Palladium Nanopowder/Nanoparticles (Pd, 99.9%, ~20nm)

Price range: $245.00 through $430.00
Select options This product has multiple variants. The options may be chosen on the product page
$245/0.5g
$430/1g

Product 

Palladium Nanopowder/Nanoparticles (Pd, 99.9%, ~20nm)

CAS No.

7440-05-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 ~20nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

106.42 g/mol

Melting Point

1,554.9 °C

Boiling Point

2,963 °C°C

Density

 12.02 g/cm³

Product Codes

NCZ-1063K

Nickel (Ni) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.250”

$245.00

Product 

Nickel (Ni) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.250''

CAS No.

7440-02-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 58.69 g/mol

Melting Point

~1453–1455 °C

Boiling Point

~2913 °C

Density

 8.90 g/cm³

Product Codes

NCZ-1882K

Magnesium (Mg) Sputtering Targets, Purity: 99.98%, Size: 4”, Thickness: 0.250”

$246.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Silicon (Si) Sputtering Targets, N-type, Purity: 99.999%, Size: 1”, Thickness: 0.250”

$246.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Molybdenum (Mo) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.250”

$246.00

Product 

Molybdenum (Mo) Sputtering Targets, Purity: 99.95%, Size: 4'', Thickness: 0.250''

CAS No.

 7439-98-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

95.95 g/mol

Melting Point

 2623 °C

Boiling Point

 4639 °C

Density

10.28 g/cm³

Product Codes

NCZ-1934K

Magnesium (Mg) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.125”

$246.00

Product 

Magnesium (Mg) Sputtering Targets, Purity: 99.95%, Size: 3'', Thickness: 0.125''

CAS No.

7439-95-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 24.305 g/mol

Melting Point

 650 °C

Boiling Point

 1,090 °C

Density

1.738 g/cm³

Product Codes

NCZ-1999K

Zinc (Zn) Sputtering Targets, Purity: 99.95%, Size: 6”, Thickness: 0.250”

$247.00

Product 

Zinc (Zn) Sputtering Targets, Purity: 99.95%, Size: 6'', Thickness: 0.250''

CAS No.

7440‑66‑6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

Zn (black granules) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

65.38 g/mol

Melting Point

419.5 °C

Boiling Point

 907 °C

Density

7.14 g/cm³

Product Codes

NCZ-1464K

Barium (Ba) Sputtering Targets, Purity: 99.5%, Size: 1”, Thickness: 0.250”

$247.00

Product 

Barium (Ba) Sputtering Targets, Purity: 99.5%, Size: 1'', Thickness: 0.250''

CAS No.

7440-39-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

137.327 g/mol

Melting Point

 727 °C

Boiling Point

 1845 °C

Density

 3.51 g/cm³

Product Codes

NCZ-2492K

Barium (Ba) Sputtering Targets, Purity: 99.5%, Size: 1”, Thickness: 0.125”

$247.00

Product 

Barium (Ba) Sputtering Targets, Purity: 99.5%, Size: 1'', Thickness: 0.125''

CAS No.

7440-39-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

137.327 g/mol

Melting Point

 727 °C

Boiling Point

 1845 °C

Density

 3.51 g/cm³

Product Codes

NCZ-2493K

CR2032 Coin Cell Case (Negative Case, Cone Spring, Spacer, Positive Case)

Price range: $248.00 through $719.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

CR2032 Coin Cell Case (Negative Case, Cone Spring, Spacer, Positive Case) for Battery Research CR2032 Coin Cell Cases (20d x 3.2t mm) with O-rings for Battery Research

Selenium (Se) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.250”

$248.00

Product 

Selenium (Se) Sputtering Targets, Purity: 99.999%, Size: 2'', Thickness: 0.250''

CAS No.

