Lithium Fluoride (LiF) 99.99% 4N Powder

Price range: $205.00 through $865.00
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Product Lithium Fluoride (LiF) 99.99% 4N Powder
CAS No. 7789-24-4
Appearance White crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 10nm (Size Can be customized),  Ask for other available size range.
Ingredient LiF
Molecular Weight 25.94 g/mol
Melting Point 845 °C
Boiling Point 1,676 °C
Density 2.64 g/cm³
Product Codes NCZ-444I
 

Thulium Oxide (Tm2O3) 99.99% 4N Powder

Price range: $205.00 through $1,635.00
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Product Thulium Oxide (Tm2O3) 99.99% 4N Powder
CAS No. 12036-44-1
Appearance White to pale green
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 5µm (Size Can be customized),  Ask for other available size range.
Ingredient Tm2O3
Molecular Weight 385.87 g/mol
Melting Point 2341 °C
Boiling Point 3945 °C
Density 8.6 g/cm³
Product Codes NCZ-558I
 

Titanium (IV) Dioxide (TiO2) Rutile 99.99% 4N Nano Powder 50 nm

Price range: $205.00 through $975.00
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Product Titanium (IV) Dioxide (TiO2) Rutile 99.99% 4N Nano Powder 50 nm
CAS No. 13463-67-7
Appearance White fine
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 50nm (Size Can be customized),  Ask for other available size range.
Ingredient TiO2
Molecular Weight 79.87 g/mol
Melting Point N/A
Boiling Point N/A
Density 4.23 g/cm³
Product Codes NCZ-570I
 

Magnesium (Mg) Sputtering Targets, Purity: 99.98%, Size: 2”, Thickness: 0.250”

$206.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Single Walled Nanotubes (SWNTs 90%, CNTs 95%)

Price range: $206.00 through $805.00
Select options This product has multiple variants. The options may be chosen on the product page
$206/1g
$805/5g

Product 

Single Walled Nanotubes (SWNTs 90%, CNTs 95%)

CAS No.

7727-54-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

Diameter: ~1–2 nm, Length: ~5–30 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

228.20 g/mol

Melting Point

 ~120 °C

Boiling Point

N/A

Density

 1.98 g/cm³

Product Codes

NCZ-1229K

Tantalum Sputtering Target Ta

Price range: $206.00 through $1,855.00
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Product Tantalum Sputtering Target Ta
CAS No. 7440-25-7
Appearance Gray Blue, Metallic
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Ta
Molecular Weight 180.94788 g/mol
Melting Point 3,017 °C
Boiling Point N/A
Density 16.6 g/cm3
Product Codes NCZ-141H
 

Copper Oxide (CuO) Sputtering Target

Price range: $206.00 through $596.00
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Product 

Copper Oxide (CuO) Sputtering Target

CAS No.

1317-38-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

79.55 g/mol

Melting Point

1,320 °C

Boiling Point

Decomposes (~2,000 °C+)

Density

6.31 g/cm³

Product Codes

NCZ-1369K

1g Ordered Mesoporous Carbon CMK-3 Nano Powder

$206.00
Product 1g Ordered Mesoporous Carbon CMK-3 Nano Powder
CAS No. 99685-96-8
Appearance Black 
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 100nm (Size Can be customized), Ask for other available size range.
Ingredient C
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 2.0 – 2.2 g/cm³
Product Codes NCZ-140I

Tungsten (VI) Oxide (WO3) 99.9% 3N Nanopowder, 50g

$206.00
Product Tungsten (VI) Oxide (WO3) 99.9% 3N Nanopowder, 50g
CAS No. 1314-35-8
Appearance Yellow to light greenish
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 100nm (Size Can be customized),  Ask for other available size range.
Ingredient WO3
Molecular Weight 231.84 g/mol
Melting Point N/A
Boiling Point N/A
Density 7.16 g/cm³
Product Codes NCZ-582I

Strong Graphene Aerogel, Diameter: 1.2±0.1 cm, Height: 1.2±0.1 cm

Price range: $207.00 through $781.00
Select options This product has multiple variants. The options may be chosen on the product page
Please contact us for quotes for larger quantities !   Graphene aerogels are materials which have elasticity and they can easily gain their original form after some compression. In addition, the low density of graphene aerogels enables them to be very absorbent. This material can absorb more than 850 times of its own weight. This property means that it could be useful for environmental clean-ups like oil spills, and the aerogels only need to be picked up later after absorbing the spilled material. Graphene aerogel may also have some applications in both the storage and the transfer of energy by enabling the creation of lighter, higher-energy-density batteries and vigorous research is being done on the matter.

