Silicon (Si) Nanopowder for Battery Applications

Price range: $108.96 through $1,690.00
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Dysprosium (Dy) Micron Powder, Purity: 99.5 %, Size: 325 mesh

Price range: $109.00 through $4,975.00
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Applications:

Dysprosium is named from the Greek word dysprositos meaning ‘hard to get’. It is black brown metal powder. It is found in minerals such as fergusonite, monazite, bastnäsite, blomstrandine, euxenite, gadolinite, polycrase and xenotime. It is relatively stable in air at room temperature. It dissolves quickly with the evolution of hydrogen in mineral acids. Dysprosium has one of the highest magnetic strengths of the elements. Dysprosium powder has applications in electronics for data storage because of its magnetic properties. It is used in various data storage applications such as in compact discs. Dysprosium is substituted in many magnets to improve the corrosion resistance of the magnets. It has also applications in optics as a dopant in glass and optical fibers. It is also added to advance optical applications as it emits 470-500 nm and 570-600 nm wavelengths. 

Graphene NMP Dispersion, Purity: 99.5%, Graphene: 2,0 wt%

Price range: $109.00 through $655.00
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30 ml/109 € 60 ml/185 €                          120 ml/ 291

Zinc (Zn) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.125”

$109.00

Product 

Zinc (Zn) Sputtering Targets, Purity: 99.99%, Size: 2'', Thickness: 0.125''

CAS No.

7440‑66‑6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

Zn (black granules) (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

65.38 g/mol

Melting Point

419.5 °C

Boiling Point

 907 °C

Density

7.14 g/cm³

Product Codes

NCZ-1475K

Tungsten Titanium (TiW) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”

$109.00

Product 

Tungsten Titanium (TiW) Sputtering Targets, Purity: 99.99%, Size: 1'', Thickness: 0.250''

CAS No.

N/A

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 170.5 g/mol

Melting Point

 2,800 °C

Boiling Point

 ~4,800 °C

Density

16.7 g/cm³

Product Codes

NCZ-1562K

Copper (Cu) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.250”

$109.00

Product 

Copper (Cu) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.250''

CAS No.

7440-50-8

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

63.55 g/mol

Melting Point

1,084 °C

Boiling Point

 2,562 °C

Density

8.96 g/cm³

Product Codes

NCZ-2264K

Cobalt (Co) Sputtering Targets, Purity: 99.95%, Size: 4”, Thickness: 0.125”

$109.00

Product 

Cobalt (Co) Sputtering Targets, Purity: 99.95%, Size: 4'', Thickness: 0.125''

CAS No.

7440‑48‑4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

58.93 g/mol (cobalt atomic weight)

Melting Point

~1,495 °C

Boiling Point

~2,870–2,927 °C

Density

~8.9 g/cm³

Product Codes

NCZ-2289K

Fullerene-C60, Purity: 99.9%

Price range: $110.00 through $495.00
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Applications:

1. Pharmaceutical: Diagnostic reagents, super drugs, cosmetics, nuclear magnetic resonance (NMR) with the developer. DNA affinity 2. Energy: Solar battery, fuel cell, secondary battery. 3. Industry: Wear resistant material, flame retardant materials, lubricants, polymer additives, high-performance membrane, catalyst, artificial diamond, hard alloy, electric viscous fluid, ink filters, high-performance coatings, fire retardant coatings, manufacturing bioactive materials , memory materials, embedded molecular and other characteristics, composite materials etc. 4. Information industry: Semiconductor record medium, magnetic materials, printing ink, toner, ink, paper special purposes. 5. Electronic parts: Superconducting semiconductor, diodes, transistors, inductor.  , 6. Optical materials, electronic camera, fluorescence display tube, nonlinear optical materials. 7. Environment: Gas adsorption, gas storage.