7782-49-2

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 78.96 g/mol

Melting Point

 221 °C

Boiling Point

 685 °C

Density

 4.81 g/cm³

Product Codes

NCZ-1771K

Niobium Carbide (Nb2CTx) MXene Multilayer Nanoflakes

Price range: $248.00 through $1,832.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Niobium Carbide (Nb2CTx) MXene Multilayer Nanoflakes
CAS No. 60687-94-7
Appearance Gray-black
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1–5µm (Size Can be customized),  Ask for other available size range.
Ingredient Nb2CTx
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 6–7 g/cm³
Product Codes NCZ-481I
 

High Purity (>95 wt%) Single-walled Carbon Nanotubes (Floating Catalyst Method), 1g

$249.00
Product High Purity (>95 wt%) Single-walled Carbon Nanotubes (Floating Catalyst Method), 1g
CAS No. 308068-56-6
Appearance Black, fluffy
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1–2nm (Size Can be customized),  Ask for other available size range.
Ingredient C
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 1.3–1.4 g/cm³
Product Codes NCZ-386I
 

Holmium (III) Oxide (Ho2O3) 99.99% 4N Powder

Price range: $249.00 through $2,185.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Holmium (III) Oxide (Ho2O3) 99.99% 4N Powder
CAS No. 12055-62-8
Appearance Pale yellow to tan
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 5µm (Size Can be customized),  Ask for other available size range.
Ingredient Ho2O3
Molecular Weight 377.86 g/mol
Melting Point N/A
Boiling Point N/A
Density 8.41 g/cm³
Product Codes NCZ-417I

Indium Tin Oxide (ITO, 90:10wt%) Blue Nanopowder 99.99% (4N), 100g

Price range: $249.00 through $2,302.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Indium Tin Oxide (ITO, 90:10wt%) Blue Nanopowder 99.99% (4N), 100g
CAS No. 1312-43-2
Appearance Fine blue or blue-gray
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 30-50nm (Size Can be customized),  Ask for other available size range.
Ingredient In2−xSnxO3​
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 7.1 g/cm³
Product Codes NCZ-425I
 

Indium (III) Oxide ( In2O3) 99.999% 5N Powder

Price range: $249.00 through $2,302.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Indium (III) Oxide ( In2O3) 99.999% 5N Powder
CAS No. 1312-43-2
Appearance light yellow
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient In2O3
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-428I

Tantalum (V) Oxide (Ta2O5) 99.9% 3N Powder

Price range: $249.00 through $1,476.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Tantalum (V) Oxide (Ta2O5) 99.9% 3N Powder
CAS No. 1314-61-0
Appearance White to off-white
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1–10µm (Size Can be customized),  Ask for other available size range.
Ingredient Ta2O5
Molecular Weight 441.89 g/mol
Melting Point N/A
Boiling Point N/A
Density 8.2 g/cm³
Product Codes NCZ-548I

Graphdiyne Oxide Powder

Price range: $250.00 through $2,700.00
Select options This product has multiple variants. The options may be chosen on the product page

Product Name: Graphdiyne Oxide Powder

Product Graphdiyne Oxide Powder
Pack Size 10 mg, 20 mg, 50 mg, 100 mg & 1 gram
CAS No. 154702-15-5
Product Code NCZ-GD-105
APPLICATION FIELDS

Graphdiyne (GDY) is a new type of two-dimensional carbon allotrope. It is a new all-carbon nanostructured material after fullerenes, carbon nanotubes and graphene. In 2010, Li Yuliang, Academician Group For the first time, a high-quality graphene film was successfully synthesized on the surface of Cu foil by the cross-coupling reaction of hexamethylene benzene precursor. Graphene has a rich carbon chemical bond, a large conjugated system, wide interplanar spacing, and excellent chemical stability. It is known as the most stable allotrope of synthetic diacetylene. Its unique sp-sp2 carbon atoms, uniform pores and high π-conjugated structure have shown broad application prospects in gas separation, catalysis, water treatment, humidity sensors and energy.

The synthesis of Graphdiyne was reported as a 1 mm film on a copper surface. Graphdiyne was predicted to exhibit a nanoweb-like structure, characterized by triangular and regularly distributed pores, thus forming a nanoporous membrane. Due to the effective size of its pores, which almost matches the van der Waals radius of the helium atom, graphdiyne could behave as an ideal two-dimensional membrane for helium chemical and isotopic separation. The application of a graphdiyne based membrane as an efficient two-dimensional sieve for water filtration and purification technologies has been proposed.

