Barium Fluoride (BaF2) Sputtering Targets, Purity: 99.99%, Size: 6”, Thickness: 0.250”

$2,316.00

Product 

Barium Fluoride (BaF2) Sputtering Targets, Purity: 99.99%, Size: 6'', Thickness: 0.250''

CAS No.

 7787-32-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

< 5 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

175.32 g/mol

Melting Point

 1,368 °C

Boiling Point

2,260 °C

Density

 4.89 g/cm³

Product Codes

NCZ-2478K

High Purity 99.9% Lithium Nitride (Li3N) for Solid State Lithium Batteries, -50 Mesh

Price range: $605.00 through $2,316.00
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Product High Purity 99.9% Lithium Nitride (Li3N) for Solid State Lithium Batteries, -50 Mesh
CAS No. 26134-62-3
Appearance Reddish to purplish
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 300µm (Size Can be customized),  Ask for other available size range.
Ingredient Li₃N
Molecular Weight 34.83 g/mol
Melting Point 813 °C
Boiling Point N/A
Density 1.27 g/cm³
Product Codes NCZ-399I

Perovskite Quantum Dots (CsPbI3) 670 nm

Price range: $790.00 through $2,315.00
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APPLICATIONS Numerous fields of application are possible for PVK quantum dots because of their electrical and optoelectronic characteristics. Uses for PVK Quantum Dots include;
  • Biosensors,
  • Bioimaging,
  • Light Emitting Diodes (LEDs),
  • Photodetectors,
  • Solar Cells,
  • Photocatalyst.

Indium (III) Oxide ( In2O3) 99.999% 5N Powder

Price range: $249.00 through $2,302.00
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Product Indium (III) Oxide ( In2O3) 99.999% 5N Powder
CAS No. 1312-43-2
Appearance light yellow
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient In2O3
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-428I

Indium Tin Oxide (ITO, 90:10wt%) Blue Nanopowder 99.99% (4N), 100g

Price range: $249.00 through $2,302.00
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Product Indium Tin Oxide (ITO, 90:10wt%) Blue Nanopowder 99.99% (4N), 100g
CAS No. 1312-43-2
Appearance Fine blue or blue-gray
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 30-50nm (Size Can be customized),  Ask for other available size range.
Ingredient In2−xSnxO3​
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 7.1 g/cm³
Product Codes NCZ-425I
 

Aluminum (Al) Sputtering Target

Price range: $179.00 through $2,300.00
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Product 

Aluminum (Al) Sputtering Target

CAS No.

7429-90-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N\A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

26.98 g/mol

Melting Point

 660.3 °C

Boiling Point

 2,470 °C

Density

~2.70 g/cm³

Product Codes

NCZ-1284K

(-COOH) Functionalized Short Length Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: < 8 nm

Price range: $74.00 through $2,280.00
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Applications:

Multi Walled Carbon Nanotubes have a variety of potential applications in different fields. These applications include medicine, mechanics, electric-electronics, chemicals, energy and others. It can be applied in, 1-drug delivery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium batteries, 8-gas-discharge tubes, 9-flat panel displays, 10-supercapacitors, 11-transistors, 12-solar cells, 13-photoluminescence, 14-templates  

Cr2C MXenes

Price range: $175.00 through $2,275.00
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Product Name: Cr2C MXenes

Product Code: NCZ-MX-201

Product Cr2C MXene 
Colour Black Powder
Purity ≥98 wt%
Ingredient Cr2C
CAS NO 12316-56-2

Cr2C MXenes APPLICATION FIELDS

High-temperature coating, Mxene precursor, conductive self-lubricating ceramic, lithium-ion battery, supercapacitor, electrochemical catalysis.

RELATED INFORMATION

Storage Conditions: Airtight sealed, avoid light and keep dry at room temperature. Please email us for the customization. Email: contact@nanochemazone.com

(-OH) Functionalized Short Length Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: < 8 nm

Price range: $74.00 through $2,274.00
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Applications:

Multi Walled Carbon Nanotubes have a variety of potential applications in different fields. These applications include medicine, mechanics, electric-electronics, chemicals, energy and others. It can be applied in, 1-drug delivery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium batteries, 8-gas-discharge tubes, 9-flat panel displays, 10-supercapacitors, 11-transistors, 12-solar cells, 13-photoluminescence, 14-templates

Iron Nanoparticles/ Nanopowder ( Fe, 99.7%, 60~80nm)

Price range: $120.00 through $2,263.00
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$120/25g
$350/100g
$2263/kg

Product 

Iron Nanoparticles/ Nanopowder ( Fe, 99.7%, 60~80nm)

CAS No.

7439-89-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

300 nm (Size Can be customized), Ask for other available size ranges.