Gadolinium (Gd) Micron Powder, Purity: 99.5 %, Size: 325 mesh

Price range: $207.00 through $1,109.00
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25 grams/184€ 100 grams/595€ 500 grams/ 984€   Please contact us for quotes on larger quantities !!!

Gadolinium (Gd) Micron Powder

Purity: 99.5 %, Size: 325 mesh

Applications:

Gadolinium powder is relatively stable in dry air. It does however oxidize in moisture forming oxides. It can be found in minerals such as xenotime, monazite and bastnaesite. Gadolinium is a rare earth metal that possesses unique properties advantageous to specialized applications such as semiconductor fabrication and nuclear reactor shielding. Gadolinium has excellent magnetic properties. It is weakly magnetic at room temperature, but becomes strongly magnetic or ferromagnetic below room temperatures. Gadolinium powder has applications in electronics to increase the speed and capacity of computer memory. It has applications in medical magnetic resonance imaging (MRI) where it is used as intravenously administered, contrasting agents to enhance images. It also has applications as a dopant in glass.

3N5 (99.95%) Magnesium Oxide (MgO) Pieces (1-3mm) Evaporation Materials

Price range: $207.00 through $385.00
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Product 3N5 (99.95%) Magnesium Oxide (MgO) Pieces (1-3mm) Evaporation Materials
CAS No. 1309-48-4
Appearance White, Crystalline Solid 
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1-3mm (Size Can be customized),  Ask for other available size range.
Ingredient MgO
Molecular Weight 40.30 g/mol
Melting Point 2,852 °C
Boiling Point N/A
Density 3.58 g/cm³
Product Codes NCZ-128E

Aluminum Silicon Sputtering Target AlSi

Price range: $207.00 through $385.00
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Product

Aluminum Silicon Sputtering Target AlSi

CAS No. 11145-27-0
Appearance Silvery-white, metallic materials
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient AlSi
Molecular Weight 54.958 g/mol
Melting Point N/A
Boiling Point N/A
Density 2.6-2.7 g/cm³
Product Codes NCZ-101H

Neodymium(III) Chloride Hexahydrate (NdCl3.6H2O) Powder, 99.9%

Price range: $207.00 through $788.00
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Product Neodymium(III) Chloride Hexahydrate (NdCl3.6H2O) Powder, 99.9%
CAS No. 10418-03-8
Appearance Pale purple or lavender crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1–10µm (Size Can be customized),  Ask for other available size range.
Ingredient NdCl3.6H2O
Molecular Weight 308.24 g/mol
Melting Point N/A
Boiling Point N/A
Density 2.9 g/cm³
Product Codes NCZ-474I
 

Praseodymium Chloride (PrCl3) 99% 2N

$207.00
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Product Praseodymium Chloride (PrCl3) 99% 2N
CAS No. 10361-79-2
Appearance Light green to greenish-white crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1–10µm (Size Can be customized),  Ask for other available size range.
Ingredient PrCl3
Molecular Weight 247.27 g/mol
Melting Point N/A
Boiling Point N/A
Density 4.19 g/cm³
Product Codes NCZ-501I
 

Chromium (Cr) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 30-40 nm, Metal Basis

Price range: $208.00 through $539.00
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Chromium (Cr) Nanopowder/Nanoparticles

Purity: 99.95%, Size: 30-40 nm, Metal Basis

Technical Properties:

Bulk Density (g/cm3) 0,15
True Density (g/cm3) 8,9
Color black
Average Particle Size (nm) 30-40
Specific Surface Area (m2/g) 10,0-40,0
Elemental Analysis Cr Fe Al Si Others
99.9 0.05 0.02 0.01 ≤0.01

Properties, Storage and Cautions:

Chromium nanopowder is highly reactive and flammable, therefore it should be handled with care and rapid moves, vibrations should be avoided. Powder should be kept away from sunlight, any kind of heating, moisture and impacts. Coagulation of the particles is a serious problem, so, Cr powder should be sealed under vacuum and should be kept in cool and dry conditions. Air contact should be avoided.

