Silicon (Si) Sputtering Targets, N-type, Purity: 99.999%, Size: 4”, Thickness: 0.250”

$451.00

Product 

Silicon (Si) Sputtering Targets, N-type, Purity: 99.999%, Size: 4'', Thickness: 0.250''

CAS No.

7440-21-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

28.0855 g/mol

Melting Point

 1,414 °C

Boiling Point

3,265 °C

Density

 2.33 g/cm³

Product Codes

NCZ-1760K

Titanium Dioxide (TiO2) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”, Grey to Black

$452.00

Product 

Titanium Dioxide (TiO2) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.250'', Grey to Black

CAS No.

13463‑67‑7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

TiO₂ (black granules) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

79.94 g/mol

Melting Point

~1,843 °C

Boiling Point

~2,972 °C

Density

~4.23 g/cm³

Product Codes

NCZ-1439K

Tantalum Oxide (Ta2O5) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.125”

$452.00

Product 

Tantalum Oxide (Ta2O5) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness: 0.125''

CAS No.

1314-61-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 441.89 g/mol

Melting Point

 ~1872 °C

Boiling Point

N/A

Density

~8.2 g/cm³

Product Codes

NCZ-1654K

Titanium Nitride (TiN) Sputtering Targets, Purity: 99.5%, Size: 1”, Thickness: 0.250”

$453.00

Product 

Titanium Nitride (TiN) Sputtering Targets, Purity: 99.5%, Size: 1'', Thickness: 0.250''

CAS No.

25583-20-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

61.88 g/mol

Melting Point

 ~2950 °C

Boiling Point

~4300 °C

Density

5.22 g/cm³

Product Codes

NCZ-1605K

Tantalum (Ta) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.125”

$453.00

Product 

Tantalum (Ta) Sputtering Targets, Purity: 99.95%, Size: 3'', Thickness: 0.125''

CAS No.

 7440-25-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 180.95 g/mol

Melting Point

3017 °C

Boiling Point

 5458 °C

Density

16.65 g/cm³

Product Codes

NCZ-1663K

Silicon (Si) Sputtering Targets, P-type, Purity: 99.999%, Size: 8”, Thickness: 0.250”

$453.00

Product 

Silicon (Si) Sputtering Targets, P-type, Purity: 99.999%, Size: 8'', Thickness: 0.250''

CAS No.

7440-21-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

28.0855 g/mol

Melting Point

 1,414 °C

Boiling Point

3,265 °C

Density

 2.33 g/cm³

Product Codes

NCZ-1742K

Nickel Iron (Ni-Fe) Sputtering Targets, Purity: 99.5%, Size:4”, Thickness: 0.125”

$453.00

Product 

Nickel Iron (Ni-Fe) Sputtering Targets, Purity: 99.5%, Size:4'', Thickness: 0.125''

CAS No.

Nickel: [7440-02-0], Iron: [7439-89-6]

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 ~57.5 g/mol

Melting Point

 ~1450 °C

Boiling Point

 ~2800 °C

Density

~8.7 g/cm³ (Ni₈₀Fe₂₀) or ~8.1 g/cm³ (Ni₅₀Fe₅₀)

Product Codes

NCZ-1842K

Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”

$453.00

Product 

Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.250''

CAS No.

 ~68189‑52‑4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

<5 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 ~237.54 g/mol

Melting Point

 ~1300–1400 °C

Boiling Point

N/A

Density

 ~6.4–6.5 g/cm³

Product Codes

NCZ-2099K

Aluminum (Al) Nanopowder/Nanoparticles, Purity: 99.995%, Size: 38 nm, Metal Basis

$454.00
Select options This product has multiple variants. The options may be chosen on the product page

Aluminum (Al) Nanopowder/Nanoparticles

Purity: 99.995%, Size: 38 nm, Metal Basis

Technical Properties:

Bulk Density (g/cm3) 0,22
True Density (g/cm3) 2,7
Color black
Shape spherical
Crystal Structure cubic
Average Particle Size (nm) 38
Specific Surface Area (m2/g) 30-45
Elemental Analysis Al Si Fe Cu Mg, Mn, Pb, Ni, Zn
99.995 0.01 0.01 0.03 ≤0.01

Applications:

Aluminum nanoparticles are highly reactive and flammable, therefore it should be handled with care and rapid moves, vibrations should be avoided. Nanopowder should be kept away from sunlight, any kind of heating, moisture and impacts. Coagulation of the particles is a serious problem, so, nanopowder should be sealed under vacuum and should be kept in cool and dry conditions. Air contact should be avoided.Aluminum nanopowder can be used in catalysis applications as well as biomedical research. It can be added to heat transfer fluids, composite materials, package materials, transparent conductive fluids and wear resistant parts in order to strengthen their properties.  

