Titanium oxide TMHD

Price range: $16.00 through $83.00
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Product Titanium oxide TMHD
CAS No. 152248-67-4
Appearance White to off-white
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient OTi(C₁₁H₁₉O₂)₂
Molecular Weight 430.4 g/mol
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-367R
 

Titanium oxynitride (537616)

$211.00
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Titanium oxynitride (537616)
D50=0.8-1.5μm D90=3-5μm
 
Product Codes- NCZ-2771K

Titanium Oxynitride Nanoparticle, APS: 20 nm, Purity: 99.9%

Price range: $88.00 through $1,105.00
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25 grams: 78€ 100 grams: 245 € 500 grams: 584 € 1 kg: 976€ Titanium Oxynitride Nanoparticles, Average Particle Size: 20 nm, Purity: 99.9 % Performance characteristics Nano titanium oxynitride powder is prepared by high-frequency plasma gas phase synthesis method, with high purity, no free carbon black dot impurities, no ammonium chloride impurities, small particle size, uniform distribution, large specific surface area, high surface activity, and low bulk density The nano-TiON in the photocatalyst has the advantages of stable chemical properties, strong oxidation-reduction and resistance to photocathode corrosion, insoluble, non-toxic, and low cost; it is widely used as a catalyst for photocatalytic oxidation reactions. It removes pollutants in the atmosphere and water and becomes an ideal material for solving energy and environmental problems. Applications
  • Nano titanium oxynitride is used in sewage treatment: Industrial sewage contains a lot of toxic and harmful organic substances, and these pollutants are difficult to eliminate with biological treatment technology. Nano-TiON has a strong oxidizing effect under light conditions, which can cause the hydrocarbons, halogenated substances, carboxylic acids, etc. in the water to undergo redox reactions, and gradually degrade, completely oxidized into environmentally friendly CO2 and H2O and other harmless substances;
  • Nano titanium oxynitride is used in photocatalyst: The band gap of nano-TiON is less than 3.2eV, so it can still achieve catalytic degradation of toxic and harmful substances in the air under the condition of visible light with wavelengths above 400nm, and achieve the effect of purifying the environment, which is better than pure sharp Titanium dioxide photocatalyst;
  • Nano titanium oxynitride is used in self-cleaning coatings: the product has a strong catalytic oxidation effect. Adding it to the coating body can automatically decompose the organic pollutants that fall or adhere to the coating surface, and degrade into CO2, water and other substances. , Taken away with the circulation of air, in order to achieve the effect of self-cleaning;
  • Nano titanium oxynitride is used as an antibacterial agent: Nano-TiON has a strong photocatalytic sterilization effect. Under visible light irradiation, TiON decomposes water into free radicals, which enter the cell wall of bacteria, destroy the cell wall, degrade the tissue structure of the cell, and then kill the cell, which has an antibacterial and bactericidal effect;
  • Nano titanium oxynitride is used in antibacterial composite materials: TiON has a strong photocatalytic ability. Add an appropriate amount of nano TiON to polymer materials such as plastics, rubber, and fibers to make polymer composite materials, even in weak light environments , It can also prevent products from mildew and bacteria breeding;
  • nanometer titanium oxynitride is mainly used in the aerospace field. It can be used as a very thin coating to harden and protect smooth surfaces. It can also be used as a non-toxic product in medical transplantation.
Packaging and storage This product is packaged in an inert gas plastic bag, sealed and stored in a dry, cool environment. It should not be exposed to the air to prevent oxidation and agglomeration due to moisture, which will affect the dispersion performance and use effect; the number of packages can be provided according to customer requirements and packed.

Titanium Powder (Ti, ~6um, 99.5%)

Price range: $70.00 through $150.00
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$70/25g
$150/100g

Product 

Titanium Powder (Ti, ~6um, 99.5%)

CAS No.