Applications:

Chromium is a very hard metal. Therefore, in nanopowder form,  it can be widely used in applications where mechanical strength is required. It can be used in ceramics, cutting and shaping tools and steel industry

Large Inner Diameter Thin Multi-Wall Carbon Nanotubes, Purity: > 92%, OD: 28-58 nm, ID: 18-48 nm

Price range: $208.00 through $767.00
Select options This product has multiple variants. The options may be chosen on the product page
Applications:

Alcohol pyrolysis in a floating reactor produced large inner diameter thin multi-wall carbon nanotubes using ferrocene as a catalyst. They have a wide range of potential applications in various fields. Medicine, mechanics, electronics, chemicals, and energy are among the applications. It can be used in 1-drug delivery, 2-biosensors, 3-CNT composites, and so on. 4-catalysis, 5-nanoprobes, Storage of 6-hydrogen, lithium-ion batteries, eight gas discharge tubes nine flat panel displays, ten supercapacitors, eleven transistors , 12-solar cells, 13-photoluminescence,                   14-templates

Antimony (Sb) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.250”

$208.00

Product 

Antimony (Sb) Sputtering Targets, Purity: 99.95%, Size: 2'', Thickness: 0.250''

CAS No.

 7440-36-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 121.76 g/mol

Melting Point

 630.6 °C

Boiling Point

 1587 °C

Density

 6.69 g/cm³

Product Codes

NCZ-2509K

Carbon Nanotubes(CNT) Modified Graphene Aerogel, Diameter: 1.2±0.1cm, Height: 1.2±0.1cm

Price range: $209.00 through $788.00
Select options This product has multiple variants. The options may be chosen on the product page
Please contact us for quotes for larger quantities !   Graphene aerogels are materials which have elasticity and they can easily gain their original form after some compression. In addition, the low density of graphene aerogels enables them to be very absorbent. This material can absorb more than 850 times of its own weight. This property means that it could be useful for environmental clean-ups like oil spills, and the aerogels only need to be picked up later after absorbing the spilled material. Graphene aerogel may also have some applications in both the storage and the transfer of energy by enabling the creation of lighter, higher-energy-density batteries and vigorous research is being done on the matter.

Silicon Dioxide (SiO2) Sputtering Targets, Fused Quartz, Purity: 99.995%, Size: 4”, Thickness: 0.250”

$209.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

3N5 (99.95%) Molybdenum (Mo) Pellets Evaporation Materials

Price range: $209.00 through $484.00
Select options This product has multiple variants. The options may be chosen on the product page
Product 3N5 (99.95%) Molybdenum (Mo) Pellets Evaporation Materials
CAS No. 7439-98-7
Appearance Grey, Metallic 
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1-15mm (Size Can be customized),  Ask for other available size range.
Ingredient Mo
Molecular Weight 95.96 g/mol
Melting Point 2,617°C
Boiling Point N/A
Density 10.2 g/cm³
Product Codes NCZ-119E
 

4N (99.99%) ITO Indium Tin Oxide (In2O3/SnO2 90/10 wt%) Pieces Evaporation Materials

Price range: $209.00 through $755.00
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Product 4N (99.99%) ITO Indium Tin Oxide (In2O3/SnO2 90/10 wt%) Pieces Evaporation Materials
CAS No. 50926-11-9
Appearance Pale yellow, dark green, dark grey 
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1–10 mm (Size Can be customized),  Ask for other available size range.
Ingredient In2O3
Molecular Weight 62.30 g/mol
Melting Point N/A
Boiling Point N/A
Density 7.14 g/cm³
Product Codes NCZ-125E

1-5 µm Silver (Ag) Nanoflake, >99.5 wt%

Price range: $209.00 through $759.00
Select options This product has multiple variants. The options may be chosen on the product page
Product 1-5 µm Silver (Ag) Nanoflake, >99.5 wt%
CAS No. 7440-22-4
Appearance Gray
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1-5µm (Size Can be customized), Ask for other available size range.
Ingredient Ag
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 2.45-3.55 g/cm3
Product Codes NCZ-114I

Zinc (Zn) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.250”

$209.00

Product 

Zinc (Zn) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.250''

CAS No.