Lithium Phosphate (Li3PO4) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.125”

$454.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Molybdenum Disulfide (MoS2) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”

$454.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Water Soluble Carbon Quantum Dots 625 nm

Price range: $455.00 through $760.00
Select options This product has multiple variants. The options may be chosen on the product page
APPLICATIONS Water Soluble Carbon QDs have many different sectors of application since they are biocompatible. Quantum dots made of water-soluble carbon are employed in;
  • Bioimaging,
  • Biosensors,
  • Heavy Metal Detection,
  • Photocatalysis,
  • Targeted Drug Delivery.

Water Soluble Carbon Quantum Dots 572 nm

Price range: $455.00 through $760.00
Select options This product has multiple variants. The options may be chosen on the product page
APPLICATIONS Water Soluble Carbon QDs have many different sectors of application since they are biocompatible. Quantum dots made of water-soluble carbon are employed in;
  • Bioimaging,
  • Biosensors,
  • Heavy Metal Detection,
  • Photocatalysis,
  • Targeted Drug Delivery.

Water Soluble Carbon Quantum Dots 528 nm

Price range: $455.00 through $760.00
Select options This product has multiple variants. The options may be chosen on the product page
APPLICATIONS Water Soluble Carbon QDs have many different sectors of application since they are biocompatible. Quantum dots made of water-soluble carbon are employed in;
  • Bioimaging,
  • Biosensors,
  • Heavy Metal Detection,
  • Photocatalysis,
  • Targeted Drug Delivery.

Water Soluble Carbon Quantum Dots 515 nm

Price range: $455.00 through $760.00
Select options This product has multiple variants. The options may be chosen on the product page
APPLICATIONS Water Soluble Carbon QDs have many different sectors of application since they are biocompatible. Quantum dots made of water-soluble carbon are employed in;
  • Bioimaging,
  • Biosensors,
  • Heavy Metal Detection,
  • Photocatalysis,
  • Targeted Drug Delivery.

Water Soluble Carbon Quantum Dots 505 nm

Price range: $455.00 through $760.00
Select options This product has multiple variants. The options may be chosen on the product page
APPLICATIONS Water Soluble Carbon QDs have many different sectors of application since they are biocompatible. Quantum dots made of water-soluble carbon are employed in;
  • Bioimaging,
  • Biosensors,
  • Heavy Metal Detection,
  • Photocatalysis,
  • Targeted Drug Delivery.

Water Soluble Carbon Quantum Dots 420 nm

Price range: $455.00 through $760.00
Select options This product has multiple variants. The options may be chosen on the product page
APPLICATIONS Water Soluble Carbon QDs have many different sectors of application since they are biocompatible. Quantum dots made of water-soluble carbon are employed in;
  • Bioimaging,
  • Biosensors,
  • Heavy Metal Detection,
  • Photocatalysis,
  • Targeted Drug Delivery.

Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”

$455.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Yttrium Ferrite (Y3Fe5O12) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”

$455.00

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Chromium (Cr) Sputtering Targets, Purity: 99.95%, Size: 6”, Thickness: 0.125”

$455.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Silvery, shiny, hard, and brittle, chromium is a metal that resists corrosion and has a high mirror polish. The automotive industry finds extensive use for chromium sputtering targets. Chromium sputtering targets work well as a shiny coating for bumpers and wheels. Chromium sputtering targets can be employed in a variety of vacuum applications, such as automotive glass coatings.

Copper (Cu) Sputtering Targets, Purity: 99.99%, Size: 8”, Thickness: 0.250”

$455.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”

$455.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Silicon Carbide Wafer (SiC-4H)- 4H, Size: 2”, Thickness: 350 μm, Mechanical Grade, 4H Area: 95%

Price range: $456.00 through $2,010.00
Select options This product has multiple variants. The options may be chosen on the product page
Silicon Carbide Wafer (SiC-4H) – 4H Size: 2”, Thickness: 350 μm, 4H Area: 95% Technical Properties: Quality Dummy Grade Size (inch)  2”

Cobalt Iron Boron (Co-Fe-B) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.125”

$456.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

An alloy consisting of cobalt, iron, and boron can be utilized as a sputtering target. Let's examine the possible uses for cobalt, iron, and boron alloys.

