Lithium Niobate (LiNbO3) Sputtering Targets
Purity: 99.9%, Size: 2”, Thickness: 0.250”
Sputtering is a well-established technique that can deposit thin films made of a wide range of materials on a variety of shaped and sized substrates.
Sputter targets allow for reproducible processes that can be expanded from small-scale R&D initiatives. Sputter target processes can be modified to suit medium- to large-sized substrate surfaces in manufacturing batches. On the target, a chemical reaction may take place.
surface, in-flight or on the substrate depending on the procedure conditions. Sputter deposition is a complicated process due to its numerous characteristics, yet professionals have a great deal of control over the region’s growth and microstructure.