Copper (Cu) Sputtering Targets, Purity: 99.99%, Size: 8”, Thickness: 0.250”

$455.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.125”

$64.00

Product 

Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 1'', Thickness: 0.125''

CAS No.

7440-50-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

63.55 g/mol

Melting Point

1,084 °C

Boiling Point

 2,562 °C

Density

8.96 g/cm³

Product Codes

NCZ-2273K

Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.125”

$60.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.125”

$60.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.250”

$99.00

Product 

Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 1'', Thickness: 0.250''

CAS No.

7440-50-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

63.55 g/mol

Melting Point

1,084 °C

Boiling Point

 2,562 °C

Density

8.96 g/cm³

Product Codes

NCZ-2271K

Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.250”

$90.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.125”

$134.00

Product 

Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 2'', Thickness: 0.125''

CAS No.

7440-50-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

63.55 g/mol

Melting Point

1,084 °C

Boiling Point

 2,562 °C

Density

8.96 g/cm³

Product Codes

NCZ-2269K

Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.125”

$120.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.250”

$168.00

Product 

Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 2'', Thickness: 0.250''

CAS No.

7440-50-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

63.55 g/mol

Melting Point

1,084 °C

Boiling Point

 2,562 °C

Density

8.96 g/cm³

Product Codes

NCZ-2267K

Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.250”

$149.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.125”

$157.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.125”

$177.00

Product 

Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 3'', Thickness: 0.125''

CAS No.

7440-50-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

63.55 g/mol

Melting Point

1,084 °C

Boiling Point

 2,562 °C

Density

8.96 g/cm³

Product Codes

NCZ-2265K

Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.250”

$214.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.250”

$244.00

Product 

Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 3'', Thickness: 0.250''

CAS No.

7440-50-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

63.55 g/mol

Melting Point

1,084 °C

Boiling Point

 2,562 °C

Density

8.96 g/cm³

Product Codes

NCZ-2263K

Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.125”

$285.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.125”

$326.00

Product 

Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 4'', Thickness: 0.125''

CAS No.

7440-50-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

63.55 g/mol

Melting Point

1,084 °C

Boiling Point

 2,562 °C

Density

8.96 g/cm³

Product Codes

NCZ-2261K

Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.250”

$341.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When etching anisotropy is high, sputter etching is the preferred method.

is required, and selectivity is unimportant. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.250”

$392.00

Product 

Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 4'', Thickness: 0.250''

CAS No.

7440-50-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

63.55 g/mol

Melting Point

1,084 °C

Boiling Point

 2,562 °C

Density

8.96 g/cm³

Product Codes

NCZ-2259K

Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 6”, Thickness: 0.250”

$270.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 6”, Thickness: 0.250”

$309.00

Product 

Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 6'', Thickness: 0.250''

CAS No.

7440-50-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

63.55 g/mol

Melting Point

1,084 °C

Boiling Point

 2,562 °C

Density

8.96 g/cm³

Product Codes

NCZ-2256K

Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 7”, Thickness: 0.250”

$704.00

Product 

Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 7'', Thickness: 0.250''

CAS No.

7440-50-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

63.55 g/mol

Melting Point

1,084 °C

Boiling Point

 2,562 °C

Density

8.96 g/cm³

Product Codes

NCZ-2254K

Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 7”, Thickness: 0.250”

$609.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 8”, Thickness: 0.250”

$577.00

Product 

Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 8'', Thickness: 0.250''

CAS No.

7440-50-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

63.55 g/mol

Melting Point

1,084 °C

Boiling Point

 2,562 °C

Density

8.96 g/cm³

Product Codes

NCZ-2253K

Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 8”, Thickness: 0.250”

$500.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 8”, Thickness: 0.250”

$500.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Copper (II) chloride, 99.999%

Price range: $20.00 through $101.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Copper (II) chloride, 99.999%
CAS No. 10125-13-0
Appearance Blue-green crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Cl₂Cu·2H₂O
Molecular Weight 170.48 g/mol
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-151R

Copper (II) ethoxide, 98%

Price range: $17.00 through $118.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Copper (II) ethoxide, 98%
CAS No. 2850-65-9
Appearance Blue to green
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient C₄H₁₀CuO₂
Molecular Weight 153.67 g/mol
Melting Point 120 °C
Boiling Point N/A
Density 0.89–0.90 g/cm³
Product Codes NCZ-167R

Copper (II) meso-tetraphenylporphine

Price range: $30.00 through $176.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Copper (II) meso-tetraphenylporphine
CAS No. 14172-91-9
Appearance Purple solid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient C₄₄H₂₈CuN₄
Molecular Weight 676.27–676.28 g/mol
Melting Point 300 °C
Boiling Point N/A
Density N/A
Product Codes NCZ-219R
 

