High Purity MWNTs – OH Functiionalized 98+%

Price range: $115.00 through $555.00
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$115/5g
$275/25g
$555/100g

Product 

High Purity MWNTs - OH Functiionalized 98+%

CAS No.

7727‑54‑0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 <8nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 228.20 g/mol

Melting Point

~120 °C

Boiling Point

NA

Density

 1.98 g/cm³

Product Codes

NCZ-1281K

Niobium Oxide (Nb2O5) Sputtering Target

Price range: $115.00 through $526.00
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Product 

Niobium Oxide (Nb2O5) Sputtering Target

CAS No.

1313-96-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 NA (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

265.81 g/mol

Melting Point

~1,510 °C

Boiling Point

N\A

Density

~4.6–4.9 g/cm³

Product Codes

NCZ-1322K

High Purity MWNTs -OH Functionalized 99%

Price range: $115.00 through $595.00
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$115/5g
$297/25g
$795/100g

Product 

High Purity MWNTs -OH Functionalized 99%

CAS No.

 7727-54-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

30~50nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

228.20 g/mol

Melting Point

120 °C

Boiling Point

N/A

Density

 ~2.1–2.3 g/cm³

Product Codes

NCZ-1391K

Selenium (Se) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.250”

$116.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Selenium (Se) Sputtering Targets, Purity: 99.999%, Size:1”, Thickness: 0.125”

$116.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target mat

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

erial is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

Aluminum Nanoparticles/ Nanopowder (Al, 99.7% 40-60 nm)

Price range: $116.00 through $815.00
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$116/25g
$332/100g
$815/250g

Product 

Aluminum Nanoparticles/ Nanopowder (Al, 99.7% 40-60 nm)

CAS No.

24304-00-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

40-60 nm (Size Can be customized), Ask for other available size ranges.

Ingredient

AlN

Molecular Weight

40.982 g/mol

Melting Point

2200 °C

Boiling Point

2517 °C

Density

3.3 g/cm³

Product Codes

NCZ-1010K

Molybdenum Nanoparticles/ Mo Nanopowder ( 99.7%, 40~60nm)

Price range: $116.00 through $333.00
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$116/25g
$333/100g

Product 

Molybdenum Nanoparticles/ Mo Nanopowder ( 99.7%, 40~60nm)

CAS No.

7439-98-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

40~60nm (microns) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

95.95 g/mol

Melting Point

2623 °C

Boiling Point

4639 °C

Density

10.28 g/cm³

Product Codes

NCZ-1048K

Barium Strontium Titanate Sputtering Target SrBaTiO3

Price range: $116.00 through $1,583.00
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Product Barium Strontium Titanate Sputtering Target SrBaTiO3
CAS No. 12636-91-4
Appearance Gray to black
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 0.5µm (Size Can be customized),  Ask for other available size range.
Ingredient SrBaTiO3
Molecular Weight 304.98 g/mol
Melting Point 1,700 °C
Boiling Point N/A
Density 5.5 – 6.2 g/cm³
Product Codes NCZ-104H

Zinc (Zn) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.125”

$116.00

Product 

Zinc (Zn) Sputtering Targets, Purity: 99.95%, Size: 1'', Thickness: 0.125''

CAS No.

7440‑66‑6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

Zn (black granules) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

65.38 g/mol

Melting Point

419.5 °C

Boiling Point

 907 °C

Density

7.14 g/cm³

Product Codes

NCZ-1478K

Silicon (Si) Sputtering Targets, undoped, Purity: 99.999%, Size: 1”, Thickness: 0.250”

$116.00

Product 

Silicon (Si) Sputtering Targets, undoped, Purity: 99.999%, Size: 1'', Thickness: 0.250''

CAS No.

7440-21-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

28.0855 g/mol

Melting Point

1,414 °C

Boiling Point

 3,265 °C

Density

 2.33 g/cm³

Product Codes

NCZ-1736K

Iron (Fe) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.250”

$116.00

Product 

Iron (Fe) Sputtering Targets, Purity: 99.95%, Size: 2'', Thickness: 0.250''

CAS No.

 7439-89-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 55.85 g/mol

Melting Point

 1538 °C

Boiling Point

 2862 °C

Density

 7.87 g/cm³

Product Codes

NCZ-2185K

Iron (Fe) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”

$116.00

Product 

Iron (Fe) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.125''

CAS No.