Prime Si+Si3N4 Wafer, Size: 4”, Orientaion: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2 Side Polished, Thickness: 380± 15 μm, Coating 1000 nm

Price range: $110.00 through $2,370.00
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Prime Si+Si3N4 Wafer Size: 4”, Orientaion: (100), Boron Doped, Thickness: 380± 15 μm, Coating 1000 nm Technical Properties: Quality Prime

Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.250”

$110.00

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Aluminum which has the chemical symbol of Al, is a silvery white, soft, ductile metal that is the third most abundant element. Aluminum is notable due to for its light weight, strength, durability and for its ability to resist corrosion. Aluminum forms an extremely thin but very strong layer of oxide film. Aluminum has also high thermal and electrical conductivity. Aluminum sputtering targets have a particularly fine-grained microstructure. This property of Aluminum sputtering targets ensures that you benefit from uniform erosion and a low susceptibility to particle formation throughout the sputtering process.

Copper (Cu) Sputtering Targets, Purity: 99.99%, Size: 6”, Thickness: 0.125”

$110.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Iron Nanoparticles/ Nanopowder ( Fe, 99.7%, 100~130nm)

Price range: $110.00 through $330.00
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$110/25g
$330/100g

Product 

Iron Nanoparticles/ Nanopowder ( Fe, 99.7%, 100~130nm)

CAS No.

7439-89-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

100~130nm (Size Can be customized), Ask for other available size ranges.

Ingredient

AlN

Molecular Weight

63.55 g/mol

Melting Point

1084.62 °C

Boiling Point

2562 °C

Density

8.96 g/cm³

Product Codes

NCZ-1043K

Cerium Oxide Powder(CeO2, 5-20um, 99.9%)

Price range: $110.00 through $175.00
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$110/500g
$175/kg

Product 

Cerium Oxide Powder(CeO2, 5-20um, 99.9%)

CAS No.

1306-38-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

5-20um (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

172.11 g/mol

Melting Point

 ~2,400 °C

Boiling Point

~3,500 °C

Density

~7.13 g/cm³

Product Codes

NCZ-1120K

Cerium Oxide Powder(CeO2, 5um, 99.9%)

$110.00
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$110/500g $175/kg
Product Cerium Oxide Powder(CeO2, 5um, 99.9%)
CAS No. 1306-38-3
Appearance White or light yellow powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS  5um (Size Can be customized),  Ask for other available size range.
Ingredient CeO2
Molecular Weight 172.115g/mol
Melting Point 2600°C
Boiling Point 3,500°C
Density 7.2g/cm³
Product Codes NCZ-104R
 

3N8 (99.98%) Titanium (Ti) Wire Evaporation Materials, 1 meter length

$110.00
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Product 3N8 (99.98%) Titanium (Ti) Wire Evaporation Materials, 1 meter length
CAS No. 7440-32-6
Appearance Silvery Metallic 
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 0.1mm (Size Can be customized),  Ask for other available size range.
Ingredient Ti
Molecular Weight 47.87 g/mol
Melting Point 1,660°C
Boiling Point N/A
Density 4.5 g/cm³
Product Codes NCZ-114E
 

100nm Alpha Aluminum Oxide Al2O3 Nanoparticles Water Dispersion, 20wt%

Price range: $110.00 through $869.00
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Product 100nm Alpha Aluminum Oxide Al2O3 Nanoparticles Water Dispersion, 20wt%
CAS No. 1344-28-1
Appearance White
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 100nm (Size Can be customized), Ask for other available size range.
Ingredient Al2O3
Molecular Weight 101.96 g/mol
Melting Point N/A
Boiling Point N/A
Density 3.99 g/cm³
Product Codes NCZ-121I
 

10nm Anatase Titanium Dioxide TiO2 Nanoparticles Water Dispersion 10wt%

Price range: $110.00 through $869.00
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Product 10nm Anatase Titanium Dioxide TiO2 Nanoparticles Water Dispersion 10wt%
CAS No. 1317-70-0
Appearance White
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 10nm (Size Can be customized),  Ask for other available size range.
Ingredient TiO₂
Molecular Weight 79.87 g/mol
Melting Point 1840 °C
Boiling Point N/A
Density 3.78 g/cm³
Product Codes NCZ-132I
 

