Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”

$528.00

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”

$607.00

Product 

Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.125''

CAS No.

7440-65-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

88.91 g/mol

Melting Point

1522 °C

Boiling Point

3338 °C

Density

4.47 g/cm³

Product Codes

NCZ-1519K

Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”

$610.00

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”

$702.00

Product 

Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.250''

CAS No.

7440-65-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

88.91 g/mol

Melting Point

1522 °C

Boiling Point

3338 °C

Density

4.47 g/cm³

Product Codes

NCZ-1518K

Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”

$729.00

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”

$840.00

Product 

Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.125''

CAS No.

7440-65-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

88.91 g/mol

Melting Point

1522 °C

Boiling Point

3338 °C

Density

4.47 g/cm³

Product Codes

NCZ-1517K

Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”

$767.00

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”

$884.00

Product 

Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 4'', Thickness: 0.250''

CAS No.

7440-65-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

~20–50 µm*  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

88.91 g/mol

Melting Point

1522 °C

Boiling Point

3338 °C

Density

4.47 g/cm³

Product Codes

NCZ-1516K

Yttrium ACAC

Price range: $16.00 through $80.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Yttrium ACAC
CAS No. 14698-09-6
Appearance White to pale yellow crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Y(C₅H₇O₂)₃
Molecular Weight 353.14 g/mol
Melting Point N/A
Boiling Point N/A
Density 2.3 g/cm³
Product Codes NCZ-305R

Yttrium Aluminate (Y3Al5O12) Nanopowder/Nanoparticles, Purity: 99.7+%, Size: 25 nm

Price range: $70.00 through $278.00
Select options This product has multiple variants. The options may be chosen on the product page
1 gram/65 € 
5 grams/255 €                       
Please contact us for quotes on larger quantities !!!

Yttrium Aluminate (Y3Al5O12) Nanopowder/Nanoparticles

Purity: 99.7+%, Size: 25 nm

Technical Properties:

Purity (%) 99.7
Average Particle Size (nm) 25
Color white
Morphology nearly spherical
Elemental Analysis La Sm Eu Gd Ce Fe Cu Ni Si Zn Pb Ca
0.006% 0.002% 0.007% 0.003% 0.003% 2 µg/g 3  µg/g 2 µg/g 8 µg/g 3  µg/g 4 µg/g 6 µg/g

Applications:

Yttrium Aluminum Oxide nanoparticles has applications in electronic devices. It is used in temperature sensors, P-type transparent conductive films, and counter electrodes. It is used as cathode materials for alkaline batteries. Its optical properties can be used in active optical filters, and automotive rear-view mirrors with adjustable reflectance. It also has applications in the field of catalysis.

Yttrium Aluminate (Y3Al5O12) Nanopowder/Nanoparticles, Purity: 99.7+%, Size: 25 nm

Price range: $78.00 through $306.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Yttrium Aluminum Oxide nanoparticles has applications in electronic devices. It is used in temperature sensors, P-type transparent conductive films, and counter electrodes. It is used as cathode materials for alkaline batteries. Its optical properties can be used in active optical filters, and automotive rear-view mirrors with adjustable reflectance. It also has applications in the field of catalysis.

Yttrium Chloride Hexahydrate (YCl3 · 6H2O) 99.9% 3N

$425.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Yttrium Chloride Hexahydrate (YCl3 · 6H2O) 99.9% 3N
CAS No. 10025-91-9
Appearance White crystalline powder or granules
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient YCl3·6H2O
Molecular Weight 241.46 g/mol
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-604I
 

Yttrium Ferrite (Y3Fe5O12) Sputtering Targets, elastomer, Purity: 99.9%, Size: 2”, Thickness: 0.125”

$660.00

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Yttrium Ferrite (Y3Fe5O12) Sputtering Targets, elastomer, Purity: 99.9%, Size: 2”, Thickness: 0.125”

$760.00

Product 

Yttrium Ferrite (Y3Fe5O12) Sputtering Targets, elastomer, Purity: 99.9%, Size: 2'', Thickness: 0.125''

CAS No.