7440‑66‑6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

Zn (black granules) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

65.38 g/mol

Melting Point

419.5 °C

Boiling Point

 907 °C

Density

7.14 g/cm³

Product Codes

NCZ-1469K

Zinc (Zn) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.125”

$209.00

Product 

Zinc (Zn) Sputtering Targets, Purity: 99.95%, Size: 3'', Thickness: 0.125''

CAS No.

7440‑66‑6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

Zn (black granules) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

65.38 g/mol

Melting Point

419.5 °C

Boiling Point

 907 °C

Density

7.14 g/cm³

Product Codes

NCZ-1470K

30nm Zinc Oxide ZnO Nanoparticles Water Dispersion

Price range: $209.00 through $264.00
Select options This product has multiple variants. The options may be chosen on the product page
Product 30nm Zinc Oxide ZnO Nanoparticles Water Dispersion
CAS No. 1314-13-2
Appearance Light Yellow
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 30nm (Size Can be customized), Ask for other available size range.
Ingredient ZnO
Molecular Weight 81.38 g/mol
Melting Point 1,975°C
Boiling Point 2,360°C
Density 5.61 g/cm³
Product Codes NCZ-156I

3N (99.9%) Copper (II) Oxide (CuO) Powder, 1~2 um

Price range: $209.00 through $319.00
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Product 3N (99.9%) Copper (II) Oxide (CuO) Powder, 1~2 um
CAS No. 1317-38-0
Appearance Black
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1-2um (Size Can be customized), Ask for other available size range.
Ingredient CuO
Molecular Weight 79.54 g/mol
Melting Point N/A
Boiling Point N/A
Density 2.33 g/cm3
Product Codes NCZ-160I

4N (99.99%) Indium Tin Oxide (In2O3/SnO2 90/10 wt%) Pieces Evaporation Materials

Price range: $209.00 through $755.00
Select options This product has multiple variants. The options may be chosen on the product page
Product 4N (99.99%) Indium Tin Oxide (In2O3/SnO2 90/10 wt%) Pieces Evaporation Materials
CAS No. 50926-11-9
Appearance Blue-gray or yellowish solid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient In₂O₃·SnO₂
Molecular Weight N/A
Melting Point 1,910 °C
Boiling Point N/A
Density 7.1 g/cm³
Product Codes NCZ-170I

50nm Zinc Oxide ZnO Nanoparticles Water Dispersion

Price range: $209.00 through $264.00
Select options This product has multiple variants. The options may be chosen on the product page
Product 50nm Zinc Oxide ZnO Nanoparticles Water Dispersion
CAS No. 1314-13-2
Appearance Milky white liquid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 50nm (Size Can be customized),  Ask for other available size range.
Ingredient ZnO
Molecular Weight 81.38 g/mol
Melting Point N/A
Boiling Point N/A
Density 5.61 g/cm³
Product Codes NCZ-190I
 

99.995% 4N5 Indium Foil (100x100x0.3 mm) for Heat Sink and Solid State Battery

$209.00
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Product 99.995% 4N5 Indium Foil (100x100x0.3 mm) for Heat Sink and Solid State Battery
CAS No. 7440-74-6
Appearance Silvery, shiny metal foil
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 10–100µm (Size Can be customized),  Ask for other available size range.
Ingredient In
Molecular Weight 138.205 g/mol
Melting Point 156.6 °C
Boiling Point N/A
Density 7.31 g/cm³
Product Codes NCZ-254I
 

99.999% 5N 30-50 nm Aluminum Oxide (Alumina) Al2O3 Powder, 500 g

$209.00
Product 99.999% 5N 30-50 nm Aluminum Oxide (Alumina) Al2O3 Powder, 500 g
CAS No. 1344-28-1
Appearance White to off-white
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 30-50nm (Size Can be customized),  Ask for other available size range.
Ingredient Al2O3
Molecular Weight 101.96 g/mol
Melting Point N/A
Boiling Point N/A
Density 3.65 g/cm³
Product Codes NCZ-258I
 

99.9wt% Aminated Hollow Mesoporous Silica Powder (Spherical)

