Aluminum Silicon (AlSi) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.250”

$150.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. When the target shatters,

Mass spectrometry measures the concentration and identity of sputtered atoms. The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”

$150.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Nickel (Ni) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”

$150.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Aluminum Copper (Al/Cu) Sputtering Target

Price range: $150.00 through $515.00
Select options This product has multiple variants. The options may be chosen on the product page

Product 

Aluminum Copper (Al/Cu) Sputtering Target

CAS No.

12004‑15‑8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

89.911 g/mol

Melting Point

~ 548 °C

Boiling Point

≈ 2,400 °C to 2,550 °C

Density

6.52 g/cm³

Product Codes

NCZ-1312K

4N5 (99.995%) Lead (Pb) Pieces Evaporation Materials

Price range: $150.00 through $594.00
Select options This product has multiple variants. The options may be chosen on the product page
Product 4N5 (99.995%) Lead (Pb) Pieces Evaporation Materials
CAS No. 7439-92-1
Appearance Bluish White, Metallic
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 3–6 mm (Size Can be customized),  Ask for other available size range.
Ingredient Pb
Molecular Weight N/A
Melting Point 328 °C
Boiling Point N/A
Density 11.34 g/cm3
Product Codes NCZ-161E
 

High Purity Methylammonium Chloride (MACl, CH6ClN), 99.99%, 50g

$150.00
Product High Purity Methylammonium Chloride (MACl, CH6ClN), 99.99%, 50g
CAS No. 593-51-1
Appearance White 
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS <10µm (Size Can be customized), Ask for other available size range.
Ingredient CH6ClN
Molecular Weight 67.52 g/mol
Melting Point 233 °C
Boiling Point 954 °C 
Density N/A
Product Codes NCZ-106I
 

Aqueous Dispersion of PEDOT:PSS Conductive Polymer (Clevios P VP AI 4083) for Solar Cell and Electronics, OLED Grade

Price range: $150.00 through $403.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Aqueous Dispersion of PEDOT:PSS Conductive Polymer (Clevios P VP AI 4083) for Solar Cell and Electronics, OLED Grade
CAS No. 155090-83-8
Appearance Dark blue aqueous liquid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 4–6µm (Size Can be customized),  Ask for other available size range.
Ingredient C₆H₄O₂S
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 1.0–1.1 g/cm³
Product Codes NCZ-290I

Titanium carbide(TiC) (220571)

Price range: $150.00 through $170.00
Select options This product has multiple variants. The options may be chosen on the product page
Titanium carbide(TiC) (220571)
Grade Chemical composition(%) Average particle size Fsss(µm)
Total carbon Free carbon Fe Si Al O N Na Ca
TiC-X ≥19.0 ≤1.0 0.10 0.05 0.01 1.20 0.50 0.01 0.02 ≤1.0
TiC-1 ≥19.0 ≤1.0 0.06 0.05 0.01 0.60 0.30 0.01 0.02 1.5-2.0
TiC-2 ≥19.0 ≤1.0 / 0.05 0.01 0.50 0.50 0.01 0.02 2.0-4.0
 
Product Codes- NCZ-2758K

Carbon Nanotube Sponges, Size: 10 mm x 10 mm, Thickness: 3-4 mm

Price range: $151.00 through $563.00
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Carbon Nanotube Sponges, Size: 10 mm x 10 mm, Thickness: 3-4 mm The carbon nanotube sponge structure is uniform and they possess good mechanical strength, good flexibility, high porosity and low density. They can be used as a purifying agent in order to absorb pollutants. These pollutants can be fertilizers, pesticides or pharmaceuticals found in water, energy storage materials, catalyst carriers or in high-efficiency composite materials.

Carbon Nanotube-Carbon Black Prepared by Electrostatic Adsorption, CNTs: 34.4 wt%, Carbon Black: 65.6 wt%

Price range: $151.00 through $643.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Super conductive black carbon nanoparticles surface is usually negatively charged. Carbon nanotubes are treated with cationic surfactant (Cetyl trimethyl ammonium bromide). Carbon nanotubes and black carbon self assemble to form a uniform stable complex. The complex shows high strength and conductivity which makes it suitable for processing into conductive plastics, conductive sheets, and films.  