Copper (II) methoxide, 98%

Price range: $26.00 through $160.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Copper (II) methoxide, 98%
CAS No. 1184-54-9
Appearance Blue to green
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Cu(OCH₃)₂
Molecular Weight N/A
Melting Point 206 °C
Boiling Point N/A
Density N/A
Product Codes NCZ-168R
 

Copper (II) nitrate hexahydrate, 99.999%

Price range: $16.00 through $72.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Copper (II) nitrate hexahydrate, 99.999%
CAS No. N/A
Appearance Blue crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient CuN₂O₆
Molecular Weight 187.55 g/mol
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-152R

Copper (II) oxide, 99.999%

Price range: $16.00 through $77.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Copper (II) oxide, 99.999%
CAS No. 1317-38-0
Appearance Black
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient CuO
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-153R
 

Copper (II) sulfate, 99.999%

Price range: $19.00 through $99.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Copper (II) sulfate, 99.999%
CAS No. 23254-43-5
Appearance Blue crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient CuSO₄
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 2.286 g/cm³
Product Codes NCZ-154R

Copper ACAC

Price range: $16.00 through $36.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Copper ACAC
CAS No. 13395-16-9
Appearance Bright blue crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient C₁₅H₂₁CoO₆
Molecular Weight 261.76 g/mol
Melting Point 279–288 °C
Boiling Point N/A
Density 0.721 g/cm
Product Codes NCZ-266R
 

Copper Alloy Series

Product Copper Alloy Series
CAS No. 7440-50-8
Appearance Metallic gray powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 15-45 µm (Size Can be customized),  Ask for other available size range.
Ingredient N/A
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-140M
 

Copper BZACAC

Price range: $16.00 through $74.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Copper BZACAC
CAS No. 14128-84-8
Appearance Blue-green solid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient C₂₀H₁₈CuO₄
Molecular Weight N/A
Melting Point 192–196 °C
Boiling Point N/A
Density N/A
Product Codes NCZ-267R

Copper BZACAC

Price range: $16.00 through $66.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Copper BZACAC
CAS No. 14128-84-8
Appearance Blue-green solid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient C₂₀H₁₈CuO₄
Molecular Weight 385.9 g/mol
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-245R

Copper DIBZACAC

Price range: $16.00 through $49.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Copper DIBZACAC
CAS No. N/A
Appearance Deep green or bluish solid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient C₂₀H₁₄CuO₄
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-268R
 

Copper doped Ti3AlC2 MAXene powder

Price range: $25.00 through $525.00
Select options This product has multiple variants. The options may be chosen on the product page

Product Name:  Copper Doped Ti3AlC2 MAXene Powder

Product Code: NCZ-MX-105-20A

Product Cu doped Ti3AlC2 MAXene powder
Colour Black Powder
Purity ≥98 wt%
Ingredient Cu@Ti3AlC2
CAS NO 196506-01-1

Copper doped Ti3AlC2 MAXene powder application field:

High-temperature coating, Mxene precursor, conductive self-lubricating ceramic, lithium-ion battery, supercapacitor, electrochemical catalysis. RELATED INFORMATION Storage Conditions: Airtight sealed, avoid light and keep dry at room temperature. Please email us for the customization. Email: contact@nanochemazone.com

Copper Foam for Battery and Supercapacitor Research, Purity: 99.9+%, Size : 100 mm x100 mm x 1mm

Price range: $93.00 through $369.00
Select options This product has multiple variants. The options may be chosen on the product page
1 piece: 93€ 5 pieces: 369€ Product Information Product Name Copper Foam for Battery and Supercapacitor Research Product No NG10BEW0949

Copper FOD

Price range: $16.00 through $64.00
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Product Copper FOD
CAS No. N/A
Appearance Blue to green crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient C₁₆H₁₆CuF₁₄O₄
Molecular Weight 595 g/mol
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-386R
 

Copper HFAC

Price range: $16.00 through $74.00
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Product Copper HFAC
CAS No. 14781-45-4
Appearance Green to dark green
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Cu(C₅HF₆O₂)₂·xH₂O
Molecular Weight 479.66 g/mol
Melting Point 130–135 °C
Boiling Point N/A
Density N/A
Product Codes NCZ-311R

Copper Indium (Cu-In) Alloy Nanopowder/Nanoparticles, Purity: 99.9% , Size: < 500 nm

Price range: $121.00 through $539.00
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1 gram/107 € 
5 grams/475 €                       
Please contact us for quotes on larger quantities !!! 