10nm Gamma Aluminum Oxide Al2O3 Nanoparticles Water Dispersion 20wt%, pH 6-8

Price range: $110.00 through $869.00
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Product 10nm Gamma Aluminum Oxide Al2O3 Nanoparticles Water Dispersion 20wt%, pH 6-8
CAS No. 1344-28-1
Appearance White
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 10nm (Size Can be customized),  Ask for other available size range.
Ingredient Al₂O₃
Molecular Weight 101.96 g/mol
Melting Point 1840 °C
Boiling Point N/A
Density 3.95–3.99 g/cm³
Product Codes NCZ-133I

10nm Gamma Aluminum Oxide Al2O3 Nanoparticles Water Dispersion 20wt%, pH 8-10

Price range: $110.00 through $869.00
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Product 10nm Gamma Aluminum Oxide Al2O3 Nanoparticles Water Dispersion 20wt%, pH 8-10
CAS No. 1344-28-1
Appearance White
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 10nm (Size Can be customized),  Ask for other available size range.
Ingredient Al₂O₃
Molecular Weight 101.96 g/mol
Melting Point 1,840 °C
Boiling Point N/A
Density 1.05–1.15 g/cm³
Product Codes NCZ-134I
 

15-20nm Rutile Titanium Dioxide TiO2 Nanoparticles Water Dispersion 20wt%

Price range: $110.00 through $869.00
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Product 15-20nm Rutile Titanium Dioxide TiO2 Nanoparticles Water Dispersion 20wt%
CAS No. 1317-80-2
Appearance Milky or white liquid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 15-20nm (Size Can be customized),  Ask for other available size range.
Ingredient TiO2
Molecular Weight 79.87 g/mol
Melting Point N/A
Boiling Point N/A
Density 4.2 g/cm³
Product Codes NCZ-136I
 

20-30nm Anatase Titanium Dioxide TiO2 Nanoparticles Water Dispersion 20wt%

Price range: $110.00 through $869.00
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Product 20-30nm Anatase Titanium Dioxide TiO2 Nanoparticles Water Dispersion 20wt%
CAS No. 1317-70-0
Appearance Milky white to light gray liquid
Purity ≥99%,  ≥99.9%,  ≥95% (Other purities are also available)
APS 20-30nm (Size Can be customized),  Ask for other available size range.
Ingredient TiO2
Molecular Weight 79.87 g/mol
Melting Point N/A
Boiling Point N/A
Density 3.9 g/cm³
Product Codes NCZ-144I

20nm Gamma Aluminum Oxide Al2O3 Nanoparticles Water Dispersion, 20wt%

Price range: $110.00 through $869.00
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Product 20nm Gamma Aluminum Oxide Al2O3 Nanoparticles Water Dispersion, 20wt%
CAS No. 1344-28-1
Appearance White Liquid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 20nm (Size Can be customized), Ask for other available size range.
Ingredient Al2O3
Molecular Weight N/A
Melting Point 1,800°C
Boiling Point 100°C
Density 3.6 – 3.9 g/cm³
Product Codes NCZ-147I

30-50nm Rutile Titanium Dioxide TiO2 Nanoparticles Water Dispersion 20wt%

Price range: $110.00 through $869.00
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Product 30-50nm Rutile Titanium Dioxide TiO2 Nanoparticles Water Dispersion 20wt%
CAS No. 13463-67-7
Appearance Milky white, opaque liquid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 30-50nm (Size Can be customized), Ask for other available size range.
Ingredient TiO2
Molecular Weight 79.87 g/mol
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-152I

30nm Aluminum Oxide Al2O3 Nanoparticles Water Dispersion, 20wt%

Price range: $110.00 through $869.00
Select options This product has multiple variants. The options may be chosen on the product page
Product 30nm Aluminum Oxide Al2O3 Nanoparticles Water Dispersion, 20wt%
CAS No. 1344-28-1
Appearance White
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 30nm (Size Can be customized), Ask for other available size range.
Ingredient Al₂O₃
Molecular Weight N/A
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-154I