Carbon Nanotube Buckypaper with Metal 0.8%, Thickness: 28 µm, Diameter: 35-39 mm

Price range: $151.00 through $682.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Carbon Nanotubes are used in a variety of applications. Buckypapers with metals are strong and have good electrical conductivity. They can be used for the following purposes: 1-Transmission of electricity and heat. 2- super capacitors. 3-Shielding against electromagnetic interference. 4-Electrodes are used in fuel cells, supercapacitors, and batteries. 5-Extremely strong structures. 6-Medical equipment. 7-Displays with seven flat panels.

Gallium Arsenide (GaAs) Wafers, Size: 2”, Thickness: 350±25 μm, Double Side Polished, EPI-ready, Dopant: Zinc (P Type)

Price range: $151.00 through $2,250.00
Select options This product has multiple variants. The options may be chosen on the product page
Gallium Arsenide (GaAs) Wafer Size: 2”, Double Side Polished, Thickness: 350± 25 μm, EPI-ready, Dopant: Zinc (P Type) Technical Properties:

Boron Nitride Nanoparticles/ Nanopowder (BN, Hexagonal, 99.5%, <100nm)

Price range: $151.00 through $387.00
Select options This product has multiple variants. The options may be chosen on the product page
$151/25g
$387/100g

Product 

Boron Nitride Nanoparticles/ Nanopowder (BN, Hexagonal, 99.5%, <100nm)

CAS No.

10043-11-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

<100nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

24.82 g/mol

Melting Point

>2,973 °C (sublimes without melting)

Boiling Point

Sublimes at ~2,973 °C

Density

~2.1–2.3 g/cm³

Product Codes

NCZ-1103K

Silicon Dioxide (SiO2) Sputtering Targets, Fused Quartz, Purity: 99.995%, Size: 3”, Thickness: 0.250”

$151.00

Product 

Silicon Dioxide (SiO2) Sputtering Targets, Fused Quartz, Purity: 99.995%, Size: 3'', Thickness: 0.250''

CAS No.

7631-86-9

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

60.08 g/mol

Melting Point

~1710°C

Boiling Point

 ~2,950 °C

Density

~2.20 g/cm³

Product Codes

NCZ-1715K

Carbon (C) (Graphite) Sputtering Targets, Purity: 99.999%, Size: 3”, Thickness: 0.125”

$152.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

3N5 (99.95%) Chromium (Cr) Pieces Evaporation Materials

Price range: $152.00 through $286.00
Select options This product has multiple variants. The options may be chosen on the product page
Product 3N5 (99.95%) Chromium (Cr) Pieces Evaporation Materials
CAS No. 7440-47-3
Appearance Silvery, Metallic
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1–10 mm (Size Can be customized),  Ask for other available size range.
Ingredient Cr
Molecular Weight 175.34 g/mol
Melting Point 1857°C
Boiling Point 2672 °C
Density 7.2 g/cm³
Product Codes NCZ-106E
 

Indium Sputtering Target In

Price range: $152.00 through $865.00
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Product Indium Sputtering Target In
CAS No. 7440-74-6
Appearance Silvery Lustrous Gray, Metallic
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient In
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 7.31 g/cm³
Product Codes NCZ-121H

Titanium Sputtering Target Ti

Price range: $152.00 through $947.00
Select options This product has multiple variants. The options may be chosen on the product page
Product Titanium Sputtering Target Ti
CAS No. 7440-32-6
Appearance Silvery metallic
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Ti
Molecular Weight 47.867 g/mol
Melting Point N/A
Boiling Point N/A
Density 4.5 g/cm³
Product Codes NCZ-144H

Nickel (Ni) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”

$152.00

Product 

Nickel (Ni) Sputtering Targets, Purity: 99.99%, Size: 1'', Thickness: 0.125''

CAS No.

7440-02-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

~58.69 g/mol

Melting Point

~1,455 °C

Boiling Point

~2,913 °C

Density

~8.91 g/cm³

Product Codes

NCZ-1894K

Iron (Fe) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.125”

$152.00

Product 

Iron (Fe) Sputtering Targets, Purity: 99.95%, Size: 3'', Thickness: 0.125''

CAS No.