Ingredient

AlN

Molecular Weight

63.55 g/mol

Melting Point

1084.62 °C

Boiling Point

2562 °C

Density

8.96 g/cm³

Product Codes

NCZ-1042K

Barium Titanate (BaTiO3) Sputtering Targets, Purity: 99.99%, Size: 8”, Thickness: 0.250”

$2,250.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. When the target shatters,

Mass spectrometry measures the concentration and identity of sputtered atoms. The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Formulated as BaTiO3, barium titanate is an inorganic substance. When formed as big crystals, barium titanate is clear and has a white powdery appearance. It is a ferroelectric ceramic material with piezoelectric and photorefractive characteristics. Titanate of barium sputtering Agents have various applications. For instance, barium titanate films, which are produced by sputtering targets, can be employed in particular electronic ceramics. Barium titanate can be utilized in the building of electrical devices such as sensors, capacitors, and detectors.

Barium Fluoride (BaF2) Sputtering Targets, Purity: 99.99%, Size: 8”, Thickness: 0.125′

$2,250.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. When the target shatters,

Mass spectrometry measures the concentration and identity of sputtered atoms. The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

A chemical compound consisting of barium and fluorine, barium fluoride (BaF2) is a salt. It is a solid that has the potential to be a clear crystal. A is barium fluoride.

Barium Fluoride (BaF2) Sputtering Targets, Purity: 99.99%, Size: 8”, Thickness: 0.250”

$2,250.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. When the target shatters,

Mass spectrometry measures the concentration and identity of sputtered atoms. The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

A chemical compound consisting of barium and fluorine, barium fluoride (BaF2) is a salt. It is a solid that has the potential to be a clear crystal. A is barium fluoride.

Gallium Arsenide (GaAs) Wafers, Size: 2”, Thickness: 350±25 μm, Double Side Polished, EPI-ready, Dopant: Zinc (P Type)

Price range: $151.00 through $2,250.00
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Gallium Arsenide (GaAs) Wafer Size: 2”, Double Side Polished, Thickness: 350± 25 μm, EPI-ready, Dopant: Zinc (P Type) Technical Properties:

Dysprosium (III) Oxide (Dy2O3) Powder 99.99% 4N

Price range: $238.00 through $2,246.00
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Product Dysprosium (III) Oxide (Dy2O3) Powder 99.99% 4N
CAS No. 1308-87-8
Appearance Fine white to pastel yellow–green crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1–5µm (Size Can be customized),  Ask for other available size range.
Ingredient Dy2O3
Molecular Weight 372.998 g/mol
Melting Point 2 408 °C
Boiling Point N/A
Density 7.80–7.81 g/cm³
Product Codes NCZ-338I

Short Length Multi Walled Carbon Nanotubes, Purity: > 96%, Outside Diameter: < 8 nm

Price range: $81.00 through $2,244.00
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Applications:

Multi Walled Carbon Nanotubes have a variety of potential applications in different fields. These applications include medicine, mechanics, electric-electronics, chemicals, energy and others. It can be applied in, 1-drug delivery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium batteries, 8-gas-discharge tubes, 9-flat panel displays, 10-supercapacitors, 11-transistors, 12-solar cells, 13-photoluminescence, 14-templates

(-COOH) Functionalized Graphitized Multi Walled Carbon Nanotubes, Purity: > 99.99%, Outside Diameter: 18-28 nm

Price range: $73.00 through $2,241.00
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Applications:

Multi Walled Carbon Nanotubes have a variety of potential applications in different fields. These applications include medicine, mechanics, electric-electronics, chemicals, energy and others. It can be applied in, 1-drug delivery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium batteries, 8-gas-discharge tubes, 9-flat panel displays, 10-supercapacitors, 11-transistors, 12-solar cells, 13-photoluminescence, 14-templates

Borosilicate Wafer, Size: 8”, 2-Side Polished, Thickness: 1250 ± 25 μm

Price range: $121.00 through $2,238.00
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Borosilicate Wafer Size: 8”, 2- Side Polished, Thickness: 1250 ± 25 μm Technical Properties: Materials Borosilicate Size (inch) 8” Orientation

Polyhydroxylated Fullerene (Fullerenols)/ C60, (-OH) Functionalized, Dispersed in Water, 250 ppm Dry powder

Price range: $127.00 through $2,228.00
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25 ml/114 € 100 ml/345 € 500 ml/1350 € 1000 ml/1990 € Please contact us for quotes on larger quantities.

Polyhydroxylated Fullerene (Fullerenols)/ C60

(-OH) Functionalized, Dispersed in Water, 250 ppm Dry powder

The starting material is >98% purity C60 fullerenes. C60 bearing over 40 hydroxyl groups that have higher water solubility (>50 mg/mL). These exist as monodisperse nanoparticles in water, and have a valiant polishing effect. They exhibit superior antioxidant and anti-inflammatory properties.

Applications:

1. Pharmaceutical: Diagnostic reagents, super drugs, cosmetics, nuclear magnetic resonance (NMR) with the developer. DNA affinity, anti-HIV drugs, anti-cancer drugs, chemotherapy drugs, cosmetics additives and scientific research. 2. Energy: Solar battery, fuel cell, secondary battery. 3. Industry: Wear resistant material, flame retardant materials, lubricants, polymer additives, high-performance membrane, catalyst, artificial diamond, hard alloy, electric viscous fluid, ink filters, high-performance coatings, fire retardant coatings, manufacturing bioactive materials , memory materials, embedded molecular and other characteristics, composite materials etc. 4. Information industry: Semiconductor record medium, magnetic materials, printing ink, toner, ink, paper special purposes. 5. Electronic parts: Superconducting semiconductor, diodes, transistors, inductor.  , 6. Optical materials, electronic camera, fluorescence display tube, nonlinear optical materials. 7. Environment: Gas adsorption, gas storage.  

