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2D Materials 3
3D Printer Materials 106
- Aluminum Based Alloy Powder 17
- Cobalt Alloy Powder 4
- Copper Alloy Powder 7
- High Entropy Alloy Powder 6
- High Temperature Alloy Powder 15
- IMC(Intermetallic Compound Powder) 6
- Iron Based Alloy Powder 20
- MIM Powder 0
- Refractory Metal Powder 3
- SPHERICAL NICKEL BASE ALLOY MICRON POWDER 17
- Titanium Based Alloy Powder 11
AAO templates 1
Activated carbon fibers 6
Activated carbons 1
Al 1
ALUMINUM SILICON COPPER SPUTTERING TARGETS 4
- 1 2
- 2 2
ALUMINUM SILICON SPUTTERING TARGETS 9
- 1 2
- 2 2
- 3 2
- 4 2
ANTIMONY SPUTTERING TARGETS 3
- 1 0
- 2 3
ANTIMONY TELLURIDE SPUTTERING TARGETS 9
- 1 2
- 2 3
- 22 0
- 3 2
- 4 2
Artificial Biological Solutions 6
BARIUM FLUORIDE SPUTTERING TARGETS 12
- 1 0
- 2 2
- 3 2
- 4 2
- 5 2
- 6 2
- 8 2
BARIUM SPUTTERING TARGETS 8
- 1 2
- 2 2
- 3 2
- 4 2
BARIUM STRONTIUM TITANATE SPUTTERING TARGETS 10
- 2 1
- 3 2
- 4 2
- 6 2
- 8 2
BARIUM TITANATE SPUTTERING TARGETS 18
- 1 3
- 2 3
- 3 4
- 4 3
- 5 2
- 6 2
- 8 1
BARIUM ZIRCONATE SPUTTERING TARGETS 8
- 1 2
- 2 2
- 3 1
- 4 2
- 6 1
BATTERY EQUIPMENT 174
- 18650 Cylinder Cell Assembly Materials 3
- Battery Lab Machine 7
- Coin Cell Materials 21
- FOILS FOR BATTERIES 24
  - Aluminum Foil 6
  - Copper Foil 2
  - Graphite Foils 7
  - Lithium Foil 1
  - Nickel Foils 2
  - Platinum Foils 6
- LITHIUM BATTERY MATERIALS 58
  - ANODE MATERIALS 23
  - Cathode Materials 23
  - OTHER MATERIALS 3
  - Pouch Cell Materials 9
- Other Battery Lab Equipments 2
- Porous Metal Foam Materials 5
- RAW MATERIALS FOR BATTERY APPLICATION 30
- Separators For Batteries 3
BISMUTH FERRITE (INDIUM) SPUTTERING TARGETS 3
- 1 1
- 2 1
- 3 1
BISMUTH FERRITE SPUTTERING TARGETS 17
- 1 2
- 2 2
- 3 2
- 4 2
- 5 2
- 6 2
- 7 3
- 8 2
BISMUTH OXIDE SPUTTERING TARGETS 9
- 1 2
- 2 3
- 3 3
- 4 1
BISMUTH SPUTTERING TARGETS 9
- 1 2
- 2 2
- 3 2
- 4 3
BISMUTH TELLURIDE SPUTTERING TARGETS 10
- 1 2
- 2 2
- 3 1
- 4 2
- 6 1
- 8 1
Borides 9
BORON CARBIDE SPUTTERING TARGETS 11
- 1 1
- 2 1
- 3 2
- 4 3
- 6 2
- 8 2
BORON NITRIDE SPUTTERING TARGETS 12
- 1 2
- 2 2
- 3 2
- 4 2
- 6 2
- 8 1
BORON SPUTTERING TARGETS 10
- 2 5
- 3 3
- 4 2
CALCIUM MANGANATE SPUTTERING TARGETS 9
- 1 2
- 2 2
- 3 3
- 4 2
Carbides 2
CARBON (GRAPHITE) SPUTTERING TARGETS 7
- 1 1
- 2 2
- 3 2
- 4 2
CARBON (PYROLYTIC GRAPHITE) SPUTTERING TARGETS 11
- 1 2
- 2 3
- 3 3
- 4 3
CARBON NANOTUBES 223
- CARBON NANOTUBE FIBERS 16
  - CARBON NANOTUBE FIBERS 12
  - Composite Wires of Carbon Nanotubes 3
- Carbon Nanotube Nanoribbon 4
- Carbon Nanotube Sponges 8
- CNT DISPERSIONS 20
  - All Carbon Nanotube Dispersions 9
- Double-Walled CNTs 6
  - DWCNT, >65% 2
  - DWCNT, >65%, -COOH 2
  - DWCNT, >65%, -OH 2
- Graphitized Multi-Walled CNTs 16
- Multi-Walled CNTs 33
  - Aligned MWCNT, >96% 2
  - Carbon NanoFibers 0
  - Industrial MWCNTs 0
  - MWCNT, >90%, -COOH 1
  - MWCNT, >92% 4
  - MWCNT, >92%, -COOH 4
  - MWCNT, >92%, -OH 5
  - MWCNT, >95% 1
  - MWCNT, >96% 4
  - MWCNT, >96%, -COOH 6
  - MWCNT, >96%, -Ni 1