 7439-89-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 55.85 g/mol

Melting Point

 1538 °C

Boiling Point

 2862 °C

Density

 7.87 g/cm³

Product Codes

NCZ-2182K

Gallium Arsenide (GaAs) Wafers, Size: 4”, Thickness: 640±25 μm, Single Side Polished, EPI-ready, Dopant: Silicon (N-type)

Price range: $153.00 through $3,191.00
Select options This product has multiple variants. The options may be chosen on the product page
1 piece/138€ 5 pieces/640€ 25 pieces/2875€ Please contact us for quotes on larger quantities ! Gallium Arsenide (GaAs) Wafer Size: 4”, Single Side Polished, Thickness: 640± 25 μm, EPI-ready, Dopant: Silicon (N-type) Technical Properties:
Quality  GaAs
Materials  GaAs
Size (inch)  4”
Thickness (μm)  640± 25
Polished  Single Side
Dopant  Silicon (N-Type)
Orientation  (100) 2 deg off toward<111>A±0.5
Resistivity   (1.2-9.9) E-3
Mobility  1000-3000
EPD  ≤3000
Growth method  VGF
OF Length  32±1
IF Length  18±1
Applications: Gallium arsenide (GaAs) is a compound of the elements gallium and arsenic. Vertical gradient freeze is the most common method to produce GaAs wafers. Mainly used for circuits, electronics and solar cell applications. Carbon, silicon, tellurium and zinc are some of the dopants that are used to modify the characteristics and electrical properties of gallium arsenide wafers. Wafer flatness and surface purity are ensured by highest quality standards. Boron concentration of gallium arsenide wafers highly depend on the production method. Gallium arsenide wafers with adequate electrical resistancy prevent high current induction in the circuit. Mobility of GaAs wafers can be tailored with different doping levels. Gallium arsenide (GaAs) is a semiconductor compound. Gallium arsenide (GaAs)  has a high electron velocity and high saturated electron mobility. This makes gallium arsenide (GaAs) components are useful in fast electronic switching applications and at ultra-high radio frequencies. In 1907, the British discovered infrared emmission from gallium arsenide. This was called electroluminescence. Also, gallium arsenide (GaAs) was used as a solar cells in space for the Venera 3 mission in 1965, which is the first known operational use of gallium arsenide (GaAs).
  • Gallium arsenide (GaAs) is used in laser diodes.
  • Gallium arsenide (GaAs) is used in solar cells.
  • Gallium arsenide (GaAs) is used in optical windows.
  • Gallium arsenide (GaAs) is used in monolithic microwave integrated circuits.
  • Gallium arsenide (GaAs) is used in microwave frequency integrated circuits.
  • Gallium arsenide (GaAs) is used in infrared light-emitting diodes.
  • Gallium arsenide (GaAs) is useful in barometers.
  • Gallium arsenide (GaAs) is useful in pharmaceuticals and nuclear medicine tests.
  • Gallium arsenide (GaAs) is useful in high temperature thermometers.

Gallium Arsenide (GaAs) Wafers, Size: 2”, Thickness: 400±25 μm, Double Side Polished, EPI-ready

Price range: $153.00 through $2,370.00
Select options This product has multiple variants. The options may be chosen on the product page
Gallium Arsenide (GaAs) Wafer Size: 2”, Double Side Polished, Thickness: 400± 25 μm, EPI-ready  Technical Properties: Quality  GaAs Materials  GaAs

Molybdenum (Mo) Sputtering Targets, Purity: 99.95%, Size: 3”, Thickness: 0.125”

$153.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Molybdenum (Mo) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.125”

$153.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Nickel (Ni) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”

$153.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Nickel Chromium (Ni-Cr) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”

$153.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Silicon Nanoparticles/ Nanopowder (Si, 99% 50~80nm)

Price range: $153.00 through $391.00
Select options This product has multiple variants. The options may be chosen on the product page
$153/25g
$391/100g

Product 

Silicon Nanoparticles/ Nanopowder (Si, 99% 50~80nm)

CAS No.