Price range: $209.00 through $396.00
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Product 99.9wt% Aminated Hollow Mesoporous Silica Powder (Spherical)
CAS No. 7631-86-9
Appearance White to off-white fine
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 100–500nm (Size Can be customized),  Ask for other available size range.
Ingredient SiO₂
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 2.0–2.2 g/cm³
Product Codes NCZ-267I
 

Graphene Oxide Sheet with Large Diameter

Price range: $209.00 through $374.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Graphene Oxide Sheet with Large Diameter
CAS No. 7782-42-5
Appearance Brownish to yellowish
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 5–50µm (Size Can be customized),  Ask for other available size range.
Ingredient CₓOᵧH_z
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 1.8–2.2 g/cm³
Product Codes NCZ-364I
 

Graphene Quantum Dots Solution (Green Fluorescence), 1mg/mL

Price range: $209.00 through $374.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Graphene Quantum Dots Solution (Green Fluorescence), 1mg/mL
CAS No. 1034343-98-0
Appearance Pale yellow or light green
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 5nm  (Size Can be customized),  Ask for other available size range.
Ingredient CₓOᵧH_z
Molecular Weight 2000 g/mol
Melting Point N/A
Boiling Point N/A
Density 2.0–2.3 g/cm³
Product Codes NCZ-367I

Premium Grade Synthetic Diamond Superabrasive Micropowder

Price range: $209.00 through $429.00
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Product Premium Grade Synthetic Diamond Superabrasive Micropowder
CAS No. 7782-40-3
Appearance Fine crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 0.1–20µm (Size Can be customized),  Ask for other available size range.
Ingredient C
Molecular Weight 438.92 g/mol
Melting Point N/A
Boiling Point N/A
Density 3.52 g/cm³
Product Codes NCZ-504I

Silicon-doped Carbon Quantum Dots Solution (Green Fluorescence), 1mg/mL

$209.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Silicon-doped Carbon Quantum Dots Solution (Green Fluorescence), 1mg/mL
CAS No. N/A
Appearance Pale yellow to light green
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 2–10nm (Size Can be customized),  Ask for other available size range.
Ingredient C_xSi_yH_zO_w
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-521I

Titanium Silicon Carbide (Ti3SiC2) MAX Phase Micron-Powder, 20g

$209.00
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Product Titanium Silicon Carbide (Ti3SiC2) MAX Phase Micron-Powder, 20g
CAS No. 12202-82-3
Appearance Gray-black
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 40–50µm (Size Can be customized),  Ask for other available size range.
Ingredient TiO2
Molecular Weight 195.7–195.71 g/mol
Melting Point N/A
Boiling Point N/A
Density 4.5 g/cm³
Product Codes NCZ-579I

Water-Soluble Red Fluorescence Carbon Quantum Dot Powder/Dispersion

Price range: $209.00 through $689.00
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Product Water-Soluble Red Fluorescence Carbon Quantum Dot Powder/Dispersion
CAS No. 7440-44-0
Appearance Brownish
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 5–6 nm (Size Can be customized),  Ask for other available size range.
Ingredient V2C
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-595I

Mesocarbon Microbeads (MCMB) Graphite Micron Powder for Lithium Ion Battery

Price range: $210.00 through $369.00
Select options This product has multiple variants. The options may be chosen on the product page
500 grams/210 € 1000 grams/369 € Please contact us for quotes on larger quantities !!! Mesocarbon Microbeads (MCMB) Graphite Micron Powder for Lithium

Mesocarbon Microbeads (MCMB) Graphite Micron Powder for Lithium Ion Battery

Price range: $210.00 through $369.00
Select options This product has multiple variants. The options may be chosen on the product page
500 grams/210 € 1000 grams/369 € Please contact us for quotes on larger quantities !!! Mesocarbon Microbeads (MCMB) Graphite Micron Powder for Lithium

(-COOH) Functionalized Short Length Single Walled Carbon Nanotubes, Purity: > 92%

Price range: $210.00 through $3,730.00
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Applications:

Single Walled Carbon Nanotubes have a variety of potential applications in different fields. These applications include medicine, mechanics, electric-electronics, chemicals, energy and others. It can be applied in, 1-drug delivery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium batteries, 8-gas-discharge tubes, 9-flat panel displays, 10-supercapacitors, 11-transistors, 12-solar cells, 13-photoluminescence, 14-templates

