Praseodymium Oxide Nanopowder/ Nanoparticles Pr6O11, 99.9%, ~100nm

Price range: $80.00 through $475.00
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$80/25g $215/100g $475/500g
Product Praseodymium Oxide Nanopowder/ Nanoparticles Pr6O11, 99.9%, ~100nm
CAS No. 12037-29-5
Appearance Dark brown or black powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 100nm (Size Can be customized),  Ask for other available size range.
Ingredient Pr6O11
Molecular Weight 1021.44 g/mol
Melting Point 2183°C
Boiling Point 3760 °C
Density 6.5 g/cm³
Product Codes NCZ-118R
 

Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”

$475.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”

$469.00

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”

$468.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”

$455.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”

$431.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Purity: 99.9%, Size: 2”, Thickness: 0.125”

$426.00

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Erbium Oxide (Er2O3) Micron Powder, Purity: 99.99%, Size: 325 mesh

Price range: $71.00 through $415.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Erbium oxide is used in electronic devices. It is used in capacitors, metal-oxide semiconductor transistors, and as adopants for optical fiber and laser materials. It is also used as tunned insulator for josephson junctions.

Yttrium Oxide (Y2O3) Nanopowder/Nanoparticles, Purity: 99.999%, Size: 25-50 nm

Price range: $33.00 through $414.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Yttrium oxide nanoparticles have applications in inorganic synthesis, material science, and in different electronic devices. In inorganic synthesis yttrium oxide is an important starting point for inorganic compound. It is used in making plasma and flat panel displays. It is also used in making fluorescent lamps, ultra-fast sensors, and photoelectric sensors. Yttrium oxide nanoparticle is used as additive in steel , iron, and non-ferrous alloys. It is also used as additive in coatings for high temperature applications.

Europium Oxide (Eu2O3) Micron Powder, Purity: 99.99%, Size: 325 mesh

Price range: $94.00 through $405.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Europium oxide shows high efficiency as a luminescent material. It is used in flat-panal displays, fluorescent lamps, red powder activation of color TV, and high pressure mercury lump. It is also used as an agent for manufacturing fluorescence glass.

QUICK VIEW Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.250”

$396.00

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Samarium Oxide (Sm2O3) Nanopowder/Nanoparticles, Purity: 99.955%, Size: 13-47 nm

Price range: $25.00 through $395.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Samarium Oxide nanoparticles is used in high permittivity ceramics for dielectric resonators and substrates. It is used in nuclear reaction piles as structural and shielding materials. It is also used as a component material for making gas sensors, catalysts, and solid oxide fuel cell.

Terbium Oxide (Tb4O7) Nanopowder/Nanoparticles, Purity: 99.97%, Size: 8-110 nm, Cubic

Price range: $75.00 through $387.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Terbium oxide nanoparticles have good magnetic and optical properties. It is used in magneto-optical glasses, and magneto-optical recording materials. It is also used in glass materials with Faraday Rotation effect for optical and laser based devices. It has catalytic application in automobile exhaust converter, and is used as activating agent for fluorescent powder.

Cerium Oxide (CeO2) Nanopowder/Nanoparticles, Purity: 99.975%, Size: 8-28 nm

Price range: $59.00 through $384.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Cerium Oxide nanoparticles are excellent oxidation resistant materials. It is used in oxidation resistant coatings, oxygen sensors, and oxygen pumps. It is good Infrared absorbent. It is used in heat resistant alloy coatings and coatings for infrared filters. Cerium Oxide nanoparticle is used in electronics as buffer layer for superconductors and polishing media for electronic devices. It is also used as electrolytes and electrode materials for solid oxide fuel cells. Cerium Oxide nanoparticles have also applications in the field of catalysis as a catalyst or catalyst support.

Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”

$363.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Europium Oxide Nanopowder / Nanoparticles (Eu2O3, 99.9%, 50 nm)

Price range: $128.00 through $360.00
Select options This product has multiple variants. The options may be chosen on the product page
$128/5g $360/25g
Product Europium Oxide Nanopowder / Nanoparticles (Eu2O3, 99.9%, 50 nm)
CAS No. 1308-96-9
Appearance Fine white powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 50nm (Size Can be customized),  Ask for other available size range.
Ingredient Eu2O3
Molecular Weight 351.93g/mol
Melting Point 2400°C
Boiling Point N/A
Density 7.42g/cm³
Product Codes NCZ-109R
 

Erbium Oxide Nanopowder / Nanoparticles (Er2O3, 99.9%, 40-50 nm)

Price range: $55.00 through $345.00
Select options This product has multiple variants. The options may be chosen on the product page
$55/25g $120/100g $345/500g
Product Erbium Oxide Nanopowder / Nanoparticles (Er2O3, 99.9%, 40-50 nm)
CAS No. 12061-16-4
Appearance Pink powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 40-50nm (Size Can be customized),  Ask for other available size range.
Ingredient Er2O3
Molecular Weight 382.52g/mol
Melting Point 2344°C
Boiling Point N/A
Density 8.64g/cm³
Product Codes NCZ-106R
 

Cerium Oxide doped with Gadolinium Nanoparticles (10mol%Gd2O3+90mol%CeO2, 99.9%, <100 nm)

Price range: $133.00 through $337.00
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$133/25g $337/100g
Product Cerium Oxide doped with Gadolinium Nanoparticles (10mol%Gd2O3+90mol%CeO2, 99.9%, <100 nm)
CAS No. 1306-38-3
Appearance White or pale yellow powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 100 nm (Size Can be customized),  Ask for other available size range.
Ingredient CeO2
Molecular Weight 177.38 g/mol
Melting Point 2400°C
Boiling Point N/A
Density 7.2g/cm³
Product Codes NCZ-105R

Praseodymium (Pr) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.250”

$322.00

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Gadolinium Oxide (Gd2O3) Nanopowder/Nanoparticles, Purity: 99.99%, Size: 13-95 nm

Price range: $38.00 through $316.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Gadolinium oxide nanoparticles are used in different fluorescent, luminescence and electric devices. It is used in electroluminescent devices, cathode-ray tube, field emission displays, ferroelectric memory, plasma display panels, ultraviolet detectors, and high resolution x-ray medical imaging.

Cerium Oxide Nanopowder/ Nanoparticles (Nanoceria or CeO2, 10~30nm, 99.9%) (Copy)

Price range: $55.00 through $315.00
Select options This product has multiple variants. The options may be chosen on the product page
$55/25g
$115/100g
$205/500g
$315/kg

Product 

Cerium Oxide Nanopowder/ Nanoparticles (Nanoceria or CeO2, 10~30nm, 99.9%)

CAS No.

1306-38-3

Appearance

Powder

Purity

≥99%,  ≥99.9%,  ≥95%

(Other purities are also available)

APS

10~30nm (Size Can be customized), Ask for other available size ranges.

Ingredient

N/A

Molecular Weight

172.11 g/mol

Melting Point

~1,590 °C

Boiling Point

3,500°C

Density

~5.17 g/cm³

Product Codes

NCZ-1138K

Yttrium Aluminate (Y3Al5O12) Nanopowder/Nanoparticles, Purity: 99.7+%, Size: 25 nm

Price range: $78.00 through $306.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Yttrium Aluminum Oxide nanoparticles has applications in electronic devices. It is used in temperature sensors, P-type transparent conductive films, and counter electrodes. It is used as cathode materials for alkaline batteries. Its optical properties can be used in active optical filters, and automotive rear-view mirrors with adjustable reflectance. It also has applications in the field of catalysis.

Yttrium Oxide Nanoparticles / Nanopowder (Y2O3, 99.995%, 30~50nm)

Price range: $80.00 through $305.00
Select options This product has multiple variants. The options may be chosen on the product page
$80/25g $179/100g $305/500g
Product Yttrium Oxide Nanoparticles / Nanopowder (Y2O3, 99.995%, 30~50nm)
CAS No. 1314-36-9
Appearance White powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 30-50nm (Size Can be customized),  Ask for other available size range.
Ingredient Y2O3
Molecular Weight 225.81 g/mol
Melting Point 2425°C
Boiling Point 4300°C
Density 5.01 g/cm³
Product Codes NCZ-121R
 

Cerium Oxide (CeO2) Micron Powder, Purity: 99.99%, Size: 325 mesh, White

Price range: $36.00 through $305.00
Select options This product has multiple variants. The options may be chosen on the product page
5 grams/24 € 25 grams/37 € 100 grams/65 € 500 grams/135 € 1000 grams/195 €
Please contact us for quotes on larger quantities !!!