7440-21-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

50~80nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

28.0855 g/mol

Melting Point

 1,414 °C

Boiling Point

3,265 °C

Density

~2.33 g/cm³

Product Codes

NCZ-1066K

Multi Walled Carbon Nanotubes N-butanol Dispersion, 4 wt%, Purity: >96%, OD: 45-75 nm, Length 8-28 µm

Price range: $154.00 through $752.00
Select options This product has multiple variants. The options may be chosen on the product page
15 ml/140 € 30 ml/245 € 60 ml/385 € 120 ml/682 €    
Please contact us for quotes on larger quantities !!!

Multi Walled Carbon Nanotubes N-butanol Dispersion

4 wt%, Purity: >96+%, OD: 45-75 nm, Length 8-28 µm

Technical Properties:

Purity >96 %
Color black
Average Outside Diameter (nm) 45-75
Average Inside Diameter (nm) 5.0-10.0
Length (μm) 8-28
Tap Density (g/cm3) 0.30
True Density (g/cm3) 2.4
Specific Surface Area (m2/g) 50
Ash < 1.5 wt%
Electrical Conductivity (S/cm) > 98
Manufacturing Method CVD

Applications:

MWCNTs have a variety of potential applications in different fields. These applications include midicine, mechanical, electric, chemical, energy and others. It can be applied in, 1-drug dilevery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium battaries, 8-gas-discharge tubes, 9-flat panel display, 10-supercapacitor, 11-transistors, 12-solar cells, 13-photoluminescence, 14-tamplate  

Multi Walled Carbon Nanotubes Isopropanol Dispersion, 4 wt%, Purity: >96%, OD: 45-75 nm, Length 8-28 µm (No reviews

Price range: $154.00 through $766.00
Select options This product has multiple variants. The options may be chosen on the product page
15 ml/140 € 30 ml/245 € 60 ml/410 € 120 ml/695 €
Please contact us for quotes on larger quantities !!!

Multi Walled Carbon Nanotubes Isopropanol Dispersion

4 wt%, Purity: >96+%, OD: 45-75 nm, Length 8-28 µm

Technical Properties:

Purity > 96%
Color black
Average Outside Diameter (nm) 45-75
Average Inside Diameter (nm) 5.0-10.0
Length (μm) 8-28
Tap Density (g/cm3) 0.30
True Density (g/cm3) 2.4
Specific Surface Area (m2/g) 50
Ash < 1.5 wt%
Electrical Conductivity (S/cm) > 98
Manufacturing Method CVD

Applications:

MWCNTs have a variety of potential applications in different fields. These applications include midicine, mechanical, electric, chemical, energy and others. It can be applied in, 1-drug delivery, 2-biosensors, 3-CNT composites, 4-catalysis, 5-nanoprobes, 6-hydrogen storage, 7-lithium battaries, 8-gas-discharge tubes, 9-flat panel display, 10-supercapacitor, 11-transistors, 12-solar cells, 13-photoluminescence, 14-template

Lithium Battery Strapping Tape, Width: 10 mm, Thickness: 0.03 mm, Length: 100 m

Price range: $154.00 through $532.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Lithium Battery Strapping Tape is mainly used on parts of lithium battery and for adhesion, packing, wrapping and holding purposes on battery assembling process.

Indium (In) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”

$154.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

5N (99.999%) Antimony (Sb) Pieces Evaporation Materials

Price range: $154.00 through $847.00
Select options This product has multiple variants. The options may be chosen on the product page
Product 5N (99.999%) Antimony (Sb) Pieces Evaporation Materials
CAS No. 7440-36-0
Appearance Silvery, Lustrous Gray, Semi-metallic 
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1–10mm (Size Can be customized),  Ask for other available size range.
Ingredient Sb
Molecular Weight 121.76 g/mol
Melting Point N/A
Boiling Point N/A
Density 6.69 g/cm³
Product Codes NCZ-135E

4N (99.99%) Zinc Sulfide (ZnS) Pieces (3-12mm) Evaporation Materials

Price range: $154.00 through $511.00
Select options This product has multiple variants. The options may be chosen on the product page
Product 4N (99.99%) Zinc Sulfide (ZnS) Pieces (3-12mm) Evaporation Materials
CAS No. 1314-98-3
Appearance White, Crystalline Solid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 3-12mm (Size Can be customized),  Ask for other available size range.
Ingredient ZnS
Molecular Weight 97.47 g/mol
Melting Point 1,700 °C
Boiling Point N/A
Density 3.98 g/cm3
Product Codes NCZ-151E
 