7440-32-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

~6um (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

47.87 g/mol

Melting Point

1,668 °C

Boiling Point

3,287 °C

Density

4.51 g/cm³

Product Codes

NCZ-1080K

Titanium Silicon Carbide (Ti3SiC2) MAX Phase Micron-Powder, 20g

$209.00
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Product Titanium Silicon Carbide (Ti3SiC2) MAX Phase Micron-Powder, 20g
CAS No. 12202-82-3
Appearance Gray-black
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 40–50µm (Size Can be customized),  Ask for other available size range.
Ingredient TiO2
Molecular Weight 195.7–195.71 g/mol
Melting Point N/A
Boiling Point N/A
Density 4.5 g/cm³
Product Codes NCZ-579I

Titanium Sputtering Target Ti

Price range: $152.00 through $947.00
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Product Titanium Sputtering Target Ti
CAS No. 7440-32-6
Appearance Silvery metallic
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Ti
Molecular Weight 47.867 g/mol
Melting Point N/A
Boiling Point N/A
Density 4.5 g/cm³
Product Codes NCZ-144H

Titanium Vanadium Aluminum Carbide (TiVAlC) MAX Phase Micron-Powder, 10g

$979.00
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Product Titanium Vanadium Aluminum Carbide (TiVAlC) MAX Phase Micron-Powder, 10g
CAS No. N/A
Appearance Dark grey to black
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 40–60µm (Size Can be customized),  Ask for other available size range.
Ingredient TiVAlC
Molecular Weight 137.8 g/mol
Melting Point N/A
Boiling Point N/A
Density 4.46 g/cm³
Product Codes NCZ-580I
 

TiVAlC MAXene Powder Low Price

$0.00

Product Name: TiVAlC MAXene Powder

Product TiVAlC MAXene powder
Colour Black Powder
Purity ≥98 wt%
Ingredient TiVAlC
Product Code NCZ-MX-226

TiVAlC MAXene powder APPLICATION FIELDS

High-temperature coating, MXene precursor, conductive self-lubricating ceramic, lithium-ion battery, supercapacitor, electrochemical catalysis. RELATED INFORMATION Storage Conditions: Airtight sealed, avoid light and keep dry at room temperature. Please email us for the customization. Email: contact@nanochemazone.com

trans-Bis(benzonitrile)palladium (II) chloride

Price range: $52.00 through $279.00
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Product trans-Bis(benzonitrile)palladium (II) chloride
CAS No. 14220-64-5
Appearance yellow-brown solid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient C₁₄H₁₀Cl₂N₂Pd
Molecular Weight 383.6 g/mol
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-193R
 

trans-Bis(triphenylphosphine)palladium (II) chloride

Price range: $66.00 through $352.00
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Product trans-Bis(triphenylphosphine)palladium (II) chloride
CAS No. 13965-03-2
Appearance Yellow to orange crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient C₃₆H₃₀Cl₂PdP₂
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-206R

trans-Dichlorobis(ethylenediamine)rhodium (III) nitrate

Price range: $120.00 through $602.00
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Product trans-Dichlorobis(ethylenediamine)rhodium (III) nitrate
CAS No. N/A
Appearance White
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient [Rh(en)₂Cl₂]NO₃ 
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-223R
 

trans-Dichlorodiamminepalladium (II)

Price range: $37.00 through $212.00
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Product trans-Dichlorodiamminepalladium (II)
CAS No. N/A
Appearance Yellow crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Cl₂H₆N₂Pd
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 2.5 g/cm³
Product Codes NCZ-226R

trans-Dichlorodiammineplatinum (II)

Price range: $59.00 through $313.00
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Product trans-Dichlorodiammineplatinum (II)
CAS No. 14913-33-8
Appearance Yellow to light yellow
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Cl₂H₆N₂Pt
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-228R

Tri-Nitrogen-doped Graphdiyne Powder, 10 mg/bottle

$770.00
Product Tri-Nitrogen-doped Graphdiyne Powder, 10 mg/bottle
CAS No. N/A
Appearance Black
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 50–200nm (Size Can be customized),  Ask for other available size range.
Ingredient CₙN₃
Molecular Weight 137.8 g/mol
Melting Point N/A
Boiling Point N/A
Density 1.3 – 1.5 g/cm³
Product Codes NCZ-581I

Tricalcium aluminate(Ca3Al2O6) (303982)

$553.00
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Product 

Tricalcium aluminate(Ca3Al2O6) (303982)

CAS No.