Lanthanum (La) Micron Powder, Purity: 99.5 %, Size: 325 mesh

Price range: $37.00 through $2,225.00
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Applications:

Lanthanum is the first element in the rare earth or lanthanide series. It is the second most abundant element of the rare earths after cerium. Lanthanum can be found in minerals such as monazite and bastnasite. It is one of the most reactive elements in the rare earth metals. It reacts directly with elemental carbon, nitrogen, boron, selenium, silicon, phosphorus, sulfur and with halogens. It oxidizes rapidly when exposed to air. Lanthanum has application in glass and ceramic manufacturing. It is used in making special optical glasses, such as infrared absorbing glass. Because of its high refractive index and low dispersion indices Lanthanum is used as doping agents in camera and telescope lenses. It is also used in alloys such as high strength alloy steels. In catalysis Lanthanum is used in petroleum cracking and has also catalytic applications in chemical industry.

Silver (Ag) Nanopowder/Nanoparticles Dispersion, Purity: 99.99%, Size: 14 nm, 52000 ppm

Price range: $211.00 through $2,220.00
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Applications:

This research grade product brings special properties of silver (Ag) nanoparticles into a solution. This way silver nanoparticles find further applications in the research studies. It is an easy to use dispersion and can be diluted with water addition and simple mixing. This dispersion can be used in the applications where antibacterial protection is needed. It can be used in antibacterial finishing of textiles (such as leather), paper products, deodorants for personal belongings (such as toys, footwear), deodorizing agents in paints and skin related medical products (such as antibacterial gels and lotions). Also, it can be added to many different polymers/plastics such as poly ethylene, polypropylene, ABS etc. as an antibacterial reagent. Note: Silver nanoparticle dispersion product should be kept away from sunlight. It is a research grade product, it should be handled by professional people. If nanoparticles begin to agglomerate after stored for a long time, the dispersion can be simply mixed before use.

Iron Nickel (Fe-Ni) Alloy Powder, Purity: 99.9%, Size: 325 mesh, Fe/Ni: 5:5

Price range: $38.00 through $2,220.00
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5 grams/34 € 25 grams/98 €                        
100 grams/295 €                     
500 grams/860 €                    
1000 grams/1970 € Please contact us for quotes on larger quantities !!!

Iron Nickel (Fe-Ni) Alloy Powder

Purity: 99.9%, Size: 325 mesh, Fe/Ni: 5:5

 

Hydrothermal Synthesis Autoclave Reactor with PPL Lined Vessel 500 ml

Price range: $495.00 through $2,215.00
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APPLICATIONs
  • Chemical synthesis
  • Synthesizing of nanoparticles
  • For cultured crystal growth
  • Polymerization reaction
  • Hydrothermal decomposition
  • Catalyst synthesis
  • Hydrothermal oxidation
  • Hydrothermal precipitation
  • Material Digester / digestion
  • Crystallization process
  • Dissolve of heavy metals, refractory material, organic chemicals etc.
 

Aluminum-Silicon (AlSi) Alloy Powder, Al85Si15, APS: 50nm, Purity: 99.9%

Price range: $145.00 through $2,214.00
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Aluminum-Silicon (AlSi) Alloy Powder, Al85Si15, APS: 50nm, Purity: 99.9% Performance characteristics Nano Al-Si alloy powder is prepared by gas phase CVD method, the alloy ratio can be adjusted appropriately, the purity is high, the particle size is small, the distribution is uniform, the surface area is large, the loose density is small, not easy to crack, easy to disperse, large industrial output, easy to disperse the alloy Among the materials and ceramic materials, the specific gravity is small, the weight is light, the thermal conductivity is good, the coefficient of expansion is small, the wear resistance is good, the volume stability is good, and it has certain room temperature and high temperature mechanical properties. Product parameter
APS 50 nm
Purity 99.9 %
BET Surface Area 29.64 m2/g
Theoritical density 2.684 g/cm3
Bulk density 0.896 g/cm3
Melting Point 400 °C
Boiling Point 1100 °C
Shape Spherical
Color Black Powder
Manufacturing Method CVD