  - MWCNT, >96%, -OH 5
  - MWCNT, >99%, -Ni 0
- Short Length Multi-Walled CNTs 0
- Single-Walled CNTs 12
  - SWCNT, >65% 1
  - SWCNT, >65%, -COOH 2
  - SWCNT, >65%, -OH 1
  - SWCNT, >92% 2
  - SWCNT, >92%, -COOH 2
  - SWCNT, >92%, -OH 2
  - SWCNT, >95% 1
  - SWCNT, >96% 1
CARBON SPUTTERING TARGETS 4
- 1 1
- 2 1
- 3 1
Cellulose 3
Cerium 23
CERIUM OXIDE SPUTTERING TARGETS 21
- 1 3
- 2 3
- 3 3
- 4 3
- 5 2
- 6 2
- 7 2
- 8 2
Chitosan 2
Chitosans 15
CHROMIUM OXIDE SPUTTERING TARGETS 11
- 1 2
- 2 3
- 3 3
- 4 3
CHROMIUM SPUTTERING TARGETS 6
- 3 2
- 4 2
- 6 1
- 8 1
COATINGS 3
- Dry Film Lubricants 3
COBALT IRON BORON SPUTTERING TARGETS 6
- 1 0
- 2 3
- 3 2
COBALT SPUTTERING TARGETS 15
- 1 2
- 2 4
- 3 3
- 4 2
- 6 2
- 8 2
Conductive Adhesive Paste 7
COPPER SPUTTERING TARGETS 24
- 1 4
- 2 4
- 3 3
- 4 4
- 5 1
- 6 2
- 7 2
- 8 4
Cosmetic ingredients 17
Cs 3
Cyclodextrins 4
Dendrimers 5
Deposition Materials 109
Dicalcium silicate 0
Discounted Products 12
DISPERSIONS 99
- Borophene Dispersions 1
- Carbon Nanotube Dispersions 38
- GRAPHENE DISPERSIONS 7
- METAL AND OXIDE DISPERSIONS 53
- Silicene Dispersions 1
Dysprosium 23
Erbium 28
Europium 34
Evaporation Materials 71
Foams 2
Fullerene 37
- Fullerene-C60 5
- Fullerene-C70 6
- Polyhydroxylated Fullerene (Fullerenols) 10
Gadolinium 30
GALLIUM Arsenide (GASB) WAFERS 2
Graphdiyne 5
Graphene 93
Graphites 2
Hemicellulose 4
High Purity Inorganic Chemicals 511
High Purity Inorganics 54
High Purity Metal Sputtering Targets 52
Holmium 27
Homogeneous Catalyst 53
Hydrotalcite 2
Inorganic Biomaterials 15
Intermetallics 2
Lab Equipment 14
- Dispersion Equipment 6
  - High Energy Ball Mill 1
  - Homogenizer 2
  - Three Roll Mill 2
- Hydrothermal Synthesis Autoclave Reactors 7
- Roll to Roll PE-CVD 1
Lanthanum 28
LEAD ZIRCONIUM TITANATE 0
LK-99 Raw Materials 3
Lutetium 24
Mesophase 4
Metal Alkoxides 31
Metal beta diketonates ACAC 49
Metal beta diketonates Chiral 10
Metal beta diketonates FOD 15
Metal beta diketonates HFAC 29
Metal beta diketonates TFAC 14
Metal beta diketonates TMHD 36
Metal beta diketonates TTFA 2
microparticles 114
- Elemental micron powder 113
Miscellaneous 11
Molecular sieves 23
MOLYBDENUM SPUTTERING TARGET 11
- 1 2
- 2 2
- 3 2
- 4 2
- 6 2
- 8 1
MXene and MAXene 74
Nanoparticales 0
Nanoparticles 172
- Compounds nanoparticles 34
- Element & Alloys Nanoparticles 53
  - Aluminum Nanoparticles 0
  - Bismuth Nanoparticles 0
  - Boron Nanoparticles 0
  - Carbon Nanoparticles 0
  - Chromium Nanoparticles 0
  - Cobalt Nanoparticles 0
  - Copper Nanoparticles 0
  - Fe-Si Nanoparticles 0
  - Gold Nanoparticles 0
  - Indium Nanoparticles 0
  - Iron Nanoparticles 0
  - Molybdenum Nanoparticles 0
  - Nickel Nanoparticles 0
  - Platinum Nanoparticles 2
  - Selenium Nanoparticles 1
  - Silicon Nanoparticles 6
  - Silver Nanoparticles 16
  - Sulphur Nanoparticles 1
  - Tantalum Nanoparticles 1
  - Tin Nanoparticles 2
  - Titanium Nanoparticles 3
  - Tungsten Nanoparticles 3
  - Zinc Nanoparticles 4
- Magnetic Nanoparticles 0
  - Magnetic Powders of Fe2O3 0
