Zinc Oxide Nanoparticle/ Nanopowder (ZnO) 99.8% ,10~30nm

Price range: $25.00 through $167.00
Select options This product has multiple variants. The options may be chosen on the product page
$25/25g
$59/100g
$130/500g
$167/1kg

Product 

Zinc Oxide Nanoparticle/ Nanopowder (ZnO) 99.8% ,10~30nm

CAS No.

1314-13-2

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

10~30nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

81.38 g/mol

Melting Point

~1,975 °C

Boiling Point

~2,360 °C

Density

~5.61 g/cm³

Product Codes

NCZ-1215K

Zinc Oxide Nanoparticles

$0.00

Zinc Oxide Nanoparticles

Zinc Oxide Nanopowder

MF: ZnO
Chemical Name: Zinc oxide
Purity: > 99.99%
APS: 20 nm (Size Customization possible)
Form: Nano powder
Product Number: #NCZ4701
CAS Number 1314-13-2
Note: We supply different products of microparticles and Nanoparticles powder in all size range according to client’s requirements.

Zinc Oxide Nanoparticles/ Nanopowder(ZnO, 99.8%, 200 nm)

Price range: $45.00 through $125.00
Select options This product has multiple variants. The options may be chosen on the product page
$45/100g
$87/500g
$125/1kg

Product 

Zinc Oxide Nanoparticles/ Nanopowder(ZnO, 99.8%, 200 nm)

CAS No.

1314-13-2

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

200 nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

81.38 g/mol

Melting Point

~1,975 °C

Boiling Point

~2,360 °C

Density

~5.61 g/cm³

Product Codes

NCZ-1216K

Zinc Oxide Nanopowder/ Nanoparticles ( Alumina Doped), 40nm

Price range: $70.00 through $115.00
Select options This product has multiple variants. The options may be chosen on the product page
$70/100g
$115/500g

Product 

Zinc Oxide Nanopowder/ Nanoparticles ( Alumina Doped), 40nm

CAS No.

1314-13-2

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

40nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

81.38 g/mol

Melting Point

~1,975 °C

Boiling Point

~2,360 °C

Density

~5.4–5.6 g/cm³

Product Codes

NCZ-1218K

Zinc Oxide with Alumina (ZnO/Al2O3) Sputtering Target

Price range: $217.00 through $727.00
Select options This product has multiple variants. The options may be chosen on the product page

Product 

Zinc Oxide with Alumina (ZnO/Al2O3) Sputtering Target

CAS No.

1314-13-2 (ZnO) / 1344-28-1 (Al₂O₃)

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

81–90 g/mol

Melting Point

~1,975 °C (ZnO), ~2,050 °C (Al₂O₃)

Boiling Point

N/A

Density

~5.6 g/cm³

Product Codes

NCZ-1332K

Zinc phytate (343604)

$342.00
Select options This product has multiple variants. The options may be chosen on the product page
Zinc phytate (343604)
product name Zinc phytate
Chemical name Inositol hexaphosphoric Zinc salt
Molecular formula C6H6024P6Zn6
Application White powder.
Specification Specification
Index name Index
Content 98%min
Alkalinity acidity(l% aqueous solution) 6.0-7.0
Phosphorus 17.4%min
Zinc 36.9%min
Calcium salt 0.02%max
Sulphate 0.01%max
Chloride 0.01%max
Iron salt O.002%max
Arsenic O.0003%max
Heavy metal O.001%max
Loss on drying 2%max
Residue on ignition 0.1%max
Storage Kept away from light or heat.
Product Codes- NCZ-2628K

Zinc Powder ( Zn, 99.9%, -325 mesh)

Price range: $75.00 through $290.00
Select options This product has multiple variants. The options may be chosen on the product page
$75/100g
$175/500g
$290/kg

Product 

Zinc Powder ( Zn, 99.9%, -325 mesh)

CAS No.

7440-66-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

-325 mesh (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

65.38 g/mol

Melting Point

419.5 °C

Boiling Point

907 °C

Density

7.14 g/cm³

Product Codes

NCZ-1085K

Zinc Selenide Quantum Dots (ZnSe/ZnS QD) 420 nm

Price range: $540.00 through $1,275.00
Select options This product has multiple variants. The options may be chosen on the product page
APPLICATIONS Due to their distinct qualities, ZnSe QDs are utilized in:
  • Light emmiting diodes (LEDs),
  • Photocatalysts,
  • Solar cells,
  • Biological markers,
  • Scintillators,
  • Sensors.