Copper Indium (Cu-In) Alloy Nanopowder/Nanoparticles

Purity: 99.9% , Size: < 500 nm

Technical Properties:

Alloy Ratio (Cu-In) depends on customer needs
Average Particle Size (nm) <500

Properties, Storage and Cautions:

Cu-In alloy nanoparticles are highly reactive, therefore it should be handled with care and rapid moves, vibrations should be avoided. The powder should be kept away from sunlight, any kind of heating, moisture and impacts. Coagulation of the particles is a serious problem, so, the powder should be sealed under vacuum and should be kept in cool and dry conditions. Air contact should be avoided.

Copper Indium (Cu-In) Alloy Nanopowder/Nanoparticles, Purity: 99.9% , Size: < 500 nm

Price range: $121.00 through $539.00
Select options This product has multiple variants. The options may be chosen on the product page

Copper Indium (Cu-In) Alloy Nanopowder/Nanoparticles

Purity: 99.9% , Size: < 500 nm

Technical Properties:

Alloy Ratio (Cu-In) depends on customer needs
Average Particle Size (nm) <500

Properties, Storage and Cautions:

Cu-In alloy nanoparticles are highly reactive, therefore it should be handled with care and rapid moves, vibrations should be avoided. The powder should be kept away from sunlight, any kind of heating, moisture and impacts. Coagulation of the particles is a serious problem, so, the powder should be sealed under vacuum and should be kept in cool and dry conditions. Air contact should be avoided.

Copper Indium (Cu-In) Alloy Nanopowder/Nanoparticles, Purity: 99.9% , Size: < 500 nm

Price range: $121.00 through $539.00
Select options This product has multiple variants. The options may be chosen on the product page

Copper Indium (Cu-In) Alloy Nanopowder/Nanoparticles

Purity: 99.9% , Size: < 500 nm

Technical Properties:

Alloy Ratio (Cu-In) depends on customer needs
Average Particle Size (nm) <500

Properties, Storage and Cautions:

Cu-In alloy nanoparticles are highly reactive, therefore it should be handled with care and rapid moves, vibrations should be avoided. The powder should be kept away from sunlight, any kind of heating, moisture and impacts. Coagulation of the particles is a serious problem, so, the powder should be sealed under vacuum and should be kept in cool and dry conditions. Air contact should be avoided.

Copper Indium (Cu-In) Alloy Nanopowder/Nanoparticles, Purity: 99.9% , Size: < 500 nm

Price range: $121.00 through $538.00
Select options This product has multiple variants. The options may be chosen on the product page

Copper Indium (Cu-In) Alloy Nanopowder/Nanoparticles

Purity: 99.9% , Size: < 500 nm

Technical Properties:

Alloy Ratio (Cu-In) depends on customer needs
Average Particle Size (nm) <500

Properties, Storage and Cautions:

Cu-In alloy nanoparticles are highly reactive, therefore it should be handled with care and rapid moves, vibrations should be avoided. The powder should be kept away from sunlight, any kind of heating, moisture and impacts. Coagulation of the particles is a serious problem, so, the powder should be sealed under vacuum and should be kept in cool and dry conditions. Air contact should be avoided.

Copper Nanoparticles

$0.00

Copper Nanoparticles Powder

MF: Cu
Chemical Name:

Copper Nanoparticles

Purity: > 99.99%
APS: 25 nm (Size Customization possible)
Form: Nanopowder/Dispersion
Product Number: #NCZ2101
CAS Number 7440-50-8

Application:

The key applications of copper nanoparticles are listed below:

Copper nanoparticles based ink for screen printed circuits and electrode fabrication for electrochemistry. 

Acts as an antibiotic, anti-microbial, and anti-fungal agent when added to plastics, coatings, and textiles. Copper diet supplements with efficient delivery characteristics. High strength metals and alloys.

Copper plays an important role in electronic circuits because of its excellent electrical conductivity and ideal material for Thermal, electronic, and biomedical applications such as antimicrobial, Dental Health care and antiviral mask, and gloves coating. 

Please contact us for customization and price inquiry.

Note: We supply different size products of micro and Nano Size range dispersion according to the client’s requirements.

Copper Nanoparticles/ Nanopowder (Cu, ~1um, 99.8%)

Price range: $45.00 through $433.00
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$45/25g $83/100g
$275/500g
$433/1kg

Product 

Copper Nanoparticles/ Nanopowder (Cu, ~1um, 99.8%)

CAS No.