  - Magnetic Powders of Fe3O4 0
- multi-elements oxide nanoparticles 17
- Nanocellulose 8
- Single Metal Oxide Nanoparticles 54
Nanoparticles & Nanopowders 466
- Metal and Non-metal Elements 94
- Oxides and Compounds 106
Nanotubes & Graphenes 69
Nitrides 6
Organic 3
Organic salts 3
PAMAM 0
Polyamino acids 3
polymers 17
Potassium 0
PZT SPUTTERING TARGETS 0
Quantum Dots 61
- Cadmium Selenide Quantum Dots (CdSe/ZnS) 13
- Carbon Quantum Dots (CQD) 17
- Graphene Quantum Dots (GQD) 1
- Indium Phosphide Quantum Dots (InP/ZnS QD) 11
- Lead Sulfide Quantum Dots (PbS QD) 8
- Perovskite Quantum Dots 3
- QLED Quantum Dots 6
- Zinc Selenide Quantum Dots (ZnSe/ZnS QD) 2
Rare Earth Materials 187
- RARE EARTH COMPOUND POWDER 7
- RARE EARTH ELEMENT POWDER 16
  - Cerium (Ce) Powder 1
  - Dysprosium (Dy) Powder 1
  - Erbium (Er) Powder 1
  - EUROPIUM (EU) POWDER 1
  - Gadolinium (Gd) Powder 1
  - Holmium (Ho) Powder 1
  - Lanthanum (La) Powder 1
  - Neodymium (Nd) Powder 1
  - Praseodymium (Pr) Powder 1
  - Samarium (Sm) Powder 1
  - Scandium (Sc) Powder 2
  - Terbium (Tb) Powder 1
  - Thulium (Tm) Powder 1
  - Yttrium (Y) Powder 2
- RARE EARTH OXIDE POWDER 29
- Rare Earth Sputtering Targets 115
Screen Printed Electrode 2
SHAPE MEMORY MATERIALS 23
- SHAPE MEMORY ALLOYS 8
  - Shape Memory Alloy Sheets 3
  - SHAPE MEMORY ALLOY WIRES 5
- SHAPE MEMORY POLYMERS 15
Silica aerogel 2
Silicon Wafers & Semiconductor Wafers 275
- 2" 8
- 3" 6
- 4" 16
- 6" 6
- 8" 3
- Borosilicate Wafer 11
  - 2" 0
  - 3" 2
  - 4" 5
  - 6" 3
  - 8" 1
- CZ-Si Wafer 23
  - 2" 7
  - 3" 4
  - 4" 7
  - 6" 3
  - 8" 2
- Fused Silica Wafers 7
  - 2" 1
  - 4" 4
  - 6" 2
- FZ-Si Wafers 10
  - 2" 2
  - 3" 1
  - 4" 7
- GAAS WAFER 14
  - 2" 8
  - 4" 6
- GALLIUM ANTIMONIDE (GASB) WAFERS 20
  - 2" 8
  - 3" 8
  - 4" 4
- Gallium Arsenide (GaAs) Wafers 6
  - 2" 0
  - 4" 0
  - 6" 0
- INDIUM ARSENIDE (INAS) WAFERS 2
  - 2" 1
  - 3" 1
  - 4" 0
- INDIUM PHOSPHIDE (INP) WAFERS 29
  - 2" 9
  - 3" 12
  - 4" 8
- Quartz Wafer 9
  - 2" 1
  - 4" 8
- SI + SINX WAFERS 7
  - 3" 2
  - 4" 5
- SI + SIO2 WAFERS 24
  - 2" 3
  - 3" 5
  - 4" 14
  - 6" 2
- Si+Si3N4 Wafer 5
  - 2" 0
  - 3" 1
  - 4" 4
  - 6" 0
- SILICON CARBIDE WAFER ( SIC-4H ) - 4H 13
  - 2" 5
  - 3" 4
  - 4" 4
- SILICON CARBIDE WAFER ( SIC-6H ) - 6H 2
  - 2" 2
- SILICON ON INSULATOR (SOI) WAFERS 9
  - 4" 2
  - 6" 4
  - 8" 3
- Wafer Shippers 5
Silk extracts 1
Sodium phytate 0
Spherical materials 14
Sputtering Targets 2432
- Sputtering Targets Names A - C 298
  - Aluminum Nitride Sputtering Targets 22
    - 1" 6
    - 2" 6
    - 3" 6
    - 4" 4
  - Aluminum Oxide Sputtering Targets 24
    - 1" 4
    - 2" 5
    - 3" 4
    - 4" 4
    - 6" 4
    - 8" 3
  - Aluminum Sputtering Targets 25
    - 1" 4
    - 2" 4
    - 3" 4
    - 4" 4
    - 5" 1
    - 6" 4
    - 8" 4
- SPUTTERING TARGETS NAMES D - M 337
  - ERBIUM OXIDE SPUTTERING TARGETS 8
    - 1 2
    - 2 2
    - 3 2
    - 4 2
  - Erbium Oxide Sputtering Targets 7
  - GERMANIUM SPUTTERING TARGETS 11
    - 1 1
    - 2 2
    - 3 4
    - 4 2
  - INDIUM OXIDE SPUTTERING TARGETS 9