RELATED INFORMATION Storage Conditions: Sealed, avoid light, keep dry at room temperature. 

Graphdiyne Powder

Price range: $250.00 through $2,700.00
Select options This product has multiple variants. The options may be chosen on the product page

Product Name: Graphdiyne Powder

Product Graphdiyne Powder
Pack Size 10 mg, 20 mg, 50 mg, 100 mg & 1 gram
CAS No. 154702-15-5
Product Code NCZ-GD-104
APPLICATION FIELDS

Graphdiyne (GDY) is a new type of two-dimensional carbon allotrope. It is a new all-carbon nanostructured material after fullerenes, carbon nanotubes and graphene. In 2010, Li Yuliang, Academician Group For the first time, a high-quality graphene film was successfully synthesized on the surface of Cu foil by the cross-coupling reaction of hexamethylene benzene precursor. Graphene has a rich carbon chemical bond, a large conjugated system, wide interplanar spacing, and excellent chemical stability. It is known as the most stable allotrope of synthetic diacetylene. Its unique sp-sp2 carbon atoms, uniform pores and high π-conjugated structure have shown broad application prospects in gas separation, catalysis, water treatment, humidity sensors and energy.

The synthesis of Graphdiyne was reported as a 1 mm film on a copper surface. Graphdiyne was predicted to exhibit a nanoweb-like structure, characterized by triangular and regularly distributed pores, thus forming a nanoporous membrane. Due to the effective size of its pores, which almost matches the van der Waals radius of the helium atom, graphdiyne could behave as an ideal two-dimensional membrane for helium chemical and isotopic separation. The application of a graphdiyne based membrane as an efficient two-dimensional sieve for water filtration and purification technologies has been proposed.

RELATED INFORMATION Storage Conditions: Sealed, avoid light, keep dry at room temperature. 

Nickel (Ni) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.250”

$250.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

High Purity >95 wt% Hydroxylate Multi-walled Carbon Nanotube

Price range: $250.00 through $350.00
Select options This product has multiple variants. The options may be chosen on the product page
Product High Purity >95 wt% Hydroxylate Multi-walled Carbon Nanotube
CAS No. N/A
Appearance Black
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient (C)n(OH)x
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-404I
 

Magnesium (Mg) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.125”

$250.00

Product 

Magnesium (Mg) Sputtering Targets, Purity: 99.95%, Size: 4'', Thickness: 0.125''

CAS No.

7439-95-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 24.305 g/mol

Melting Point

 650 °C

Boiling Point

 1,090 °C

Density

1.738 g/cm³

Product Codes

NCZ-1995K

Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 8”, Thickness: 0.250”

$250.00

Product 

Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 8'', Thickness: 0.250''

CAS No.

 7429-90-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 26.98 g/mol

Melting Point

 660.3 °C

Boiling Point

 2519 °C

Density

 2.70 g/cm³

Product Codes

NCZ-2563K

Double-pass AAO template(circle, D=12mm) (236993)

$250.00
Double-pass AAO template(circle, D=12mm) (236993)
Grad es Pore diameter Interpore distance Pore depth Price(S/5pc)
AAO-DP-02 50nm 65nm 50-70um 255
AAO-DP-II 50nm 110nm 255
AAO-DP-12 70nm 110nm 255
AAO-DP-13 SOnm 110nm 255
AAO-DP-41 200nm 450nm 255
AAO-DP-42 300nm 450nm 255
AAO-DP-43 400nm 450nm 255
Product Codes- NCZ-2632K

Poly(L-lactide)(PLLA) (606989)

$250.00
Poly(L-lactide)(PLLA) (606989)
Grade Inherent viscosity (dL/g) Weight average molecular weight (x10000)
PLLA 05 o. 3-0. 5
PLLA 07 4—6
PLLA-IO 7-1. o 6 10
PLLA-15 1. 0-1. 5 10-18
PLLÅ 20 1. 5-2. o 18-25
PLLA 30 2, 0-3. o 25-40
PLLA-40 3. 0-4. o 40 50
PLLA-50 4. 0-5. o 50-70
Product Codes- NCZ-2633K