 7439-89-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 55.85 g/mol

Melting Point

 1538 °C

Boiling Point

 2862 °C

Density

 7.87 g/cm³

Product Codes

NCZ-2189K

Scandium Oxide (Sc2O3) Micron Powder, Purity: 99.99%, Size: 325 mesh

Price range: $117.00 through $2,141.00
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Applications:

Scandium oxide is used in the preparation of other scandium compounds. It is also used as additive to glass, ceramics and high temperature systems to improve their properties.

Cobalt (Co) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.250”

$117.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

The chemical element cobalt has the atomic number 27 and the symbol Co. Cobalt is a silver-gray, hard, and shiny metal. Because it is one of only three room temperature ferromagnets with unaxial symmetry and hence suitability for digital recording, cobalt is employed in the production of high-strength, wear-resistant alloys as well as magnetic recording.

Tin (Sn) Sputtering Targets, Purity: 99.95%, Size: 2”, Thickness: 0.125”

$117.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Vanadium (V) Sputtering Targets, Purity: 99.5%, Size: 1”, Thickness: 0.250”

$117.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Yttrium Oxide Micron Powder (Y2O3, 99.995%, 1~2um)

Price range: $117.00 through $327.00
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$117/100g
$280/500g
$327/Kg

Product 

Yttrium Oxide Micron Powder (Y2O3, 99.995%, 1~2um)

CAS No.

1314-36-9

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 1~2um (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

225.81 g/mol

Melting Point

~2,430 °C

Boiling Point

~4,300 °C

Density

~5.01 g/cm³

Product Codes

NCZ-1211K

Yttrium Oxide Micron Powder (Y2O3, 99.999%, <10um)

Price range: $117.00 through $280.00
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$117/100g
$280/500g

Product 

Yttrium Oxide Micron Powder (Y2O3, 99.999%, <10um)

CAS No.

1314-36-9

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

<10um (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

225.81 g/mol

Melting Point

~2,430 °C

Boiling Point

~4,300 °C

Density

~5.01 g/cm³

Product Codes

NCZ-1212K

Yttrium Oxide Powder (Y2O3, 99.995%, 1~2um)

Price range: $117.00 through $280.00
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$117/100g $280/500g $327/kg
Product Yttrium Oxide Powder (Y2O3, 99.995%, 1~2um)
CAS No. 1314-36-9
Appearance White powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1-2um (Size Can be customized),  Ask for other available size range.
Ingredient Y2O3
Molecular Weight 225.81 g/mol
Melting Point 2425°C
Boiling Point 4300°C
Density 5.01 g/cm³
Product Codes NCZ-123R
 

Yttrium Oxide Micron Powder (Y2O3, 99.999%, <10um)

Price range: $117.00 through $180.00
Select options This product has multiple variants. The options may be chosen on the product page
$117/100g $180/500g
Product Yttrium Oxide Micron Powder (Y2O3, 99.999%, <10um)
CAS No. 1314-36-9
Appearance White powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 10um (Size Can be customized),  Ask for other available size range.
Ingredient Y2O3
Molecular Weight 225.81 g/mol
Melting Point 2425°C
Boiling Point 4300°C
Density 5.01 g/cm³
Product Codes NCZ-124R
 

Nickel (Ni) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 31 nm, Metal Basis

Price range: $118.00 through $282.00
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Nickel (Ni) Nanopowder/Nanoparticles

Purity: 99.95%, Size: 31 nm, Metal Basis

Technical Properties:

True Density (g/cm3) 8,9
Shape spherical
Color black
Average Particle Size (nm) 31
Specific Surface Area (m2/g) 11,0-15,0
Elemental Analysis Ni Si Mg Fe Others
99.9 0.1 0.1 0.1 0.05

Properties, Storage and Cautions:

Nickel nanoparticles are highly reactive and flammable, therefore it should be handled with care and rapid moves, vibrations should be avoided. Nanopowder should be kept away from sunlight, any kind of heating, moisture and impacts. Coagulation of the particles is a serious problem, so, nanopowder should be sealed under vacuum and should be kept in cool and dry conditions. Air contact should be avoided.