    - 1 2
    - 2 2
    - 3 2
    - 4 2
  - INDIUM SPUTTERING TARGETS 4
    - 1 4
  - INDIUM TIN OXIDE (ITO) SPUTTERING TARGETS 11
    - 1 3
    - 2 1
    - 3 2
    - 4 2
    - 6 2
    - 8 1
  - INDIUM ZINC OXIDE SPUTTERING TARGETS 9
    - 1 2
    - 2 3
    - 3 2
    - 4 2
  - IRON OXIDE SPUTTERING TARGETS 16
    - 1 3
    - 2 3
    - 3 3
    - 4 2
    - 5 1
    - 6 2
    - 7 2
  - IRON SPUTTERING TARGETS 14
    - 1 2
    - 2 6
    - 3 3
    - 4 3
  - LANTHANUM ALUMINATE (INDIUM) SPUTTERING TARGETS 2
    - 1 1
    - 2 1
  - LANTHANUM CALCIUM MANGANATE (LA0.7CA0.3MNO3) 16
    - 1 2
    - 2 2
    - 3 2
    - 4 2
    - 5 2
    - 6 2
    - 7 2
    - 8 2
  - LANTHANUM MANGANATE SPUTTERING TARGETS 17
    - 1 3
    - 2 2
    - 3 2
    - 4 2
    - 5 2
    - 6 2
    - 7 2
    - 8 2
  - Lanthanum Nickel Oxide Sputtering Targets 18
  - Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) 6
  - Lanthanum Strontium Manganate(La0.7Sr0.3MnO3) 9
  - Lanthanum Titanate Sputtering Targets 16
  - LEAD ZIRCONIUM TITANATE, PZT SPUTTERING TARGETS 16
    - 1 2
    - 2 2
    - 3 2
    - 4 2
    - 5 2
    - 6 2
    - 7 2
    - 8 2
  - LITHIUM COBALT OXIDE SPUTTERING TARGETS 10
    - 1 1
    - 2 3
    - 3 3
    - 4 3
  - LITHIUM NICKEL COBALT OXIDE (LINI(1-X)COXO2) 2
    - 2 2
  - LITHIUM NIOBATE SPUTTERING TARGETS 7
    - 1 1
    - 2 2
    - 3 2
    - 4 2
  - LITHIUM PHOSPHATE SPUTTERING TARGETS 18
    - 1 3
    - 2 3
    - 3 2
    - 4 3
    - 5 1
    - 6 2
    - 7 2
    - 8 1
  - LITHIUM TITANATE SPUTTERING TARGETS 8
    - 1 2
    - 2 2
    - 3 3
    - 4 1
  - MAGNESIUM FLUORIDE SPUTTERING TARGETS 10
    - 1 2
    - 2 2
    - 3 2
    - 4 2
    - 6 1
    - 8 1
  - MAGNESIUM OXIDE SPUTTERING TARGETS 22
    - 1 3
    - 2 5
    - 3 2
    - 4 3
    - 5 2
    - 6 2
    - 7 2
    - 8 2
  - MAGNESIUM SPUTTERING TARGETS 22
    - 1 4
    - 2 4
    - 3 4
    - 4 4
    - 5 1
    - 6 2
    - 8 2
  - MANGANESE SPUTTERING TARGETS 11
    - 1 3
    - 2 2
    - 3 3
    - 4 2
    - 6 1
  - MOLYBDENUM DISILICIDE SPUTTERING TARGETS 9
    - 1 2
    - 2 2
    - 3 2
    - 4 3
  - MOLYBDENUM DISULFIDE SPUTTERING TARGETS 15
    - 1 3
    - 2 3
    - 3 3
    - 4 2
    - 6 2
    - 8 1
  - MOLYBDENUM OXIDE SPUTTERING TARGETS 9
    - 1 2
    - 2 2
    - 3 3
    - 4 2
- SPUTTERING TARGETS NAMES N - S 244
  - 4. 0
  - NICKEL CHROMIUM SPUTTERING TARGETS 13
    - 1 2
    - 2 2
    - 3 4
    - 4 2
    - 6 2
  - NICKEL IRON SPUTTERING TARGETS 8
    - 1 2
    - 2 3
    - 3 2
    - 4 1
  - NICKEL OXIDE SPUTTERING TARGETS 11
    - 1 4
    - 2 7
    - 3 0
  - NICKEL SPUTTERING TARGETS 34
    - 1 3
    - 2 6
    - 3 6
    - 4 6
    - 5 1
    - 6 6
    - 8 6
  - NICKEL VANADIUM SPUTTERING TARGETS 10
    - 1 2
    - 2 2
    - 3 2
    - 4 2
    - 6 1
    - 8 1
  - NIOBIUM OXIDE SPUTTERING TARGETS 11
    - 1 2
    - 2 3
    - 3 2
    - 4 3
    - 8 1
  - NIOBIUM SPUTTERING TARGETS 8
    - 1 2
    - 2 2
    - 3 2
    - 4 2
  - PERMALLOY SPUTTERING TARGETS 6
    - 2 2
    - 3 2
    - 4 2
  - Praseodymium Calcium Manganate Sputtering Targets 19
    - 1 2