3N (99.9%) Chromium Oxide Cr2O3 Pieces Evaporation Materials

Price range: $154.00 through $843.00
Select options This product has multiple variants. The options may be chosen on the product page
Product 3N (99.9%) Chromium Oxide Cr2O3 Pieces Evaporation Materials
CAS No. 1308-38-9
Appearance Green, Crystalline Solid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1–6mm (Size Can be customized),  Ask for other available size range.
Ingredient Cr2O3
Molecular Weight 151.99 g/mol
Melting Point 1,529 °C
Boiling Point N/A
Density 5.22 g/cm3
Product Codes NCZ-163E
 

10g High Purity (>99.9 wt%) Graphitized Multi-Walled Carbon Nanotubes (MWCNTs) with Open Tube Ends

$154.00
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Product 10g High Purity (>99.9 wt%) Graphitized Multi-Walled Carbon Nanotubes (MWCNTs) with Open Tube Ends
CAS No. 308068-56-6
Appearance Black fibrous
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A.
Ingredient N/A
Molecular Weight 12.01 g/mol
Melting Point N/A
Boiling Point N/A
Density 2.1 g/cm³
Product Codes NCZ-123I
 

4N (99.99%) Zinc Sulfide (ZnS) Pieces (3-12mm) Evaporation Materials

Price range: $154.00 through $511.00
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Product 4N (99.99%) Zinc Sulfide (ZnS) Pieces (3-12mm) Evaporation Materials
CAS No. 1314-98-3
Appearance Yellow-Red, Crystalline Solid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 3-12mm (Size Can be customized),  Ask for other available size range.
Ingredient ZnS
Molecular Weight 97.47 g/mol
Melting Point N/A
Boiling Point N/A
Density 3.98 g/cm³
Product Codes NCZ-179I
 

5N (99.999%) Antimony (Sb) Pieces Evaporation Materials

Price range: $154.00 through $847.00
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Product 5N (99.999%) Antimony (Sb) Pieces Evaporation Materials
CAS No. 7440-36-0
Appearance Silvery-gray, brittle metallic solid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient Sb
Molecular Weight 121.76 g/mol
Melting Point 630.6 °C
Boiling Point 1,580 °C
Density 6.697 g/cm³
Product Codes NCZ-193I

85-95% 200 nm Titanium Dioxide TiO2 Nanoparticles, 500g

$154.00
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Product 85-95% 200 nm Titanium Dioxide TiO2 Nanoparticles, 500g
CAS No. 13463-67-7
Appearance White
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 200nm (Size Can be customized),  Ask for other available size range.
Ingredient TiO2
Molecular Weight 79.87 g/mol
Melting Point N/A
Boiling Point N/A
Density 4.23 g/cm³
Product Codes NCZ-205I

99% Anhydrous Zirconium(IV) Chloride (ZrCl4) Powder

Price range: $154.00 through $847.00
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Product 99% Anhydrous Zirconium(IV) Chloride (ZrCl4) Powder
CAS No. 10026-11-6
Appearance Black
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1-10μm. (Size Can be customized),  Ask for other available size range.
Ingredient ZrCl4
Molecular Weight 233.04 g/mol
Melting Point N/A
Boiling Point N/A
Density 2.8 g/cm³
Product Codes NCZ-210I
 

99.5% Silicon Dioxide Polishing Powder Nanoparticles, 1kg

Price range: $154.00 through $220.00
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Product 99.5% Silicon Dioxide Polishing Powder Nanoparticles, 1kg
CAS No. 7631-86-9
Appearance White
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient SiO2
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 0.65 g/cm³
Product Codes NCZ-221I
 

Praseodymium (Pr) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.250”

$154.00

Product 

Praseodymium (Pr) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.250''

CAS No.

