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Thermoset Carbon Paste (140 ℃, 1000 ohm/sqr/25µm, 10-15 µm)

Price range: $165.00 through $345.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

  • Biosensors,
  • Membrane Keyboards,
  • Printed Sensors,
  • PV cell,
  • Printed resistors
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Thermoset Carbon Paste (140 ℃, 100 ohm/sqr/25µm), 15-20 µm

Price range: $165.00 through $260.00
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Applications:

  • Printed electronics,
  • Sensors and biosensor,
  • PV cells,
  • Membrane keyboards,
  • Energy storage devices,
  • Automative electronics
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Thermoset Carbon Paste (140℃, <20 ohm/sqr/25µm), 10-12 µm

Price range: $165.00 through $260.00
Select options This product has multiple variants. The options may be chosen on the product page

 Applications:

  • Printed electronics,
  • Sensors and biosensor,
  • PV cells,
  • Membrane keyboards,
  • Energy storage devices,
  • Aautomative electronics.
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Gallium Arsenide (GaAs) Wafers, Size: 4”, Thickness: 640±25 μm, Single Side Polished, EPI-ready, Dopant: Silicon (N-type)

Price range: $165.00 through $3,450.00
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Gallium Arsenide (GaAs) Wafer Size: 4”, Single Side Polished, Thickness: 640± 25 μm, EPI-ready, Dopant: Silicon (N-type) Technical Properties: Quality
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Aluminum (Al) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.125”

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$165.00
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Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Aluminum which has the chemical symbol of Al, is a silvery white, soft, ductile metal that is the third most abundant element. Aluminum is notable due to for its light weight, strength, durability and for its ability to resist corrosion. Aluminum forms an extremely thin but very strong layer of oxide film. Aluminum has also high thermal and electrical conductivity. Aluminum sputtering targets have a particularly fine-grained microstructure. This property of Aluminum sputtering targets ensures that you benefit from uniform erosion and a low susceptibility to particle formation throughout the sputtering process.
Single Walled Nanotubes -OH Functionalized (SWNTs 90%, CNTs 95%)
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Single Walled Nanotubes -OH Functionalized (SWNTs 90%, CNTs 95%)

Price range: $165.00 through $795.00
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$165/1g
$795/5g

Product 

 Single Walled Nanotubes -OH Functionalized (SWNTs 90%, CNTs 95%)

CAS No.

7727-54-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

~0.8 – 2 nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 228.18 g/mol

Melting Point

~120 °C

Boiling Point

N/A

Density

  1.98 g/cm³

Product Codes

NCZ-1247K
3N5 (99.95%) Magnesium (Mg) Pellets Evaporation Materials3N5 (99.95%) Magnesium (Mg) Pellets Evaporation Materials
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3N5 (99.95%) Magnesium (Mg) Pellets Evaporation Materials

Price range: $165.00 through $594.00
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Product 3N5 (99.95%) Magnesium (Mg) Pellets Evaporation Materials
CAS No. 7439-95-4
Appearance Silvery White, Metallic
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 3–6mm (Size Can be customized),  Ask for other available size range.
Ingredient Mg
Molecular Weight 60.084 g/mol
Melting Point 649°C
Boiling Point 1090°C
Density 1.74 g/cm³
Product Codes NCZ-110E
3N (99.9%) Titanium Monoxide (TiO) Pieces and Tablets Evaporation Materials
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3N (99.9%) Titanium Monoxide (TiO) Pieces and Tablets Evaporation Materials

Price range: $165.00 through $275.00
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Product 3N (99.9%) Titanium Monoxide (TiO) Pieces and Tablets Evaporation Materials
CAS No. 1314-35-8
Appearance Dark, Crystalline Solid 
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1mm (Size Can be customized),  Ask for other available size range.
Ingredient TiO
Molecular Weight 63.88 g/mol
Melting Point 1,750 °C
Boiling Point 3,227 °C
Density 4.95 g/cm³
Product Codes NCZ-139E
3N5 (99.95%) Tungsten (W) Wire Evaporation Materials
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3N5 (99.95%) Tungsten (W) Wire Evaporation Materials