Nickel (Ni) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 90 nm, Metal Basis

Price range: $118.00 through $232.00
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Nickel (Ni) Nanopowder/Nanoparticles

Purity: 99.95%, Size: 90 nm, Metal Basis

Technical Properties:

Bulk Density (g/cm3) 1,1
True Density (g/cm3) 8,9
Shape spherical
Color black
Average Particle Size (nm) 90
Specific Surface Area (m2/g) 28,1
Elemental Analysis Ni Co Mg Pb Others
99.95 0.002 0.001 0.001 0.001

Properties, Storage and Cautions:

Nickel nanoparticles are highly reactive and flammable, therefore it should be handled with care and rapid moves, vibrations should be avoided. Nanopowder should be kept away from sunlight, any kind of heating, moisture and impacts. Coagulation of the particles is a serious problem, so, nanopowder should be sealed under vacuum and should be kept in cool and dry conditions. Air contact should be avoided.

Aluminum (Al) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.125”

$118.00

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Aluminum which has the chemical symbol of Al, is a silvery white, soft, ductile metal that is the third most abundant element. Aluminum is notable due to for its light weight, strength, durability and for its ability to resist corrosion. Aluminum forms an extremely thin but very strong layer of oxide film. Aluminum has also high thermal and electrical conductivity. Aluminum sputtering targets have a particularly fine-grained microstructure. This property of Aluminum sputtering targets ensures that you benefit from uniform erosion and a low susceptibility to particle formation throughout the sputtering process.

Zinc (Zn) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.250”

$118.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

N-Methyl-2-Pyrrolidone (NMP) Solvent for Lithium Battery Cathode Materials, Purity: 99.90%

Price range: $119.00 through $494.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

N-Methyl-2-Pyrrolidone (NMP) Solvent for Lithium Battery Cathode Materials

Lutetium Oxide (Lu2O3) Micron Powder, Purity: 99.99%, Size: 325 mesh

Price range: $119.00 through $1,850.00
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Applications:

Lutetium oxide is used as raw material for laser crystals. It is used in glass, ceramics, and phosphorus as an additive. It is also used as a catalyst in hydrogenation, polymerization, cracking, and alkylation.

N-Methyl-2-Pyrrolidone (NMP) Solvent for Lithium Battery Cathode Materials, Purity: 99.90%

Price range: $119.00 through $494.00
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Applications:

N-Methyl-2-Pyrrolidone (NMP) Solvent for Lithium Battery Cathode Materials

Polyhydroxylated Fullerene (Fullerenols)/ C60, (-OH) Functionalized, Dispersed in Water, 130 ppm Dry powder

Price range: $119.00 through $2,325.00
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Applications:

1. Pharmaceutical: Diagnostic reagents, super drugs, cosmetics, nuclear magnetic resonance (NMR) with the developer. DNA affinity, anti-HIV drugs, anti-cancer drugs, chemotherapy drugs, cosmetics additives and scientific research. 2. Energy: Solar battery, fuel cell, secondary battery. 3. Industry: Wear resistant material, flame retardant materials, lubricants, polymer additives, high-performance membrane, catalyst, artificial diamond, hard alloy, electric viscous fluid, ink filters, high-performance coatings, fire retardant coatings, manufacturing bioactive materials , memory materials, embedded molecular and other characteristics, composite materials etc. 4. Information industry: Semiconductor record medium, magnetic materials, printing ink, toner, ink, paper special purposes. 5. Electronic parts: Superconducting semiconductor, diodes, transistors, inductor.  , 6. Optical materials, electronic camera, fluorescence display tube, nonlinear optical materials. 7. Environment: Gas adsorption, gas storage.

Titanium Dioxide (TiO2) Nanopowder/Nanoparticles Dispersion in 2-Propanol, Size: 12 nm, Anatase, 22 wt%

Price range: $119.00 through $633.00
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Titanium Dioxide (TiO2) Nanopowder/Nanoparticles Dispersion in 2-Propanol Size: 12 nm, Anatase, 22 wt%

N-Methyl-2-Pyrrolidone (NMP) Solvent for Lithium Battery Cathode Materials, Purity: 99.90%

Price range: $119.00 through $494.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

N-Methyl-2-Pyrrolidone (NMP) Solvent for Lithium Battery Cathode Materials

Lanthanum Hexaboride (LaB6) Micron Powder, High Purity: 99.5+%, Size: 1.5-18 µm

Price range: $119.00 through $1,725.00
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Applications:

Lanthanum hexaboride powder main application is in hot cathodes. It is used as a single crystal ar as a coating in hot cathodes. It is also used in electronics, radar aerospace, and infrared application. It has application in X-ray powder diffraction instrument as size/strain standard for the calibration of the instrument.

