Cerium (Ce) Micron Powder, Purity: 99.5 %, Size: 325 mesh

Price range: $1,360.00 through $4,656.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Cerium is the most abundant element of the rare earth elements. It is found in minerals sallanite, rhabdophane, hydroxylbastnasite, bastnasite, monazite, synchysite, and zircon. It is ductile and it oxidizes very quickly at room temperature. Cerium nanoparticles are graded as highly flammable and harmful. Cerium powder is applied as polishing agent in glass polishing. It is very efficient glass polishing agents. It is used for precision optical polishing because of its strong oxidizing properties. It is also used to remove ultrafine diesel particle emissions like carbon. It is used in steel manufacturing to remove unwanted trace elements such as lead and antimony and to remove free oxygen and sulfur. Cerium powder has also applications in fuel cells functions for example it is used in the electrolyte of solid oxide fuel cells. 

Cerium Oxide (CeO2) Micron Powder, Purity: 99.99%, Size: 325 mesh, White

Price range: $36.00 through $305.00
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5 grams/24 € 25 grams/37 € 100 grams/65 € 500 grams/135 € 1000 grams/195 €
Please contact us for quotes on larger quantities !!!

Cerium Oxide (CeO2) Micron Powder

Purity: 99.99%, Size: 325 mesh, White

Technical Properties:

PURITY

Min. 99.99 %

COMPOSITION

Ce- 81.4, O- 18.6

PARTICLE SIZE

325 mesh

CAS

1306-38-3

DENSITY

686 g/cm³

BOILING POINT

3468 °C

MELTING POINT

2600 °C

MOHS HARDNESS @ 20ºC

6

COEFF. OF EXPANSION @ 20ºC

8 x 10 ⁸

ELECTRIC RESISTIVITY

0.218 microhm-1

CRYSTAL STRUCTURE

Cubic, Face Centered

FORM  

Powder

APPLICATIONS

Lapping, Polishing

                                   

Cerium Oxide (CeO2) Nanopowder/Nanoparticles, Purity: 99.975%, Size: 8-28 nm

Price range: $59.00 through $384.00
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Applications:

Cerium Oxide nanoparticles are excellent oxidation resistant materials. It is used in oxidation resistant coatings, oxygen sensors, and oxygen pumps. It is good Infrared absorbent. It is used in heat resistant alloy coatings and coatings for infrared filters. Cerium Oxide nanoparticle is used in electronics as buffer layer for superconductors and polishing media for electronic devices. It is also used as electrolytes and electrode materials for solid oxide fuel cells. Cerium Oxide nanoparticles have also applications in the field of catalysis as a catalyst or catalyst support.

Cerium Oxide doped with Gadolinium Nanoparticles (10mol%Gd2O3+90mol%CeO2, 99.9%, <100 nm)

Price range: $133.00 through $337.00
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$133/25g $337/100g
Product Cerium Oxide doped with Gadolinium Nanoparticles (10mol%Gd2O3+90mol%CeO2, 99.9%, <100 nm)
CAS No. 1306-38-3
Appearance White or pale yellow powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 100 nm (Size Can be customized),  Ask for other available size range.
Ingredient CeO2
Molecular Weight 177.38 g/mol
Melting Point 2400°C
Boiling Point N/A
Density 7.2g/cm³
Product Codes NCZ-105R

Cerium Oxide Nanopowder/ Nanoparticles (CeO2, 100~1000nm, 99.9%)

Price range: $97.00 through $185.00
Select options This product has multiple variants. The options may be chosen on the product page
$97/100g $185/500g $271/kg
Product Cerium Oxide Nanopowder/ Nanoparticles (CeO2, 100~1000nm, 99.9%)
CAS No. 1306-38-3
Appearance Pale yellow to white powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 100 - 1000 nm (Size Can be customized),  Ask for other available size range.
Ingredient CeO2
Molecular Weight 172.11g/mol
Melting Point 2400°C
Boiling Point 3500°C
Density N/A
Product Codes NCZ-101R
 

Cerium Oxide Nanopowder/ Nanoparticles (Nanoceria or CeO2, 10~30nm, 99.9%)