Price range: $165.00 through $238.00
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Product 3N5 (99.95%) Tungsten (W) Wire Evaporation Materials
CAS No. 7440-33-7
Appearance Grayish White, Lustrous, Metallic
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 0.5mm-1mm (Size Can be customized),  Ask for other available size range.
Ingredient W
Molecular Weight 183.84 g/mol
Melting Point 3,410 °C
Boiling Point N/A
Density 19.25 g/cm3
Product Codes NCZ-145E
 
Nickel/Iron (Ni/Fe 81/19 wt.%) Pellets Evaporation Materials
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Nickel/Iron (Ni/Fe 81/19 wt.%) Pellets Evaporation Materials

Price range: $165.00 through $627.00
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Product Nickel/Iron (Ni/Fe 81/19 wt.%) Pellets Evaporation Materials
CAS No. N/A
Appearance Silver-gray to dark gray
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Ni/Fe
Molecular Weight 265.81 g/mol
Melting Point N/A
Boiling Point N/A
Density 8.7 g/cm3
Product Codes NCZ-147E
3N (99.9%) Samarium (Sm) Pellets & Pieces (3-6mm) Evaporation Materials
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3N (99.9%) Samarium (Sm) Pellets & Pieces (3-6mm) Evaporation Materials

Price range: $165.00 through $308.00
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Product 3N (99.9%) Samarium (Sm) Pellets & Pieces (3-6mm) Evaporation Materials
CAS No. 7440-19-9
Appearance Silvery White Metallic
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 3-6mm (Size Can be customized),  Ask for other available size range.
Ingredient Sm
Molecular Weight 78.96 g/mol
Melting Point N/A
Boiling Point N/A
Density 7.52 g/cm3
Product Codes NCZ-158E
 
Nickel Iron Sputtering Targets Ni/Fe
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Nickel Iron Sputtering Targets Ni/Fe

Price range: $165.00 through $469.00
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Product Nickel Iron Sputtering Targets Ni/Fe
CAS No. N/A
Appearance Solid, metallic gray sputtering target
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient NiFe
Molecular Weight N/A
Melting Point 1,500 °C
Boiling Point N/A
Density 8.7 g/cm³
Product Codes NCZ-131H
 
1g Multilayer Graphene Oxide Powder
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1g Multilayer Graphene Oxide Powder

$165.00
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Product 1g Multilayer Graphene Oxide Powder
CAS No. 7782-42-5
Appearance Brown to dark brown
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 0.5–10µm (Size Can be customized),  Ask for other available size range.
Ingredient C₈H₂O₃
Molecular Weight N/a
Melting Point N/A
Boiling Point N/A
Density 0.3 – 0.7 g/cm³
Product Codes NCZ-139I
 
4N (99.99%) Silver (Ag) Pieces (1-4mm) Evaporation Materials
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4N (99.99%) Silver (Ag) Pieces (1-4mm) Evaporation Materials

$165.00
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Product 4N (99.99%) Silver (Ag) Pieces (1-4mm) Evaporation Materials
CAS No. 7440-22-4
Appearance Shiny, metallic, silver-white
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1-4mm (Size Can be customized),  Ask for other available size range.
Ingredient Ag
Molecular Weight 107.87 g/mol
Melting Point 961.8 °C
Boiling Point 2,162 °C
Density 10.49 g/cm³
Product Codes NCZ-172I
 
Anhydrous Sodium Tungstate (Na2WO4), >99%
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Anhydrous Sodium Tungstate (Na2WO4), >99%

Price range: $165.00 through $263.00
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Product Anhydrous Sodium Tungstate (Na2WO4), >99%
CAS No. 13472-45-2
Appearance White crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Na₂WO₄
Molecular Weight 293.83 g/mol
Melting Point 698 °C
Boiling Point N/A
Density 4.18 g/cm³
Product Codes NCZ-288I
Nickel Iron (Ni-Fe) Sputtering Targets, Purity: 99.95%, Size: 1'', Thickness: 0.250''
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Nickel Iron (Ni-Fe) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.250”

$165.00
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Product 

 Nickel Iron (Ni-Fe) Sputtering Targets, Purity: 99.95%, Size: 1'', Thickness: 0.250''

CAS No.