12068-40-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

706.32 g/mol

Melting Point

~1,790 °C

Boiling Point

N/A

Density

~5.17 – 5.36

Product Codes

NCZ-1510K

Yttrium Ferrite (Y3Fe5O12) Sputtering Targets, indium, Purity: 99.9%, Size: 2”, Thickness: 0.125”

$686.00

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Yttrium Ferrite (Y3Fe5O12) Sputtering Targets, indium, Purity: 99.9%, Size: 2”, Thickness: 0.125”

$790.00

Product 

Yttrium Ferrite (Y3Fe5O12) Sputtering Targets, indium, Purity: 99.9%, Size: 2'', Thickness: 0.125''

CAS No.

12068-40-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

706.32 g/mol

Melting Point

~1,790 °C

Boiling Point

N/A

Density

~5.17 – 5.36

Product Codes

NCZ-1511K

Yttrium Ferrite (Y3Fe5O12) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”

$780.00

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Yttrium Ferrite (Y3Fe5O12) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”

$900.00

Product 

Yttrium Ferrite (Y3Fe5O12) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.125''

CAS No.

12063-56-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

~2–10 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

737.94 g/mol

Melting Point

~1040–1550 °C

Boiling Point

N/A

Density

~5.11 g/cm³

Product Codes

NCZ-1515K

Yttrium Ferrite (Y3Fe5O12) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”

$788.00

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Yttrium Ferrite (Y3Fe5O12) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”

$909.00

Product 

Yttrium Ferrite (Y3Fe5O12) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.250''

CAS No.

12068-40-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

706.32 g/mol

Melting Point

~1,790 °C

Boiling Point

N/A

Density

~5.17 – 5.36

Product Codes

NCZ-1514K

Yttrium Ferrite (Y3Fe5O12) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”

$455.00

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Yttrium Ferrite (Y3Fe5O12) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”

$522.00

Product 

Yttrium Ferrite (Y3Fe5O12) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''

CAS No.

12068-40-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

706.32 g/mol

Melting Point

~1,790 °C

Boiling Point

N/A

Density

~5.17 – 5.36

Product Codes

NCZ-1513K

Yttrium Ferrite (Y3Fe5O12) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”

$520.00

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Yttrium Ferrite (Y3Fe5O12) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”

$598.00

Product 

Yttrium Ferrite (Y3Fe5O12) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.125''

CAS No.

12068-40-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

706.32 g/mol

Melting Point

~1,790 °C

Boiling Point

N/A

Density

~5.17 – 5.36

Product Codes

NCZ-1512K

Yttrium Fluoride (YF3) 99.9% 3N

Price range: $186.00 through $556.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Yttrium Fluoride (YF3) 99.9% 3N
CAS No. 13758-39-7
Appearance White crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient YF3
Molecular Weight 169.91 g/mol
Melting Point N/A
Boiling Point N/A
Density 5.03 g/cm³
Product Codes NCZ-605I

Yttrium Fluoride (YF3) Nanopowder, Purity: 99.9%, APS: < 50 nm

Price range: $55.00 through $562.00
Select options This product has multiple variants. The options may be chosen on the product page
25 grams: 49 €   100 grams: 97 €   500 grams: 298 €  1000 grams:  495 € Please contact us for quotes on larger quantities !!!    Yttrium Fluoride (YF3) Nanopowder Purity: 99.9%, APS: < 50 nm CAS #: 13709-49-4 Linear Formula: YF3 CERTIFICATE OF ANALYSIS Purity                       99.9 % Ti                            ≤50ppm Fe                           ≤50ppm Al                            ≤10ppm K                             ≤30ppm   SEM IMAGE OF THE PRODUCT  