50nm Aluminum Oxide Al2O3 Nanoparticles Water Dispersion, 20wt%

Price range: $110.00 through $869.00
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Product 50nm Aluminum Oxide Al2O3 Nanoparticles Water Dispersion, 20wt%
CAS No. 1344-28-1
Appearance Black, flaky solid
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 50nm (Size Can be customized),  Ask for other available size range.
Ingredient Al₂O₃
Molecular Weight 101.96 g/mol
Melting Point N/A
Boiling Point N/A
Density N/A
Product Codes NCZ-188I
 

99.99% 4N Gallium (Ga) Metal

Price range: $110.00 through $484.00
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Product 99.99% 4N Gallium (Ga) Metal
CAS No. 7440-55-3
Appearance Silvery-white, soft, and shiny metal
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1–5mm (Size Can be customized),  Ask for other available size range.
Ingredient Ga
Molecular Weight 69.72 g/mol
Melting Point 29.78 ℃
Boiling Point 2043 ℃
Density 5.904 g/cm3 
Product Codes NCZ-245I

Graphene Sheet, Size: 29 cm x 59 cm, Thickness: 35 µm, Highly Conductive

Price range: $111.00 through $1,304.00
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Graphene sheets are essentially the finest materials in the world. Graphene sheet is a one-atom-thick planar sheet of carbon iotas which are intensively packed in a hexagonal lattice structure. Graphene sheets show high electrical conductance at room temperatures. They are used as fillers for the improvement of electrical and mechanical properties in composite materials. Graphene sheets have a vital importance for applications in biomaterials, biosensors, biomedical devices and drug delivery. Our company sells Graphene Sheet with low prices and high quality

Crystalline Boron (B) Micron Powder, Average Particle Size: 5 µm, Purity: 99+%

Price range: $111.00 through $1,920.00
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25 grams/98 € 100 grams/295 € 500 grams/984 € 1000 grams/1695 € Crystalline Boron (B) Micron Powder, Average Particle Size: 5 Micron, Purity: 99+%
PRODUCT PROPERTIES
Molecular Weight 10.811
Appearance Black/Brown
Melting Point       2100oC / 3812oF
Boiling Point 2600oC / 4712oF
Density 2.34 cryst. g/cm3
Form Crystalline powder
Resistivity 1.5E12 μΩ-cm, 20 °C
Average Particle Size 5 micron
Storage temperature RT
Mohs Hardness @20oC 9.3
Applications Aerospace, Ceramic Material, Fuel Source, Nuclear
  Elemental Analysis (%)
B 99%
Fe 0.10 %
Al 0.10 %
Ca 0.09 %
Si 0.05 %
Cu 0.001 %
Sn 0.001 %
Mg 0.29 %
Mn 0.0006 %
  APPLICATIONS
  • A black - brown color powder used primarily for its thermal properties.
  • Corrosion inhibition: Boron compounds produced with boron nanopowders make it useful in anti-freeze, brake fluids, hydrolic systems, and other applications where ferrous materials need protection against corrosion.
  • Abrasive: boron can serve as a rugged, highly abrasive surface for any number of purposes. Combined with its thermal properties, this makes it highly effective for high speed cutting and similar tasks.
  • Photoelectric applications: Boron powder offers unique applications in photography, tanning, electrolytic condensation, fuel cells, and a host of other photoelectric fields.
  • Biocide: Borates in general work to kill a variety of insects and similar pests through simple physical destruction, making them one of the most universally effective pest control options.
  • Ignition: The thermal properties of boron powder make it an excellent ignition aid for any number of applications. This sees it used in charcoal briquettes, fuels, torches, and countless other applications.