N/A

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  ~57.6 g/mol

Melting Point

 ~1,400 – 1,450 °C

Boiling Point

~2,730 – 2,750 °C

Density

  ~8.6 – 8.7 g/cm³

Product Codes

NCZ-1848K
Niobium Oxide (Nb2O5) Sputtering Targets, Purity: 99.5%, Size: 1'', Thickness: 0.250''
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Niobium Oxide (Nb2O5) Sputtering Targets, Purity: 99.5%, Size: 1”, Thickness: 0.250”

$166.00
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Product 

 Niobium Oxide (Nb2O5) Sputtering Targets, Purity: 99.5%, Size: 1'', Thickness: 0.250''

CAS No.

1313-96-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  265.81 g/mol

Melting Point

~1512 °C

Boiling Point

N/A

Density

  4.6 – 4.9 g/cm³

Product Codes

NCZ-1811K
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Copper (Cu) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 35 nm, Metal Basis

,
Price range: $167.00 through $334.00
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Copper (Cu) Nanopowder/Nanoparticles

Purity: 99.95%, Size: 35 nm, Metal Basis

Technical Properties:

Bulk Density (g/cm3) 0,19
True Density (g/cm3) 8,9
Color warm copper brown
Shape spherical
Crystal Structure cubic
Average Particle Size (nm) 35
Specific Surface Area (m2/g) 11,0-15,0
Elemental Analysis Cu Fe Ni Others
≥99.95 ≤0.006 ≤0.005 ≤0.002

Properties, Storage and Cautions:

Copper nanoparticles are highly reactive and flammable, therefore it should be handled with care and rapid moves, vibrations should be avoided. Nanopowder should be kept away from sunlight, any kind of heating, moisture and impacts. Coagulation of the particles is a serious problem, so, nanopowder should be sealed under vacuum and should be kept in cool and dry conditions. Air contact should be avoided.
Graphene Oxides Gel (98%,
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Graphene Oxides Gel (98%, <2nm, diameter: 1~5um)

Price range: $167.00 through $785.00
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$167/1g $785/5g
Product Graphene Oxides Gel (98%, <2nm, diameter: 1~5um)
CAS No. 1034343-98-0
Appearance Black or greyish-black powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1-5um (Size Can be customized),  Ask for other available size range.
Ingredient (C)_x(O)_y(H)_z
Molecular Weight 2043.82 g/mol
Melting Point N/A
Boiling Point N/A
Density 0.48 g/cm³
Product Codes NCZ-115G
 
Graphene Oxides Gel (98%,
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Graphene Oxides Gel (98%, <2nm, diameter: 8~15um)

Price range: $167.00 through $785.00
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$167/1g $785/5g
Product Graphene Oxides Gel (98%, <2nm, diameter: 8~15um)
CAS No. 1034343-98-0
Appearance Black powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 8-15um (Size Can be customized),  Ask for other available size range.
Ingredient (C)x(OH)y(O)z
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 1.36 g/cm³
Product Codes NCZ-116G
 
Graphene Oxides Gel (98%, 50um)
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Graphene Oxides Gel (98%, <2nm, diameter: >50um)

Price range: $167.00 through $785.00
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$167/1g $785/5g
Product Graphene Oxides Gel (98%, <2nm, diameter: >50um)
CAS No. 1034343-98-0
Appearance Black powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 50um (Size Can be customized),  Ask for other available size range.
Ingredient (C)x(OH)y(O)z
Molecular Weight 2043.786 g/mol
Melting Point N/A
Boiling Point N/A
Density 1.36 g/cm³
Product Codes NCZ-117G
 
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Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.125''
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Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”

$167.00
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Product 

 Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.125''

CAS No.