Cerium Oxide (CeO2) Micron Powder

Purity: 99.99%, Size: 325 mesh, White

Technical Properties:

PURITY

Min. 99.99 %

COMPOSITION

Ce- 81.4, O- 18.6

PARTICLE SIZE

325 mesh

CAS

1306-38-3

DENSITY

686 g/cm³

BOILING POINT

3468 °C

MELTING POINT

2600 °C

MOHS HARDNESS @ 20ºC

6

COEFF. OF EXPANSION @ 20ºC

8 x 10 ⁸

ELECTRIC RESISTIVITY

0.218 microhm-1

CRYSTAL STRUCTURE

Cubic, Face Centered

FORM  

Powder

APPLICATIONS

Lapping, Polishing

                                   

Neodymium Oxide (Nd2O3) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 25-40 nm

Price range: $38.00 through $304.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Neodymium oxide nanoparticle is used as catalysts and catalyst supports. It is also used as coloring agent of glass and ceramics. It is used as dopant for solid state lasers and as additive for Mg and Al alloys and polymers.

CHOOSE OPTIONS COMPARE QUICK VIEW Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”

$303.00
but allow experts a large degree of control over the growth and microstructure of the area.

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Europium Oxide (Eu2O3) Nanopowder/Nanoparticles, Purity: 99.995%, Size: 8-90 nm, Cubic (No reviews yet)Write

Price range: $44.00 through $300.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Europium oxide nanoparticles show high efficiency as a luminescent material. It is used in flat-panel displays, fluorescent lamps, red powder activation of color TV, and high pressure mercury lump. It is also used as an agent for manufacturing fluorescence glass

Samarium Oxide (Sm2O3) Micron Powder, Purity: 99.99%, Size: 325 mesh

Price range: $10.00 through $281.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Samarium Oxide is used in high permittivity ceramics for dielectric resonators and substrates. It is used in nuclear reaction piles as structural and shielding materials. It is also used as a component material for making gas sensors, catalysts, and solid oxide fuel cell.

Erbium Oxide (Er2O3) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 8-90 nm, Cubic

Price range: $38.00 through $281.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Erbium oxide nanoparticles are used in electronic devices. It is used in capacitors, metal-oxide semiconductor transistors, and as a dopants for optical fiber and laser materials. It is also used as tunned insulator for Josephson junctions.

Yttrium Oxide Powder (Y2O3, 99.995%, 1~2um)

Price range: $117.00 through $280.00
Select options This product has multiple variants. The options may be chosen on the product page
$117/100g $280/500g $327/kg
Product Yttrium Oxide Powder (Y2O3, 99.995%, 1~2um)
CAS No. 1314-36-9
Appearance White powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1-2um (Size Can be customized),  Ask for other available size range.
Ingredient Y2O3
Molecular Weight 225.81 g/mol
Melting Point 2425°C
Boiling Point 4300°C
Density 5.01 g/cm³
Product Codes NCZ-123R
 

Yttrium Aluminate (Y3Al5O12) Nanopowder/Nanoparticles, Purity: 99.7+%, Size: 25 nm

Price range: $70.00 through $278.00
Select options This product has multiple variants. The options may be chosen on the product page
1 gram/65 € 
5 grams/255 €                       
Please contact us for quotes on larger quantities !!!