Yttrium Fluoride (YF3) Nanopowder, Purity: 99.9%, APS: < 50 nm

Price range: $55.00 through $561.00
Select options This product has multiple variants. The options may be chosen on the product page
25 grams: 49 €   100 grams: 97 €   500 grams: 298 €  1000 grams:  495 € Please contact us for quotes on larger quantities !!!    Yttrium Fluoride (YF3) Nanopowder Purity: 99.9%, APS: < 50 nm CAS #: 13709-49-4 Linear Formula: YF3 CERTIFICATE OF ANALYSIS Purity                       99.9 % Ti                            ≤50ppm Fe                           ≤50ppm Al                            ≤10ppm K                             ≤30ppm  

Yttrium FOD

Price range: $16.00 through $109.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Yttrium FOD
CAS No. 17978-84-6
Appearance White crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient C₃₀H₃₀F₂₁O₆Y
Molecular Weight N/A
Melting Point 200–205 °C
Boiling Point N/A
Density N/A
Product Codes NCZ-396R
 

Yttrium HFAC

Price range: $22.00 through $138.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Yttrium HFAC
CAS No. 33751-70-1
Appearance White crystalline solid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Y(C₅HF₆O₂)₃·2H₂O
Molecular Weight N/A
Melting Point 128–130 °C
Boiling Point N/A
Density N/A
Product Codes NCZ-334R

Yttrium Oxide (Y2O3) Nanopowder/Nanoparticles, High Purity: 99.99%, Size: 18-38 nm

Price range: $36.00 through $481.00
Select options This product has multiple variants. The options may be chosen on the product page
5 grams/32 € 25 grams/68 € 100 grams/125 € 500 grams/245 € 1000 grams/425 €
Please contact us for quotes on larger quantities !!!

Yttrium Oxide (Y2O3) Nanopowder/Nanoparticles

High Purity: 99.99%, Size: 18-38 nm

Technical Properties:

Purity (%) 99.99
Morphology spherical
Average Particle Size (nm) 18.0-38.0
Color white
Specific Surface Area (m2/g) 25.0-55.0
Bulk Density (g/cm3) 0,3
True Density (g/cm3) 5,1

Applications:

Yttrium oxide nanoparticles have applications in inorganic synthesis, material science, and in different electronic devices. In inorganic synthesis yttrium oxide is an important starting point for inorganic compound. It is used in making plasma and flat panel displays. It is also used in making fluorescent lamps, ultra-fast sensors, and photoelectric sensors. Yttrium oxide nanoparticle is used as additive in steel , iron, and non-ferrous alloys. It is also used as additive in coatings for high temperature applications.  

Yttrium Oxide (Y2O3) Nanopowder/Nanoparticles, High Purity: 99.99%, Size: 18-38 nm

Price range: $40.00 through $532.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Yttrium oxide nanoparticles have applications in inorganic synthesis, material science, and in different electronic devices. In inorganic synthesis yttrium oxide is an important starting point for inorganic compound. It is used in making plasma and flat panel displays. It is also used in making fluorescent lamps, ultra-fast sensors, and photoelectric sensors. Yttrium oxide nanoparticle is used as additive in steel , iron, and non-ferrous alloys. It is also used as additive in coatings for high temperature applications.

Yttrium Oxide (Y2O3) Nanopowder/Nanoparticles, Purity: 99.999%, Size: 25-50 nm

Price range: $33.00 through $414.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Yttrium oxide nanoparticles have applications in inorganic synthesis, material science, and in different electronic devices. In inorganic synthesis yttrium oxide is an important starting point for inorganic compound. It is used in making plasma and flat panel displays. It is also used in making fluorescent lamps, ultra-fast sensors, and photoelectric sensors. Yttrium oxide nanoparticle is used as additive in steel , iron, and non-ferrous alloys. It is also used as additive in coatings for high temperature applications.

Yttrium Oxide (Y2O3) Nanopowder/Nanoparticles, Purity: 99.999%, Size: 25-50 nm

Price range: $29.00 through $375.00
Select options This product has multiple variants. The options may be chosen on the product page
5 grams/26 € 25 grams/54 € 100 grams/101 € 500 grams/175 € 1000 grams/331 €
Please contact us for quotes on larger quantities !!!