Vanadium Nitrade (VN) Nanopowder, APS: 40nm, Purity: 99.9%

Price range: $145.00 through $2,208.00
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Vanadium Nitrade (VN) Nanopowder, APS: 40nm, Purity: 99.9% Performance characteristics Nano vanadium nitride powder is prepared by high frequency plasma gas phase synthesis method, with high purity, no free carbon black dot impurities, no ammonium chloride impurities, uniform particle size distribution, large mass production, and can be applied to cemented carbide in large quantities Its surface activity can be well dispersed in the alloy material and play the role of alloy dispersion strengthening. Vanadium nitride, also known as vanadium-nitrogen alloy, is a new type of alloy additive that can replace ferro-vanadium in the production of microalloyed steel. The addition of vanadium nitride to steel can improve the comprehensive mechanical properties of steel such as strength, toughness, ductility and thermal fatigue resistance, and make the steel have good weldability. When the same strength is reached, adding nano-vanadium nitride can save 30-40% of vanadium addition, thereby reducing costs. Applications
  • Vanadium-nitrogen alloy can be used in structural steel, tool steel, pipe steel, steel bar and cast iron. Vanadium-nitrogen alloy used in high-strength low-alloy steel can simultaneously carry out effective vanadium and nitrogen microalloying, promote the precipitation of carbon, vanadium, and nitrogen compounds in the steel, and more effectively play the role of settlement strengthening and grain refinement;
  • Nano-vanadium nitride (VN) has very high thermal, chemical stability and strong mechanical properties, and is widely used in cutting tools, abrasive tools and structural materials; it is also a good catalyst with high catalytic activity and high selectivity , Good stability and anti-poisoning performance. Fine-grained VN can effectively increase the catalytic activity and improve the toughness of structural materials.
Packaging and storage This product is packaged in an inert gas plastic bag, sealed and stored in a dry, cool environment. It should not be exposed to the air to prevent oxidation and agglomeration due to moisture, which will affect the dispersion performance and use effect; the number of packages can be provided according to customer requirements and packed.

Copper Nickel Alloy Nanopowder, Cu55Ni45, APS: 50nm, Purity: 99.9%

Price range: $148.00 through $2,207.00
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Copper Nickel Alloy Nanopowder, Cu55Ni45, APS: 50nm, Purity: 99.9% Performance characteristics Nano-copper-nickel alloy powder is prepared by gas phase CVD method, the alloy ratio can be adjusted appropriately, the purity is high, the particle size is small, the distribution is uniform, the surface area is large, easy to disperse, the industrial production is large, and it has good mechanical properties at room temperature and high temperature strength. It has high corrosion resistance, good wear resistance, easy processing, and non-magnetic. It is a good structural material for manufacturing traveling wave tubes and other electron tubes, and can also be used as a structural material for aero engines. Product parameter
APS 50 nm
Purity 99.9 %
BET Surface Area 28.84 m2/g
Theoritical density 8.800 g/cm3
Bulk density 0.949 g/cm3
Melting Point 900 °C
Boiling Point 1500 °C
Shape Spherical
Color Black Powder
Manufacturing Method CVD

Copper-Zinc Alloy Nanopowder, Cu55Zn45, Average Particle Size: 50nm, Purity: 99.9%

Price range: $145.00 through $2,206.00
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Copper-Zinc Alloy Nanopowder, Cu55Zn45, Average Particle Size: 50nm, Purity: 99.9%  Performance characteristics Nano copper-zinc alloy powder is prepared by gas phase CVD method, the alloy ratio can be adjusted appropriately, the purity is high, the particle size is small, the distribution is uniform, the surface area is large, it is easy to disperse, the industrial production is large, and it has good strength, thermal conductivity, wear resistance and Color. Product parameter
APS 50 nm
Purity 99.9 %
BET Surface Area 29.02 m2/g
Theoritical density 6.751 g/cm3
Bulk density 0.899 g/cm3
Melting Point 400 °C
Boiling Point 1100 °C
Shape Spherical
Color Black Powder
Manufacturing Method CVD

Lithium Phosphate (Li3PO4) Sputtering Targets, Purity: 99.95%, Size: 8”, Thickness: 0.125”

$2,203.00

Product 

Lithium Phosphate (Li3PO4) Sputtering Targets, Purity: 99.95%, Size: 8'', Thickness: 0.125''

CAS No.

10377-52-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 115.79 g/mol

Melting Point

 ~837 °C

Boiling Point

N/A

Density

 ~2.53 g/cm³

Product Codes

NCZ-2021K

Iron-Nickel Nanoparticles, Fe65Ni35, APS: 50nm, Purity: 99.9%

Price range: $144.00 through $2,201.00
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Iron-Nickel Nanoparticles, Fe65Ni35, APS: 50nm, Purity: 99.9% Performance characteristics Nano iron-nickel alloy powder is prepared by gas phase CVD method, the alloy ratio can be adjusted appropriately, the purity is high, the particle size is small, the distribution is uniform, the surface area is large, it is easy to disperse, and the industrial output is large. Low-frequency soft magnetic materials with high permeability and low coercivity in the magnetic field are commonly used in sensitive relays, magnetic shields, telephone and radio transformers, AC and DC meters, and current transformers (see transformers). Applications 1. Nano-iron-nickel alloy powder has a wide range of application prospects in industries such as microwave absorbing materials, magnetic materials, hard alloys, and alloy coatings due to its special properties and special surface magnetism that are different from elemental iron and nickel metal powders; 2. Due to the refinement of nano-iron-nickel alloy grains, it is widely used in electronic products such as memory drums, magnetic cards, and magnetic tapes; 3. Powder metallurgy, auto parts, high specific gravity alloys, diamond tools, magnetic materials, electromagnetic shielding materials, which can be used as substitutes for pure metal nickel powder and cobalt powder; 4. The nano-iron-nickel alloy coating has a wide range of uses in protection, decoration, magnetism, etc. Its expansion coefficient is not much different from that of the nickel coating, so the peeling resistance is basically the same, but due to the addition of iron, the melting point of the iron-nickel alloy is high , And superior high-temperature strength and ductility, so the coating and molten steel have very good high-temperature resistance and thermal shock resistance, so it has excellent solderability and is very suitable for electronic components and printed circuit boards; 5. Nano-iron-nickel alloy can react with oxidizing corrosive gases, oxygen, chlorine, etc. to form a passivation film. It shows better corrosion resistance than iron in acid solutions and enhances the adhesion of the oxidized passivation layer. An anti-corrosion material. Packaging and storage This product is packaged in an inert gas glass bottle, sealed and stored in a dry, cool environment. It should not be exposed to the air to prevent oxidation and agglomeration due to moisture, which will affect the dispersion performance and use effect; the number of packages can be provided according to customer requirements and packed.