Yttrium Aluminate (Y3Al5O12) Nanopowder/Nanoparticles

Purity: 99.7+%, Size: 25 nm

Technical Properties:

Purity (%) 99.7
Average Particle Size (nm) 25
Color white
Morphology nearly spherical
Elemental Analysis La Sm Eu Gd Ce Fe Cu Ni Si Zn Pb Ca
0.006% 0.002% 0.007% 0.003% 0.003% 2 µg/g 3  µg/g 2 µg/g 8 µg/g 3  µg/g 4 µg/g 6 µg/g

Applications:

Yttrium Aluminum Oxide nanoparticles has applications in electronic devices. It is used in temperature sensors, P-type transparent conductive films, and counter electrodes. It is used as cathode materials for alkaline batteries. Its optical properties can be used in active optical filters, and automotive rear-view mirrors with adjustable reflectance. It also has applications in the field of catalysis.

Praseodymium (Pr) Sputtering Targets, Purity: 99.9%, Size: 4”, Thickness: 0.125”

$273.00

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Lanthanum Oxide (La2O3) Micron Powder, Purity: 99.99%, Size: 325 mesh

Price range: $12.00 through $244.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Lanthanum oxide is used as a catalyst in organic chemical productions, autompbile exhausts, and in improving propellant burning rates. In electronics it can be used in light converting films due to its high photoelectric conversion efficiency. It can also be used in piezoelectric materials, electrode materials, laser materials, hydrogen storage materials, and light emmitting materials. Lanthanum oxide can also be used for manufacturing all kinds of alloy materials, optical glass, and high refraction optical fibers.

Yttrium Oxide Nanoparticles / Nanopowder (Y2O3, 99.995%, 0.5~1um)

Price range: $105.00 through $225.00
Select options This product has multiple variants. The options may be chosen on the product page
$105/100g $225/500g $325/kg
Product Yttrium Oxide Nanoparticles / Nanopowder (Y2O3, 99.995%, 0.5~1um)
CAS No. 1314-36-9
Appearance White powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 0.5-1nm (Size Can be customized),  Ask for other available size range.
Ingredient Y2O3
Molecular Weight 225.81 g/mol
Melting Point 2425°C
Boiling Point 4300°C
Density 5.01 g/cm³
Product Codes NCZ-122R
 

Neodymium Oxide Nanoparticles (Nd2O3, 99.9+%, ~100 nm)

Price range: $81.00 through $221.00
Select options This product has multiple variants. The options may be chosen on the product page
$81/25g $221/100g
Product Neodymium Oxide Nanoparticles (Nd2O3, 99.9+%, ~100 nm)
CAS No. 1313-97-9
Appearance Pale purple powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 100nm (Size Can be customized),  Ask for other available size range.
Ingredient Nd2O3
Molecular Weight 336.48g/mol
Melting Point 2233°C
Boiling Point 3760°C
Density 7.24 g/cm³
Product Codes NCZ-117R
 

Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness: 0.250” €220.00

$220.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Erbium oxide with a chemical formula of Er2Ois an oxide of erbium metal. The applications of erbium oxide are varied due to their electrical, optical and photoluminescence properties. Nanoscale materials doped with Er+3 are of much interest because they have special particle-size-dependent optical and electrical properties. Erbium oxide doped nanoparticle materials can be dispersed in glass or plastic for display purposes, such as display monitors. The spectroscopy of Er+3 electronic transitions in host crystals lattices of nanoparticles combined with ultrasonically formed geometries in aqueous solution of carbon nanotubes is of great interest for synthesis of photoluminescence nanoparticles in ‘green’ chemistry. Erbium oxide is among the most important rare earth metals used in biomedicine. Erbium oxides are also used as gate dielectrics in semiconductor devices since it has a high dielectric constant (10-14) and a large band gap. Erbium is sometimes used as a coloring for glasses and erbium oxide can also be used as a burnable neutron poison for nuclear fuel. Erbium oxide films obtained by sputtering can be used for their photoluminescence effect.

Europium (Eu) Micron Powder, Purity: 99.5 %, Size: 325 mesh

Price range: $34.00 through $217.00
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1 gram/32 € 5 grams/53 € 25 grams/109 € 100 grams/200 €  Please contact us for quotes on larger quantities !!

