$213.00

Applications of Sputtering Targets;

Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as a silicon wafer.
Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
Sputter targets is also used for analysis by etching away the target material.

One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Aluminum which has the chemical symbol of Al, is a silvery white, soft, ductile metal that is the third most abundant element. Aluminum is notable due to for its light weight, strength, durability and for its ability to resist corrosion. Aluminum forms an extremely thin but very strong layer of oxide film. Aluminum has also high thermal and electrical conductivity. Aluminum sputtering targets have a particularly fine-grained microstructure. This property of Aluminum sputtering targets ensures that you benefit from uniform erosion and a low susceptibility to particle formation throughout the sputtering process.

Product	Antimony Sputtering Target (Sb)
CAS No.	7440-36-0
Appearance	Silvery, Lustrous Gray, Semi-metallic
Purity	≥99%, ≥99.9%, ≥95%(Other purities are also available)
APS	N/A
Ingredient	Sb
Molecular Weight	121.76 g/mol
Melting Point	630 °C
Boiling Point	17500 °C
Density	N/A
Product Codes	NCZ-103H

Product	1g Amine Functionalized Graphene Oxide Powder
CAS No.	7782-42-5
Appearance	Black
Purity	≥99%, ≥99.9%, ≥95%(Other purities are also available)
APS	0.5–5µm (Size Can be customized), Ask for other available size range.
Ingredient	CₓHᵧONₙ
Molecular Weight	79.87 g/mol
Melting Point	N/A
Boiling Point	N/A
Density	0.0993 g/cm³
Product Codes	NCZ-137I

Product	1g Reduced Monolayer Graphene Oxide
CAS No.	7782-42-5
Appearance	Black or dark gray
Purity	≥99%, ≥99.9%, ≥95%(Other purities are also available)
APS	0.5–10µmnm (Size Can be customized), Ask for other available size range.
Ingredient	C₁₀H₂O₁
Molecular Weight	N/A
Melting Point	300°C
Boiling Point	N/A
Density	1.8 – 2.2 g/cm³
Product Codes	NCZ-141I

Product	Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 4'', Thickness: 0.250''
CAS No.	7429-90-5
Appearance	Powder
Purity	≥99%, ≥99.9%, ≥95% (Other purities are also available)
APS	N/A (Size Can be customized), Ask for other available size ranges.
Ingredient	N/A
Molecular Weight	26.98 g/mol
Melting Point	660.3 °C
Boiling Point	2519 °C
Density	2.70 g/cm³
Product Codes	NCZ-2572K

Compound Formula	B/C
Size Range	< 10 layers
Average Particle Size	5-10 µm
Morphology	Platelets
Thickness	5 nm

Peaks	Peak Position (eV)	Atomic Contentration (%)
B1s	195,98	11,1
C1s	293,48	77,52
O1s	540,88	11,38

Product	Samarium Oxide Nanopowder/ Nanoparticles (Sm2O3, 99.9%, 100nm)
CAS No.	12060-58-1
Appearance	Yellow to white powder
Purity	≥99%, ≥99.9%, ≥95%(Other purities are also available)
APS	100nm (Size Can be customized), Ask for other available size range.
Ingredient	Sm₂O₃.
Molecular Weight	348.72 g/mol
Melting Point	2,335° C
Boiling Point	4,118° C
Density	8.347g/cm3
Product Codes	NCZ-120R

Product	Zinc (Zn) Sputtering Targets, Purity: 99.99%, Size: 4'', Thickness: 0.125''
CAS No.	7440‑66‑6
Appearance	Powder
Purity	≥99%, ≥99.9%, ≥95% (Other purities are also available)
APS	Zn (black granules) (Size Can be customized), Ask for other available size ranges.
Ingredient	N/A
Molecular Weight	65.38 g/mol
Melting Point	419.5 °C
Boiling Point	907 °C
Density	7.14 g/cm³
Product Codes	NCZ-1467K