7440-65-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 88.91 g/mol

Melting Point

1522 °C

Boiling Point

3338 °C

Density

 4.47 g/cm³

Product Codes

NCZ-1523K
Tungsten Titanium (TiW) Sputtering Targets, Purity: 99.995%, Size: 1'', Thickness: 0.250''
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Tungsten Titanium (TiW) Sputtering Targets, Purity: 99.995%, Size: 1”, Thickness: 0.250”

$167.00
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Product 

 Tungsten Titanium (TiW) Sputtering Targets, Purity: 99.995%, Size: 1'', Thickness: 0.250''

CAS No.

N/A

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  170.5 g/mol

Melting Point

2,700 – 3,200 °C

Boiling Point

4,000 – 5,000 °C

Density

 16.7 g/cm³

Product Codes

NCZ-1561K
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Reduced Graphene Oxide Water Dispersion, Purity: 99.5%, rGO: 2,0 wt%

Price range: $168.00 through $961.00
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Applications of Reduced Graphene Oxide Water Dispersion

  • Energy Storage
  • Biomedical Applications
  • Biosensors
  • Use as a high performance additive for composites with PPO, POM ,PPS, PC, ABS, PP, PE, PS, Nylon and rubbers.
  • Can improve composites tensile strength, stiffness, corrosion resistance, abrasion resistance and anti-static.
  • Electricity and lubricant properties.
  • For all mechanical properties modifications, typical amounts are about 2-6 wt%
  • For conductivity modification, typical amounts are about 2-8 wt%
Nickel (Ni) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.125''
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Nickel (Ni) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”

$168.00
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Product 

 Nickel (Ni) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.125''

CAS No.

7440-02-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  58.69 g/mol

Melting Point

 1,455 °C

Boiling Point

 2,732 °C

Density

  8.90 g/cm³

Product Codes

NCZ-1880K
Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 2'', Thickness: 0.250''
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Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.250”

$168.00
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Product 

 Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 2'', Thickness: 0.250''

CAS No.
7440-50-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 63.55 g/mol

Melting Point

 1,084 °C

Boiling Point

 2,562 °C

Density

 8.96 g/cm³

Product Codes

NCZ-2267K
α-Cyclodextrin (237605)
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α-Cyclodextrin (237605)

$168.00
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α-Cyclodextrin (237605)

Feature alpha-Cyclodextrin is a non-reducing cyclic saccharide comprised of six glucose units linked by alpha-1.4 bonds. It is produced by the action of cyclodextrin glucosyl transferase on hydrolysed starch syrups. The cavity of alpha-cyclodextrin is less than beta-cyclodextrin, so it is used to allow formation of inclusion complexes with little molecules. The solubility degree of Alpha-cyclodextrin in water is 14.5 g/100ml @ 25°C, so the situation that needs high solubility of cyclodextrin.

CAS : 10016-20-3

Molecular Formula:  C36H60O30

Specifications

 
Items Index
Appearance White powder, Odorless, Minor sweet
Assay ≥ 98.0%
Moisture content ≤11.0%
Residue on ignition ≤0.1%
Specific rotation +147°~+152°
pH 5.0 – 8.0
Color and clarity of solution Clear and colorless
Reductive sugar ≤0.2%
Chloride ≤0.018%
Heavy metal ≤0.0002%
As ≤0.0001%
Total bacteria count ≤100pcs/g
Moulds and yeasts ≤20pcs/g
Escherichia coli Negative
Product Codes- NCZ-2760K
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Molybdenum (Mo) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.250”

, ,
$169.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered. By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized. There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.
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Silicon (Si) Sputtering Targets, undoped, Purity: 99.999%, Size: 2”, Thickness: 0.125”

, , ,
$169.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

Even very low quantities of contaminants can be detected with the aid of the sputtering target, allowing for the determination of the target material's composition.

Applications for sputtering targets are also found in space. One type of space weathering is sputtering, which modifies the chemical and physical characteristics of airless worlds like the Moon and asteroids.