Zinc Nanoparticles/ Nanopowder ( Zn, 99.9% 80-100nm)

Price range: $119.00 through $369.00
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$119/25g
$369/100g

Product 

Zinc Nanoparticles/ Nanopowder ( Zn, 99.9% 80-100nm)

CAS No.

7440-66-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

80-100nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

65.38 g/mol

Melting Point

419.5 °C

Boiling Point

907 °C

Density

7.14 g/cm³

Product Codes

NCZ-1084K

Copper (Cu) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.125”

$119.00

Product 

Copper (Cu) Sputtering Targets, Purity: 99.99%, Size: 4'', Thickness: 0.125''

CAS No.

7440-50-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

63.55 g/mol

Melting Point

1,084 °C

Boiling Point

 2,562 °C

Density

8.96 g/cm³

Product Codes

NCZ-2262K

Titanium Aluminum Carbide (Ti3AlC2) MAX Phase Micron-Powder

Price range: $119.00 through $823.00
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Product Titanium Aluminum Carbide (Ti3AlC2) MAX Phase Micron-Powder
CAS No. 196506-01-1
Appearance Grey-black, flaky to granular
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS  8.6µm (Size Can be customized),  Ask for other available size range.
Ingredient Ti3AlC2
Molecular Weight 194.60 g/mol
Melting Point N/A
Boiling Point N/A
Density 4.2–4.3 g/cm³
Product Codes NCZ-571I

Aluminum (Al) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.125”

$119.00

Product 

Aluminum (Al) Sputtering Targets, Purity: 99.999%, Size: 2'', Thickness: 0.125''

CAS No.

 7429-90-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 26.98 g/mol

Melting Point

 660.3 °C

Boiling Point

 2519 °C

Density

 2.70 g/cm³

Product Codes

NCZ-2579K

(-COOH) Functionalized Single Walled Carbon Nanotubes, Purity: > 92%, SSA: 370 m2/g

Price range: $120.00 through $1,845.00
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(-COOH) Functionalized Single Walled Carbon Nanotubes

Purity: > 92%, SSA: 370 m2/g, Dia: 1.0 nm

Single walled carbon nanotubes (SWCNTs, SWNTs) comprise of one-atom-thick sheets of graphene that rolled up to form long hollow tubes. SWCNTs possess exceptional thermal, mechanical and electrical properties. These remarkable properties lead to advances in performance in a wide range of materials and devices. Single-walled carbon nanotubes are actively used in diverse area including energy storage, molecular electronics, nanomechanial devices, composites and bio-sensing. You can buy (-COOH) Functionalized Single Walled Carbon Nano Tubes with low prices and high purity. 

(-OH) Functionalized Single Walled Carbon Nanotubes, Purity: > 92%, SSA: 370 m2/g, Dia: 1.0 nm

Price range: $120.00 through $1,845.00
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(-OH) Functionalized Single Walled Carbon Nanotubes

Purity: > 92%, SSA: 370 m2/g, Dia: 1.0 nm

Single walled carbon nanotubes (SWCNTs, SWNTs) comprise of one-atom-thick sheets of graphene that rolled up to form long hollow tubes. SWCNTs possess exceptional thermal, mechanical and electrical properties. These remarkable properties lead to advances in performance in a wide range of materials and devices. Single-walled carbon nanotubes are actively used in diverse area including energy storage, molecular electronics, nano mechanial devices, composites and bio-sensing. We supply (-OH) Functionalized Single Walled Carbon Nano Tubes to fulfill our customers' need with low prices and various options.

Carbon Nanotube-TiO2 Prepared by Electrostatic Adsorption, CNTs: 25 wt%, TiO2-rutile: 75 wt%

Price range: $120.00 through $550.00
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5 grams/109 € 25 grams/219 € 100 grams/499 €                                  
Please contact us for quotes on larger quantities !!!

Carbon Nanotube-TiO2 Prepared by Electrostatic Adsorption

CNTs: 25 wt%, TiO2-rutile: 75 wt%

Technical Properties:

Carbon Nanotubes
Purity > 95 wt%
Outside Diameter (nm) >50
Inside Diameter (nm) 5.0-15.0
Length (μm) 5.0-20.0
Manufacturing Method CVD
Color black
TiO2 (Rutile) Nanoparticles
Average Particle Size (nm) 100-300
Shape spherical
CNTs 20 wt%, TiO2-rutile 80 wt%
Specific Surface Area (m2/g) 18,5
Volume Resistivity (Ω.cm) <2

Applications:

Carbon Nanotube-TiO2 is prepared by electrostatic interactions. Carbon nanotubes are treated by cationic surfactant (Cetyl trimethyl ammonium bromide). TiO2 rutile and CNTs self-assemble to form a uniform and stable complex. It is easy to disperse and has good static conductive properties. It also show excellent mechanical and corrosion resistance properties. It can be used in petrochemical industry, coal industry and many coating fields.  