Europium (Eu) Micron Powder

Purity: 99.5 %, Size: 325 mesh

Technical Properties:

PURITY

 99.5 %

PARTICLE SIZE

325 mesh

MELTING POINT 

822 °C

BOILING POINT 

1597 °C

DENSITY

5.243 gm/cc

FORM  

Powder

ELECTRIC RESISTIVITY

90.0 microhm-cm @ 25 °C

   

Applications:

Europium is the least abundant of the rare earth elements. It is also the most reactive one. Europium is found in many minerals such as xenotime, monazite, bastnasite, and loparite. It is not found in nature as a free element. Europium is used in fluorescent glass manufacturing as a doping agent, and in glasses used in lasers. It is also used in phosphors and doped phosphorous in television sets. 

Samarium Oxide Nanopowder/ Nanoparticles (Sm2O3, 99.9%, 100nm)

$215.00
Select options This product has multiple variants. The options may be chosen on the product page
$215/25g
Product Samarium Oxide Nanopowder/ Nanoparticles (Sm2O3, 99.9%, 100nm)
CAS No. 12060-58-1
Appearance Yellow to white powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 100nm (Size Can be customized),  Ask for other available size range.
Ingredient Sm₂O₃. 
Molecular Weight 348.72 g/mol
Melting Point 2,335° C
Boiling Point 4,118° C
Density 8.347g/cm3
Product Codes NCZ-120R
 

Gadolinium Oxide Nanoparticles/Nanopowder (Gd2O3, 99.9%, <100nm)

Price range: $93.00 through $215.00
Select options This product has multiple variants. The options may be chosen on the product page
$93/25g $215/100g
Product Gadolinium Oxide Nanoparticles/Nanopowder (Gd2O3, 99.9%, <100nm)
CAS No. 1314-35-8
Appearance White powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 100nm (Size Can be customized),  Ask for other available size range.
Ingredient Gd₂O₃
Molecular Weight 362.50 g/mol
Melting Point 2420°C
Boiling Point N/A
Density 7.07 g/cm³
Product Codes NCZ-110R
 

Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.250”

$214.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Erbium oxide with a chemical formula of Er2Ois an oxide of erbium metal. The applications of erbium oxide are varied due to their electrical, optical and photoluminescence properties. Nanoscale materials doped with Er+3 are of much interest because they have special particle-size-dependent optical and electrical properties. Erbium oxide doped nanoparticle materials can be dispersed in glass or plastic for display purposes, such as display monitors. The spectroscopy of Er+3 electronic transitions in host crystals lattices of nanoparticles combined with ultrasonically formed geometries in aqueous solution of carbon nanotubes is of great interest for synthesis of photoluminescence nanoparticles in ‘green’ chemistry. Erbium oxide is among the most important rare earth metals used in biomedicine. Erbium oxides are also used as gate dielectrics in semiconductor devices since it has a high dielectric constant (10-14) and a large band gap. Erbium is sometimes used as a coloring for glasses and erbium oxide can also be used as a burnable neutron poison for nuclear fuel. Erbium oxide films obtained by sputtering can be used for their photoluminescence effect.

Praseodymium Oxide (Pr6O11) Nanopowder/Nanoparticles, Purity: 99.99%, Size: 13-57 nm

Price range: $30.00 through $211.00
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Applications:

Praseodymium oxide nanoparticle is widely used in magnetic materials. It has also applications in catalysis.

Erbium Oxide Micron powder ( Er2O3 Micron powder, 99.9%, 1um)

Price range: $40.00 through $210.00
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$40/25g $90/100g $210/500g
Product Erbium Oxide Micron powder ( Er2O3 Micron powder, 99.9%, 1um)
CAS No. 12061-16-4
Appearance Pink powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1um (Size Can be customized),  Ask for other available size range.
Ingredient Er2O3
Molecular Weight 382.56g/mol
Melting Point 2344°C
Boiling Point 3290°C
Density 8.64g/cm³
Product Codes NCZ-107R
 

Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.125”