7440-10-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 140.91 g/mol

Melting Point

931 °C

Boiling Point

 3520 °C

Density

 6.77 g/cm³

Product Codes

NCZ-1792K

Cerium Oxide (CeO2) Powder 99.5%, 2N5 Trace Metal Basis, 1kg

$154.00
Product Cerium Oxide (CeO2) Powder 99.5%, 2N5 Trace Metal Basis, 1kg
CAS No. 1306-38-3
Appearance Pale yellow or white
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS N/A
Ingredient CeO2
Molecular Weight 172.11 g/mol
Melting Point N/A
Boiling Point N/A
Density 7.22 g/cm³
Product Codes NCZ-316I
 

Nickel (Ni) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”

$154.00

Product 

Nickel (Ni) Sputtering Targets, Purity: 99.9%, Size: 3'', Thickness: 0.250''

CAS No.

7440-02-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 58.69 g/mol

Melting Point

~1453–1455 °C

Boiling Point

~2913 °C

Density

 8.90 g/cm³

Product Codes

NCZ-1883K

Multi Walled Carbon Nanotubes Isopropanol Dispersion, 4 wt%, Purity: >96%, OD: 45-75 nm, Length 8-28 µm

Price range: $155.00 through $765.00
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Multi Walled Carbon Nanotubes Isopropanol Dispersion 4 wt%, Purity: >96+%, OD: 45-75 nm, Length 8-28 µm Technical Properties: Purity > 96%

Multi Walled Carbon Nanotubes N-butanol Dispersion, 4 wt%, Purity: >96%, OD: 45-75 nm, Length 8-28 µm

Price range: $155.00 through $750.00
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Multi Walled Carbon Nanotubes N-butanol Dispersion 4 wt%, Purity: >96+%, OD: 45-75 nm, Length 8-28 µm Technical Properties: Purity >96 %

CR2032 Coin Cell Cases with 304SS, Diameter: 20 mm, Height: 3.2 mm

Price range: $155.00 through $544.00
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Applications:

CR2032 Coin Cell Cases with SS304 is excellent for developing new rechargeable battery and battery electrodes

Bismuth Powder (Bi, 99.0+%, <25 um)

Price range: $155.00 through $255.00
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$155/500g
$255/1kg

Product 

Bismuth Powder (Bi, 99.0+%, <25 um)

CAS No.

7440-69-9

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

100nm (Size Can be customized), Ask for other available size ranges.

Ingredient

AlN

Molecular Weight

208.98 g/mol

Melting Point

~271.4 °C

Boiling Point

1,564 °C

Density

~9.78 g/cm³

Product Codes

NCZ-1023K

Copper Nanowires/ Cu Nanowires Immersed in Ethanol

$155.00
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$155/5g

Product 

Copper Nanowires/ Cu Nanowires Immersed in Ethanol

CAS No.

7440-50-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

300 nm (Size Can be customized), Ask for other available size ranges.

Ingredient

AlN

Molecular Weight

63.55 g/mol

Melting Point

1084.62 °C

Boiling Point

2562 °C

Density

8.96 g/cm³

Product Codes

NCZ-1040K

Silicon Powder ( Si, 99.9+%, -200mesh/+325mesh)

Price range: $155.00 through $285.00
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$155/500g
$285/kg

Product 

Silicon Powder ( Si, 99.9+%, -200mesh/+325mesh)

CAS No.

7440-21-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

-200mesh/+325mesh (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

28.0855 g/mol

Melting Point

1,414 °C

Boiling Point

3,265 °C

Density

~2.33 g/cm³

Product Codes

NCZ-1073K

Tantalum Carbide Nanopowder/ Nanoparticles ( TaC, 99.5%, <2um)

Price range: $155.00 through $845.00
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$155/100g
$475/500g
$845/1kg

Product 

Tantalum Carbide Nanopowder/ Nanoparticles ( TaC, 99.5%, <2um)

CAS No.

12070-06-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

<2 µm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

192.96 g/mol

Melting Point

~3,768–3,880 °C

Boiling Point

~4,780–5,470 °C

Density

~14.3–14.7 g/cm³

Product Codes

NCZ-1193K

High Purity Short MWNTs -OH Functionalized 98+%, 8~15nm

Price range: $155.00 through $855.00
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$155/5g
$355/25g
$855/100g

Product 

High Purity Short MWNTs -OH Functionalized 98+%, 8~15nm

CAS No.