Poly(DL-lactide)(PLA) (607989)

$250.00
Poly(DL-lactide)(PLA) (607989)
Grade Inherent viscosity (dL/g) Weight average molecular weight (x10000)
PDLLA 05 o. 1-0. 3 1-2
PULA 07 0. 3-0. 5 2 5
PDLLA 10 o. 5-0. 8 5 10
PDLLA-15 10-20
PDLLA 20 4-2. o 20-30
PULA 30 2. 0-3. o 30 50
PDLLA-40 3 50 70
Product Codes- NCZ-2634K

Zn-Mg-Al Hydrotalcite (321558)

$250.00
Select options This product has multiple variants. The options may be chosen on the product page
Zn-Mg-Al Hydrotalcite (321558)
Items Specifications
Appearance White odorless fine powder
Loss on drying(105°C, 1hr) ≤0.5%w/w
Average particle size 0.6-0.9µm %50
Specific surface area 5-10m2/g
MgO/Al2O3 2.8-3.2
ZnO/Al2O3 0.8-1.2
Product Codes- NCZ-2765K

Aluminum Silicon (AlSi) Sputtering Targets, Purity: 99.999%, Size: 4”, Thickness: 0.250”

$251.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered. With the sputtering target's assistance, the

It is possible to identify the target material and even detect incredibly tiny impurity amounts.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Bismuth (Bi) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”

$251.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer.

Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered. With the sputtering target's assistance, the

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

The metal bismuth is silvery with a hint of pink and is fragile. Both in air and water, it is stable. Despite having poor thermal and electrical qualities, bismuth is used to create fusible alloys, a class of materials with low melting points that can be used in a variety of applications, such as thermal fuses and solders. Because pure bismuth exhibits a high absorption of gamma rays, it can be used as a window or filter for these particles while allowing neutrons to pass through.

Silicon Dioxide (SiO2) Sputtering Targets, Fused Quartz, Purity: 99.995%, Size: 6”, Thickness: 0.250”

$251.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

4N (99.99%) Cerium Oxide (CeO2) Pieces Evaporation Materials

Price range: $251.00 through $1,292.00
Select options This product has multiple variants. The options may be chosen on the product page
Product 4N (99.99%) Cerium Oxide (CeO2) Pieces Evaporation Materials
CAS No. 1306-38-3
Appearance White or Pale Yellow, Crystalline Solid 
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1-4mm (Size Can be customized),  Ask for other available size range.
Ingredient CeO2
Molecular Weight 40.30 g/mol
Melting Point 2600 °C
Boiling Point N/A
Density 7.13 g/cm³
Product Codes NCZ-130E

4N (99.99%) Cerium Oxide CeO2 Pieces Evaporation Materials

Price range: $251.00 through $1,292.00
Select options This product has multiple variants. The options may be chosen on the product page
Product 4N (99.99%) Cerium Oxide CeO2 Pieces Evaporation Materials
CAS No. 1306-38-3
Appearance Yellow-white to pale off-white solid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 3–10mm (Size Can be customized), Ask for other available size range.
Ingredient CeO2
Molecular Weight 172.11 g/mol
Melting Point 2600 °C
Boiling Point N/A
Density 7.13 g/cm³
Product Codes NCZ-168I

Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.250”

$251.00

Product 

Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness: 0.250''

CAS No.

12061-16-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

382.52 g/mol

Melting Point

~2,343 °C

Boiling Point

N/A

Density

~8.64 g/cm³

Product Codes

NCZ-2247K

Indium Oxide (In2O3) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”

$252.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Indium Oxide (In2O3) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”

$252.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Indium Zinc Oxide/IZO (InZnO) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”

$252.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Neodymium (Nd) Sputtering Target

Price range: $252.00 through $694.00
Select options This product has multiple variants. The options may be chosen on the product page

Product 

Neodymium (Nd) Sputtering Target

CAS No.