$210.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Erbium oxide with a chemical formula of Er2Ois an oxide of erbium metal. The applications of erbium oxide are varied due to their electrical, optical and photoluminescence properties. Nanoscale materials doped with Er+3 are of much interest because they have special particle-size-dependent optical and electrical properties. Erbium oxide doped nanoparticle materials can be dispersed in glass or plastic for display purposes, such as display monitors. The spectroscopy of Er+3 electronic transitions in host crystals lattices of nanoparticles combined with ultrasonically formed geometries in aqueous solution of carbon nanotubes is of great interest for synthesis of photoluminescence nanoparticles in ‘green’ chemistry. Erbium oxide is among the most important rare earth metals used in biomedicine. Erbium oxides are also used as gate dielectrics in semiconductor devices since it has a high dielectric constant (10-14) and a large band gap. Erbium is sometimes used as a coloring for glasses and erbium oxide can also be used as a burnable neutron poison for nuclear fuel. Erbium oxide films obtained by sputtering can be used for their photoluminescence effect.

Cerium Oxide Nanopowder/ Nanoparticles (Nanoceria or CeO2, 10~30nm, 99.9%)

Price range: $55.00 through $205.00
Select options This product has multiple variants. The options may be chosen on the product page
$55/25g $115/100g $205/500g $315/kg
Product Cerium Oxide Nanopowder/ Nanoparticles (Nanoceria or CeO2, 10~30nm, 99.9%)
CAS No. 1306-38-3
Appearance White Powder
Purity ≥99%,  ≥99.9%,  ≥95% (Other purities are also available)
APS 15-30 nm  (Size Can be customized),  Ask for other available size range.
Ingredient CeO2
Molecular Weight 172.115g/mol
Melting Point 2400°C
Boiling Point 3,500°C
Density 7.2 g/cm³
Product Code NCZ-100R
 

Dysprosium Oxide (Dy2O3) Nanopowder/Nanoparticles, High Purity: 99.95+%, Size: 28 nm

Price range: $41.00 through $204.00
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Applications:

Dysprosium oxide nanoparticles show good magnetic and optical properties. these properties are applied in magneto-optical recording materials and in luminescence. It is a neutron absorbent and used in the measurement of neutron energy-spectrum and in nuclear reaction control rods. It is used as glass material in laser-based and optical devices with a Faraday Rotation affect.

Praseodymium (Pr) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.250”

$201.00

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 4”, Thickness: 0.250”

$189.00
Select options This product has multiple variants. The options may be chosen on the product page
 

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Erbium oxide with a chemical formula of Er2Ois an oxide of erbium metal. The applications of erbium oxide are varied due to their electrical, optical and photoluminescence properties. Nanoscale materials doped with Er+3 are of much interest because they have special particle-size-dependent optical and electrical properties. Erbium oxide doped nanoparticle materials can be dispersed in glass or plastic for display purposes, such as display monitors. The spectroscopy of Er+3 electronic transitions in host crystals lattices of nanoparticles combined with ultrasonically formed geometries in aqueous solution of carbon nanotubes is of great interest for synthesis of photoluminescence nanoparticles in ‘green’ chemistry. Erbium oxide is among the most important rare earth metals used in biomedicine. Erbium oxides are also used as gate dielectrics in semiconductor devices since it has a high dielectric constant (10-14) and a large band gap. Erbium is sometimes used as a coloring for glasses and erbium oxide can also be used as a burnable neutron poison for nuclear fuel. Erbium oxide films obtained by sputtering can be used for their photoluminescence effect.

Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.250”

$186.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Erbium oxide with a chemical formula of Er2Ois an oxide of erbium metal. The applications of erbium oxide are varied due to their electrical, optical and photoluminescence properties. Nanoscale materials doped with Er+3 are of much interest because they have special particle-size-dependent optical and electrical properties. Erbium oxide doped nanoparticle materials can be dispersed in glass or plastic for display purposes, such as display monitors. The spectroscopy of Er+3 electronic transitions in host crystals lattices of nanoparticles combined with ultrasonically formed geometries in aqueous solution of carbon nanotubes is of great interest for synthesis of photoluminescence nanoparticles in ‘green’ chemistry. Erbium oxide is among the most important rare earth metals used in biomedicine. Erbium oxides are also used as gate dielectrics in semiconductor devices since it has a high dielectric constant (10-14) and a large band gap. Erbium is sometimes used as a coloring for glasses and erbium oxide can also be used as a burnable neutron poison for nuclear fuel. Erbium oxide films obtained by sputtering can be used for their photoluminescence effect.