Zinc Selenide Quantum Dots (ZnSe/ZnS QD) 450 nm

Price range: $530.00 through $1,255.00
Select options This product has multiple variants. The options may be chosen on the product page
APPLICATIONS Due to their distinct qualities, ZnSe QDs are utilized in:
  • Light emmiting diodes (LEDs),
  • Photocatalysts,
  • Solar cells,
  • Biological markers,
  • Scintillators,
  • Sensors.

Zinc Sputtering Target Zn

Price range: $130.00 through $321.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Zinc Sputtering Target Zn
CAS No. 7440-66-6
Appearance Shiny silvery-grey metal
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Zn
Molecular Weight 65.38 g/mol.
Melting Point N/A
Boiling Point N/A
Density 7.14 g/cm³
Product Codes NCZ-149H
 

Zinc Sulfide (ZnS) Sputtering Target

Price range: $232.00 through $919.00
Select options This product has multiple variants. The options may be chosen on the product page

Product 

Zinc Sulfide (ZnS) Sputtering Target

CAS No.

 1314-98-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

97.45 g/mol

Melting Point

~1,850 °C

Boiling Point

(~1,180–1,200 °C)

Density

~4.09 g/cm³

Product Codes

NCZ-1343K

Zinc Sulfide (ZnS) Sputtering Targets, indium, Purity: 99.99%, Size: 2”, Thickness: 0.125”

$613.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Zinc Sulfide (ZnS) Sputtering Targets, indium, Purity: 99.99%, Size: 2”, Thickness: 0.125”

$710.00

Product 

Zinc Sulfide (ZnS) Sputtering Targets, indium, Purity: 99.99%, Size: 2'', Thickness: 0.125''

CAS No.

1314-98-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 (ZnS) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

97.45 g/mol

Melting Point

~1700 °C

Boiling Point

N/A

Density

 4.09 g/cm³

Product Codes

NCZ-1501K

Zinc Sulfide (ZnS) Sputtering Targets, indium, Purity: 99.99%, Size: 3”, Thickness: 0.125”

$1,078.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Zinc Sulfide (ZnS) Sputtering Targets, indium, Purity: 99.99%, Size: 3”, Thickness: 0.125”

$1,252.00

Product 

Zinc Sulfide (ZnS) Sputtering Targets, indium, Purity: 99.99%, Size: 3'', Thickness: 0.125''

CAS No.

1314-98-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 (ZnS) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

97.45 g/mol

Melting Point

~1700 °C

Boiling Point

N/A

Density

 4.09 g/cm³

Product Codes

NCZ-1500K

Zinc Sulfide (ZnS) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”

$225.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Zinc Sulfide (ZnS) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”

$256.00

Product 

Zinc Sulfide (ZnS) Sputtering Targets, Purity: 99.99%, Size: 1'', Thickness: 0.125''

CAS No.

1314-98-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 (ZnS) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

97.45 g/mol

Melting Point

~1700 °C

Boiling Point

N/A

Density

 4.09 g/cm³

Product Codes

NCZ-1509K

Zinc Sulfide (ZnS) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”

$296.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Zinc Sulfide (ZnS) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”

$338.00

Product 

Zinc Sulfide (ZnS) Sputtering Targets, Purity: 99.99%, Size: 1'', Thickness: 0.250''

CAS No.

1314-98-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 (ZnS) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

97.45 g/mol

Melting Point

~1700 °C

Boiling Point

N/A

Density

 4.09 g/cm³

Product Codes

NCZ-1508K

Zinc Sulfide (ZnS) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.125”

$338.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Zinc Sulfide (ZnS) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.125”

$389.00

Product 

Zinc Sulfide (ZnS) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness: 0.125''

CAS No.

1314-98-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 (ZnS) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

97.45 g/mol

Melting Point

~1700 °C

Boiling Point

N/A

Density

 4.09 g/cm³

Product Codes

NCZ-1507K

Zinc Sulfide (ZnS) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.250”

$490.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Zinc Sulfide (ZnS) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.250”

$566.00

Product 

Zinc Sulfide (ZnS) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness: 0.250''

CAS No.

1314-98-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 (ZnS) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

97.45 g/mol

Melting Point

~1700 °C

Boiling Point

N/A

Density

 4.09 g/cm³

Product Codes

NCZ-1506K

Zinc Sulfide (ZnS) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”

$628.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Zinc Sulfide (ZnS) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”

$727.00

Product 

Zinc Sulfide (ZnS) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.125''

CAS No.