Iron-Silicon Nanoparticles, Fe65Si35, APS:50nm, Purity: 99.9%

Price range: $144.00 through $2,201.00
Select options This product has multiple variants. The options may be chosen on the product page
Iron-Silicon Nanoparticles, Fe65Si35, APS:50nm, Purity: 99.9% Performance characteristics Nano iron-silicon alloy powder is prepared by gas phase CVD method, the alloy ratio can be adjusted appropriately, the purity is high, the particle size is small, the distribution is uniform, the surface area is large, easy to disperse, easy to process, suitable for use in power frequency and audio high magnetic field. In the power industry, iron-silicon alloys are mainly used in motors and transformers; in the electronics industry, they are mainly used in power transformers, audio transformers, and pulse transformers.

Iron-Nickel Nanoparticles, Fe65Ni35, APS: 50nm, Purity: 99.9%

Price range: $144.00 through $2,201.00
Select options This product has multiple variants. The options may be chosen on the product page
Iron-Nickel Nanoparticles, Fe65Ni35, APS: 50nm, Purity: 99.9% Performance characteristics Nano iron-nickel alloy powder is prepared by gas phase CVD method, the alloy ratio can be adjusted appropriately, the purity is high, the particle size is small, the distribution is uniform, the surface area is large, it is easy to disperse, and the industrial output is large. Low-frequency soft magnetic materials with high permeability and low coercivity in the magnetic field are commonly used in sensitive relays, magnetic shields, telephone and radio transformers, AC and DC meters, and current transformers (see transformers). Product parameter
APS 50 nm
Purity 99.9 %
BET Surface Area 28.91 m2/g
Theoritical density 2.890 g/cm3
Bulk density 0.932 g/cm3
Melting Point 1000 °C
Boiling Point 1800 °C
Shape Spherical
Color Black Powder
Manufacturing Method CVD

Barium Fluoride (BaF2) Sputtering Targets, Purity: 99.99%, Size: 6”, Thickness: 0.125”

$2,196.00

Product 

Barium Fluoride (BaF2) Sputtering Targets, Purity: 99.99%, Size: 6'', Thickness: 0.125''

CAS No.

 7787-32-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

< 5 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

175.32 g/mol

Melting Point

 1,368 °C

Boiling Point

2,260 °C

Density

 4.89 g/cm³

Product Codes

NCZ-2479K

Gallium Antimonide (GaSb) Wafers, Size: 2”, Thickness: 500± 25 μm, Orientation: 100, Testing Grade

Price range: $475.00 through $2,196.00
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Gallium Antimonide (GaSb) Wafers Size: 2”, Thickness: 500± 25 μm, Orientation: 100 Technical Properties: Quality  Testing Grade Size (inch)  2” Thickness

Gallium Antimonide (GaSb) Wafers, Size: 2”, Thickness: 500± 25 μm, Orientation: 111, Testing Grade

Price range: $475.00 through $2,196.00
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Gallium Antimonide (GaSb) Wafers Size: 2”, Thickness: 500± 25 μm, Orientation: 111 Technical Properties: Quality  Testing Grade Size (inch)  2” Thickness

(-COOH) Functionalized Graphitized Multi Walled Carbon Nanotubes, Purity: > 99.99%, Outside Diameter: 28-48 nm

Price range: $73.00 through $2,196.00
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Applications:

Multi Walled Carbon Nanotubes have a variety of potential applications in different fields. These applications include medicine, mechanics, electric-electronics, chemicals, energy and others. It can be applied in, 1-drug delivery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium batteries, 8-gas-discharge tubes, 9-flat panel displays, 10-supercapacitors, 11-transistors, 12-solar cells, 13-photoluminescence, 14-templates  

Hydroxyapatite(Ca10(PO4)6(OH)2, 30-40um) (502611)