    - 2 4
    - 3 2
    - 4 2
  - PRASEODYMIUM SPUTTERING TARGETS 12
    - 1 2
    - 2 2
    - 3 2
    - 4 3
    - 6 2
    - 8 2
  - Purity: 99.9% 0
  - SELENIUM SPUTTERING TARGETS 9
    - 1 2
    - 2 3
    - 3 2
    - 4 2
  - SILICON (SI (N-TYPE)) SPUTTERING TARGET 13
    - 1 1
    - 2 2
    - 3 2
    - 4 2
    - 5 2
    - 6 2
    - 8 2
  - SILICON (SI (P-TYPE)) SPUTTERING TARGETS 16
    - 1 3
    - 2 2
    - 3 3
    - 4 3
    - 6 2
    - 8 2
  - SILICON (SI) (UNDOPED) SPUTTERING TARGETS 7
    - 1 2
    - 2 2
    - 3 2
    - 4 1
  - SILICON CARBIDE SPUTTERING TARGETS 12
    - 1 2
    - 2 3
    - 3 3
    - 4 3
  - SILICON DIOXIDE (FUSED QUARTZ) SPUTTERING TARGETS 16
    - 1 2
    - 2 3
    - 3 3
    - 4 3
    - 5 1
    - 6 2
    - 8 1
  - SILICON NITRIDE SPUTTERING TARGETS 12
    - 1 4
    - 2 5
    - 3 3
  - SILVER SPUTTERING TARGETS 11
    - 1 2
    - 2 3
    - 3 2
    - 4 2
    - 6 1
    - 8 1
  - Size: 1'' 0
  - STRONTIUM TITANATE SPUTTERING TARGETS 17
    - 1 3
    - 2 3
    - 3 2
    - 4 2
    - 5 2
    - 6 2
    - 7 2
    - 8 1
  - Thickness: 0.250'' 0
- SPUTTERING TARGETS NAMES T - Z 363
  - TANTALUM OXIDE SPUTTERING TARGETS 10
    - 2 4
    - 3 4
    - 4 1
  - TANTALUM SPUTTERING TARGETS 12
    - 1 2
    - 2 3
    - 3 2
    - 4 2
    - 6 1
    - 8 2
  - TIN OXIDE SPUTTERING TARGETS 11
    - 1 2
    - 2 3
    - 3 3
    - 4 3
  - TIN SPUTTERING TARGETS 17
    - 1 4
    - 2 4
    - 3 3
    - 4 2
    - 6 2
    - 8 2
  - TITANIUM BORIDE SPUTTERING TARGETS 8
    - 1 1
    - 2 3
    - 3 2
    - 4 2
  - TITANIUM CARBIDE SPUTTERING TARGETS 7
    - 1 1
    - 2 2
    - 3 2
    - 4 2
  - TITANIUM DIOXIDE SPUTTERING TARGETS 29
    - 1 6
    - 2 7
    - 3 6
    - 4 6
    - 6 2
    - 8 1
  - TITANIUM NITRIDE SPUTTERING TARGETS 11
    - 1 2
    - 2 4
    - 3 2
    - 4 3
  - TUNGSTEN DISULFIDE SPUTTERING TARGETS 9
    - 2 2
    - 3 2
    - 4 2
    - 5 2
    - 6 1
    - 8 1
  - TUNGSTEN OXIDE SPUTTERING TARGETS 11
    - 1 2
    - 2 3
    - 3 3
    - 4 3
  - TUNGSTEN SPUTTERING TARGETS 13
    - 1 2
    - 2 3
    - 3 3
    - 4 2
    - 6 1
    - 8 2
  - TUNGSTEN TITANIUM SPUTTERING TARGETS 12
    - 1 3
    - 2 2
    - 3 2
    - 4 2
    - 6 2
    - 8 1
  - VANADIUM OXIDE SPUTTERING TARGETS 14
    - 1 1
    - 2 4
    - 3 3
    - 4 3
    - 6 1
    - 8 1
  - VANADIUM SPUTTERING TARGETS 9
    - 1 2
    - 2 2
    - 3 2
    - 4 2
    - 8 1
  - YTTERBIUM OXIDE SPUTTERING TARGETS 7
    - 1 2
    - 2 3
    - 3 2
  - YTTRIUM FERRITE SPUTTERING TARGETS 6
    - 1 2
    - 2 3
    - 3 1
  - YTTRIUM SPUTTERING TARGETS 8
    - 1 2
    - 2 2
    - 3 2
    - 4 2
  - ZINC OXIDE SPUTTERING TARGETS 17
    - 1 5
    - 2 6
    - 3 5
    - 4 1
  - ZINC OXIDE WITH ALUMINA SPUTTERING TARGETS 14
    - 1 1
    - 2 4
    - 3 4
    - 4 3
    - 6 1
    - 8 1
  - ZINC SPUTTERING TARGETS 20
    - 1 4
    - 2 6
    - 3 4
    - 4 4
    - 6 1
    - 8 1
  - ZINC SULFIDE SPUTTERING TARGETS 10
    - 1 2
    - 2 3
    - 3 3
    - 4 2
Sulfides 2
Super absorbent polymers 7
Tea extracts 1
Titanate 2
Tricalcium silicate 3
Whiskers 9