Copper (Cu) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.250”

$111.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Magnesium Oxide (MgO) Sputtering Targets, indium, Purity: 99.95%, Size: 2”, Thickness: 0.250”

$111.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Zinc (Zn) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.250”

$111.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Tungsten (W) nanoparticles/nanopowder ( W, 99.7%, 80~100nm)

Price range: $111.00 through $333.00
Select options This product has multiple variants. The options may be chosen on the product page
$111/25g
$333/100g

Product 

Tungsten (W) nanoparticles/nanopowder ( W, 99.7%, 80~100nm)

CAS No.

7440-33-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

80~100nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

183.84 g/mol

Melting Point

3,422 °C

Boiling Point

5,555 °C

Density

19.3 g/cm³

Product Codes

NCZ-1082K

Carbon (C) (Graphite) Sputtering Targets, Purity: 99.999%, Size: 1”, Thickness: 0.250”

$111.00

Product 

Carbon (C) (Graphite) Sputtering Targets, Purity: 99.999%, Size: 1'', Thickness: 0.250''

CAS No.

 7782‑42‑5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

12.01 g/mol

Melting Point

~3,652 °C (no liquid phase)

Boiling Point

 ~4,200 °C

Density

 ~2.25 g/cm³

Product Codes

NCZ-2354K

Graphene NMP Dispersion, Purity: 99.5%, Graphene: 2,0 wt%

Price range: $112.00 through $675.00
Select options This product has multiple variants. The options may be chosen on the product page
Graphene NMP Dispersion, Purity: 99.5%, Graphene: 2,0 wt%
Graphene Purity (%) 99,5
Graphene Thickness (nm) 0,6-1,2
Diameter (µm) 2,0-12,0
Appearance Black Liquid
Concentration (wt%) 2,0 (mg/ml)
Specific Surface Area (m2/g) 600-1200
Elemental Analysis (%) C            O 99,6    <0,4
Surfactant                                                                                                           YES

Magnesium (Mg) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.250”

$112.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Nickel (Ni) Sputtering Targets, Purity: 99.995%, Size: 1”, Thickness: 0.125”

$112.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

By helping of the sputtering target, the composition of the target material may be evaluated and even extremely tiny amounts of contaminants are recognized.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Niobium (Nb) Sputtering Targets, Purity: 99.95% pure Ex Ta, Size: 4”, Thickness: 0.250”

$112.00

Product 

Niobium (Nb) Sputtering Targets, Purity: 99.95% pure Ex Ta, Size: 4'', Thickness: 0.250''

CAS No.

7440-03-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

92.906 g/mol

Melting Point

 2,468 °C

Boiling Point

 4,744 °C

Density

 8.57 g/cm³

Product Codes

NCZ-1813K

Aluminum (Al) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”

$113.00

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Aluminum which has the chemical symbol of Al, is a silvery white, soft, ductile metal that is the third most abundant element. Aluminum is notable due to for its light weight, strength, durability and for its ability to resist corrosion. Aluminum forms an extremely thin but very strong layer of oxide film. Aluminum has also high thermal and electrical conductivity. Aluminum sputtering targets have a particularly fine-grained microstructure. This property of Aluminum sputtering targets ensures that you benefit from uniform erosion and a low susceptibility to particle formation throughout the sputtering process.

Tungsten Titanium (TiW) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”

$113.00

Product 

Tungsten Titanium (TiW) Sputtering Targets, Purity: 99.99%, Size: 1'', Thickness: 0.125''

CAS No.

N/A

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

 170.5 g/mol

Melting Point

 2,800 °C

Boiling Point

 ~4,800 °C

Density

16.7 g/cm³

Product Codes

NCZ-1563K

Cobalt (Co) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.250”

$113.00

Product 

Cobalt (Co) Sputtering Targets, Purity: 99.95%, Size: 1'', Thickness: 0.250''

CAS No.