CR2032 Coin Cell Cases with 316SS, Diameter: 20 mm, Height: 3.2 mm

Price range: $210.00 through $648.00
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Applications:

CR2032 Coin Cell Cases with 316SS is excellent for developing new rechargeable battery and battery electrodes

Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.125”

$210.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Erbium oxide with a chemical formula of Er2Ois an oxide of erbium metal. The applications of erbium oxide are varied due to their electrical, optical and photoluminescence properties. Nanoscale materials doped with Er+3 are of much interest because they have special particle-size-dependent optical and electrical properties. Erbium oxide doped nanoparticle materials can be dispersed in glass or plastic for display purposes, such as display monitors. The spectroscopy of Er+3 electronic transitions in host crystals lattices of nanoparticles combined with ultrasonically formed geometries in aqueous solution of carbon nanotubes is of great interest for synthesis of photoluminescence nanoparticles in ‘green’ chemistry. Erbium oxide is among the most important rare earth metals used in biomedicine. Erbium oxides are also used as gate dielectrics in semiconductor devices since it has a high dielectric constant (10-14) and a large band gap. Erbium is sometimes used as a coloring for glasses and erbium oxide can also be used as a burnable neutron poison for nuclear fuel. Erbium oxide films obtained by sputtering can be used for their photoluminescence effect.

Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.125”

$210.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Erbium oxide is an oxide of erbium metal, having the chemical formula Er2O3.

Magnesium (Mg) Sputtering Targets, Purity: 99.98%, Size: 3”, Thickness: 0.125”

$210.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Zinc (Zn) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.250”

$210.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Manganese (Mn) Sputtering Target

Price range: $210.00 through $956.00
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Product 

Manganese (Mn) Sputtering Target

CAS No.

7439-96-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

54.938 g/mol

Melting Point

1,246 °C

Boiling Point

2,061 °C

Density

1.738 g/cm³

Product Codes

NCZ-1297K

Silicon Sputtering Target Si (undoped)

Price range: $210.00 through $559.00
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Product Silicon Sputtering Target Si (undoped)
CAS No. 7440-21-3
Appearance Dark Gray with a Bluish Tinge, Semi-Metallic
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 10–20 µm (Size Can be customized),  Ask for other available size range.
Ingredient Si
Molecular Weight 28.0855 g/mol
Melting Point 1,410 °C
Boiling Point N/A
Density 2.32 g/cm³
Product Codes NCZ-136H

Vanadium (V) Sputtering Targets, Purity: 99.5%, Size: 2”, Thickness: 0.125”

$210.00

Product 

Vanadium (V) Sputtering Targets, Purity: 99.5%, Size: 2'', Thickness: 0.125''

CAS No.

7440‑62‑2

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

V(Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

50.94 g/mol

Melting Point

1890 °C

Boiling Point

3380 °C

Density

 ~6.11 g/cm³

Product Codes

NCZ-1396K

3N (99.9%) 150nm Silicon (Si) Nanopowder

Price range: $210.00 through $1,815.00
Select options This product has multiple variants. The options may be chosen on the product page
Product 3N (99.9%) 150nm Silicon (Si) Nanopowder
CAS No. 7440-21-3
Appearance Gray to black fine
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 150nm (Size Can be customized),  Ask for other available size range.
Ingredient Si
Molecular Weight 28.0855 g/mol
Melting Point 1,414 °C
Boiling Point N/A
Density 2.33 g/cm³
Product Codes NCZ-157I
 

Aluminum Silicon (AlSi) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.250”

$210.00

Product 

Aluminum Silicon (AlSi) Sputtering Targets, Purity: 99.999%, Size: 2'', Thickness: 0.250''

CAS No.

Aluminum: 7429-90-5 Silicon: 7440-21-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 Al: 26.98 g/mol Si: 28.09 g/mol

Melting Point

 ~577–660 °C (depends on Si content)

Boiling Point

~2519 °C (approx.)