Product	Silicon Dioxide (SiO2) Sputtering Targets, Fused Quartz, Purity: 99.995%, Size: 4'', Thickness: 0.125''
CAS No.	7631-86-9
Appearance	Powder
Purity	≥99%, ≥99.9%, ≥95% (Other purities are also available)
APS	N/A (Size Can be customized), Ask for other available size ranges.
Ingredient	N/A
Molecular Weight	60.08 g/mol
Melting Point	~1710°C
Boiling Point	~2,950 °C
Density	~2.20 g/cm³
Product Codes	NCZ-1714K

Product	Nickel Chromium (Ni-Cr) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''
CAS No.	11106-97-1
Appearance	Powder
Purity	≥99%, ≥99.9%, ≥95% (Other purities are also available)
APS	N/A (Size Can be customized), Ask for other available size ranges.
Ingredient	N/A
Molecular Weight	~110.69 g/mol
Melting Point	~1,400 °C
Boiling Point	~2,730–2,750 °C
Density	~8.4 – 8.5 g/cm³
Product Codes	NCZ-1859K

Testing item	Testing standard
appearance	white fine powder
loss on drying, %	≤1.0
zinc oxide content, %	17.0~19.0
melting point, ℃	125~135
free acid, %	≤2.0
iodine value	≤1.0
fineness, %	325 mesh passing≥99.0
heavy metal(in Pb), %	≤0.0020
lead, %	≤0.0010
arsenic, %	≤0.0005

Testing item	Testing standard
appearance	white fine powder
loss on drying, %	≤6.0
magnesium oxide content, %	8.2~8.9
melting point, ℃	132~138
free acid, %	≤3.0
iodine value	≤1.0
fineness , %	200 mesh passing≥99.0
heavy metal(in Pb), %	≤0.0020
lead, %	≤0.0010
arsenic, %	≤0.0005

Quality	GaAs
Materials	GaAs
Size (inch)	4”
Thickness (μm)	300± 25
Polished	Double Side
Dopant	Undoped
Orientation	100
Resistivity	1 E8
Mobility	4500
EPD	≤5000
Growth method	VGF
OF Length	32.5±1
IF Length	18±1

Testing item	Testing standard
appearance	white fine powder
ethyl alcohol solubility test	meet the specification
loss on drying, %	≤6.0
ignition residue(sulfate), %	29.0~32.0
acid value (H+)/(mmol/100g)	≤5.0
iodine value	≤1.0
fineness, %	200 mesh passing≥99.0
heavy metal(in Pb), %	≤0.0020
lead, %	≤0.0010
arsenic, %	≤0.0005

Product	Standard pH 10.01 Buffer Powder, 100 Sachets
CAS No.	N/A
Appearance	White to off-white crystalline
Purity	≥99%, ≥99.9%, ≥95%(Other purities are also available)
APS	10–100µm (Size Can be customized), Ask for other available size range.
Ingredient	Na₂B₄O₇·10H₂O
Molecular Weight	40.00 g/mol
Melting Point	N/A
Boiling Point	N/A
Density	1.2–1.4 g/cm³
Product Codes	NCZ-533I

Product	Standard pH 4.01 Buffer Powder, 100 Sachets
CAS No.	N/A
Appearance	White to off-white crystalline
Purity	≥99%, ≥99.9%, ≥95%(Other purities are also available)
APS	10–100µm (Size Can be customized), Ask for other available size range.
Ingredient	KHC₈H₄O₄
Molecular Weight	N/A
Melting Point	N/A
Boiling Point	N/A
Density	1.2–1.4 g/cm³
Product Codes	NCZ-535I

Product	Standard pH 7.00 Buffer Powder, 100 Sachets
CAS No.	7778-77-0
Appearance	White to off-white fine crystalline
Purity	≥99%, ≥99.9%, ≥95%(Other purities are also available)
APS	10–100µm (Size Can be customized), Ask for other available size range.
Ingredient	KH₂PO₄
Molecular Weight	136.09 g/mol
Melting Point	N/A
Boiling Point	N/A
Density	1.2–1.4 g/cm³
Product Codes	NCZ-538I