Yttrium Oxide (Y2O3) Nanopowder/Nanoparticles

Purity: 99.999%, Size: 25-50 nm

Technical Properties:

Purity (%) 99.999
Morphology spherical
Average Particle Size (nm) 25.0-50.0
Color white
Specific Surface Area (m2/g) 25.0-45.0
Bulk Density (g/cm3) 0,3
True Density (g/cm3) 5,1
Elemental Analysis (%) SiO2 Fe2O3 CaO
0.008 0.0032 0.006

Applications:

Yttrium oxide nanoparticles have applications in inorganic synthesis, material science, and in different electronic devices. In inorganic synthesis yttrium oxide is an important starting point for inorganic compound. It is used in making plasma and flat panel displays. It is also used in making fluorescent lamps, ultra-fast sensors, and photoelectric sensors. Yttrium oxide nanoparticle is used as additive in steel , iron, and non-ferrous alloys. It is also used as additive in coatings for high temperature applications.

Yttrium Oxide (Y2O3) Sputtering Target

Price range: $420.00 through $948.00
Select options This product has multiple variants. The options may be chosen on the product page

Product 

Yttrium Oxide (Y2O3) Sputtering Target

CAS No.

 1314-36-9

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

225.81 g/mol

Melting Point

~2,430 °C

Boiling Point

~4,300 °C

Density

~5.01 g/cm³

Product Codes

NCZ-1330K

Yttrium Oxide Micron Powder (Y2O3, 99.995%, 1~2um)

Price range: $117.00 through $327.00
Select options This product has multiple variants. The options may be chosen on the product page
$117/100g
$280/500g
$327/Kg

Product 

Yttrium Oxide Micron Powder (Y2O3, 99.995%, 1~2um)

CAS No.

1314-36-9

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 1~2um (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

225.81 g/mol

Melting Point

~2,430 °C

Boiling Point

~4,300 °C

Density

~5.01 g/cm³

Product Codes

NCZ-1211K

Yttrium Oxide Micron Powder (Y2O3, 99.999%, <10um)

Price range: $117.00 through $280.00
Select options This product has multiple variants. The options may be chosen on the product page
$117/100g
$280/500g

Product 

Yttrium Oxide Micron Powder (Y2O3, 99.999%, <10um)

CAS No.

1314-36-9

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

<10um (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

225.81 g/mol

Melting Point

~2,430 °C

Boiling Point

~4,300 °C

Density

~5.01 g/cm³

Product Codes

NCZ-1212K

Yttrium Oxide Micron Powder (Y2O3, 99.999%, <10um)

Price range: $117.00 through $180.00
Select options This product has multiple variants. The options may be chosen on the product page
$117/100g $180/500g
Product Yttrium Oxide Micron Powder (Y2O3, 99.999%, <10um)
CAS No. 1314-36-9
Appearance White powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 10um (Size Can be customized),  Ask for other available size range.
Ingredient Y2O3
Molecular Weight 225.81 g/mol
Melting Point 2425°C
Boiling Point 4300°C
Density 5.01 g/cm³
Product Codes NCZ-124R
 

Yttrium Oxide nanoparticles

$0.00

Yttrium Oxide Nanoparticles

Yttrium Oxide Nanopowder

MF: Y2O3
Chemical Name: Yttrium Oxide
Purity: > 99.99%
APS: 30 nm (Size Customization possible)
Form: Nanopowder
Product Number: #NCZ6001
CAS Number 1314-36-9
Note: We supply different size products of microparticles and Nanoparticles size range powder according to client’s requirements.

Yttrium Oxide Nanoparticles / Nanopowder (Y2O3, 99.995%, 0.5~1um)

Price range: $105.00 through $325.00
Select options This product has multiple variants. The options may be chosen on the product page
$105/100g
$225/500g
$325/Kg

Product 

Yttrium Oxide Nanoparticles / Nanopowder (Y2O3, 99.995%, 0.5~1um)

CAS No.