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Tin (Sn) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.250”

, ,
$169.00
Add to cart

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

4N (99.99%) Tin (Sn) Pellets Evaporation Materials
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4N (99.99%) Tin (Sn) Pellets Evaporation Materials

Price range: $169.00 through $607.00
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Product 4N (99.99%) Tin (Sn) Pellets Evaporation Materials
CAS No. 7440-31-5
Appearance Silvery Lustrous Gray, Metallic 
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1–10mm (Size Can be customized),  Ask for other available size range.
Ingredient Sn
Molecular Weight 118.71 g/mol
Melting Point 232°C
Boiling Point 1564°C
Density 7.28 g/cm³
Product Codes NCZ-113E
Niobium Sputtering Target Nb
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Niobium Sputtering Target Nb

Price range: $169.00 through $693.00
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Product Niobium Sputtering Target Nb
CAS No. 685830-44-8
Appearance Gray, Metallic
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1–5μm (Size Can be customized),  Ask for other available size range.
Ingredient Nb
Molecular Weight 92.90638 g/mol
Melting Point 2,468 °C
Boiling Point N/A
Density 8.57 g/cm³
Product Codes NCZ-134H
Molybdenum (Mo) Sputtering Targets, Purity: 99.95%, Size: 4'', Thickness: 0.125''
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Molybdenum (Mo) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.125”

$169.00
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Product 

 Molybdenum (Mo) Sputtering Targets, Purity: 99.95%, Size: 4'', Thickness: 0.125''

CAS No.

 7439-98-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 95.95 g/mol

Melting Point

 2623 °C

Boiling Point

 4639 °C

Density

 10.28 g/cm³

Product Codes

NCZ-1935K
Molybdenum (Mo) Sputtering Targets, Purity: 99.95%, Size: 3'', Thickness: 0.125''
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Molybdenum (Mo) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.125”

$169.00
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Product 

 Molybdenum (Mo) Sputtering Targets, Purity: 99.95%, Size: 3'', Thickness: 0.125''

CAS No.

 7439-98-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 95.95 g/mol

Melting Point

 2623 °C

Boiling Point

 4639 °C

Density

 10.28 g/cm³

Product Codes

NCZ-1937K
pH Calibration Buffer Solution Pack – pH 4.01/7.00/10.01 (250 mL Each)
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pH Calibration Buffer Solution Pack – pH 4.01/7.00/10.01 (250 mL Each)

$169.00
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Product pH Calibration Buffer Solution Pack – pH 4.01/7.00/10.01 (250 mL Each)
CAS No. 778-77-0
Appearance Clear, colorless liquid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient N/A
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-490I
Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 1'', Thickness: 0.125''
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Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”

$169.00
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Product 

 Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 1'', Thickness: 0.125''

CAS No.
12061-16-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 382.52 g/mol

Melting Point

 ~2,343 °C

Boiling Point

N/A

Density

 ~8.64 g/cm³

Product Codes

NCZ-2250K
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Short Single Walled Carbon Nanotubes, Purity: > 92%

Price range: $170.00 through $2,630.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

There are numerous possible uses for single-walled carbon nanotubes in various industries. These applications span a variety of fields, such as energy, chemistry, electronics, mechanics, and medicine. One can use it for medication delivery, two for biosensors, three for CNT composites, and four for catalysis.

5-hydrogen storage, 6-nanoprobes 7-lithium power cells 8 tubes for gas discharge, nine flat-panel monitors Ten supercapacitors and eleven transistors Photoluminescence, 12, solar cells, 13, and 14 templates  
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Nickel (Ni) Sputtering Targets, Purity: 99.995%, Size: 2”, Thickness: 0.125”

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$170.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Hafnium Oxide Nanoparticles/Nanopowder (HfO2, ~100nm, 99.9+%)
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Hafnium Oxide Nanoparticles/Nanopowder (HfO2, ~100nm, 99.9+%)

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Price range: $170.00 through $605.00
Select options This product has multiple variants. The options may be chosen on the product page
$170/25g
$605/100g

Product 

 Hafnium Oxide Nanoparticles/Nanopowder (HfO2, ~100nm, 99.9+%)