Cerium Oxide Nanopowder/ Nanoparticles (CeO2, 100~1000nm, 99.9%)

Price range: $97.00 through $185.00
Select options This product has multiple variants. The options may be chosen on the product page
$97/100g $185/500g $271/kg
Product Cerium Oxide Nanopowder/ Nanoparticles (CeO2, 100~1000nm, 99.9%)
CAS No. 1306-38-3
Appearance Pale yellow to white powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 100 - 1000 nm (Size Can be customized),  Ask for other available size range.
Ingredient CeO2
Molecular Weight 172.11g/mol
Melting Point 2400°C
Boiling Point 3500°C
Density N/A
Product Codes NCZ-101R
 

Samarium Oxide Micronpowder( Sm2O3, 99.9%, 3~5um)

Price range: $75.00 through $181.00
Select options This product has multiple variants. The options may be chosen on the product page
$75/25g $115/100g $181/500g
Product Samarium Oxide Micronpowder( Sm2O3, 99.9%, 3~5um)
CAS No. 12060-58-1
Appearance Pale yellow or off-white powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 3-5um (Size Can be customized),  Ask for other available size range.
Ingredient Sm₂O₃
Molecular Weight 348.72 g/mol
Melting Point 2335° C
Boiling Point 4118° C
Density 8.347g/cm3
Product Codes NCZ-119R
 

Yttrium Oxide Micron Powder (Y2O3, 99.999%, <10um)

Price range: $117.00 through $180.00
Select options This product has multiple variants. The options may be chosen on the product page
$117/100g $180/500g
Product Yttrium Oxide Micron Powder (Y2O3, 99.999%, <10um)
CAS No. 1314-36-9
Appearance White powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 10um (Size Can be customized),  Ask for other available size range.
Ingredient Y2O3
Molecular Weight 225.81 g/mol
Melting Point 2425°C
Boiling Point 4300°C
Density 5.01 g/cm³
Product Codes NCZ-124R
 

Cerium Oxide Powder(CeO2, 1~3um, 99.9%)

Price range: $93.00 through $175.00
Select options This product has multiple variants. The options may be chosen on the product page
$93/100g $175/500g
Product Cerium Oxide Powder(CeO2, 1~3um, 99.9%)
CAS No. 1306-38-3
Appearance Pale yellow or white powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 1 to 3um (Size Can be customized),  Ask for other available size range.
Ingredient CeO2
Molecular Weight 172.11g/mol
Melting Point 2600°C
Boiling Point 3468°C
Density 7.13 g/cm³
Product Codes NCZ-103R
 

Praseodymium (Pr) Sputtering Targets, Purity: 99.9%, Size: 3”, Thickness: 0.125”

$175.00

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.

Holmium Oxide (Ho2O3) Micron Powder, Purity: 99.99%, Size: 325 mesh

Price range: $36.00 through $175.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications: 

Holmium oxide is used in glass manufacturing. It is used as a colorant in glass and cubic zirconia. It gives sharp optical absorption peaks in the spectral range of 200-900 nm when added to glass. It is used as a calibration standard for optical spectrophotometers. It is also used as a catalyst and as a laser material.

Lanthanum Oxide Nanoparticles/ Nanopowder ( La2O3, 99.99+%, 100 nm)

Price range: $75.00 through $173.00
Select options This product has multiple variants. The options may be chosen on the product page
$75/25g $173/100g
Product Lanthanum Oxide Nanoparticles/ Nanopowder ( La2O3, 99.99+%, 100 nm)
CAS No. 1312-81-8
Appearance White powder
Purity ≥99%,  ≥99.9%,  ≥95%(Other purities are also available)
APS 100nm (Size Can be customized),  Ask for other available size range.
Ingredient La₂O₃ 
Molecular Weight 325.809 g/mol
Melting Point 2217°C
Boiling Point 4200°C
Density 6.51 g/cm³
Product Codes NCZ-116R
 

Praseodymium Oxide (Pr6O11) Nanopowder/Nanoparticles, Purity: 99.95%, Size: 8-110 nm

Price range: $25.00 through $169.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Praseodymium oxide nanoparticle is widely used in magnetic materials. It has also applications in catalysis.

Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 3”, Thickness: 0.125”

$156.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Erbium oxide with a chemical formula of Er2Ois an oxide of erbium metal. The applications of erbium oxide are varied due to their electrical, optical and photoluminescence properties. Nanoscale materials doped with Er+3 are of much interest because they have special particle-size-dependent optical and electrical properties. Erbium oxide doped nanoparticle materials can be dispersed in glass or plastic for display purposes, such as display monitors. The spectroscopy of Er+3 electronic transitions in host crystals lattices of nanoparticles combined with ultrasonically formed geometries in aqueous solution of carbon nanotubes is of great interest for synthesis of photoluminescence nanoparticles in ‘green’ chemistry. Erbium oxide is among the most important rare earth metals used in biomedicine. Erbium oxides are also used as gate dielectrics in semiconductor devices since it has a high dielectric constant (10-14) and a large band gap. Erbium is sometimes used as a coloring for glasses and erbium oxide can also be used as a burnable neutron poison for nuclear fuel. Erbium oxide films obtained by sputtering can be used for their photoluminescence effect.

Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 1”, Thickness: 0.125”

$150.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Erbium oxide with a chemical formula of Er2Ois an oxide of erbium metal. The applications of erbium oxide are varied due to their electrical, optical and photoluminescence properties. Nanoscale materials doped with Er+3 are of much interest because they have special particle-size-dependent optical and electrical properties. Erbium oxide doped nanoparticle materials can be dispersed in glass or plastic for display purposes, such as display monitors. The spectroscopy of Er+3 electronic transitions in host crystals lattices of nanoparticles combined with ultrasonically formed geometries in aqueous solution of carbon nanotubes is of great interest for synthesis of photoluminescence nanoparticles in ‘green’ chemistry. Erbium oxide is among the most important rare earth metals used in biomedicine. Erbium oxides are also used as gate dielectrics in semiconductor devices since it has a high dielectric constant (10-14) and a large band gap. Erbium is sometimes used as a coloring for glasses and erbium oxide can also be used as a burnable neutron poison for nuclear fuel. Erbium oxide films obtained by sputtering can be used for their photoluminescence effect.

Gadolinium Oxide (Gd2O3) Micron Powder, Purity: 99.99%, Size: 325 mesh

Price range: $23.00 through $149.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications:

Gadolinium oxide is used in different fluorescent, luminescence and electric devices. It is used in lectroluminescent devices, cathode-ray tube, field emission displays, ferroelectric memory, plasma display panals, ultraviolet detectors, and high resolution x-ray medical imaging.

Erbium Oxide (Er2O3) Sputtering Targets, Purity: 99.99%, Size: 2”, Thickness:0.125”

$138.00
Select options This product has multiple variants. The options may be chosen on the product page

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the target material can be determined and even extremely low concentrations of impurities are detected. Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon. Erbium oxide with a chemical formula of Er2Ois an oxide of erbium metal. The applications of erbium oxide are varied due to their electrical, optical and photoluminescence properties. Nanoscale materials doped with Er+3 are of much interest because they have special particle-size-dependent optical and electrical properties. Erbium oxide doped nanoparticle materials can be dispersed in glass or plastic for display purposes, such as display monitors. The spectroscopy of Er+3 electronic transitions in host crystals lattices of nanoparticles combined with ultrasonically formed geometries in aqueous solution of carbon nanotubes is of great interest for synthesis of photoluminescence nanoparticles in ‘green’ chemistry. Erbium oxide is among the most important rare earth metals used in biomedicine. Erbium oxides are also used as gate dielectrics in semiconductor devices since it has a high dielectric constant (10-14) and a large band gap. Erbium is sometimes used as a coloring for glasses and erbium oxide can also be used as a burnable neutron poison for nuclear fuel. Erbium oxide films obtained by sputtering can be used for their photoluminescence effect.