$2,195.00
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Hydroxyapatite(Ca10(PO4)6(OH)2, 30-40um) (502611)
Test Items Specifications
Appearance White , free flowing powder
Calcium Assay(Ca), % 22.0-27.5
Phosphorus Assay(P), % 9.0-11.5
Loss on Drying, % ≤ 8.0
pH(1.0% Water solution) 6.0-9.0
Arsenic, % ≤ 0.0003
Lead, mg/kg ≤ 3
Heavy Metals(as Pb), % ≤ 0.001
Average size, µm 30-40
 
Product Codes- NCZ-2787K

Gallium Arsenide (GaAs) Wafers, Size: 2”, Thickness: 400±25 μm, Double Side Polished, EPI-ready

Price range: $142.00 through $2,192.00
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1 piece/128€ 5 pieces/490€ 25 pieces/1975€ Please contact us for quotes on larger quantities ! Gallium Arsenide (GaAs) Wafer Size: 2”, Double Side Polished, Thickness: 400± 25 μm, EPI-ready  Technical Properties:
Quality  GaAs
Materials  GaAs
Size (inch)  2”
Thickness (μm)  400± 25
Polished  Double Side
Dopant  Undoped
Orientation  100
Resistivity   1 E8
Mobility  2000
EPD  ≤5000
Growth method  VGF
OF Length  17±1
IF Length  7±1
Applications: Gallium arsenide (GaAs) is a compound of the elements gallium and arsenic. Vertical gradient freeze is the most common method to produce GaAs wafers. Mainly used for circuits, electronics and solar cell applications. Carbon, silicon, tellurium and zinc are some of the dopants that are used to modify the characteristics and electrical properties of gallium arsenide wafers. Wafer flatness and surface purity are ensured by highest quality standards. Boron concentration of gallium arsenide wafers highly depend on the production method. Gallium arsenide wafers with adequate electrical resistancy prevent high current induction in the circuit. Mobility of GaAs wafers can be tailored with different doping levels. Gallium arsenide (GaAs) is a semiconductor compound. Gallium arsenide (GaAs)  has a high electron velocity and high saturated electron mobility. This makes gallium arsenide (GaAs) components are useful in fast electronic switching applications and at ultra-high radio frequencies. In 1907, the British discovered infrared emmission from gallium arsenide. This was called electroluminescence. Also, gallium arsenide (GaAs) was used as a solar cells in space for the Venera 3 mission in 1965, which is the first known operational use of gallium arsenide (GaAs).
  • Gallium arsenide (GaAs) is used in laser diodes.
  • Gallium arsenide (GaAs) is used in solar cells.
  • Gallium arsenide (GaAs) is used in optical windows.
  • Gallium arsenide (GaAs) is used in monolithic microwave integrated circuits.
  • Gallium arsenide (GaAs) is used in microwave frequency integrated circuits.
  • Gallium arsenide (GaAs) is used in infrared light-emitting diodes.
  • Gallium arsenide (GaAs) is useful in barometers.
  • Gallium arsenide (GaAs) is useful in pharmaceuticals and nuclear medicine tests.
  • Gallium arsenide (GaAs) is useful in high temperature thermometers.

Tetrakis(triphenylphosphine)palladium, Pd(PPh3)4, >98%

Price range: $283.00 through $2,189.00
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Product Tetrakis(triphenylphosphine)palladium, Pd(PPh3)4, >98%
CAS No. 14221-01-3
Appearance Yellow crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 10–100µm (Size Can be customized),  Ask for other available size range.
Ingredient Pd(PPh₃)₄
Molecular Weight 1155.52 g/mol
Melting Point 121–123 °C
Boiling Point N/A
Density 7.3 g/cm³
Product Codes NCZ-553I
 

>99 wt.% Titanium Vanadium Carbide (TiVC) MXene Material, 1g

$2,189.00
Product >99 wt.% Titanium Vanadium Carbide (TiVC) MXene Material, 1g
CAS No. 7631-86-9
Appearance Black or dark gray fine
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1–5μm (Size Can be customized),  Ask for other available size range.
Ingredient TiVC
Molecular Weight 170.7 g/mol
Melting Point N/A
Boiling Point N/A
Density 4.0–5.0 g/cm³
Product Codes NCZ-273I
 

50-100 um 3YSZ Zirconium Dioxide Yttria Stabilized Powder

Price range: $198.00 through $2,189.00
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Product 50-100 um 3YSZ Zirconium Dioxide Yttria Stabilized Powder
CAS No. N/A
Appearance White or off-white
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 50-100nm (Size Can be customized),  Ask for other available size range.
Ingredient ZrO₂
Molecular Weight 123.22 g/mol
Melting Point 2,700 °C
Boiling Point N/A
Density 6.05 g/cm³
Product Codes NCZ-185I

3YSZ Zirconium Dioxide Yttria Stabilized Nanoparticles, 50 nm

Price range: $198.00 through $2,189.00
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Product 3YSZ Zirconium Dioxide Yttria Stabilized Nanoparticles, 50 nm
CAS No. N/A
Appearance White or off-white
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 50nm (Size Can be customized),  Ask for other available size range.
Ingredient (ZrO₂)₀.97·(Y₂O₃)₀.03
Molecular Weight 123.22 g/mol
Melting Point 2,700 °C
Boiling Point N/A
Density N/A
Product Codes NCZ-163I
 