CAS No.
 12055-23-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

<100nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  210.49 g/mol

Melting Point

~2,758 °C

Boiling Point

~5,400 °C

Density

 ~9.68 g/cm³

Product Codes

NCZ-1138K
Aluminum Silicon (AlSi) Sputtering Targets, Purity: 99.999%, Size: 1'', Thickness: 0.250''
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Aluminum Silicon (AlSi) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.250”

$170.00
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Product 

 Aluminum Silicon (AlSi) Sputtering Targets, Purity: 99.999%, Size: 1'', Thickness: 0.250''

CAS No.
Aluminum: 7429-90-5 Silicon: 7440-21-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  Al: 26.98 g/mol Si: 28.09 g/mol

Melting Point

  ~577–660 °C (depends on Si content)

Boiling Point

~2519 °C (approx.)

Density

 ~2.6–2.7 g/cm³

Product Codes

NCZ-2518K
Potassium phytate (344604)
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Potassium phytate (344604)

$170.00
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Potassium phytate (344604)
product name Potassium phytate
Chemical name Inositol Hexaphosphoric Potassium Salt
Molecular formula C H O 6 6 24 P K6 12
Application White powder. Widely used in the fields including medicine, food and daily-use chemical etc.. Packing:25kg/cardboard drum or on the clients' requirements. Storage: Stored in cool, dry and heat insulative place. Products can be produced on the clients' requirements.
Specification Specification
Index name Index
Content 98%min
Alkalinity acidity 10.5-11.5
Calcium salt 0.01%max
Sulphate 0.01%max
Chloride 0.01%max
Arsenic 3ppm max
Heavy metal O.001%max
Loss on drying 2%max
Storage Kept away from light or heat.
Product Codes- NCZ-2626K
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Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.125”

, , ,
$171.00
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 Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Aluminum which has the chemical symbol of Al, is a silvery white, soft, ductile metal that is the third most abundant element. Aluminum is notable due to for its light weight, strength, durability and for its ability to resist corrosion. Aluminum forms an extremely thin but very strong layer of oxide film. Aluminum has also high thermal and electrical conductivity. Aluminum sputtering targets have a particularly fine-grained microstructure. This property of Aluminum sputtering targets ensures that you benefit from uniform erosion and a low susceptibility to particle formation throughout the sputtering process.
Nickel (Ni) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.125''
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Nickel (Ni) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”

$171.00
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Product 

 Nickel (Ni) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.125''

CAS No.

7440-02-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  58.69 g/mol

Melting Point

~1453–1455 °C

Boiling Point

2913 °C

Density

  8.90 g/cm³

Product Codes

NCZ-1885K
Tantalum Aluminum Carbide (Ta4AlC3) MAX Phase Micron-Powder
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Tantalum Aluminum Carbide (Ta4AlC3) MAX Phase Micron-Powder

Price range: $171.00 through $645.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Tantalum Aluminum Carbide (Ta4AlC3) MAX Phase Micron-Powder
CAS No. N/A
Appearance Dark gray to black
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1–5µm (Size Can be customized),  Ask for other available size range.
Ingredient Ta4AlC3
Molecular Weight 654.48 g/mol
Melting Point N/A
Boiling Point N/A
Density 10.3 g/cm³
Product Codes NCZ-549I
 
Carbon (C) (Graphite) Sputtering Targets, Purity: 99.999%, Size: 3'', Thickness: 0.125''
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Carbon (C) (Graphite) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.125”

$171.00
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Product 

 Carbon (C) (Graphite) Sputtering Targets, Purity: 99.999%, Size: 3'', Thickness: 0.125''

CAS No.
 7782‑42‑5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 12.01 g/mol

Melting Point

 ~3,652 °C (no liquid phase)

Boiling Point

 ~4,200 °C

Density

  ~2.25 g/cm³

Product Codes

NCZ-2352K
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Reduced Graphene Oxide Water Dispersion, Purity: 99.5%, rGO: 2,0 wt%

Price range: $172.00 through $989.00
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Reduced Graphene Oxide (rGO) is derived by deoxygenation of graphene oxide via chemical, thermal, electrochemical process or through IR or UV irradiation to get a powder form. Reduced graphene oxide is the most suitable solution for bulk material applications such as energy storage thanks to be manufactured easily in large quantities with desired quantity level. For applications requiring the highest uniformity in size, we offer high purity of Reduced Graphene Oxide (rGO) with lowest prices.
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Fullerene-C70, Purity: 96%

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Price range: $172.00 through $828.00
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  1 gram/154 € 5 grams/740 €                          
Please contact us for quotes on larger quantities !!!