Product	Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 4'', Thickness: 0.250''
CAS No.	12061-16-4
Appearance	Powder
Purity	≥99%, ≥99.9%, ≥95% (Other purities are also available)
APS	N/A (Size Can be customized), Ask for other available size ranges.
Ingredient	N/A
Molecular Weight	382.52 g/mol
Melting Point	~2,343 °C
Boiling Point	N/A
Density	~8.64 g/cm³
Product Codes	NCZ-2243K

Product	3N (99.9%) 300nm Silicon (Si) Nanoparticle Water Dispersion, 5%
CAS No.	7440-21-3
Appearance	Grayish-white to light brown
Purity	≥99%, ≥99.9%, ≥95%(Other purities are also available)
APS	300nm (Size Can be customized), Ask for other available size range.
Ingredient	Si
Molecular Weight	28.0855 g/mol
Melting Point	N/A
Boiling Point	N/A
Density	2.33 g/cm³
Product Codes	NCZ-158I

Product	Carboxylic Double-walled Carbon Nanotubes, 1g
CAS No.	308068-56-6
Appearance	Black fibrous
Purity	≥99%, ≥99.9%, ≥95%(Other purities are also available)
APS	N/A
Ingredient	CₓHᵧO_z
Molecular Weight	N/A
Melting Point	N/A
Boiling Point	N/A
Density	2.1–2.2 g/cm³
Product Codes	NCZ-309I

Fullerene Compound Formula	C70
Fullerene Molecular Weight	840.77 g/mol
Fullerene Purity	99%
Fullerene Melting Point	>280 °C
Fullerene Appearance	Black Powder
Fullerene CAS	115383-22-7

Product	Zinc Oxide with Alumina (ZnO/Al2O3) Sputtering Target
CAS No.	1314-13-2 (ZnO) / 1344-28-1 (Al₂O₃)
Appearance	Powder
Purity	≥99%, ≥99.9%, ≥95% (Other purities are also available)
APS	NA (Size Can be customized), Ask for other available size ranges.
Ingredient	N/A
Molecular Weight	81–90 g/mol
Melting Point	~1,975 °C (ZnO), ~2,050 °C (Al₂O₃)
Boiling Point	N/A
Density	~5.6 g/cm³
Product Codes	NCZ-1332K

Product	Silicon (Si) Sputtering Targets, undoped, Purity: 99.999%, Size: 2'', Thickness: 0.250''
CAS No.	7440-21-3
Appearance	Powder
Purity	≥99%, ≥99.9%, ≥95% (Other purities are also available)
APS	N/A (Size Can be customized), Ask for other available size ranges.
Ingredient	N/A
Molecular Weight	28.0855 g/mol
Melting Point	1,414 °C
Boiling Point	3,265 °C
Density	2.33 g/cm³
Product Codes	NCZ-1734K

Product	Niobium (Nb) Sputtering Targets, Purity: 99.95% pure Ex Ta, Size: 3'', Thickness: 0.250''
CAS No.	7440-03-1
Appearance	Powder
Purity	≥99%, ≥99.9%, ≥95% (Other purities are also available)
APS	N/A (Size Can be customized), Ask for other available size ranges.
Ingredient	N/A
Molecular Weight	92.906 g/mol
Melting Point	2,468 °C
Boiling Point	4,744 °C
Density	8.57 g/cm³
Product Codes	NCZ-1815K

Filter by price

Product categories

Applications of Sputtering Targets;

Applications of Sputtering Targets;

Applications of Sputtering Targets;

Applications of Sputtering Targets;

Applications of Sputtering Targets;

Applications of Sputtering Targets;

Applications:

Boron Doped Graphene

DESCRIPTION

Applications

XRD Analysis

XPS Analysis

TEM

SEM

Applications of Sputtering Targets;

Applications of Sputtering Targets;

Fullerene-C70

Purity: 99%

Technical Properties:

Applications:

Applications of Sputtering Targets;

Applications of Sputtering Targets;

Applications of Sputtering Targets;

Polyhydroxylated Fullerene (Fullerenols)/ C60

(-OH) Functionalized, Dispersed in Water, 500 ppm Dry powder

Applications:

Applications:

Gallium Arsenide (GaAs) Wafer

Size: 4”, Double Side Polished, Thickness: 300± 25 μm, EPI-ready

Technical Properties:

Applications:

Applications of Sputtering Targets;

Applications:

Single Walled Carbon Nanotubes

Purity: > 96%, Dia: 1.0 nm

Applications:

Applications of Sputtering Targets;

Applications of Sputtering Targets;

Applications of Sputtering Targets;

Applications of Sputtering Targets;

Applications of Sputtering Targets;

Applications of Sputtering Targets;

Cobalt (Co) Nanopowder/Nanoparticles

Purity: 99.5%, Size: 100 nm

Cobalt (Co) Nanopowder/Nanoparticles

Purity: 99.5%, Size: 100 nm

Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles Dispersion in 2-Propanol

Gamma, Size: 12 nm, 12 wt%

Boron Doped Graphene

Shipping world wide

24/7 Support.

Online Payment.

Fast Delivery.

Canada (North America) Office Address:

Product	Nickel Vanadium (NiV) Sputtering Targets, Purity: 99.95%, Size: 1'', Thickness: 0.250''
CAS No.	11137-91-4
Appearance	Powder
Purity	≥99%, ≥99.9%, ≥95% (Other purities are also available)
APS	N/A (Size Can be customized), Ask for other available size ranges.
Ingredient	N/A
Molecular Weight	~57.9 g/mol
Melting Point	~1,350–1,450 °C
Boiling Point	N/A
Density	~8.5 g/cm³
Product Codes	NCZ-1829K

Product	Lithium Titanate (Li2TiO3) Sputtering Targets, Purity: 99.95%, Size: 1'', Thickness: 0.250''
CAS No.	12031-82-2
Appearance	Powder
Purity	≥99%, ≥99.9%, ≥95% (Other purities are also available)
APS	N/A (Size Can be customized), Ask for other available size ranges.
Ingredient	N/A
Molecular Weight	109.75 g/mol
Melting Point	Decomposes before melting (~1,200 °C)
Boiling Point	N/A
Density	~3.41 g/cm³
Product Codes	NCZ-2014K

Product	3N5 (99.95%) Niobium (Nb) Wire (0.5mm Dia.) Evaporation Materials
CAS No.	7440-03-1
Appearance	Gray, Metallic
Purity	≥99%, ≥99.9%, ≥95%(Other purities are also available)
APS	0.5mm (Size Can be customized), Ask for other available size range.
Ingredient	Nb
Molecular Weight	92.91 g/mol
Melting Point	2,468 °C
Boiling Point	N/A
Density	8.57 g/cm³
Product Codes	NCZ-141E

Product	5N 0.3-10 um Alpha Aluminum Oxide (Alumina) Al2O3 Powder, 500 g
CAS No.	1344-28-1
Appearance	White
Purity	≥99%, ≥99.9%, ≥95%(Other purities are also available)
APS	0.3-10um (Size Can be customized), Ask for other available size range.
Ingredient	Al2O3
Molecular Weight	101.96 g/mol
Melting Point	1N/A
Boiling Point	N/A
Density	0.4-0.6 g/cm3
Product Codes	NCZ-256I

Product	Carbon Quantum Dot Dispersion (Green Fluorescence)
CAS No.	7789-75-5
Appearance	Clear to pale yellow or brown
Purity	≥99%, ≥99.9%, ≥95%(Other purities are also available)
APS	2–10nm (Size Can be customized), Ask for other available size range.
Ingredient	CₓHᵧN_zO_w
Molecular Weight	N/A
Melting Point	N/A
Boiling Point	N/A
Density	1.8–2.2 g/cm³
Product Codes	NCZ-303I

Product	Cadmium (Cd) Sputtering Target
CAS No.	7440-43-9
Appearance	Powder
Purity	≥99%, ≥99.9%, ≥95% (Other purities are also available)
APS	NA (Size Can be customized), Ask for other available size ranges.
Ingredient	N/A
Molecular Weight	112.41 g/mol
Melting Point	321.07 °C
Boiling Point	767 °C
Density	8.65 g/cm³
Product Codes	NCZ-1286K