7440-00-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

144.24 g/mol

Melting Point

1,024 °C

Boiling Point

3,074 °C

Density

7.01 g/cm³

Product Codes

NCZ-1356K

Praseodymium (Pr) Sputtering Target

Price range: $252.00 through $694.00
Select options This product has multiple variants. The options may be chosen on the product page

Product 

Praseodymium (Pr) Sputtering Target

CAS No.

7440-10-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

140.91 g/mol

Melting Point

 931 °C

Boiling Point

3,129 °C

Density

6.77 g/cm³

Product Codes

NCZ-1358K

Chitosan(Industrial grade) (333668)

$252.00
Select options This product has multiple variants. The options may be chosen on the product page
Chitosan(Food grade) (332668)
Item
Food grade
Appearance
White powder
Degree of deacetylation
90%, 95%
pH
7.0-8.0
Loss on drying
<10.0%
Residue on ignition
<1.5%
Insoluble
<1.0%
Heavy metal (measured by Pb)
≤10ppm
As
≤0.5ppm
Total bacterial count
≤1000cfu/g
Viscosity 50-800mpa·s
Granularity 80mesh, 100mesh
Product Codes- NCZ-2654K

Chitosan Oligosaccharide(from Aspergillus Niger) (239555)

$252.00
Select options This product has multiple variants. The options may be chosen on the product page
Chitosan Oligosaccharide(from Aspergillus Niger) (239555)
ANALYSIS SPECIFICATION RUSULT
Deacetylation ≥98% 98.16%
Appearance Light yellow -brown powder Complies
pH 5.5-7 5.8
Mesh size 150mesh 100% pass 150 mesh
Molecular weight ≤ 5500Da 5000Da
Moisture ≤10% 5.12%
Total ash ≤ 2% 0.41%
Heavy Metals ≤ 10 ppm 7ppm
As ≤ 2.0ppm 1ppm
Pb ≤ 1.0ppm 0.5ppm
Cd ≤ 0.5ppm Negative
Hg ≤ 0.5ppm Negative
Microbiological quality Total Plate Count Yeast & Mold E.Coliform Salmonella . <1000cfu/g <100cfu/g Negative Negative . 200cfu/g 70cfu/g Negative Negative
  Product Codes- NCZ-2664K

Chitosan hydrochloride(from Mushroom, Water soluble) (334555)

$252.00
Select options This product has multiple variants. The options may be chosen on the product page
Chitosan hydrochloride(from Mushroom, Water soluble) (334555)
ANALYSIS SPECIFICATION
Deacetylation ≥98%
Characters/appearance White to light yellow powder
Odor and taste Characteristic
pH 3-5
Viscosity in 1% Acetic acid 10-100 cps
Mesh size/sieve analysis 100% pass 80 mesh
Loss on drying ≤8%
Water solubility Soluble in water easily
Heavy Metals As Pb Cd Hg Sum ≤ 2.0 ppm ≤ 1.0 ppm ≤ 0.5 ppm ≤ 0.5 ppm ≤ 20.0 ppm
Microbiological quality Total Plate Count Yeast & Mold E.Coli. Salmonella <1000 cfu/g <100 cfu/g Negative Negative
  Product Codes- NCZ-2665K

Chitosan hydrochloride(from Aspergillus Niger, Water soluble) (337555)

$252.00
Select options This product has multiple variants. The options may be chosen on the product page
Chitosan hydrochloride(from Mushroom, Water soluble) (334555)
ANALYSIS SPECIFICATION
Deacetylation ≥98%
Characters/appearance White to light yellow powder
Odor and taste Characteristic
pH 3-5
Viscosity in 1% Acetic acid 10-100 cps
Mesh size/sieve analysis 100% pass 80 mesh
Loss on drying ≤8%
Water solubility Soluble in water easily
Heavy Metals As Pb Cd Hg Sum ≤ 2.0 ppm ≤ 1.0 ppm ≤ 0.5 ppm ≤ 0.5 ppm ≤ 20.0 ppm
Microbiological quality Total Plate Count Yeast & Mold E.Coli. Salmonella <1000 cfu/g <100 cfu/g Negative Negative
  Product Codes- NCZ-2665K