3YSZ Zirconium Dioxide Yttria Stabilized Nanoparticles, 30 nm

Price range: $198.00 through $2,189.00
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Product 3YSZ Zirconium Dioxide Yttria Stabilized Nanoparticles, 30 nm
CAS No. 7439-89-6
Appearance White or off-white
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 30 nm (Size Can be customized),  Ask for other available size range.
Ingredient Fe
Molecular Weight 123.22 g/mol
Melting Point 2,700 °C
Boiling Point N/A
Density 6.0 g/cm³
Product Codes NCZ-162I

30 nm 8YSZ Zirconium Dioxide ZrO2 Nanoparticles,>86.5% High Purity

Price range: $198.00 through $2,189.00
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Product 30 nm 8YSZ Zirconium Dioxide ZrO2 Nanoparticles,>86.5% High Purity
CAS No. 1314-23-4
Appearance White or off-white
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 30nm (Size Can be customized), Ask for other available size range.
Ingredient ZrO2 
Molecular Weight 123.22 g/mol
Melting Point N/A
Boiling Point N/A
Density 5.2 g/cm³
Product Codes NCZ-151I
 

Molybdenum Disulfide (MoS2) Sputtering Targets, Purity: 99.9%, Size: 6”, Thickness: 0.125”

$2,187.00

Product 

Molybdenum Disulfide (MoS2) Sputtering Targets, Purity: 99.9%, Size: 6'', Thickness: 0.125''

CAS No.

 1317-33-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 160.07 g/mol

Melting Point

 ~1185 °C

Boiling Point

 ~4500 °C

Density

 ~5.06 g/cm³

Product Codes

NCZ-1911K

Monoclinic Zirconium Oxide (Zirconia) ZrO2 Nanoparticles, 50nm to 80nm, >99.9% High Purity

Price range: $198.00 through $2,185.00
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Product Monoclinic Zirconium Oxide (Zirconia) ZrO2 Nanoparticles, 50nm to 80nm, >99.9% High Purity
CAS No. 1314-23-4
Appearance White or off-white
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 50–80nm (Size Can be customized),  Ask for other available size range.
Ingredient ZrO2
Molecular Weight 123.22 g/mol
Melting Point 2,715 °C
Boiling Point N/A
Density 5.68 g/cm³
Product Codes NCZ-455I

Monoclinic Zirconium Oxide (Zirconia) ZrO2 Nanoparticles, 20nm to 40nm, >99.9% High Purity

Price range: $198.00 through $2,185.00
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Product Monoclinic Zirconium Oxide (Zirconia) ZrO2 Nanoparticles, 20nm to 40nm, >99.9% High Purity
CAS No. N/A
Appearance White
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 20–40nm (Size Can be customized),  Ask for other available size range.
Ingredient ZrO2
Molecular Weight 123.22 g/mol
Melting Point 2,715 °C
Boiling Point N/A
Density 5.68 g/cm³
Product Codes NCZ-454I
 

Holmium (III) Oxide (Ho2O3) 99.99% 4N Powder

Price range: $249.00 through $2,185.00
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Product Holmium (III) Oxide (Ho2O3) 99.99% 4N Powder
CAS No. 12055-62-8
Appearance Pale yellow to tan
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 5µm (Size Can be customized),  Ask for other available size range.
Ingredient Ho2O3
Molecular Weight 377.86 g/mol
Melting Point N/A
Boiling Point N/A
Density 8.41 g/cm³
Product Codes NCZ-417I

5YSZ Zirconium Oxide Yttria Stabilized Nanoparticles 20nm to 40nm

Price range: $198.00 through $2,185.00
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Product 5YSZ Zirconium Oxide Yttria Stabilized Nanoparticles 20nm to 40nm
CAS No. 7440-21-3
Appearance White
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 20-40nm (Size Can be customized),  Ask for other available size range.
Ingredient (ZrO₂)₀.95(Y₂O₃)₀.05
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 5.68 g/cm³
Product Codes NCZ-202I
 

3YSZ Zirconium Oxide Yttria Stabilized Nanoparticles 50nm to 80nm

Price range: $198.00 through $2,185.00
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Product 3YSZ Zirconium Oxide Yttria Stabilized Nanoparticles 50nm to 80nm
CAS No. N/A
Appearance White or off-white
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 50nm-80nm (Size Can be customized),  Ask for other available size range.
Ingredient (ZrO₂)₀.97·(Y₂O₃)₀.03
Molecular Weight 123.22 g/mol
Melting Point 2,700 °C
Boiling Point N/A
Density 6.0 g/cm³
Product Codes NCZ-164I
 

Tungsten Oxide (WO3) Sputtering Targets, indium, Purity: 99.9%, Size: 4”, Thickness: 0.125”

$2,178.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Prime Si+Si3N4 Wafer, Size: 4”, Orientaion: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2 Side Polished, Thickness: 380± 15 μm, Coating 1000 nm

Price range: $101.00 through $2,178.00
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1 piece/92 € 5 pieces/420 € 25 pieces/1975 € Please contact us for quotes on larger quantities !!!