Barium Titanate (BaTiO3) Sputtering Targets, Purity: 99.99%, Size: 8”, Thickness: 0.250”

Sputtering Targets

$2,628.00

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Product	Barium Titanate (BaTiO3) Sputtering Targets, Purity: 99.99%, Size: 8'', Thickness: 0.250''
CAS No.	12047‑27‑7
Appearance	Powder
Purity	≥99%, ≥99.9%, ≥95% (Other purities are also available)
APS	1 – 5 µm (Size Can be customized), Ask for other available size ranges.
Ingredient	N/A
Molecular Weight	~233.19 g/mol
Melting Point	~1625 °C
Boiling Point	N/A
Density	~6.02 g/cm³
Product Codes	NCZ-2453K

Barium Titanate (BaTiO3) Sputtering Targets, Purity: 99.99%, Size: 8'', Thickness: 0.125''

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Barium Titanate (BaTiO3) Sputtering Targets, Purity: 99.99%, Size: 8”, Thickness: 0.125”

Sputtering Targets

$2,628.00

Add to cart

Product	Barium Titanate (BaTiO3) Sputtering Targets, Purity: 99.99%, Size: 8'', Thickness: 0.125''
CAS No.	12047‑27‑7
Appearance	Powder
Purity	≥99%, ≥99.9%, ≥95% (Other purities are also available)
APS	1 – 5 µm (Size Can be customized), Ask for other available size ranges.
Ingredient	N/A
Molecular Weight	~233.19 g/mol
Melting Point	~1625 °C
Boiling Point	N/A
Density	~6.02 g/cm³
Product Codes	NCZ-2454K

45s Bioglass(Actimins, 45%SiO2+24.5%Na2O+24.5%CaO+6%P2O5, >98%, 5μm) (210982)

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45s Bioglass(Actimins, 45%SiO2+24.5%Na2O+24.5%CaO+6%P2O5, >98%, 5μm) (210982)

Inorganic Biomaterials

$2,730.00

Select options This product has multiple variants. The options may be chosen on the product page

Product	45s Bioglass(Actimins, 45%SiO2+24.5%Na2O+24.5%CaO+6%P2O5, >98%, 5μm) (210982)
CAS No.	957049‑68‑2
Appearance	Powder
Purity	≥99%, ≥99.9%, ≥95% (Other purities are also available)
APS	5μm (Size Can be customized), Ask for other available size ranges.
Ingredient	N/A
Molecular Weight	~330.165 g/mol
Melting Point	~1100 – 1200 °C
Boiling Point	N/A
Density	~2.7 – 2.8 g/cm³
Product Codes	NCZ-2614K

45s Bioglass(Actimins, 45%SiO2+24.5%Na2O+24.5%CaO+6%P2O5, >98%, 10μm) (410982)