Price range: $55.00 through $205.00
Select options This product has multiple variants. The options may be chosen on the product page
$55/25g $115/100g $205/500g $315/kg
Product Cerium Oxide Nanopowder/ Nanoparticles (Nanoceria or CeO2, 10~30nm, 99.9%)
CAS No. 1306-38-3
Appearance White Powder
Purity ≥99%,  ≥99.9%,  ≥95% (Other purities are also available)
APS 15-30 nm  (Size Can be customized),  Ask for other available size range.
Ingredient CeO2
Molecular Weight 172.115g/mol
Melting Point 2400°C
Boiling Point 3,500°C
Density 7.2 g/cm³
Product Code NCZ-100R
 

Cerium Oxide Nanopowder/ Nanoparticles (Nanoceria or CeO2, 10~30nm, 99.9%) (Copy)

Price range: $55.00 through $315.00
Select options This product has multiple variants. The options may be chosen on the product page
$55/25g
$115/100g
$205/500g
$315/kg

Product 

Cerium Oxide Nanopowder/ Nanoparticles (Nanoceria or CeO2, 10~30nm, 99.9%)

CAS No.

1306-38-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

10~30nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

172.11 g/mol

Melting Point

~1,590 °C

Boiling Point

3,500°C

Density

~5.17 g/cm³

Product Codes

NCZ-1138K

Cerium Oxide Powder(CeO2, 1~3um, 99.9%)

Price range: $93.00 through $175.00
Select options This product has multiple variants. The options may be chosen on the product page
$93/100g $175/500g
Product Cerium Oxide Powder(CeO2, 1~3um, 99.9%)
CAS No. 1306-38-3
Appearance Pale yellow or white powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1 to 3um (Size Can be customized),  Ask for other available size range.
Ingredient CeO2
Molecular Weight 172.11g/mol
Melting Point 2600°C
Boiling Point 3468°C
Density 7.13 g/cm³
Product Codes NCZ-103R
 

Cerium Oxide Powder(CeO2, 5um, 99.9%)

$110.00
Select options This product has multiple variants. The options may be chosen on the product page
$110/500g $175/kg
Product Cerium Oxide Powder(CeO2, 5um, 99.9%)
CAS No. 1306-38-3
Appearance White or light yellow powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS  5um (Size Can be customized),  Ask for other available size range.
Ingredient CeO2
Molecular Weight 172.115g/mol
Melting Point 2600°C
Boiling Point 3,500°C
Density 7.2g/cm³
Product Codes NCZ-104R
 

CHOOSE OPTIONS COMPARE QUICK VIEW Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”

$1,006.00

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs  in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

CHOOSE OPTIONS COMPARE QUICK VIEW Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”

$303.00
but allow experts a large degree of control over the growth and microstructure of the area.

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Dysprosium (Dy) Micron Powder, Purity: 99.5 %, Size: 325 mesh

Price range: $109.00 through $4,975.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Dysprosium is named from the Greek word dysprositos meaning ‘hard to get’. It is black brown metal powder. It is found in minerals such as fergusonite, monazite, bastnäsite, blomstrandine, euxenite, gadolinite, polycrase and xenotime. It is relatively stable in air at room temperature. It dissolves quickly with the evolution of hydrogen in mineral acids. Dysprosium has one of the highest magnetic strengths of the elements. Dysprosium powder has applications in electronics for data storage because of its magnetic properties. It is used in various data storage applications such as in compact discs. Dysprosium is substituted in many magnets to improve the corrosion resistance of the magnets. It has also applications in optics as a dopant in glass and optical fibers. It is also added to advance optical applications as it emits 470-500 nm and 570-600 nm wavelengths. 

Dysprosium Oxide (Dy2O3) Micron Powder, Purity: 99.99%, Size: 325 mesh

Price range: $71.00 through $579.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Dysprosium oxide shows good magnetic and optical properties. these properties are applied in magneto-optical recording materials and in luminescence. It is a neutron absorbent and used in the measurement of neutron energy-spectrum and in nuclear reaction control rods. It is used as glass material in laser-based and optical devices with a Faraday Rotation affect.