1314-98-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 (ZnS) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

97.45 g/mol

Melting Point

~1700 °C

Boiling Point

N/A

Density

 4.09 g/cm³

Product Codes

NCZ-1505K

Zinc Sulfide (ZnS) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.250”

$664.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Zinc Sulfide (ZnS) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.250”

$769.00

Product 

Zinc Sulfide (ZnS) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.250''

CAS No.

1314-98-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 (ZnS) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

97.45 g/mol

Melting Point

~1700 °C

Boiling Point

N/A

Density

 4.09 g/cm³

Product Codes

NCZ-1504K

Zinc Sulfide (ZnS) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.125”

$849.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Zinc Sulfide (ZnS) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.125”

$985.00

Product 

Zinc Sulfide (ZnS) Sputtering Targets, Purity: 99.99%, Size: 4'', Thickness: 0.125''

CAS No.

1314-98-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 (ZnS) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

97.45 g/mol

Melting Point

~1700 °C

Boiling Point

N/A

Density

 4.09 g/cm³

Product Codes

NCZ-1503K

Zinc Sulfide (ZnS) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.250”

$873.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Zinc Sulfide (ZnS) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.250”

$1,013.00

Product 

Zinc Sulfide (ZnS) Sputtering Targets, Purity: 99.99%, Size: 4'', Thickness: 0.250''

CAS No.

1314-98-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 (ZnS) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

97.45 g/mol

Melting Point

~1700 °C

Boiling Point

N/A

Density

 4.09 g/cm³

Product Codes

NCZ-1502K

Zinc TMHD

Price range: $39.00 through $222.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Zinc TMHD
CAS No. 5488-64-0
Appearance White to off-white crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient C₂₂H₃₈O₄Zn
Molecular Weight 423.92 g/mol
Melting Point N/A
Boiling Point N/A
Density 1.3 g/cm³
Product Codes NCZ-370R

Zirconium (IV) isopropoxide

Price range: $26.00 through $160.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Zirconium (IV) isopropoxide
CAS No. 14717-56-7
Appearance White to off-white
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient C₁₅H₄₀O₅Zr
Molecular Weight 387.7 g/mol
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-188R

Zirconium (Zr) Micron Powder Purity: 99.5%, Size : 80 µm, Metal Basis

Price range: $23.00 through $284.00
Select options This product has multiple variants. The options may be chosen on the product page
1 gram/21 € 5 grams/76 € 25 grams/143 € 100 grams/252 €  

Zirconium (Zr) Micron Powder Purity: 99.9 %, Size: 325 mesh

Price range: $107.00 through $1,125.00
Select options This product has multiple variants. The options may be chosen on the product page
25 grams/95 € 100 grams/235 € 500 grams/756 € 1000 grams/998 €

Zirconium (Zr) Sputtering Target

Price range: $75.00 through $455.00
Select options This product has multiple variants. The options may be chosen on the product page

Product 

Zirconium (Zr) Sputtering Target

CAS No.

7440-67-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

91.224 g/mol

Melting Point

1,855 °C

Boiling Point

4,409 °C

Density

6.52 g/cm³

Product Codes

NCZ-1311K

Zirconium ACAC

Price range: $16.00 through $92.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Zirconium ACAC
CAS No. 17501-44-9
Appearance White/off-white
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Zr(C₅H₇O₂)₄
Molecular Weight 487.66 g/mol
Melting Point N/A
Boiling Point N/A
Density 1.419 g/cm³
Product Codes NCZ-306R
 

Zirconium Carbide (ZrC) Nanopowder/Nanoparticles, Purity: 99.5+%, Thickness: 18 nm, Cubic

Price range: $49.00 through $222.00
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5 grams/44 € 25 grams/87 € 100 grams/196 €                   
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Zirconium Carbide (ZrC) Nanopowder/Nanoparticles

Purity: 99.5+%, Thickness: 18 nm, Cubic

Storage Condition:

Zirconium carbide nanoparticles should be sealed in vacuum and stored in cool and dry room. It should not be exposure to air and avoid stress.