Fullerene-C70

Purity: 96% 

Technical Properties:

Fullerene Compound Formula C70
Fullerene  Molecular Weight 840.77 g/mol
Fullerene  Purity 96%
Fullerene  Melting Point >280 °C
Fullerene  Appearance Black Powder
Fullerene  CAS 115383-22-7 

Applications:

1. Pharmaceutical: Diagnostic reagents, super drugs, cosmetics, nuclear magnetic resonance (NMR) with the developer. DNA affinity 2. Energy: Solar battery, fuel cell, secondary battery. 3. Industry: Wear resistant material, flame retardant materials, lubricants, polymer additives, high-performance membrane, catalyst, artificial diamond, hard alloy, electric viscous fluid, ink filters, high-performance coatings, fire retardant coatings, manufacturing bioactive materials , memory materials, embedded molecular and other characteristics, composite materials etc. 4. Information industry: Semiconductor record medium, magnetic materials, printing ink, toner, ink, paper special purposes. 5. Electronic parts: Superconducting semiconductor, diodes, transistors, inductor.  , 6. Optical materials, electronic camera, fluorescence display tube, nonlinear optical materials. 7. Environment: Gas adsorption, gas storage.  
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Hydrothermal Synthesis Autoclave Reactor with PPL Lined Vessel 100 ml

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Price range: $172.00 through $688.00
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APPLICATIONs
  • Chemical synthesis
  • Synthesizing of nanoparticles
  • For cultured crystal growth
  • Polymerization reaction
  • Hydrothermal decomposition
  • Catalyst synthesis
  • Hydrothermal oxidation
  • Hydrothermal precipitation
  • Material Digester / digestion
  • Crystallization process
  • Dissolve of heavy metals, refractory material, organic chemicals etc.
   
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Iron (Fe) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.250”

, ,
$172.00
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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

High Purity Bismuth (III) Fluoride (BiF3), 99.99% 4N
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High Purity Bismuth (III) Fluoride (BiF3), 99.99% 4N

Price range: $172.00 through $458.00
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Product High Purity Bismuth (III) Fluoride (BiF3), 99.99% 4N
CAS No. 7787-61-3
Appearance White to off-white crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient BiF3
Molecular Weight 265.97 g/mol
Melting Point N/A
Boiling Point N/A
Density 8.2 g/cm³
Product Codes NCZ-406I
 
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Nickel Foam for Battery Cathode Substrate, Size: 1000 mm x 300 mm x 1.6 mm

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Price range: $173.00 through $782.00
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Applications:

Nickel Foam for Battery Cathode Substrate (1000 mm length x 300 mm width x 1.6 mm thickness) - EQ-bcnf-16m
Vanadium Carbide Powder -100/+270 Mesh
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Vanadium Carbide Powder -100/+270 Mesh

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Price range: $173.00 through $315.00
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$173/500g
$315/Kg

Product 

 Vanadium Carbide Powder -100/+270 Mesh

CAS No.

12070-10-9

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 

 -100/+270 Mesh (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 62.95 g/mol

Melting Point

~2,810 °C

Boiling Point

~3,900 °C

Density

 ~5.77 g/cm³

Product Codes

NCZ-1207K
Ytterbium Oxide Powder ( Yb2O3, 99.9%, ~5um)
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Ytterbium Oxide Powder ( Yb2O3, 99.9%, ~5um)

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$173.00
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$173/100g

Product 

 Ytterbium Oxide Powder ( Yb2O3, 99.9%, ~5um)

CAS No.

