kept away from sunlight, any kind of heating, moisture and impacts. Coagulation of the particles is a serious problem, so, the powder should be sealed under vacuum and should be kept in cool and dry conditions. Air contact should be avoided.

Applications:

Ni-Ti alloy materials show high elasticity and shape memory property. They can be used in heat engines, sensors, biomedical applications, actuators etc.

Nickel Titanium (Ni-Ti) Alloy Nanopowder/Nanoparticles, Size: 55 nm, Ni:Ti/50:50

$228.00
Select options This product has multiple variants. The options may be chosen on the product page
Nickel Titanium (Ni-Ti) Alloy Nanopowder/Nanoparticles Size: 55 nm, Ni:Ti/50:50 Technical Properties: Alloy Ratio (Ni-Ti) 50-50 Average Particle Size (nm) 55

Platinum Foil, Purity 99.95%, Thickness: 0.5mm, 1×1 cm

Price range: $228.00 through $1,079.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications

  • Dental veneers
  • Fabrication of electrochemically stable microelectrode arrays
  • A counter electrode for the fabrication of supercapacitors
  • An enzyme electrode probe for potential usage in biosensors
  • Arc-casting, hot-pressing, machining, vacuum-arc melting, casting, custom-alloying, extruding, rolling, cutting, vacuum-sealing, and bonding.
  • Electronics industry for electrical contacts which might be subject to high temperatures
  • Make weights and measure standards

Magnesium (Mg) Sputtering Targets, Purity: 99.98%, Size: 4”, Thickness: 0.125”

$228.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Silver (Ag) Nanopowder, 30-50nm, >99.99% Purity, 5g

$228.00
Product Silver (Ag) Nanopowder, 30-50nm, >99.99% Purity, 5g
CAS No. 7440-22-4
Appearance Gray to dark gray fine
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 30-50nm (Size Can be customized),  Ask for other available size range.
Ingredient Ag
Molecular Weight N/A
Melting Point 961.8°C
Boiling Point N/A
Density 10.49 g/cm³
Product Codes NCZ-522I
 

Activated carbon fiber Yarn(Rayon based) (120584)

$228.00
Select options This product has multiple variants. The options may be chosen on the product page
Activated carbon fiber Yarn(Rayon based) (120584)

Test Items

Units

Specifications

Filament diameter

um

10-20

Bulk density

g/m3

0.04-0.10

Ignition point

°C

»500

BET

m2/g

1200

Pore volume

cm3/g

0.67

pH

5.6-7.0

Ash

%

≤1.5

Iodine adsorption (liquid phase)

mg/g

1100-1150

Benzene adsorption

%

35-38

Filament length

mm

≤8mm

≤3mm

Product Codes- NCZ-2686K

Activated carbon fiber Powder(Rayon based, 100-120 mesh) (070584)

$228.00
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Activated carbon fiber Powder(Rayon based, 100-120 mesh) (070584)

Test Items Specifications
Ignition temperature(°C) » 500
BET(m2/g) 1200
Pore volume(cm3/g) 0.67
pH 5.6-7.0
Ash(%) ≤ 3
Iodine uptake (liquid phase) (mg/g) 1050-1100
Benzene uptake(%) 35-38
Mesh number(mesh) 100-120
Product Codes- NCZ-2687K

Activated carbon fiber Felt(Rayon based, for solvent recovery) (263584)

$228.00
Select options This product has multiple variants. The options may be chosen on the product page
Activated carbon fiber Felt(Rayon based, for solvent recovery) (263584)
CAS 7440-44-0
Product Codes- NCZ-2691K

3N5 (99.95%) Molybdenum Trioxide (MoO3) Pellets (1-3mm) Evaporation Materials

Price range: $229.00 through $627.00
Select options This product has multiple variants. The options may be chosen on the product page
Product 3N5 (99.95%) Molybdenum Trioxide (MoO3) Pellets (1-3mm) Evaporation Materials
CAS No. 1313-27-5
Appearance White or Pale Yellow, Crystalline Solid 
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1-3mm (Size Can be customized),  Ask for other available size range.
Ingredient MoO3
Molecular Weight 143.95 g/mol
Melting Point 795 °C
Boiling Point N/A
Density 4.69 g/cm³
Product Codes NCZ-132E

Nickel Iron (Ni-Fe) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.125”

$229.00

Product 

Nickel Iron (Ni-Fe) Sputtering Targets, Purity: 99.95%, Size: 2'', Thickness: 0.125''

CAS No.

N/A

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 57.5 g/mol

Melting Point

 ~1,400 – 1,450 °C

Boiling Point

 ~2,730 – 2,750 °C

Density

 ~8.7 g/cm³

Product Codes

NCZ-1846K

Lithium Zirconate (Li2ZrO3) Powder, 99.5% 2N5

Price range: $229.00 through $645.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Lithium Zirconate (Li2ZrO3) Powder, 99.5% 2N5
CAS No. 12031-83-3
Appearance White to off-white fine
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 100nm (Size Can be customized),  Ask for other available size range.
Ingredient Li2ZrO3
Molecular Weight 157.22 g/mol
Melting Point 1,500 °C
Boiling Point N/A
Density 4.4 g/cm³
Product Codes NCZ-447I

18650 Cylinder Cell Case

Price range: $230.00 through $1,082.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications

18650 Cylinder Cell Case with Anti-Explosive Cap & Insulation O-ring

Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.125”

$230.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Silicon (Si) Sputtering Targets, P-type, Purity: 99.999%, Size: 2”, Thickness: 0.125”

$230.00

Product 

Silicon (Si) Sputtering Targets, P-type, Purity: 99.999%, Size: 2'', Thickness: 0.125''

CAS No.