Magnesium (Mg) Sputtering Targets, Purity: 99.98%, Size: 6”, Thickness: 0.250”

$456.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Silicon (Si) Sputtering Targets, N-type, Purity: 99.999%, Size: 8”, Thickness: 0.250”

$456.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered. Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

Shape Memory Polymer NGM5520, Ether Type

Price range: $457.00 through $6,057.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Shape Memory Polymer (SMP) has myriad of advanced applications in different fields from daily life uses like textile to biomedicals. These applications include smart catheter, drug-delivery systems, biosensors, auto-repairing automobile parts, smart textile, self-healing materials, smart suture, artificial organs like muscles, and so on.

Multi-walled Carbon Nanotube Paper, 50-60um Thickness

$457.00
Product Multi-walled Carbon Nanotube Paper, 50-60um Thickness
CAS No. 308068-56-6
Appearance Black to dark gray
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 50-60um ( (Size Can be customized),  Ask for other available size range.
Ingredient C
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 0.4 – 1.5 g/cm³
Product Codes NCZ-460I

Boron Nitride (BN) Sputtering Targets, Purity: 99.5%, Size: 2”, Thickness: 0.125”

$457.00

Product 

Boron Nitride (BN) Sputtering Targets, Purity: 99.5%, Size: 2'', Thickness: 0.125''

CAS No.

 10043-11-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

24.82 g/mol

Melting Point

~2973 °C

Boiling Point

N/A

Density

~2.1 g/cm³

Product Codes

NCZ-2373K

Zinc Oxide (ZnO) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”

$458.00

Product 

Zinc Oxide (ZnO) Sputtering Targets, Purity: 99.9%, Size: 1'', Thickness: 0.250''

CAS No.

1314‑13‑2

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

ZnO (black granules) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

81.38 g/mol

Melting Point

~1975 °C

Boiling Point

~2360 °C

Density

 ~5.61 g/cm³

Product Codes

NCZ-1455K

Zinc Oxide (ZnO) with Alumina Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”

$458.00

Product 

Zinc Oxide (ZnO) with Alumina Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.125''

CAS No.

ZnO: 1314-13-2 Al₂O₃: 1344-28-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

ZnO + Al₂O₃ (AZO)(black granules) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

ZnO: 81.38 g/mol Al₂O₃: 101.96 g/mol

Melting Point

~1975 °C

Boiling Point

N/A

Density

~5.6 g/cm³

Product Codes

NCZ-1488K

Cerium Nitrate Hexahydrate (Ce(NO3)3 · 6H2O) 99.95% 3N5

$458.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Cerium Nitrate Hexahydrate (Ce(NO3)3 · 6H2O) 99.95% 3N5
CAS No. 10294-41-4
Appearance White crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Ce(NO3)3·6H2O
Molecular Weight 434.22 g/mol
Melting Point N/A
Boiling Point N/A
Density 2.6 g/cm³
Product Codes NCZ-315I

Europium Nitrate Pentahydrate (Eu(NO3)3 · 5H2O) 99.99% 4N

$458.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Europium Nitrate Pentahydrate (Eu(NO3)3 · 5H2O) 99.99% 4N
CAS No. 63026-01-7
Appearance White to off-white crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 40–100µm (Size Can be customized),  Ask for other available size range.
Ingredient Eu(NO3)3·5H2O
Molecular Weight 428.06 g/mol
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-345I
 

Silicon Nitride (Si3N4) Sputtering Targets, Purity: 99.5%, Size: 2”, Thickness: 0.125”, Dark Gray to Black

$459.00

Product 

Silicon Nitride (Si3N4) Sputtering Targets, Purity: 99.5%, Size: 2'', Thickness: 0.125'', Dark Gray to Black

CAS No.

 12033-89-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 140.28 g/mol

Melting Point

 ~1900 °C

Boiling Point

N/A

Density

~3.2 g/cm³

Product Codes

NCZ-1701K

Water Soluble Cadmium Selenide Quantum Dots (CdSe/ZnS) 645 nm

Price range: $460.00 through $1,155.00
Select options This product has multiple variants. The options may be chosen on the product page
APPLICATIONS Water-soluble CdSe QDs have several sectors of application since they are biocompatible. Uses for water-soluble CdSe quantum dots include;
  • Heavy Metal
  • Detection Bioconjugation
  • Optoelectronic devices
  • Biological imaging.