Hydrothermal Synthesis Autoclave Reactor with PTFE Lined Vessel 50 ml

Price range: $120.00 through $525.00
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APPLICATIONs
  • Chemical synthesis
  • Synthesizing of nanoparticles
  • For cultured crystal growth
  • Polymerization reaction
  • Hydrothermal decomposition
  • Catalyst synthesis
  • Hydrothermal oxidation
  • Hydrothermal precipitation
  • Material Digester / digestion
  • Crystallization process
  • Dissolve of heavy metals, refractory material, organic chemicals etc.
 

Copper (Cu) Sputtering Targets, Purity: 99.999%, Size: 2”, Thickness: 0.125”

$120.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

Iron Nanoparticles/ Nanopowder ( Fe, 99.7%, 60~80nm)

Price range: $120.00 through $2,263.00
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$120/25g
$350/100g
$2263/kg

Product 

Iron Nanoparticles/ Nanopowder ( Fe, 99.7%, 60~80nm)

CAS No.

7439-89-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

300 nm (Size Can be customized), Ask for other available size ranges.

Ingredient

AlN

Molecular Weight

63.55 g/mol

Melting Point

1084.62 °C

Boiling Point

2562 °C

Density

8.96 g/cm³

Product Codes

NCZ-1042K

High Purity Short MWNTs -OH Functionalized 98+%, <8nm

Price range: $120.00 through $615.00
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$120/5g
$320/25g
$615/100g

Product 

High Purity Short MWNTs -OH Functionalized 98+%, <8nm

CAS No.

7727-54-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

<8nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

228.20 g/mol

Melting Point

 ~120 °C

Boiling Point

NA

Density

 1.98 g/cm³

Product Codes

NCZ-1263K

Silicon Dioxide (SiO2) Sputtering Targets, Fused Quartz, Purity: 99.995%, Size: 2” , Thickness: 0.250”

$120.00

Product 

Silicon Dioxide (SiO2) Sputtering Targets, Fused Quartz, Purity: 99.995%, Size: 2'' , Thickness: 0.250''

CAS No.

7631-86-9

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

60.08 g/mol

Melting Point

~1710°C

Boiling Point

 ~2,950 °C

Density

~2.20 g/cm³

Product Codes

NCZ-1717K

Copper Indium (Cu-In) Alloy Nanopowder/Nanoparticles, Purity: 99.9% , Size: < 500 nm

Price range: $121.00 through $539.00
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Copper Indium (Cu-In) Alloy Nanopowder/Nanoparticles

Purity: 99.9% , Size: < 500 nm

Technical Properties:

Alloy Ratio (Cu-In) depends on customer needs
Average Particle Size (nm) <500

Properties, Storage and Cautions:

Cu-In alloy nanoparticles are highly reactive, therefore it should be handled with care and rapid moves, vibrations should be avoided. The powder should be kept away from sunlight, any kind of heating, moisture and impacts. Coagulation of the particles is a serious problem, so, the powder should be sealed under vacuum and should be kept in cool and dry conditions. Air contact should be avoided.

Copper Indium (Cu-In) Alloy Nanopowder/Nanoparticles, Purity: 99.9% , Size: < 500 nm

Price range: $121.00 through $539.00
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Copper Indium (Cu-In) Alloy Nanopowder/Nanoparticles

Purity: 99.9% , Size: < 500 nm

Technical Properties:

Alloy Ratio (Cu-In) depends on customer needs
Average Particle Size (nm) <500

Properties, Storage and Cautions:

Cu-In alloy nanoparticles are highly reactive, therefore it should be handled with care and rapid moves, vibrations should be avoided. The powder should be kept away from sunlight, any kind of heating, moisture and impacts. Coagulation of the particles is a serious problem, so, the powder should be sealed under vacuum and should be kept in cool and dry conditions. Air contact should be avoided.