Dysprosium Oxide (Dy2O3) Nanopowder/Nanoparticles, High Purity: 99.95+%, Size: 28 nm

Price range: $41.00 through $204.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Dysprosium oxide nanoparticles show good magnetic and optical properties. these properties are applied in magneto-optical recording materials and in luminescence. It is a neutron absorbent and used in the measurement of neutron energy-spectrum and in nuclear reaction control rods. It is used as glass material in laser-based and optical devices with a Faraday Rotation affect.

Erbium (Er) Micron Powder, Purity: 99.5 %, Size: 325 mesh

Price range: $59.00 through $1,782.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Erbium is named after the Swedish town Ytterby where it was first discovered. It is fairly stable in air and does not oxidize as rapidly as some of the other rare earth metals. Erbium when it is ionized fluoresces in a bright pink color. This property makes it highly useful for imaging and optical applications. Erbium is used in optics as doping agent in optical fibers. It enables the fiber to be optically pumped which acts as an amplifier for signals passing through it. It is used in sunglasses and jewelry due to their sharp absorption spectra bands in visible, ultraviolet and near infrared light. It is also used as a colorant for glass and porcelain. It provides the pink color in cubic zirconia.

Erbium Oxide (Er2O3) Micron Powder, Purity: 99.99%, Size: 325 mesh

Price range: $71.00 through $415.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Erbium oxide is used in electronic devices. It is used in capacitors, metal-oxide semiconductor transistors, and as adopants for optical fiber and laser materials. It is also used as tunned insulator for josephson junctions.

Erbium Oxide (Er2O3) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 8-90 nm, Cubic

Price range: $38.00 through $281.00
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Applications:

Erbium oxide nanoparticles are used in electronic devices. It is used in capacitors, metal-oxide semiconductor transistors, and as a dopants for optical fiber and laser materials. It is also used as tunned insulator for Josephson junctions.

Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”

$150.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Erbium oxide with a chemical formula of Er2Ois an oxide of erbium metal. The applications of erbium oxide are varied due to their electrical, optical and photoluminescence properties. Nanoscale materials doped with Er+3 are of much interest because they have special particle-size-dependent optical and electrical properties. Erbium oxide doped nanoparticle materials can be dispersed in glass or plastic for display purposes, such as display monitors. The spectroscopy of Er+3 electronic transitions in host crystals lattices of nanoparticles combined with ultrasonically formed geometries in aqueous solution of carbon nanotubes is of great interest for synthesis of photoluminescence nanoparticles in ‘green’ chemistry. Erbium oxide is among the most important rare earth metals used in biomedicine. Erbium oxides are also used as gate dielectrics in semiconductor devices since it has a high dielectric constant (10-14) and a large band gap. Erbium is sometimes used as a coloring for glasses and erbium oxide can also be used as a burnable neutron poison for nuclear fuel. Erbium oxide films obtained by sputtering can be used for their photoluminescence effect.

Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”

$214.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Erbium oxide with a chemical formula of Er2Ois an oxide of erbium metal. The applications of erbium oxide are varied due to their electrical, optical and photoluminescence properties. Nanoscale materials doped with Er+3 are of much interest because they have special particle-size-dependent optical and electrical properties. Erbium oxide doped nanoparticle materials can be dispersed in glass or plastic for display purposes, such as display monitors. The spectroscopy of Er+3 electronic transitions in host crystals lattices of nanoparticles combined with ultrasonically formed geometries in aqueous solution of carbon nanotubes is of great interest for synthesis of photoluminescence nanoparticles in ‘green’ chemistry. Erbium oxide is among the most important rare earth metals used in biomedicine. Erbium oxides are also used as gate dielectrics in semiconductor devices since it has a high dielectric constant (10-14) and a large band gap. Erbium is sometimes used as a coloring for glasses and erbium oxide can also be used as a burnable neutron poison for nuclear fuel. Erbium oxide films obtained by sputtering can be used for their photoluminescence effect.

Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.250” €220.00

$220.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Erbium oxide with a chemical formula of Er2Ois an oxide of erbium metal. The applications of erbium oxide are varied due to their electrical, optical and photoluminescence properties. Nanoscale materials doped with Er+3 are of much interest because they have special particle-size-dependent optical and electrical properties. Erbium oxide doped nanoparticle materials can be dispersed in glass or plastic for display purposes, such as display monitors. The spectroscopy of Er+3 electronic transitions in host crystals lattices of nanoparticles combined with ultrasonically formed geometries in aqueous solution of carbon nanotubes is of great interest for synthesis of photoluminescence nanoparticles in ‘green’ chemistry. Erbium oxide is among the most important rare earth metals used in biomedicine. Erbium oxides are also used as gate dielectrics in semiconductor devices since it has a high dielectric constant (10-14) and a large band gap. Erbium is sometimes used as a coloring for glasses and erbium oxide can also be used as a burnable neutron poison for nuclear fuel. Erbium oxide films obtained by sputtering can be used for their photoluminescence effect.

Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness:0.125”

$138.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Erbium oxide with a chemical formula of Er2Ois an oxide of erbium metal. The applications of erbium oxide are varied due to their electrical, optical and photoluminescence properties. Nanoscale materials doped with Er+3 are of much interest because they have special particle-size-dependent optical and electrical properties. Erbium oxide doped nanoparticle materials can be dispersed in glass or plastic for display purposes, such as display monitors. The spectroscopy of Er+3 electronic transitions in host crystals lattices of nanoparticles combined with ultrasonically formed geometries in aqueous solution of carbon nanotubes is of great interest for synthesis of photoluminescence nanoparticles in ‘green’ chemistry. Erbium oxide is among the most important rare earth metals used in biomedicine. Erbium oxides are also used as gate dielectrics in semiconductor devices since it has a high dielectric constant (10-14) and a large band gap. Erbium is sometimes used as a coloring for glasses and erbium oxide can also be used as a burnable neutron poison for nuclear fuel. Erbium oxide films obtained by sputtering can be used for their photoluminescence effect.

Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”

$156.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Erbium oxide with a chemical formula of Er2Ois an oxide of erbium metal. The applications of erbium oxide are varied due to their electrical, optical and photoluminescence properties. Nanoscale materials doped with Er+3 are of much interest because they have special particle-size-dependent optical and electrical properties. Erbium oxide doped nanoparticle materials can be dispersed in glass or plastic for display purposes, such as display monitors. The spectroscopy of Er+3 electronic transitions in host crystals lattices of nanoparticles combined with ultrasonically formed geometries in aqueous solution of carbon nanotubes is of great interest for synthesis of photoluminescence nanoparticles in ‘green’ chemistry. Erbium oxide is among the most important rare earth metals used in biomedicine. Erbium oxides are also used as gate dielectrics in semiconductor devices since it has a high dielectric constant (10-14) and a large band gap. Erbium is sometimes used as a coloring for glasses and erbium oxide can also be used as a burnable neutron poison for nuclear fuel. Erbium oxide films obtained by sputtering can be used for their photoluminescence effect.

Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.250”

$186.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Erbium oxide with a chemical formula of Er2Ois an oxide of erbium metal. The applications of erbium oxide are varied due to their electrical, optical and photoluminescence properties. Nanoscale materials doped with Er+3 are of much interest because they have special particle-size-dependent optical and electrical properties. Erbium oxide doped nanoparticle materials can be dispersed in glass or plastic for display purposes, such as display monitors. The spectroscopy of Er+3 electronic transitions in host crystals lattices of nanoparticles combined with ultrasonically formed geometries in aqueous solution of carbon nanotubes is of great interest for synthesis of photoluminescence nanoparticles in ‘green’ chemistry. Erbium oxide is among the most important rare earth metals used in biomedicine. Erbium oxides are also used as gate dielectrics in semiconductor devices since it has a high dielectric constant (10-14) and a large band gap. Erbium is sometimes used as a coloring for glasses and erbium oxide can also be used as a burnable neutron poison for nuclear fuel. Erbium oxide films obtained by sputtering can be used for their photoluminescence effect.

Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.125”

$210.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Erbium oxide with a chemical formula of Er2Ois an oxide of erbium metal. The applications of erbium oxide are varied due to their electrical, optical and photoluminescence properties. Nanoscale materials doped with Er+3 are of much interest because they have special particle-size-dependent optical and electrical properties. Erbium oxide doped nanoparticle materials can be dispersed in glass or plastic for display purposes, such as display monitors. The spectroscopy of Er+3 electronic transitions in host crystals lattices of nanoparticles combined with ultrasonically formed geometries in aqueous solution of carbon nanotubes is of great interest for synthesis of photoluminescence nanoparticles in ‘green’ chemistry. Erbium oxide is among the most important rare earth metals used in biomedicine. Erbium oxides are also used as gate dielectrics in semiconductor devices since it has a high dielectric constant (10-14) and a large band gap. Erbium is sometimes used as a coloring for glasses and erbium oxide can also be used as a burnable neutron poison for nuclear fuel. Erbium oxide films obtained by sputtering can be used for their photoluminescence effect.

Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.250”

$189.00
Select options This product has multiple variants. The options may be chosen on the product page
 

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Erbium oxide with a chemical formula of Er2Ois an oxide of erbium metal. The applications of erbium oxide are varied due to their electrical, optical and photoluminescence properties. Nanoscale materials doped with Er+3 are of much interest because they have special particle-size-dependent optical and electrical properties. Erbium oxide doped nanoparticle materials can be dispersed in glass or plastic for display purposes, such as display monitors. The spectroscopy of Er+3 electronic transitions in host crystals lattices of nanoparticles combined with ultrasonically formed geometries in aqueous solution of carbon nanotubes is of great interest for synthesis of photoluminescence nanoparticles in ‘green’ chemistry. Erbium oxide is among the most important rare earth metals used in biomedicine. Erbium oxides are also used as gate dielectrics in semiconductor devices since it has a high dielectric constant (10-14) and a large band gap. Erbium is sometimes used as a coloring for glasses and erbium oxide can also be used as a burnable neutron poison for nuclear fuel. Erbium oxide films obtained by sputtering can be used for their photoluminescence effect.

Erbium Oxide Micron powder ( Er2O3 Micron powder, 99.9%, 1um)

Price range: $40.00 through $210.00
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$40/25g $90/100g $210/500g
Product Erbium Oxide Micron powder ( Er2O3 Micron powder, 99.9%, 1um)
CAS No. 12061-16-4
Appearance Pink powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1um (Size Can be customized),  Ask for other available size range.
Ingredient Er2O3
Molecular Weight 382.56g/mol
Melting Point 2344°C
Boiling Point 3290°C
Density 8.64g/cm³
Product Codes NCZ-107R
 

Erbium Oxide Nanopowder / Nanoparticles (Er2O3, 99.9%, 40-50 nm)

Price range: $55.00 through $345.00
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$55/25g $120/100g $345/500g
Product Erbium Oxide Nanopowder / Nanoparticles (Er2O3, 99.9%, 40-50 nm)
CAS No. 12061-16-4
Appearance Pink powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 40-50nm (Size Can be customized),  Ask for other available size range.
Ingredient Er2O3
Molecular Weight 382.52g/mol
Melting Point 2344°C
Boiling Point N/A
Density 8.64g/cm³
Product Codes NCZ-106R
 

Europium (Eu) Micron Powder, Purity: 99.5 %, Size: 325 mesh

Price range: $34.00 through $217.00
Select options This product has multiple variants. The options may be chosen on the product page
1 gram/32 € 5 grams/53 € 25 grams/109 € 100 grams/200 €  Please contact us for quotes on larger quantities !!