Density

~2.6–2.7 g/cm³

Product Codes

NCZ-2516K

Mg-Al Hydrotalcite (323558)

$210.00
Select options This product has multiple variants. The options may be chosen on the product page
Mg-Al Hydrotalcite (323558) Added into PVC resin, the following properties will be improved: 1. Volume resistivity 2. Congo-red index 3. Initial coloring . Typical Analysis Value
Items Analysis value
Molar ratio(MgO/Al2O3) 4.21
Loss on drying(105°C, 1hr) % 0.38
Specific surface area(BET) m2/g 10.1
Average particle size µm 0.44
Na(XRF result) ppm 150
. Performance Formulation: PVC 100 TOTM 50 Stab 6.8(HT 70%)
Congo-red 200°C(min) 255
Volume resistivity(1014Ωcm) 11.90
Coloring 190°C 5min Good
Coloring 190°C 30min Good
Product Codes- NCZ-2764K

Silver (Ag) Nanopowder/Nanoparticles Dispersion, Purity: 99.99%, Size: 14 nm, 52000 ppm

Price range: $211.00 through $2,220.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

This research grade product brings special properties of silver (Ag) nanoparticles into a solution. This way silver nanoparticles find further applications in the research studies. It is an easy to use dispersion and can be diluted with water addition and simple mixing. This dispersion can be used in the applications where antibacterial protection is needed. It can be used in antibacterial finishing of textiles (such as leather), paper products, deodorants for personal belongings (such as toys, footwear), deodorizing agents in paints and skin related medical products (such as antibacterial gels and lotions). Also, it can be added to many different polymers/plastics such as poly ethylene, polypropylene, ABS etc. as an antibacterial reagent. Note: Silver nanoparticle dispersion product should be kept away from sunlight. It is a research grade product, it should be handled by professional people. If nanoparticles begin to agglomerate after stored for a long time, the dispersion can be simply mixed before use.

Niobium (Nb) Sputtering Targets, Purity: 99.95% pure Ex Ta, Size: 4”, Thickness: 0.125”

$211.00

Product 

Niobium (Nb) Sputtering Targets, Purity: 99.95% pure Ex Ta, Size: 4'', Thickness: 0.125''

CAS No.

7440-03-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

92.906 g/mol

Melting Point

 2,468 °C

Boiling Point

 4,744 °C

Density

 8.57 g/cm³

Product Codes

NCZ-1814K

Niobium (Nb) Sputtering Targets, Purity: 99.95% pure Ex Ta, Size: 3”, Thickness: 0.125”

$211.00

Product 

Niobium (Nb) Sputtering Targets, Purity: 99.95% pure Ex Ta, Size: 3'', Thickness: 0.125''

CAS No.

7440-03-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

92.906 g/mol

Melting Point

 2,468 °C

Boiling Point

 4,744 °C

Density

 8.57 g/cm³

Product Codes

NCZ-1816K

Nickel Iron (Ni-Fe) Sputtering Targets, Purity: 99.5%, Size: 2”, Thickness: 0.125”

$211.00

Product 

Nickel Iron (Ni-Fe) Sputtering Targets, Purity: 99.5%, Size: 2'', Thickness: 0.125''

CAS No.

N/A

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 ~57.6 g/mol

Melting Point

 ~1,400 – 1,450 °C

Boiling Point

~2,730 – 2,750 °C

Density

 ~8.6 – 8.7 g/cm³

Product Codes

NCZ-1847K

Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.250”

$211.00

Product 

Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.250''

CAS No.

12061-16-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

382.52 g/mol

Melting Point

~2,343 °C

Boiling Point

N/A

Density

~8.64 g/cm³

Product Codes

NCZ-2245K

Titanium oxynitride (537616)

$211.00
Select options This product has multiple variants. The options may be chosen on the product page
Titanium oxynitride (537616)
D50=0.8-1.5μm D90=3-5μm
 
Product Codes- NCZ-2771K

Carbon (C) (Graphite) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.250”

$212.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 6”, Thickness: 0.250”

$213.00

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Aluminum which has the chemical symbol of Al, is a silvery white, soft, ductile metal that is the third most abundant element. Aluminum is notable due to for its light weight, strength, durability and for its ability to resist corrosion. Aluminum forms an extremely thin but very strong layer of oxide film. Aluminum has also high thermal and electrical conductivity. Aluminum sputtering targets have a particularly fine-grained microstructure. This property of Aluminum sputtering targets ensures that you benefit from uniform erosion and a low susceptibility to particle formation throughout the sputtering process.