7440-21-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

28.0855 g/mol

Melting Point

 1,414 °C

Boiling Point

3,265 °C

Density

 2.33 g/cm³

Product Codes

NCZ-1751K

Silicon (Si) Sputtering Targets, N-type, Purity: 99.999%, Size: 2”, Thickness: 0.125”

$230.00

Product 

Silicon (Si) Sputtering Targets, N-type, Purity: 99.999%, Size: 2'', Thickness: 0.125''

CAS No.

7440-21-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

28.0855 g/mol

Melting Point

 1,414 °C

Boiling Point

3,265 °C

Density

 2.33 g/cm³

Product Codes

NCZ-1765K

99.99% 4N Purity Gallium Trinitrate Hydrate (Ga(NO3)3 · xH2O)

Price range: $231.00 through $1,859.00
Select options This product has multiple variants. The options may be chosen on the product page
Product 99.99% 4N Purity Gallium Trinitrate Hydrate (Ga(NO3)3 · xH2O)
CAS No. 10115-40-1
Appearance White to off-white crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 10–50µm (Size Can be customized),  Ask for other available size range.
Ingredient Ga(NO₃)₃ · xH₂O
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 2.4 g/cm³
Product Codes NCZ-249I

Praseodymium (Pr) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”

$231.00

Product 

Praseodymium (Pr) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.250''

CAS No.

7440-10-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 140.91 g/mol

Melting Point

931 °C

Boiling Point

 3520 °C

Density

 6.77 g/cm³

Product Codes

NCZ-1790K

Graphite Oxide Powder

Price range: $231.00 through $429.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Graphite Oxide Powder
CAS No. 7782-42-5
Appearance Brownish-yellow
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 10µm (Size Can be customized),  Ask for other available size range.
Ingredient CₓOᵧH_z
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 1.8–2.2 g/cm³
Product Codes NCZ-369I

Nickel (Ni) Sputtering Targets, Purity: 99.995%, Size: 3”, Thickness: 0.250”

$231.00

Product 

Nickel (Ni) Sputtering Targets, Purity: 99.995%, Size: 3'', Thickness: 0.250''

CAS No.

7440-02-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 58.69 g/mol

Melting Point

 1,455 °C

Boiling Point

 2,732 °C

Density

 8.90 g/cm³

Product Codes

NCZ-1881K

Antimony (Sb) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.125”

$231.00

Product 

Antimony (Sb) Sputtering Targets, Purity: 99.999%, Size: 1'', Thickness: 0.125''

CAS No.

 7440-36-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 121.76 g/mol

Melting Point

 630.6 °C

Boiling Point

 1587 °C

Density

 6.69 g/cm³

Product Codes

NCZ-2511K

PE Separator Film for Battery Applications Thickness: 12μm, Width: 60mm, Length: 500 m, 1 roll: 500 m

Price range: $232.00 through $619.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Information Product Name PE Separator Film for Battery Applications Thickness 12μm±2 Width 60mm±0.5 Length 500m Product No NG10BEW0941 Surface

Platinum Foil, Purity 99.95%, Thickness: 0.5mm, 1×1 cm

Price range: $232.00 through $1,094.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications

  • Dental veneers
  • Fabrication of electrochemically stable microelectrode arrays
  • A counter electrode for the fabrication of supercapacitors
  • An enzyme electrode probe for potential usage in biosensors
  • Arc-casting, hot-pressing, machining, vacuum-arc melting, casting, custom-alloying, extruding, rolling, cutting, vacuum-sealing, and bonding.
  • Electronics industry for electrical contacts which might be subject to high temperatures
  • Make weights and measure standards

Manganese (Mn) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.125”

$232.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Tungsten Sputtering Target W

Price range: $232.00 through $714.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Tungsten Sputtering Target W
CAS No. 7440-33-7
Appearance Grayish White, Lustrous, Metallic
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient W
Molecular Weight 183.84 g/mol
Melting Point 3410°C
Boiling Point N/A
Density 19.3 g/cm³
Product Codes NCZ-145H
 

Zinc Sulfide (ZnS) Sputtering Target

Price range: $232.00 through $919.00
Select options This product has multiple variants. The options may be chosen on the product page

Product 

Zinc Sulfide (ZnS) Sputtering Target

CAS No.

 1314-98-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

97.45 g/mol

Melting Point

~1,850 °C

Boiling Point

(~1,180–1,200 °C)

Density

~4.09 g/cm³

Product Codes

NCZ-1343K

Magnesium (Mg) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.250”

$232.00

Product 

Magnesium (Mg) Sputtering Targets, Purity: 99.95%, Size: 3'', Thickness: 0.250''

CAS No.

7439-95-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 24.305 g/mol

Melting Point

 650 °C

Boiling Point

 1,090 °C

Density

1.738 g/cm³

Product Codes

NCZ-1997K

Lanthanum Hexaboride Nanoparticles/Nanopowder ( LaB6, 99+%, 50~80nm)

Price range: $233.00 through $681.00
Select options This product has multiple variants. The options may be chosen on the product page
$233/25g
$391/50g
$681/100g

Product 

Lanthanum Hexaboride Nanoparticles/Nanopowder ( LaB6, 99+%, 50~80nm)

CAS No.

12008-21-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 50~80nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 203.78 g/mol

Melting Point

~2,530 °C

Boiling Point

N/A

Density

~4.72 g/cm³

Product Codes

NCZ-1146K