Prime Si+Si3N4 Wafer

Size: 4”, Orientaion: (100), Boron Doped, Thickness: 380± 15 μm, Coating 1000 nm

Technical Properties:

Quality Prime
Materials Si+Si3N4
Size (inch) 4”
Orientation (100)
Coating 1000 nm
Thickness (μm) 380± 15
Doping Boron
Resistivity (ohm.cm) 1-10
Polished Double Side
Silicon nitride (Si3N4,SiN) offers excellent mechanical and thermal stability. It is commonly used for hard masks, as a dielectric material, or as a passivation layer. Silicon nitride is very hard by nature and has good thermal shock resistance and oxidation resistance. Silicon Nitride has good high temperature strength, creep resistance and oxidation resistance. Silicon Nitride's low thermal expansion coefficient gives good thermal shock resistance.

Barium Strontium Titanate (BaO4SrTi) Sputtering Targets, elastomer, Purity: 99.99%, Size: 8”, Thickness: 0.125”

$2,175.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered. With the sputtering target's assistance, the

It is possible to identify the target material and even detect incredibly tiny impurity amounts.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

A solid mixture of barium titanate (BaTiO3) and strontium titanate (SrTiO3) is called barium strontium titanate (BST). Sputtering techniques yield thin coatings of barium strontium titanate (BST), which confers exceptional dielectric characteristics to materials. Because of their numerous uses in tunable microwave devices including phase shifters, delay lines, resonators, and varactors, barium strontium titanate (BST) based ferroelectric thin film devices have become more and more well-known over the past ten years.

Barium Strontium Titanate (BaO4SrTi) Sputtering Targets, elastomer, Purity: 99.99%, Size: 8”, Thickness: 0.250”

$2,175.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered. With the sputtering target's assistance, the

It is possible to identify the target material and even detect incredibly tiny impurity amounts.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

A solid mixture of barium titanate (BaTiO3) and strontium titanate (SrTiO3) is called barium strontium titanate (BST). Sputtering techniques yield thin layers of barium strontium titanate (BST), which give materials exceptional dielectric characteristics. Because of their numerous uses in tunable microwave devices including phase shifters, delay lines, resonators, and varactors, barium strontium titanate (BST) based ferroelectric thin film devices have become more and more well-known over the past ten years.

High-Performance Copper Foil Rolls for Lithium Ion Battery, Size: 10 µm

Price range: $494.00 through $2,175.00
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1 roll/494 € 5 rolls/2175 € Please contact us for quotes on larger quantities !!! High-Performance Copper Foil Rolls for Lithium Ion Battery

High-Performance Copper Foil Rolls for Lithium Ion Battery, Size: 10 µm

Price range: $494.00 through $2,175.00
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1 roll/494 € 5 rolls/2175 € Please contact us for quotes on larger quantities !!! High-Performance Copper Foil Rolls for Lithium Ion Battery

Aluminum (III) Sulfide, Al2S3, 99.9% Powder

Price range: $535.00 through $2,163.00
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Product Aluminum (III) Sulfide, Al2S3, 99.9% Powder
CAS No. 1302-81-4
Appearance White to grayish
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1–10µm (Size Can be customized),  Ask for other available size range.
Ingredient Al2S3
Molecular Weight 150.158 g/mol
Melting Point N/A
Boiling Point N/A
Density 2.02 g/cm³
Product Codes NCZ-277I

4N (99.99%) Indium (In) Pellets Evaporation Materials

Price range: $415.00 through $2,163.00
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Product 4N (99.99%) Indium (In) Pellets Evaporation Materials
CAS No. 7440-74-6
Appearance Soft, ductile, silvery-white metal
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1–6mm (Size Can be customized),  Ask for other available size range.
Ingredient In
Molecular Weight 228.18 g/mol
Melting Point 156.6 °C
Boiling Point 2,072 °C
Density 7.13 g/cm³
Product Codes NCZ-169I
 

4N (99.99%) Indium (In) Pellets Evaporation Materials

Price range: $415.00 through $2,163.00
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Product 4N (99.99%) Indium (In) Pellets Evaporation Materials
CAS No. 7440-74-6
Appearance Silvery Lustrous Gray, Metallic 
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1-3mm (Size Can be customized),  Ask for other available size range.
Ingredient In
Molecular Weight 40.30 g/mol
Melting Point 157 °C
Boiling Point 2,072 °C
Density 7.3 g/cm³
Product Codes NCZ-129E
 

Scandium (Sc) Sputtering Target

Price range: $927.00 through $2,148.00
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Product 

Scandium (Sc) Sputtering Target

CAS No.

7440-20-2

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

44.96 g/mol

Melting Point

 1,541 °C

Boiling Point

 2,838 °C

Density

2.99 g/cm³

Product Codes

NCZ-1359K

Scandium Oxide (Sc2O3) Micron Powder, Purity: 99.99%, Size: 325 mesh

Price range: $117.00 through $2,141.00
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Applications:

Scandium oxide is used in the preparation of other scandium compounds. It is also used as additive to glass, ceramics and high temperature systems to improve their properties.