1314-37-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

~5um (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  394.08 g/mol

Melting Point

~2,345 °C

Boiling Point

~4,300 °C

Density

 ~9.17 g/cm³

Product Codes

NCZ-1214K
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Short Single Walled Carbon Nanotubes, Purity: > 92%

, ,
Price range: $174.00 through $2,705.00
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Applications:

Single Walled Carbon Nanotubes have a variety of potential applications in different fields. These applications include medicine, mechanics, electric-electronics, chemicals, energy and others. It can be applied in, 1-drug delivery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium batteries, 8-gas-discharge tubes, 9-flat panel displays, 10-supercapacitors, 11-transistors, 12-solar cells, 13-photoluminescence, 14-templates
Aluminum Oxide (Al2O3) Sputtering Target
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Aluminum Oxide (Al2O3) Sputtering Target

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Price range: $174.00 through $526.00
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Product 

 Aluminum Oxide (Al2O3) Sputtering Target

CAS No.

1344-28-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 101.96 g/mol

Melting Point

2,072 °C

Boiling Point

 ~2,977 °C

Density

  3.95 – 4.1 g/cm³

Product Codes

NCZ-1365K
Nickel Chromium (Ni-Cr) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.250''
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Nickel Chromium (Ni-Cr) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”

$174.00
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Product 

 Nickel Chromium (Ni-Cr) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.250''

CAS No.

 11106-97-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

  ~110.69 g/mol

Melting Point

 ~1,400 °C

Boiling Point

 ~2,730–2,750 °C

Density

  ~8.4 – 8.5 g/cm³

Product Codes

NCZ-1860K
Indium (In) Sputtering Targets, Purity: 99.99%, Size: 1'', Thickness: 0.250''
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Indium (In) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”

$174.00
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Product 

 Indium (In) Sputtering Targets, Purity: 99.99%, Size: 1'', Thickness: 0.250''

CAS No.
 7440-74-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 114.82 g/mol

Melting Point

  156.6 °C

Boiling Point

 2,072 °C

Density

  7.31 g/cm³

Product Codes

NCZ-2233K
Cr2C MXene Powder
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Cr2C MXenes

Price range: $175.00 through $2,275.00
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Product Name: Cr2C MXenes

Product Code: NCZ-MX-201

Product Cr2C MXene 
Colour Black Powder
Purity ≥98 wt%
Ingredient Cr2C
CAS NO 12316-56-2

Cr2C MXenes APPLICATION FIELDS

High-temperature coating, Mxene precursor, conductive self-lubricating ceramic, lithium-ion battery, supercapacitor, electrochemical catalysis.

RELATED INFORMATION

Storage Conditions: Airtight sealed, avoid light and keep dry at room temperature. Please email us for the customization. Email: contact@nanochemazone.com
Aluminium Oxide Nanoparticles
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Alumina nanoparticles powder

Price range: $175.00 through $875.00
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Alumina nanoparticles powder

MF: Al2O3
Chemical Name: Aluminum Oxide Nanoparticle Powder
Purity: > 99.99%
APS: 20-100 nm (Customization is possible)
Form: Nanopowder/Dispersion
Product Number: NCZ2201-G
CAS Number 1344-28-1

Alumina nanoparticles powder

The aluminum Oxide gamma form is also available on request.  Note: We can supply different size products of microparticles and Nanoparticles Size range powder according to the client’s requirements.
Barium Iron Oxide Nanopowder
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Barium Iron Oxide Nanoparticles

Price range: $175.00 through $875.00
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Barium Iron Oxide Nanoparticles

MF: BaFe12O19
Chemical Name: Barium Dodecairon Nonadecaoxide
Purity: > 99.99%
APS: 100 nm (Size Customization possible)
Form: Nanopowder
Product Number: #NCZ601
CAS Number 12047-11-9

Barium Iron Oxide Nanoparticles

Note: We can supply different size products of microparticles and Nanoparticles Size range powder according to the client’s requirements.