1314-36-9

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 

0.5~1um (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

225.81 g/mol

Melting Point

~2,430 °C

Boiling Point

~4,300 °C

Density

~5.01 g/cm³

Product Codes

NCZ-1210K

Yttrium Oxide Nanoparticles / Nanopowder (Y2O3, 99.995%, 0.5~1um)

Price range: $105.00 through $225.00
Select options This product has multiple variants. The options may be chosen on the product page
$105/100g $225/500g $325/kg
Product Yttrium Oxide Nanoparticles / Nanopowder (Y2O3, 99.995%, 0.5~1um)
CAS No. 1314-36-9
Appearance White powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 0.5-1nm (Size Can be customized),  Ask for other available size range.
Ingredient Y2O3
Molecular Weight 225.81 g/mol
Melting Point 2425°C
Boiling Point 4300°C
Density 5.01 g/cm³
Product Codes NCZ-122R
 

Yttrium Oxide Nanoparticles / Nanopowder (Y2O3, 99.995%, 30~50nm)

Price range: $80.00 through $305.00
Select options This product has multiple variants. The options may be chosen on the product page
$80/25g
$179/100g
$305/500g

Product 

Yttrium Oxide Nanoparticles / Nanopowder (Y2O3, 99.995%, 30~50nm)

CAS No.

 1314-36-9

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

30~50nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

225.81 g/mol

Melting Point

~2,430 °C

Boiling Point

~4,300 °C

Density

~5.01 g/cm³

Product Codes

NCZ-1208K

Yttrium Oxide Nanoparticles / Nanopowder (Y2O3, 99.995%, 30~50nm)

Price range: $80.00 through $305.00
Select options This product has multiple variants. The options may be chosen on the product page
$80/25g $179/100g $305/500g
Product Yttrium Oxide Nanoparticles / Nanopowder (Y2O3, 99.995%, 30~50nm)
CAS No. 1314-36-9
Appearance White powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 30-50nm (Size Can be customized),  Ask for other available size range.
Ingredient Y2O3
Molecular Weight 225.81 g/mol
Melting Point 2425°C
Boiling Point 4300°C
Density 5.01 g/cm³
Product Codes NCZ-121R
 

Yttrium Oxide Nanoparticles / Nanopowder (Y2O3, 99.995%, 30~50nm) (Copy)

Price range: $80.00 through $305.00
Select options This product has multiple variants. The options may be chosen on the product page
$80/25g
$179/100g
$305/500g

Product 

Yttrium Oxide Nanoparticles / Nanopowder (Y2O3, 99.995%, 30~50nm)

CAS No.

1314-36-9

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 

30~50nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

225.81 g/mol

Melting Point

~2,430 °C

Boiling Point

~4,300 °C

Density

~5.01 g/cm³

Product Codes

NCZ-1209K

Yttrium Oxide Powder (Y2O3, 99.995%, 1~2um)

Price range: $117.00 through $280.00
Select options This product has multiple variants. The options may be chosen on the product page
$117/100g $280/500g $327/kg
Product Yttrium Oxide Powder (Y2O3, 99.995%, 1~2um)
CAS No. 1314-36-9
Appearance White powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1-2um (Size Can be customized),  Ask for other available size range.
Ingredient Y2O3
Molecular Weight 225.81 g/mol
Melting Point 2425°C
Boiling Point 4300°C
Density 5.01 g/cm³
Product Codes NCZ-123R
 

Yttrium Oxyfluoride (YOF) Nanopowder, Purity: 99.9%, APS: < 50 nm

Price range: $53.00 through $548.00
Select options This product has multiple variants. The options may be chosen on the product page
25 grams: 47 €  
100 grams: 96 € 500 grams: 295  € 1000 grams: 484 €
Please contact us for quotes on larger quantities !!! Yttrium Oxyfluoride (YOF) Nanopowder Purity: 99.9%, APS: < 50 nm Linear Formula: YOF