12042‑78‑3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

  <80um (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

~270.19 g/mol

Melting Point

~1542 °C

Boiling Point

N/A

Density

 ~3.06 g/cm³

Product Codes

NCZ-2609K

Tricalcium silicate(Ca3SiO5) (203982)

$482.00
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Product 

Tricalcium silicate(Ca3SiO5) (203982)

CAS No.

12168‑85‑3 — tricalcium silicate (also known as C₃S or alite)

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

  <10um (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

~228.3 g/mol

Melting Point

~2150 °C — high-temperature data from CRC sources

Boiling Point

N/A

Density

 ~3.14 g/cm³

Product Codes

NCZ-2607K

Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)dysprosium, 99.9%

Price range: $39.00 through $222.00
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Product Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)dysprosium, 99.9%
CAS No. 15522-69-7
Appearance Off-white or yellow crystalline powder/solid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient C₃₃H₅₇DyO₆ (Dy(C₁₁H₁₉O₂)₃)
Molecular Weight 712.30 g/mol
Melting Point 182–185 °C
Boiling Point N/A
Density N/A
Product Codes NCZ-444R

Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)erbium, 99.9%

Price range: $41.00 through $227.00
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Product Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)erbium, 99.9%
CAS No. 35733-23-4
Appearance Pink powder or crystals
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1-10 µm (Size Can be customized),  Ask for other available size range.
Ingredient Er(C₁₁H₁₉O₂)₃
Molecular Weight 717.06 g/mol
Melting Point 179–180 °C
Boiling Point N/A
Density N/A
Product Codes NCZ-473R
 

Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)europium, 99.9%

Price range: $41.00 through $231.00
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Product Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)europium, 99.9%
CAS No. 1241-91-0
Appearance Pale yellow to orange crystalline powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Eu(C₁₁H₁₉O₂)₃
Molecular Weight 609.26 g/mol
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-506R
 

Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)gadolinium, 99.9%

Price range: $41.00 through $227.00
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Product Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)gadolinium, 99.9%
CAS No. 14768-15-1
Appearance Off-white crystalline powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1-10 µm (Size Can be customized),  Ask for other available size range.
Ingredient C₃₃H₅₇O₆Gd
Molecular Weight 707.07 g/mol
Melting Point 178–183 °C
Boiling Point N/A
Density N/A
Product Codes NCZ-537R

Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)holmium, 99.9%

Price range: $42.00 through $235.00
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Product Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)holmium, 99.9%
CAS No. 15522-73-3
Appearance Off-white crystalline solid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient C₃₃H₅₇HoO₆
Molecular Weight  714.7 g/mol
Melting Point 175–180 °C
Boiling Point N/A
Density N/A
Product Codes NCZ-574R
 

Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)lanthanum, 99.9%

Price range: $39.00 through $222.00
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Product Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)lanthanum, 99.9%
CAS No. 14319-13-2
Appearance White to off-white crystalline powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1-10 μm (Size Can be customized),  Ask for other available size range.
Ingredient C₃₃H₅₇O₆La
Molecular Weight 688.72 g/mol
Melting Point N/A
Boiling Point N/A
Density 1.3 - 1.5 g/cm³
Product Codes NCZ-602R

Tris(4,4,4-trifluoro-1-(2-thienyl)-1,3-butanediono)europium, 99.9%

Price range: $69.00 through $360.00
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Product Tris(4,4,4-trifluoro-1-(2-thienyl)-1,3-butanediono)europium, 99.9%
CAS No. 17904-86-8
Appearance White to light yellow to light orange powder or crystals
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient C₃₆H₂₀EuF₉N₂O₆S₃
Molecular Weight 995.69 g/mol
Melting Point 248 °C
Boiling Point N/A
Density N/A
Product Codes NCZ-507R