7440‑48‑4

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 N/A (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

58.93 g/mol (cobalt atomic weight)

Melting Point

~1,495 °C

Boiling Point

~2,870–2,927 °C

Density

~8.9 g/cm³

Product Codes

NCZ-2294K

Niobium (Nb) Sputtering Targets, Purity: 99.95% pure Ex Ta, Size: 1”, Thickness: 0.250”

$114.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Tungsten (W) Sputtering Targets, Purity: 99.95%, Size: 1”, Thickness: 0.250”

$114.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Vanadium (V) Sputtering Targets, Purity: 99.5%, Size: 1”, Thickness: 0.125”

$114.00

Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

Nickel Nanopowder/ Nanoparticles ( Ni, 99.5%, 500nm)

Price range: $114.00 through $559.00
Select options This product has multiple variants. The options may be chosen on the product page
$114/100g $352/500g $559/1000g

Product 

Nickel Nanopowder/ Nanoparticles ( Ni, 99.5%, 500nm)

CAS No.

7440-02-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

500nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

58.69 g/mol

Melting Point

1455 °C

Boiling Point

2913 °C

Density

8.90 g/cm³

Product Codes

NCZ-1054K

Nickel Nanoparticles / nanopowder (Ni, 99.5%, 180nm)

Price range: $114.00 through $559.00
Select options This product has multiple variants. The options may be chosen on the product page
$114/100g
$352/500g
$559/1000g

Product 

Nickel Nanoparticles / nanopowder (Ni, 99.5%, 180nm)

CAS No.

7440-02-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

180nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

58.69 g/mol

Melting Point

1455 °C

Boiling Point

2913 °C

Density

8.90 g/cm³

Product Codes

NCZ-1055K

Nickel Nanopowder/ Nanoparticles ( Ni, 99.5%, 300nm)

Price range: $114.00 through $559.00
Select options This product has multiple variants. The options may be chosen on the product page
$114/100g $352/500g $559/1kg

Product 

Nickel Nanopowder/ Nanoparticles ( Ni, 99.5%, 300nm)

CAS No.

7440-02-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

300nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

58.69 g/mol

Melting Point

1455 °C

Boiling Point

2913 °C

Density

8.90 g/cm³

Product Codes

NCZ-1057K

Tin (Sn) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”

$114.00

Product 

Tin (Sn) Sputtering Targets, Purity: 99.99%, Size: 1'', Thickness: 0.250''

CAS No.

7440-31-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

N/A  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

118.71 g/mol

Melting Point

231.93 °C

Boiling Point

2602 °C

Density

~7.31 g/cm³

Product Codes

NCZ-1645K

Silicon (Si) Nanopowder for Battery Applications

Price range: $115.00 through $2,028.00
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5 grams/115 € 25 grams/234 €                        100 grams/708 €       

Quartz Wafer, (X-Cut), Size: 4”, 2-Side Polished, Thickness: 200 ± 25 μm

Price range: $115.00 through $2,520.00
Select options This product has multiple variants. The options may be chosen on the product page
Quartz Wafer (X-Cut), Size: 4”, 2-Side Polished, Thickness: 200 ± 25 μm Technical Properties: Quality Prime Materials Quartz Size (inch)

Silicon (Si) Nanopowder for Battery Applications

Price range: $115.00 through $2,028.00
Select options This product has multiple variants. The options may be chosen on the product page
5 grams/115 € 25 grams/234 €                        100 grams/708 €       

Silicon (Si) Nanopowder for Battery Applications

Price range: $115.00 through $2,028.00
Select options This product has multiple variants. The options may be chosen on the product page
5 grams/115 € 25 grams/234 €                        100 grams/708 €       

Aluminum-Silicon Alloy Powder (Al-Si, 1-2 micron)

Price range: $115.00 through $395.00
Select options This product has multiple variants. The options may be chosen on the product page
$115/100g
$260/500g
$395/1000g

Product 

Aluminum-Silicon Alloy Powder (Al-Si, 1-2 micron)

CAS No.

24304-00-5

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

1-2 micron (Size Can be customized), Ask for other available size ranges.