Yttrium Sputtering Target Y

Price range: $189.00 through $967.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Yttrium Sputtering Target Y
CAS No. 7440-65-5
Appearance Silvery White, Metallic
Purity ≥99%,  ≥99.9%,  ≥95% (Other purities are also available)
APS N/A
Ingredient Y
Molecular Weight 88.91 g/mol
Melting Point 1,522 °C
Boiling Point N/A
Density N/A
Product Codes NCZ-148H
 

Yttrium TMHD

Price range: $41.00 through $227.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Yttrium TMHD
CAS No. 15632-39-0
Appearance White to off-white crystalline solid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient C₃₃H₅₇O₆Y
Molecular Weight 638.71 g/mol
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-369R
 

Yttrium(III) Oxide (Y2O3) Nanopowder, 20nm, ≥99.99% (4N) Purity, 100g

$579.00
Product Yttrium(III) Oxide (Y2O3) Nanopowder, 20nm, ≥99.99% (4N) Purity, 100g
CAS No. 1314-36-9
Appearance Fine white
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 20nm (Size Can be customized),  Ask for other available size range.
Ingredient Y2O3
Molecular Weight 225.81 g/mol
Melting Point N/A
Boiling Point N/A
Density 5.01 g/cm³
Product Codes NCZ-606I
 

Zensor Screen Printed Electrodes

Price range: $20.00 through $175.00
Select options This product has multiple variants. The options may be chosen on the product page

Screen Printed Electrode

Product Name: Screen Printed Electrode (Zensor SPE)

Product Name Zensor Screen Printed Electrodes (Carbon, Graphene, Silver & Gold, etc.)
Product Code NCZSPE101
Diameter of WE 2 mm, 3 mm, 4 mm, 5 mm
Size of RE 0.5 x 1 mm
Ratio CE/WE Surface Area 4/1
Shape Rectangle
Overall Dimension 50 x 10 mm
Thickness 0.5 mm
Thickness of Coated Material 10 µm
Working Electrode Graphite/Gold/Graphene/CNT/Platinum/Silver/Pdot-PSS, Prussian Blue (customization possible)
Counter Electrode Graphite/Gold/Silver
Reference Electrode Ag/AgCl
Substrate Valox FR1
Packaging 10, 40, 50, 100, 200, 500, 1000 Pcs etc.

Zensor screen printed electrodes

  • Dimensions: 50 x 13 mm (h x w)
  • Working electrode: 3 mm diameter disk
  • Materials: graphitic carbon powder (working and auxiliary electrodes), Ag/AgCl pellet (reference)

Ask for the customization and Request price information: sales@nanochemazone.com

Zensor screen printed electrodes (SPEs) feature a carbon working electrode (central circle), carbon auxiliary (outer annular crescent), and Ag/AgCl pellet reference electrode. They can be used as low-cost disposable electrodes in aqueous solutions of moderate pH. Disposable SPEs can be used as an alternative to expensive glassy carbon or platinum electrodes for teaching experiments, or routine analyses, where a clean reproducible surface would otherwise require time-consuming electrode polishing.

Relatively large tabs at the top of the SPE enable electrical contact with standard miniature alligator clips (no special cables required).

If using solutions that contain species that might react with the Ag/AgCl pellet reference (sulfide, iodide, cyanide, ammonia, etc.) then the Zensor SE100 SPE working electrode is recommended using a conventional reference and auxiliary electrodes, with an intervening salt bridge in cases of serious interference.

Not suitable for use with organic solvents, or concentrated acidic or basic aqueous solutions.

Zero Valent Zinc Nanopowder

$0.00

Zinc Nanoparticles Zero Valent

Zinc Nanopowder Zero Valent

MF: Zn
Chemical Name: Zinc
Purity: > 99.9%
APS: 20 nm, 40 nm, 80 nm (Size Customization possible)
Form: Nanopowder
Product Number: NCZ6201-20A
CAS Number 7440-66-6
Note: We supply different products of microparticles and Nanoparticles powder in all sizes range according to the client’s requirements.