7440-50-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

~1um (Size Can be customized), Ask for other available size ranges.

Ingredient

AlN

Molecular Weight

63.55 g/mol

Melting Point

1084.62 °C

Boiling Point

2562 °C

Density

8.96 g/cm³

Product Codes

NCZ-1037K

Copper Nanoparticles/ Nanopowder (Cu, 500nm, 99.8%)

Price range: $50.00 through $454.00
Select options This product has multiple variants. The options may be chosen on the product page
$50/25g $87/100g
$286/500g
$454/1kg

Product 

Copper Nanoparticles/ Nanopowder (Cu, 500nm, 99.8%)

CAS No.

7440-50-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

500nm (Size Can be customized), Ask for other available size ranges.

Ingredient

AlN

Molecular Weight

63.55 g/mol

Melting Point

1084.62 °C

Boiling Point

2562 °C

Density

8.96 g/cm³

Product Codes

NCZ-1036K

Copper Nanoparticles/Nanopowder (Cu, 99.5%, 300nm)

Price range: $50.00 through $92.00
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$50/25g $92/100g

Product 

Copper Nanoparticles/Nanopowder (Cu, 99.5%, 300nm)

CAS No.

7440-50-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

300nm (Size Can be customized), Ask for other available size ranges.

Ingredient

AlN

Molecular Weight

63.55 g/mol

Melting Point

1084.62 °C

Boiling Point

2562 °C

Density

8.96 g/cm³

Product Codes

NCZ-1035K

Copper Nanoparticles/Nanopowder (Cu, 99.7% 60-80 nm)

Price range: $82.00 through $240.00
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$82/25g
$240/100g

Product 

Copper Nanoparticles/Nanopowder (Cu, 99.7% 60-80 nm)

CAS No.

7440-50-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

60-80 nm (Size Can be customized), Ask for other available size ranges.

Ingredient

AlN

Molecular Weight

63.55 g/mol

Melting Point

1084.62 °C

Boiling Point

2562 °C

Density

8.96 g/cm³

Product Codes

NCZ-1033K

Copper Nanoparticles/Nanopowder (Cu, 99.9% 100~130nm)

Price range: $65.00 through $183.00
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$65/25g
$183/100g

Product 

Copper Nanoparticles/Nanopowder (Cu, 99.9% 100~130nm)

CAS No.

7440-50-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

100-130 nm (Size Can be customized), Ask for other available size ranges.

Ingredient

AlN

Molecular Weight

63.55 g/mol

Melting Point

1084.62 °C

Boiling Point

2562 °C

Density

8.96 g/cm³

Product Codes

NCZ-1034K

Copper Nanoparticles/Nanopowder (Cu, 99.9% 40-60 nm)

Price range: $82.00 through $240.00
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$82/25g
$240/100g

Product 

Copper Nanoparticles/Nanopowder (Cu, 99.9% 40-60 nm)

CAS No.

7440-50-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

40–60 nm (Size Can be customized), Ask for other available size ranges.

Ingredient

AlN

Molecular Weight

63.55 g/mol

Melting Point

1084.62 °C

Boiling Point

2562 °C

Density

8.96 g/cm³

Product Codes

NCZ-1032K

Copper Nanoparticles/Nanopowder in organic media (Cu, 5-7nm, oil-soluble, dispersible, lubricants additive)

Price range: $123.00 through $433.00
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$123/100g
$315/500g
$433/1000g

Product 

Copper Nanoparticles/Nanopowder in organic media (Cu, 5-7nm, oil-soluble, dispersible, lubricants additive)

CAS No.

7440-50-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

5-7nm (Size Can be customized), Ask for other available size ranges.

Ingredient

AlN

Molecular Weight

63.55 g/mol

Melting Point

1084.62 °C

Boiling Point

2562 °C

Density

8.96 g/cm³

Product Codes

NCZ-1031K

Copper Nanowires immersed in ethanol

$197.00
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$197/5g

Product 

Copper Nanowires immersed in ethanol

CAS No.

7440-50-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

150 nm (Size Can be customized), Ask for other available size ranges.

Ingredient

AlN

Molecular Weight

63.55 g/mol

Melting Point

1084.62 °C

Boiling Point

2562 °C

Density

8.96 g/cm³

Product Codes

NCZ-1038K

Copper Nanowires/ Cu Nanowires

$141.00
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$141/5g

Product 

Copper Nanowires/ Cu Nanowires

CAS No.

7440-50-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

150 nm (Size Can be customized), Ask for other available size ranges.