Tris(6,6,7,7,8,8,8-heptafluoro-2,2-dimethyl-3,5-octandionato)cerium, 99.9%

Price range: $16.00 through $92.00
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Product Tris(6,6,7,7,8,8,8-heptafluoro-2,2-dimethyl-3,5-octandionato)cerium, 99.9%
CAS No. 172424-98-5
Appearance Yellow powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1–5 µm (Size Can be customized),  Ask for other available size range.
Ingredient C₃₀H₃₀CeF₂₁O₆
Molecular Weight 1025.64 g/mol
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-420R

Tris(6,6,7,7,8,8,8-heptafluoro-2,2-dimethyl-3,5-octandionato)erbium, 99.9%

Price range: $16.00 through $111.00
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Product Tris(6,6,7,7,8,8,8-heptafluoro-2,2-dimethyl-3,5-octandionato)erbium, 99.9%
CAS No. 17978-75-5
Appearance Pink powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1-50 µm (Size Can be customized),  Ask for other available size range.
Ingredient C₃₀H₃₃ErF₂₁O
Molecular Weight 1052.8 g/mol
Melting Point 157–163 °C
Boiling Point N/A
Density N/A
Product Codes NCZ-471R
 

Tris(6,6,7,7,8,8,8-heptafluoro-2,2-dimethyl-3,5-octandionato)europium, 99.9%

Price range: $16.00 through $86.00
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Product Tris(6,6,7,7,8,8,8-heptafluoro-2,2-dimethyl-3,5-octandionato)europium, 99.9%
CAS No. 14552-07-9
Appearance Pale yellow to yellow powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient C₄₅H₆₆EuF₂₁O₁₈
Molecular Weight 1,247.65 g/mol
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-502R
 

Tris(6,6,7,7,8,8,8-heptafluoro-2,2-dimethyl-3,5-octandionato)gadolinium, 99.9%

Price range: $16.00 through $102.00
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Product Tris(6,6,7,7,8,8,8-heptafluoro-2,2-dimethyl-3,5-octandionato)gadolinium, 99.9%
CAS No. 17631-67-3
Appearance White to pale yellow powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1-10 µm (Size Can be customized),  Ask for other available size range.
Ingredient C₃₀H₃₀F₂₁O₆Gd
Molecular Weight 1042.77 g/mol
Melting Point 219°C
Boiling Point N/A
Density N/A
Product Codes NCZ-535R

Tris(6,6,7,7,8,8,8-heptafluoro-2,2-dimethyl-3,5-octandionato)lanthanum, 99.9%

Price range: $16.00 through $102.00
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Product Tris(6,6,7,7,8,8,8-heptafluoro-2,2-dimethyl-3,5-octandionato)lanthanum, 99.9%
CAS No. 19106-89-9
Appearance White to pale solid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1-10 μm (Size Can be customized),  Ask for other available size range.
Ingredient La(FOD)₃
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-600R

Tris(d,d-dicamphoylmethanato)europium, 99%

Price range: $161.00 through $798.00
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Product Tris(d,d-dicamphoylmethanato)europium, 99%
CAS No. 52351-64-1
Appearance Solid, typically powder or crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient C₆₃H₁₀₅EuO₆
Molecular Weight 1110.47 g/mol
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-500R
 

Tris(trifluoromethylhydroxy-d-camphorato)europium, 99.9%

Price range: $35.00 through $199.00
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Product Tris(trifluoromethylhydroxy-d-camphorato)europium, 99.9%
CAS No. 108664-27-6
Appearance Pale yellow crystalline powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient C₄₅H₄₈EuF₉O₆
Molecular Weight 978.83 g/mol
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-505R

Tris[3-(heptafluoropropylhydroxymethylene-(+)-camphorato)europium, 99.9%

Price range: $23.00 through $145.00
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Product Tris[3-(heptafluoropropylhydroxymethylene-(+)-camphorato)europium, 99.9%
CAS No. 34788-82-4
Appearance Pale yellow crystalline powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient C₄₂H₄₅EuF₂₁O₆
Molecular Weight 1193.71 g/mol
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-503R

Tristrontium silicate(Sr3SiO5) (203677)

$482.00
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Product 

Tristrontium silicate(Sr3SiO5) (203677)

CAS No.