Activated Carbon fiber Felt(Rayon based, conventional) (061584)

$252.00
Activated Carbon fiber Felt(Rayon based, conventional) (061584)
Grade Weight(g/m2) Surface area(m2/g) Thickness(mm) Width(m) Price($/kg)
08013 80±10 1300 1 1 252
13013 130±10 1300 1 1 252
16013 160±10 1300 2 1 252
19013 190±10 1300 3 1 252
19015 190±10 1500 3 1 252
24013 240±10 1300 3 1 252
24015 240±10 1500 3 1 252
25013 250±20 1300 4 1 252
25015 250±20 1500 4 1 252
28013 280±20 1300 4 1 252
28015 280±20 1500 4 1 252
30013 300±20 1300 5 1 252
35013 350±20 1300 5 1 252
Product Codes- NCZ-2688K

Cubic Boron nitride(CBN, micron powder) (323514)

Price range: $252.00 through $292.00
Select options This product has multiple variants. The options may be chosen on the product page
Cubic Boron nitride(CBN, micron powder) (323514)
Product Name: CBN-M800
Product Description: Black CBN micro powder, used for grinding and polishing, suitable for resin bond systems.

Product Name:CBN-M850

Product Description: Black CBN micronpowder, designed for honing whetstones and PCBN, also suitable for ferrous lapping and polishing applications.

Product Name:CBN-M990

Product Description: Amber CBN micronpower, designed for honing whetstones and PCBN, also suitable for super precision processing and lapping applications.
Product Codes- NCZ-2770K

Silver (Ag) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.125”

$253.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Silver (Ag) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.125”

$253.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

3N5 (99.95%) Niobium (Nb) Pellets (2mm Dia. x 5-8mm L) Evaporation Materials

Price range: $253.00 through $451.00
Select options This product has multiple variants. The options may be chosen on the product page
Product 3N5 (99.95%) Niobium (Nb) Pellets (2mm Dia. x 5-8mm L) Evaporation Materials
CAS No. 7440-03-1
Appearance Gray, Metallic 
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 2mm (Size Can be customized),  Ask for other available size range.
Ingredient Nb
Molecular Weight 40.30 g/mol
Melting Point 2,468 °C
Boiling Point N/A
Density 8.57 g/cm³
Product Codes NCZ-131E
 

99.999% 5N 500 nm Alpha Aluminum Oxide (Alumina) Al2O3 Powder, 500 g

$253.00
Product 99.999% 5N 500 nm Alpha Aluminum Oxide (Alumina) Al2O3 Powder, 500 g
CAS No. 1344-28-1
Appearance White fine
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 500nm (Size Can be customized),  Ask for other available size range.
Ingredient Al2O3
Molecular Weight 101.96 g/mol
Melting Point 2050 °C
Boiling Point N/A
Density 3.95–4.00 g/cm³
Product Codes NCZ-259I

99.9wt% Carboxylated Hollow Mesoporous Silica Powder (Spherical)

Price range: $253.00 through $462.00
Select options This product has multiple variants. The options may be chosen on the product page
Product 99.9wt% Carboxylated Hollow Mesoporous Silica Powder (Spherical)
CAS No. 7631-86-9
Appearance White or off-white fine
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 100–500nm (Size Can be customized),  Ask for other available size range.
Ingredient (SiO2)x(-COOH)y
Molecular Weight 60.08 g/mol
Melting Point N/A
Boiling Point N/A
Density 2.0–2.2 g/cm³
Product Codes NCZ-269I
 

Nickel Iron (Ni-Fe) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.250”

$253.00

Product 

Nickel Iron (Ni-Fe) Sputtering Targets, Purity: 99.95%, Size: 2'', Thickness: 0.250''

CAS No.

N/A

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 ~57.6 g/mol

Melting Point

~1,430 – 1,480 °C

Boiling Point

 ~2,730 – 2,750 °C

Density

 ~8.5 – 8.7 g/cm³

Product Codes

NCZ-1845K

Nickel Chromium (Ni-Cr) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”

$253.00

Product 

Nickel Chromium (Ni-Cr) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.250''

CAS No.