Ingredient

AlN

Molecular Weight

63.55 g/mol

Melting Point

1084.62 °C

Boiling Point

2562 °C

Density

8.96 g/cm³

Product Codes

NCZ-1039K

Copper Nanowires/ Cu Nanowires Immersed in Ethanol

$155.00
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$155/5g

Product 

Copper Nanowires/ Cu Nanowires Immersed in Ethanol

CAS No.

7440-50-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

300 nm (Size Can be customized), Ask for other available size ranges.

Ingredient

AlN

Molecular Weight

63.55 g/mol

Melting Point

1084.62 °C

Boiling Point

2562 °C

Density

8.96 g/cm³

Product Codes

NCZ-1040K

Copper Nickel (Cu-Ni) Alloy Nanopowder/Nanoparticles, Size: < 80 nm

Price range: $76.00 through $307.00
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Copper Nickel (Cu-Ni) Alloy Nanopowder/Nanoparticles

Size: < 80 nm

Technical Properties:

Alloy Ratio (Cu-Ni) 50-50
Average Particle Size (nm) 80

Properties, Storage and Cautions:

Cu-Ni alloy nanoparticles are highly reactive, therefore it should be handled with care and rapid moves, vibrations should be avoided. The powder should be kept away from sunlight, any kind of heating, moisture and impacts. Coagulation of the particles is a serious problem, so, the powder should be sealed under vacuum and should be kept in cool and dry conditions. Air contact should be avoided.

Applications:

Cu-Ni alloy is known with its good machinability and resistance to corrosion. It is used in heat exchangers, fittings, pumps, cooling systems, power plants, coins, mechanical and electrical equipment, bullet jackets etc.  

Copper Nickel (Cu-Ni) Alloy Nanopowder/Nanoparticles, Size: < 80 nm

Price range: $76.00 through $307.00
Select options This product has multiple variants. The options may be chosen on the product page
1 gram/67 €  
5 grams/271 €                       
Please contact us for quotes on larger quantities !!!

Copper Nickel (Cu-Ni) Alloy Nanopowder/Nanoparticles

Size: < 80 nm

Technical Properties:

Alloy Ratio (Cu-Ni) 50-50
Average Particle Size (nm) 80

Properties, Storage and Cautions:

Cu-Ni alloy nanoparticles are highly reactive, therefore it should be handled with care and rapid moves, vibrations should be avoided. The powder should be kept away from sunlight, any kind of heating, moisture and impacts. Coagulation of the particles is a serious problem, so, the powder should be sealed under vacuum and should be kept in cool and dry conditions. Air contact should be avoided.

Applications:

Cu-Ni alloy is known with its good machinability and resistance to corrosion. It is used in heat exchangers, fittings, pumps, cooling systems, power plants, coins, mechanical and electrical equipment, bullet jackets etc.

Copper Nickel (Cu-Ni) Alloy Nanopowder/Nanoparticles, Size: < 80 nm

Price range: $75.00 through $307.00
Select options This product has multiple variants. The options may be chosen on the product page

Copper Nickel (Cu-Ni) Alloy Nanopowder/Nanoparticles

Size: < 80 nm

Technical Properties:

Alloy Ratio (Cu-Ni) 50-50
Average Particle Size (nm) 80

Properties, Storage and Cautions:

Cu-Ni alloy nanoparticles are highly reactive, therefore it should be handled with care and rapid moves, vibrations should be avoided. The powder should be kept away from sunlight, any kind of heating, moisture and impacts. Coagulation of the particles is a serious problem, so, the powder should be sealed under vacuum and should be kept in cool and dry conditions. Air contact should be avoided.

Copper Nickel (Cu-Ni) Alloy Nanopowder/Nanoparticles, Size: < 80 nm

Price range: $156.00 through $277.00
Select options This product has multiple variants. The options may be chosen on the product page

Copper Nickel (Cu-Ni) Alloy Nanopowder/Nanoparticles

Size: < 80 nm

Technical Properties:

Alloy Ratio (Cu-Ni) 50-50
Average Particle Size (nm) 80

Properties, Storage and Cautions:

Cu-Ni alloy nanoparticles are highly reactive, therefore it should be handled with care and rapid moves, vibrations should be avoided. The powder should be kept away from sunlight, any kind of heating, moisture and impacts. Coagulation of the particles is a serious problem, so, the powder should be sealed under vacuum and should be kept in cool and dry conditions. Air contact should be avoided.

Applications:

Cu-Ni alloy is known with its good machinability and resistance to corrosion. It is used in heat exchangers, fittings, pumps, cooling systems, power plants, coins, mechanical and electrical equipment, bullet jackets etc