Water Soluble Cadmium Selenide Quantum Dots (CdSe/ZnS) 545 nm

Price range: $460.00 through $1,520.00
Select options This product has multiple variants. The options may be chosen on the product page

APPLICATIONS

Water Soluble CdSe QDs have several sectors of application since they are biocompatible. Uses for water-soluble CdSe quantum dots include;

  • Heavy Metal Detection,
  • Bioconjugation,
  • Optoelectronic devices,
  • Biological imaging.

Water Soluble Cadmium Selenide Quantum Dots (CdSe/ZnS) 525 nm

Price range: $460.00 through $1,520.00
Select options This product has multiple variants. The options may be chosen on the product page

APPLICATIONS

Water Soluble CdSe QDs have several sectors of application since they are biocompatible. Uses for water-soluble CdSe quantum dots include;

  • Heavy Metal Detection,
  • Bioconjugation,
  • Optoelectronic devices,
  • Biological imaging.

Water Soluble Cadmium Selenide Quantum Dots (CdSe/ZnS) 500 nm

Price range: $460.00 through $1,520.00
Select options This product has multiple variants. The options may be chosen on the product page

APPLICATIONS

Water Soluble CdSe QDs offer a wide range of applications because of their biocompatibility. Utilizing Water Soluble CdSe Quantum Dots in;

  • Heavy Metal Detection,
  • Bioconjugation,
  • Optoelectronic devices,
  • Biological imaging.

Water Soluble Cadmium Selenide Quantum Dots (CdSe/ZnS) 470 nm

Price range: $460.00 through $1,520.00
Select options This product has multiple variants. The options may be chosen on the product page

APPLICATIONS

Water Soluble CdSe QDs have several sectors of application since they are biocompatible. Uses for water-soluble CdSe quantum dots include;

  • Heavy Metal Detection,
  • Bioconjugation,
  • Optoelectronic devices,
  • Biological imaging.

Water Soluble Cadmium Selenide Quantum Dots (CdSe/ZnS) 450 nm

Price range: $460.00 through $1,520.00
Select options This product has multiple variants. The options may be chosen on the product page

APPLICATIONS

Water Soluble CdSe QDs have several sectors of application since they are biocompatible. Uses for water-soluble CdSe quantum dots include;

  • Heavy Metal Detection,
  • Bioconjugation,
  • Optoelectronic devices,
  • Biological imaging.

Water Soluble Indium Phosphide Quantum Dots (InP/ZnS QD) 700 nm

Price range: $460.00 through $1,155.00
Select options This product has multiple variants. The options may be chosen on the product page
APPLICATIONS Water Soluble InP QDs have several domains of use because of their biocompatibility. InP Quantum Dots that are Water Soluble are employed in;
  • Bioconjugation,
  • Bioimaging,
  • Biolabeling.

Water Soluble Indium Phosphide Quantum Dots (InP/ZnS QD) 625 nm

Price range: $460.00 through $1,155.00
Select options This product has multiple variants. The options may be chosen on the product page
APPLICATIONS Water Soluble InP QDs have several domains of use because of their biocompatibility. InP Quantum Dots that are Water Soluble are employed in;
  • Bioconjugation,
  • Bioimaging,
  • Biolabeling.

Water Soluble Indium Phosphide Quantum Dots (InP/ZnS QD) 600 nm

Price range: $460.00 through $1,155.00
Select options This product has multiple variants. The options may be chosen on the product page
APPLICATIONS Water Soluble InP QDs have several domains of use because of their biocompatibility. InP Quantum Dots that are Water Soluble are employed in;
  • Bioconjugation,
  • Bioimaging,
  • Biolabeling.

Water Soluble Indium Phosphide Quantum Dots (InP/ZnS QD) 560 nm

Price range: $460.00 through $1,155.00
Select options This product has multiple variants. The options may be chosen on the product page
APPLICATIONS Water Soluble InP QDs have several domains of use because of their biocompatibility. InP Quantum Dots that are Water Soluble are employed in;
  • Bioconjugation,
  • Bioimaging,
  • Biolabeling.