Ingredient

AlN

Molecular Weight

40.982 g/mol

Melting Point

2200 °C

Boiling Point

2517 °C

Density

3.3 g/cm³

Product Codes

NCZ-1014K

Silicon Powder (Si, 99.99%, -325mesh)

Price range: $115.00 through $393.00
Select options This product has multiple variants. The options may be chosen on the product page
$115/100g
$215/500g
$393/kg

Product 

Silicon Powder (Si, 99.99%, -325mesh)

CAS No.

7440-21-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

-325mesh (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

28.0855 g/mol

Melting Point

1,414 °C

Boiling Point

3,265 °C

Density

~2.33 g/cm³

Product Codes

NCZ-1072K

Tungsten Nanoparticles/nanopowder ( W, 99.7% 40-60 nm)

Price range: $115.00 through $345.00
Select options This product has multiple variants. The options may be chosen on the product page
$115/25g
$345/100g

Product 

Tungsten Nanoparticles/nanopowder ( W, 99.7% 40-60 nm)

CAS No.

7440-33-7

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

40–60 nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

183.84 g/mol

Melting Point

3,422 °C

Boiling Point

5,555 °C

Density

19.3 g/cm³

Product Codes

NCZ-1081K

Tungsten Carbide Nanoparticles/ Nanopowder ( WC, 80nm)

Price range: $115.00 through $715.00
Select options This product has multiple variants. The options may be chosen on the product page
$115/25g
$305/100g
$715/500g

Product 

Tungsten Carbide Nanoparticles/ Nanopowder ( WC, 80nm)

CAS No.

12070-12-1

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 

80nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

195.85 g/mol

Melting Point

~2,870 °C

Boiling Point

~6,000 °C

Density

~15.63 g/cm³

Product Codes

NCZ-1205K

High Purity Multi Walled Nanotubes (MWNTs 98+%, <8nm)

Price range: $115.00 through $555.00
Select options This product has multiple variants. The options may be chosen on the product page
$115/5g
$275/25g
$555/100g

Product 

High Purity Multi Walled Nanotubes (MWNTs 98+%, <8nm)

CAS No.

7727-54-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

<8nm  (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

228.20 g/mol

Melting Point

 120 °C

Boiling Point

N/A

Density

 1.98 g/cm³

Product Codes

NCZ-1239K

High Purity Multi Walled Nanotubes (MWNTs 99%)

Price range: $115.00 through $595.00
Select options This product has multiple variants. The options may be chosen on the product page
$115/5g
$297/25g
$595/100g

Product 

High Purity Multi Walled Nanotubes (MWNTs 99%)

CAS No.

 7727-54-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

~10–30 nm(Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

228.20 g/mol

Melting Point

 120 °C

Boiling Point

N/A

Density

 1.98 g/cm³

Product Codes

NCZ-1240K

High Purity MWNTs – COOH Functiionalized 98+%

Price range: $115.00 through $555.00
Select options This product has multiple variants. The options may be chosen on the product page
$115/5g
$275/25g
$555/100g

Product 

High Purity MWNTs - COOH Functiionalized 98+%

CAS No.

 308068-56-6

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

 <8nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

N/A

Melting Point

N/A

Boiling Point

N/A

Density

~1.8–2.1 g/cm³

Product Codes

NCZ-1259K

High Purity MWNTs – OH Functiionalized 98+%

Price range: $115.00 through $555.00
Select options This product has multiple variants. The options may be chosen on the product page
$115/5g
$275/25g
$555/100g

Product 

High Purity MWNTs - OH Functiionalized 98+%

CAS No.

7727-54-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

<8nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

228.18 g/mol

Melting Point

120 °C

Boiling Point

NA

Density

~1.98 g/cm³

Product Codes

NCZ-1262K

High Purity MWNTs -COOH Functionalized 99%

Price range: $115.00 through $595.00
Select options This product has multiple variants. The options may be chosen on the product page
$115/5g
$297/25g
$595/100g

Product 

High Purity MWNTs -COOH Functionalized 99%

CAS No.

708051-49-0

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

50-100 nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

NA

Melting Point

 >600 °C

Boiling Point

NA

Density

 ~1.8–2.1 g/cm³

Product Codes

NCZ-1275K