Copper Indium (Cu-In) Alloy Nanopowder/Nanoparticles, Purity: 99.9% , Size: < 500 nm

Price range: $121.00 through $538.00
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Copper Indium (Cu-In) Alloy Nanopowder/Nanoparticles

Purity: 99.9% , Size: < 500 nm

Technical Properties:

Alloy Ratio (Cu-In) depends on customer needs
Average Particle Size (nm) <500

Properties, Storage and Cautions:

Cu-In alloy nanoparticles are highly reactive, therefore it should be handled with care and rapid moves, vibrations should be avoided. The powder should be kept away from sunlight, any kind of heating, moisture and impacts. Coagulation of the particles is a serious problem, so, the powder should be sealed under vacuum and should be kept in cool and dry conditions. Air contact should be avoided.

Copper Indium (Cu-In) Alloy Nanopowder/Nanoparticles, Purity: 99.9% , Size: < 500 nm

Price range: $121.00 through $539.00
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1 gram/107 € 
5 grams/475 €                       
Please contact us for quotes on larger quantities !!! 

Copper Indium (Cu-In) Alloy Nanopowder/Nanoparticles

Purity: 99.9% , Size: < 500 nm

Technical Properties:

Alloy Ratio (Cu-In) depends on customer needs
Average Particle Size (nm) <500

Properties, Storage and Cautions:

Cu-In alloy nanoparticles are highly reactive, therefore it should be handled with care and rapid moves, vibrations should be avoided. The powder should be kept away from sunlight, any kind of heating, moisture and impacts. Coagulation of the particles is a serious problem, so, the powder should be sealed under vacuum and should be kept in cool and dry conditions. Air contact should be avoided.

Aluminum Nitride (AlN) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 790 nm, Hexagonal

Price range: $121.00 through $459.00
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100 grams/107 €
500 grams/299 €  1000 grams/405 € 
                      
Please contact us for quotes on larger quantities !!!

Aluminum Nitride (AlN) Nanopowder/Nanoparticles

Purity: 99.95%, Size: 790 nm, Hexagonal

Applications:

Aluminum nitride powder has applications in elecronic devices, optical devices, and in composites. It is used in manufacturing of integrated circuit boards. It has high thermal conductivity. It used in the fabrication of metal matrix and polymer matrix composites that is used in heat seal adhesives and electronic packaging materials. It is also used in making high thermally conductive ceramics, high temperature crucibles, heat sinks, and thermally conductive filler for polymers.

Borosilicate Wafer, Size: 8”, 2-Side Polished, Thickness: 1250 ± 25 μm

Price range: $121.00 through $2,238.00
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Borosilicate Wafer Size: 8”, 2- Side Polished, Thickness: 1250 ± 25 μm Technical Properties: Materials Borosilicate Size (inch) 8” Orientation

Indium Tin Oxide Nanoparticles/Nanopowder (ITO, Blue, In2O3:SnO2=90:10, 99.99%, 20~70nm) (Copy)

Price range: $121.00 through $515.00
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$121/5g
$221/25g
$515/100g

Product 

Indium Tin Oxide Nanoparticles/Nanopowder (ITO, Blue, In2O3:SnO2=90:10, 99.99%, 20~70nm)

CAS No.

1312-43-2

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 20~70nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

~277.6 g/mol

Melting Point

~1,800 °C

Boiling Point

Decomposes

Density

~7.1 g/cm³

Product Codes

NCZ-1142K

Indium Tin Oxide Nanoparticles (ITO, Blue, In2O3:SnO2=95:5, 99.99%, 20-70 nm)

Price range: $121.00 through $515.00
Select options This product has multiple variants. The options may be chosen on the product page
$121/5g
$221/25g
$515/100g

Product 

Indium Tin Oxide Nanoparticles (ITO, Blue, In2O3:SnO2=95:5, 99.99%, 20-70 nm)

CAS No.