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45s Bioglass(Actimins, 45%SiO2+24.5%Na2O+24.5%CaO+6%P2O5, >98%, 10μm) (410982)

Inorganic Biomaterials

$2,730.00

Select options This product has multiple variants. The options may be chosen on the product page

Product	45s Bioglass(Actimins, 45%SiO2+24.5%Na2O+24.5%CaO+6%P2O5, >98%, 10μm) (410982)
CAS No.	957049-68-2
Appearance	Powder
Purity	≥99%, ≥99.9%, ≥95% (Other purities are also available)
APS	~10 μm (Size Can be customized), Ask for other available size ranges.
Ingredient	N/A
Molecular Weight	~331.3 g/mol (average per formula unit)
Melting Point	~1100 – 1200 °C
Boiling Point	N/A
Density	~2.7–2.8 g/cm³
Product Codes	NCZ-2615K

45s Bioglass(Actimins, 45%SiO2+24.5%Na2O+24.5%CaO+6%P2O5, >98%, 1-2mm) (811982)

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45s Bioglass(Actimins, 45%SiO2+24.5%Na2O+24.5%CaO+6%P2O5, >98%, 1-2mm) (811982)

Inorganic Biomaterials

$2,730.00

Select options This product has multiple variants. The options may be chosen on the product page

Product	45s Bioglass(Actimins, 45%SiO2+24.5%Na2O+24.5%CaO+6%P2O5, >98%, 1-2mm) (811982)
CAS No.	957049‑68‑2
Appearance	Powder
Purity	≥99%, ≥99.9%, ≥95% (Other purities are also available)
APS	1–2 mm(Size Can be customized), Ask for other available size ranges.
Ingredient	N/A
Molecular Weight	Not defined (amorphous); ~330 g/mol estimate
Melting Point	~1100 – 1200 °C
Boiling Point	N/A
Density	~2.7 g/cm³
Product Codes	NCZ-2616K

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Pneumatic Cylindrical Battery Sealing Machine

BATTERY EQUIPMENT, Battery Lab Machine

$3,550.00

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FEATURES

Pneumatic sealing machine mostly used for the sample of lab battery materials’ research, which to make cylindrical battery
Standard 18650 cylindrical battery sealing mould (1 set, 2 sealing). You can also choose other cylindrical battery sealing mould
Totally operated by pneumatic. Without any electricity. Very easy to use
Two steps for sealing which make better sealing
Precise design of the mold ensures accurate and reliable sealing. Solid steel structure design makes a steady and safe use
Good looking appearance, simple maintenance, small size, easy operater and accurate molding
Gas supply by compressed air or Inert gas cylinder. External connection of the compressed gas make sure the balance of the atmosphere in the glove box
Precise design of the mold ensures accurate and reliable sealing. Solid steel structure design makes a steady and safe use

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Ultrasonic Homogenizer

Lab Equipment, Dispersion Equipment, Homogenizer

$3,700.00

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Applications of Ultrasonic Homogenizer

Ultrasonic homogenizers have a wide range of applications, including disintegrating cells and biological tissues, DNA protein extraction, RNA hydrolysis, and protein microencapsulation in biology. In chemistry, they are used to accelerate and increase reactions output. They are also used for Earth and sediments treatments in the environment field, as well as quality control, R&D, sample gas removal, dissolution and homogenization, emulsion, and dispersion in general analysis. Additionally, ultrasonic homogenizers can be used in an anti-noise cabin to insulate high noises emitted by ultrasound effects. Our ultrasonic homogenizer packing includes a host, ultrasonic probe, power cord, cable, fuse, operating user manual, sound box, and lifting platform. Choose Nanografi for reliable and high-quality ultrasonic homogenizer solutions tailored to your specific needs.

Ultrasonic Homogenizer Packing List

Host: 1
Ultrasonic Probe: 1
Power Cord: 1
Cable: 1
Fuse: 3
Operating User Manual: 1
Sound Box: 1
Lifting Platform: 1

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High Energy Ball Mill

Lab Equipment, Dispersion Equipment, High Energy Ball Mill

$3,940.00

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Applications:

Mechanical Alloying
Refractory Material Production
Paints
Pharmaceuticals
Geology and Mining
Environmental Science
Energy and Battery Industry

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Silver (Ag) Sputtering Targets, Purity: 99.99%, Size: 8”, Thickness: 0.250”

SILVER SPUTTERING TARGETS, 8, SPUTTERING TARGETS NAMES N - S, Sputtering Targets

$4,282.00

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Applications of Sputtering Targets;

Film deposition is accomplished using sputtering targets. A technique for sputtering thin films is called "deposition made by sputter targets," which entails eroding material from a "target" source onto a "substrate" like a silicon wafer. Etching of the target is done using semiconductor sputtering targets. When selectivity is not an issue and a high degree of etching anisotropy is required, sputter etching is the method of choice. By removing the target material through etching, sputter targets are also utilized for investigation. In secondary ion spectroscopy (SIMS), one example is when the target material is sputtered at a steady pace. Mass spectrometry is used to quantify the concentration and identity of spewed atoms as the target is sputtered.