7727-54-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

8~15nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

228.20 g/mol

Melting Point

 120 °C

Boiling Point

NA

Density

 1.98 g/cm³

Product Codes

NCZ-1264K

High Purity Short MWNTs -OH Functionalized 98+%, >50nm

Price range: $155.00 through $855.00
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$155/5g
$355/25g
$855/100g

Product 

High Purity Short MWNTs -OH Functionalized 98+%, >50nm

CAS No.

7727-54-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

>50nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 228.20 g/mol

Melting Point

 120 °C

Boiling Point

NA

Density

1.98 g/cm³

Product Codes

NCZ-1266K

High Purity Short MWNTs -COOH Functionalized 98+%, 8~15nm

Price range: $155.00 through $855.00
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$155/5g
$355/25g
$855/100g

Product 

High Purity Short MWNTs -COOH Functionalized 98+%, 8~15nm

CAS No.

708051-49-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

8~15nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

NA

Melting Point

 >600 °C

Boiling Point

NA

Density

 ~1.8–2.1 g/cm³

Product Codes

NCZ-1276K

High Purity Short MWNTs -COOH Functionialized 98+%, 20~30nm

Price range: $155.00 through $855.00
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$155/5g
$355/25g
$855/100g

Product 

High Purity Short MWNTs -COOH Functionialized 98+%, 20~30nm

CAS No.

708051-49-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

20~30nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

NA

Melting Point

 >600 °C

Boiling Point

NA

Density

 ~1.8–2.1 g/cm³

Product Codes

NCZ-1277K

High Purity Short MWNTs -OH Functionialized 98+%, 20~30nm

Price range: $155.00 through $855.00
Select options This product has multiple variants. The options may be chosen on the product page
$155/5g
$355/25g
$855/100g

Product 

High Purity Short MWNTs -OH Functionialized 98+%, 20~30nm

CAS No.

7727-54-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

8~15nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

228.20 g/mol

Melting Point

 ~120 °C

Boiling Point

N/A

Density

 1.98 g/cm³

Product Codes

NCZ-1265K

High Purity Short MWNTs -OH Functionalized 98+%, 30~50nm

Price range: $155.00 through $855.00
Select options This product has multiple variants. The options may be chosen on the product page
$155/5g
$355/25g
$855/100g

Product 

High Purity Short MWNTs -OH Functionalized 98+%, 30~50nm

CAS No.

7727-54-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

30~50nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

228.18 g/mol

Melting Point

 120 °C

Boiling Point

NA

Density

1.98 g/cm³

Product Codes

NCZ-1282K

High Purity Short MWNTs -COOH Functionalized 98+%, >50nm

Price range: $155.00 through $855.00
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$155/5g
$355/25g
$855/100g

Product 

High Purity Short MWNTs -COOH Functionalized 98+%, >50nm

CAS No.

708051-49-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

>50nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

NA

Melting Point

 >600 °C

Boiling Point

NA

Density

 ~1.8–2.1 g/cm³

Product Codes

NCZ-1279K

High Purity Short MWNTs -COOH Functionalized 98+%, <8nm

Price range: $155.00 through $855.00
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$155/5g
$355/25g
$855/100g

Product 

High Purity Short MWNTs -COOH Functionalized 98+%, <8nm

CAS No.

7727-54-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

50-100 nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

228.18 g/mol

Melting Point

~120 °C

Boiling Point

NA

Density

1.98 g/cm³

Product Codes

NCZ-1283K

Copper (Cu) Sputtering Target

Price range: $155.00 through $486.00
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Product 

Copper (Cu) Sputtering Target

CAS No.

7440-50-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

63.55 g/mol

Melting Point

2,562 °C

Boiling Point

2,927 °C

Density

8.96 g/cm³

Product Codes

NCZ-1352K

Iron (Fe) Sputtering Target

Price range: $155.00 through $486.00
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Product 

Iron (Fe) Sputtering Target

CAS No.

7439-88-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

192.22 g/mol

Melting Point

2,446 °C

Boiling Point

4,428 °C

Density

22.56 g/cm³

Product Codes

NCZ-1358K