Europium (Eu) Micron Powder

Purity: 99.5 %, Size: 325 mesh

Technical Properties:

PURITY

 99.5 %

PARTICLE SIZE

325 mesh

MELTING POINT 

822 °C

BOILING POINT 

1597 °C

DENSITY

5.243 gm/cc

FORM  

Powder

ELECTRIC RESISTIVITY

90.0 microhm-cm @ 25 °C

   

Applications:

Europium is the least abundant of the rare earth elements. It is also the most reactive one. Europium is found in many minerals such as xenotime, monazite, bastnasite, and loparite. It is not found in nature as a free element. Europium is used in fluorescent glass manufacturing as a doping agent, and in glasses used in lasers. It is also used in phosphors and doped phosphorous in television sets. 

Europium Oxide (Eu2O3) Micron Powder, Purity: 99.99%, Size: 325 mesh

Price range: $94.00 through $405.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Europium oxide shows high efficiency as a luminescent material. It is used in flat-panal displays, fluorescent lamps, red powder activation of color TV, and high pressure mercury lump. It is also used as an agent for manufacturing fluorescence glass.

Europium Oxide (Eu2O3) Nanopowder/Nanoparticles, Purity: 99.995%, Size: 8-90 nm, Cubic (No reviews yet)Write

Price range: $44.00 through $300.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Europium oxide nanoparticles show high efficiency as a luminescent material. It is used in flat-panel displays, fluorescent lamps, red powder activation of color TV, and high pressure mercury lump. It is also used as an agent for manufacturing fluorescence glass

Europium Oxide Nanopowder / Nanoparticles (Eu2O3, 99.9%, 50 nm)

Price range: $128.00 through $360.00
Select options This product has multiple variants. The options may be chosen on the product page
$128/5g $360/25g
Product Europium Oxide Nanopowder / Nanoparticles (Eu2O3, 99.9%, 50 nm)
CAS No. 1308-96-9
Appearance Fine white powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 50nm (Size Can be customized),  Ask for other available size range.
Ingredient Eu2O3
Molecular Weight 351.93g/mol
Melting Point 2400°C
Boiling Point N/A
Density 7.42g/cm³
Product Codes NCZ-109R
 

Gadolinium (Gd) Micron Powder, Purity: 99.5 %, Size: 325 mesh

Price range: $288.00 through $1,538.00
Select options This product has multiple variants. The options may be chosen on the product page
25 grams/288 € 100 grams/893 € 500 grams/ 1538 €   Please contact us for quotes on larger quantities !!! Gadolinium (Gd) Micron Powder

Gadolinium Oxide (Gd2O3) Micron Powder, Purity: 99.99%, Size: 325 mesh

Price range: $23.00 through $149.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Gadolinium oxide is used in different fluorescent, luminescence and electric devices. It is used in lectroluminescent devices, cathode-ray tube, field emission displays, ferroelectric memory, plasma display panals, ultraviolet detectors, and high resolution x-ray medical imaging.

Gadolinium Oxide (Gd2O3) Nanopowder/Nanoparticles, Purity: 99.99%, Size: 13-95 nm

Price range: $38.00 through $316.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Gadolinium oxide nanoparticles are used in different fluorescent, luminescence and electric devices. It is used in electroluminescent devices, cathode-ray tube, field emission displays, ferroelectric memory, plasma display panels, ultraviolet detectors, and high resolution x-ray medical imaging.

Gadolinium Oxide Nanoparticles/Nanopowder (Gd2O3, 99.9%, <100nm)

Price range: $93.00 through $215.00
Select options This product has multiple variants. The options may be chosen on the product page
$93/25g $215/100g
Product Gadolinium Oxide Nanoparticles/Nanopowder (Gd2O3, 99.9%, <100nm)
CAS No. 1314-35-8
Appearance White powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 100nm (Size Can be customized),  Ask for other available size range.
Ingredient Gd₂O₃
Molecular Weight 362.50 g/mol
Melting Point 2420°C
Boiling Point N/A
Density 7.07 g/cm³
Product Codes NCZ-110R
 

Holmium (Ho) Micron Powder, Purity: 99.5 %, Size: 325 mesh

Price range: $24.00 through $1,531.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Holmium has the highest magnetic moment of any naturally occurring element. It can be found in minerals such as gadolinite and monazite. It is stable in dry air at room temperature, but it oxidises rapidly in moist air and at elevated temperatures. Holmium has application in glass and ceramic manufacturing. It is used as a yellow and red glass colouriser. It is also used in cubic zirconia to give dichroic colour in yellow. Because of its high magnetic moment Holmium is used to create strong artificial magnetic fields. It is also used in microwave equipments that are used for eye-safe medical and dental technologies.