Water Soluble Indium Phosphide Quantum Dots (InP/ZnS QD) 525 nm

Price range: $460.00 through $1,155.00
Select options This product has multiple variants. The options may be chosen on the product page
APPLICATIONS Water Soluble InP QDs have several domains of use because of their biocompatibility. InP Quantum Dots that are Water Soluble are employed in;
  • Bioconjugation,
  • Bioimaging,
  • Biolabeling.

Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”

$460.00

Product 

Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''

CAS No.

7440-65-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

88.91 g/mol

Melting Point

1522 °C

Boiling Point

3338 °C

Density

4.47 g/cm³

Product Codes

NCZ-1521K

Tetra-needle like Zinc oxide whisker(ZnO, D=0.5-5μm, L=10-50μm) (124671)

$460.00
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Tetra-needle like Zinc oxide whisker(ZnO, D=0.5-5μm, L=10-50μm) (124671)

Property Descriptions
Appearance white and loose powder
Microstructure Tetra-needle like with nanotips
Crystal structure Single crystal, wurtzite
Length of needle(μm) 10~50
Diameter of needle root (μm) 0.5~5
Apparent density (g/cm3) 0.2±0.1
True density (g/cm3) 5.5±0.2
Whiteness (%) ≥80
Powder resistivity (Ω.cm) 105 ~108
Thermal expansion coefficient (%/℃) 4.0×10-6
Heat resistance (℃) ≥1000℃
    Features 1. High strength: T-ZnOw is of single wurtzite crystal with almost no structure defects. It is nearly a kind of ideal crystal with high mechanical strength and modulus of elasticity. Its tensile strength and modulus of elasticly reach 1.0×104 Mpa and 3.5×105 Mpa respectively, close to the theoretical values. 2. Isotropic behaviour: the unique three-dimensional tetra-needle like structure give it isotropic reinforcing and modification effect, guaranteeing products with isotropic mechanical properties, dimension homogeneity, thermal contraction and other characteristics. 3. Excellent heat resistance: Melting point of ZnO is higher than 1800°C, and T-ZnOw can resist 1750°C . Higher than 1000°C under atmospheric pressure may result in structure damage at the needle tip. 4.  Adjustable electric properties: ZnO is a n-type of semiconductor that can be doped to control its conductivity, piezoelectricity, piezosensitivity and other electric and electronic properties. 5.  Activity of nanosemiconductor: T-ZnOw has special nanoactivity due to its unique structure. With the nonstoichiometric characteristic, T-ZnOw can release reactive oxygen species, giving it high efficient, broad spectrum and long-term antibacterial and environmental cleaning property. Applications  1.  Antistatic polymer (white, high efficient, permanent and reinforcing effect, wear resistant property) 2. Wear-resistant and antiskidding materials (high-grade rubber tyres, brake, gear, rubber belt conveyer, etc.) 3.  Microwave-absorption materials (wave-absorbing and stealthy materials, electromagnetic shielding materials, etc.) 4. Vibration and damping materials (structural vibration, industrial damping, noise reduction materials) 5. Toughening for ceramic materials (craft ceramics, structural ceramics, special ceramics) 6. Enhanced composite materials (to improve the mechanical properties, processing performance, strength and elasticity modulus) 7. Antibacterial and antialgae composite materials (home appliances, daily necessities, textiles, paints) 8.  Decomposition of formaldehyde and other organic compounds (from decoration materials, indoor air) Instruction for use Mix matrix materials with T-ZnOw and other auxiliary agents and process as original production technology. Coupling agent and dispersing agent are recommended to add for strengthening the combining ability between T-ZnOw and matrix materials. Dosage Usually 5wt% to 15wt%. Note This product is only available to customers in USA and Canada by FedEx Ground.  
Product Codes- NCZ-2755K

Bismuth (Bi) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 78 nm, Metal Basis

$461.00
Select options This product has multiple variants. The options may be chosen on the product page
100 grams/405 €
Please contact us for quotes on larger quantities !!!