12712‑63‑9

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

  <30um (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

N/A

Melting Point

N/A

Boiling Point

N/A

Density

~4.74 g/cm³ (as tristrontium silicate is termed Sr₃[SiO₄]O

Product Codes

NCZ-2608K

Trititanium pentoxide(Ti3O5, 99.99%) (221976)

$364.00
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Trititanium pentoxide(Ti3O5, 99.99%) (221976)

Shape

Color

Purity

Package

Storage

Crystal

Granule

1-3 mm 3-5 mm

Purple black

99.99%

Avoid exposure to sunlight & acid Keep dry

Sinter

Tablet

9×5mm Upon demand

Tea black

 Granule

Upon demand

  Properties

CAS No.

Density (g/cm3)

Evaporation Temperature(°C)

Refractive Index at 550nm

Transparency Range(μm)

Evaporation Source

12065-65-5

4.89

1500~2000

2.2~2.3

0.4~8

RE, RS

Applications

AR coating; Beam Splitter; Cold light coating filter; HR coating; Glasses coating

Product Codes- NCZ-2786K

Tungsten (VI) Oxide (WO3) 99.9% 3N Nanopowder, 50g

$206.00
Product Tungsten (VI) Oxide (WO3) 99.9% 3N Nanopowder, 50g
CAS No. 1314-35-8
Appearance Yellow to light greenish
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 100nm (Size Can be customized),  Ask for other available size range.
Ingredient WO3
Molecular Weight 231.84 g/mol
Melting Point N/A
Boiling Point N/A
Density 7.16 g/cm³
Product Codes NCZ-582I

Tungsten (VI) Oxide (WO3) 99.99% 4N Powder

$707.00
Product Tungsten (VI) Oxide (WO3) 99.99% 4N Powder
CAS No. 1314-35-8
Appearance Light Yellow
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 100nm (Size Can be customized),  Ask for other available size range.
Ingredient WO3
Molecular Weight 231.84 g/mol
Melting Point N/A
Boiling Point N/A
Density 7.16 g/cm³
Product Codes NCZ-583I
 

Tungsten (W) nanoparticles/nanopowder ( W, 99.7%, 80~100nm)

Price range: $111.00 through $333.00
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$111/25g
$333/100g

Product 

Tungsten (W) nanoparticles/nanopowder ( W, 99.7%, 80~100nm)

CAS No.

7440-33-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

80~100nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

183.84 g/mol

Melting Point

3,422 °C

Boiling Point

5,555 °C

Density

19.3 g/cm³

Product Codes

NCZ-1082K

Tungsten (W) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 780 nm, metal basis

Price range: $31.00 through $450.61
Select options This product has multiple variants. The options may be chosen on the product page
Tungsten (W) Nanopowder/Nanoparticles Purity: 99.95%, Size: 780 nm, Metal Basis Technical Properties: True Density (g/cm3) 19,3 Color black Tmelting (oC) 3422

Tungsten (W) Nanopowder/Nanoparticles, Purity: 99.955+%, Size: 35-55 nm, Metal Basis

$259.92
Select options This product has multiple variants. The options may be chosen on the product page
Tungsten (W) Nanopowder/Nanoparticles Purity: 99.955+%, Size: 35-55 nm, Metal Basis Technical Properties: True Density (g/cm3) 19,3 Bulk Density (g/cm3) 3,8

Tungsten (W) Nanopowder/Nanoparticles, Purity: 99.955+%, Size: 65 nm, Metal Basis

Price range: $82.86 through $246.30
Select options This product has multiple variants. The options may be chosen on the product page
Tungsten (W) Nanopowder/Nanoparticles Purity: 99.955+%, Size: 65 nm, Metal Basis Technical Properties: True Density (g/cm3) 19,3 Bulk Density (g/cm3) 4,1

Tungsten (W) Sputtering Target

Price range: $63.00 through $629.00
Select options This product has multiple variants. The options may be chosen on the product page

Product 

Tungsten (W) Sputtering Target

CAS No.