Zinc (Zn) Nanopowder/Nanoparticles, High purity: 99.995+%, Size: 60-70 nm

Price range: $63.56 through $162.00
Select options This product has multiple variants. The options may be chosen on the product page
Zinc (Zn) Nanopowder/Nanoparticles High purity: 99.995+%, Size: 60-70 nm Technical Properties: True Density (g/cm3) 7,1 Bulk Density (g/cm3) 0,3 Color

Zinc (Zn) Nanopowder/Nanoparticles, High purity: 99.995+%, Size: 90-110 nm

Price range: $57.89 through $182.74
Select options This product has multiple variants. The options may be chosen on the product page
Zinc (Zn) Nanopowder/Nanoparticles High purity: 99.995+%, Size: 90-110 nm Technical Properties: True Density (g/cm3) 7,1 Bulk Density (g/cm3) 0,9 Color

Zinc (Zn) Nanopowder/Nanoparticles, Purity: 99.95%,Size: 790 nm

Price range: $21.57 through $539.14
Select options This product has multiple variants. The options may be chosen on the product page
Zinc (Zn) Nanopowder/Nanoparticles Purity: 99.95%, Size: 790 nm Technical Properties: True Density (g/cm3) 7,1 Color dark gray Tmelting (oC) 420 Tboiling (oC)

Zinc (Zn) powder, -40 mesh, 99.999%

Price range: $605.00 through $943.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Zinc (Zn) powder, -40 mesh, 99.999%
CAS No. 7440-66-6
Appearance Shiny, grayish metallic
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Zn
Molecular Weight 65.38 g/mol
Melting Point N/A
Boiling Point N/A
Density 7.14 g/cm³
Product Codes NCZ-607I

Zinc (Zn) Sputtering Target

Price range: $70.00 through $390.00
Select options This product has multiple variants. The options may be chosen on the product page

Product 

Zinc (Zn) Sputtering Target

CAS No.

7440-66-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

65.38 g/mol

Melting Point

419.5 °C

Boiling Point

907 °C

Density

 7.14 g/cm³

Product Codes

NCZ-1310K

Zinc (Zn) Sputtering Targets, indium, Purity: 99.95%, Size: 1”, Thickness: 0.125”

$374.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Zinc (Zn) Sputtering Targets, indium, Purity: 99.95%, Size: 1”, Thickness: 0.125”

$425.00

Product 

Zinc (Zn) Sputtering Targets, indium, Purity: 99.95%, Size: 1'', Thickness: 0.125''

CAS No.

7440‑66‑6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

Zn (black granules) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

65.38 g/mol

Melting Point

419.5 °C

Boiling Point

 907 °C

Density

7.14 g/cm³

Product Codes

NCZ-1461K

Zinc (Zn) Sputtering Targets, indium, Purity: 99.95%, Size: 2”, Thickness: 0.125”

$465.00

Product 

Zinc (Zn) Sputtering Targets, indium, Purity: 99.95%, Size: 2'', Thickness: 0.125''

CAS No.

7440‑66‑6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

Zn (black granules) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

65.38 g/mol

Melting Point

419.5 °C

Boiling Point

 907 °C

Density

7.14 g/cm³

Product Codes

NCZ-1459K

Zinc (Zn) Sputtering Targets, indium, Purity: 99.95%, Size: 2”, Thickness: 0.125”

$403.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Zinc (Zn) Sputtering Targets, indium, Purity: 99.95%, Size: 4”, Thickness: 0.125”

$759.00

Product 

Zinc (Zn) Sputtering Targets, indium, Purity: 99.95%, Size: 4'', Thickness: 0.125''

CAS No.

7440‑66‑6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

Zn (black granules) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

65.38 g/mol

Melting Point

419.5 °C

Boiling Point

 907 °C

Density

7.14 g/cm³

Product Codes

NCZ-1458K