 11106-97-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 ~110.69 g/mol

Melting Point

 ~1,400 °C

Boiling Point

 ~2,730–2,750 °C

Density

 ~8.4 – 8.5 g/cm³

Product Codes

NCZ-1858K

Fluorinated Graphite, 50g

$253.00
Product Fluorinated Graphite, 50g
CAS No. 51311-17-2
Appearance Gray-black to white
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1–50µm (Size Can be customized),  Ask for other available size range.
Ingredient (CFₓ)_n, x
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 1.9–2.7 g/cm³
Product Codes NCZ-346I

Gadolinium (Gd) Metal 99.9% 3N

$253.00
Product Gadolinium (Gd) Metal 99.9% 3N
CAS No. 7440-54-2
Appearance Silvery-white
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 40–50µm (Size Can be customized),  Ask for other available size range.
Ingredient Gd
Molecular Weight N/A
Melting Point 1,312 °C
Boiling Point 3,250 °C
Density 7.90 g/cm³
Product Codes NCZ-347I
 

Graphene Nanoplatelets, 10g

$253.00
Product Graphene Nanoplatelets, 10g
CAS No. 1034343-98-0
Appearance Black
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1-5nm (Size Can be customized),  Ask for other available size range.
Ingredient C
Molecular Weight 12 g/mol
Melting Point N/A
Boiling Point N/A
Density 2.2 g/cm³
Product Codes NCZ-361I
 

Magnesium (Mg) Sputtering Targets, Purity: 99.98%, Size: 3”, Thickness: 0.250”

$253.00

Product 

Magnesium (Mg) Sputtering Targets, Purity: 99.98%, Size: 3'', Thickness: 0.250''

CAS No.

7439-95-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 24.305 g/mol

Melting Point

 650 °C

Boiling Point

 1,090 °C

Density

1.738 g/cm³

Product Codes

NCZ-1996K

Short Multi-walled Carbon Nanotube, >95 wt%, 25g

Price range: $253.00 through $363.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Short Multi-walled Carbon Nanotube, >95 wt%, 25g
CAS No. 308068-56-6
Appearance Black
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 5µm (Size Can be customized),  Ask for other available size range.
Ingredient C
Molecular Weight 137.91 g/mol
Melting Point 2485°C
Boiling Point N/A
Density 2.1 g/cm³
Product Codes NCZ-513I
 

Silicon Dioxide (SiO2) Nanowires Powder, 1g/bottle

$253.00
Product Silicon Dioxide (SiO2) Nanowires Powder, 1g/bottle
CAS No. 60676-86-0
Appearance White to off-white fibrous
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1–10µm (Size Can be customized),  Ask for other available size range.
Ingredient SiO₂
Molecular Weight 60.08 g/mol
Melting Point N/A
Boiling Point N/A
Density 2.2 g/cm³
Product Codes NCZ-517I

Two-dimensional NiAl Layered Double Hydroxide (NiAl-LDH) Powder, 500 mg/bottle

$253.00
Product Two-dimensional NiAl Layered Double Hydroxide (NiAl-LDH) Powder, 500 mg/bottle
CAS No. N/A
Appearance Light green to pale yellow
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 20–40nm (Size Can be customized),  Ask for other available size range.
Ingredient Ni₆Al₂(OH)₁₆CO₃·4H₂O
Molecular Weight 604.2 g/mol
Melting Point N/A
Boiling Point N/A
Density 2.2 – 2.4 g/cm³
Product Codes NCZ-585I

Copper (Cu) Sputtering Targets, Purity: 99.99%, Size: 7”, Thickness: 0.125”

$254.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Gadolinium (Gd) Sputtering Target

Price range: $254.00 through $904.00
Select options This product has multiple variants. The options may be chosen on the product page

Product 

Gadolinium (Gd) Sputtering Target

CAS No.

7440-54-2

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

157.25 g/mol

Melting Point

1,312 °C

Boiling Point

3,273 °C

Density

7.90 g/cm³

Product Codes

NCZ-1289K