Applications:

Zirconium carbide nanoparticles has high hardness, high thermal conductivity, good oxidation resistance, and toughness. It is used in textile industry in making thermostat textiles in nylon, fiber and hard alloy. It is also used in composite materials such as polymer nanocomposites, ceramic and metal matrix. Zirconium carbide nanoparticles is also used in nano-structured parts in metallurgical, chemical and aviation industry. It has application in drills and other tools that need to be abrasion resistant.

Zirconium Carbide (ZrC) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 400-1100 nm, Cubic

Price range: $41.00 through $397.00
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25 grams/37 € 100 grams/107 € 500 grams/271 € 1000 grams/350 €
Please contact us for quotes on larger quantities !!!

Zirconium Carbide (ZrC) Nanopowder/Nanoparticles

Purity: 99.95%, Size: 400-1100 nm, Cubic

Applications:

Zirconium carbide powder has high hardness, high thermal conductivity, good oxidation resistance, and toughness. It is used in textile industry in making thermostat textiles in nylon, fiber and hard alloy. It is also used in composite materials such as polymer nanocomposites, ceramic and metal matrix. Zirconium carbide powder is also used in nano-structured parts in metallurgical, chemical and aviation industry. It has application in drills and other tools that need to be abrasion resistant.

Zirconium Carbide (ZrC) Sputtering Target

Price range: $390.00 through $991.00
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Product 

Zirconium Carbide (ZrC) Sputtering Target

CAS No.

 12070-14-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

103.23 g/mol

Melting Point

~3,530 °C

Boiling Point

 ~5,100 °C

Density

~6.59 g/cm³

Product Codes

NCZ-1339K

Zirconium Carbide Nanoparticles/ Nanopowder ( ZrC, 97+%, 60nm)

Price range: $136.00 through $467.00
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$136/25g
$467/100g

Product 

Zirconium Carbide Nanoparticles/ Nanopowder ( ZrC, 97+%, 60nm)

CAS No.

12070-14-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

60nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

103.23 g/mol

Melting Point

~3,532 °C

Boiling Point

~5,100 °C

Density

 ~6.73 g/cm³

Product Codes

NCZ-1228K

Zirconium Diboride (ZrB2) Nanopowder/Nanoparticles, Purity: 99.5%, Size: 45 nm, Hexagonal

Price range: $74.00 through $305.00
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1 gram/66 € 5 grams/269 € 
                      
Please contact us for quotes on larger quantities !!! 

Zirconium Diboride (ZrB2) Nanopowder/Nanoparticles

Purity: 99.5%, Size: 45 nm, Hexagonal

Applications:

Zirconium diboride nanoparticles has high hardness, high thermal conductivity, good oxidation resistance, and good anti corrosion ability. It is used in special ceramic refractory industry, nuclear industry, space industry, and military industry. It is also used as surface coating of rolling balls and in smooth solid materials.

Zirconium Diboride (ZrB2) Powder, 99.5% Purity, -325 Mesh

$891.00
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Product Zirconium Diboride (ZrB2) Powder, 99.5% Purity, -325 Mesh
CAS No. 12045-64-6
Appearance Gray to black
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 44µm (Size Can be customized),  Ask for other available size range.
Ingredient ZrB2
Molecular Weight 81.38 g/mol
Melting Point N/A
Boiling Point N/A
Density 5.61 g/cm³
Product Codes NCZ-611I

Zirconium diboride(ZrB2) (055857)

Price range: $383.00 through $448.00
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Zirconium diboride(ZrB2) (055857)
Grade Purity Moisture D50 Price($/kg)
ZrB2-90% 90% min 1.0% max ̴5 µm 383
ZrB2-99% 99% min 0.5% max ̴15 µm 448
Product Codes- NCZ-2697K

Zirconium HFAC

Price range: $28.00 through $169.00
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Product Zirconium HFAC
CAS No. 19530-02-0
Appearance White to off-white crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient C₂₀H₈F₂₄O₈Zr
Molecular Weight 919.47 g/mol
Melting Point 41–43 °C
Boiling Point N/A
Density N/A
Product Codes NCZ-335R
 

Zirconium Hydride (ZrH4) Nanopowder/Nanoparticles, Purity: 99.5+ %, Size: 20-40 nm

Price range: $49.00 through $553.00
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1 gram/44 € 5 grams/128 €                       
25 grams/264 €                    
100 grams/488 €     
Please contact us for quotes on larger quantities !!!