The target material's composition may be ascertained and even very low concentrations of contaminants can be found with the aid of the sputtering target.

There is also an application area for sputtering targets in space. One type of space weathering that alters the chemical and physical characteristics of airless worlds like the Moon and asteroids is sputtering.

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Pneumatic Die Cutting Machine For Battery Electrode Cutting

Battery Lab Machine

$4,350.00

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Pneumatic Die Cutting Machine For Battery Electrode Cutting Pneumatic die cutter is suitable for die-cutting of positive and negative electrodes

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Holmium (Ho) Metal 99.5% 2N5, 1kg

High Purity Inorganic Chemicals

$4,881.00

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Product	Holmium (Ho) Metal 99.5% 2N5, 1kg
CAS No.	7440-60-0
Appearance	Silvery, soft, ductile meta
Purity	≥99%, ≥99.9%, ≥95%(Other purities are also available)
APS	N/A
Ingredient	Ho
Molecular Weight	164.9303 g/mol
Melting Point	1,474 °C
Boiling Point	N/A
Density	8.79 g/cm³
Product Codes	NCZ-416I

Silver (Ag) Sputtering Targets, Purity: 99.99%, Size: 8'', Thickness: 0.250''

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Silver (Ag) Sputtering Targets, Purity: 99.99%, Size: 8”, Thickness: 0.250”

Sputtering Targets

$5,002.00

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Product	Silver (Ag) Sputtering Targets, Purity: 99.99%, Size: 8'', Thickness: 0.250''
CAS No.	7440-22-4
Appearance	Powder
Purity	≥99%, ≥99.9%, ≥95% (Other purities are also available)
APS	N/A (Size Can be customized), Ask for other available size ranges.
Ingredient	N/A
Molecular Weight	107.87 g/mol
Melting Point	961.78 °C
Boiling Point	2162 °C
Density	10.49 g/cm³
Product Codes	NCZ-1685K

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Shape Memory Polymer NGS5520, Solution Type

SHAPE MEMORY POLYMERS, NGS-Solution Type Shape Memory Polymer, SHAPE MEMORY MATERIALS

$5,800.00

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Applications:

Shape Memory Polymer (SMP) has myriad of advanced applications in different fields from daily life uses like textile to biomedicals. These applications include smart catheter, drug-delivery systems, biosensors, auto-repairing automobile parts, smart textile, self-healing materials, smart suture, artificial organs like muscles, and so on.

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Shape Memory Polymer NGS4520, Solution Type

SHAPE MEMORY POLYMERS, NGS-Solution Type Shape Memory Polymer, SHAPE MEMORY MATERIALS

$5,800.00

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Applications:

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Shape Memory Polymer NGS3520, Solution Type

SHAPE MEMORY POLYMERS, NGS-Solution Type Shape Memory Polymer, SHAPE MEMORY MATERIALS

$5,800.00

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Applications:

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Platinum Foil, Purity 99.95%, Thickness: 0.5mm, 10×10 cm

BATTERY EQUIPMENT, FOILS FOR BATTERIES, Platinum Foils

$6,485.00 – $34,125.00Price range: $6,485.00 through $34,125.00

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Applications

Dental veneers
Fabrication of electrochemically stable microelectrode arrays
A counter electrode for the fabrication of supercapacitors
An enzyme electrode probe for potential usage in biosensors
Arc-casting, hot-pressing, machining, vacuum-arc melting, casting, custom-alloying, extruding, rolling, cutting, vacuum-sealing, and bonding.
Electronics industry for electrical contacts which might be subject to high temperatures
Make weights and measure standards

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Platinum Foil, Purity 99.95%, Thickness: 0.5mm, 10×10 cm

BATTERY EQUIPMENT, FOILS FOR BATTERIES, Platinum Foils

$10,838.00 – $52,800.00Price range: $10,838.00 through $52,800.00

Select options This product has multiple variants. The options may be chosen on the product page

Applications

Dental veneers
Fabrication of electrochemically stable microelectrode arrays
A counter electrode for the fabrication of supercapacitors
An enzyme electrode probe for potential usage in biosensors
Arc-casting, hot-pressing, machining, vacuum-arc melting, casting, custom-alloying, extruding, rolling, cutting, vacuum-sealing, and bonding.
Electronics industry for electrical contacts which might be subject to high temperatures
Make weights and measure standards