7440-33-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

183.84 g/mol

Melting Point

3,422 °C

Boiling Point

5,555 °C

Density

19.25 g/cm³

Product Codes

NCZ-1307K

Tungsten (W) Sputtering Targets, elastomer, Purity: 99.95%, Size: 2”, Thickness: 0.125”

$540.00

Product 

Tungsten (W) Sputtering Targets, elastomer, Purity: 99.95%, Size: 2'', Thickness: 0.125''

CAS No.

7440-33-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 183.84 g/mol

Melting Point

3422 °C

Boiling Point

 5555 °C

Density

19.25 g/cm³

Product Codes

NCZ-1584K

Tungsten (W) Sputtering Targets, elastomer, Purity: 99.95%, Size: 2”, Thickness: 0.125”

$470.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered. The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target. There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Tungsten (W) Sputtering Targets, elastomer, Purity: 99.95%, Size: 3”, Thickness: 0.125”

$739.00

Product 

Tungsten (W) Sputtering Targets, elastomer, Purity: 99.95%, Size: 3'', Thickness: 0.125''

CAS No.

 7440-33-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 183.84 g/mol

Melting Point

3,410 °C

Boiling Point

5,900 °C

Density

19.25 g/cm³

Product Codes

NCZ-1583K

Tungsten (W) Sputtering Targets, elastomer, Purity: 99.95%, Size: 3”, Thickness: 0.125”

$642.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.125”

$83.00

Product 

Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 1'', Thickness: 0.125''

CAS No.

7440-33-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 183.84 g/mol

Melting Point

3422 °C

Boiling Point

 5555 °C

Density

19.25 g/cm³

Product Codes

NCZ-1595K

Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.125”

$76.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.250”

$127.00

Product 

Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 1'', Thickness: 0.250''

CAS No.

7440-33-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 183.84 g/mol

Melting Point

3422 °C

Boiling Point

 5555 °C

Density

19.25 g/cm³

Product Codes

NCZ-1594K

Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.250”

$114.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.125”

$227.00

Product 

Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 2'', Thickness: 0.125''

CAS No.

7440-33-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 183.84 g/mol

Melting Point

3422 °C

Boiling Point

 5555 °C

Density

19.25 g/cm³

Product Codes

NCZ-1593K

Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.125”

$200.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.250”

$315.00

Product 

Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 2'', Thickness: 0.250''

CAS No.

7440-33-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 183.84 g/mol

Melting Point

3422 °C

Boiling Point

 5555 °C

Density

19.25 g/cm³

Product Codes

NCZ-1592K

Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.250”

$276.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.125”

$261.00

Product 

Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 3'', Thickness: 0.125''

CAS No.

7440-33-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 183.84 g/mol

Melting Point

3422 °C

Boiling Point

 5555 °C

Density

19.25 g/cm³

Product Codes

NCZ-1591K

Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.125”

$230.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.250”

$351.00

Product 

Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 3'', Thickness: 0.250''

CAS No.

7440-33-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 183.84 g/mol

Melting Point

3422 °C

Boiling Point

 5555 °C

Density

19.25 g/cm³

Product Codes

NCZ-1590K

Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.250”

$307.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

Even very low quantities of contaminants can be detected with the aid of the sputtering target, allowing for the determination of the target material's composition.

Applications for sputtering targets are also found in space. One type of space weathering is sputtering, which modifies the chemical and physical characteristics of airless worlds like the Moon and asteroids.

Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.125”

$469.00

Product 

Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 4'', Thickness: 0.125''

CAS No.

7440-33-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 183.84 g/mol

Melting Point

3422 °C

Boiling Point

 5555 °C

Density

19.25 g/cm³

Product Codes

NCZ-1589K

Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.125”

$409.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.250”

$587.00

Product 

Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 4'', Thickness: 0.250''

CAS No.

7440-33-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 183.84 g/mol

Melting Point

3422 °C

Boiling Point

 5555 °C

Density

19.25 g/cm³

Product Codes

NCZ-1588K

Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.250”

$511.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.