Holmium Oxide (Ho2O3) Micron Powder, Purity: 99.99%, Size: 325 mesh

Price range: $36.00 through $175.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications: 

Holmium oxide is used in glass manufacturing. It is used as a colorant in glass and cubic zirconia. It gives sharp optical absorption peaks in the spectral range of 200-900 nm when added to glass. It is used as a calibration standard for optical spectrophotometers. It is also used as a catalyst and as a laser material.

Lanthanum (La) Micron Powder, Purity: 99.5 %, Size: 325 mesh

Price range: $37.00 through $2,225.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Lanthanum is the first element in the rare earth or lanthanide series. It is the second most abundant element of the rare earths after cerium. Lanthanum can be found in minerals such as monazite and bastnasite. It is one of the most reactive elements in the rare earth metals. It reacts directly with elemental carbon, nitrogen, boron, selenium, silicon, phosphorus, sulfur and with halogens. It oxidizes rapidly when exposed to air. Lanthanum has application in glass and ceramic manufacturing. It is used in making special optical glasses, such as infrared absorbing glass. Because of its high refractive index and low dispersion indices Lanthanum is used as doping agents in camera and telescope lenses. It is also used in alloys such as high strength alloy steels. In catalysis Lanthanum is used in petroleum cracking and has also catalytic applications in chemical industry.

Lanthanum Aluminate (LaAlO3) Sputtering Targets, indium, Purity: 99.9%, Size: 1”, Thickness: 0.125”

$688.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Lanthanum Aluminate (LaAlO3) Sputtering Targets, indium, Purity: 99.9%, Size: 2”, Thickness: 0.125”

$833.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”

$475.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”

$499.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”

$534.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”

$560.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”

$363.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”

$431.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”

$455.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”

$468.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 5”, Thickness: 0.125”

$589.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 5”, Thickness: 0.250”

$593.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 6”, Thickness: 0.125”

$660.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 6”, Thickness: 0.250”

$672.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 7”, Thickness: 0.125”

$710.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 7”, Thickness: 0.250”

$768.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 8”, Thickness: 0.125”

$650.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 8”, Thickness: 0.250”

$776.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Lanthanum Hexaboride (LaB6) Micron Powder, High Purity: 99.5+%, Size: 1.5-18 µm

Price range: $119.00 through $1,725.00
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Applications:

Lanthanum hexaboride powder main application is in hot cathodes. It is used as a single crystal ar as a coating in hot cathodes. It is also used in electronics, radar aerospace, and infrared application. It has application in X-ray powder diffraction instrument as size/strain standard for the calibration of the instrument.

Lanthanum Hexaboride (LaB6) Micron Powder, High Purity: 99.95+%, Size: 200 mesh (No reviews yet)

Price range: $105.00 through $1,350.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Lanthanum hexaboride powder main application is in hot cathodes. It is used as a single crystal ar as a coating in hot cathods. It is also used in electronics, radar aerospace, and infrared application. It has application in X-ray powder diffraction instrument as size/strain standard for the calibration of the instrument.

Lanthanum Hexaboride Nanoparticles/ Nanopowder (LaB6, 99+%, 50-80 nm)

Price range: $233.00 through $681.00
Select options This product has multiple variants. The options may be chosen on the product page
$233/25g $394/50g $681/100g
Product Lanthanum Hexaboride Nanoparticles/ Nanopowder (LaB6, 99+%, 50-80 nm)
CAS No. 12008-21-8
Appearance Black powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 50-80nm (Size Can be customized),  Ask for other available size range.
Ingredient LaB6
Molecular Weight 203.78g/mol
Melting Point 2210°C
Boiling Point N/A
Density 4.72 g/cm³
Product Codes NCZ-115R
 

Lanthanum Manganate (LaMnO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”

$620.00

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.