Bismuth (Bi) Nanopowder/Nanoparticles

Purity: 99.95%, Size: 78 nm, Metal Basis

Technical Properties:

Shape spherical
Tmelting (oC) 271
Tboiling (oC) 1560
Average Particle Size (nm) 78
Specific Surface Area (m2/g) 17-28
Elemental Analysis Bi O S C Si Na Others
99.95 0.07 0.005 0.004 0.002 0.002 0.001
 

Lanthanum Nitrate Hexahydrate (La(NO3)3 · 6H2O) 99.9% 3N

$461.00
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Product Lanthanum Nitrate Hexahydrate (La(NO3)3 · 6H2O) 99.9% 3N
CAS No. 10294-41-4
Appearance White crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1-10nm (Size Can be customized),  Ask for other available size range.
Ingredient La(NO3)3·6H2O
Molecular Weight 433.01 g/mol
Melting Point N/A
Boiling Point N/A
Density 2.3 g/cm³
Product Codes NCZ-440I

3N (99.9%) Boron (B) Pieces Evaporation Materials

Price range: $462.00 through $867.00
Select options This product has multiple variants. The options may be chosen on the product page
Product 3N (99.9%) Boron (B) Pieces Evaporation Materials
CAS No. 7440-42-8
Appearance Black, Semi-metallic 
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1–10mm (Size Can be customized),  Ask for other available size range.
Ingredient B
Molecular Weight 143.95 g/mol
Melting Point N/A
Boiling Point N/A
Density 2.34 g/cm³
Product Codes NCZ-134E
 

Molybdenum Oxide (MoO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”

$462.00

Product 

Molybdenum Oxide (MoO3) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.125''

CAS No.

1313-27-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 143.94 g/mol

Melting Point

 ~795°C

Boiling Point

 ~1155°C

Density

 ~4.7 g/cm³

Product Codes

NCZ-1901K

Nickel (Ni) Coated Multi-Walled Carbon Nanotubes, 30g

Price range: $462.00 through $484.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Nickel (Ni) Coated Multi-Walled Carbon Nanotubes, 30g
CAS No. N/A
Appearance Black fibrous
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 10–50nm ( (Size Can be customized),  Ask for other available size range.
Ingredient Ni
Molecular Weight 12.01 g/mol
Melting Point N/A
Boiling Point N/A
Density 0.27–0.83 g/cm³
Product Codes NCZ-476I
 

Two-dimensional NiFe Layered Double Oxide (NiFe-LDO) Powder, 500 mg/bottle

$462.00
Product Two-dimensional NiFe Layered Double Oxide (NiFe-LDO) Powder, 500 mg/bottle
CAS No. N/A
Appearance Brown
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 10–30nm (Size Can be customized),  Ask for other available size range.
Ingredient NiFe₂O₄
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 4.5 – 5.0 g/cm³
Product Codes NCZ-587I

Molybdenum Disilicide (MoSi2) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.250”

$463.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered. By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized. There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Manganese (Mn) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.125”

$463.00

Product 

Manganese (Mn) Sputtering Targets, Purity: 99.95%, Size: 2'', Thickness: 0.125''

CAS No.

 7439-96-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

54.93804 g/mol

Melting Point

 1,246 °C

Boiling Point

 2,061 °C

Density

 7.21 g/cm³

Product Codes

NCZ-1952K

Sodium carboxymethyl cellulose(Food grade) (553866)

$463.00
Select options This product has multiple variants. The options may be chosen on the product page

Product 

Sodium carboxymethyl cellulose(Food grade) (553866)

CAS No.

  9004-34-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

<100 μm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

~17,000–800,000 g/mol

Melting Point

 ~274 °C (decomposes)

Boiling Point

N/A

Density

~1.5–1.6 g/cm³

Product Codes

NCZ-2602K

Yttrium (Y) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”

$464.00

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Niobium Oxide (Nb2O5) Sputtering Targets, indium, Purity: 99.5%, Size: 4”, Thickness: 0.125”

$464.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Cadmium Telluride (CdTe) Sputtering Target

Price range: $464.00 through $1,375.00
Select options This product has multiple variants. The options may be chosen on the product page

Product 

Cadmium Telluride (CdTe) Sputtering Target

CAS No.

1306-25-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 240.01 g/mol

Melting Point

~1,041 °C

Boiling Point

~1,050 °C

Density

~6.2 g/cm³

Product Codes

NCZ-1344K

Molybdenum Disilicide (MoSi2) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.125”

$464.00

Product 

Molybdenum Disilicide (MoSi2) Sputtering Targets, Purity: 99.95%, Size: 2'', Thickness: 0.125''

CAS No.

12136-78-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

152.11 g/mol

Melting Point

 ~2030 °C

Boiling Point

 ~2300 °C to 2500 °C

Density

~6.26 g/cm³

Product Codes

NCZ-1927K