Zirconium Hydride (ZrH4) Nanopowder/Nanoparticles

Purity: 99.5+ %, Size: 20-40 nm

Applications:

Zirconium Hydride nanoparticles/nanopowder are used as strong reducing agents and foaming agents. In order to obtain hard alloys Zirconium Hydride nanoparticles/nanopowder are used as additive. In powder metallurgy Zirconium Hydride nanoparticles/nanopowder are used as hydrogenation catalysts and in vacuum tube industry Zirconium Hydride nanoparticles/nanopowder are used as getters in the vacuum tube industry. In vacuum system, Zirconium Hydride nanoparticles/nanopowder help establish a seal between a metal and ceramic.

Zirconium Oxide (ZrO2) Nanopowder/Nanoparticles Water Dispersion, Size: 40-50 nm, 22 wt%

Price range: $27.00 through $337.00
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25 ml/24 € 50 ml/38 € 100 ml/65 € 500 ml/195 € 1000 ml/298 €
Please contact us for quotes on larger quantities !!!

Zirconium Oxide (ZrO2) Nanopowder/Nanoparticles Water Dispersion

Size: 40-50 nm, 22 wt%

Zirconium Oxide (ZrO2) Nanopowder/Nanoparticles Water Dispersion, Size: 40-50 nm, 22 wt%

Price range: $26.00 through $328.00
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25 ml/24 € 50 ml/38 € 100 ml/65 € 500 ml/195 € 1000 ml/298 €
Please contact us for quotes on larger quantities !!!

Zirconium Oxide (ZrO2) Nanopowder/Nanoparticles Water Dispersion

Size: 40-50 nm, 22 wt%

Zirconium Oxide (ZrO2) Nanopowder/Nanoparticles Water Dispersion, Size: 40-50 nm, 22 wt%

Price range: $38.00 through $466.00
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Zirconium Oxide (ZrO2) Nanopowder/Nanoparticles Water Dispersion Size: 40-50 nm, 22 wt%

Zirconium Oxide (ZrO2) Nanopowder/Nanoparticles, Purity: 99.95+ %, Size: 30 nm

Price range: $37.00 through $382.00
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5 grams/31 € 25 grams/64 €                        
100 grams/105 €                     
500 grams/226 €                    
1000 grams/338 € Please contact us for quotes on larger quantities !!!

Zirconium Oxide (ZrO2) Nanopowder/Nanoparticles

Purity: 99.95+ %, Size: 30 nm

Zirconium Oxide Micron Powder (ZrO2, 99.9%, 1~3um)

Price range: $53.00 through $181.00
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$53/100g
$117/500g
$181/kg

Product 

Zirconium Oxide Micron Powder (ZrO2, 99.9%, 1~3um)

CAS No.

1314-23-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

~10–50 nm(Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

123.22 g/mol

Melting Point

~2,715 °C

Boiling Point

~4,300 °C

Density

~5.68 g/cm³

Product Codes

NCZ-1224K

Zirconium Oxide Nanopowder

$0.00

Zirconium Oxide Nanopowder

Product Name: Zirconium Oxide Nanopowder

Product Zirconium Oxide Powder
MF ZrO2
Item Code NCZ-AM-102-20
CAS Number 1314-23-4
Particle Size 70 nm, 1 micron, 10 microns, 325 Mesh (Customization is available)
Hafnium Content ≤ 0.1% or less than 1000 ppm
Molecular Weight 123.22
Appearance White Powder
Purity 99% to 99.999%

Zirconium Oxide Nanopowder

Stefanic et al. have study the influence of processing parameters (pH value, type of anion, and reaction temperature) on the properties of hydrous zirconia. They mix zirconium n-isopropoxide in isopropanol with aqueous solutions of different pH values and ion types. After that, they calcined the sample at 400°C. They obtain tetragonal zirconia as the dominant phase after calcination.

Stocker & Baiker have prepared zirconia aerogel by sol-gel method using tetra-n-butoxy zirconium (IV) and acid catalysis. They vary the acid to alkoxide ratio and types of alcoholic solvent in the reaction. They found out that zirconia aerogel prepared with an acid-to-alkoxide ratio of 0.95 and butanol have the largest BET surface area (205 m2g-1).

Beena et al. synthesized nanocrystalline zirconia using sol-gel and precipitation techniques. For sol-gel synthesis, they dilute zirconium propoxide to 30wt% by adding propanol and then hydrolyze with dropwise ammonia solution under continuous stirring until pH 10-10.5. For precipitation synthesis, they dissolved zirconium oxychloride in distilled water and then hydrolyzed with dropwise ammonia solution under continuous stirring until pH 10-10.5. The precipitates are then filtered and washed with distilled water to remove chlorine ions. Both sol-gel and precipitate samples are dried in an oven as well as under vacuum in rotavapor before calcined at different temperatures (400-700°C).