1312-43-2

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 20-70nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

~277.6 g/mol

Melting Point

~1,800 °C

Boiling Point

Decomposes

Density

~7.1 g/cm³

Product Codes

NCZ-1143K

3N5 (99.95%) Tantalum (Ta) Wire Evaporation Materials, 1 meter length

Price range: $121.00 through $319.00
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Product 3N5 (99.95%) Tantalum (Ta) Wire Evaporation Materials, 1 meter length
CAS No. 7440-25-7
Appearance Gray Blue, Metallic
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 0.25-0.30 mm (Size Can be customized),  Ask for other available size range.
Ingredient Ta
Molecular Weight 180.95 g/mol
Melting Point 3,017 °C
Boiling Point N/A
Density 16.6 g/cm3
Product Codes NCZ-154E

99.99% 4N Purity Gallium Sulfate (Ga2(SO4)3 Powder

Price range: $121.00 through $286.00
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Product 99.99% 4N Purity Gallium Sulfate (Ga2(SO4)3 Powder
CAS No. 10294-55-2
Appearance White crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 50μm (Size Can be customized),  Ask for other available size range.
Ingredient Ga₂(SO₄)₃
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density 2.68 g/cm³
Product Codes NCZ-248I
 

99.99% Alpha Alumina Polishing Powder Nanoparticles, 1kg

Price range: $121.00 through $396.00
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Product 99.99% Alpha Alumina Polishing Powder Nanoparticles, 1kg
CAS No. 10115-40-1
Appearance White to off-white
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 20–50nm  (Size Can be customized),  Ask for other available size range.
Ingredient Al₂O₃
Molecular Weight N/A
Melting Point 2072 °C
Boiling Point N/A
Density 3.95 g/cm³
Product Codes NCZ-250I
 

Niobium (Nb) Sputtering Targets, Purity: 99.95% pure Ex Ta, Size: 1”, Thickness: 0.125”

$121.00

Product 

Niobium (Nb) Sputtering Targets, Purity: 99.95% pure Ex Ta, Size: 1'', Thickness: 0.125''

CAS No.

7440-03-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

92.906 g/mol

Melting Point

 2,468 °C

Boiling Point

 4,744 °C

Density

 8.57 g/cm³

Product Codes

NCZ-1820K

Magnesium Oxide (MgO) Sputtering Targets, indium, Purity: 99.95%, Size: 2”, Thickness: 0.250”

$121.00

Product 

Magnesium Oxide (MgO) Sputtering Targets, indium, Purity: 99.95%, Size: 2'', Thickness: 0.250''

CAS No.

1309-48-4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

40.30 g/mol

Melting Point

 ~2852 °C

Boiling Point

~3600 °C

Density

 ~3.58 g/cm³

Product Codes

NCZ-1957K

Lead (Pb) Sputtering Targets, Purity: 99.99+%, Size: 1”, Thickness: 0.125”

$121.00

Product 

Lead (Pb) Sputtering Targets, Purity: 99.99+%, Size: 1'', Thickness: 0.125''

CAS No.

7439‑92‑1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 207.2 g/mol

Melting Point

~327.5 °C

Boiling Point

~1,740 °C

Density

 ~11.34 g/cm³

Product Codes

NCZ-2078K

Magnesium Fluoride, MgF2 99% Powder

$121.00
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Product Magnesium Fluoride, MgF2 99% Powder
CAS No. 7783-40-6
Appearance White to off-white crystalline
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1-20nm (Size Can be customized),  Ask for other available size range.
Ingredient MgF2
Molecular Weight 62.30 g/mol
Melting Point N/A
Boiling Point N/A
Density 3.15 g/cm³
Product Codes NCZ-449I

Molybdenum (Mo) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 30-40 nm, Metal Basis

Price range: $122.00 through $306.00
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Molybdenum (Mo) Nanopowder/Nanoparticles

Purity: 99.95%, Size: 30-40 nm, Metal Basis

Technical Properties:

Bulk Density (g/cm3) 0,25
True Density (g/cm3) 10,2
Color black
Shape spherical
Crystal Structure cubic
Average Particle Size (nm) 30-40
Specific Surface Area (m2/g) 22,0-35,0
Elemental Analysis Mo Fe C Mg Al Others
99.95 0.004 0.002 0.001 0.001 0.001

Properties, Storage and Cautions:

Molybdenum nanoparticles are highly reactive and flammable, therefore it should be handled with care and rapid moves, vibrations should be avoided. Nanopowder should be kept away from sunlight, any kind of heating, moisture and impacts. Coagulation of the particles is a serious problem, so, nanopowder should be sealed under vacuum and should be kept in cool and dry conditions. Air contact should be avoided.

Aluminum Oxide (Al2O3) Sputtering Targets, Purity: 99.5%, Size: 2”, Thickness: 0.250”

$122.00

 Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. When the target shatters,

Mass spectrometry measures the concentration and identity of sputtered atoms. The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

With the chemical formula Al2O3, aluminum oxide is a compound made of aluminum and oxygen.