Size Options: also available in the other nano and micron size range, 325 Mesh, 200 Mesh, etc. (Ask for the size and ratio customization)

Zirconium Oxide Nanopowder/ Nanoparticles(ZrO2- 8Y, 99.9%, 0.8um)

Price range: $69.00 through $234.00
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$68/100g
$147/500g
$234/kg

Product 

Zirconium Oxide Nanopowder/ Nanoparticles(ZrO2- 8Y, 99.9%, 0.8um)

CAS No.

 1314-23-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

0.8um(Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

~130.9 g/mol

Melting Point

~2,700 °C

Boiling Point

~4,300 °C

Density

~5.9 – 6.1 g/cm³

Product Codes

NCZ-1227K

Zirconium Oxide Nanopowder/Nanoparticles (ZrO2, 20~30nm, 99%)

Price range: $78.00 through $216.00
Select options This product has multiple variants. The options may be chosen on the product page
$78/100g
$152/500g
$216/kg

Product 

Zirconium Oxide Nanopowder/Nanoparticles (ZrO2, 20~30nm, 99%)

CAS No.

 1314-23-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

20~30nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

123.22 g/mol

Melting Point

~2,715 °C

Boiling Point

~4,300 °C

Density

~5.6–6.0 g/cm³

Product Codes

NCZ-1225K

Zirconium Silicide Powder

$0.00

Zirconium Silicide Nanoparticles

Product Name: Zirconium Silicide powder ZrSi2
MF ZrSi2
Chemical Name Zirconium Silicide
Purity ≥ 99%
APS 50-100 nm, 1 to 5 um, 10 um, 325 Mesh  (Size Customization possible)
Form Gray Powder
Product Number NCZ3245-20
CAS Number 12401-56-8

Note: We supply different products of microparticles and Nanoparticles powder in all sizes range according to the client’s requirements.

Zirconium disilicide is a kind of grey powder with tetragonal crystal. And it is mainly used in areas like metal ceramics, high-temperature oxidation resistant coating, high-temperature structural materials, and aviation and spaceflight, etc.

Zirconium(IV) Silicide (ZrSi2) - COA

Mg

O

K

Fe

Other

0.03

0.5

0.05

0.025

0.33

We also supply MnSi2, Ti5Si3, Nb5Si3, CoSi2, HfSi2, MoSi2, and other silicide powders, ask for the customization and technical specifications at contact@nanochemazone.com

Zirconium Sputtering Target Zr

Price range: $99.00 through $1,089.00
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Product Zirconium Sputtering Target Zr
CAS No. 7440-67-7
Appearance Silvery-white, lustrous metal. 
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Zr
Molecular Weight 91.224 g/mol
Melting Point N/A
Boiling Point N/A
Density 6.52 g/cm³
Product Codes NCZ-150H

Zirconium TFAC

Price range: $16.00 through $80.00
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Product Zirconium TFAC
CAS No. 17499-68-2
Appearance White to light yellow
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Zr(C₅H₄F₃O₂)₄
Molecular Weight 703.54 g/mol
Melting Point 128–133 °C
Boiling Point N/A
Density N/A
Product Codes NCZ-257R

Zirconium TMHD

Price range: $16.00 through $75.00
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Product Zirconium TMHD
CAS No. 19348-19-3
Appearance White to off-white crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient C₂₂H₃₈O₄Zr
Molecular Weight 441.49 g/mol
Melting Point N/A
Boiling Point N/A
Density 1.5 g/cm³
Product Codes NCZ-371R
 

Zn-Mg-Al Hydrotalcite (321558)

$250.00
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Zn-Mg-Al Hydrotalcite (321558)
Items Specifications
Appearance White odorless fine powder
Loss on drying(105°C, 1hr) ≤0.5%w/w
Average particle size 0.6-0.9µm %50
Specific surface area 5-10m2/g
MgO/Al2O3 2.8-3.2
ZnO/Al2O3 0.8-1.2
Product Codes- NCZ-2765K

ZnSe-based QLED Quantum Dots 455 nm

Price range: $915.00 through $1,780.00
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APPLICATIONS
  • Televisions
  • Monitors
  • Smartphones